TW201000524A - Novel macromolecular compounds having a core-shell structure for use as semiconductors - Google Patents
Novel macromolecular compounds having a core-shell structure for use as semiconductors Download PDFInfo
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- TW201000524A TW201000524A TW098107954A TW98107954A TW201000524A TW 201000524 A TW201000524 A TW 201000524A TW 098107954 A TW098107954 A TW 098107954A TW 98107954 A TW98107954 A TW 98107954A TW 201000524 A TW201000524 A TW 201000524A
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- 229920001542 oligosaccharide Polymers 0.000 description 1
- 150000002482 oligosaccharides Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 125000000466 oxiranyl group Chemical group 0.000 description 1
- GNWXVOQHLPBSSR-UHFFFAOYSA-N oxolane;toluene Chemical compound C1CCOC1.CC1=CC=CC=C1 GNWXVOQHLPBSSR-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 125000001792 phenanthrenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C=CC12)* 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
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- 229920000128 polypyrrole Polymers 0.000 description 1
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- 238000001556 precipitation Methods 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
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- 238000001953 recrystallisation Methods 0.000 description 1
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- 238000010561 standard procedure Methods 0.000 description 1
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- 238000010345 tape casting Methods 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
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Description
201000524 六、發明說明: 【發明所屬之技術領域】 本發明係關於具核殼結構的新穎巨分子化合物以及 其在電子組件中之用途。 【先前技術】 隨有機導體及半導體化合物之發現,分子電子元件 領域在過去15年快速發展。這段時間已發現許多具有 半導體或電光性質之化合物。一般了解分子電子元件將 不取代以矽為主之習知半導體建構塊。反而認為分子電 子組件將開啟需要塗覆大面積之適合性、結構撓曲性、 低溫加工性及低成本之新應用領域。半導體有機化合物 係目前針對如場效電晶體(OFET)、有機發光二極體 (OLED)、感測器及光伏打元件之應用領域戶斤發展。 OFET之簡單結構化及整合入有機半導體積體電路係提 供迄今因石夕建構塊之價格及缺乏撓曲性而尚無法藉由 矽技術獲得智慧卡或價格顯示板用之便宜解決方法。 OFET同樣可用作大面積撓曲基質顯示器之開關元件。 有機半導體、半導體積體電路及其應用之概述係提供於 (例如)H. Klauk(編者),〇rganic Electronics,Materials,
Manufacturing and Applications,Wiley-VCH 2006。 場效電晶體係二電極元件’其中兩電極(已知之‘‘源 極”及“汲極”)間之薄導電通路之導電率係由第三電極 3 201000524 (已知之“閘極”)所控制,而第三電極係以薄絕緣層而與 導電通路分離。場效電晶體之最重要的特徵性質係電荷 載體之移動率,其明確地決定電晶體之切換速度及已切 換態與未切換態之電流間的比例(已知之“開/關比”)。 迄今已有兩大類化合物用於有機場效電晶體中。這 兩類化合物具有延伸共輛單元並根據分子量及結構分 成共軛聚合物及共軛寡聚物。 寡聚物一般具有均勻分子結構及低於10 〇〇〇道耳吞 之分子量。聚合物一般包含具有分子量分布之均勻重複 單元鏈。然而,寡聚物與聚合物間存在一流體轉變。 寡聚物與聚合物間之區別經常反映在這些化合物之 加工存在基本差異。寡聚物經常可汽化並可藉由氣相沉 積法塗覆於基板上。術語聚合物經常用於指(無關其分 子結構)無法再汽化並因此係藉其他方法塗覆之化合 物。至於聚合物,一般尋求可溶於液體介質,例如有機 溶劑中,然後可藉由適當塗覆方法塗覆之化合物。極普 遍之塗覆方法係(例如)旋塗。特別精緻的方法係藉由喷 墨法塗覆半導體化合物。在此方法中,半導體化合物溶 液係以極細液滴形式塗覆於基板上並乾燥之。此方法容 許在塗覆期間進行結構化。此半導體化合物之塗覆方法 的敘述係描述於(例如)Nature,第401卷,第685頁中。 一般而言,濕化學法被視為具有極大潛力可以簡單 方式獲得便宜之有機半導體積體電路。 4 201000524 製造高品質有機半導體電路之重要必要條件係具有 極高純度之化合物。有序化現象在半導體中係扮演一重 要角色。阻礙化合物均勻對準及顯著的晶粒邊界皆使半 導體性質急劇下降,因此利用不具極高純度之化合物建 構之有機半導體電路一般係無法使用。餘留不純物可 (例如)將電荷注入半導體化合物中(“摻雜”)並因此降低 開/關比,或用作電荷陷阱並因此大幅降低移動率。此 外,不純物可引發半導體化合物與氧之反應且具有氧化 作用之不純物可氧化半導體化合物並因此縮短可能儲 存、加工及操作時間。 一般所需之純度係高得使得一般無法藉由已知聚合 物-化學法如洗滌、再沉澱及萃取達到。另一方面,寡 聚物可如分子均勻且經常揮發之化合物般藉由昇華或 層析法相對簡單地獲得純化。 半導體聚合物之一些重要代表係描述於下。至於聚 苐及第共聚物,例如聚(9,9-二辛基苐-共-二噻吩)(1)
201000524 =獲得高達g.G2平方伏特秒之電荷移動率(下文亦 間輪為移動率)(Science,2_,第携卷,第⑽ 至於立體規則之聚(3_己基嫁2,5-二基)(11)、
(Π) 已獲得尚達〇.1平方厘米/伏特秒之移動率(Science, 1998,第280卷’第1741頁)。聚第、聚第共聚物及聚 (3-己基η塞吩-2,5-二基)實際上像所有長鏈聚合物般在由 溶液塗覆後形成良好薄膜並因此容易處理。然而,如具 有分子量分布之高分子量聚合物般,其無法藉由真空昇 華純化且不易藉由層析法處理。 寡聚物半導體化合物之重要代表係(例如)寡噻吩,特 別係彼等具有末端烷基取代基如式(m)及稠五苯(IV)者。 201000524
rX = h、烷基、烷氧基
(IV) 對;例如)α,α· 得’如已描述 (Science,2_,第29〇H夂平方厘米/伏特秒 46^-^rr-L 4,第963頁)及紅烯單晶之移 ^ ί 320 , 、 若由溶液塗覆寡聚物,移動率通常快 ^降低I又而5 ’當寡聚物化合物係由溶液進行處理 叶,半導體性質之降低_因於絲物化合物之適中溶 解度及低薄卿成傾向。因此,不均勾性係歸因於(例 如)乾煉溶液期間所形成之沉澱(chem. Mater.,1998,第 10卷,第633頁)。 因此曾企圖結合半導體聚合物之良好加工及薄膜形 7 201000524 成性質及半導體寡聚物之性質。US-A6,025,462描述具 有星狀結構並包含分枝核及共輛側基之殼的導電聚合 物。然而,此等物具有/些缺點。若側基係藉由侧邊未 經取代之共軛結構所形成’所得化合物係微溶或不溶的 且無法進行處理。若共軛單元係經側基取代,此確實導 致較佳溶解度,但由於側基之體積’使其產生會損害這 些化合物之半導體性質之内部失序及形態缺陷。 WO 02/26859 A1描述包含附接芳族共軛鏈之共軛 主鏈之聚合物。該等聚合物帶有可使電子導電之二芳基 胺側基。然而,這些化合物因二芳基胺側基而不適合作 為半導體。 EP-A 1 398 341及EP-A 1 580 217描述具核殼結構 並用作電子組件之半導體及可由溶液進行處理之半導 體化合物。然而,這些化合物傾向獲得製造期間不易結 晶之薄膜,其對某些應用而言可能係一阻礙,因為結晶 膜係高電荷載體移動率之必要條件。雖然已知有機半導 體薄膜接著可藉由熱處理而有序化(deLeeuw等人wo 2005104265) ’但該化合物之巨分子特徵亦可阻礙熱處 理完成後績規則化。 在 Applied Physics Letters 90,053504(2007),jang 等人描述藉由喷墨印刷法製造電晶體。α,α、二己基四噻 吩係用作有機半導體。在此所發現〇.〇43平方厘米/伏特 秒之移動率相當於彼等材料之氣相沉積層的移動率。然 201000524 而,電晶體中6微米之極小電極間隔係經選擇。此類+ 結構無法以滾動式大量印刷法製得。目前現代印刷法y 達到約20-50微米之解析度。半導體層之均勻性及相逢 界對於运些間隔係扮演一極重要的角色。
Appl. Phys. Lett. 87, 222109(2005),Russel 等人插迷 聚(3-己基噻吩-2,5-二基)及α,α’-二己基四噻吩之混合物 用於有機場效電晶體之半導體層之用途。在此,α,α,-二 己基四噻吩形成以聚合物連接之晶質島狀物。然而,半 導體層中所見之移動率係受聚(3-己基噻吩-2,5-二基)相 車父於oc,oc -一己基四ΰ塞吩之低移動率所限制。在Jap. j
Appl. Phys. (2005),第 44 卷,第 L1567 頁,聚(3-己基嗜 吩-2,5-二基)及α,α’·二己基六噻吩之混合物係用於製造 場效電晶體。然而,為達到該等化合物之足夠溶解度, 需將該等溶液加熱至19〇°C,其係不適合工業應用的。
Adv· Funct. Mater. 2007, 17, 1617-1622 描述由飽和溶液 結晶之經環己基取代之四VJ塞吩。然而,此類加工不容許 大量生產。而且,電極結構中必須使用小通道長度以確 保該等晶體在這些結構上充分重疊。此類小電極結構之 製造再次需要無法用於大量生產之快速印刷程序之複雜 微影法。 β 因此對由溶劑加工後具有較佳性質之半導體有需求。 9 201000524 【發明内容】 提供具有 足夠穩定 導體層之 本發明目的係提供可由慣用溶劑進行處理、 〈好性質之半導體薄膜並在空氣中儲存時保持 之有機化合物。此類化合物極適合用於有機丰 大面積塗覆。 、、仏係Θ等化合物形成均句厚度及形態之古 並適合用於電子應用中。 質層 已驚釾地發現當錢化合物具核殼結構時, 需性質,其中該核殼結構包含由多官能基單元構:有所 2連接鏈及各末端鍵聯點藉由至少—撓曲非 /一個帶有拉電子基之亞曱基碳原子封端之線性此『 泰聚物鏈構成之殼。 、'’ /、輕 純巨特目較於由純單體紐化合物或制殼結構之 1二:=構成之半導體,由寡聚物有機化合物及 構之巨分子化合物及/或具單體線性化人 電:曾匕::的混合物構成之薄膜的薄膜形態及所得宏i 電性質係獲改善。 本發明提供具減結構之巨分子化合物,其巾該核具 =石夕及/或碳為主之巨分子基本結構並經由碳基連接 ▲、接^至少兩個具有連續共缝鍵之碳基線性寡聚物 且《亥等線性共I猶各H由至少__個其他,制係無共 輕雙鍵之脂族、芳脂族或氧脂族鏈經至少—個帶有拉電 子基之亞甲基碳原子封端。 201000524 在-ϋ具體表現中,具核殼結構之 物可為寡聚物或聚合物。為達本發成刀子化口 工旦你# 1 non、苦ή·工,,Α 的’寡聚物係分 子里低於1_道耳吞之化合物且聚 為1000道耳吞或更高之化合物。視 糸千均刀子里 均分子量可為數目平均分子量(Μη)或里重量去而:分:: (Mw)。在此所指的是數目平均分子量(μ)卞9刀于里 為達本發明目的,核殼結構係一分子級 指一個分子之結構。 對於本&月目的’線性共輛寡聚物鏈之末端鍵聯點 係線性絲物鏈之末端單元巾具有共婦鍵之點,經由 該點係無法進-步鍵聯至另—此類鏈。末端意指最遠離 核處。具有連續共軛雙鍵之線性寡聚物鏈於下文中亦將 簡稱為線性共軛寡聚物鏈。 具核殼結構之巨分子化合物較佳具有通式(z)之核殼 結構, K—-V—a4-L—-A——R m L L Jq 」n (z) 其中 K係n-官能基核, V係連接鏈, L係線性共輛寡聚物鏈,較佳係一含經取代或未 11 201000524 經取代σ塞吩或伸苯基單元, Α係一帶有拉電子基之亞曱基碳原子,其係選自 羰基、二氰乙烯基、氰基丙烯酸酯、丙二酸酯及二鹵 亞曱基組成之群, R係線性或分枝C2-C2G-烷基、C3-C8-伸環烷基、 单不飽和或多不飽和C2-C20-稀基、C2-C20-烧氧基、 c2-c2〇-芳烷基或C2-C2G-寡醚或c2-c2〇-聚醚基, q係0或1及 η係大於或等於2,較佳係2至4之整數。 當Α上之拉電子基形成氰基丙烯酸酯或丙二酸酯 時,對應烷基係線性或分枝CrC12-烷基,較佳係線性 或分枝CrC8-烷基。當A上之拉電子基形成二鹵亞甲基 時,此係二溴亞曱基、二氯亞甲基、二碘亞曱基或二氟 亞曱基,較佳係二氟亞曱基。 該較佳化合物之殼係藉由各附接該核之 n-V-(A)q_L-A-R建構塊形成。 至於(例如)n等於3、4或6,這些化合物係式(Z-3)、 (Z-4)或(Z-6)之結構, 12 201000524
(Z-3) (Z-4) (Z-6) 其中K、V、L及R係如上所定義般。 此類化合物係經建構以使由多官能基單元構成之 核,即分枝核、連接鏈、帶有拉電子基之亞曱基碳、線 性共輛寡聚物鏈及非共輛鏈彼此連接。 由多官能基單元構成之核較佳具有樹狀或高分枝結 構。 南分枝結構及其製法係為熟諸此技者本身已知。南 分枝聚合物或寡聚物具有所用單體結構預定之特定結 構。所用單體係ABn單體,即帶有兩個不同官能基A 及B之單體。其中一官能基(A)每分子僅出現一次,而 另一官能基(B)出現多次(η次)。兩官能基A及B可彼此 反應以形成化學鍵,如聚合。由於單體結構,已知為高 分枝聚合物之具有樹狀結構的聚合物係在聚合反應時 形成。高分枝聚合物不具規則分枝點,無環且該等鏈末 端實際上只具B官能基。對於以矽為主之高分枝聚合物 13 201000524 貫例问为枝聚合物、其結構、分枝問題及其術語係描 述於 LJ. Mathias, T.w· Carothers,Adv. Dendritic
MaCr〇mol.(1995),2, 10M21及其中所引用之研究。 為達本發明目的,高分枝聚合物較佳係樹狀聚合物。 為達本發明目的,樹狀聚合物係藉由兩或更多單體 連接至各已事先鍵結之單體上而逐步增大之合成巨分 子結構,因此單體末基的數目隨各步驟以指數方式增加 並最後形成球形樹狀結構。依此方式,具有基團之三維 巨分子結構具分枝點並以規則方式由中央持續至周 圍°此類結構通常係藉由熟諳此技者已知方法逐層增 大。層數通常係指世代數目。各層中之分枝數目及端基 數目係隨世代增加而增加。由於其規則結構,樹狀結構 可提供特定優勢。樹狀結構、製備方法及術語係為熟諳 此技者已知並描述於(例如)G· R. Newkome等人, Dendrimers and Dendrons, Wiley-VCH Weinheim, 2001 中。 可用於由樹狀或高分枝結構構成之核(下文亦簡稱 為樹狀或高分枝核)之結構係(例如)彼等描述於US-A 6.025.462中者。這些係(例如)高分枝結構如聚伸苯基、 聚醚酮、聚酯如(例如)US-A 5.183.862、US-A 5.225.522 及US-A 5.270.402中所述者、聚芳香醯胺如(例如)US-A 5.264.543中所述者、聚醯胺如US-A 5.346.984中所述 者、聚碳矽烷或聚碳矽氧烷如(例如)US-A 6.384.172中 14 201000524 所述者或聚伸芳基如(例如)US-A 5.070.183或US-A 5.145.930中所述者或樹狀結構如聚伸芳基、聚伸芳基 醚或聚酿胺胺如(例如)US-A 4.435.548及US-A 4.507.466中所述者以及聚乙亞胺如(例如)US_A 4.631.337中所述者。 樹狀核較佳係藉由矽氧烷及/或碳矽烷單元形成。較 ,係使用二矽氧烷及四曱基二矽氧烷單元作為矽氧烷 單元且較佳碳矽烷單元係四伸丙基矽烷、四伸乙基矽 烧、甲基三伸丙基珍燒、乙基三伸丙基石找、丙基三伸 丙基石夕烧、己基三伸丙基魏、二甲基二伸丙基石夕烧、 二己基二 而,亦可 二乙基二伸丙基矽烷、二两基二伸丙基矽烷 伸丙基#、己基甲基二伸丙基魏單元。_,亦可 使用其他結構單元以增大缝或高分枝核。樹狀或高分 枝核之角色主要係取得-系列官能基並因此形成一可 附接該等連接鏈及線性共轉聚_翻此可以核殼 2形式顧之基質。線性共轉聚物鏈係藉由附接至 基負而預序化並因此增加其有效性。 =或高分枝核在鍵_的意義上具衫個前端基 係適合祕附接料連接鏈與線性共輛寡 具體言之’核如高分枝結構所構成之核般 =個’但較佳係至少三個官能基,特佳係至少 樹狀或高分枝核中之較佳結構係u,5_伸苯基單元 201000524 (式V-a)及式(V-b)至(V-e)之單元,其中複數個相同或不 同之式(V-a)至(V-e)單元係彼此鍵結,
其中在式(V-c)及(V-d)之單元中a、b、c及d係彼此獨立 地為0、1、2或3。 在式(V-a)至(V-e)及下文所用其他結構式中以*標示 之位置係指鍵聯點(linkage point)。單元(V-a)至(V-e)可 經由這些點彼此連接或經由連接鏈及若適合經由帶有 拉電子基之亞曱基碳原子連接至線性共軛寡聚物鏈 (L)。 由式(V-a)單元構成之樹狀核(K)的實例如下: 16 201000524
經由連接鏈(v)及若適合經由帶有拉電子基之亞甲 基碳原子鍵聯至線性共軛寡聚物鏈(L)係發生在以*標 示之位置。 具核殼結構之巨分子化合物的殼係藉由連接鏈 (V)、至少一個帶有拉電子基之亞曱基碳原子(A)、線性 共軛寡聚物鏈(L)及非共軛鏈(R)形成。連接鏈(V)較佳係 具有高撓曲性,即高分子(内)移動率者並依此方式造成 -L-R段圍繞核K之幾何排列。為達本發明目的,撓曲 係分子(内)可移動意義上所指者。 適合連接鏈基本上係具有下列結構特點之線性或分 枝鏈: •碳原子以單鍵鍵結至叾炭原子, •氫原子鍵結至破, •氧原子經由單鍵鍵結至碳, •矽原子經由單鍵鍵結至碳及/或 •石夕原子經由單鍵鍵結至氧, 17 201000524 其較佳係由總數為6至6G㈣子所構成 任何環結構。 佳係小各 適合的連接鏈特佳係線性或分枝C2_C2〇_伸烧基键如 伸乙基、伸正丁基、伸正己基、伸正辛基及伸正十二碳 基、線性或分枝聚氧伸烧鏈如含有_〇ch2_、_〇ch(ch3)-或-0-(CH2)4-段之寡醚鏈、線性或分枝矽氧烷鏈,例如 彼等具有二曱基矽氧烷結構單元及/或線性或分枝碳矽 烧鏈者’即含有矽_碳單鍵之鏈,其中矽原子及碳原子 在邊專鍵中可間隔、隨意或以欲段方式排列,如具有 -SiR2-CH2-CH2-CH2-SiR2 結構單元之鏈。 通式(Z)之適合線性共軛寡聚物鏈(L)基本上係具有 本身形成導電或半導電寡聚物或聚合物之結構的所有 鏈。其為(例如)經取代或未經取代之聚苯胺、聚噻吩、 聚伸乙二氧基噻吩、聚伸苯基、聚吡咯、聚乙炔、聚異 萘、聚伸苯基伸乙烯基、聚苐,其可以均聚物或均寡 聚物或共聚物或共寡聚物的形式使用。較佳可用作線性 共輛寡聚物鏈之此類結構的實例係由2至1 〇個’特佳 係2至8個通式(VI_a)至(V]Uf)之單元所構成之鏈。 201000524
(Vl-a) (Vl-b) ι-ι3 〇2
(Vi-e)
(Vl-f) 其中 R1、R2及R3可相同或不同並各為氫或線性或分枝 CVC20-烷基或Q-Cw烷氧基且較佳係相同的並各 為氫, 該等基團R4可相同或不同並各為氫或線性或分枝 CrQzo-烷基或CrC^o-烷氧基,較佳係氫或C6-C]2-烧基,且 19 201000524 R5係氮或甲基或乙基,較佳係氫,及 S、t各彼此獨立地為〇至4之整數且概,較佳係S制。 在式(v-a)至(v-f)中以*標 (叫至(叫可經由這^^’單元 於各個鏈端帶有非共親鏈(^。、線性共輕寡聚物鏈或 特仏係包3經取代或未經取代2 (vi-b)或經取代或未經取代 ’久:VI_a)或 性共輛寡聚物鍵。字首數^ 土(=)等單元之線 經其發生鍵結之位置。,’ M·指補等單元中 在此及下文中’除非另外# + ^一 特別係crc2(r^基或經燒氣二”牲坐取代係指經烧基, 取代。 U坑乳基’特別係CVC20-烧氧基 物鏈 吩XVI-b)等單元之線性共輛寡聚 在通式(Z)中L所指之線性共軛寡 鍵聯點係經非共_(R)封端。 撓曲性,即高分子_多動率並因此= ^ 作用並因此產生較佳溶解度者。為目 挽曲係具有分子(内)移動率之意義上所指X者。二:= W係具有2至20個碳原子,較佳係6至2Q個碳$ 並可視情況插人氧之線性或分枝㈣、不飽和或芳月原^ 鏈或CVC8_伸環絲。較佳係脂族及氧脂族基,即^ 20 201000524 基或插入氧之線性或分枝脂族基,如寡 伸環録。特佳係未分枝C2_C2。嘴基基或 =乳基或c3_c8·伸環燒基。適合鏈之實例係燒基如2正^ 基、正庚基、正辛基、正壬基、正癸基及正 及烧氧基如正己氧基、正庚氧基、正辛氧基、正=土以 :錢基及正十二碳氧基或C3—c8_伸環烷基如“ 基、%己基或環庚基。 衣戌 可提及通式(Vl-a-R)及(VI_b_R)之結構元 通包含各末端簡點經非共㈣㈣之二 輛养聚物鏈之結構元素,(A)q_L_A_R的實例:'、、 (A)q
(VI-a-R) S 、㈧c
A-R (VI-b-R) 其中A、尺及q係如上針對通式(z)所定義且 P係2至10 ’較佳係2至8,特佳係2至7之整數。 具核殼結構之巨分子化合物之較佳具體 :狀核中之矽氧烷及/或她單元、線二二 t之連接鏈、数基、二氰乙烯基、編烯醆自旨枝:烷 旨或二i亞甲基之至少—個帶有拉電子基之 : 石反原子之拉電子基、未經取代寡噻吩鏈及/或具有2至·^ 21 201000524 個,較佳係4至6個經取代或未經取代嗔吩之寡(3,4-伸 乙二氧基嗔吩)鏈或3,4-伸乙二氧基11塞吩單元之線性共輛 寡聚物鏈及CVC^-烧基之撓曲非共輛鏈。這些化合物之 實例係式(Z-2-a)至(Z-2-i)之下列化合物:
(Z-2-a)
(Z-2-d)
(Z-2-e) 22 201000524
(Z-2-f)
(Z-2-g) 〇
(Z-2-i) 提及下列化合物(Z-4-a)至(Z-4-h)作為其他實例:
(Z-4-a) 23 201000524
Si
(Z-4 七)
(Z-4-c)
(Z-4-d)
(Z-4-e)
(Z-4-g) 24 201000524
(Z-4-h) 通式(Z)之根據本發Μ分子化合物之層較佳係 或半導體的。铸體之化合物或混合物層係本發 主題。特佳係電荷紐移料至少為1G·4平方厘米/伏二 秒之化合物層。電荷載體係(例如)正電洞。 本發明化合物—般係易溶於慣用有機溶劑中並因此 極適合用於由溶液進行加卫。特別適合的溶劑係芳族 物、醚或鹵化脂族烴,例如氯仿、甲笨、苯、二甲笨、 二乙H甲燒、氯苯、二氯苯或四氫吱喃或這些溶 劑之混合物。本發明化合物可藉由各種處理途徑製得。 製備本發明化合物之途徑對化合物之性質不重要。 一本發明化合物在慣用溶劑如芳族物、醚或_化脂族 烴二如在氯:、曱笨、苯、二曱苯、二乙醚、二氣甲烷、 氯苯、二氯苯或四氫11夫喃中具有至少G.1重量%,較佳係 至少1重i /❶,特佳係至少5重量%之溶解度。 本發明化合物由已蒸發驗形成具有丨㈣厚度及形 態之高品質層且其因此適合餘電子應用中。 最後’本么明另外提供本發明化合物作為電子組件如 場效電晶體、、發光組件如有機發光二極體或光伏打電 池、雷射及感測器之半導體。 本發明化合物較佳係以層形式用於這些目的t。 25 201000524 為可確保作為半導體之有效功能性,本發明化合物及 混合物具有足夠移動率,如至少10_4平方厘米/伏特秒。 電荷移動率可(例如)如M. Pope及C.E. Swenberg,
Electronic Processes in Organic Crystals and Polymers,第 2 版,第 709-713 頁(Oxford University Press,New Y〇rk
Oxford 1999)中所述般測得。 對於用途,本發明化合物係被塗覆於適合基板上,例 如具有電或電子結構之矽晶圓、聚合物薄膜或玻璃板 上。所有塗覆方法基本上皆可能用於塗覆。本發明化合 物及混合物較佳係由液相,即由溶液進行塗覆並接著蒸 掉溶劑。由溶液塗覆可藉由已知方法’例如藉由噴霧了 浸潰、印刷及刮刀塗布進行。特佳係藉由旋塗及喷墨印 刷進行塗覆。 ' 由本發明化合物產生之層可錢覆後(例如)藉由軌 處理,如包括瞬_晶相或藉由結構化,如雷健 一步修飾。 本發明另外提供包含本發明化合物及混合物 導體之電子組件。 下列實例用於說明本發明且不構成限制。 【實施方式】 實例 式(Z)之根據本發明化合物可(例如)藉由類似 述合成之方法製得。 26 201000524 所有反應容器係利用慣用保護氣體技術烘乾並在使 用前以氮氣充滿之。 OFET製備: a) OFET之基板及洗務 —將一側已經拋光並具有厚度為3〇〇毫微米之熱生長 ,化物層之p-摻雜矽晶圓(Sil_Chem)切割成25釐米χ25 釐=基板。首先小心地洗滌基板。在流動蒸餾水下以無 ,至用布(Bemot M-3, Ashaih Kasei Corp.)擦拭以移除黏 者的發碎#並接著於贼下超音波浴巾以強度為2%之 水/^tucasoi水性溶液洗滌該等基板15分鐘。然後以蒸餾 水清洗基板並在離心中旋乾。在塗布前立刻在uv/臭氧 ,應 WPR_1GG,UVP lne” Cambridge,GB)巾清潔已拋光 表面10分鐘。 b) 介電層 L 2基二甲基氯矽垸(〇DMC)(Alddch, 246859)係用作 "電中間層。將0DMC倒入Petri盤中以致僅覆蓋 底°卩。然後將存有直立在邊緣上之經洗滌Si基板之 於八上。整個以朝上之玻璃燒杯覆蓋並將petri 令基板留在富含辛基二曱基氯石夕烧 之汛圍中達15分鐘。 六甲基二矽氮烷(HMDS):將用作介電中間層之六曱 =石夕氮燒(Aldrich,37921-2)倒人玻璃燒杯中,而 直立在雜上梭絲Si基板之槽係位於其 27 11 201000524 中。矽氮烷完全覆蓋基板。玻璃燒杯係經覆蓋並在 加熱板上加熱至70°C。令基板留在矽氮烷中達24 小時。接著在乾氮氣流中乾燥基板。 c) 有機半導體 製備一化合物溶於適合溶劑之溶液以塗覆該半導體 層。為使該等組分完全溶解,將溶液置於恥它下超音波 浴中約1分鐘。溶液之濃度為0.3重量〇/0。 °曰/ 具有介電中間層之基板以已抛光面面朝上的方式放 在旋塗設備(Carl Stiss,RCB mit Gyrset®)架中並以吹風 機加熱至約70°C。將約1毫升仍溫熱的溶液滴在表面上 並在1200rpm下持續30秒以500轉/平方秒之加速度及 打開Gyrset®的情況下將含有機半導體之溶液旋離基^反。 d) 塗覆電極 接著將源極及汲極之電極氣相沉積在此層上。此係利 用含有電化學製造之Ni板之光罩進行,其帽抑板具 有4個凹部,含有兩個交叉梳狀物。各梳狀物之齒的寬 度為10微米且長度為4.7釐米。將光罩置於經塗布基板 表面上並以磁鐵由後側固定。 在氣相沉積單元(Univex 350, Leybold)中將金氣相沉 積在基板上。 e) 電容測量 忒等配置之電容係藉使依同樣方式製得但無有機半 體層之基板同樣在相同光罩後進行氣相沉積
而測得。P 矽晶圓與氣相沉積電極間之電容係藉由萬用電表, 28 201000524
MetraHit 18S,Gossen Metrawatt GmbH 測得。所量得此配 置之电谷為C=G.7nF’基於電極幾何相當於每單位面積 之電容C=6.8nF/平方厘米。 f)電特徵 特徵曲線係藉由兩個電流-電壓源(Kdthley 23 8)所量 得。一電壓源施加一電位至源極及汲極並測定流動之電 抓,而第二電壓源施加一電位至閘極及源極。源極及汲 極係與所印上之Au條接觸;高度摻雜之si晶圓形成閘 極並經由已拆除氧化物之後側進行接觸。特徵曲線之記 錄及其5平估係藉由如(例如)“〇rganic Thin_fiim transistors: A review of recent advances5,5 C. D. Dimitrakopoulos, D.J. Mascaro, IBM J. Res. & Dev.第 45 卷’第1期,2001年i月中所述之已知方法進行。 實例 該等合成係在保護氣體下進行。為達此目的,所有玻 璃裝置係在15〇。(:下烘箱中乾燥2小時,趁熱組裝,抽真 空並接著以保護氣體充滿之。所用溶劑係經標準方法乾 燥及除氣。 實例1 1-(2,2’-二嗔吩-5-基)庚 _1_酮 29 201000524
Mg THF
MgBr
將5-溴-2,2’-二噻吩(10.5克,42.8毫莫耳)溶於110 毫升無水THF之溶液逐滴加入鎂(1.04克,43.7毫莫耳) 溶於10毫升無水THF之懸浮液中。接著令混合物迴流2 小時。然後在0°C下將冷溶液逐滴加入庚醯氯(6.34克, 34毫莫耳)與新鮮製得之Li2MgCl4(l.〇7亳莫耳,由135 毫克(1.〇7毫莫耳)]\^]1€12與95毫克(2.24毫莫耳)1^1於 15毫升無水THF中製得)的溶液中。接著以2小時之時 間將混合物溫熱至室溫並另外攪拌1小時。將溶液倒入 400毫升水及600毫升二乙醚中。分離出有機相,以水 清洗,經硫酸鈉乾燥,過濾之並在低壓下蒸掉溶劑。此 獲得12.1克粗產物,其藉由層析法在石夕膠上(溶析液:甲 笨-己烷1 : 1)純化獲得10.70克(94%)產物。 NMR(250 MHz, CDC13, δ, ppm) : 0.88(t, 3H, J=6.7 Hz, -CH2-C//3),1.20-1.45(重疊峰,6H,-CH2-C//2-CH2-), 1.73(m, 2H, M=5, J=7.3 Hz, -CH2-C//2-CH2-CO-), 2.85(t, 2H, J=7.3 Hz, -CH2-C//2-CO-), 7.15(d, 1H, J=3.7Hz), 7.30(s,1H), 7.28-7.33(重疊峰,2H), 7.58(d,1H, J=4_3 Hz)。 30 201000524 實例2 2-(2,2’-二噻吩-5·基)-2-己基_i,3-二啐戊烷
P-TosH, HO-CH2-CH2-〇H
苯,85°C 將1-(2,2’-二噻吩_5_基)庚克,3S 9毫莫耳)溶 於熱苯(350毫升)中並與對-曱苯磺酸(1_37克,7·2毫莫耳) 及乙二醇(8G毫升’89克,Μ4毫莫耳)摻混。溶液在115。〇 下水分離器上彿騰18小時。接著以飽和賴氫納溶液清 洗溶液,分離出有機相,經硫酸鈉乾燥,過濾之並在低 壓下蒸掉溶劑。此獲得11.79克粗產物,其藉由層析法在 石夕膠上(浴析液.曱苯)純化並由己烧再結晶。此獲得8.35 克(72%)產物。 H NMR(250 MHz, CDC13, δ, ppm) : 0.87(t, 3H, J=6.7 Hz, -CH2-C/f3), 1.20-1.48(重疊峰,6H, -CH2-C//2-CH2-), 1.40(m, 2H, M=5, J=7.3 Hz, -CH2-C//2-CH2-C(0-CH2-CH2-0)-),i.99(t,2H,J=7.3 Hz, -CH2-C//2_C(0-CH2-CH2-0)-), 4.〇〇(m, 4H, CH2-C(0-C//2-C//2-〇)-T), 6.88(d, 1H, J=3.7Hz), 6.99(dd, 1H, J!=4.9 Hz, J2=3.7 Hz), 7.00(d, 1H, J-3.7 Hz), 7.12(dd, 1H, 1^3.7 Hz, J2=1.2 Hz), 7.19(dd, 1H, J]=5.4 Hz, J2=1.2 31 201000524
Hz)。 實例3 1-[5,-(4,4,5,5-四曱基-1,3,2-二氧雜硼戊烷-2-基),2,2,-二 噻吩-5-基】-2-己基-1,3-二呤戊烷
BuU /THF -78 - +20 °C 在-70至-75°C下將丁基鋰(15.70克,25.1毫莫耳)溶於 己烷之1.6M溶液逐滴加入2-(2,2’-二噻吩-5-基)-2-己基 -1,3-二哼戊烷(8.10克,25·1毫莫耳)溶於250毫升無水 THF之溶液中。在-75°C下另外攪拌反應溶液60分鐘, 接著一次加入所有2-異丙氧基-4,4,5,5-四甲基-1,3,2-二氧 雜硼戊烷(5.124毫升,25.1毫莫耳)。在-78°C下另外攪拌 溶液1小時並在室溫下另外攪拌1小時。加入600毫升 新鮮蒸餾的二乙醚及300毫升已除氣之水。隨攪拌逐滴 加入25毫升1 M HC1。分離出有機相,以水清洗,經硫 酸納乾燥,過滤之並在低壓下蒸掉溶劑。此獲得11.26 克(95%)產物。 aH NMR(250 MHz, CDC13, δ, ppm) : 0.84(t, 3H, J=6.7 Hz, 32 201000524 -CH2_C//3),1.20-1.48(重疊峰且最大值在 133ppm,2〇H, -CH2-C//2-CH2_& 0-C(C/f3)2),i.99(t,2H,J=7.3 Hz, -CH2-C//2-C(0-CH2-CH2-0)-)9 4.00(m, 4H, CH2-C(0-C^2-C/f2-〇)-T), 6.88(d, 1H, J=3.7Hz), 7.06(d, 3H, J=3.7 Hz), 7.18(d, 1H, J=3.7 Hz), 7.49(d, 1H, J=3.7 Hz)。 實例4 l-[5’-(4,4,5,5-四甲基-1,3,2-二氧雜硼戊烷 _2_基)_2,2,_二 噻吩-5-基】庚-1-酮
,)-2,2’-二噻吩-5-基]-2-己基-1,3-二啐戊烧(51 克,n.4〇 耄莫耳)溶於無水THF(50毫升)中並與114亳升(丨丨毫莫 耳)濃HC1摻混。溶液在室溫下攪拌7小時。接著加乂 牝〇亳升新鮮蒸餾的二乙醚及2〇〇毫升已除氣之水。分 離出有機相’以飽和腦叫水溶液清洗之,經硫酸納 乾燦’過濾之並在低壓下蒸掉溶劑。此獲得4 2克 產物。 33 201000524 lU NMR(250 MHz, CDCI3, δ, ppm) : 0.88(t, 3H, 1=6.7 Hz, -CHrC^3),1.20-1.45(重疊峰且最大值在 i 34ppm,18H, -CH2-C//2-CH2-及 0-C(C//3)2), 2H,m=5, J=7.3 Hz, -CH2-C//2-CH2-CO-), 2.85(t, 2H, J=7.3 Hz, -CH2-C//2-CO-), 7.20(d, 1H, J=3.7Hz), 7.35(d, 1H, J-3.7
Hz), 7.53(d, 1H,J=3‘7 Hz), 7.59(d, 1H, J二4.3 Hz)。 實例5 l-(5’-溴-2,2’-二嗔吩-5-基)十一碳_1〇_稀小酮
Mg + BrCH2CH2Br -- MgBr2.Et20 + C2H4
步驟1,溴化鎂-二乙_錯合物之合成。洛择人篆 克,38.6毫莫耳)溶於15毫升無水THF之懸浮液逐滴加 入丨,2_二溴乙烷(3.18毫升,36.7毫莫耳)溶於25毫升二 乙醚之溶液中。令反應混合物迴流3〇分鐘,接著冷卻至 室溫並另外用於步驟2中。 步驟2·製備(5’善2>2,-二嘆吩_5_基)演化鎖。在_贼 下將丁基鐘(19.3毫升’ 3G.9毫莫耳)溶於己烧之溶 夜込滴加入5,5 -一溴_2,2 -二嗔吩(1〇 〇〇克,3〇 9毫莫耳) 溶於450 *升無水THF g容液中。接著在-赋下㈣反 應溶液3G分鐘。接著—次加人所有步驟i之演化錢二 34 201000524 乙醚錯合物溶液。為 並接著在室溫下_2小日^另外攪拌反應溶液30分鐘 步驟3·製備κ(5 ' ^ 小,二σ塞吩-5-基)十一碳-10-稀 石户赫Hi I驟2之溶液逐滴加入十一
. 克,30.9毫莫耳)溶液及新鮮製得之 Li2MgCl4(1.54 亳茇且、〜从— T . 異耳),谷於無水THF之溶液中。 (Ll2MgCl4,#由在室溫下5。毫升無水·中授摔
MnCl2(194 笔克 ’ 15·1 毫莫耳)與 LiCl(137 毫克,32.4 毫 莫耳)達2小時而由其製得)。以2小時之時間將混合物溫 熱至室溫並另外擾拌1小時。 接著將反應溶液倒入4 〇 0毫升水中並與6 〇 〇毫升二乙 鱗授拌°分離出有機相’以水清洗,經硫酸納乾燥,過 濾之並在低壓下蒸掉溶劑。此獲得12 〇6克粗產物,其 係藉自曱苯重複再結晶及在矽膠上(溶析液:曱苯_己烷 1 : 1,60°C)進行層析法而純化。此獲得8.89克(63%)呈 橘色晶體形式之產物。 35 1 NMR(250 MHz, CDC13, δ,ppm) : 1.20-1.45(重疊峰, 10H, -CH2-C//2-CH2·-), 1.72(m, 2H, Μ—5, J=7.3 Hz, -CH2-CH2-CH2-CO-), 2.02(dt, 2H, Ji=7.3 Hz, J2=7.1 Hz, -CH2-C7/2-CH=CH2), 2.82(t, 2H, J=7.5Hz, -CH2-C7/2-CO-), 4.95(m, 2H, -CH2-CH=C//2), 5.78(m, 1H, -CH2-C//=CH2), 7.00(d, 1H, J=3.7 Hz), 7.05(d, 1H, J=3.7 Hz), 7.09(d, 1H, J=4.3 Hz), 7.30(s,1H),7.57(d,1H, J=4.3 Hz)。 201000524 實例6
〆將 3.26 克(8.07 毫莫耳)i_[5M4,4,5,5_四甲基_u,2_: 氧雜硼戊烷-2-基)-2,2’-二噻吩_5_基]庚_丨_酮及2.79克 (6.78鼋莫耳》_(5’善2,2’_二噻吩_5_基)十一碳.稀小 酮洛於120耄升曱苯之溶液除氣並與466毫克pd(pph^ 摻混。接著加入24毫升已除氣之2MNa2C〇3水溶液並迴 k檀拌反應混合物12小時。加入3〇〇毫升曱苯及3〇〇毫 升水,分離出有機相,以水清洗直到其pH呈中性,乾燥 之,過濾之並在低壓下蒸掉溶劑。此粗產物係自甲苯再 結晶。此獲得4.07克(99%)之產物。 lU NMR(250 MHz, CDC13, δ, ppm) : 0.90(t, 3H, J=6.7 Hz, -CH2-C/73),1.22-1.45(重複峰,16H, -CH2-C//2-CH2-), 1.78(m, 4H, M=5, J=7.3 Hz, -CH2-C/f2-CH2-CO-), 2.01(m, 2H, M=4, J=6.7Hz, -CH2-C=C//2), 2.85(t, 4H, J=7.3 Hz, -CH2-C//2-CO), 4.95(m, 2H, -CH2-CH=C/f2), 5.78(m, 1H, 36 201000524 -CH2-Ci/=CH2), 7.14(d, 2H, J=3.7 Hz), 7.17(d, 2H, J=4.3
Hz), 7.22(d,2H,J=3.7 Hz),7.58(d,2H, J=4.3 Hz)。 實例7 {l-[5”’-(2,2-二氰基小己基乙婦基)·2,2,: 5,,2” : 5”,2”, 四嗔吩_5_基】Η 碳·ΐ〇-稀小亞基}丙二腈
在9(TC下攪拌2.5克(4.1毫莫耳μ-ρ,'庚醯基_2,2,: 5,2 . 5 四嗟吩-5-基)十一碳_1〇_烯_1_酮、;[.os 克 (16.4宅莫耳)丙二腈及120毫升無水σ比α定達25小時。接 著在低壓下移除溶劑且所得粗產物係藉由層析法(矽 膠’溶析液:甲苯-THF 10 : 1)純化。此獲得L48克(51%) 之純產物。 NMR(250 MHz, CDC13, δ, ppm) : 0.89(t, 3H, J=6.7 Hz), 1.22-1.42(重複峰,12H,-CH2-C/i2-CH2·),1.46(m,4H, M=5, J=7.3 Hz, -C//2-CH2-CH2-C(CN)2-), 1.70(m, 4H, M=5, J=7.3Hz, -C//2-CH2-C(CN)2-), 2.02(m, 2H, M=4, J=6.7 Hz, -C^2-C=CH2), 2.93(t, 4H, J=7.3 Hz, 37 201000524 -C//2-C(CN)2-), 4.95(m, 2H, -CH2-CH^C//2), 5.78(m, 1H, -CH2-C//=CH2), 7.20(d, 2H, J=4.3 Hz), 7.28(d, 2H, J=4.3 Hz), 7.3l(d, 2H, J=4.3 Hz), 7.95(^ 2H, J=3.7 Hz) ° 實例8 [H5,,M2,2-二氰基小己基乙稀基)_2,2, : 5,,2” ·· 5”,2' 四嗔吩 丙二腈
在赋下將0.24克(0.34毫 -1-己基乙烯基)-2,2, : 5,,2,,. ,,,,1 L 、,礼卷 ,御基}丙二腈及10毫升^ 溶於20毫升甲苯中。接著C,3-四甲基二石夕氧烧 於二甲苯之(UM溶液。微升^她觸媒溶 接著在健下❹苯- 矽氧烷。所獲得包含72%產物于的1,1,3,3_四曱基二 座物、8.5%二聚物及19%具有 偏移雙鍵之起始物之粗產物㈣克)無進一步純化地反 應。 38 201000524
分鐘 實例8之粗產物的GPC分析 (二聚物.咼峰在7.3分鐘’產物:高峰在7.8分鐘,具有偏移 雙鍵之起始物:高峰在8·1分鐘) 實例9 1,3-雙-{3-[5”’-(2,2-二氰基-1-己基乙婦基)_2,2,: 5,,2” · 5”,2’”-四噻吩-5-基1-亞十一碳基]丙二腈卜以^义四甲 基二矽氧烷
39 201000524 在40°C下將[1-[5,,,_(2,2_二氰基_丨_己基乙 基)-2,2’ : 5’,2” : 5”,2,”_四噻吩_5_基四甲基 二石夕氧垸基)亞十一碳基]丙二腈(〇·25克,0.3毫莫耳 {1-[5 -(2,2-二氰基_ι·己基乙烯基)_2,2, : 5,,2,,: 5,,,2,,,_ =噻吩-5-基]十-碳_1〇_烯小亞基}丙二腈(〇·27克,’㈣ 笔莫耳)溶於15毫升無水曱苯中並接著與2〇微升 Karstedt觸媒溶於二曱苯之〇1 Μ溶液摻混。在恥它下 攪拌反應溶液6小時。接著在低壓下移除溶劑。此獲得 0.52克包含56%所需產物之產物。
實例9之反應產物的GPC分析 (產物:高峰在7.3分鐘,起始物:高峰在7.8分鐘,具有偏移雙 40 201000524 鍵之起始物:高峰在8.1分鐘) 【圖式簡單說明】 無。 【主要元件符號說明】 無。 41
Claims (1)
- 201000524 七、申請專利範圍: ]·—種具核殼結構之巨分子化合物,其令該核具有以矽 及/或碳為主之巨分子基本結構並經由碳基連接鏈連 接至至少兩個具有賴餘雙社碳基雜寡聚物鍵 且該等線性共軛鏈各藉由至少一個其他,特別係無共 軛雙鍵之脂族、芳脂族或氧脂族鏈經由至少一個帶有 拉電子基之亞甲基碳原子封端。 2.根據申請專利範圍第丨項之化合物,其特徵在於具核 喊結構之該(等)巨分子化合物係通式(z)之化合物, K+V+A 士 L—A—R| in 其中 Κ係η-官能基核, V係連接鏈, L係線性共軛寡聚物鏈,較佳係一含經取代或未經 取代σ塞吩或伸笨基單元者, Α係一帶,拉電子基之亞曱基碳原子,其係選自羰 基、一氛乙稀基、氰基丙烯酸酯、丙二酸酯及二鹵 亞甲基組成之群, R係線性或分枝烷基、C3_C8_伸環烷基、單 不飽和或多不飽和C2-C20-烯基、C2-C20-烷氧基、 42 201000524 匸2_匸2〇-芳烧基或C2-C20-养·鍵或C2-C20-聚酸基’ q 係0或1及 η 係大於或等於2,較佳係2至4之整數。 3. 根據申請專利範圍第1或2項之化合物,其特徵在於 該(等)巨分子化合物之核具有樹狀或高分枝結構。 4. 根據申請專利範圍第1至3項中至少一項之化合物, 其特徵在於該(等)巨分子化合物之樹狀核具有矽氧 烷及/或碳矽烷單元。 5. 根據申請專利範圍第1至4項中至少一項之化合物, 其特徵在於該等連接鏈V係線性或分枝C2-C2G-伸烷 基鏈、線性或分枝聚氧伸烷鏈、線性或分枝矽氧烷鏈 及/或線性或分枝碳碎烧鏈。 6. 根據申請專利範圍第1至5項中至少一項之化合物, 其特徵在於該(等)巨分子化合物之殼包含寡噻吩鏈及 /或具有2至8個經取代或未經取代噻吩之寡(3,4-伸乙 二氧基嗔吩)鏈或3,4-伸乙二氧基嗔吩單元作為線性共 輛寡聚物鏈。 7. 根據申請專利範圍第1至6項中至少一項之化合物, 其特徵在於該(等)巨分子化合物之線性共軛寡聚物鏈 43 201000524 的各末端鍵聯位置係經相同或不同、分枝或未分枝烷 基、烧氧基,較佳係烧基封端。 8. —種根據申請專利範圍第1至7項中任一項之化合物 之用途,其係作為電子組件中之半導體。 9. 根據申請專利範圍第8項之用途,其特徵在於該等組 件係場效電晶體、發光組件,特別係有機發光二極體 或光伏打電池、雷射及感測器。 10. 根據申請專利範圍第8或9項之用途,其特徵在於該 化合物係以層形式由溶液塗覆至該組件上。 11. 一種電子組件,其包含根據申請專利範圍第1至7項 中至少一項之化合物作為半導體。 44 201000524 四、指定代表圖: (一) 本案指定代表圖為:無。 (二) 本代表圖之元件符號簡單說明:無。 五、本案若有化學式時,請揭示最能顯示發明特徵的化學式: 益〇 * »'>
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US5183862A (en) | 1990-06-22 | 1993-02-02 | E. I. Du Pont De Nemours And Company | Hyperbranched polyesters |
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DE102006043039A1 (de) * | 2006-09-14 | 2008-03-27 | H.C. Starck Gmbh | Halbleiterschichten bildende Mischungen von organischen Verbindungen |
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