JPH10161320A - Exposure device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To attain the facilitation of the attachment/detachment of a film photomask and the prevention of the damage of the film photomask when it is removed from a device. SOLUTION: Plural first evacuation holes 304 for evacuating the film photomask 2 are provided in the surface abutted on the film photomask 2, of an evacuation frame 303 supporting a gauge plate 1. Then, in the part abutted on the evacuation frame 303 on a side opposite to the surface in contact with the film photomask 2, of the gauge plate 1, a seal member 306 is provided for preventing the leakage of vacuum through the first evacuation holes 304 at the time of executing the evacuation of the film photomask 2.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] 1. Field of the Invention [0002] The present invention relates to an exposure apparatus, and more particularly, to an improvement in its structure.

[0002]

2. Description of the Related Art In recent years, when a conductive pattern is formed on a printed circuit board or an electrode is formed on a glass substrate for a flat display, a pattern drawn on a photomask is formed by using a light exposure technique. It is transferred to the photosensitive film surface of the substrate.

As a photomask used for this exposure, a film-shaped or sheet-shaped photomask (hereinafter, collectively referred to as "film photomask") is used. As an exposure apparatus using this film photomask, for example, there are exposure apparatuses disclosed in JP-A-7-49575 and JP-A-8-22131.

According to the structures of the exposure apparatuses disclosed in these publications, the film photomask is disposed so as to overlap a gauge plate made of a transparent substrate for positioning the film photomask. Accurate alignment of the film photomask is performed by pulling the film photomask outward in the plane by a plurality of actuators provided on the periphery of the film photomask.

[0005]

However, although the above-mentioned film photomask is arranged on the gauge plate, this film photomask is not held at all on the gauge plate. At the time of attachment / detachment, it is necessary to hold by hand or the like, and there is a problem that human error is apt to occur when attaching / detaching a film photomask having a size of 1000 × 1500 mm.

Further, in the peripheral portion of the film photomask, for example, FIG.
Is provided, when the actuator is disengaged from the film photomask, the film photomask moves inward together with the clamp mechanism, and the film photomask is bent and damaged. There is.

SUMMARY OF THE INVENTION An object of the present invention is to provide an exposure apparatus which can easily attach / detach a film photomask to / from a gauge plate and prevent damage caused when the film photomask is removed from the exposure apparatus.

[0008]

In an exposure apparatus according to the present invention, an exposing station for exposing a substrate while holding the substrate substantially vertically, and exchanging a substrate or a film photomask are provided. A work station provided on the exposure light source side of the exposure station, a gauge plate holder for holding a transparent gauge plate disposed opposite to the film photomask, and a peripheral portion of the film photomask in the exposure station. And a plurality of actuators for elastically extending the film photomask by applying a tensile force to the long holes, and supporting the actuator and supporting the film photomask. An XYθ stage that can move in the XYθ direction within the plane and an exposure station And a substrate holder for holding the substrate.

Further, a plurality of first vacuum nozzles for vacuum suction of the film photomask are provided on a contact surface of the gauge plate holder with the film photomask, and the first vacuum nozzle is provided with a surface of the gauge plate in contact with the film photomask. A seal member for preventing air from leaking at the time of vacuum suction of the film photomask by the first vacuum nozzle is provided at the contact portion with the gauge plate holder on the opposite side.

Thus, by providing a plurality of first vacuum nozzles, it is possible to hold the film photomask on the gauge plate holder, and to improve the workability of attaching and detaching the film photomask to and from the gauge plate holder. As well as being able to adhere to the gauge plate with the film photomask extended,
The shape and size of the film photomask pattern can be stabilized.

Further, by providing a seal member for preventing air from leaking during vacuum suction of the film photomask by the first vacuum nozzle, the film photomask can be reliably held.

Preferably, a plurality of second vacuum nozzles for vacuum suction of the film photomask are provided between a plurality of actuators provided on the XYθ stage.

Thus, for example, Japanese Patent Application Laid-Open No. 7-495
In the case where a clamp mechanism as shown in FIG. 16 of Japanese Patent Publication No. 75-175 is used, since the film photomask in the vicinity of the clamped state is suction-adsorbed by the second vacuum nozzle, the film photomask is moved together with the clamp mechanism. It is possible to reliably release the clamp mechanism from the film photomask without moving inward.
As a result, the film photomask bends as before,
Damage can be prevented beforehand.

[0014] Also preferably, there is provided a moving carrier for moving between the exposure station and the work station, wherein the moving carrier has a film photomask carrier for exchanging a film photomask and a moving carrier for exchanging a substrate. It has two carriers, a substrate carrier.

As described above, the provision of the movable carrier makes it possible to separate the work in the exposure station from the work in the work station, thereby improving the workability of the exposure process in the exposure apparatus. In addition, by providing two carriers, a film photomask carrier and a substrate carrier, on one moving carrier, it is possible to reduce the size of the exposure apparatus.

[0016]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of an exposure apparatus according to the present invention will be described below with reference to the drawings. First, a schematic configuration of the exposure apparatus will be described with reference to FIG. FIG. 1 is a longitudinal sectional view of the exposure apparatus.

A transparent gauge plate 1 used for positioning a film photomask 2 is arranged on an exposure light source side while being fixed to a frame 11. Frame 11
Is equipped with a CCD camera 12 as a device for detecting a displacement of a positioning mark of a film photomask.

The frame 11 is provided with a mask XYθ driving mechanism 400 for positioning the film photomask 2 in the X direction, the Y direction and the θ direction in the plane. The detailed structure of the mask XYθ driving mechanism 400 will be described later.

Next, the plane structure of the frame 11 will be described with reference to FIG. FIG. 2 is a sectional view taken along the line AA in FIG.
FIG. One end of each of an X-axis direction moving mechanism 13 and a Y-axis direction moving mechanism 14 is attached to the frame 11, and the other end of these moving mechanisms is a stage 1.
5 attached. The X-axis direction moving mechanism 13 and the Y-axis direction moving mechanism 14 allow the mask XYθ driving mechanism 4
00 is configured. A plurality of actuators 9 are arranged side by side around the stage 15. One hook 16 extends from each actuator 9, and these hooks 16 are engaged in slots 10 provided in the peripheral portion of the film photomask 2. The film photomask 2 is held by the actuator 9 in a state where a slight tension is applied by the actuator 9.

The plurality of actuators 9 can be individually operated, whereby the film photomask 2 can be arbitrarily extended and deformed. In FIG. 1, the film photomask 2 is disposed in contact with the gauge plate 1 in order to easily maintain the flatness, but may be disposed close to each other with a small distance.

A first plate for relative positioning between the gauge plate 2 and the film photomask 1 is provided.
Alignment marks 6 are provided on the periphery, and second alignment marks 7 for aligning the substrate 3 and the film photomask 1 are provided.

Referring again to FIG. 1, the substrate 3 coated with the photosensitive agent to be exposed is carried on a substrate holder 17, and a vacuum suction operation is performed by a vacuum suction hole 18 formed in the substrate holder 17. Thus, the film is held on the substrate holder 17 with the exposure surface facing the film photomask 2. Note that the holding is not necessarily performed by using vacuum suction, and a substrate holding unit using another known technique may be used.

Next, by operating the piston cylinder mechanism 19, the substrate 3 approaches the film photomask 2 together with the substrate holder 17, and is opposed to a position close to the film photomask.

The substrate holder 17 is also provided with an XYθ driving mechanism 500 for controlling the X-axis direction, Y-axis direction and θ direction (rotation direction) of the substrate.

Next, the structure of the mobile carrier 20 will be described with reference to FIGS. FIG. 3 is a view taken along line BB in FIG.

The moving carrier 20 is connected to the exposure station 1000 at a position where the gauge plate 1 and the substrate holder 17 are arranged, and the substrate 3 or the film photomask 2.
A work station 2000 for exchanging the image data is provided, and a moving frame 201 is provided so as to be movable between the exposure station 1000 and the work station 2000. A guide roller 203 is provided at an upper end of the moving frame 201, and an upper guide rail 202 that receives the guide roller 203 and extends between the exposure station 1000 and the work station 2000 is provided.

On the other hand, at the lower end of the moving frame 201, a guide 204 is provided.
Exposure station 1000 and work station 2000
And is movably arranged by a ball screw 206.

The moving frame 201 is provided on its exposure light source side with a film photomask carrier 207 provided with a plurality of vacuum pads 208. On the back side of the film photomask carrier 207, the substrate 3 is mounted. A substrate carrier 209 for holding is provided.
The moving frame 201 is provided with a plurality of air cylinders 210 for moving the film photomask carrier 207 forward and backward with respect to the gauge plate 1. In addition,
The film photomask carrier 207 is a vacuum pad 2
The structure is not limited to the structure having 08, but may be a structure having a plurality of vacuum suction holes in a flat plate.

Next, referring to FIGS. 4 and 5, the structure of the vacuum suction device provided on the peripheral edge of the gauge plate 1 and the peripheral edge of the film photomask 2 will be described. FIG. 4 is a partially enlarged view of the area shown in FIG. 2B, and FIG. 5 is a partially enlarged view of the area shown in FIG. 1C.

Referring to both figures, a vacuum frame 303 is provided in the holding portion of gauge plate 1 of frame 11, and first vacuum suction holes 30 are provided inside vacuum frame 303.
4 and a first header 307 are provided at a predetermined pitch on the periphery of the gauge plate 1 as shown in the plan view of FIG. As described above, by providing the vacuum frame 303 having the first vacuum suction holes 304 in the peripheral portion of the gauge plate 1, it is possible to hold the film photomask 2 by the vacuum frame 303 when the film photomask 2 is attached or detached. Thus, the workability of attaching and detaching the film photomask 2 can be improved.

Further, the film photomask 2 can be closely fixed to the gauge plate 1 in a stretched state, so that the shape and size of the pattern of the film photomask 2 can be stabilized.

The contact portion of the gauge plate 1 with the vacuum frame 303 on the side opposite to the surface in contact with the film photomask 2 is provided with air during the vacuum suction of the film photomask 2 by the first vacuum suction holes 304. A seal member 306 for preventing leakage is provided over the entire circumference.

Although not shown, a similar sealing member is provided on the surface of the first vacuum suction hole 304 which is in contact with the film photomask 2 opposite to the sealing member 306, so that the vacuum suction is more reliably performed. The holes 304 allow the film photomask 2 to be vacuum-sucked.

Further, a plurality of vacuum blocks 301 having a plurality of second vacuum suction holes 302 for vacuum suction of the film photomask 2 are provided between the actuators 9. The vacuum frame 301 includes a vacuum frame 3
A second header 305 is provided in the same manner as in the third header. Thus, the second vacuum suction holes 302 are provided between the actuators 9.
By providing a plurality of vacuum blocks 301 having
The effect as shown in FIG. 8 can be obtained.

First, referring to FIG. 6, hooks 16 are inserted into slots 10 provided in the peripheral portion of film photomask 2.
When the hook 16 is held by the hook member 16a via the shaft 16b by the urging force of the spring 16c as shown in FIG. When the hook 16 is moved in the direction of arrow A in FIG. 6 in order to release the engagement of the hook 16, the film photomask 2 is strongly held by the hook 16 according to the conventional structure.
The film photomask 2 moves inward together with the hook 16, and the film photomask 2 is bent.

However, in the present embodiment, since the peripheral portion of the film photomask 2 is sucked by the second vacuum suction hole 302, the film of the hook 16 is opposed to the holding force of the spring 16c of the hook 16. Photo mask 2
Can be reliably released. Therefore, as shown in FIG. 7 and FIG.
It is possible to open the film photomask 2 from above, and it is possible to prevent the film photomask 2 from being damaged.

Here, referring again to FIG. 5, the mask XY
The structure of the Y-axis moving mechanism 14 of the θ drive mechanism 400 will be briefly described. Note that the X-axis direction moving mechanism 13 is the same as the Y-axis direction moving mechanism 14, and the description is omitted here. Further, the substrate XYθ driving mechanism 500 is the same as the mask XYθ driving mechanism 400, and thus detailed description is omitted.

The Y-axis direction moving mechanism 14 includes a roller 4 provided on a stage 15 on which the actuator 9 is mounted.
The linear slider 402 is provided slidably along a linear guide 403 provided on the frame 11. Further, the linear slider 402 is slidable in the Y-axis direction by the rotation of the ball screw 404.

In the above-described exposure apparatus, FIG.
As shown in FIG. 7, the mask XYθ driving mechanism 400 and the substrate X
The Yθ driving mechanism 500 is provided so as to be opposed to each other, but is not limited thereto.
As shown in (1), the same operation and effect can be obtained by further providing a frame 11A on the exposure light source side of the frame 11 and providing the substrate XYθ driving device 500 between the frames 11 and 11A.

As described above, in this embodiment, by providing the vacuum frame 303 having the vacuum suction holes 304 at the peripheral portion of the gauge plate 1, it is possible to hold the film photomask 2 by the vacuum frame 303, The workability of attaching and detaching 2 can be improved. Further, the film photomask 2 can be tightly fixed to the gauge plate 1 in a stretched state, and the shape and dimensions of the pattern of the film photomask 2 can be stabilized.

Further, at the contact portion of the gauge plate 1 with the vacuum frame 303 on the opposite side to the surface in contact with the film photomask 2, air leaks during vacuum suction of the film photomask 2 by the first vacuum suction holes 304. By providing the seal member 306 for preventing the occurrence of the problem, the film photomask 2 can be securely held, and the film photomask 2 can be more reliably held.

By providing a plurality of vacuum blocks 301 having a plurality of second vacuum suction holes 302 between the actuators 9, the hooks 1 provided on the actuators 9 are provided.
6 prevents the film photomask 2 from moving inward when the film photomask 2 is opened, thereby preventing the film photomask 2 from being damaged.

Further, a moving frame 201 for moving between the exposure station 1000 and the work station 2000 is provided. The moving frame 201 has a film photomask carrier 207 for exchanging the film photomask 2 and a substrate 3. By providing the substrate carrier 209 for exchanging the substrate, the efficiency of the operations for exchanging the film photomask 2 and exchanging the substrate 3 is improved, and the exposure apparatus can be automated.

It should be understood that the embodiments disclosed herein are illustrative in all aspects and not restrictive. For example, in FIG. 3, the work station 2000 is provided only on the left side of the exposure station 1000. However, by providing the work station also on the right side of the exposure station 1000, the substrate can flow from the left side to the right side. This makes it possible to configure an automated line for mounting / detaching the substrate of the exposure apparatus.

Therefore, the scope of the present invention is defined by the terms of the claims, rather than the description above, and is intended to include any modifications within the scope and meaning equivalent to the terms of the claims.

[Brief description of the drawings]

FIG. 1 is a longitudinal sectional view showing the structure of an exposure apparatus according to the present invention.

FIG. 2 is a view taken in the direction of arrows AA in FIG.

FIG. 3 is a view taken along line BB in FIG. 1;

FIG. 4 is a partially enlarged view of a region indicated by C in FIG. 1;

FIG. 5 is a partial enlarged view of a region indicated by B in FIG. 2;

FIG. 6 is a first diagram for explaining the operation and effect of the second vacuum device based on the present invention.

FIG. 7 is a second diagram for explaining the operation and effect of the second vacuum device based on the present invention.

FIG. 8 is a third diagram for explaining the operation and effect of the second vacuum device based on the present invention.

FIG. 9 is a longitudinal sectional view showing another embodiment of the exposure apparatus according to the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Gauge plate 2 Film photomask 3 Substrate 9 Actuator 10 Slot 11 Frame 13 X-axis direction moving mechanism 14 Y-axis direction moving mechanism 15 Stage 16 Hook 17 Substrate holder 19 Piston cylinder mechanism 20 Moving carrier 201 Moving frame 202 Upper guide rail 203 Guide Roller 204 Guide 205 Linear bearing 206 Ball screw 207 Film photomask carrier 208 Suction pad 209 Substrate carrier 210 Air cylinder 301 Vacuum block 302 Second vacuum suction hole 303 Vacuum frame 304 First vacuum suction hole 305 Second header 307 First header 306 Seal member 400 Mask XYθ drive mechanism 401 Roller 402 Linear slider 403 Linear guide 404 Ball screw 500 Substrate XYθ Dynamic mechanism

Claims (3)

[Claims] Irradiating a light beam emitted from an exposure light source to the photosensitive agent applied to the substrate surface through a film photomask arranged in contact with or in close proximity to the substrate coated with the photosensitive agent surface; An exposure apparatus for transferring the pattern of the film photomask onto the photosensitive agent, comprising: an exposure station for performing exposure processing of the substrate while holding the substrate substantially vertically; and A work station for exchanging a mask is provided; a gage plate holder for holding a transparent gage plate disposed opposite to the film photomask on the side of the exposure light source of the exposure station; In the above, the film photomask is connected to a plurality of long holes provided in the peripheral portion, A plurality of actuators for elastically extending the film photomask by applying a tensile force to the long holes, and an XYθ stage supporting the actuator and capable of moving the film photomask in the XYθ direction within the plane thereof And a substrate holder for holding the substrate in the exposure station, wherein a first vacuum for vacuum suction of the film photomask is provided on a contact surface of the gauge plate holder with the film photomask. A plurality of nozzles are provided, and a contact portion of the gauge plate with the gauge plate holder on a side opposite to a surface in contact with the film photomask is provided when the first vacuum nozzle vacuum-suctions the film photomask. An exposure apparatus provided with a seal member for preventing air leakage in the exposure apparatus. 2. The exposure apparatus according to claim 1, further comprising a plurality of second vacuum nozzles for vacuum suction of the film photomask between the plurality of actuators provided on the XYθ stage. 3. A moving carrier for moving between the exposure station and the work station, wherein the moving carrier exchanges the substrate with a film photomask carrier for exchanging the film photomask. 3. The exposure apparatus according to claim 1, wherein the exposure apparatus has two carriers, namely, a substrate carrier for use in the exposure.