TW200844677A - Image forming optical system, exposure equipment and device manufacturing method - Google Patents

Image forming optical system, exposure equipment and device manufacturing method Download PDF

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Publication number
TW200844677A
TW200844677A TW097101424A TW97101424A TW200844677A TW 200844677 A TW200844677 A TW 200844677A TW 097101424 A TW097101424 A TW 097101424A TW 97101424 A TW97101424 A TW 97101424A TW 200844677 A TW200844677 A TW 200844677A
Authority
TW
Taiwan
Prior art keywords
imaging
optical system
image
imaging optical
pattern
Prior art date
Application number
TW097101424A
Other languages
English (en)
Chinese (zh)
Inventor
Youhei Fujishima
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200844677A publication Critical patent/TW200844677A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW097101424A 2007-01-16 2008-01-15 Image forming optical system, exposure equipment and device manufacturing method TW200844677A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007006844 2007-01-16

Publications (1)

Publication Number Publication Date
TW200844677A true TW200844677A (en) 2008-11-16

Family

ID=39635832

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097101424A TW200844677A (en) 2007-01-16 2008-01-15 Image forming optical system, exposure equipment and device manufacturing method

Country Status (2)

Country Link
TW (1) TW200844677A (fr)
WO (1) WO2008087827A1 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151365A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101213831B1 (ko) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
CN103278912B (zh) * 2013-06-19 2015-07-08 中国科学院光电技术研究所 一种折反式紫外光刻物镜
CN104111515B (zh) * 2014-07-11 2016-09-28 中国科学院光电技术研究所 一种大数值孔径浸没式投影物镜

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4245286B2 (ja) * 2000-10-23 2009-03-25 株式会社ニコン 反射屈折光学系および該光学系を備えた露光装置
WO2005059654A1 (fr) * 2003-12-15 2005-06-30 Carl Zeiss Smt Ag Objectif utilise comme objectif de projection pour microlithographie dote d'au moins une lentille liquide
DE602005018648D1 (de) * 2004-07-14 2010-02-11 Zeiss Carl Smt Ag Katadioptrisches projektionsobjektiv
EP1852745A1 (fr) * 2006-05-05 2007-11-07 Carl Zeiss SMT AG Objectif de projection, haute résolution NA
DE102006038398A1 (de) * 2006-08-15 2008-02-21 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage

Also Published As

Publication number Publication date
WO2008087827A1 (fr) 2008-07-24

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