200947158 六、發明說明 【發明所屬之技術領域】 本發明是關於對膜狀光罩周緣施加力讓該光罩彈 形，使繪製在該光罩上包括複數位置對準標記的圖案 及/或形狀改變，藉此在上述光罩和基板對準位置後 述圖案轉印在上述基板上的曝光方法所使用的光罩。 ❾ 【先前技術】 上述的曝光方法，是揭示在日本專利第340268 1 接著，根據第5圖及第6圖說明其原理。如圖示， 101的周圍，設有對光罩101周緣部賦予拉力的複數 器102做爲力賦予手段。致動器102是以包圍著光罩 安裝在底座構件103。致動器102的活動端部104形 鉤 105。 另一方面，光罩101的周緣部形成有複數的孔（ © ) 106。孔106可容納致動器102的鉤105且與該鉤 卡合構成爲連結部可將力賦予手段即致動器102的拉 達至光罩1 01。 光罩101其平面性維持用的透明玻璃板107是由 構件103支撐著。 基板108是配置在與光罩101相向的位置。基板 是支撐在基板支撐構件109上，其與光罩101之間的 量是成爲可變。 光罩101的與基板108相反的側配置有CCD攝 性變 尺寸 將上 號。 光罩 致動 101 成有 長孔 105 力傳 底座 108 間隙 影機 200947158 1 10。CCD攝影機110，其位置是可改變，能夠同時讀取 繪製在光罩101上的位置對準標記111 (第5圖）和繪製 在基板108上的位置對準標記116(第8圖）。另，光罩 1 0 1上的位置對準標記1 1 1間的間距是形成比基板1 0 8上 的位置對準標記1 1 6間的間距還若干小。 第5圖中以二點虛線B包圍的光罩ιοί區域是可辨識 該區域中爲包括位置對準標記11的圖案繪製處的圖案顯 示區域112。此外，包圍著圖案顯示區域112周圍的光罩 101區域是可辨識爲將光罩101連結於力賦予手段即致動 器102成爲力傳達用區域的力傳達區域113。 在進行光罩101和基板108的位置對準時，首先，以 CCD攝影機110讀取繪製在雙方的位置對準標記成重叠的 狀態，根據位置偏差量的數據移動光罩101或基板108， 使各位置對準標記的位置偏差量平均。 其次，啓動致動器102對光罩101賦予拉力，藉此改 變包括位置對準標記111的圖案尺寸及/或形狀，使光罩 1 0 1的位置對準標記1 1 1和基板1 0 8的位置對準標記1 1 6 以高精度成爲彼此重疊。 如上述當光罩101和基板108的位置對準結束後，就 使曝光用的光114(第6圖）通過光罩101照射至基板 108，將繪製在光罩101其圖案顯示區域112內的圖案轉 印在基板108上。藉此，使圖案以尺寸精度高及位置對準 精度高的狀態轉印在基板1 08上。 〔專利文獻1〕日本專利第340268 1號 -6- 200947158 【發明內容】 〔發明欲解決之課題〕 上述的曝光方法使用至今的先前光罩，勢必要比這以 前所使用的光罩還大。其原因是圖案繪製處的圖案顯示區 域112的周圍需要設有力傳達區域113。曝光時若只是要 單純地支撐光罩的外周緣，則圖案顯示區域12的周圍只 φ 要設有寬度窄的「支撐用區域」即可。但是，若需要連結 力賦予手段’則不僅需要形成有連結用的孔，爲了不讓各 致動器拉力造成的光罩局部性歪曲直接影響到圖案，力傳 達區域113的寬度必須形成相當大。其結果，就不得不將 昂貴材料構成的光罩形成爲較大。 先前的光罩101的尺寸和這以前的光罩的尺寸以第7 圖進行比較的結果，相對於二點虛線B所包圍的圖案顯示 區域112的面積，先前的光罩ιοί的面積約爲2.6倍，但 © 二點虛線C所示的這以前的光罩的面積是圖案顯示區域 112的約1.6倍。這是因爲圖案顯示區域112周圍的區域 ，就先前的光罩101而言是不得不需要較大的力傳達區域 1 1 3，但相對於此這以前的光罩卻只要小的支撐用區域1 1 5 即可。 第8圖，是表示配置成與光罩相向的基板108和形成 在其上面的位置對準標記116的平面圖。光罩和基板108 位置對準後，利用曝光使繪製在光罩上的圖案轉印在基板 108上。與基板108相比，光罩101具有約2.5倍以上的 200947158 尺寸，但其一半以上是以昂貴光罩材料製成的非必要性力 傳達區域113。 光罩尺寸大造成的問題，並不限於光罩製作費用的增 加而已。由於大的光罩是無法以現狀的光罩描繪裝置對應 ，爲了獲得能夠對應大光罩的描繪裝置是需要新的設備投 資。 ’ 於是，本發明的課題是分開製成含有圖案顯示區域的 中央部份和含有力傳達區域的部份，然後透過接合形成光 罩，藉此就能夠達到降低材料費及避免新的設備投資。 〔用以解決課題之手段〕 爲了解決上述課題，根據本發明時， 可提供一種對膜狀光罩周緣施加力讓該光罩彈性變形 ，使繪製在該光罩上包括複數位置對準標記的圖案尺寸及 /或形狀改變，藉此在上述光罩和基板對準位置後將上述 圖案轉印在上述基板上的曝光方法所使用的光罩， 0 該光罩，構成爲具備： 繪製有上述圖案的中央部份；及 與該中央部份個別形成，全體配置成包圍著上述中央 部份外周緣部並且成爲接合在該中央部份外周緣部的力傳 達部份，具有和可使上述中央部份彈性變形的力賦予手段 連結用之連結部的力傳達部份。 上述力傳達部份也可由針對上述中央部份的各邊個別 製成的複數帶狀構件所構成，藉由將該帶狀構件分別接合 -8 - 200947158 上述中央部份的各邊以形成光罩。 或者，又可將上述力傳達部份以單一的框緣狀構件製 成，藉由將該框緣狀構件接合上述中央部份以形成光罩。 或者，又可將上述力傳達部份由針對上述中央部份彼 此鄰接的2個邊製成的一對L字形構件所形成，藉由將該 一對L字形構件接合上述中央部份以形成光罩。 上述中央部份及上述力傳達部是以彼此緣端面成對面 0 的狀態，利用膠帶黏貼在該對面部的至少單面側就能夠讓 彼此接合。 上述連結部，可構成複數孔以做爲形成在力賦予手段 即致動器之活動端部的鉤其勾掛用。 上述力傳達部份’可用具有上述中央部份構成用材料 同等楊氏模量的材料構成。 〔發明效果〕 ® 根據本發明的光罩時，繪有圖案的中央部份，和對中 央部份的周圍傳達力讓中央部份彈性變形的力傳達部份， 因是個別製成，所以力傳達部份不需用昂貴的光罩材料製 作，能夠以更便宜的材料構成。因此，使用昂貴材料的部 份減少，能夠降低光罩全體的製作費。 此外，在光罩描繪圖案時，只要將與力傳達部份爲分 離狀態的中央部份配置描繪裝置即可。中央部份因是 爲現狀描繪裝置能夠對應的尺寸大小，所以不需要新設_ 的投資。 -9- 200947158 又加上’當力傳達部份以具有上述中央部份構成用材 料同等楊氏模量的材料構成時，力傳達部份就可和中央部 份同等伸展，即使是2個不同構件的接合構造，全體也不 會扭曲歪斜。 【實施方式】 〔發明之最佳實施形態〕 第1圖是本發明一實施形態的光罩1平面圖。光罩1 ，具備：已描繪有包括複數位置對準標記2之圖案的中央 部份3;及全體配置成包圍著中央部份3外圍緣部的力傳 達部份4。力傳達部份4是與中央部份3個別製成。 中央部份3，可區分成以二點虛線d包圍的區域即該 區域中描繪有圖案的圖案顯示區域5，和包圍該區域周圍 的安裝用區域6。中央部份3是以先前光罩形成用材料相 同或同等的材料構成。 該實施形態中，力傳達部份4，如第2圖所示，由針 對中央部份3的各邊個別製成的4個帶狀構件4a〜4d所 構成。各帶狀構件4a〜4d是分別接合在中央部份3的各 邊。 於接合時，將中央部份3的安裝用區域6的外圍緣端 面和與其相向的各帶狀構件4a〜4d的緣端面成對面狀態 ，沿著雙方的緣端面貼上膠帶7(參照第1圖）。膠帶7 是可只貼在緣端面對面部的單側面，也可貼在兩面。雙方 的緣端面可彼此接觸’也可彼此接近。此外，也可以膠帶 -10- 200947158 7取代，或者也可使用膠帶7的同時用黏合劑塗抹在中央 部份3的安裝用區域6的外圍緣端面及與其相向的各帶狀 構件4a〜4d的緣端面間。也可以利用其他適合的機械式 接合手段，爲了提高接合尺寸精度，最好是使用固定工具 各帶狀構件4a〜4d，設有複數的孔（長孔）8以做爲 形成在力賦予手段即致動器之活動端部的鉤（未圖示）其 ❹ 勾掛用。該等孔8是構成和可使中央部份3其面內彈性變 形的力賦予手段連結用的連結部。 其他的連結部的形態，例如可在各帶狀構件4a〜4d 形成有凹凸形狀部（未圖示）等，構成可與力賦予手段的 活動端部彼此卡合形成力的傳達。 力傳達部份4沒有描繪圖案。因此，力傳達部份4不 必使用和中央部份3相同的昂貴材料構成，能夠採用更便 宜的材料。具體而言，中央部份3是以通過的光罩材料即 © PET (聚對苯二甲酸乙二醇酯）塗敷有感光材的材料製成 ，力傳達部份4是以感光材未塗敷狀態的PET製成。因兩 者的楊氏模量實質上相同，施加張力時爲相同的仲展。因 此，即使是不同構件的接合構造，拉伸時還是不會產生扭 曲歪斜。另，力傳達部份4所使用的PET材，不僅可不用 塗敷感光材’也可不需要如中央部份3所使用的PET材要 求「完美無瑕」，因此能夠採用較便宜的材料。 第3圖是本發明另一實施形態的光罩Η平面圖。光 罩11’具備：已描繪有包括複數位置對準標記2之圖案的 -11 - 200947158 中央部份3;及全體配置成包圍著中央部份3外圍緣部的 力傳達部份14。力傳達部份14是與中央部份3個別製成 〇 於該實施形態中，力傳達部份14如第4圖所示是以 單一的框緣狀構件製成。力傳達部份14內圍緣部的尺寸 及形狀的訂定是根據力傳達部份14和中央部份3配合時 ，力傳達部份14的內圍緣部所形成的空間內可剛好嵌入 中央部份3的外圍緣部。 0 如第3圖所示，框緣狀的力傳達部份14的空間內爲 嵌入有中央部份3的狀態後，用膠帶7讓力傳達部份14 及中央部份3的雙方彼此接合。針對接合及力傳達部份14 構成用的材料，如第1圖及第2圖實施形態的相關說明， 可選擇各種不同的手段。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to applying a force to a periphery of a film-like reticle to cause the reticle to be elastic, so that a pattern and/or shape including a plurality of positional alignment marks on the reticle is drawn. The reticle used in the exposure method in which the pattern is transferred onto the substrate is described later at the alignment position of the reticle and the substrate. ❾ [Prior Art] The above-described exposure method is disclosed in Japanese Patent No. 340268. Next, the principle will be described based on Fig. 5 and Fig. 6. As shown in the figure, a plurality of 102s for applying a pulling force to the peripheral edge portion of the mask 101 are provided as a force applying means. The actuator 102 is attached to the base member 103 by surrounding the reticle. The movable end 104 of the actuator 102 is shaped as a hook 105. On the other hand, a plurality of holes (©) 106 are formed in the peripheral portion of the mask 101. The aperture 106 can receive and engage the hook 105 of the actuator 102 such that the coupling portion can pull the force imparting means, i.e., the actuator 102, to the reticle 101. The transparent glass plate 107 for maintaining the planarity of the mask 101 is supported by the member 103. The substrate 108 is disposed at a position facing the mask 101. The substrate is supported on the substrate supporting member 109, and the amount between the substrate and the mask 101 is variable. The side of the photomask 101 opposite to the substrate 108 is provided with a CCD image-capturing size. The reticle is actuated 101 into a long hole 105 force transmission base 108 gap camera 200947158 1 10. The CCD camera 110, whose position is changeable, can simultaneously read the position alignment mark 111 (Fig. 5) drawn on the reticle 101 and the position alignment mark 116 (Fig. 8) drawn on the substrate 108. Further, the pitch between the alignment marks 1 1 1 on the photomask 1 0 1 is formed to be somewhat smaller than the pitch between the alignment marks 1 16 on the substrate 1 0 8 . The mask area surrounded by the two-dotted line B in Fig. 5 is a pattern display area 112 in which the pattern drawing portion including the position alignment marks 11 in the area can be recognized. Further, the region of the reticle 101 surrounding the pattern display region 112 is a force transmission region 113 that can be recognized as a region for which the actuator 102 is connected to the force applying means, that is, the force transmitting region. When aligning the position of the reticle 101 and the substrate 108, first, the CCD camera 110 reads the state in which the alignment marks are overlapped, and moves the reticle 101 or the substrate 108 based on the data of the positional deviation amount so that each The positional deviation of the position alignment marks is averaged. Next, the actuator 102 is actuated to apply a pulling force to the reticle 101, thereby changing the pattern size and/or shape of the aligning mark 111, so that the position of the reticle 101 is aligned with the mark 1 1 1 and the substrate 1 0 8 The position alignment marks 1 1 6 are superposed on each other with high precision. After the alignment of the photomask 101 and the substrate 108 is completed as described above, the light 114 for exposure (FIG. 6) is irradiated to the substrate 108 through the mask 101, and is drawn in the pattern display region 112 of the mask 101. The pattern is transferred onto the substrate 108. Thereby, the pattern is transferred onto the substrate 108 in a state in which the dimensional accuracy is high and the alignment accuracy is high. [Patent Document 1] Japanese Patent No. 340268 No. -6-200947158 [Disclosed from the Invention] [Problems to be Solved by the Invention] The above-described exposure method uses a conventional photomask which is still larger than the photomask used in the prior art. The reason for this is that the force transmission area 113 needs to be provided around the pattern display area 112 at the drawing. In the case of simply supporting the outer periphery of the mask during exposure, only the "supporting region" having a narrow width may be provided around the pattern display region 12. However, if the coupling force applying means is required, it is necessary to form not only the holes for connection, but also the width of the force transmission region 113 must be formed to be large in order to prevent the local distortion of the mask from directly affecting the pattern due to the tension of the actuators. As a result, it is necessary to form a photomask made of an expensive material to be large. As a result of comparing the size of the previous reticle 101 with the size of the previous reticle as shown in FIG. 7, the area of the previous reticle ιοί is about 2.6 with respect to the area of the pattern display area 112 surrounded by the two-dotted line B. The area of the previous mask shown by the two-dotted line C is about 1.6 times that of the pattern display area 112. This is because the area around the pattern display area 112 has to require a large force transmission area 1 1 3 in the case of the previous mask 101, but as long as the previous mask is as small as the support area 1 1 5 is fine. Fig. 8 is a plan view showing the substrate 108 disposed to face the reticle and the alignment mark 116 formed thereon. After the photomask and the substrate 108 are aligned, the pattern drawn on the photomask is transferred onto the substrate 108 by exposure. The reticle 101 has a size of about 2009 times the 200947158 compared to the substrate 108, but more than half of it is an unnecessary force transmitting region 113 made of an expensive reticle material. The problem caused by the large size of the mask is not limited to the increase in the cost of mask production. Since a large reticle cannot correspond to the current reticle drawing device, it is necessary to invest in new equipment in order to obtain a drawing device capable of corresponding to a large reticle. Thus, the object of the present invention is to separately form a central portion including a pattern display region and a portion containing a force transmission region, and then form a reticle by bonding, thereby achieving a reduction in material cost and avoiding new equipment investment. [Means for Solving the Problems] In order to solve the above problems, according to the present invention, it is possible to provide a force applied to a peripheral edge of a film mask to elastically deform the mask so that a plurality of position alignment marks are drawn on the mask. a mask used for an exposure method for transferring the pattern onto the substrate after the mask and the substrate are aligned, wherein the mask is configured to have: a central portion of the pattern; and the central portion is formed separately, and is entirely disposed so as to surround the outer peripheral edge portion of the central portion and is a force transmitting portion joined to the outer peripheral portion of the central portion, and has the center The portion of the elastically deformable force imparting means connects the force transmitting portion of the connecting portion. The force transmitting portion may also be formed by a plurality of strip members which are individually formed for each side of the central portion, and the strip members are respectively joined to the sides of the central portion of -8 - 200947158 to form a mask. . Alternatively, the force transmitting portion may be formed as a single frame-like member, and the frame member may be joined to the central portion to form a photomask. Alternatively, the force transmitting portion may be formed by a pair of L-shaped members formed for the two sides adjacent to each other at the center portion, and the pair of L-shaped members are joined to the central portion to form light. cover. The central portion and the force transmitting portion are bonded to each other on at least one side of the pair of faces by a state in which the end faces of the opposite faces are opposite to each other. The connecting portion may constitute a plurality of holes for hooking the hook formed at the movable end portion of the actuator, which is a force applying means. The above-described force transmitting portion may be composed of a material having the same Young's modulus as the material for forming the central portion. [Effect of the Invention] According to the reticle of the present invention, the central portion of the pattern is drawn, and the force transmitting portion that transmits the force to the central portion to elastically deform the central portion is formed separately. The communication part does not need to be made of expensive mask material, and can be constructed with cheaper materials. Therefore, the use of a portion of the expensive material is reduced, and the manufacturing cost of the entire reticle can be reduced. Further, in the case where the mask is drawn, the drawing device may be disposed in a central portion in which the force transmitting portion is in a separated state. The central part is to describe the size of the device for the status quo, so there is no need to invest in the new _. -9- 200947158 In addition, when the force transmission part is made of the material having the same Young's modulus as the central part constituting material, the force transmission part can be stretched as the center part, even if it is 2 different The joint structure of the members does not distort the whole. [Embodiment] BEST MODE FOR CARRYING OUT THE INVENTION Fig. 1 is a plan view showing a reticle 1 according to an embodiment of the present invention. The reticle 1 is provided with a central portion 3 in which a pattern including a plurality of positional alignment marks 2 has been drawn, and a force transmitting portion 4 which is entirely disposed to surround a peripheral edge portion of the central portion 3. The force transmission part 4 is made separately from the central part 3. The central portion 3 can be divided into a region surrounded by a two-dotted line d, that is, a pattern display region 5 in which a pattern is drawn in the region, and a mounting region 6 surrounding the region. The central portion 3 is made of the same or equivalent material as the material for forming the mask. In this embodiment, the force transmitting portion 4 is constituted by four strip-shaped members 4a to 4d which are individually formed on the respective sides of the center portion 3 as shown in Fig. 2 . Each of the strip members 4a to 4d is joined to each side of the center portion 3, respectively. At the time of joining, the peripheral edge end surface of the mounting portion 6 of the center portion 3 and the edge end faces of the respective strip-shaped members 4a to 4d facing each other are opposed to each other, and the tape 7 is attached along both edge faces (see the first Figure). The tape 7 can be attached to only one side of the edge end face to the face, or it can be attached to both sides. The edge faces of both sides may be in contact with each other' or may be close to each other. Further, it may be replaced by a tape-10-200947158 7, or a tape 7 may be used while being applied to the peripheral edge end surface of the mounting region 6 of the center portion 3 and the respective strip members 4a to 4d opposed thereto. Between the edges of the edge. Other suitable mechanical joining means may be used. In order to improve the joint dimensional accuracy, it is preferable to use the fixing tool strip members 4a to 4d, and a plurality of holes (long holes) 8 are provided as the force imparting means. A hook (not shown) of the movable end of the actuator is used for hooking. These holes 8 are connecting portions for constituting a force applying means for deforming the in-plane elastic deformation of the center portion 3. In the form of the other connecting portions, for example, irregularities (not shown) may be formed in the respective band members 4a to 4d, and the movable end portions of the force applying means may be engaged with each other to form a force. The force transmission part 4 does not depict a pattern. Therefore, the force transmitting portion 4 does not have to be made of the same expensive material as the central portion 3, and a more convenient material can be used. Specifically, the central portion 3 is made of a material that is passed through a photomask material, that is, PET (polyethylene terephthalate) coated with a photosensitive material, and the force transmitting portion 4 is uncoated with a photosensitive material. Made of PET in the state of application. Since the Young's modulus of the two is substantially the same, the same secondary development is applied when the tension is applied. Therefore, even in the joint structure of the different members, the twisting does not occur at the time of stretching. In addition, the PET material used in the part 4 can be used not only without applying the photosensitive material, but also without requiring the PET material used in the central portion 3 to be "perfect", so that a cheaper material can be used. Fig. 3 is a plan view showing a mask of another embodiment of the present invention. The reticle 11' is provided with a central portion 3 of -11 - 200947158 in which a pattern including a plurality of position alignment marks 2 has been drawn, and a force transmitting portion 14 which is entirely disposed to surround the peripheral edge portion of the central portion 3. The force transmitting portion 14 is formed separately from the central portion 3. In this embodiment, the force transmitting portion 14 is formed as a single frame-like member as shown in Fig. 4. The size and shape of the peripheral edge portion of the force transmitting portion 14 are determined such that when the force transmitting portion 14 and the central portion 3 are engaged, the space formed by the inner peripheral edge portion of the force transmitting portion 14 can be just embedded in the center. The peripheral edge of part 3. As shown in Fig. 3, in the space in which the frame-like force transmitting portion 14 is in the state in which the central portion 3 is fitted, the force transmitting portion 14 and the central portion 3 are joined to each other by the tape 7. For the material for the bonding and force transmitting portion 14, as described in the first and second embodiments, various means can be selected.
又加上，另外的實施形態（未圖示）中，力傳達部份 是由上述中央部份彼此鄰接的2個邊製成的一對L字形構 件所形成。一對L字形構件是透過彼此組合形成可包圍著 Q 中央部份外圍緣部的尺寸及形狀。針對力傳達部份和中央 部份的接合及力傳達部份構成用的材料是和其他的實施形 態的狀況相同。 【圖式簡單說明】 第1圖爲本發明一實施形態的光罩平面圖。 第2圖爲表示第1圖光罩構成要素接合前的狀態分解 平面圖。 -12- 200947158 第3圖爲本發明另一實施形態的光罩平面圖。 第4圖爲表不第3圖光罩形成前的力傳達部份分解平 面圖。 第5圖爲表示先前的光罩和力賦予手段的組合平面圖 〇 第6圖爲第5圖光罩及力賦予手段和基板同時圖示的 縱剖面圖，相當於第5圖VI-VI線剖面圖。 0 第7圖爲先前的光罩和這以前的光罩尺寸比較用的平 面圖。 第8圖爲基板和繪製在其上面的位置對準標記同時圖 示的平面圖。 【主要元件符號說明】 1 :光罩 2:光罩的位置對準標記 © 3 :中央部份 4 :力傳達部份 5 :圖案顯示區域 6 :安裝用區域 7 :膠帶 8 :孔（連結部） 1 1 :光罩 1 4 :力傳達部份 101 :光罩 -13- 200947158Further, in another embodiment (not shown), the force transmitting portion is formed by a pair of L-shaped members which are formed by the two sides in which the central portions are adjacent to each other. A pair of L-shaped members are combined to form a size and shape that surrounds the peripheral edge portion of the central portion of the Q. The material for the joint of the force transmitting portion and the central portion and the force transmitting portion are the same as those of the other embodiments. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a plan view of a photomask according to an embodiment of the present invention. Fig. 2 is a plan exploded plan view showing the components of the mask of Fig. 1 before joining. -12- 200947158 Fig. 3 is a plan view of a photomask according to another embodiment of the present invention. Fig. 4 is a partially exploded plan view showing the force transmission before the mask formation of Fig. 3. Fig. 5 is a plan view showing a combination of a conventional mask and a force applying means. Fig. 6 is a longitudinal sectional view showing a mask and a force applying means and a substrate at the same time as Fig. 5, which corresponds to a cross section taken along line VI-VI of Fig. 5. Figure. 0 Figure 7 is a plan view comparing the previous mask to the previous mask size. Figure 8 is a plan view showing the substrate and the alignment marks drawn thereon. [Description of main component symbols] 1 : Mask 2: Positioning mark of the mask © 3: Center part 4: Force transmission part 5 : Pattern display area 6 : Mounting area 7 : Tape 8 : Hole (connection part ) 1 1 : Photomask 1 4 : Force transmission part 101 : Photomask-13 - 200947158
102:致動器（力賦予手段） 103 :底座構件 1 0 4 :活動端部 105：鉤 106:孑L 107 :玻璃板 108 :基板 109 :基板支撐構件 1 10 : CCD攝影機 1 1 1 :光罩的位置對準標記 112:圖案顯7K區域 1 1 3 :力傳達區域 1 14 :光 1 15 :支撐用區域 1 1 6 :基板的位置對準標記102: Actuator (force imparting means) 103: Base member 1 0 4 : movable end portion 105: hook 106: 孑L 107: glass plate 108: substrate 109: substrate supporting member 1 10 : CCD camera 1 1 1 : light Alignment mark 112 of the cover: pattern 7K area 1 1 3 : force transmission area 1 14 : light 1 15 : support area 1 1 6 : position alignment mark of the substrate