TW200924858A - Liquid material applying apparatus - Google Patents
Liquid material applying apparatus Download PDFInfo
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- TW200924858A TW200924858A TW097106432A TW97106432A TW200924858A TW 200924858 A TW200924858 A TW 200924858A TW 097106432 A TW097106432 A TW 097106432A TW 97106432 A TW97106432 A TW 97106432A TW 200924858 A TW200924858 A TW 200924858A
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- 239000011344 liquid material Substances 0.000 title abstract description 5
- 238000012360 testing method Methods 0.000 claims abstract description 286
- 239000000758 substrate Substances 0.000 claims abstract description 183
- 230000007246 mechanism Effects 0.000 claims abstract description 127
- 239000011347 resin Substances 0.000 claims abstract description 45
- 229920005989 resin Polymers 0.000 claims abstract description 45
- 238000001514 detection method Methods 0.000 claims abstract description 11
- 238000007599 discharging Methods 0.000 claims abstract description 4
- 238000000576 coating method Methods 0.000 claims description 260
- 239000011248 coating agent Substances 0.000 claims description 259
- 239000000463 material Substances 0.000 claims description 48
- 239000012530 fluid Substances 0.000 claims description 25
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- 238000005401 electroluminescence Methods 0.000 description 58
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- 238000001444 catalytic combustion detection Methods 0.000 description 22
- 230000005525 hole transport Effects 0.000 description 9
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- 238000010586 diagram Methods 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
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- 206010029412 Nightmare Diseases 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 206010008129 cerebral palsy Diseases 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
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- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- RHZWSUVWRRXEJF-UHFFFAOYSA-N indium tin Chemical compound [In].[Sn] RHZWSUVWRRXEJF-UHFFFAOYSA-N 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12044—OLED
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Coating Apparatus (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
200924858 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種對基板塗佈流動性材料之塗佈裝置 【先前技術】 習知,開發有-種利用有機EL(Electr。⑽咖⑽) 材料之有機EL顯示裝置,例如,在使用高分子有機乩材 料的主動矩陣(active matrix)驅動方式之有機此顯示裝 置的製造中,於玻璃基板(以下’僅稱之為「基板」)上依 序進行以下步驟:形成TFT(ThinFilmTransistGr)電路; 形成作為陽極之IT〇(Indium Tin Qxide)電極;形成間隔 壁;塗佈包含電洞輸送材料之流動性材料(以下,稱之為 「電洞輸送液」);利用加熱處理形成電洞輸送層;塗饰 包含有機EL材料之流動性材料(以下,稱為「有機乩 液」);利用加熱處理形成有機EL層;形成陰極;以及形 成絕緣膜來進行密封。 於有機EL冑示裝置之製造中,作為將電洞輸送液或有 機EL液塗佈於基板上之塗佈裝置之―,係如日本專利特 開2002-75640冑公報(文@ υ及日本專利㈣ 2003-10755號公報(文獻2)所示,使連續吐出流動性材料 之複數個噴嘴相對於基板進行相對移動,藉此在基板上塗 佈流動性材料。 α在上述文獻1及讀2之裝置中,使複數個嘴嘴於主掃 描方向上移動’並且每當喷嘴朝主掃描方向上移動時,便 使基板於副掃描方向上移動,藉此將流動性材料以條紋狀 97106432 6 200924858 塗佈於^/成在基板上之塗佈區域内的複數個間隔壁之間 的槽中。於上述文獻i及文獻2之塗佈裝置中,藉由保持 -構件將3個喷嘴-體保持著,並且以與基板垂直之支持轴 •為中心使該保持構件轉動,以減小3個喷嘴於副掃描方向 上之間距,而可使流動性材料之塗佈間距變窄。 另一方面,於日本專利特開2〇〇4_74〇5〇 3)中揭示-塗佈裝置,其係们個喷嘴於主掃描方向上: ❹動,並且每當喷嘴於主掃描方向上移動時,使基板於副掃 描方向上移動,藉此將流動性材料以條紋狀塗佈於形成在 基板上之塗佈區域内的複數間隔壁之間的槽中。在上述文 獻3之塗佈裝置中,朝設置在喷嘴與基板之間的遮罩 (mask)上塗佈有機EL液,並根據遮罩上的有機乩液之塗 佈軌跡以及基板上的槽之影像資料來修正基板之傾斜 度,以使噴嘴之主掃描方向與槽之延伸方向一致。 ,是,通常於上述裝置中,噴嘴之間距調整係藉由作業 ❹^員之手動作業而進行的,調整結果之確認亦藉由作業人 員直接觀察塗佈結果而進行的,故難以進行高精度之間距 f整’且調整所需之作業時間及勞力亦很大。又,在調整 月il之間距檢測時以及調整結果之確認時等的測試塗佈,有 時會在製品用之基板之非塗佈區域上進行,而當喷嘴數量 •較多時,測試塗佈所需之範圍會大於非塗佈區域之範圍, 因而無法進行喷嘴之間距調整。 【發明内容】 本七月係關於一種對基板塗佈流動性材料之塗佈裝 97106432 7 200924858 置,其目的在於,在不對基板塗佈流動性材料之情況下, 可咼精度地調整塗佈裝置之複數個喷嘴之間距。 ❹ 、本發明之塗佈裝置具備:基板保持部,用以保持基板; 複數個喷嘴’朝向上述基板之主面連續地吐出流動性材 料;喷嘴掃描機構’使上述複數個喷嘴在與上述基板之上 述主面平行的主掃描方向相對於上述基板進行相對移 動,同時每當朝上述主掃描方向移動時,使上述基板相對 於上述複數個㈣在與上述主面平行且與上述主掃描方 向垂直的副掃描方向進行相對移動;測試塗佈部,具有測 忒塗佈面,該測試塗佈面在未對上述基板進行塗佈時測試 塗佈來自上述複數個噴嘴之流動性材料;測試塗佈部進退 機構,使上述測試塗佈部在上述複數個喷嘴於上述主掃描 相對移動路徑進退,以使測試塗佈時的上述複數個 上述測試塗佈面之間的距離、及塗佈時的上述複數 上述基板之上述主面之間的距離相等;攝像部, ==複數個喷嘴於上述主掃描方向之相對移動而取 上述測試塗佈面的流動性材料之圖案之影像;間 個嘴嘴於上述副掃描方向象而檢測上述複數 满料加“ 1間距調整機構,對上述 塗佈面更拖:i述副掃描方向的間距進行調整;以及測試 ίΓΓΓ 上述賴塗佈部之上_試塗佈面更 動性材料之情況下,高精度地,敕滿2不對基板塗佈流 本發明之-較佳實施形態中== 喷嘴之間距。 r室佈裝置更具備:基板旋 97106432 8 200924858 轉機構,使上述基板保持部以與上述基板之上述主面垂直 的旋轉軸為中心旋轉;另一個攝像部,取得在上述主掃描 方向上與上述測試塗佈面分開設置的另一個測試塗佈面 • ^塗佈的流動性材料之圖案之影像;以及基板位置調整 部,根據由上述攝像部與上述另一個之攝像部所取得的流 動性材料之圖案之影像、以及由上述攝像部與上述另一個 f像所取得的上述基板之上述主面上之定位用記號之 影像,來控制上述喷嘴掃描機構及上述基板旋轉機構,藉 此調整上述基板相對於上述複數個喷嘴之相對位置。藉 此,可咼精度地進行基板之位置調整。 本發明之另-較佳實施形態中’上述測試塗佈部係保持 樹脂膠帶之一部分的膠帶保持部,上述測試塗佈面係上述 樹月曰膠帶之上述一部分之主面,上述測試塗佈面更換機構 具備將上述樹脂膠帶朝上述測試塗佈部送出之膠帶供給 ❹本發明之又-實施形態中,上述測試塗佈面係相對 動性材料中之霜濕性與上 、 兴上述基板之上述主面相同的測試 持部 上述測試塗佈部係保持上述測試片之測試片保 可參照隨附 上述目的及其他目的、特徵、態樣及優點 圖式,由以下本發明之詳細說明明白。 【實施方式】 圖1係表示本發明第i實施形態之塗佈裝 圖,圖2係塗佈梦罟^ 之俯視 裝置1之則視圖。塗佈裝置1係對平面顯 97106432 9 200924858 示裝置用之玻璃基板9(以下,僅稱之為「基板9」)塗佈 包含平面顯示裝置用之像素形成材料的流動性材料之裝 置。本實施形態中,塗佈裝置i係對主動矩陣驅動方式之 有機EL(Electro Luminescence)顯示裝置用之基板9塗 佈包含有機EL材料的流動性材料(以下,稱為「有機訌 如圖i及圖 土 7衣且1丹侑.丞扳保持部J J, ❹ 保持基板9 ;基板移動機構12,使基板保持部u在與基 板9之主面平行的既定方向(亦即,® 1中之Y方向,以 I 1?稱為掃柄方向」)上水平移動;以及基板旋轉機 二 保持部U以與基板9之主面垂直的旋轉 -、而旋轉。基板保持部u之内部具 器之加熱機構(省略圖示)。 令… 塗佈裝置1還具備:⑽相機13,係 2個攝像部;2個攝像部移動機構13am之200924858 IX. OBJECTS OF THE INVENTION: 1. Field of the Invention The present invention relates to a coating apparatus for coating a substrate with a fluid material. [Prior Art] It is known to develop an organic EL (Electr. (10) Coffee (10)) In the organic EL display device of the material, for example, in the manufacture of an organic active display device using a polymer organic germanium material, the glass substrate (hereinafter referred to as "substrate" only) is used. The following steps are performed: forming a TFT (ThinFilmTransistGr) circuit; forming an IT (Indium Tin Qxide) electrode as an anode; forming a partition; applying a fluid material including a hole transporting material (hereinafter, referred to as "hole transport" Liquid"); forming a hole transport layer by heat treatment; coating a fluid material containing an organic EL material (hereinafter referred to as "organic liquid"); forming an organic EL layer by heat treatment; forming a cathode; and forming an insulating film To seal. In the production of an organic EL display device, as a coating device for applying a hole transport liquid or an organic EL liquid to a substrate, it is disclosed in Japanese Patent Laid-Open Publication No. 2002-75640 (Japanese Patent No. 2002-75640) (4) As shown in Japanese Patent Publication No. 2003-10755 (Document 2), a plurality of nozzles for continuously discharging a fluid material are relatively moved with respect to a substrate, thereby applying a fluid material to the substrate. α is in the above documents 1 and 2 In the apparatus, the plurality of nozzles are moved in the main scanning direction and the substrate is moved in the sub-scanning direction whenever the nozzle moves in the main scanning direction, thereby coating the fluid material in a stripe shape 97106432 6 200924858 The film is placed in a groove between a plurality of partition walls in the coating region on the substrate. In the coating device of the above documents i and 2, the three nozzle bodies are held by the holding member. And the holding member is rotated around the support shaft perpendicular to the substrate to reduce the distance between the three nozzles in the sub-scanning direction, and the coating pitch of the fluid material can be narrowed. Japanese Patent Special 2〇 4_74〇5〇3) discloses a coating apparatus which has nozzles in the main scanning direction: swaying, and moving the substrate in the sub-scanning direction every time the nozzle moves in the main scanning direction, thereby The fluid material is applied in a stripe shape in a groove between the plurality of partition walls formed in the coated region on the substrate. In the coating apparatus of the above document 3, the organic EL liquid is applied onto a mask disposed between the nozzle and the substrate, and according to the coating trajectory of the organic sputum on the mask and the groove on the substrate The image data is used to correct the inclination of the substrate so that the main scanning direction of the nozzle coincides with the direction in which the groove extends. In the above-mentioned apparatus, the adjustment of the distance between the nozzles is performed by the manual operation of the operator, and the confirmation of the adjustment result is also performed by the worker directly observing the coating result, so that it is difficult to perform high precision. The distance between the work and the labor required for adjustment is also large. In addition, test coating such as when adjusting the interval between the month il and the confirmation of the adjustment result may be performed on the non-coated region of the substrate for the product, and when the number of nozzles is large, the test coating is performed. The required range is larger than the range of the non-coated area, so that the nozzle spacing adjustment cannot be performed. SUMMARY OF THE INVENTION This July is a coating apparatus for coating a substrate with a fluid material, the purpose of which is to accurately adjust the coating device without applying a fluid material to the substrate. The distance between the multiple nozzles. The coating apparatus of the present invention includes: a substrate holding portion for holding the substrate; a plurality of nozzles 'continuously discharging the fluid material toward the main surface of the substrate; and a nozzle scanning mechanism' for causing the plurality of nozzles to be in contact with the substrate The main scanning direction parallel to the main surface is relatively moved with respect to the substrate, and each time the substrate is moved in the main scanning direction, the substrate is parallel to the main surface and perpendicular to the main scanning direction with respect to the plurality of (4) The sub-scanning direction is relatively moved; the test coating portion has a test coating surface, and the test coated surface is tested for coating the fluid material from the plurality of nozzles when the substrate is not coated; the test coating portion The advancing and retracting mechanism causes the test coating unit to advance and retreat in the main scanning relative movement path in the plurality of nozzles so that the distance between the plurality of test coated surfaces at the time of test coating and the plural number at the time of coating The distance between the main faces of the substrate is equal; the imaging unit, == the relative movement of the plurality of nozzles in the main scanning direction And moving the image of the pattern of the fluid material of the test coated surface; detecting the plurality of full material plus the "pitch adjustment mechanism" between the mouths in the sub-scanning direction image, and dragging the coated surface Adjusting the pitch in the sub-scanning direction; and in the case of testing the above-mentioned coating-coated surface modifier material, the substrate is coated with high precision, and the substrate is not coated with the substrate. Medium == distance between the nozzles. The r-chamber device further includes: a substrate rotation 97106432 8 200924858 a rotation mechanism that rotates the substrate holding portion around a rotation axis perpendicular to the main surface of the substrate; and another imaging unit acquires An image of a pattern of another test coated surface that is disposed separately from the test coated surface in the main scanning direction, and a substrate position adjusting portion, according to the image capturing unit and the other image capturing unit a pattern of the pattern of the fluid material obtained by the portion, and a positioning mark on the main surface of the substrate obtained by the imaging unit and the other f-image And controlling the nozzle scanning mechanism and the substrate rotating mechanism to adjust a relative position of the substrate relative to the plurality of nozzles, thereby accurately adjusting a position of the substrate. Further preferred embodiment of the present invention In the embodiment, the test coating portion holds a tape holding portion of a part of the resin tape, the test coating surface is a main surface of the part of the tree-shaped enamel tape, and the test coated surface replacement mechanism includes the resin tape In the embodiment of the present invention, the test coating surface is the same as the test surface of the upper surface of the substrate, and the test coating surface is the same as the above-mentioned main surface of the substrate. The test coating section retains the test piece of the test piece described above with reference to the above-mentioned objects and other objects, features, aspects and advantages of the invention. [Embodiment] Fig. 1 is a view showing a coating package according to an i-th embodiment of the present invention, and Fig. 2 is a view showing a plan view of a device 1 for applying a nightmare. The coating apparatus 1 is a device for applying a fluid material including a pixel forming material for a flat display device to a glass substrate 9 (hereinafter simply referred to as "substrate 9") for a display device. In the present embodiment, the coating device i applies a fluid material containing an organic EL material to a substrate 9 for an active matrix driving type organic EL (Electro Luminescence) display device (hereinafter referred to as "organic germanium" and The soil 7 and the 1 侑 侑 保持 holding portion JJ, 保持 holding the substrate 9; the substrate moving mechanism 12, the substrate holding portion u is in a predetermined direction parallel to the main surface of the substrate 9 (that is, Y in the 1) The direction is shifted horizontally by I 1?, referred to as the sweeping direction"; and the substrate rotating machine 2 holding portion U is rotated by rotation perpendicular to the main surface of the substrate 9. The heating of the internal holder of the substrate holding portion u The apparatus (not shown). The coating apparatus 1 further includes: (10) a camera 13 and two imaging units; and two imaging unit moving mechanisms 13am.
相機13於副掃描方向 ^ 11 2個CCD β γ i 口上刀別進仃個別移動丨塗佈頭14, 係從複數個噴嘴17朝向基㈣ 側的主面(以下,稱為「μ矣品、ηι 丞极y之(+z) 之吐出機構.泠德、、表」)91連續吐出有機el液 出機構,塗佈頭移動機構15,使 個受液部16,在塗佈方向」)上水平移動;2 被設置於基板保持部n $移動方向(亦即,χ方向)上, 有機EL液,·以及間且:接來自塗佈頭14之 °機構3,對複數個喷嘴1 7於副 97106432 200924858 掃插方向上之間距加以調整。如圖丨 自塗佈頭14之右;、,、遇具備對來 《有機EL錢行測試㈣之測試 :二佈^置1具備對上述構成加以控制之控制部1〇。 連之:腦Γ,控制部10之構成係由以下各部分 ^而成.進仃各種運算處理之Gpu :記憶所執行之 _ 异處理之作業區域的RAM;記憶基本程式之 Ο 記憶各種資訊之固定磁碟;對作業人員顯干各種次 訊之顯示器;以及鍵盤及滑鼠等輸二 制部10之CPU等根據程式逸杆、軍笪♦圖3係表不控 及其他構成之方塊圖,圖3中:=1^實現之功能以 说 T之間距檢測部1 〇 1、蜩单嬙 基板位置調整糊相當於由C峨 月b再者’該等功能亦可由複數台電腦實現。The camera 13 advances the individual 丨 coating head 14 in the sub-scanning direction ^ 2 2 CCD β γ i ports, and faces the main surface from the plurality of nozzles 17 toward the base (four) side (hereinafter, referred to as "μ矣品, Ηι y y y (+z) discharge mechanism. 泠德,表表) 91 continuously discharges the organic el liquid discharge mechanism, and the coating head moving mechanism 15 causes the liquid receiving portion 16 to be in the coating direction") Horizontal movement; 2 is disposed in the substrate holding portion n $ moving direction (that is, the χ direction), the organic EL liquid, and the mechanism 3 connected from the coating head 14 to the plurality of nozzles 17 Sub 97106432 200924858 Adjust the distance between the sweeping directions. As shown in the figure, the right side of the coating head 14 is provided; and, in the case of the test of the organic EL money test (4), the second control unit 1 has a control unit 1 that controls the above configuration. Even the cerebral palsy, the structure of the control unit 10 is formed by the following parts. The Gpu of various arithmetic processing: the RAM of the work area executed by the memory _ different processing; the memory of the basic program 记忆 memory of various information a fixed disk; a display for the operator to display various secondary messages; and a CPU such as a keyboard and a mouse, etc., such as a CPU, etc., according to the program, the military, the military, and the other components. In Fig. 3, the function realized by =1^ is said to be the distance detection unit 1 〇1, 蜩 single 嫱 substrate position adjustment paste is equivalent to C 峨月b again, and the functions can also be realized by a plurality of computers.
方戶Γ之塗^頭14上,16個喷嘴17在圖1中之X ❹ 稍偏蔣f/i由主掃描方向)上分開排列成大致直線狀,並且 稍::们中之γ方向(亦即,副掃描方向)配置。本實施 鄰接之2個喷嘴17之間在副掃描方向上之距離, 延袖ΐ形成於基板9之塗佈區域上的在主掃描方向上 ::之間隔壁之間的間距(以下,稱為「間隔壁之間距」) 倍塗佈裝置i在未對基板9進行有機液之塗佈 :測=塗!單元2進行有㈣液之測試塗佈,並根 個哈峰17 果來控制間距調整機構3,藉此調整複數 娜L之間於副掃描方向上之距離。關於喷嘴17之間 距調整方法,於以下描述。 ® 4及圖5分㈣表示塗佈頭14之—部分的前視圖及 97106432 11 200924858 俯視圖。如圖4及圖5所示,塗佈頭14具備: 9之上二91(參照㈣連續吐出有機虹液之⑺個j 裝有該16㈣嘴之噴嘴安裝部⑷。噴嘴安 ㊁1?二具備:與Υ方向大致垂直之背板部14U、以及 …大致垂直之水平:Z(亦即,(-z)側之端部)且與 :::嘴17分別可移動地安裝於從水平部 ❹ 之邊_)方向(亦即,副掃描方向)延 匕) 喷嘴17之(勒置有噴嘴鎖定部Η心 貞疋噴觜17相對於喷嘴安裝部141之位置。 嘴之塗佈裝置1中’在16個喷嘴17固定於噴 =女^141上(參_ 4及圖5)之狀態下 續地吐出有機=,=== 复數個喷嘴17連 逯朝主掃描方向移動,且每當塗 ❹ Γ 2=掃描方向移動1次,則基板9由基 向 4進仃相對於基板9於主掃描方向及副掃插 :之相對移動’藉此將有機EL液以條紋狀塗佈於武 表面91上。塗佈裝置1之塗佈頭移動機構15 ί "移動機構12分別為喷嘴掃描機構,使16個喷嘴17 ==裝部141一起相對於基板9在主掃描方 描方向上進行相對移動。 ν =’塗佈裝置丨中’間距調整機構3在基板保持部u 之(+Χ)側與塗佈頭14個別地設置,16個喷嘴17及噴嘴 97106432 12 200924858 安裝部141(參照圖4及圖 動機構15之作用下,與間距2嘴掃描機構之塗佈頭移 換言之’間距調整機構3係:構3相獨立地移動。 14#目1 藉由噴嘴掃描機構使塗佈頭 •相對於基板9之相對移動相獨立地配置。 間距調整機構3具備與複數個 個(本實施形態中為16個)^固§嘴嘴17分別對應之複數 示問距娜Μ。 3整頭。圖6及圖7係分別表 之一裥尊瓸qn 、 調整碩中位於最靠近(-X)侧 之”周整頭30、以及塗佈頭 ❹視圖。® 6中,為求容易理解^一部分的俯視圖及左側 鎖定部173之圖- 解而省略圖4及圖5中的喷嘴 頊叱冲之圖不。又,圖 喷嘴安裝部141及嘴嘴17之_#易理解’顯示出 畆沾立丨二 0日 之 分的包含喷嘴17之中心 軸的剖面。間距調整機構3 完全相同。 械構3中,複數個調整頭30之構造 如圖6及圖7所示,姻敕 Q1 °周王頭3〇具備:安裝部固定機構 31,從(+Y)側及(_γ)侧將笛 微稱 Q1, , , Μ則將第1固定部311及第2固定部 c接於噴嘴安震部141之水平部ΐ4ΐ2上,以將喷嘴 女裝部141固定;喷嘴板接立 ^抵接部32’從(-γ)侧(亦即,副掃 田° 抵接於噴嘴17 ;喷嘴施壓機構33,使喷嘴 =喷嘴抵接部32相反侧(即,喷嘴17之⑼側喷: 接;“二之另—侧)對喷嘴抵接部32施壓;以及抵 °移動機構34 ’對由喷嘴施壓機構33施壓之噴嘴17 所抵接的喷嘴抵接部32於副掃描方向之位置加以調整。 間距調整機構3在喷嘴安梦邮】 — 31 1 , 裝。卩⑷被*裝部固定機構 疋# 311及第2固定部314夾持固定的狀態 97106432 13 924858 下,藉由鎖定部操作機構(省略 173(參照圖4及圖5)之鎖定 :)來解时嘴鎖定部 馬達⑽及連接於喷嘴施構=移動機構34之步進 332受到控制部i。之調整機構4二,333的氣缸 動。藉此,噴嘴抵接部32 愿〇2(參照圖3)之驅 別從⑼側及⑽側抵接於構%之桿331分 接部移動機構34之作用 喷嘴抵接部32在抵 ❾ 噴嘴施壓_ 33时嘴抵接部嘴17在 方向移動。接著,當喷嘴17移^=壓之狀態下,朝⑻ 用鎖定部操作機構來 而之距離後,再次利 喷嘴17之位置。173進行操作,以鎖定 侧==之塗佈裝置1中調整喷嘴之間距時,以從㈠) 個嘴嘴之m 將除基準喷嘴以外的其他15 ❹ 向上移動^^ * °然後,使該15個喷嘴丨7於副掃描方 #方嘴17之位置’以使各喷嘴17於副掃 與基準喷嘴間的距離成為既定距離。間距調整機 =所進㈣喷嘴π之位置調整(亦即,各喷嘴間距離之 下方法來進行:根據測試塗佈單元2進行測 、 機EL液之影像’藉由圖3所示之控制部1〇之 曰距檢測冑101而檢測出各喷嘴間距離,並根據該距離 ’、卩,根據間距檢測部1〇1之檢測結果),利用調整機構 空^ m來控制間距調整機構3之抵接部移動機構 34(參照圖6及圖7)。 97106432 200924858 如圖1所示,測試塗備留_ ^ f佈早70 2具備·· 2個測試塗佈平二 部21 ’設置於基板保持部11之⑼側,並配置成 、向上分開且…向上大致相同位置上;以及二: .在2個測試塗佈平台部21之間朝χ方向上延伸,: =兩端部固定於測試塗佈平台音"卜各測 21經由滑塊2】](參照圖8及圖9)而在Y方向上可移動地 安裝於基板移動機構12之執道121上,且經由連接部⑴ 而固定於基板保持部lljL。塗佈裝置1中基㈣持部 =基板rm冓12之作用下於γ方向上移動,而測試 塗佈早το 2亦與基板保持部u 一起在γ方向上移動。 圖8及圖9係分別表示(+Χ)侧之測試塗佈平台部21的 及^視、圖。圖8及圖9中亦一併描繪出基板移動 構 ^刀,圖9中亦一併描㈣中央受液部22之 =二為求方便圖示’圖8及圖9中描緣出測試塗 之外殼212之剖面(圖13及圖15中亦相同)。 ❹圖9中’亦描繪出樹脂膠帶213之剖面。塗佈裝置1中, 圖1所示的(-X)侧之測試塗佈平台部21亦具有與圖8及 圖9所不的⑽側之測試塗佈平台部21大致相同之構造。 如圖8及圖9所示,測試塗佈平台部2ι具傷:滑塊⑴, .可移動地安裝於基板移動機構12之執道121上;外殼 -212,固定於滑塊211 i ;樹脂膠帶213,其係進行有機 E L液之測試塗佈的測試塗佈構件;膠帶保持部叫,在外 殼212之上部對樹脂膠帶213之進行測試塗佈之部位加以 保持;膠帶供給部215,保持未使用之(亦即,未進行有 97106432 15 200924858 機EL液之測試塗佈之)捲狀的樹脂膠帶213,並且將該樹 脂膠帶213送出而供給至膠帶保持部214;以及膠帶回收 邛216,將經有機EL液測試塗佈之樹脂膠帶2丨3中的使 用儿的。P 7刀捲繞回收。本實施形態中,利用pps(聚苯硫 醚,Polyphenylene Sulfide)系之樹脂膠帶作為樹脂膠帶 213。 所不 刿试塗佈平台部21具備 如圖 · , w -I- ^丄穴调 · 1文修▼货 〇 广"15及膠帶回收部216旋轉之馬彡2171及堝輪 、:2、以及配置於膠帶保持部2U之(+x)側(在⑼側之 ,貝,试塗佈平台部21中,配置於膠帶保持部214之(-X)侧) ^外側受液部218,外側受液部218與配置在膠帶保持部 二It二)側(在Η)側之測試塗佈平台部21中,配置於 部214之㈤侧)的中央受液部22 一起,配置於 由膠帶保持部214所保持樹脂膠帶213 亦 即,(-Z)側)。 ^ 216則二塗:平台部21膠帶供給部215及膠帶回收部 刀別藉由馬達2171之驅動而以_ 8 + 既定之魚户…u㈣$動而以圖8中之逆時針旋轉 朝(+γ)方: ,於/帶保持部214中’樹脂膠帶213 吋)方向送出既定之長度,樹脂9lq + Α & 位於膠帶保持部214。如圖Λ膠帶213之未使用部分 θ . 戈圖8所不,測試塗佈平a邱91 具備感測器2151,其在膠帶供给Α σσΡ21 之問柃%世、σ σΡ 215與膠帶保持部214 又,:=膠帶供給部21以出之樹脂膠帶213之終端, 定量㈤收部216附近具備感測器216卜其檢測既 士脂膠帶213經膠帶回收部216之捲繞回收。’、 97106432 200924858 在圖8及圖9所示之測試塗佈平台部21中, 帶213之膠帶保持部214所保持的一部分⑽側之主面 成為測試塗佈由複數個喷嘴17(參照冑υ所吐 ❹ EL液的測試塗佈面213卜將樹脂膠帶213之上述一邱八 加以保持之膠帶保持部214成為具有測試塗佈面MM : 測試塗佈部。又,供給及回收樹脂膠帶213之膠帶供 215及膠帶时部216成為將測試塗佈部之測試塗;^ 2131更換成新的測試塗佈面之測試塗佈面更換機構。換 言之,測試塗佈單元2具備:於主掃描方向上分開設置之 2個測試塗佈面213卜以及將該2個測試塗佈面η”與 新的測試塗佈面個別更換之2個測試塗佈面更換機構。、 圖10係表示圖8及圖9所示之膠帶保持部214附近之 俯視圖。如圖8至圖1〇所示,膠帶保持部214具備:膠 帶吸附部214卜配置於樹脂膠帶213之(_ζ)侧(亦即,與 測試塗佈面2131相反側),i吸附樹脂膠帶213;膠帶按 麼部2U2,酉己置於樹脂膠帶213之⑽側(亦即,以與測 試塗佈面2131對向之方式配置),且朝向膠帶吸附部2⑷ 按廢樹脂膠帶213之測試塗佈面2131附近之部位;按壓 部升降機構2143,使膠帶按壓部2142於2方向上升降; 以及按壓部移動機構2144,使膠帶按壓部2142及按壓部 升降機構2143於Υ方向上移動。 膠帶吸附部2141具備保持樹轉帶213並且與基板保 持Ρ 11上之基板9之上表面91(參照圖υ平行的保持平 面2145 ’如圖10所示,膠帶按壓部2142具備在樹脂膠 97106432 200924858 帶213之測試塗佈面2131之(+γ)侧及(_γ)侧朝χ方向延 伸之2個爪部2146。圖8至圖10所示之膠帶保持部214 中,在按壓部升降機構2143之作用下,膠帶按壓部2142 .下降,而於膠帶吸附部2141上稍彎曲成朝(+Ζ)側凸起之 樹脂膠帶213係由2個爪部2146朝膠帶吸附部2141之伴 持平面2145上按壓。 ” 然後,使用膠帶吸附部2141來對樹脂膠帶2U進行真 空吸附,藉此樹脂膠帶213之測試塗佈面2131以平滑之 ❹狀態固定於膠帶吸附部2141之保持平面2145上,而與基 板9之上表面91(參照圖υ具有相同高度。測試塗佈平$ 部21中’膠帶吸附部2141及膠帶按壓部2142成為將樹 脂膠帶213之測試塗佈面2131加以固定之膠帶固定部。 在膠及附邛2141對樹脂膠帶213吸附之後,膠帶按壓 部2142藉由按壓部升降機構2143上升,與樹脂膠帶213 分開,並且藉由按壓部移動機構2144在(+Y)方向上移 ❹動’從測試塗佈面2131上退出。 八人對在基板9上進行有機el液塗佈之前的塗佈裝 置1之準備作業加以說明。塗佈裝置1之準備作業,係對 圖1所示之塗佈頭14的複數個喷嘴17於副掃描方向上的 間距(以下’稱為「喷嘴間距」)進行調整,並對基板9相 •對於喷嘴17之相對位置進行調整後,於基板9上塗佈有 機EL液。圖11A及圖UB係塗佈裝置i之準備作業( 喷嘴間距之調整及基板9之位置調整)之流程圖。 塗佈裝置1 _ ’首先’將基板保持部11自圖1所示之 97106432 18 200924858 之It、則向移動’而如圖12所示’測試塗佈單元2 17於二佈平台部21位於塗佈頭14之複數個噴嘴 對銘叙田方向上的移動路徑(亦即,相對於基板g之相 杰=之路控)下方之測試塗佈位置。此時,2個測試塗 佈=口部21分別位於2個咖相機13之下方(步驟s⑴。 置1中基板移動機構12成為測試塗佈部進退 機構’該測試塗佈部進退機構使測試塗佈單元2之2個測 j塗佈部即膠帶保持部214(參照圖8至圖⑻在複數個嘴 时Π於主掃描方向上之移動路徑上進I再者,測試塗 佈單元2未必與基板保持部丨丨一起移動,亦可藉由與基 板移動機構12相獨立地受到驅動之其他測試塗佈部進退 機構(例如,被设置於無桿式氣缸或基板移動機構12之執 道121上的其他移動件),而使測試塗佈單元2在複數個 喷嘴17於主掃描方向上之移動路徑上進退。 當測試塗佈單元2位於測試塗佈位置時,開始從塗佈頭 ❹14之複數個噴嘴17朝向(+χ)側之受液部16吐出有機El 液,並且驅動塗佈頭移動機構15使塗佈頭14開始移動。 然後,從複數個喷嘴17連續地吐出同一種有機EL液,並 且如圖12之一點鍵線所示,塗佈頭14在從()側之受液 '部16上朝(-X)側之受液部16上的主掃描方向上移動,由 *此於測試塗佈單元2之各測試塗佈平台部21上,由膠帶 保持部214所保持的樹脂膠帶213之測試塗佈面2131 (參 照圖8至圖1〇)上以條紋狀塗佈有機此液(步驟S12)。 此時,如上所述,樹脂膠帶213之測試塗佈面2131與 97106432 19 200924858 基板保持部11上之基板9之上表面91具有相同高度,故 z方向上的複數個喷嘴17與樹脂膠帶213之測試塗佈面 -2131之間的距離、及在基板9上進行有機EL液之塗 .的複數個喷嘴Π與基板9之上表面91之間的距離相等。 又,在2個測試塗佈平台部21之間,從喷嘴17吐出之有 機EL液由甲央受液部22承接,在各測試塗佈平台部η 之測試塗佈面2131與受液部16之間,有機此液由外侧 受液部218(參照圖9)承接。 ❹然後,使用CCD相機13來拍攝各測試塗佈平台 測試塗佈面213卜取得塗佈於測試塗佈面2131上°的有機 EL液之條紋狀圖案之影像,並傳送至控制部ι〇之間 測部101(參照圖3)(步驟S13)。 間距檢測部101根據由(+χ)側之⑽相機13所取得之 影像,找出有機EL液之各線之中心線,並檢__< 中心線間於副掃描方向上之各距離(亦即,副掃描方向上 〇相互鄰接的2個喷嘴17間之各距離),作為喷嘴間距(步 ⑷。再者’間距檢測部1Q1對嘴嘴間距之檢測可根 據由(-X)側之CCD相機13所取得之影像進行,且亦可根 據由2個CCD相機13分別取得之影像之雙方而進行 如,將根據兩影像所求得的喷嘴17之間距之平均值作為 然後’求出基準喷嘴即從(_x)侧起的第8個噴嘴17鱼 其他15個喷嘴17各自之間的距離,並根據預先設定之^ 嘴間距(如上所述,本實施形態中,係指等於間隔壁間距 97106432 20 200924858 之3倍的距離,以下,稱為「目標噴嘴間距」), 是否需要調整各喷嘴17之位置(步驟si 5)。當各啥確認 相對於基準喷嘴之相對位置為既定位置時,二嘴17 W判斷無需進行㈣位置之調整,而結束喷嘴=制部 整作業。 £之調 :反’當經判斷需要進行喷嘴位置之調整時 ,、侍的各喷嘴間距離,利用間距檢測部 ❹ 嘴以外的15個嘖嘴17f以下,r R出除基準噴 無為移動喷嘴」)於副掃 田向上之欲移動量(以下,僅稱為「移動量 J經判斷為15個移動喷嘴均需要進行喷嘴位置心的 情況加以說明。 用1置之調整的 嘴二7移中動量後’停止塗佈頭14吐出有機 機構之作Λ = 點鏈線所示,在塗佈頭移動 調整機構3對:之調^^^ ❹ 之各調整頭30上,利用圖f:然後,於間距調整機構3 構31之第i固〜"®及圖7所示之安裝部固定機 ⑼側來夾持‘:二及^2固定部314,從(-γ)側及 安裝部141加以固定: 之水平部1412 ’以將喷嘴 其次’使用各調整M q 動噴嘴之嘴嘴鎖定$ 鎖定部操作機構來解除各移 描方向可移動。:Ϊ :73之鎖定’而使各移動噴嘴在副掃 參照圖3),=,利用控制部1〇之調整機構控制部 中,作為間距調整機^與各移動噴嘴對應之調整頭3〇 之驅動部的抵接部移動機構34 97106432 21 200924858 之步進馬達343,並且喑嘴”/组丄 喷嘴抵接部32施靨夕f嘴在藉由嗔嘴施塵機構33對 求出的移動量…掃=’根據由間距檢測部1 〇 1所 移動嘴嘴於副::;^方向上移動(步驟则。當各 置再次被鎖定1 移動結束時,各移動喷嘴之位 直丹人被鎖疋部操作機 動喷嘴無需進行位[月敕=#者當經判斷15個移 除,且亦不時’該移動嗔嘴之鎖定不會被解 于、且亦不會朝副掃描方向上移動。 ❹ 其後,安裝部固定機構31之第1固定部3 定部314離開喷嘴安裝 1及第2固 頭14之噴嘴安装二2二之水平部⑷2 ’而使塗佈 用文衮。P 141之固定得以解除。 佈頭14朝⑽側之受液部16上 所不之塗 嘴17吐出有機EL液。 並開始從複數個噴 沾於塗佈裂置1中,根據由間距檢測部101所求出 的移動量,藉由除i個基 J丄01所求出 即,所有移動噴嘴)於副掃/卜的所有嘴嘴17(亦 貝再;於田丨J知描方向上之個 ❿ 嘴間距。本實施形態令,於12 動來調整喷 調整喷嘴間距。再者,塗佈裝置二:可;=内 Π均在副掃描方向上進行個卿動來調 固喷嘴 當移動喷嘴於副掃描方向上之移動結束:二間距二 單元2之各測試塗佈平台部21上,圖8至圖^式塗佈 帶吸附部2141對樹腊膠帶2U之吸附被解除斤::膠 ίο所示,在按部移動機構2144之作用下“如圖 2142朝(-Y)方向移動而位於膠帶吸附部2" 按壓部 著’藉由圖9所示馬達2171之驅動,圖8至圖1〇 :示^ 97106432 22 200924858 膠帶保持部214中的樹脂膠帶213朝( + γ)方向傳送既定之 長度,新的測試塗佈面2131位於膠帶吸附部2141上。 ❹ 其次,在按壓部升降機構2143之作用下,膠帶按壓部 2142下降並朝向膠帶吸附部2141按壓樹脂膠帶213,並 且在膠帶吸附部2141之作用下,樹脂膠帶213被吸附, 藉此測試塗佈面更換成新的測試塗佈面2131並固定於保 持平面襲上(步驟S152)。當樹脂膠帶213被吸附後,、 膠帶按壓部2142從測試塗佈面2131上退出。On the head 14 of the Fanghu ,, the 16 nozzles 17 are arranged in a substantially straight line in the X ❹ in FIG. 1 and slightly in the main scanning direction), and slightly: in the γ direction ( That is, the sub-scanning direction is configured. The distance between the two nozzles 17 adjacent to the present embodiment in the sub-scanning direction, and the spacing between the partition walls in the main scanning direction formed on the coated region of the substrate 9 (hereinafter referred to as "Interval between partitions") The coating device i does not apply the organic liquid to the substrate 9: measurement = coating! The unit 2 performs the test coating of the (iv) liquid, and controls the pitch adjustment mechanism 3 by the root peaks 17, thereby adjusting the distance between the complex numbers L in the sub-scanning direction. The method of adjusting the pitch of the nozzles 17 is described below. ® 4 and Figure 5 (4) show a front view of a portion of the coating head 14 and a top view of 97106432 11 200924858. As shown in Fig. 4 and Fig. 5, the coating head 14 is provided with: 9 on the 9th (refer to (4) (7) continuous discharge of the organic rainbow liquid (7) j nozzle mounting portion (4) with the 16 (four) nozzle. The nozzle safety 2: 2 has: A level substantially perpendicular to the back plate portion 14U and the direction substantially perpendicular to the Υ direction: Z (that is, an end portion on the (-z) side) and a::: the nozzle 17 are movably attached to the horizontal portion The direction of the side _) (that is, the sub-scanning direction) is delayed. The position of the nozzle 17 (the nozzle locking portion Η 贞疋 17 is positioned relative to the nozzle mounting portion 141. 16 nozzles 17 are fixed on the spray = female ^ 141 (see _ 4 and Fig. 5) and continue to squirt organic =, === a plurality of nozzles 17 are moved in the main scanning direction, and each time ❹ Γ 2 = When the scanning direction is moved once, the substrate 9 is moved in the main scanning direction and the sub-sweeping relative to the substrate 9 from the base 4, and the organic EL liquid is applied to the surface 91 in a stripe shape. The coating head moving mechanism 15 of the cloth device 1 ί " the moving mechanism 12 is a nozzle scanning mechanism, respectively, so that 16 nozzles 17 == the mounting portion 141 together with the substrate 9 in the main sweep Relative movement in the square direction. ν = 'Coating device ' 'The pitch adjustment mechanism 3 is provided separately from the coating head 14 on the (+Χ) side of the substrate holding portion u, 16 nozzles 17 and nozzles 97106432 12 200924858 With the mounting portion 141 (refer to FIG. 4 and the moving mechanism 15 as described above, the coating head of the nozzle scanning mechanism of the pitch 2 is shifted, in other words, the pitch adjusting mechanism 3 is moved independently of the structure 3. 14#目1 is scanned by the nozzle The mechanism arranges the coating heads independently of the relative movement of the substrate 9. The pitch adjusting mechanism 3 is provided with a plurality of (respectively 16 in the present embodiment) and a plurality of mouths 17 corresponding to each other.整. 3 The whole head. Figure 6 and Figure 7 are the ones of the table, the top of the week, and the top of the coating head, which is located on the closest (-X) side. In order to facilitate understanding of a part of the top view and the view of the left side lock portion 173, the nozzle smear diagrams in FIGS. 4 and 5 are omitted. Moreover, the nozzle mount portion 141 and the nozzle 17 are easy to understand. 'Shows the section containing the central axis of the nozzle 17 on the twentieth day. The adjustment mechanism 3 is identical. In the mechanism 3, the structure of the plurality of adjustment heads 30 is as shown in Fig. 6 and Fig. 7, and the wedding 敕Q1 ° 周王头3〇 has: the mounting portion fixing mechanism 31, from the (+Y) side And (_γ) side, the flute is called Q1, and then the first fixing portion 311 and the second fixing portion c are connected to the horizontal portion ΐ4ΐ2 of the nozzle amphetrating portion 141 to fix the nozzle dressing portion 141; The plate abutting portion 32' is abutted from the (-γ) side (that is, the sub-sweeping area a is in contact with the nozzle 17; the nozzle pressing mechanism 33 is such that the nozzle = the opposite side of the nozzle abutting portion 32 (i.e., the nozzle 17) (9) side spray: connection; "two other sides" pressurizing the nozzle abutting portion 32; and abutting movement mechanism 34' abutting portion of the nozzle abutting against the nozzle 17 pressed by the nozzle pressing mechanism 33 32 is adjusted in the position of the sub-scanning direction. The spacing adjustment mechanism 3 in the nozzle An Mengmail] — 31 1 , loaded. The 卩(4) is fixed by the tying portion fixing mechanism 疋#311 and the second fixing portion 314 in a state of 97106432 13 924858, and is locked by the locking portion operating mechanism (the 173 (see FIGS. 4 and 5) is omitted). The timepiece lock motor (10) and the step 332 connected to the nozzle construction = moving mechanism 34 are received by the control unit i. The adjustment mechanism 4, 333 cylinders move. Thereby, the nozzle abutting portion 32 (see FIG. 3) is abutted against the (9) side and the (10) side from the (9) side and the (10) side, and the acting nozzle abutting portion 32 of the tapping portion moving mechanism 34 is abutting the nozzle. When the pressure _ 33 is applied, the mouth abutting portion mouth 17 moves in the direction. Next, when the nozzle 17 is moved to the pressure, the position of the nozzle 17 is again obtained by the distance of the locking portion operating mechanism toward (8). 173, when the nozzle spacing is adjusted in the coating device 1 with the locking side ==, the other 15 以外 other than the reference nozzle is moved upward from (m) the nozzle m, and then the 15 The nozzles 7 are positioned at the position of the sub-scanning side #方嘴 17 so that the distance between each of the nozzles 17 and the reference nozzle becomes a predetermined distance. Pitch adjustment machine = position adjustment of the (four) nozzle π (that is, the method is performed under the distance between the nozzles: the image of the EL liquid is measured according to the test coating unit 2) by the control unit shown in FIG. The distance detecting nozzle 101 detects the distance between the nozzles, and based on the distance ', 卩, according to the detection result of the spacing detecting unit 1〇1, the adjustment mechanism is used to control the offset of the pitch adjusting mechanism 3. The joint moving mechanism 34 (see FIGS. 6 and 7). 97106432 200924858 As shown in Fig. 1, the test coating is left _ ^ f cloth early 70 2 equipped with two test coating flat portions 21 ' on the (9) side of the substrate holding portion 11 and arranged to be separated upwards and ... Upwardly at the same position; and two: . extending between the two test coating platform sections 21 in the direction of the ,, : = both ends are fixed to the test coating platform sound " each test 21 via the slider 2] (see FIGS. 8 and 9), it is movably attached to the path 121 of the substrate moving mechanism 12 in the Y direction, and is fixed to the substrate holding portion 11jL via the connecting portion (1). In the coating apparatus 1, the base (four) holding portion = the substrate rm 冓 12 is moved in the γ direction, and the test coating early τ 2 is also moved in the γ direction together with the substrate holding portion u. Fig. 8 and Fig. 9 show the test coating platform portion 21 on the (+Χ) side, respectively. 8 and FIG. 9 also depict the substrate moving structure, and FIG. 9 also shows (4) the central liquid receiving portion 22 = two for convenience. 'Figure 8 and FIG. 9 depicting the test coating The cross section of the outer casing 212 (the same is true in Figs. 13 and 15). Also shown in Fig. 9 is a cross section of the resin tape 213. In the coating apparatus 1, the test coating stage portion 21 on the (-X) side shown in Fig. 1 also has substantially the same structure as the test coating stage portion 21 on the (10) side of Figs. 8 and 9 . As shown in FIG. 8 and FIG. 9, the test coating platform portion 2 ι is wounded: the slider (1), is movably mounted on the road 121 of the substrate moving mechanism 12; the outer casing - 212 is fixed to the slider 211 i; The tape 213 is a test coating member for performing test coating of an organic EL liquid; the tape holding portion is held at a portion where the resin tape 213 is tested and coated on the upper portion of the outer casing 212; the tape supply portion 215 is kept unmaintained. The roll of the resin tape 213 is used (that is, the test coating of the EL liquid of 97106432 15 200924858 is not applied), and the resin tape 213 is sent out and supplied to the tape holding portion 214; and the tape recovery 邛 216, The use of the coated resin tape 2丨3 was tested by an organic EL liquid. P 7 knife winding recovery. In the present embodiment, a pps (Polyphenylene Sulfide) resin tape is used as the resin tape 213. The coating platform unit 21 is provided with a horse, a horse, a horse, a horse, a horse, a horse, a horse, a horse, a horse, a horse, a horse, a horse, a horse, a horse, a horse, a horse, a horse. And disposed on the (+x) side of the tape holding portion 2U (on the (9) side, in the test coating platform portion 21, disposed on the (-X) side of the tape holding portion 214), the outer liquid receiving portion 218, and the outer side The liquid receiving portion 218 and the central liquid receiving portion 22 disposed on the (five) side of the portion 214 of the test coating platform portion 21 disposed on the side of the tape holding portion (the second side) are disposed by the tape. The resin tape 213 held by the portion 214 is also the (-Z) side. ^ 216 Second coating: the plate portion 21 tape supply portion 215 and the tape collecting portion knife are driven by the motor 2171 to rotate counterclockwise in Fig. 8 by _ 8 + a predetermined fish... u (four) $ movement (+ γ) side: The predetermined length is sent in the direction of the 'resin tape 213 于' in the tape holding portion 214, and the resin 9lq + Α & is located in the tape holding portion 214. As shown in Fig. 8 , the unused portion θ of the tape 213 is not provided. The test coating layer A 91 has a sensor 2151 which is supplied to the tape supply ΑσσΡ21, σ σ 215 and the tape holding portion 214. Further, the tape supply unit 21 is provided with a sensor 216 in the vicinity of the (5) receiving portion 216, and the tape is collected by the tape collecting portion 216. ', 97106432 200924858 In the test coating platform portion 21 shown in Figs. 8 and 9, the main surface of the portion (10) side held by the tape holding portion 214 of the belt 213 is subjected to test coating by a plurality of nozzles 17 (refer to 胄υ The test coated surface 213 of the spouted EL liquid is provided with the test coated surface MM: the test coated portion 214 which holds the above-mentioned one of the resin tape 213. Further, the resin tape 213 is supplied and recovered. The tape supply portion 216 and the tape portion 216 become the test coated surface replacement mechanism for testing the test coating portion; 2131 is replaced with a new test coated surface. In other words, the test coating unit 2 is provided in the main scanning direction. Two test coated surfaces 213 and two test coated surface replacement mechanisms for separately replacing the two test coated surfaces η" with the new test coated surface. FIG. 10 shows FIG. 8 and FIG. A plan view of the vicinity of the tape holding portion 214 shown in Fig. 9. As shown in Fig. 8 to Fig. 1A, the tape holding portion 214 includes a tape suction portion 214 disposed on the (_ζ) side of the resin tape 213 (that is, with the test coating) The opposite side of the cloth surface 2131), i adsorption resin glue 213; the tape is placed on the (10) side of the resin tape 213 (that is, disposed opposite to the test coated surface 2131), and is coated with the waste resin tape 213 toward the tape adsorption portion 2 (4). a portion near the cloth surface 2131; a pressing portion elevating mechanism 2143 that elevates and lowers the tape pressing portion 2142 in two directions; and a pressing portion moving mechanism 2144 that moves the tape pressing portion 2142 and the pressing portion elevating mechanism 2143 in the z-direction. The portion 2141 is provided with a top surface 91 of the substrate 9 on which the tree transfer belt 213 is held and held on the substrate 11 (see the holding plane 2145' parallel to the drawing). As shown in FIG. 10, the tape pressing portion 2142 is provided with a resin adhesive 97106432 200924858. The two claw portions 2146 extending in the χ direction on the (+γ) side and the (_γ) side of the test coated surface 2131. The tape holding portion 214 shown in Figs. 8 to 10 functions as a pressing portion lifting mechanism 2143. Then, the tape pressing portion 2142 is lowered, and the resin tape 213 slightly curved toward the (+Ζ) side on the tape suction portion 2141 is pressed by the two claw portions 2146 toward the accompanying plane 2145 of the tape suction portion 2141. ” Then, use tape The adhesive portion 2141 vacuum-adsorbs the resin tape 2U, whereby the test coated surface 2131 of the resin tape 213 is fixed to the holding plane 2145 of the tape suction portion 2141 in a smooth state, and the upper surface 91 of the substrate 9 (refer to The tape coating portion 2141 and the tape pressing portion 2142 in the test coating unit 21 are tape fixing portions for fixing the test coated surface 2131 of the resin tape 213. After the glue and the attachment 2141 are adsorbed to the resin tape 213, the tape pressing portion 2142 is lifted by the pressing portion lifting mechanism 2143, separated from the resin tape 213, and moved by the pressing portion moving mechanism 2144 in the (+Y) direction. 'Exit from test coated surface 2131. The preparation work of the coating device 1 before the organic EL liquid coating on the substrate 9 will be described by eight persons. The preparation operation of the coating device 1 adjusts the pitch (hereinafter referred to as "nozzle pitch") of the plurality of nozzles 17 of the coating head 14 shown in Fig. 1 in the sub-scanning direction, and the substrate 9 is After the relative position of the nozzle 17 is adjusted, the organic EL liquid is applied onto the substrate 9. Fig. 11A and Fig. UB are flowcharts showing the preparation work (adjustment of the nozzle pitch and position adjustment of the substrate 9) of the coating device i. The coating device 1_'firstly' moves the substrate holding portion 11 from the It of 97106432 18 200924858 shown in Fig. 1 to the 'moving' and the test coating unit 2 17 is placed on the second cloth platform portion 21 as shown in Fig. 12 The number of nozzles of the cloth head 14 is the test coating position below the moving path in the direction of the field (i.e., relative to the substrate g of the substrate g). At this time, the two test coatings = the mouth portion 21 are respectively located below the two coffee cameras 13 (step s (1). In the first step, the substrate moving mechanism 12 becomes the test coating portion advance and retreat mechanism". The tape holding portion 214 which is the two measuring portions of the cloth unit 2 (see FIGS. 8 to 8 ) is in the moving path in the main scanning direction at the time of the plurality of nozzles, and the test coating unit 2 does not necessarily The substrate holding portion 丨丨 moves together, and may be driven by another test coating portion advancing and retracting mechanism independently of the substrate moving mechanism 12 (for example, disposed on the stem 121 of the rodless cylinder or substrate moving mechanism 12) The other moving member) causes the test coating unit 2 to advance and retreat in the moving path of the plurality of nozzles 17 in the main scanning direction. When the test coating unit 2 is located at the test coating position, the plural from the coating head 14 is started. The nozzles 17 discharge the organic El liquid toward the liquid receiving portion 16 on the (+χ) side, and drive the coating head moving mechanism 15 to start the movement of the coating head 14. Then, the same organic EL liquid is continuously discharged from the plurality of nozzles 17 And as shown in Figure 12 As shown by the key line, the coating head 14 is moved in the main scanning direction on the liquid-receiving portion 16 on the (-X) side from the liquid receiving portion 16 on the () side, and is applied to the test coating unit 2 The test coating surface 2131 (see FIGS. 8 to 1A) of the resin tape 213 held by the tape holding portion 214 is applied to the test coating platform portion 21 in a stripe shape to apply the organic liquid (step S12). At this time, as described above, the test coated surface 2131 of the resin tape 213 has the same height as the upper surface 91 of the substrate 9 on the substrate holding portion 11 of the 97106432 19 200924858, so the test of the plurality of nozzles 17 and the resin tape 213 in the z direction is performed. The distance between the coated surfaces - 2131 and the number of nozzles 进行 coated with the organic EL liquid on the substrate 9 is equal to the distance between the upper surface 91 of the substrate 9. Further, in the two test coating platforms Between 21, the organic EL liquid discharged from the nozzle 17 is received by the central liquid receiving portion 22, and between the test coating surface 2131 and the liquid receiving portion 16 of each test coating platform portion η, the organic liquid is externally received by the liquid. The portion 218 (see Fig. 9) is taken up. Then, the CCD camera 13 is used to photograph each test coating platform test coated surface 213. The image of the striped pattern of the organic EL liquid applied on the test coated surface 2131 is obtained and transmitted to the control unit ι (see FIG. 3) (step S13). The pitch detecting unit 101 is based on (+χ) side (10) The image obtained by the camera 13 finds the center line of each line of the organic EL liquid, and checks the distance between the center lines in the sub-scanning direction (ie, the sub-scanning direction). The distance between the two nozzles 17 adjacent to each other is used as the nozzle pitch (step (4). Further, the detection of the nozzle pitch by the pitch detecting unit 1Q1 can be performed based on the image obtained by the CCD camera 13 on the (-X) side. Further, based on the two images obtained by the two CCD cameras 13, the average value of the distance between the nozzles 17 obtained from the two images may be used as the reference nozzle, that is, from the (_x) side. The distance between the other 15 nozzles 17 of the 8th nozzle 17 and according to the preset nozzle spacing (as described above, in the present embodiment, the distance is equal to 3 times the spacing of the partition walls 97106432 20 200924858) , hereinafter, referred to as "target nozzle pitch"), It is necessary to adjust the position of each nozzle 17 (step si 5). When it is confirmed that the relative position with respect to the reference nozzle is a predetermined position, the two nozzles 17 W judge that it is not necessary to perform the adjustment of the (four) position, and the nozzle = the whole part is completed. Adjustment of £: When it is judged that it is necessary to adjust the nozzle position, the distance between the nozzles of the waiter is 15 or less than the 15 nozzles other than the nozzle of the pitch detecting unit, and the R R is removed from the reference nozzle. The amount of movement required to move up in the sub-sweeping field (hereinafter, it is only referred to as "the amount of movement J is judged to be that the nozzle position center is required for each of the 15 moving nozzles. After the 'stopping of the coating head 14 to discharge the organic mechanism Λ = as indicated by the dotted line, on the respective adjustment heads 30 of the coating head movement adjustment mechanism 3: The mounting mechanism fixing unit (9) of the pitch adjusting mechanism 3 is configured to hold the ':2 and 2 fixing portions 314, and the mounting portion 141 is provided from the (-γ) side and the mounting portion 141. Fixing: The horizontal portion 1412' is used to move the nozzle next to each of the adjustment Mq moving nozzles to lock the locking portion operating mechanism to release the respective moving directions. (Ϊ: 73 locking 'and the moving nozzles are The sub-scan refers to FIG. 3), and the control unit 1 is used as the control unit. The stepping motor 343 of the abutting portion moving mechanism 34 97106432 21 200924858 of the adjusting portion of the adjusting head 3 corresponding to each moving nozzle, and the nozzle"/group nozzle abutting portion 32 The amount of movement obtained by the grin dusting mechanism 33 is swept = 'moving in the direction of the sub-::;^ according to the movement of the nozzle by the pitch detecting unit 1 (1 (steps. When each set is locked again) 1 At the end of the movement, the position of each moving nozzle is directly locked by the mandible. The maneuvering nozzle does not need to be in place. [月敕=#When judged by 15 removal, and from time to time, the movement of the mouth is not locked. The solution is removed and does not move in the sub-scanning direction. ❹ Thereafter, the first fixing portion 3 of the mounting portion fixing mechanism 31 is separated from the nozzle mounting 1 and the nozzle 2 of the second solid head 14 The horizontal portion (4) 2' is used to release the coating. The fixing of the P 141 is released. The cloth head 14 discharges the organic EL liquid from the nozzles 17 which are not on the liquid receiving portion 16 on the (10) side, and starts to apply from a plurality of sprays. In the cloth splitting 1, the movement amount obtained by the pitch detecting unit 101 is divided by i bases J丄01. Immediately, all the moving nozzles are in the mouths of all the nozzles of the sub-sweeping/spans (also in the direction of the nozzles in the direction of the drawing). In this embodiment, the nozzles are adjusted to adjust the nozzle spacing. Furthermore, the coating device 2: can be; = the inner helium is in the sub-scanning direction to perform a clear motion to adjust the nozzle when the moving nozzle moves in the sub-scanning direction: the two-pitch two unit 2 test coating On the platform portion 21, the adsorption of the wax-coated tape 2U of the coating belt 2141 of FIG. 8 to FIG. 2 is released by the action of the pressing mechanism 2144, as shown in FIG. 2142 (- Y) is moved in the direction of the tape suction portion 2" the pressing portion is driven by the motor 2171 shown in Fig. 9, and Fig. 8 to Fig. 1 shows the resin tape 213 in the tape holding portion 214 toward (+) The γ) direction is transmitted for a predetermined length, and a new test coated surface 2131 is placed on the tape adsorption portion 2141. Next, under the action of the pressing portion elevating mechanism 2143, the tape pressing portion 2142 is lowered and the resin tape 213 is pressed toward the tape suction portion 2141, and the resin tape 213 is adsorbed by the tape suction portion 2141, thereby testing the coating. The surface is replaced with a new test coated surface 2131 and fixed to the holding plane (step S152). After the resin tape 213 is adsorbed, the tape pressing portion 2142 is withdrawn from the test coated surface 2131.
將測試塗佈面2131更換後,返回至步驟⑽,塗佈頭 14 -邊從複數個喷嘴17吐出有機EL =動,在測試塗佈單元2之2個測試塗佈面2131上塗= 液(步驟S12)。接著’藉由⑽相機13而取得測 上之有機此液之圖案影像,並利用間距檢 行再抑 彳喷嘴間距’以確認是否需要时嘴位置進 ==:S13〜S15)。然後,反覆進行以下動作, =1:為無需調整喷嘴位置為止,即,在間距調整機構 21Γ之Λ 7朝副掃描方向之移動、及測試塗佈面 之更換(步驟 上有機EL液之塗備=)’以及於測試塗佈面2131 噴嘴位置之㈣: 之檢測、及是否需要調整 罝之確涊(步驟S12〜S15)。 所:::::之調整結束時’在由2個CCD相機13最後 (亦即,係#:斷塗::2131上的有機肌液圖案的2個影像 為「最終影像中整噴嘴間距時之影像,以下,稱 」)中,分別藉由控制部1〇之基板位置調整 97106432 23 200924858 部1〇3(參照圖3)而求出影像中的有冑EL&之圖案於副掃 描方向上之位置。接著,以由⑻侧之CCD相機13所拍 攝之最終影像為基準,求出由(_χ)側之CCD相機13所拍 攝的最終影像中之圖案位置於副掃描方向上之偏移量(以 下’稱為「位置偏移量」)(步驟Sl6)。 其次,在(-X)侧之攝像部移動機構13a受到基板位置調 整部103之控制下,(_χ)側之⑽相機13朝副掃描方向 ❹ 移動與位置偏移量相等之距離,而調整2個CCD相機13 之相對位置(步驟S17)。藉此,2個CCD相機13之攝像區 域之中心連結而成之直線與由塗佈頭14所塗佈的有機乩 液之線平仃。具體而言,當卜χ)側之ccd相機Η的最線 影:象中的有機EL液之圖案與⑻側之最終影像相比朝 L偏移時,(-X)侧之⑽相機13朝(―Y)方向移動, ^朝(+Y)側偏移時,⑼侧之⑽相機13朝⑻方向 再者塗佈襄置1中的CCD相機13之位置調整可 ❾ 在(-)侧之⑽相機13被㈣之狀態下,藉由移動 側之CCD相機1 q &、仓V- . 移動來進行 仃’亦可藉由使兩方之⑽相機13 之Lcc:相Γ3之位置調整結束時,在基板移動機構12 起朝9與基板保持部11及測試塗佈單元2 一 2個CCD ^矛動’並且如圖1中實線所示,基板9位於 1面之下方(步驟S18)。此時,於基板9之上 =域上== 所。又置的2個定位用記號93(參照圖12), 97106432 24 200924858 分別位於2個CCD相機13之攝像區域内。在基板9上,2 個疋位用記號93之中心連結而成之直線與塗佈區域之複 • 數個槽平行。 • 然後,2個CCD相機13在基板位置調整部1 〇3之控制 下,對基板9上之2個定位用記號93進行拍攝(步驟 S19)。其次,根據2個定位用記號93之影像而求出定位 用記號93之_心間在副掃描方向上之距離,並根據預先 記憶的定位用記號93之中心間在主掃描方向上的距離, 求出基板9於旋轉方向上之偏移量(亦即,傾斜度)。然 後,基板位置調整部103根據基板9之於旋轉方向上之偏 移量控制基板旋轉機構12a而使基板9發生旋轉,藉此2 個定位用記號93相對於CCD相機13於副掃描方向上之相 對位置相等(步驟S20)。 如以上所描述,塗佈裝置i中,2個CCD相機i 3相對 於複數個喷嘴17(從複數個喷嘴17吐出並塗佈於基板9 ❹上之有機EL液之線)於副掃描方向上的相對位置彼此相 等。因此,2個定位用記號93相對於CCD相機13於副掃 描方向之相對位置彼此相等,藉此2個定位用記號犯相 對於複數個噴嘴17(從複數個喷嘴17吐出並塗佈於基板9 上之有機EL液之線)於副掃描方向上的相對位置彼此相 等。亦即,基板9上塗佈區域之間隔壁間的槽相對於主掃 描方向上的複數個喷嘴17之移動軌跡平行。 如此’塗佈裝置1中’根據由2個CCD相機13所取得 的有機EL液圖案之影像以及由2個CCD相機13所取得的 97106432 25 200924858 =板9之上表面91上的定位用記號93之影像,基板移動 機構12及基板旋轉機構12a受到控制部1()之基板位置調 整部酬參照圖3)之控制,藉此來調整基板㈠目對於複 數個噴嘴17之相對位置。 接著’當基板9之位置調整結束時,在塗佈頭移動機構 15之作用下,塗佈頭14 —邊從複數個喷嘴卩連續地吐 出有機EL液,-邊朝主掃描方向移動,並且每當塗佈頭 β 14朝主掃描方向上移動^欠,則基板9由基板移動機構 〇 12朝副掃描方向((+Υ)方向)上步進移動。然後,複數個 喷嘴17反覆進行相對於基板9於主掃描方向及副掃描方 向之相對移動,直至基板9位於圖1中之二點鍵線所示之 塗佈結束位置為止,藉此將有機EL液以條紋狀塗佈於基 板9上。 如上所說明,利用塗佈裝置丨對測試塗佈單元2之測試 塗佈面2131塗佈有機EL液,並根據由CCD相機13所取 ⑩得的測試塗佈面2131上之有機乩液圖案的影像而檢測噴 嘴間距,再根據該檢測結果,利用間距調整機構3來調整 複數個喷嘴17於副掃描方向上的間距。藉此,可在不對 基板9塗佈有機EL液之情況下,高精度地調整塗佈裝置 ’ 1之複數個喷嘴17於副掃描方向上的間距(亦即,噴嘴間 - 距)。 曰 其結果為’與在&板上之非塗佈區域進行測試塗佈以調 整喷嘴間距之情況不同,可在不考慮喷嘴數量與非塗佈區 域之大小間的關係(亦即,測試塗佈所需區域之大小與基 97106432 26 200924858 板上的可測試塗佈區域之大小之間的關係)的情況下,高 精度地調整喷嘴間距。因此,塗佈裝置丨之構造尤其適合 .具備數個(例如8個以上)喷嘴之塗佈裝置。又,塗佈裝置 • 1中,由於不對基板進行測試塗佈,故可防止經測試塗佈 之2機EL液乾燥後可能會由有機乩材料產生之微粒,可 提高對基板9之塗佈品質。 塗佈裝置1中,由於測試塗佈時的喷嘴丨7與測試塗佈 面2131之間於Z方向之距離和對基板9塗佈有機EL液時 ,喷嘴17與基板9之上表面91之間於z方向之距離相 等,故有機EL液塗佈於基板9上時的有機乩液之吐出距 離與測試塗佈時的吐出距離相等。假設,於基板上塗佈時 及測試塗佈時的吐出距離之差較大,則經塗佈的複數個有 機EL液之線之間距可能會發生變化,但本實施形態之塗 佈裝置1中’可防止於基板9上塗佈時及測試塗佈時的吐 出距離之差所造成之影響,故可更高精度地調整喷嘴間 ❹距。再者, 塗佈裝置1中,只要在可防止吐出距離相對於 有機EL液之線間距之差所造成影響之範圍内,則即便測 試塗佈時的喷嘴17與測試塗佈面2131之間於Z方向上之 距離、和對基板9塗佈有機EL液時的喷嘴17與基板9之 ‘ 上表面91之間於Z方向之距離稍有不同,亦可視作上述 - 距離實質上相等。 測試塗佈平台部21中,將測試塗佈面2131作為樹脂膠 帶213之主面’利用膠帶供給部215將樹脂膠帶213送出 至膠帶保持部214’藉此可容易將使用完的(亦即,進行 97106432 27 200924858 有機EL液之測試塗佈後的)測試塗佈面2i 31更換成新的 未使用之測試塗佈面。在膠帶保持部214中,利用膠帶吸 附部2141及膠帶按壓部2142來固定樹脂膠帶213之測試 塗佈面2131並使其平坦,且使測試塗佈面2131與複數個 喷嘴17之間的距離保持固定,藉此可更高精度地檢測喷 嘴間距。 測試塗佈單元2中,測試塗佈平台部21之測試塗佈面 ❹After the test coated surface 2131 is replaced, the process returns to the step (10), and the coating head 14 - discharges the organic EL = motion from the plurality of nozzles 17, and applies the liquid on the two test coated surfaces 2131 of the test coating unit 2 (step S12). Then, the image image of the organic liquid to be measured is obtained by (10) the camera 13, and the nozzle pitch is checked by the pitch to confirm whether or not the nozzle position is required to be ==: S13 to S15). Then, the following operations are repeated, =1: there is no need to adjust the nozzle position, that is, the movement of the pitch adjustment mechanism 21 to the sub-scanning direction, and the replacement of the test coated surface (the coating of the organic EL liquid on the step) =) 'and test (4) of the coated surface 2131 nozzle position: the detection, and whether it is necessary to adjust the 罝 (steps S12 to S15). At the end of the adjustment of ::::: 'At the end of the two CCD cameras 13 (that is, the two images of the organic muscle pattern on the #: break:: 2131 are "the entire nozzle spacing in the final image" In the image, hereinafter, "), the pattern of the 胄EL& in the image is obtained in the sub-scanning direction by the substrate position adjustment 97106432 23 200924858 portion 1〇3 (see FIG. 3) of the control unit 1 The location. Then, based on the final image captured by the CCD camera 13 on the (8) side, the offset of the pattern position in the final image captured by the CCD camera 13 on the (_) side in the sub-scanning direction is obtained (hereinafter ' This is called "position offset" (step S16). Next, the imaging unit moving mechanism 13a on the (-X) side is controlled by the substrate position adjusting unit 103, and the (10) camera 13 on the (_) side moves in the sub-scanning direction ❹ by a distance equal to the positional shift amount, and the adjustment 2 The relative positions of the CCD cameras 13 (step S17). Thereby, the straight line connecting the centers of the imaging areas of the two CCD cameras 13 and the line of the organic sputum coated by the coating head 14 are flat. Specifically, when the pattern of the ccd camera on the side of the dice) is shifted to the L compared to the final image on the (8) side, the (10) camera 13 toward the (-X) side (Y) direction shift, ^ (+) side shift, (9) side (10) camera 13 in the (8) direction and then the position adjustment of the CCD camera 13 in the coating unit 1 can be adjusted on the (-) side (10) When the camera 13 is in the state of (4), the movement of the CCD camera 1 q & the bin V-. on the moving side is performed, and the position adjustment of the Lcc: phase 3 of the (10) camera 13 can also be ended. At the time of the substrate moving mechanism 12, two CCDs are struck toward the substrate holding portion 11 and the test coating unit 2, and as shown by the solid line in FIG. 1, the substrate 9 is located below one surface (step S18). . At this time, on the substrate 9 = domain ==. Two positioning marks 93 (refer to FIG. 12) and 97106432 24 200924858 are respectively placed in the imaging areas of the two CCD cameras 13. On the substrate 9, the straight line connecting the two positions with the mark 93 is parallel to the plurality of grooves of the coating area. Then, the two CCD cameras 13 image the two positioning marks 93 on the substrate 9 under the control of the substrate position adjusting unit 1 〇 3 (step S19). Then, the distance between the centers of the positioning marks 93 in the sub-scanning direction is obtained from the images of the two positioning marks 93, and the distance between the centers of the positioning marks 93 stored in advance in the main scanning direction is determined. The amount of shift (i.e., the inclination) of the substrate 9 in the rotational direction is obtained. Then, the substrate position adjusting unit 103 controls the substrate rotating mechanism 12a to rotate the substrate 9 in accordance with the amount of shift of the substrate 9 in the rotational direction, whereby the two positioning marks 93 are in the sub-scanning direction with respect to the CCD camera 13. The relative positions are equal (step S20). As described above, in the coating device i, the two CCD cameras i 3 are opposed to the plurality of nozzles 17 (the lines of the organic EL liquid discharged from the plurality of nozzles 17 and applied to the substrate 9) in the sub-scanning direction. The relative positions are equal to each other. Therefore, the relative positions of the two positioning marks 93 with respect to the CCD camera 13 in the sub-scanning direction are equal to each other, whereby the two positioning marks are made to be opposed to the plurality of nozzles 17 (discharged from the plurality of nozzles 17 and applied to the substrate 9) The relative positions of the upper organic EL liquid lines in the sub-scanning direction are equal to each other. That is, the grooves between the partition walls of the coating region on the substrate 9 are parallel with respect to the movement trajectories of the plurality of nozzles 17 in the main scanning direction. Thus, in the 'coating apparatus 1', based on the image of the organic EL liquid pattern obtained by the two CCD cameras 13 and the 97106432 25 200924858 obtained by the two CCD cameras 13 = the positioning mark 93 on the upper surface 91 of the board 9 The image moving mechanism 12 and the substrate rotating mechanism 12a are controlled by the substrate position adjusting portion of the control unit 1 (see FIG. 3), thereby adjusting the relative position of the substrate (one) to the plurality of nozzles 17. Then, when the position adjustment of the substrate 9 is completed, the coating head 14 intermittently discharges the organic EL liquid from the plurality of nozzles under the action of the coating head moving mechanism 15, and moves in the main scanning direction, and each When the coating head β 14 is moved in the main scanning direction, the substrate 9 is stepwise moved by the substrate moving mechanism 〇12 in the sub-scanning direction ((+Υ) direction). Then, the plurality of nozzles 17 repeatedly perform relative movement with respect to the substrate 9 in the main scanning direction and the sub-scanning direction until the substrate 9 is positioned at the coating end position indicated by the two-point key line in FIG. The liquid is applied to the substrate 9 in a stripe shape. As described above, the test coating surface 2131 of the test coating unit 2 is coated with the organic EL liquid by a coating device, and according to the organic sputum pattern on the test coated surface 2131 obtained by the CCD camera 13. The nozzle pitch is detected by the image, and based on the detection result, the pitch adjustment mechanism 3 is used to adjust the pitch of the plurality of nozzles 17 in the sub-scanning direction. Thereby, the pitch of the plurality of nozzles 17 of the coating device '1 in the sub-scanning direction (i.e., the inter-nozzle-distance) can be adjusted with high precision without applying the organic EL liquid to the substrate 9. The result is 'different from the case where the test coating is applied to the non-coated area on the & plate to adjust the nozzle pitch, regardless of the relationship between the number of nozzles and the size of the non-coated area (ie, test coating) In the case where the size of the area required for the cloth is related to the size of the testable coated area on the base 97106432 26 200924858, the nozzle pitch is adjusted with high precision. Therefore, the structure of the coating device is particularly suitable. A coating device having a plurality of nozzles (for example, eight or more) is provided. Further, in the coating apparatus 1 , since the substrate is not subjected to test coating, it is possible to prevent particles which may be generated from the organic cerium material after drying of the EL liquid which has been tested and coated, and to improve the coating quality of the substrate 9 . . In the coating device 1, the distance between the nozzle 17 and the upper surface 91 of the substrate 9 is between the nozzle 丨 7 and the test coated surface 2131 at the time of the test coating and the application of the organic EL liquid to the substrate 9 Since the distance in the z direction is equal, the discharge distance of the organic sputum when the organic EL liquid is applied onto the substrate 9 is equal to the discharge distance at the time of test coating. Assuming that the difference in the discharge distance between the coating on the substrate and the test coating is large, the distance between the lines of the plurality of coated organic EL liquids may vary, but in the coating device 1 of the present embodiment. 'It is possible to prevent the influence of the difference in the discharge distance between the application on the substrate 9 and the test coating, so that the inter-nozzle pitch can be adjusted with higher precision. Further, in the coating apparatus 1, as long as the influence of the difference in the line spacing of the discharge distance with respect to the organic EL liquid can be prevented, even between the nozzle 17 and the test coated surface 2131 at the time of test coating The distance in the Z direction and the distance between the nozzle 17 when the organic EL liquid is applied to the substrate 9 and the upper surface 91 of the substrate 9 are slightly different in the Z direction, and it can be considered that the above-distance is substantially equal. In the test coating platform unit 21, the test coated surface 2131 is used as the main surface of the resin tape 213, and the resin tape 213 is sent out to the tape holding portion 214 by the tape supply portion 215, whereby it can be easily used (that is, The test coated surface 2i 31 of the 97106432 27 200924858 test of the organic EL liquid was replaced with a new unused test coated surface. In the tape holding portion 214, the test coated surface 2131 of the resin tape 213 is fixed and flattened by the tape suction portion 2141 and the tape pressing portion 2142, and the distance between the test coated surface 2131 and the plurality of nozzles 17 is maintained. It is fixed, whereby the nozzle pitch can be detected with higher precision. In the test coating unit 2, the test coated surface of the coating platform portion 21 is tested.
2131在由塗佈頭14進行測試塗佈時,會與複數個喷嘴17 於主掃描方向上的相對移動路徑之僅一部分重疊。換言 之,於塗佈頊移動機構15作用下的複數個喷嘴17之移動 路瓜上,在主掃描方向之僅一部分上配置測試塗佈面 2131因此可使塗佈有機EL液之測試塗佈面之面積變 小,而可減少測試塗佈面2131之使用量。其結果可降低 喷嘴間距調整所需之成本。 _ 塗佈裝置1中,根據由控制部10之間距檢測部1〇1所 檢測出的喷嘴間距’利用調整機構控制部10 2來控制間距 調整機構3之抵接部移動機構34,由此可自動地調整噴 :間距。其結果可更高精度地調整喷嘴間距,並且可減少 調整所需之作業時間及勞力。又,利用間距調整 接的噴嘴17間;方向上進行個別移動’藉此可對鄰 度地調整。、田1十田方向上的各距離進行個別且高精 塗佈裝置1中 根據在主掃描方向上分_ 2_試塗 97106432 28 200924858 佈面2131上所塗佈的古施+ ^ Q L 怖的有機乩液之圖案的影像、以及在基 ^、主掃描方向分開配置的2蚊㈣記號93之影 ^來^基板Μ目對於喷嘴17之相對位置,由此使由 固、嘴17所塗佈之有機EL液之線與基板^之塗佈區 q的複數個槽精度良好地平行,而可高精度地進行基板 之 =置調整。又,由於可利用喷嘴間距調整用之構成來 仃土板9之位置調整,故可簡化塗佈裝置工之構造。When the test coating is applied by the coating head 14, 2131 overlaps with only a part of the relative movement paths of the plurality of nozzles 17 in the main scanning direction. In other words, on the moving road cucumber of the plurality of nozzles 17 which are applied by the coating movement mechanism 15, the test coating surface 2131 is placed on only a part of the main scanning direction, so that the test coated surface of the organic EL liquid can be applied. The area becomes smaller, and the amount of the test coated surface 2131 can be reduced. The result is a reduction in the cost of nozzle spacing adjustment. In the coating device 1, the abutting portion moving mechanism 34 of the pitch adjusting mechanism 3 is controlled by the adjusting mechanism control unit 102 based on the nozzle pitch detected by the distance detecting portion 1〇1 between the control units 10, thereby Automatically adjust the spray: spacing. As a result, the nozzle pitch can be adjusted with higher precision, and the work time and labor required for the adjustment can be reduced. Further, it is possible to adjust the proximity by using the pitch adjustment between the nozzles 17 and the individual movement in the direction. The distances in the direction of the field 1 field are carried out in the individual and high-precision coating device 1 according to the organic scanning + ^ QL horror coated on the surface of the main scanning direction according to the main scanning direction _ 2_ test coating 97106432 28 200924858 cloth surface 2131 The image of the sputum pattern and the shadow of the 2 mosquitoes (4) marks 93 arranged separately in the base and the main scanning direction are the relative positions of the substrates to the nozzles 17, thereby being coated by the solid and the nozzles 17. The plurality of grooves of the organic EL liquid line and the application region q of the substrate are accurately parallel, and the substrate can be adjusted with high precision. Further, since the position adjustment of the alumina board 9 can be adjusted by the nozzle pitch adjustment, the structure of the coating apparatus can be simplified.
Ο 91更進—步’藉由具有相同構造之2個測試塗佈平台部 1而構成將2個測試塗佈面2131分別固定之2個膠帶保 暖:214、以及將2個測試塗佈面2131分別更換之2個 ’ ▼供給部215及2個膠帶回收部216,由此可使塗佈裝 置1之構造更加簡化。 其次’對本發明第2實施形態之塗佈裝置加以說明。第 形I、之塗佈裝置具備與圖8及圖9所示之測試塗佈 平口邛21之構造不同的2個測試塗佈平台部21&,而其 他構成與圖1至圖7所示之塗佈|置!相同,在以下說明 中標註相同符號。 圖13係表示(+χ)侧之測試塗佈平台部21&之左側視 圖。圖13中亦一併描繪出基板移動機構12之一部分。第 2實%形態之塗佈裝置中,(_χ)侧之測試塗佈平台部21 & 亦與圖13所示之(+X)侧之測試塗佈平台部21a具有相同 之構造。 如圖13所示,測試塗佈平台部21a具備:滑塊211, 可移動地安裝於基板移動機構12之轨道121上;外殼 97106432 29 200924858 212,固定於滑塊211上;測試片213a,係進行有機肛 液之測試塗佈的測試塗佈構件;測試片保持部2Ua,在 _外殼212之上部對測試片213a加以保持;測試片收容邛 • 215a,係於測試片213a之(-Z)側將未使用之(亦即,未進 行有機EL液之測試塗佈之)複數個測試片213b(以下,稱 為「等待測試片213b」)疊層並保持的匣盒(magazine); 壓出機構216a,係將由測試片保持部214a所保持的測試 片213a朝向(+Y)方向壓出之氣缸;以及測試片回收部 鼙217a,收取由壓出機構216a從測試片保持部21乜所壓 之測試片213a。 測忒片213a係由相對於有機EL液之濡濕性與基板9相 同之材料形成的,本實施形態中,係由與基板9同材質之 玻璃所形成。又’於測試片213a的⑽側之主面上,形 成有與有機EL液塗佈前形成於基板9上之薄膜(例如,下 述電洞輸送材料之層)相同之薄膜,而測試片213a的⑽ ❹側之主面與基板9之上表面91各自相對於有機以液之濡 濕!·生相同(亦即,大致相等)。再者,亦可藉由適宜選擇測 式片213a之材料,使測試片213&的(+z)侧之主面與基板 .9之上表面91各自相對於有機EL液之濡濕性相同,而無 而於測5式片213a的(+Z)侧之主面上形成薄膜。 測试塗佈平台部21a巾,測試片213&的⑷)侧之主面 r為供測试塗佈複數個噴嘴17(參照圖吐出之有機乩 之之測式塗佈面2m,而用以保持測試片之測試片 呆持邓214a成為具有測試塗佈面2131之測試塗佈部。 97106432 30 200924858 13 J t以片保持部214一 ==面抵接部,’其抵接於測試片2ΐ3&之測試 击 並決定Z方向(亦即,與測試塗佈面2131 J上的測試塗佈面2131之位置。测試片保持部 213;广:二片广藉由與測試片2l3a之測試塗佈面 ❹ Ο 2131相反侧(亦即,⑼侧)之測試片收容部215a,而經 =複數個等待測試片213b朝向測試塗佈面抵接部⑽按 塱,以對測试塗佈面抵接部2147施壓。 測試塗佈平台部2la中’壓出機構216&受到驅動而 抵接於測試塗佈面抵接部2147之測試片213_⑻方向 壓出並從測試片保接_4β 9 7 / ' 4a取出。接著,將收容於測試 片收谷4215a +之複數個等待測試片_中、最上部之 等待測試片⑽朝向測試片保持部214a之測試塗佈面抵 接# 2147把壓’而成為保持於測試片保持部214a中之新 =試片213&,該測試片⑽的⑽側之主面成為新的 測试上佈面213卜亦即,測試塗佈平台畜"“中,壓出 機構j16a成為從測試片保持部21如中取出測試片2… ^則4片取出’測试片收容部215&及壓出機構叫&成 =試片保持部2l4a之測試塗佈面2131更換為新的測 "塗佈面之測S式塗佈面更換機構。 第2實施形態之塗佈裝置的準備作業(亦即,喷嘴間距 之調整及基板9之位置調整)之流程中,對於圖11A所示 之步驟s152中的測試塗佈面2131之更換,係指從利用樹 97106432 31 200924858 脂膠帶213之送出者,轡南丨田、目丨丨叫^ ηι 山可變更為利用測試片2l3a之更換者, 除此之外與第I實施形態相同。 、 第2實施形態之塗係步罟巾纺银 至饰衮置中與第I實施形態相同,於 測試塗佈單元2(參照0丨)之賴塗佈面2i3i上塗佈有機 EL液,並根據測試塗佈面2l3l上之有機此液圖案之影 像來檢測喷嘴間距,再根墟拾、、目彳έ士 丹很像檢利結果來調整複數個喷嘴 17(參照圖I)於副掃描方向上的 田々冋上的間距。藉此,可在不對基 ❹ 板9(參照圖I)進行有機此液之分& J节俄i LL·履之塗佈的情況下,高精度地 調整塗佈裝置之複數個喷喈η , 文双m嘴i7於副掃描方向上的間距 (亦即,喷嘴間距)。 第2實施形態之塗佈裝置中’尤其將測試塗佈面2ΐ3ι 作為相對於有機EL液之漂濕性與基板9之上表面9i相同 的測試片2l3a之主面’藉此可防止測試塗佈面2i3i與基 板一9之上表面91的職性之差所導致的測量誤差等,而 可咼精度地檢測嘴嘴間距。 ❿於測試塗佈平台部…上,設置有在測試片_的⑼ 側收容有複數個等待測試片213b之測試片收容部心, 並利用壓出機構216a從測試片保持部心中壓出測試片 _,而將新的測試片213a朝向測試片保持部ma之測 試塗佈面抵接部2147施壓,以配置新的測試塗佈面 • :13卜藉此’可容易更換測試塗佈面2m,並且可將測 试塗佈面2131與複數個啥嘴1 7 » pg ^ 攸双1回嘎賀17之間的距離保持固定,而 可更咼精度地檢測喷嘴間距。 ’但本發明並非限定 以上對本發明之實施形態進行說明 97106432 32 200924858 於上述實施形態’其可進行各種變更。 例如’對於第1實施形態之塗佈裝置1之測試塗佈平台 '部21,當膠帶保持部214中僅利用膠帶吸附部2141之吸 .引力來吸附樹脂膠帶213以便將測試塗佈面2131以平滑 之狀態固定之情況時,亦可省略膠帶按屋部2丨42、按壓 部升降機構2143及按壓部移動機構2144,僅將膠帶吸附 1 2141作為用以固定樹脂膠帶2丨3之測試塗佈面2131的 ❹膠帶固定部。又,亦可無須進行膠帶吸附部2141之吸附, ,藉由膠帶按壓部2142之按壓來固定樹脂膠帶2丨3之測 試塗佈面213卜於此情況下,僅膠帶按壓部2142成為膠 帶固定部。 ,佈震置1之準備作業中,步驟S151中的利用間距調 機構3使喷嘴π移動與步驟S152中的測試 之更換可並行進行,亦可使牛驟Μ„^ — j使步驟S152在步驟S151之前進 仃(第2。實施形態令亦相同)。又,步驟⑽中所拍攝之定 ❹:立用二己號未必為設置於非塗佈區域上之定位專用記號,例 …、可將形成於塗佈區域内之間隔壁上或非塗佈區域上 的配線之一部分作為定位用記號。 一 -满ΓΓΐ整機構3-中’可利用1個調整頭30而依序進行 固喷鳴17於副掃描方向上之位置調整 '設置複數個調整頭30。於此产:兄下未,、需要 此匱况下’複數個喷嘴1 7益山 塗佈頭移動機構15對塗佈 嘴7猎由 3〇所對應之位置依序移動。 调I碩 之1個噴嘴17作為笑進“ 複數個嘴嘴17中 作為基準噴嘴時,調整頭3〇不會對該基準 97106432 33 200924858 ==調整。又’基準喷嘴亦可朝副掃描方向上不 了移動地固疋於噴嘴安裝部141上。 .上述實施形態之塗佈震置中’未必需要將所 -17(或,除1個喷嘴17以外之其他所有喷 方向上個別移動,不可移動地 奴)於田i知描 喈忠胜加士 移動地固疋有複數個喷嘴17之喷 機=:可在與間距調整機構3不同之其他間距調: 機構之作用下’以與基板9之上表面91垂直之 = ::僅旋轉微小之角度’藉此來變更副掃描方向上的喷嘴 L檢二Γ褒置之喷嘴間距之調整,亦可根據喷嘴間 進行。 謂者對間距调整機構進行手動操作來 槿!基板9之位置調整係藉由與喷嘴間距調 塗:的其他機構來進行時,亦可於測試 =:=1個測試塗佈平台部。於此情況下, 之Ί,亦可在不對基板9塗佈有機el液 ❿之匱况下,尚精度地調整喷嘴間距。 他制樹轉帶213的測試塗佈單元仏之其 他例之後視圖。對於圖15所示之測 與圖8及圖9所示之測試塗佈平台部!而二 .並且僅設置有1個比基板…向(:即;二向 寬度更大的測試塗佈平台物。在測試塗= =21b之上部之膠帶保持部214中,樹 佈:延r度與基板之X方向之寬度^ 測试塗佈早da之膠帶保持部214中,遍及樹脂膠帶 97106432 34 200924858 ,之x方向之大致全長塗佈有機乩液,在 之X方向之兩端部附近的2個測試塗佈面帶 附部2141固定之狀態下,刺用rrn… ㈣帶吸 以盥卜、f杏J用CCD相機進行拍攝,藉此 .八、上述貝㈣態相同之方式檢測喷 板位置調整所必要之資訊。 儿取基 測試塗佈平台部2ib中,佶接+ I次測試塗佈結束時以圖l5中時:3為^狀’並在 使用完的測試塗佈面2l3l被更為向傳送。藉此’ ❹又,使用完的測試塗佈面: 生4 上,利用噴霧器2191喷射 ^洗液,並使錢刀(airknife)⑽去除所附著之有機 EL材料’以便可用作新的測試塗佈面。再 = 2lb之構造亦可為,於(+χ)侧及(―χ)側 3供給部及㈣时部,將使以❹m㈣面捲繞並回 收0 實施形態之塗佈裝置中,亦可取代湘基板移動機 ❹構12來使基板9及基板保持部u移動,而是藉由塗佈頭 4於副掃描方向上之移動,來進行副掃描方向上的基板9 ^於塗佈頭14之相對移動。又,亦可取代利用塗佈頭 2機構15來使塗佈頭14移動,而是藉由基板9及基板 部U於主掃描方向上之移動,而進行主掃描方向上 •的塗佈頭14相對於基板9之相對移動。 上述實施形態之塗佈裝置中,設置於塗佈頭14上的喷 嘴Π之數量並非限定於16個,3個以上即可。塗佈裝置 t,例如亦可從設置於塗佈頭14上之3個噴嘴Η,將分 97106432 35 200924858 別包含紅色(R)、綠色(G)、藍色(Β)相互不同顏色之3 有機EL材料的3種有機EL·液同時吐出並塗佈於基板9 上。於此情況下,鄰接之2個喷嘴之間於副掃描方向上的 距離被調整為與間隔壁之間距相等。 ' 又’上述塗佈裝置中’亦可將包含像素形成材料即電洞 輸送材料之流動性材料(以下,稱為「電洞輸送液」)塗佈 於基板9上。此處,所謂「電洞輸送材料」’係指形成有 ο 機EL顯示裝置之電洞輸送層的材料,所謂「電洞輸逆 層」,並非僅指朝由有機EL材料所形成之有機el層中輸 送電洞之狹義的電洞輸送層,其還包含進行電洞注入 洞注入層。 上述塗佈裝置未必僅用於有機EL顯示裝置用之有機乩 液或電洞輸送液之塗佈,例如,對於液晶顯示裝置或電製 裝置等平面顯示裝置用之基板,亦可用於塗佈包含著 :料:螢光材料等其他種類之像素 材料之情況。 在如上所述之對有機El & m m 液及電洞輸送液之之基板進行有㈣ 行包含像面顯示裝置用之基板進 欲 ;之流動性材料之塗佈中,要求流動性 具有較高的位置精度。如上所述,由於塗Ο91More Steps - By means of two test coating platform portions 1 having the same structure, two tapes for fixing the two test coated surfaces 2131 are respectively kept warm: 214, and two test coated surfaces 2131 By replacing the two ' ▼ supply portions 215 and the two tape collecting portions 216 , respectively, the structure of the coating device 1 can be further simplified. Next, the coating apparatus according to the second embodiment of the present invention will be described. The coating device of the first embodiment I has two test coating platform portions 21 & which are different from the structure of the test coating flat opening 21 shown in Figs. 8 and 9 , and other configurations and those shown in Figs. 1 to 7 Coating | set! In the same way, the same symbols are denoted in the following description. Fig. 13 is a left side view showing the test coating platform portion 21 & (+χ) side. One portion of the substrate moving mechanism 12 is also depicted in FIG. In the coating apparatus of the second aspect, the test coating stage portion 21 of the (_χ) side has the same structure as the test coating stage portion 21a of the (+X) side shown in Fig. 13 . As shown in FIG. 13, the test coating platform portion 21a is provided with a slider 211 movably mounted on the rail 121 of the substrate moving mechanism 12; a housing 97106432 29 200924858 212 fixed to the slider 211; and a test piece 213a A test coating member for performing test coating of the organic anal solution; a test piece holding portion 2Ua for holding the test piece 213a on the upper portion of the outer casing 212; and a test piece containing 215a, which is attached to the test piece 213a (-Z) a side of a plurality of test pieces 213b (hereinafter referred to as "waiting test piece 213b") which are not used (that is, which have not been subjected to test coating of the organic EL liquid) are stacked and held by a magazine; The mechanism 216a is a cylinder that presses the test piece 213a held by the test piece holding portion 214a in the (+Y) direction; and the test piece recovery portion 鼙217a receives the pressure from the test piece holding portion 21 by the pressing mechanism 216a. Test piece 213a. The test piece 213a is formed of the same material as the substrate 9 with respect to the wetness of the organic EL liquid. In the present embodiment, it is formed of glass of the same material as the substrate 9. Further, on the main surface of the (10) side of the test piece 213a, a film similar to the film formed on the substrate 9 before application of the organic EL liquid (for example, a layer of the following hole transporting material) is formed, and the test piece 213a is formed. The (10) major side of the crotch side and the upper surface 91 of the substrate 9 are each wet with respect to the organic liquid (ie, substantially equal). Further, by appropriately selecting the material of the test piece 213a, the main surface of the (+z) side of the test piece 213& and the upper surface 91 of the substrate .9 are the same as the wettability of the organic EL liquid, respectively. A film is formed on the main surface of the (+Z) side of the 5 piece 213a. The test coating plate portion 21a towel, the main surface r of the (4) side of the test piece 213 & is for testing a plurality of nozzles 17 (refer to the test coated surface 2m of the organic crucible discharged from the drawing) The test piece holding the test piece is held by Deng 214a as a test coating part having the test coated surface 2131. 97106432 30 200924858 13 J t is a sheet holding portion 214 == surface abutting portion, 'which abuts the test piece 2ΐ3& The test hits and determines the Z direction (ie, the position of the test coated surface 2131 on the test coated surface 2131 J. The test piece holding portion 213; the wide: two pieces of the test by the test piece 2l3a The test piece accommodating portion 215a on the opposite side (i.e., the (9) side) of the cloth surface Ο 2131, and the plurality of waiting test pieces 213b are pressed toward the test coated surface abutting portion (10) to press the test coated surface. The pressing portion 2147 is pressed in the test coating unit portion 2a. The pressing mechanism 216 & is driven to abut against the test piece 213_(8) of the test coated surface abutting portion 2147 and is pressed out from the test piece _4β 9 7 / ' 4a is taken out. Next, it will be contained in the test piece to receive the 4215a + multiple waiting test pieces _ medium, the uppermost The test piece (10) is abutted against the test coated surface of the test piece holding portion 214a, and the pressure is changed to become the new test piece 213 & held in the test piece holding portion 214a, and the main surface of the (10) side of the test piece (10) As a new test on the surface 213, that is, the test coating platform animal "", the extrusion mechanism j16a becomes the test piece 2 from the test piece holding portion 21, etc. ^ Then 4 pieces are taken out 'test piece The accommodating portion 215& and the pressing mechanism are replaced with the test coating surface 2131 of the test piece holding portion 214a, and replaced with a new measuring " S-coated surface replacement mechanism for the coated surface. In the flow of the preparation operation of the cloth device (that is, the adjustment of the nozzle pitch and the position adjustment of the substrate 9), the replacement of the test coated surface 2131 in the step s152 shown in FIG. 11A refers to the use of the tree 97106432 31 200924858. The delivery of the adhesive tape 213 is the same as that of the first embodiment except that the replacement of the test piece 2l3a is changed by the 丨 丨 、 、 丨丨 丨丨 η η η 。 。 。 η η η η η η η η η η η The 纺 纺 spun silver to the 衮 相同 is the same as the first embodiment, The organic EL liquid is applied onto the coated surface 2i3i of the test coating unit 2 (refer to 0), and the nozzle pitch is detected according to the image of the organic liquid pattern on the test coated surface 213.1, and then the roots are picked up. As a result of the profit, the gentleman Dan adjusts the spacing of the plurality of nozzles 17 (see Fig. 1) on the field in the sub-scanning direction. This allows the substrate 9 (see Fig. I) to be organic. In the case of the liquid component & J section, the squeezing of the plurality of squeezing η of the coating device and the spacing of the double-mouth m-mouth i7 in the sub-scanning direction (ie, the nozzle) spacing). In the coating apparatus of the second embodiment, the test coated surface 2 ΐ 3 ι is used as the main surface of the test piece 231 a which is the same as the surface of the upper surface 9 i of the substrate 9 with respect to the wetness of the organic EL liquid. The measurement error or the like caused by the difference in the position of the surface 2i3i and the upper surface 91 of the substrate 9 can accurately detect the nozzle pitch. In the test coating platform portion, a test piece accommodating portion core in which a plurality of waiting test pieces 213b are accommodated on the (9) side of the test piece _ is provided, and the test piece is pressed out from the center of the test piece holding portion by the pressing mechanism 216a. _, and the new test piece 213a is pressed toward the test coated surface abutting portion 2147 of the test piece holding portion ma to configure a new test coated surface: : 13 to thereby easily replace the test coated surface 2 m And the distance between the test coated surface 2131 and the plurality of nozzles 1 7 » pg ^ 攸 double 1 back 嘎 17 can be kept fixed, and the nozzle pitch can be detected more accurately. The present invention is not limited thereto. The above embodiments of the present invention are described. 97106432 32 200924858 The above embodiments can be variously modified. For example, in the test coating platform portion 21 of the coating device 1 of the first embodiment, the resin tape 213 is adsorbed by the suction force of the tape adsorption portion 2141 in the tape holding portion 214 so that the test coated surface 2131 is When the state of the smoothing is fixed, the tape pressing portion 2丨42, the pressing portion lifting mechanism 2143, and the pressing portion moving mechanism 2144 may be omitted, and only the tape suction 1 2141 is used as the test coating for fixing the resin tape 2丨3. The ❹ tape fixing portion of the surface 2131. Moreover, the test coated surface 213 of the resin tape 2丨3 can be fixed by the pressing of the tape pressing portion 2142 without the need to adsorb the tape suction portion 2141. In this case, only the tape pressing portion 2142 becomes the tape fixing portion. . In the preparatory work of the shock setting 1, the movement of the nozzle π by the pitch adjustment mechanism 3 in step S151 may be performed in parallel with the replacement of the test in step S152, or the step of step S152 may be performed in step S152. Before S151 (the second embodiment is the same). In addition, the fixed image taken in step (10): the vertical number is not necessarily a positioning-specific mark placed on the non-coated area, for example, One part of the wiring formed on the partition wall or the non-coating area in the coating area is used as a positioning mark. One-filling mechanism 3-in' can use one adjusting head 30 to sequentially perform solid-sounding 17 Position adjustment in the sub-scanning direction 'Set a plurality of adjustment heads 30. This production: Brother is not, under this condition, 'multiple nozzles 1 7 Yishan coating head moving mechanism 15 pairs of coating nozzles 7 hunting The position corresponding to the 3〇 moves in sequence. One nozzle 17 of the I Shuo is used as a smile. When the plurality of nozzles 17 are used as the reference nozzles, the adjustment head 3〇 is not adjusted to the reference 97106432 33 200924858 ==. Further, the reference nozzle may be fixed to the nozzle mounting portion 141 so as not to move in the sub-scanning direction. In the coating shake of the above embodiment, it is not necessary to carry out the -17 (or, in addition to one nozzle 17, all the spray directions are individually moved, and the immovable slaves). The nozzle that moves a plurality of nozzles 17 is different from the pitch adjustment mechanism 3: under the action of the mechanism 'is perpendicular to the upper surface 91 of the substrate 9 :: only rotates a slight angle 'This can be used to change the nozzle pitch of the nozzle L in the sub-scanning direction. It is said that the pitch adjustment mechanism is manually operated. When the position adjustment of the substrate 9 is performed by another mechanism that is adjusted to the nozzle pitch, it is also possible to test =: = 1 test coating platform portion. In this case, the nozzle pitch can be accurately adjusted without applying the organic e liquid to the substrate 9. He made a tree-to-belt 213 test coating unit with a view of the other examples. For the test coating platform shown in FIG. 15 and FIG. 9 and FIG. 9 and only one substrate is provided (ie, the test coating platform having a larger width in the two directions) In the tape holding portion 214 of the upper portion of the test coating ==21b, the width of the tree cloth: the elongation r degree and the X direction of the substrate ^ is tested in the tape holding portion 214 coated early, throughout the resin tape 97106432 34 200924858, The organic sputum is applied to the entire length of the x-direction, and the two test coated surface tape attaching portions 2141 in the vicinity of the both ends in the X direction are fixed by the rrn... (4) with a suction, ab J is photographed by a CCD camera, and the information necessary for the position adjustment of the spray plate is detected in the same manner as the above-mentioned shell (four) state. In the base test coating platform portion 2ib, the splicing + I test coating is finished. In the case of Fig. l5: 3 is the shape of 'and' and the test coated surface 21l1 is used for further conveyance. Thus, the used test coated surface: the raw 4, sprayed with the sprayer 2191 ^ Wash the liquid and remove the attached organic EL material from the airknife (10) to be used as a new test coated surface The structure of the second embodiment may be a coating device in which the ❹m (four) plane is wound and the m (four) plane is wound on the (+χ) side and the (χ) side 3 supply unit and the (4) time portion. Instead of moving the substrate 9 and the substrate holding portion u, the substrate 9 and the substrate holding portion u are moved, and the substrate 9 in the sub-scanning direction is applied to the coating head 14 by the movement of the coating head 4 in the sub-scanning direction. In addition, instead of using the coating head 2 mechanism 15 to move the coating head 14, the substrate 9 and the substrate portion U are moved in the main scanning direction to perform the main scanning direction. The relative movement of the coating head 14 with respect to the substrate 9. In the coating apparatus of the above embodiment, the number of the nozzles 设置 provided on the coating head 14 is not limited to 16 or more, and the coating apparatus t, For example, it is also possible to use three nozzles 设置 disposed on the coating head 14, and to divide the three types of organic EL materials of red (R), green (G), and blue (Β) with different colors from each other in 97106432 35 200924858. The organic EL solution is simultaneously discharged and applied to the substrate 9. In this case, the adjacent two nozzles are in the sub-scan The distance in the direction is adjusted to be equal to the distance between the partition walls. 'In the above-mentioned coating device', a fluid material including a hole-forming material which is a pixel forming material (hereinafter referred to as "hole transport liquid") may be used. It is applied to the substrate 9. Here, the term "hole transport material" refers to a material in which a hole transport layer of an EL display device is formed, and the term "hole transport layer" does not mean only The narrow hole transport layer for transporting a hole in the organic EL layer formed of the organic EL material further includes a hole injection hole injection layer. The above coating device is not necessarily used only for the organic sputum for the organic EL display device or The application of the hole transporting liquid, for example, to a substrate for a flat display device such as a liquid crystal display device or an electric device, may be applied to a case where another type of pixel material such as a material: a fluorescent material is applied. In the above-mentioned substrate for the organic El & mm liquid and the hole transport liquid, there is a (4) row of substrates for the image surface display device; in the coating of the fluid material, the fluidity is required to be high. Positional accuracy. As mentioned above, due to coating
Si: 調整複數個喷嘴Π之間距,故尤其適 送液之會佑EL顯不襄置用之基板進行有機EL液及電洞輸 彤扣、千面顯不裝置用之基板進行包含像素 形成材枓之流動性材料之塗佈。 97106432 36 200924858 上述塗佈裝置除了用於平面顯示裝置用之基板以 外’亦可料對磁碟或光磁❹之玻璃基板、陶究基板、 或者半導體基板等各種基板進行各種流動性材料之塗佈。 . 以上詳細描寫並說明了本發明,但以上所述之說明僅為 例不,亚非限定。因此可理解為,只要不脫離本發明之範 圍,可進行多種變形及具有多種態樣。 【圖式簡單說明】 圖1係第1實施形態之塗佈裝置之俯視圖。 ° 圖2係塗佈裝置之前視圖。 圖3係表示控制部之功能的方塊圖。 圖4係表示塗佈頭之一部分的前視圖。 圖5係表示塗佈頭之一部分的俯視圖。 圖6係表示調整頭及塗佈頭之一部分的俯視圖。 圖7係表示調整頭及塗佈頭之一部分的左側視圖。 圖8係測試塗佈平台部之左侧視圖。 ❹ 圖9係測試塗佈平台部之後視圖。 圖1 〇係表示膠帶保持部附近的俯視圖。 圖11Α及圖11Β係塗佈裝置之準備作業之流程圖。 圖12係塗佈裝置之俯視圖。 •圖13係第2實施形態之測試塗佈平台部之左側視圖。 圖14係表示測試片保持部附近之俯視圖。 圖15係另一測試塗佈平台部之後視圖。 【主要元件符號說明】 1 塗佈裝置 97106432 37 200924858Si: Adjusting the distance between a plurality of nozzles, so it is especially suitable for the substrate that is used for the EL liquid and the hole for the organic EL liquid and the hole, and the substrate for the surface of the device is included. Coating of liquid materials. 97106432 36 200924858 In addition to the substrate for a flat display device, the above-mentioned coating device can also apply various kinds of fluid materials to various substrates such as a glass substrate, a ceramic substrate, or a semiconductor substrate. . The present invention has been described and illustrated in detail above, but the description above is merely exemplary and not limited. Therefore, it can be understood that various modifications and various forms are possible without departing from the scope of the invention. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a plan view of a coating apparatus according to a first embodiment. ° Figure 2 is a front view of the coating unit. Fig. 3 is a block diagram showing the function of the control unit. Figure 4 is a front elevational view showing a portion of the coating head. Fig. 5 is a plan view showing a part of a coating head. Fig. 6 is a plan view showing a part of the adjustment head and the coating head. Fig. 7 is a left side view showing a part of the adjustment head and the coating head. Figure 8 is a left side view of the test coating platform section. ❹ Figure 9 is a rear view of the test coating platform section. Fig. 1 shows a plan view of the vicinity of the tape holding portion. Fig. 11 is a flow chart showing the preparation work of the lanthanum coating device. Figure 12 is a plan view of the coating apparatus. Fig. 13 is a left side view of the test coating platform portion of the second embodiment. Fig. 14 is a plan view showing the vicinity of the test piece holding portion. Figure 15 is a rear view of another test coating platform section. [Main component symbol description] 1 Coating device 97106432 37 200924858
2 測試塗佈單元 2a 測試塗佈單元 3 間距調整機構 9 基板 10 控制部 101 間距檢測部 102 調整機構控制部 103 基板位置調整部 11 基板保持部 111 連接部 12 基板移動機構 121 執道 12a 基板旋轉機構 13 CCD相機 13a 攝像部移動機構 14 塗佈頭 141 喷嘴安裝部 142 引導槽 1411 背板部 1412 水平部 15 塗佈頭移動機構 16 受液部 17 喷嘴 173 喷嘴鎖定部 97106432 38 2009248582 test coating unit 2a test coating unit 3 pitch adjustment mechanism 9 substrate 10 control unit 101 pitch detecting unit 102 adjustment mechanism control unit 103 substrate position adjusting portion 11 substrate holding portion 111 connecting portion 12 substrate moving mechanism 121 way 12a substrate rotation Mechanism 13 CCD camera 13a Imaging unit moving mechanism 14 Coating head 141 Nozzle mounting portion 142 Guide groove 1411 Back plate portion 1412 Horizontal portion 15 Coating head moving mechanism 16 Liquid receiving portion 17 Nozzle 173 Nozzle locking portion 97106432 38 200924858
21 測試塗佈平台部 21a 測試塗佈平台部 21b 測試塗佈平台部 211 滑塊 212 外殼 213 樹脂膠帶 213a 測試片 213b 等待測試片 2131 測試塗佈面 214 膠帶保持部 214a 測試片保持部 2141 膠帶吸附部 2142 膠帶按壓部 2143 按壓部升降機構 2144 按壓部移動機構 2145 保持平面 2146 爪部 2147 測試塗佈面抵接部 215 膠帶供給部 215a 測試片收容部 2151 感測器 216 膠帶回收部 216a 壓出機構 217a 測試片回收部 97106432 39 200924858 2161 感測器 2171 馬達 . 2172 媧輪 . 218 外侧受液部 2191 噴霧器 2192 氣刀 22 中央受液部 30 調整頭 〇 31 安裝部固定機構 311 第1固定部 314 第2固定部 32 喷嘴抵接部 33 喷嘴施壓機構 331 桿 332 氣缸 _ 333 調節器 34 抵接部移動機構 343 步進馬達 91 上表面 - 93 定位用記號 97106432 4021 Test coating platform portion 21a Test coating platform portion 21b Test coating platform portion 211 Slider 212 Housing 213 Resin tape 213a Test piece 213b Waiting for test piece 2131 Test coated surface 214 Tape holding portion 214a Test piece holding portion 2141 Tape adsorption 2142 tape pressing portion 2143 pressing portion lifting mechanism 2144 pressing portion moving mechanism 2145 holding surface 2146 claw portion 2147 test coating surface abutting portion 215 tape supply portion 215a test piece housing portion 2151 sensor 216 tape collecting portion 216a pressing mechanism 217a Test piece recovery unit 97106432 39 200924858 2161 Sensor 2171 Motor. 2172 娲 wheel. 218 Outer liquid receiving part 2191 Sprayer 2192 Air knife 22 Central liquid receiving part 30 Adjustment head 安装 31 Mounting part fixing mechanism 311 First fixing part 314 2 fixing portion 32 nozzle abutting portion 33 nozzle pressing mechanism 331 rod 332 cylinder _ 333 regulator 34 abutting portion moving mechanism 343 stepping motor 91 upper surface - 93 positioning mark 97106432 40
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JP2007075771A JP5219237B2 (en) | 2007-03-23 | 2007-03-23 | Coating device |
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TW200924858A true TW200924858A (en) | 2009-06-16 |
TWI339133B TWI339133B (en) | 2011-03-21 |
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TW097106432A TWI339133B (en) | 2007-03-23 | 2008-02-25 | Liquid material applying apparatus |
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KR (1) | KR100921865B1 (en) |
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WO2010087314A1 (en) * | 2009-01-29 | 2010-08-05 | 芝浦メカトロニクス株式会社 | Coating applicator |
JP5346656B2 (en) * | 2009-04-01 | 2013-11-20 | 大日本スクリーン製造株式会社 | Coating device |
KR102180708B1 (en) | 2013-12-16 | 2020-11-23 | 삼성디스플레이 주식회사 | Organic electroluminescent display and method of manufacturing the same |
KR102309998B1 (en) * | 2014-12-29 | 2021-10-07 | 주식회사 케이씨텍 | Slit nozzle used in slit coater apparatus |
KR102049668B1 (en) * | 2018-05-28 | 2019-11-27 | 캐논 톡키 가부시키가이샤 | Film formation apparatus |
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JPS63254046A (en) * | 1987-04-13 | 1988-10-20 | Canon Inc | Ink jet recorder |
JPH10217511A (en) * | 1997-02-05 | 1998-08-18 | Brother Ind Ltd | Maintenance device for ink-jet printer |
JP2002082216A (en) * | 2000-09-07 | 2002-03-22 | Canon Inc | Device for manufacture of color filter and method for controlling position of nozzle in the device |
JP3599047B2 (en) * | 2001-06-25 | 2004-12-08 | セイコーエプソン株式会社 | Color filter and method of manufacturing the same, droplet material landing accuracy test substrate for color filter, method of measuring droplet material landing accuracy, electro-optical device, and electronic apparatus |
KR20040017271A (en) * | 2001-07-03 | 2004-02-26 | 동경 엘렉트론 주식회사 | Coating device and coating method |
JP4190827B2 (en) * | 2002-08-20 | 2008-12-03 | 大日本スクリーン製造株式会社 | Coating apparatus and coating method |
JP2004098400A (en) * | 2002-09-06 | 2004-04-02 | Seiko Epson Corp | Liquid drop ejector, liquid drop ejecting method, process for manufacturing device, and electronic apparatus |
JP2004177671A (en) * | 2002-11-27 | 2004-06-24 | Seiko Epson Corp | Film forming apparatus and film forming method, and device manufacturing apparatus and device manufacturing method, and device |
JP5011642B2 (en) * | 2004-12-10 | 2012-08-29 | 大日本印刷株式会社 | Pattern forming device |
JP2006239976A (en) * | 2005-03-02 | 2006-09-14 | Dainippon Printing Co Ltd | Pattern forming apparatus, and position correcting method |
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KR100921865B1 (en) | 2009-10-13 |
JP5219237B2 (en) | 2013-06-26 |
JP2008229565A (en) | 2008-10-02 |
KR20080086811A (en) | 2008-09-26 |
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