TW200942800A - Device for measuring pattern length and method for measuring pattern length - Google Patents

Device for measuring pattern length and method for measuring pattern length

Info

Publication number
TW200942800A
TW200942800A TW098105962A TW98105962A TW200942800A TW 200942800 A TW200942800 A TW 200942800A TW 098105962 A TW098105962 A TW 098105962A TW 98105962 A TW98105962 A TW 98105962A TW 200942800 A TW200942800 A TW 200942800A
Authority
TW
Taiwan
Prior art keywords
pattern
edge
measurement areas
measurement
electron beam
Prior art date
Application number
TW098105962A
Other languages
English (en)
Other versions
TWI375786B (zh
Inventor
Jun Matsumoto
Yoshiaki Ogiso
Original Assignee
Advantest Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advantest Corp filed Critical Advantest Corp
Publication of TW200942800A publication Critical patent/TW200942800A/zh
Application granted granted Critical
Publication of TWI375786B publication Critical patent/TWI375786B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/222—Image processing arrangements associated with the tube
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G03F1/86—Inspecting by charged particle beam [CPB]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24571—Measurements of non-electric or non-magnetic variables
    • H01J2237/24578—Spatial variables, e.g. position, distance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24592—Inspection and quality control of devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2814—Measurement of surface topography
    • H01J2237/2816—Length
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2817—Pattern inspection

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
TW098105962A 2008-03-10 2009-02-25 Device for measuring pattern length and method for measuring pattern length TW200942800A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2008/054295 WO2009113149A1 (ja) 2008-03-10 2008-03-10 パターン測長装置及びパターン測長方法

Publications (2)

Publication Number Publication Date
TW200942800A true TW200942800A (en) 2009-10-16
TWI375786B TWI375786B (zh) 2012-11-01

Family

ID=41064831

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098105962A TW200942800A (en) 2008-03-10 2009-02-25 Device for measuring pattern length and method for measuring pattern length

Country Status (5)

Country Link
US (1) US8431895B2 (zh)
JP (1) JP5066252B2 (zh)
DE (1) DE112008003774T5 (zh)
TW (1) TW200942800A (zh)
WO (1) WO2009113149A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104428867A (zh) * 2012-07-16 2015-03-18 Fei公司 用于聚焦离子束处理的终点确定
CN112393681A (zh) * 2019-08-16 2021-02-23 西克Ivp股份公司 提供三维成像的图像数据中的强度峰值位置的方法和设备

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011052070A1 (ja) * 2009-10-30 2011-05-05 株式会社アドバンテスト パターン計測装置及びパターン計測方法
JP5236615B2 (ja) * 2009-11-17 2013-07-17 株式会社日立ハイテクノロジーズ エッジ部分検出方法、測長方法、荷電粒子線装置
JP5530980B2 (ja) * 2011-06-14 2014-06-25 株式会社アドバンテスト パターン測定装置及びパターン測定方法
JP5438741B2 (ja) * 2011-10-26 2014-03-12 株式会社アドバンテスト パターン測定装置及びパターン測定方法
JP6101445B2 (ja) * 2012-08-03 2017-03-22 株式会社日立ハイテクノロジーズ 信号処理装置及び荷電粒子線装置
US9589343B2 (en) * 2012-09-27 2017-03-07 Hitachi High-Technologies Corporation Pattern measurement device, evaluation method of polymer compounds used in self-assembly lithography, and computer program
WO2015045498A1 (ja) 2013-09-26 2015-04-02 株式会社 日立ハイテクノロジーズ 荷電粒子線装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6275206A (ja) * 1985-09-30 1987-04-07 Hitachi Ltd 電子ビ−ム測長装置
JP2647732B2 (ja) * 1990-06-27 1997-08-27 株式会社日立製作所 電子線寸法計測装置
JPH05296754A (ja) 1992-04-17 1993-11-09 Nikon Corp エッジ検出方法
JPH11201919A (ja) * 1998-01-16 1999-07-30 Toshiba Corp パターン検査装置およびその方法ならびにパターン検査処理プログラムを記録した記録媒体
US6326618B1 (en) * 1999-07-02 2001-12-04 Agere Systems Guardian Corp. Method of analyzing semiconductor surface with patterned feature using line width metrology
JP2002296761A (ja) * 2001-03-29 2002-10-09 Toshiba Corp パターン測定方法、及びパターン測定装置
JP4104934B2 (ja) * 2002-08-22 2008-06-18 株式会社トプコン 試料像測長方法及び試料像測長装置
JP4286657B2 (ja) * 2003-12-26 2009-07-01 株式会社日立ハイテクノロジーズ 走査電子顕微鏡を用いたライン・アンド・スペースパターンの測定方法
JP4262125B2 (ja) * 2004-03-26 2009-05-13 株式会社日立ハイテクノロジーズ パターン測定方法
WO2007094439A1 (ja) * 2006-02-17 2007-08-23 Hitachi High-Technologies Corporation 試料寸法検査・測定方法、及び試料寸法検査・測定装置
JP4834567B2 (ja) * 2006-03-29 2011-12-14 株式会社アドバンテスト パターン測定装置及びパターン測定方法
WO2008032387A1 (fr) * 2006-09-14 2008-03-20 Advantest Corporation Dispositif de mesure de dimension de motif et procédé de mesure de superficie de motif
US7791022B2 (en) * 2007-03-13 2010-09-07 Advantest Corp. Scanning electron microscope with length measurement function and dimension length measurement method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104428867A (zh) * 2012-07-16 2015-03-18 Fei公司 用于聚焦离子束处理的终点确定
TWI620226B (zh) * 2012-07-16 2018-04-01 Fei公司 用於聚焦離子束加工之方法及系統
CN104428867B (zh) * 2012-07-16 2018-10-16 Fei 公司 用于聚焦离子束处理的终点确定
US10204762B2 (en) 2012-07-16 2019-02-12 Fei Company Endpointing for focused ion beam processing
CN112393681A (zh) * 2019-08-16 2021-02-23 西克Ivp股份公司 提供三维成像的图像数据中的强度峰值位置的方法和设备
CN112393681B (zh) * 2019-08-16 2022-07-12 西克Ivp股份公司 提供三维成像的图像数据中的强度峰值位置的方法和设备

Also Published As

Publication number Publication date
JPWO2009113149A1 (ja) 2011-07-14
US8431895B2 (en) 2013-04-30
US20110049362A1 (en) 2011-03-03
WO2009113149A1 (ja) 2009-09-17
TWI375786B (zh) 2012-11-01
JP5066252B2 (ja) 2012-11-07
DE112008003774T5 (de) 2011-02-24

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees