JP2009168935A - Photomask to be used for exposure - Google Patents

Photomask to be used for exposure Download PDF

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Publication number
JP2009168935A
JP2009168935A JP2008004570A JP2008004570A JP2009168935A JP 2009168935 A JP2009168935 A JP 2009168935A JP 2008004570 A JP2008004570 A JP 2008004570A JP 2008004570 A JP2008004570 A JP 2008004570A JP 2009168935 A JP2009168935 A JP 2009168935A
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photomask
central portion
force transmission
force
pattern
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JP5022241B2 (en
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Toshihiro Takagi
俊博 高木
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San Ei Giken Inc
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San Ei Giken Inc
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Priority to JP2008004570A priority Critical patent/JP5022241B2/en
Priority to KR1020090001409A priority patent/KR101462074B1/en
Priority to CN2009100026496A priority patent/CN101482695B/en
Priority to TW098100641A priority patent/TWI447533B/en
Publication of JP2009168935A publication Critical patent/JP2009168935A/en
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/1336—Illuminating devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V17/00—Fastening of component parts of lighting devices, e.g. shades, globes, refractors, reflectors, filters, screens, grids or protective cages
    • F21V17/10—Fastening of component parts of lighting devices, e.g. shades, globes, refractors, reflectors, filters, screens, grids or protective cages characterised by specific fastening means or way of fastening
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/46—Fixing elements

Abstract

<P>PROBLEM TO BE SOLVED: To prepare a photomask by separately forming a center part where a pattern is drawn and a force transmission part in the periphery of the center part, followed by joining both parts to reduce the material cost and to avoid new capital investment. <P>SOLUTION: The photomask 1 is prepared by separately forming a center part 3 including a pattern display region 5 and a force transmission part 4 surrounding the outer circumference edge of the center part 3. Both parts are joined to each other with a pressure-sensitive adhesive tape 7. The force transmission part 4 includes a connecting part (hole) 8 to be linked to a force imparting means for elastically deforming the center part 3. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、フィルム状のフォトマスクの周縁に力を加えて該フォトマスクを弾性的に変形させることにより、該フォトマスク上に描かれた、複数の位置合わせマークを含むパターンの寸法および／または形状を変え、それによって前記フォトマスクと基板とを位置合わせした後、前記パターンを前記基板上に転写する露光方法に用いられるフォトマスクに関する。   According to the present invention, a dimension of a pattern including a plurality of alignment marks drawn on the photomask is applied by applying force to the periphery of the film-like photomask to elastically deform the photomask. The present invention relates to a photomask used in an exposure method in which a shape is changed, thereby aligning the photomask and a substrate, and then transferring the pattern onto the substrate.

上述した露光方法は、特許第３４０２６８１号に開示されている。その原理を図５および図６に基づいて説明する。図示するように、フォトマスク１０１の周囲には、フォトマスク１０１の周縁部に引っ張り力を与えるための複数のアクチュエータ１０２が力付与手段として設けられている。アクチュエータ１０２は、フォトマスク１０１を取り囲むようにしてベース部材１０３に取り付けられている。アクチュエータ１０２の可動端部１０４にはフック１０５が形成されている。   The above-described exposure method is disclosed in Japanese Patent No. 3,402,681. The principle will be described with reference to FIGS. As shown in the drawing, a plurality of actuators 102 for applying a pulling force to the peripheral portion of the photomask 101 are provided around the photomask 101 as force applying means. The actuator 102 is attached to the base member 103 so as to surround the photomask 101. A hook 105 is formed on the movable end 104 of the actuator 102.

一方、フォトマスク１０１の周縁部には複数の孔（長孔）１０６が形成されている。孔１０６は、アクチュエータ１０２のフック１０５を受け入れてこれと係合し、力付与手段としてのアクチュエータ１０２の引っ張り力をフォトマスク１０１に伝達する連結部を構成している。   On the other hand, a plurality of holes (long holes) 106 are formed in the peripheral portion of the photomask 101. The hole 106 constitutes a connecting portion that receives and engages the hook 105 of the actuator 102 and transmits the pulling force of the actuator 102 as force applying means to the photomask 101.

フォトマスク１０１の平面性を維持するための透明なガラス板１０７が、ベース部材１０３によって支持されている。
基板１０８がフォトマスク１０１に対向する位置に配置される。基板１０８は、基板支持部材１０９上に支持されており、フォトマスク１０１との間の間隙量を可変とされている。 A transparent glass plate 107 for maintaining the planarity of the photomask 101 is supported by the base member 103.
The substrate 108 is disposed at a position facing the photomask 101. The substrate 108 is supported on a substrate support member 109, and the amount of gap between the substrate 108 and the photomask 101 is variable.

フォトマスク１０１の、基板１０８と反対の側には、ＣＣＤカメラ１１０が配置されている。ＣＣＤカメラ１１０は、その位置を変えることができ、フォトマスク１０１上に描かれた位置合わせマーク１１１（図５）と基板１０８上に描かれた位置合わせマーク１１６（図８）とを同時に読みとることができる。なお、フォトマスク１０１上の位置合わせマーク１１１間のピッチは、基板１０８上の位置合わせマーク１１６間のピッチよりも若干小さくなるようになされている。   A CCD camera 110 is arranged on the side of the photomask 101 opposite to the substrate 108. The CCD camera 110 can change its position, and simultaneously reads the alignment mark 111 (FIG. 5) drawn on the photomask 101 and the alignment mark 116 (FIG. 8) drawn on the substrate. Can do. Note that the pitch between the alignment marks 111 on the photomask 101 is slightly smaller than the pitch between the alignment marks 116 on the substrate 108.

図５において二点鎖線Ｂで囲んだフォトマスク１０１の領域は、その中に位置合わせマーク１１１を含むパターンが描かれるところのパターン表示領域１１２として認識することができる。また、パターン表示領域１１２の周囲を取り囲むフォトマスク１０１の領域は、フォトマスク１０１を力付与手段としてのアクチュエータ１０２に連結して力を伝えるための領域である力伝達領域１１３として認識することができる。   In FIG. 5, the region of the photomask 101 surrounded by the two-dot chain line B can be recognized as a pattern display region 112 where a pattern including the alignment mark 111 is drawn. The area of the photomask 101 surrounding the pattern display area 112 can be recognized as a force transmission area 113 which is an area for transmitting the force by connecting the photomask 101 to an actuator 102 as a force applying unit. .

フォトマスク１０１と基板１０８とを位置合わせするには、まず、双方に描かれた位置合わせマークが重なった状態をＣＣＤカメラ１１０で読みとり、位置ずれ量のデータに基づいてフォトマスク１０１または基板１０８を移動させ、各位置合わせマークにおける位置ずれ量を平均化する。   In order to align the photomask 101 and the substrate 108, first, a state in which the alignment marks drawn on both sides are overlapped is read by the CCD camera 110, and the photomask 101 or the substrate 108 is determined based on the positional deviation amount data. The position shift amount at each alignment mark is averaged.

次いで、アクチュエータ１０２を作動させてフォトマスク１０１に引っ張り力を与えることにより、位置合わせマーク１１１を含むパターンの寸法および／または形状を変え、フォトマスク１０１の位置合わせマーク１１１と基板１０８の位置合わせマーク１１６とが高い精度で重なり合うようにする。   Next, the actuator 102 is operated to apply a pulling force to the photomask 101, thereby changing the size and / or shape of the pattern including the alignment mark 111, and the alignment mark 111 of the photomask 101 and the alignment mark of the substrate 108. 116 is overlapped with high accuracy.

このようにしてフォトマスク１０１と基板１０８との位置合わせが終了したならば、フォトマスク１０１を通して露光用の光１１４（図６）を基板１０８に照射し、フォトマスク１０１のパターン表示領域１１２内に描かれたパターンを基板１０８上に転写する。パターンは高い寸法精度および高い位置合わせ精度で基板１０８上に転写される。
特許第３４０２６８１号 When the alignment between the photomask 101 and the substrate 108 is completed in this manner, the exposure light 114 (FIG. 6) is irradiated to the substrate 108 through the photomask 101 and enters the pattern display region 112 of the photomask 101. The drawn pattern is transferred onto the substrate 108. The pattern is transferred onto the substrate 108 with high dimensional accuracy and high alignment accuracy.
Japanese Patent No. 3402682

上述した露光方法に用いられてきた従来のフォトマスクは、それ以前に用いられていたフォトマスクよりも必然的に大きかった。パターンが描かれるところのパターン表示領域１１２の周囲に、力伝達領域１１３を設ける必要があるからである。露光時にフォトマスクの外周縁を単に支持するだけであれば、パターン表示領域１１２の周囲に狭幅の「支持用領域」を設ければよい。しかし、力付与手段を連結するとなると、連結用の孔を形成する必要があるばかりでなく、個々のアクチュエータの引っ張り力によるフォトマスクの局所的歪みがパターンに直接影響しないようにするため、力伝達領域１１３の幅をかなり大きくとらなければならない。その結果、高価な材料から構成されるフォトマスクを大きくせざるを得なかった。   The conventional photomask that has been used for the above-described exposure method is necessarily larger than the photomask used before. This is because it is necessary to provide the force transmission region 113 around the pattern display region 112 where the pattern is drawn. If the outer peripheral edge of the photomask is simply supported at the time of exposure, a narrow “supporting region” may be provided around the pattern display region 112. However, when connecting the force applying means, not only is it necessary to form a hole for connection, but also force transmission to prevent local distortion of the photomask due to the pulling force of individual actuators from directly affecting the pattern. The width of the region 113 must be made quite large. As a result, a photomask made of an expensive material has to be enlarged.

従来のフォトマスク１０１の大きさとそれ以前のフォトマスクの大きさとを図７で比較してみる。二点鎖線Bで囲まれたパターン表示領域１１２の面積に対して、従来のフォトマスク１０１の面積は約２．６倍であるが、二点鎖線Cで示されるそれ以前のフォトマスクの面積はパターン表示領域１１２の約１．６倍だった。これは、パターン表示領域１１２の周囲の領域が、従来のフォトマスク１０１では大きな力伝達領域１１３とせざるを得ないのに対し、それ以前のフォトマスクでは小さな支持用領域１１５でよかったためである。   FIG. 7 compares the size of the conventional photomask 101 with the size of the previous photomask. The area of the conventional photomask 101 is approximately 2.6 times the area of the pattern display region 112 surrounded by the two-dot chain line B, but the area of the photomask before that indicated by the two-dot chain line C is It was about 1.6 times the pattern display area 112. This is because the area around the pattern display area 112 has to be a large force transmission area 113 in the conventional photomask 101, whereas a small support area 115 is sufficient in the previous photomask.

図８は、フォトマスクに対向して配置される基板１０８とその上に形成された位置合わせマーク１１６とを示す平面図である。フォトマスクと基板１０８とを位置合わせした後、フォトマスク上に描かれたパターンが露光によって基板１０８上に転写される。基板１０８に比べ、フォトマスク１０１は約２．５倍以上の大きさを有するが、その半分以上は高価なフォトマスク材料で作成される必要性のない力伝達領域１１３である。   FIG. 8 is a plan view showing the substrate 108 disposed facing the photomask and the alignment mark 116 formed thereon. After aligning the photomask and the substrate 108, the pattern drawn on the photomask is transferred onto the substrate 108 by exposure. The photomask 101 is about 2.5 times larger than the substrate 108, but more than half of the photomask 101 is a force transmission region 113 that does not need to be made of expensive photomask material.

フォトマスクが大きくなることによってもたらされる問題は、フォトマスク製作費の増大だけではない。大きなフォトマスクは現状のフォトマスク描画装置では対応できないのである。対応可能な描画装置を求めるために、新たな設備投資が必要となる。   The problem caused by the increase in the size of the photomask is not only the increase in the cost of manufacturing the photomask. Large photomasks cannot be handled by current photomask drawing apparatuses. In order to find a drawing device that can be used, new capital investment is required.

そこで本発明の課題は、力伝達領域を含む部分とパターン表示領域を含む中央部分とを別個に作成した後に接合してフォトマスクを形成することにより、材料費の低減および新たな設備投資の回避の可能性をもたらすことである。   Therefore, an object of the present invention is to reduce a material cost and avoid a new capital investment by separately forming a portion including a force transmission region and a central portion including a pattern display region and then bonding them to form a photomask. Is to bring about the possibility of

上記課題を解決するため、本発明によれば、
フィルム状のフォトマスクの周縁に力を加えて該フォトマスクを弾性的に変形させることにより、該フォトマスク上に描かれた、複数の位置合わせマークを含むパターンの寸法および／または形状を変え、それによって前記フォトマスクと基板とを位置合わせした後、前記パターンを前記基板上に転写する露光に用いられるフォトマスクであって、
前記パターンが描かれた中央部分と、
該中央部分とは別個に作成され、全体として前記中央部分の外周縁部を取り囲むように配置され且つ該中央部分の外周縁部に接合された力伝達部分にして、前記中央部分を弾性的に変形させるための力付与手段と連結するための連結部を有する力伝達部分と、
を備えてなるフォトマスクが提供される。 In order to solve the above problems, according to the present invention,
Changing the size and / or shape of a pattern including a plurality of alignment marks drawn on the photomask by elastically deforming the photomask by applying a force to the periphery of the film-like photomask; A photomask used for exposure to transfer the pattern onto the substrate after aligning the photomask and the substrate thereby,
A central portion on which the pattern is drawn;
The center portion is elastically formed by being made separately from the center portion and arranged as a whole so as to surround the outer peripheral edge of the central portion and joined to the outer peripheral edge of the central portion. A force transmitting portion having a connecting portion for connecting to a force applying means for deforming;
A photomask comprising: is provided.

前記力伝達部分を、前記中央部分の各辺ごとに個別に作成された複数の帯状部材からなるものとし、該帯状部材を前記中央部分の各辺ごとに接合することによりフォトマスクを形成してもよい。   The force transmission portion is composed of a plurality of band-shaped members individually created for each side of the central portion, and a photomask is formed by bonding the band-shaped member to each side of the central portion. Also good.

あるいはまた、前記力伝達部分を、単一の額縁状部材として作成し、該額縁状部材を前記中央部分に接合することによりフォトマスクを形成してもよい。
あるいはまた、前記力伝達部分を、前記中央部分の互いに隣接する２つの辺ごとに作成された一対のＬ字状部材からなるものとし、該一対のＬ字状部材を前記中央部分に接合することによりフォトマスクを形成してもよい。 Alternatively, the force transmission portion may be formed as a single frame-like member, and the photomask may be formed by joining the frame-like member to the central portion.
Alternatively, the force transmitting portion is composed of a pair of L-shaped members created for each two adjacent sides of the central portion, and the pair of L-shaped members are joined to the central portion. A photomask may be formed by.

前記中央部分および前記力伝達部は、互いの縁端面を対面させた状態で、該対面部の少なくとも片面側に粘着テープを貼ることにより互いに接合することができる。
前記連結部は、力付与手段としてのアクチュエータの可動端部に形成されたフックを掛けるための複数の孔を構成することができる。 The central portion and the force transmitting portion can be joined to each other by sticking an adhesive tape on at least one side of the facing portion with the edge surfaces facing each other.
The connecting portion may constitute a plurality of holes for hooking hooks formed on a movable end portion of an actuator as a force applying means.

前記力伝達部分は、前記中央部分を構成する材料と同等のヤング係数を有する材料で構成することができる。   The force transmission portion can be made of a material having a Young's modulus equivalent to that of the material constituting the central portion.

本発明のフォトマスクによれば、パターンが描かれる中央部分と、中央部分の周囲において、中央部分を弾性的に変形させる力を伝達する力伝達部分とが別個に作成されるので、力伝達部分を高価なフォトマスク材料で作る必要はなく、より安価な材料で構成することができる。それにより、高価なフォトマスク材料を使用する部分が少なくなり、フォトマスク全体としての製作費を低減させることができる。   According to the photomask of the present invention, since the central portion on which the pattern is drawn and the force transmitting portion that transmits the force that elastically deforms the central portion around the central portion are created separately, the force transmitting portion Need not be made of an expensive photomask material, but can be made of a less expensive material. As a result, the portion using expensive photomask material is reduced, and the manufacturing cost of the entire photomask can be reduced.

また、フォトマスクにパターンを描く場合には、力伝達部分とは分離した状態の中央部分のみを描画装置にセットすればよい。中央部分は現状の描画装置で対応できる大きさなので、新たな設備投資は必要ない。   When a pattern is drawn on the photomask, only the central portion separated from the force transmission portion may be set in the drawing apparatus. The center part is large enough to handle the current drawing equipment, so no new capital investment is required.

さらに、力伝達部分を、中央部分を構成する材料と同等のヤング係数を有する材料で構成した場合には、力伝達部分が中央部分と同じように伸びるので、２つの異なる部材を接合した構造であっても、全体として捩れたり歪んだりすることがない。   Furthermore, when the force transmission part is made of a material having a Young's modulus equivalent to that of the material constituting the central part, the force transmission part extends in the same manner as the central part. Even if it exists, it is not twisted or distorted as a whole.

図１は、本発明の一実施形態によるフォトマスク１の平面図である。フォトマスク１は、複数の位置合わせマーク２を含むパターンが描かれた中央部分３と、全体として中央部分３の外周縁部を取り囲むように配置された力伝達部分４とを備える。力伝達部分４は、中央部分３とは別個に作成される。   FIG. 1 is a plan view of a photomask 1 according to an embodiment of the present invention. The photomask 1 includes a central portion 3 on which a pattern including a plurality of alignment marks 2 is drawn, and a force transmission portion 4 arranged so as to surround the outer peripheral edge of the central portion 3 as a whole. The force transmission part 4 is created separately from the central part 3.

中央部分３は、二点鎖線Dで囲んだ領域、すなわち、その中にパターンが描かれるところのパターン表示領域５と、その周囲を取り囲む取り付け用領域６とに区分することができる。中央部分３は、従来のフォトマスクを形成する材料と同じまたは同等の材料で構成される。   The central portion 3 can be divided into a region surrounded by a two-dot chain line D, that is, a pattern display region 5 in which a pattern is drawn, and a mounting region 6 surrounding the periphery. The central portion 3 is made of the same or equivalent material as that for forming a conventional photomask.

この実施態様において、力伝達部分４は、図２に示すように、中央部分３の各辺ごとに個別に作成された４つの帯状部材４ａ−４ｄからなる。それぞれの帯状部材４ａ−４ｄは、中央部分３の各辺ごとに接合される。   In this embodiment, the force transmission portion 4 is composed of four belt-like members 4a to 4d individually created for each side of the central portion 3, as shown in FIG. Each strip-like member 4 a-4 d is joined to each side of the central portion 3.

接合に際しては、中央部分３の取り付け用領域６の外周縁端面とこれに対向する各帯状部材４ａ−４ｄの縁端面とを対面させた状態にし、双方の縁端面に沿って粘着テープ７（図１）を貼り付ける。粘着テープ７は、縁端面の対面部の片側面にのみ貼ってもよいし、両面に貼ってもよい。双方の縁端面は互いに接触させてもいいし、近接させるようにしてもよい。また、粘着テープ７に代えて、または、粘着テープ７とともに、中央部分３の取り付け用領域６の外周縁端面およびこれに対向する各帯状部材４ａ−４ｄの縁端面間に接着剤を塗布してもよい。他の適当な機械的接合手段を利用してもよい。接合寸法精度を高くするために、冶具を使用することが好ましい。   At the time of joining, the outer peripheral edge surface of the attachment region 6 of the central portion 3 and the edge surface of each strip member 4a-4d facing each other face each other, and the adhesive tape 7 (see FIG. 1) Paste. The adhesive tape 7 may be affixed only on one side of the facing part of the edge surface, or may be affixed on both sides. Both edge surfaces may be in contact with each other or may be close to each other. Moreover, it replaces with the adhesive tape 7, or with the adhesive tape 7, apply | coat an adhesive agent between the outer periphery edge surface of the attachment area | region 6 of the center part 3, and the edge end surface of each strip | belt-shaped member 4a-4d facing this. Also good. Other suitable mechanical joining means may be utilized. In order to increase the joining dimensional accuracy, it is preferable to use a jig.

各帯状部材４ａ−４ｄには、力付与手段としてのアクチュエータの可動端部に形成されたフック（図示せず）を掛けるための複数の孔（長孔）８が設けられている。これらの孔８は、中央部分３をその面内で弾性的に変形させるための力付与手段と連結するための連結部を構成する。   Each strip-like member 4a-4d is provided with a plurality of holes (long holes) 8 for hooking hooks (not shown) formed at the movable end of an actuator as force applying means. These holes 8 constitute a connecting portion for connecting the central portion 3 with force applying means for elastically deforming the central portion 3 within the plane.

他の連結部の態様としては、力付与手段の可動端部と互いに係合して力を伝達可能なように各帯状部材４ａ−４ｄに形成された凹凸形状部（図示せず）などを挙げることができる。   As another aspect of the connecting portion, an uneven shape portion (not shown) formed on each of the belt-like members 4a to 4d so as to be able to engage with the movable end portion of the force applying means and transmit force can be cited. be able to.

力伝達部分４にはパターンは描かれない。したがって、力伝達部分４を中央部分３と同じように高価なフォトマスク材料で構成する必要はない。より安価な材料を採用することができる。具体的には、中央部分３は通常のフォトマスク材料である、ＰＥＴ（ポリエチレンテレフタレート）に感光材を塗布したもので作成し、力伝達部分４は、感光材を塗布しない状態のＰＥＴで作成するとよい。両者のヤング率は実質的に同一なので、張力が加わったときに同じ伸び方をする。したがって、別部材を接合した構造であるにもかかわらず、引っ張ったときに捩れや歪みが生じない。なお、力伝達部分４に用いるＰＥＴ材は、感光材を塗布しなくてよいばかりでなく、中央部分３に用いるＰＥＴ材のように「無傷」を要求されないので、その点でも安価である。   No pattern is drawn on the force transmission portion 4. Therefore, the force transmission portion 4 does not need to be made of an expensive photomask material like the central portion 3. Less expensive materials can be employed. Specifically, the central portion 3 is made of a normal photomask material, PET (polyethylene terephthalate) coated with a photosensitive material, and the force transmission portion 4 is made of PET without applying the photosensitive material. Good. Since the Young's modulus of both is substantially the same, they are stretched the same when tension is applied. Therefore, although it is the structure which joined another member, when twisted, a twist and distortion do not arise. Note that the PET material used for the force transmission portion 4 does not need to be coated with a photosensitive material, and is not required to be “uninjured” unlike the PET material used for the central portion 3, and is also inexpensive in that respect.

図３は、本発明の別の実施形態によるフォトマスク１１の平面図である。フォトマスク１１は、複数の位置合わせマーク２を含むパターンが描かれた中央部分３と、全体として中央部分３の外周縁部を取り囲むように配置された力伝達部分１４とを備える。力伝達部分１４は、中央部分３とは別個に作成される。   FIG. 3 is a plan view of a photomask 11 according to another embodiment of the present invention. The photomask 11 includes a central portion 3 on which a pattern including a plurality of alignment marks 2 is drawn, and a force transmission portion 14 disposed so as to surround the outer peripheral edge of the central portion 3 as a whole. The force transmission part 14 is made separately from the central part 3.

この実施形態においては、力伝達部分１４は図４に示すように単一の額縁状部材として作成される。力伝達部分１４の内周縁部の寸法および形状は、力伝達部分１４と中央部分３とを合わせたときに、力伝達部分１４の内周縁部が画成する空間内に中央部分３の外周縁部がぴったりと嵌るように決められる。   In this embodiment, the force transmitting portion 14 is made as a single frame-like member as shown in FIG. The size and shape of the inner peripheral edge of the force transmitting portion 14 is such that when the force transmitting portion 14 and the central portion 3 are combined, the outer peripheral edge of the central portion 3 is within the space defined by the inner peripheral edge of the force transmitting portion 14. The part is determined to fit snugly.

図３に示すように、額縁状の力伝達部分１４の空間内に中央部分３が嵌るような状態とした後、粘着テープ７で力伝達部分１４および中央部分３の双方を互いに接合する。接合および力伝達部分１４を構成する材料については、図１および図２の実施形態に関して説明したように、さまざまな手段を選択することができる。   As shown in FIG. 3, after the state in which the central portion 3 is fitted in the space of the frame-shaped force transmitting portion 14, both the force transmitting portion 14 and the central portion 3 are joined to each other with the adhesive tape 7. Various materials can be selected for the material comprising the joint and force transmitting portion 14 as described with respect to the embodiment of FIGS.

さらに別の実施形態（図示せず）においては、力伝達部分が、中央部分の互いに隣接する２つの辺ごとに作成された一対のＬ字形部材からなる。一対のＬ字形部材は、互いに組み合わせることにより中央部分の外周縁部を取り囲むような寸法および形状とされる。力伝達部分と中央部分との接合および力伝達部分を構成する材料については、他の実施形態の場合と同様である。   In yet another embodiment (not shown), the force transmitting portion is composed of a pair of L-shaped members created on two adjacent sides of the central portion. The pair of L-shaped members are dimensioned and shaped so as to surround the outer peripheral edge of the central portion by being combined with each other. The joint between the force transmission portion and the central portion and the material constituting the force transmission portion are the same as in the other embodiments.

本発明の一実施形態によるフォトマスクの平面図。The top view of the photomask by one Embodiment of this invention. 図１のフォトマスクの構成要素を接合する前の状態を示す分解平面図。The exploded plan view which shows the state before joining the component of the photomask of FIG. 本発明の別の実施形態によるフォトマスクの平面図。The top view of the photomask by another embodiment of this invention. 図３のフォトマスクを形成する前の力伝達部分を示す分解平面図。FIG. 4 is an exploded plan view showing a force transmission portion before forming the photomask of FIG. 3. 従来のフォトマスクを力付与手段と組み合わせて示す平面図。The top view which shows the conventional photomask combined with force provision means. 図５のフォトマスクおよび力付与手段を基板とともに示す縦断面図であり、図５におけるＶＩ−ＶＩ矢視図に相当する。It is a longitudinal cross-sectional view which shows the photomask and force provision means of FIG. 5 with a board | substrate, and is equivalent to the VI-VI arrow line view in FIG. 従来のフォトマスクとそれ以前のフォトマスクの大きさを比較するための平面図。The top view for comparing the magnitude | size of the conventional photomask and the photomask before it. 基板をその上に描かれた位置合わせマークとともに示す平面図。The top view which shows a board | substrate with the alignment mark drawn on it.

符号の説明Explanation of symbols

１ フォトマスク、２ フォトマスクの位置合わせマーク、３ 中央部分、４ 力伝達部分、５ パターン表示領域、６ 取り付け用領域、７ 粘着テープ、８ 孔（連結部）、１１ フォトマスク、１４ 力伝達部分、１０１ フォトマスク、１０２ アクチュエータ（力付与手段）、１０３ ベース部材、１０４ 可動端部、１０５ フック、１０６ 孔、１０７ ガラス板、１０８ 基板、１０９ 基板支持部材、１１０ ＣＣＤカメラ、１１１ フォトマスクの位置合わせマーク、１１２ パターン表示領域、１１３ 力伝達領域、１１４ 光、１１５ 支持用領域、１１６ 基板の位置合わせマーク。 DESCRIPTION OF SYMBOLS 1 Photomask, 2 Photomask alignment mark, 3 Center part, 4 Force transmission part, 5 Pattern display area, 6 Attachment area, 7 Adhesive tape, 8 hole (connection part), 11 Photomask, 14 Force transmission part , 101 Photomask, 102 Actuator (force applying means), 103 Base member, 104 Movable end, 105 Hook, 106 Hole, 107 Glass plate, 108 Substrate, 109 Substrate support member, 110 CCD camera, 111 Photomask alignment Mark, 112 pattern display area, 113 force transmission area, 114 light, 115 support area, 116 substrate alignment mark.

Claims (7)

フィルム状のフォトマスクの周縁に力を加えて該フォトマスクを弾性的に変形させることにより、該フォトマスク上に描かれた、複数の位置合わせマークを含むパターンの寸法および／または形状を変え、それによって前記フォトマスクと基板とを位置合わせした後、前記パターンを前記基板上に転写する露光に用いられるフォトマスクであって、
前記パターンが描かれた中央部分と、
該中央部分とは別個に作成され、全体として前記中央部分の外周縁部を取り囲むように配置され且つ該中央部分の外周縁部に接合された力伝達部分にして、前記中央部分を弾性的に変形させるための力付与手段と連結するための連結部を有する力伝達部分と、
を備えてなるフォトマスク。 Changing the size and / or shape of a pattern including a plurality of alignment marks drawn on the photomask by applying force to the periphery of the film-like photomask to elastically deform the photomask; A photomask used for exposure to transfer the pattern onto the substrate after aligning the photomask and the substrate thereby,
A central portion on which the pattern is drawn;
The central portion is formed separately from the central portion, is arranged so as to surround the outer peripheral edge of the central portion as a whole, and is a force transmission portion joined to the outer peripheral edge of the central portion. A force transmitting portion having a connecting portion for connecting to a force applying means for deforming;
A photomask comprising: 請求項１に記載のフォトマスクにおいて、前記力伝達部分が、前記中央部分の各辺ごとに個別に作成された複数の帯状部材からなり、該帯状部材が前記中央部分の各辺ごとに接合されている、フォトマスク。   2. The photomask according to claim 1, wherein the force transmission portion includes a plurality of band-shaped members individually created for each side of the central portion, and the band-shaped member is bonded to each side of the central portion. A photomask. 請求項１に記載のフォトマスクにおいて、前記力伝達部分が、単一の額縁状部材として作成され、該額縁状部材が前記中央部分に接合されている、フォトマスク。   2. The photomask according to claim 1, wherein the force transmission portion is formed as a single frame-shaped member, and the frame-shaped member is joined to the central portion. 請求項１に記載のフォトマスクにおいて、前記力伝達部分が、前記中央部分の互いに隣接する２つの辺ごとに作成された一対のＬ字状部材からなり、該一対のＬ字状部材が前記中央部分に接合されている、フォトマスク。   2. The photomask according to claim 1, wherein the force transmission portion includes a pair of L-shaped members created for each two adjacent sides of the central portion, and the pair of L-shaped members is the center. A photomask bonded to the part. 請求項１ないし４のいずれかに記載のフォトマスクにおいて、前記中央部分および前記力伝達部は、互いの縁端面を対面させた状態で、該対面部の少なくとも片面側に粘着テープを貼ることにより互いに接合されている、フォトマスク。   5. The photomask according to claim 1, wherein the central portion and the force transmission portion are attached with an adhesive tape on at least one side of the facing portion in a state where the edge surfaces thereof face each other. Photomasks that are bonded together. 請求項１ないし５のいずれかに記載のフォトマスクにおいて、前記連結部が、力付与手段としてのアクチュエータの可動端部に形成されたフックを掛けるための複数の孔を構成している、フォトマスク。   6. The photomask according to claim 1, wherein the connecting portion forms a plurality of holes for hooking hooks formed on a movable end portion of an actuator as a force applying means. . 請求項１ないし６のいずれかに記載のフォトマスクにおいて、前記力伝達部分が、前記中央部分を構成する材料と同等のヤング係数を有する材料で構成されている、フォトマスク。   The photomask according to any one of claims 1 to 6, wherein the force transmission portion is made of a material having a Young's modulus equivalent to a material constituting the central portion.
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