TW200843868A - Liquid treatment device - Google Patents

Liquid treatment device Download PDF

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Publication number
TW200843868A
TW200843868A TW97107861A TW97107861A TW200843868A TW 200843868 A TW200843868 A TW 200843868A TW 97107861 A TW97107861 A TW 97107861A TW 97107861 A TW97107861 A TW 97107861A TW 200843868 A TW200843868 A TW 200843868A
Authority
TW
Taiwan
Prior art keywords
liquid
substrate
developing
processing
treatment
Prior art date
Application number
TW97107861A
Other languages
English (en)
Chinese (zh)
Other versions
TWI343842B (cs
Inventor
Hiroshi Fukuda
Original Assignee
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Tech Corp filed Critical Hitachi High Tech Corp
Publication of TW200843868A publication Critical patent/TW200843868A/zh
Application granted granted Critical
Publication of TWI343842B publication Critical patent/TWI343842B/zh

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Liquid Crystal (AREA)
TW97107861A 2007-03-14 2008-03-06 Liquid treatment device TW200843868A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007064317A JP2008227195A (ja) 2007-03-14 2007-03-14 液処理装置

Publications (2)

Publication Number Publication Date
TW200843868A true TW200843868A (en) 2008-11-16
TWI343842B TWI343842B (cs) 2011-06-21

Family

ID=39845453

Family Applications (1)

Application Number Title Priority Date Filing Date
TW97107861A TW200843868A (en) 2007-03-14 2008-03-06 Liquid treatment device

Country Status (3)

Country Link
JP (1) JP2008227195A (cs)
CN (1) CN101266414A (cs)
TW (1) TW200843868A (cs)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010103131A (ja) * 2008-10-21 2010-05-06 Tokyo Electron Ltd 液処理装置及び液処理方法
JPWO2017164126A1 (ja) * 2016-03-25 2019-01-31 東レ株式会社 現像装置及び回路基板の製造方法
JP7042051B2 (ja) * 2017-09-21 2022-03-25 旭化成株式会社 現像装置及び現像方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3437702B2 (ja) * 1996-02-01 2003-08-18 大日本スクリーン製造株式会社 基板処理装置
JP2000114221A (ja) * 1998-10-02 2000-04-21 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2001255668A (ja) * 2000-03-10 2001-09-21 Matsushita Electric Ind Co Ltd 湿式処理方法及び装置
JP2002252200A (ja) * 2001-02-22 2002-09-06 Hitachi Electronics Eng Co Ltd 基板処理装置及び処理方法

Also Published As

Publication number Publication date
CN101266414A (zh) 2008-09-17
JP2008227195A (ja) 2008-09-25
TWI343842B (cs) 2011-06-21

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