SG152147A1 - Alignment method and apparatus, lithographic apparatus, metrology apparatus and device manufacturing method - Google Patents

Alignment method and apparatus, lithographic apparatus, metrology apparatus and device manufacturing method

Info

Publication number
SG152147A1
SG152147A1 SG200807390-0A SG2008073900A SG152147A1 SG 152147 A1 SG152147 A1 SG 152147A1 SG 2008073900 A SG2008073900 A SG 2008073900A SG 152147 A1 SG152147 A1 SG 152147A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
metrology
alignment
lithographic
alignment method
Prior art date
Application number
SG200807390-0A
Other languages
English (en)
Inventor
Everhardus Cornelis Mos
Boef Arie Jeffrey Den
Der Schaar Maurits Van
Stefan Carolus Jacobus Antonius Keij
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG152147A1 publication Critical patent/SG152147A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
SG200807390-0A 2007-10-09 2008-10-06 Alignment method and apparatus, lithographic apparatus, metrology apparatus and device manufacturing method SG152147A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US96064707P 2007-10-09 2007-10-09

Publications (1)

Publication Number Publication Date
SG152147A1 true SG152147A1 (en) 2009-05-29

Family

ID=40044017

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200807390-0A SG152147A1 (en) 2007-10-09 2008-10-06 Alignment method and apparatus, lithographic apparatus, metrology apparatus and device manufacturing method

Country Status (8)

Country Link
US (1) US20090097008A1 (fr)
EP (1) EP2048542A2 (fr)
JP (1) JP2009094512A (fr)
KR (1) KR20090036527A (fr)
CN (1) CN101458458A (fr)
IL (1) IL194580A0 (fr)
SG (1) SG152147A1 (fr)
TW (1) TW200931208A (fr)

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NL2003414A (en) * 2008-10-07 2010-04-08 Asml Netherlands Bv Substrate measurement method and apparatus.
NL2005240A (en) * 2009-09-22 2011-03-23 Asml Netherlands Bv Actuator, positioning system and lithographic apparatus.
DE102010041556A1 (de) * 2010-09-28 2012-03-29 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Mikrolithographie und Verfahren zur mikrolithographischen Abbildung
NL2008111A (en) * 2011-02-18 2012-08-21 Asml Netherlands Bv Optical apparatus, method of scanning, lithographic apparatus and device manufacturing method.
CN102880018B (zh) * 2011-07-11 2015-03-25 上海微电子装备有限公司 用于对准系统的参考光栅空间像调整装置及调整方法
WO2014019846A2 (fr) 2012-07-30 2014-02-06 Asml Netherlands B.V. Appareil de mesure de positions, procédé de mesure de positions, appareil lithographique, et procédé de fabrication de dispositif
JP6307162B2 (ja) * 2014-01-17 2018-04-04 エーエスエムエル ネザーランズ ビー．ブイ． サポートデバイス、リソグラフィ装置及びデバイス製造方法
CN107615473B (zh) * 2014-12-24 2021-04-20 株式会社尼康 移动体的控制方法、曝光方法、器件制造方法、移动体装置及曝光装置
CN107111255B (zh) * 2014-12-29 2018-11-13 Asml控股股份有限公司 对准系统的反馈控制系统
NL2016543A (en) 2015-04-16 2016-10-19 Asml Holding Nv Method and apparatus for optical fiber connection.
KR102102242B1 (ko) * 2015-08-28 2020-04-21 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 정렬 센서 및 방법
JP6782769B2 (ja) * 2015-09-28 2020-11-11 エーエスエムエル ネザーランズ ビー．ブイ． ２次元又は３次元の形状の階層的表現
CN108292038B (zh) 2015-12-07 2021-01-15 Asml控股股份有限公司 物镜系统
CN106933046B (zh) * 2015-12-30 2019-05-03 上海微电子装备（集团）股份有限公司 用于套刻误差检测的装置及测校方法
CN107340689B (zh) * 2016-02-29 2019-10-25 上海微电子装备（集团）股份有限公司 一种测量套刻误差的装置和方法
CN105954154A (zh) * 2016-04-28 2016-09-21 清华大学深圳研究生院 一种测量悬浮颗粒物的二维光散射角度分布的装置及方法
WO2018108440A1 (fr) * 2016-12-14 2018-06-21 Asml Netherlands B.V. Dispositif optique et systèmes associés
US10788766B2 (en) * 2017-05-08 2020-09-29 Asml Netherlands B.V. Metrology sensor, lithographic apparatus and method for manufacturing devices
US10977361B2 (en) 2017-05-16 2021-04-13 Beyondtrust Software, Inc. Systems and methods for controlling privileged operations
GB2584018B (en) 2019-04-26 2022-04-13 Beyondtrust Software Inc Root-level application selective configuration
DE102020207566B4 (de) 2020-06-18 2023-02-16 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zur Charakterisierung einer Maske für die Mikrolithographie
CN111913369B (zh) * 2020-08-24 2022-06-07 福建安芯半导体科技有限公司 一种步进式高精度光刻机

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US7570358B2 (en) * 2007-03-30 2009-08-04 Asml Netherlands Bv Angularly resolved scatterometer, inspection method, lithographic apparatus, lithographic processing cell device manufacturing method and alignment sensor

Also Published As

Publication number Publication date
EP2048542A2 (fr) 2009-04-15
CN101458458A (zh) 2009-06-17
IL194580A0 (en) 2009-08-03
US20090097008A1 (en) 2009-04-16
KR20090036527A (ko) 2009-04-14
TW200931208A (en) 2009-07-16
JP2009094512A (ja) 2009-04-30

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