TW200915419A - Plasma treating apparatus - Google Patents

Plasma treating apparatus Download PDF

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Publication number
TW200915419A
TW200915419A TW097121588A TW97121588A TW200915419A TW 200915419 A TW200915419 A TW 200915419A TW 097121588 A TW097121588 A TW 097121588A TW 97121588 A TW97121588 A TW 97121588A TW 200915419 A TW200915419 A TW 200915419A
Authority
TW
Taiwan
Prior art keywords
gas
supply member
gas supply
processing
plasma
Prior art date
Application number
TW097121588A
Other languages
English (en)
Chinese (zh)
Other versions
TWI373805B (enExample
Inventor
Hirokazu Ueda
Masahiro Horigome
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200915419A publication Critical patent/TW200915419A/zh
Application granted granted Critical
Publication of TWI373805B publication Critical patent/TWI373805B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
TW097121588A 2007-07-10 2008-06-10 Plasma treating apparatus TW200915419A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007180546A JP2009021272A (ja) 2007-07-10 2007-07-10 プラズマ処理装置

Publications (2)

Publication Number Publication Date
TW200915419A true TW200915419A (en) 2009-04-01
TWI373805B TWI373805B (enExample) 2012-10-01

Family

ID=40228420

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097121588A TW200915419A (en) 2007-07-10 2008-06-10 Plasma treating apparatus

Country Status (3)

Country Link
JP (1) JP2009021272A (enExample)
TW (1) TW200915419A (enExample)
WO (1) WO2009008241A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014060378A (ja) * 2012-08-23 2014-04-03 Tokyo Electron Ltd シリコン窒化膜の成膜方法、有機電子デバイスの製造方法及びシリコン窒化膜の成膜装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07263354A (ja) * 1994-03-25 1995-10-13 Kobe Steel Ltd プラズマｃｖｄ膜の形成方法
JP3440714B2 (ja) * 1995-12-11 2003-08-25 ソニー株式会社 シリコン化合物系絶縁膜の成膜方法
JP3935731B2 (ja) * 2001-06-25 2007-06-27 三菱重工業株式会社 プラズマｃｖｄ装置及びクリーニング方法及び成膜方法
JP4689372B2 (ja) * 2005-07-04 2011-05-25 株式会社日立プラントテクノロジー スタッカクレーンの走行駆動制御方法

Also Published As

Publication number Publication date
JP2009021272A (ja) 2009-01-29
WO2009008241A1 (ja) 2009-01-15
TWI373805B (enExample) 2012-10-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees