TW200931208A - Alignment method and apparatus, lithographic apparatus, metrology apparatus and device manufacturing method - Google Patents

Alignment method and apparatus, lithographic apparatus, metrology apparatus and device manufacturing method Download PDF

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Publication number
TW200931208A
TW200931208A TW097139059A TW97139059A TW200931208A TW 200931208 A TW200931208 A TW 200931208A TW 097139059 A TW097139059 A TW 097139059A TW 97139059 A TW97139059 A TW 97139059A TW 200931208 A TW200931208 A TW 200931208A
Authority
TW
Taiwan
Prior art keywords
substrate
marker
objective lens
radiation
spectrum
Prior art date
Application number
TW097139059A
Other languages
English (en)
Chinese (zh)
Inventor
Everhardus Cornelis Mos
Boef Arie Jeffrey Den
Der Schaar Maurits Van
Stefan Carolus Jacobus Antonius Keij
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of TW200931208A publication Critical patent/TW200931208A/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
TW097139059A 2007-10-09 2008-10-09 Alignment method and apparatus, lithographic apparatus, metrology apparatus and device manufacturing method TW200931208A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US96064707P 2007-10-09 2007-10-09

Publications (1)

Publication Number Publication Date
TW200931208A true TW200931208A (en) 2009-07-16

Family

ID=40044017

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097139059A TW200931208A (en) 2007-10-09 2008-10-09 Alignment method and apparatus, lithographic apparatus, metrology apparatus and device manufacturing method

Country Status (8)

Country Link
US (1) US20090097008A1 (fr)
EP (1) EP2048542A2 (fr)
JP (1) JP2009094512A (fr)
KR (1) KR20090036527A (fr)
CN (1) CN101458458A (fr)
IL (1) IL194580A0 (fr)
SG (1) SG152147A1 (fr)
TW (1) TW200931208A (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI414131B (zh) * 2009-09-22 2013-11-01 Asml Netherlands Bv 致動器、定位系統及微影裝置
US10082740B2 (en) 2014-12-29 2018-09-25 Asml Holding N.V. Feedback control system of an alignment system

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2003414A (en) * 2008-10-07 2010-04-08 Asml Netherlands Bv Substrate measurement method and apparatus.
DE102010041556A1 (de) * 2010-09-28 2012-03-29 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Mikrolithographie und Verfahren zur mikrolithographischen Abbildung
NL2008111A (en) * 2011-02-18 2012-08-21 Asml Netherlands Bv Optical apparatus, method of scanning, lithographic apparatus and device manufacturing method.
CN102880018B (zh) * 2011-07-11 2015-03-25 上海微电子装备有限公司 用于对准系统的参考光栅空间像调整装置及调整方法
US9606442B2 (en) 2012-07-30 2017-03-28 Asml Netherlands B.V. Position measuring apparatus, position measuring method, lithographic apparatus and device manufacturing method
US9977349B2 (en) 2014-01-17 2018-05-22 Asml Netherlands B.V. Support device, lithographic apparatus and device manufacturing method
KR102294481B1 (ko) * 2014-12-24 2021-08-27 가부시키가이샤 니콘 이동체의 제어 방법, 노광 방법, 디바이스 제조 방법, 이동체 장치, 및 노광 장치
NL2016543A (en) * 2015-04-16 2016-10-19 Asml Holding Nv Method and apparatus for optical fiber connection.
WO2017036833A1 (fr) 2015-08-28 2017-03-09 Stichting Vu Capteur d'alignement d'appareil lithographique et procédé
JP6782769B2 (ja) * 2015-09-28 2020-11-11 エーエスエムエル ネザーランズ ビー．ブイ． ２次元又は３次元の形状の階層的表現
US10247940B2 (en) 2015-12-07 2019-04-02 Asml Holding N.V. Objective lens system
CN106933046B (zh) * 2015-12-30 2019-05-03 上海微电子装备（集团）股份有限公司 用于套刻误差检测的装置及测校方法
CN107340689B (zh) * 2016-02-29 2019-10-25 上海微电子装备（集团）股份有限公司 一种测量套刻误差的装置和方法
CN105954154A (zh) * 2016-04-28 2016-09-21 清华大学深圳研究生院 一种测量悬浮颗粒物的二维光散射角度分布的装置及方法
KR102536386B1 (ko) * 2016-12-14 2023-05-23 에이에스엠엘 네델란즈 비.브이. 광 디바이스 및 연관된 시스템
WO2018206177A1 (fr) * 2017-05-08 2018-11-15 Asml Netherlands B.V. Capteur de métrologie, appareil lithographique et procédé de fabrication de dispositifs
US10977361B2 (en) 2017-05-16 2021-04-13 Beyondtrust Software, Inc. Systems and methods for controlling privileged operations
GB2584018B (en) 2019-04-26 2022-04-13 Beyondtrust Software Inc Root-level application selective configuration
DE102020207566B4 (de) * 2020-06-18 2023-02-16 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zur Charakterisierung einer Maske für die Mikrolithographie
CN111913369B (zh) * 2020-08-24 2022-06-07 福建安芯半导体科技有限公司 一种步进式高精度光刻机

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US4639092A (en) * 1984-10-30 1987-01-27 Westinghouse Electric Corp. Acousto-optic dispersive light filter
JPS63185023A (ja) * 1987-01-28 1988-07-30 Canon Inc 露光装置
US5486923A (en) * 1992-05-05 1996-01-23 Microe Apparatus for detecting relative movement wherein a detecting means is positioned in the region of natural interference
US5477057A (en) * 1994-08-17 1995-12-19 Svg Lithography Systems, Inc. Off axis alignment system for scanning photolithography
US5706091A (en) * 1995-04-28 1998-01-06 Nikon Corporation Apparatus for detecting a mark pattern on a substrate
JPH08250391A (ja) * 1995-03-10 1996-09-27 Nikon Corp 位置検出用マーク及び位置検出方法
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JPH1050579A (ja) * 1996-08-06 1998-02-20 Nikon Corp 位置検出装置及び該装置を備えた露光装置
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US7317531B2 (en) * 2002-12-05 2008-01-08 Kla-Tencor Technologies Corporation Apparatus and methods for detecting overlay errors using scatterometry
TWI264620B (en) * 2003-03-07 2006-10-21 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7057779B2 (en) * 2003-05-21 2006-06-06 K Laser Technology, Inc. Holographic stereogram device
US7791727B2 (en) * 2004-08-16 2010-09-07 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
US20070002336A1 (en) * 2005-06-30 2007-01-04 Asml Netherlands B.V. Metrology apparatus, lithographic apparatus, process apparatus, metrology method and device manufacturing method
US7570358B2 (en) * 2007-03-30 2009-08-04 Asml Netherlands Bv Angularly resolved scatterometer, inspection method, lithographic apparatus, lithographic processing cell device manufacturing method and alignment sensor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI414131B (zh) * 2009-09-22 2013-11-01 Asml Netherlands Bv 致動器、定位系統及微影裝置
US10082740B2 (en) 2014-12-29 2018-09-25 Asml Holding N.V. Feedback control system of an alignment system

Also Published As

Publication number Publication date
CN101458458A (zh) 2009-06-17
SG152147A1 (en) 2009-05-29
KR20090036527A (ko) 2009-04-14
EP2048542A2 (fr) 2009-04-15
US20090097008A1 (en) 2009-04-16
JP2009094512A (ja) 2009-04-30
IL194580A0 (en) 2009-08-03

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