JP2010019903A - Exposure apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To easily replace a photomask in an exposure apparatus. <P>SOLUTION: The exposure apparatus is equipped with a support base that reciprocally moves between an exposure station and a work station. The support base includes a center support region 21 supporting a center part of a photomask 4 and a rim support region 22 supporting a rim part of the photomask 4. The support base receives the photomask 4 on the center support region 21 and on the rim support region 22 at the work station and conveys the photomask 4 to the exposure station. The rim support region 22 has a concave 25 to avoid interference with a part 9 of a photomask support mechanism when the photomask 4 is moved to the exposure position. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention is an exposure apparatus that applies tension to a peripheral portion of a film-like photomask on which a pattern including alignment marks is drawn, and elastically deforms the photomask together with the pattern, thereby providing a photomask and a substrate. And an exposure apparatus for transferring a pattern to a substrate by exposure.

  An exposure apparatus of the type described above is known from Japanese Patent Laid-Open No. 7-49575. Such an exposure apparatus includes an exposure station, a work station, and a substrate support that can reciprocate between these stations.

  At the exposure station, a photomask is attached to the exposure position and tensioned by a photomask support mechanism. On the other hand, the substrate is arranged to face the photomask at the exposure position and aligned with the photomask. After alignment, exposure is performed with light from the light source.

  The work station is provided at a position separated from the exposure station. In the work station, an unexposed substrate is loaded onto a substrate support. The substrate is transferred to the exposure station by the substrate support, where it is aligned with the photomask and then exposed. The exposed substrate is transferred to the work station by the substrate support, where it is unloaded. A new unexposed substrate is loaded onto the substrate support and the above procedure is repeated.

  In an exposure apparatus of the type described above, exchanging the photomask is a difficult task. This is because a photomask support mechanism adapted to attach and apply a photomask includes a plurality of actuators, and it is necessary to remove a film-like photomask from these actuators and attach another photomask to the actuator. . Therefore, a special photomask exchange device may be separately prepared and used.

  There are two types of exposure apparatuses of the type described above, one that exposes the substrate and photomask horizontally and one that exposes vertically. In particular, in the case of a horizontal type, the photomask attached facing downward is exchanged, and the difficulty of work is further increased.

  SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to make it possible to easily replace a photomask simply by improving existing equipment without requiring a special photomask exchange apparatus.

According to the present invention,
A tension is applied to the peripheral portion of the film-like photomask on which a pattern including an alignment mark is drawn to elastically deform the photomask together with the pattern, thereby aligning the photomask and the substrate; An exposure apparatus for transferring the pattern onto the substrate by exposure,
At the exposure station, the photomask is attached to an exposure position by a photomask support mechanism and the tension is applied, and the substrate is arranged to face the photomask at the exposure position and the photomask. An exposure station that is aligned and then subjected to the exposure;
A work station provided at a position spaced from the exposure station;
A support that reciprocates between the exposure station and the work station;
With
The support is loaded with the unexposed substrate at the work station to carry the substrate to the exposure station, and carries the exposed substrate from the exposure station to the work station. In an exposure apparatus adapted to unload at the work station,
The support base includes a central support region capable of supporting the central portion of the photomask, and a peripheral support region capable of supporting the peripheral portion of the photomask,
The support table receives the photomask on the central support area and the peripheral support area at the work station, carries the photomask to the exposure station, and moves the photomask to the exposure position at the exposure station. It can be moved with
The peripheral support region includes a recess for avoiding interference with a part of the photomask support mechanism when the photomask is moved to the exposure position.
An exposure apparatus is provided.

  A plurality of elongated holes are formed in the peripheral portion of the photomask, the part of the photomask support mechanism is a plurality of hooks that engage with the plurality of elongated holes, and the recess is the It may be provided at a position aligned with the slot and receive a part of the hook.

  The peripheral support region may be formed separately from the central support region, and may be movable to a position retracted from the central support region.

  The peripheral support region may be formed by four rectangular members adjacent to the four sides of the central support region.

  The peripheral support region may be formed by two L-shaped members that surround the periphery of the central support region.

  The peripheral support region may be formed by a single frame-shaped member surrounding the periphery of the central support region.

  The central support region and the peripheral support region may be provided with a negative pressure suction hole or a negative pressure suction pad communicating with a negative pressure source for sucking and holding the photomask or the substrate.

  According to the exposure apparatus of the present invention, the photomask can be replaced easily and in a short time by improving the support table for transporting the substrate so that the photomask can also be transported. There is no need to separately prepare an expensive photomask exchange device. It is also possible to automate the exchange of the photomask.

  FIG. 1 is a side sectional view of an exposure apparatus according to the present invention. The internal space of the exposure apparatus housing 3 supported on the floor surface 2 via the level foot 1 is divided into an exposure station E and a work station W.

  In the exposure station E, a photomask support mechanism 5 for attaching the photomask 4 to the exposure position is disposed. The photomask support mechanism 5 includes a frame-shaped photomask support base 6, a transparent glass plate 7 held around the photomask support base 6, and a plurality of actuators 8 attached to the lower surface of the photomask support base 6. (See also FIG. 2). The telescopic rod of the actuator 8 which is a fluid pressure cylinder device forms a hook 9.

  As shown in FIG. 3, a plurality of long holes 10 are formed in the peripheral portion of the film-like photomask 4. As shown in FIGS. 1 and 2, when the hooks 9 are inserted into the long holes 10 and the actuator 8 is operated to retract the hooks 9, the hooks 9 are caught on the edges of the long holes 10. In this way, the photomask 4 is supported by the photomask support mechanism 5 while maintaining a flat surface by contacting the lower surface of the glass plate 7.

  By individually controlling the operations of the plurality of actuators 8, the tension applied to the peripheral edge of the photomask 4 can be changed along each side or locally. Accordingly, the size and shape of the pattern (including the alignment mark) drawn on the photomask 4 can be elastically changed, and the photomask 4 and the substrate 11 (FIG. 1) can be aligned with high accuracy.

  The photomask support base 6 has a camera 12 and a moving mechanism 13 for reading the alignment marks attached to the photomask 4 and the substrate 11, and the photomask 4 is moved in the XYθ direction with respect to the substrate 11. A mechanism (not shown) is often mounted.

  A guide rail 14 extends between the exposure station E and the work station W, and a support base 15 is mounted on the guide rail 14. The support table 15 can be moved between the exposure station E and the work station W by a drive mechanism (not shown).

  The conventional function of the support table 15 is to transfer the substrate 11 between the work station W and the exposure station E. The unexposed substrate 11 is loaded onto the support table 15 at the work station W and is carried to the exposure station E. The substrate 11 aligned with the photomask 4 at the exposure station E is exposed by light 16 from an upper light source (not shown), and a pattern drawn on the photomask 4 (the area is shown in FIGS. 2 and 3). (Indicated by a two-dot chain line denoted by reference numeral 17). The exposed substrate 11 is returned to the work station W by the support table 15 and unloaded there. Thereafter, a new unexposed substrate 11 is loaded onto the support base 15, and the exposure processing procedure is repeated.

  In the present invention, the support 15 is further provided with a photomask transport function. As a result, the support base 15 can be used for the replacement work of the photomask 4. As shown in FIGS. 4 and 5, the support base 15 in the exposure apparatus of the present invention includes a cylinder portion 18, a rod portion 19 assembled so as to expand and contract with respect to the cylinder portion 18, and a tip of the rod portion 19. An attached rectangular base plate 20, a table 21 fixed to the upper surface of the base plate 20 and having a rectangular shape slightly smaller than the base plate 20, an annular member 22 arranged so as to surround the table 21, and an annular member 22 and a plurality of drive mechanisms 23 attached to the base plate 20. The drive mechanism 23 is a fluid pressure cylinder device, and the tip of the extendable rod 23 a is fixed to the lower surface of the annular member 22.

  Under such a configuration, the table 21 and the annular member 22 move up and down synchronously by extending and contracting the rod portion 19. Moreover, the annular member 22 can be moved up and down independently of the table 21 by extending and contracting the rod 23a.

  In the embodiment shown in FIG. 5, the annular member 22 is a single frame-shaped member that surrounds the periphery of the table 21, but this is formed by four rectangular members adjacent to the four sides of the table 21. Also good. Alternatively, it may be formed by two L-shaped members surrounding the table 21. Furthermore, in another embodiment of the present invention, the table 21 and the annular member 22 can be integrated, and the drive mechanism 23 can be omitted.

  Conventionally, the table 21 functions as a support for the substrate 11, but in the present invention, as shown in FIGS. 4 and 5, the table 21 serves as a central support region capable of supporting the central portion of the photomask 4. Also works. On the other hand, the annular member 22 functions as a peripheral support region capable of supporting the peripheral portion of the photomask 4.

  In order to securely hold the central portion of the photomask 4 on the support base 15, a plurality of negative pressure suction holes (not shown) are provided on the surface of the table 21, and these suction holes serve as a negative pressure source. (Not shown). These suction holes function as means for sucking and holding the substrate 11 when the substrate 11 is transported. On the other hand, a plurality of suction pads 24 (FIG. 5) are provided on the surface of the annular member 22 in order to securely hold the peripheral edge of the photomask 4. The suction pad 24 is also communicated with another negative pressure source (not shown). The suction holes in the table 21 may be replaced with suction pads, and the suction pads 24 in the annular member 22 may be replaced with suction holes.

  As shown in FIG. 5, the annular member 22 is provided with a plurality of recesses 25. As can be seen from a comparison between FIG. 5 and FIG. 2, the recess 25 is provided at a position aligned with each of the long holes 10 formed in the peripheral edge of the photomask 4. The role of the recess 25 will be described later.

  A procedure for attaching and exchanging the photomask 4 in the exposure apparatus according to the present invention will be described. First, the photomask 4 is placed on the support table 15 at the work station W. The photomask 4 is placed in an accurately positioned manner so that each slot 10 at the peripheral edge is aligned with each recess 25 in the annular member 22. Positioning pins 26 (FIG. 5) that can engage with some of the elongated holes 10 in the photomask 4 may be provided on the annular member 22 to assist in the precise placement of the photomask 4. Since the positioning pin 26 finishes its role when the exact arrangement of the photomask 4 is determined, it may be configured to protrude when necessary and retracted at other times.

  Next, by operating the negative pressure source, negative pressure is applied to the suction holes on the table 21 and the suction pads 23 on the annular member 22, and the central portion of the photomask 4 is sucked and held on the table 21. Is adsorbed and held on the annular member 22. At this time, as shown in FIG. 4, adjustment by the drive mechanism 23 is performed so that the height of the upper surface of the annular member 22 matches the height of the upper surface of the table 21.

  The support table 15 holding the photomask 4 by suction moves from the work station W to the exposure station E. When the support table 15 stops at the exposure station E, the tip of the hook 9 at a position extending from each actuator 8 is positioned at the center of each slot 10 at the peripheral edge of the photomask 4 as shown in FIG. Thus, the stop position of the support base 15 is controlled.

  Next, the rod portion 19 (FIG. 4) of the support base 15 is extended to lift the base plate 20, and the photomask 4 is brought into contact with the lower surface of the glass plate 7 as shown in FIG. At this time, the tip of the hook 9 of the actuator 8 enters the long hole 10 of the photomask 4 and penetrates through it, but since the recess 25 is formed at a position aligned with the long hole 10, The tip portion does not interfere with the annular member 22.

  By operating the actuator 8 to retract the hook 9, the hook 9 is completely engaged with the edge of the long hole 10, and tension is applied to the photomask 4. In this manner, the photomask 4 is attached to the exposure position in a planar state by the photomask support mechanism 5 including the actuator 8. The lower surface of the inner peripheral edge of the frame-shaped photomask support base 6 may be flush with the lower surface of the glass plate 7, and a plurality of negative pressure suction holes 27 may be provided on the lower surface of the inner peripheral edge. By operating a negative pressure source (not shown) communicating with the suction hole 27 to hold the photomask 4 on the lower surface of the inner peripheral edge of the photomask support base 6, the photomask 4 is aligned with the glass plate 7. Guarantee that the flat state is maintained. The suction holding force by the negative pressure suction hole 27 is such that after the photomask 4 and the substrate 11 are aligned, the photomask 4 that is easily stretched due to the heat from the exposure is placed at an appropriate position along the glass plate 7. Plays a role to hold securely.

  Thereafter, the negative pressure suction on the lower surface of the photomask 4 is released, and the rod portion 19 of the support base 15 is retracted, whereby the table 21 and the annular member 22 are moved away from the photomask 4. Next, the support base 15 returns to the work station W to transport the substrate 11.

  It can be easily understood that when the photomask 4 is removed for replacement, the reverse of the above-described procedure may be performed.

  It will also be understood that the attachment, removal and transport of the photomask 4 can be easily automated.

  When exposure is performed after the photomask 4 is installed, the substrate 11 is transported between the work station W and the exposure station E by the support table 15, but this operation is not different from the conventional one, so that details will be described. Absent. However, since the substrate 11 is smaller than the photomask 4, the annular member 22 is not necessary when the substrate 11 is transported and exposed. Therefore, in order to completely eliminate the possibility that the upper surface of the annular member 22 that does not support the substrate 11 interferes with the lower surface of the photomask 4 during exposure, the support base 15 when handling the substrate 11 has The rod 23a may be shortened to move the annular member 22 to a position retracted from the table 21.

  The above-described embodiment has been described for the type in which the exposure is performed with the substrate and the photomask horizontal, but the present invention is also applicable to the type in which the exposure is performed with the substrate and the photomask vertical.

1 is a side sectional view of an embodiment of an exposure apparatus according to the present invention. The bottom view of the photomask attached to the exposure position by the photomask support mechanism. The top view of a photomask. The fragmentary side view which shows the support stand which mounted the photomask. The top view which shows the table and annular member of a support stand. The fragment cross-sectional side view which shows a mode just before a photomask is attached to a photomask support mechanism. The fragment cross-sectional side view which shows a mode immediately after a photomask was attached to the photomask support mechanism.

Explanation of symbols

1 level foot, 2 floor, 3 housing, 4 photomask, 5 photomask support mechanism, 6 photomask support base, 7 glass plate, 8 actuator, 9 hook, 10 long hole, 11 substrate, 12 camera, 13 camera Movement mechanism, 14 guide rail, 15 support base, 16 light, 17 patterns, 18 cylinder part, 19 rod part, 20 base plate, 21 table, 22 annular member, 23 drive mechanism, 23a drive mechanism rod, 24 suction pad, 25 recesses, 26 positioning pins, 27 suction holes, E exposure station, W work station.

Claims (7)

The photomask and the substrate are aligned by applying tension to the peripheral edge of the film-like photomask on which the pattern including the alignment mark is drawn, and elastically deforming the photomask together with the pattern. An exposure apparatus for transferring the pattern onto the substrate by exposure,
At an exposure station, the photomask is mounted at an exposure position by a photomask support mechanism and applied with the tension, and the substrate is disposed to face the photomask at the exposure position and the photomask. An exposure station that is aligned and then subjected to the exposure;
A work station provided at a position spaced from the exposure station;
A support that reciprocates between the exposure station and the work station;
With
The support is loaded with the unexposed substrate at the work station to carry the substrate to the exposure station, and carries the exposed substrate from the exposure station to the work station. In an exposure apparatus adapted to unload at the work station,
The support base includes a central support region capable of supporting the central portion of the photomask, and a peripheral support region capable of supporting the peripheral portion of the photomask,
The support table receives the photomask on the central support area and the peripheral support area at the work station, carries the photomask to the exposure station, and moves the photomask to the exposure position at the exposure station. It can be moved with
The peripheral support region includes a recess for avoiding interference with a part of the photomask support mechanism when the photomask is moved to the exposure position.
Exposure device. The exposure apparatus according to claim 1,
A plurality of elongated holes are formed in the peripheral portion of the photomask, the part of the photomask support mechanism is a plurality of hooks that engage with the plurality of elongated holes, and the recess is the An exposure apparatus provided at a position aligned with the elongated hole and adapted to receive a part of the hook. In the exposure apparatus according to claim 1 or 2,
The exposure apparatus according to claim 1, wherein the peripheral support region is formed separately from the central support region, and is movable to a position retracted from the central support region. In the exposure apparatus according to claim 3,
The exposure apparatus, wherein the peripheral support region is formed by four rectangular members that are respectively adjacent to the four sides of the central support region. In the exposure apparatus according to claim 3,
An exposure apparatus, wherein the peripheral support region is formed by two L-shaped members surrounding the periphery of the central support region. In the exposure apparatus according to claim 3,
An exposure apparatus, wherein the peripheral support region is formed by a single frame-shaped member surrounding the periphery of the central support region. In the exposure apparatus according to any one of claims 1 to 6,
An exposure apparatus, wherein a negative pressure suction hole or a negative pressure suction pad communicating with a negative pressure source for sucking and holding the photomask or the substrate is provided in the central support region and the peripheral support region.

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