200831239 (1) 九、發明說明 【發明所屬之技術領域】 本發明係相關於適合於平板顯示器以 造中所使用之玻璃面板削減裝置。 【先前技術】 液晶顯示器以及電漿顯示器等之平板 稱爲FPD )係多用在各種電子機器中，像 置或是電視接收影像器、行動電話之顯示 行開發以自發光而不需要背光源之具有優 之有機電致發光（EL )顯示器，將來之前 對於該FPD所要求之課題之一係爲薄 要求對於所搭載之電子機器之薄型化、小 例如，筆記型電腦以及行動電話中，更加 輕量化的要求，相隨於此造成對於FPD之 求。 另一方面，即使對於藉由在顯示面板 進行資訊輸入之觸控面板中，雖然由於_ 地普及，但是畢竟是搭載於行動電話般的 之故，因此需要薄型化。 在FPD以及觸控面板中佔去大部分3 板。於是，將玻璃面板予以薄化者係爲將 效果者。因此，如日本專利公開號第平-中，藉由在製造步驟之過程中將玻璃面标 及觸控面板之製200831239 (1) Description of the Invention [Technical Field] The present invention relates to a glass panel reducing device suitable for use in flat panel displays. [Prior Art] A flat panel such as a liquid crystal display and a plasma display is called an FPD. It is widely used in various electronic devices, such as a display or a television receiver, and a mobile phone display line is developed to self-illuminate without requiring a backlight. An excellent organic electroluminescence (EL) display, one of the issues required for the FPD in the future, is a thinner requirement for the thinning of electronic devices to be mounted, and for example, in notebook computers and mobile phones, it is lighter. The requirements that accompany this result in the FPD. On the other hand, even in the touch panel which performs information input on the display panel, since it is widely used, it is mounted on a mobile phone, and therefore it is required to be thinner. Most of the 3 boards are taken up in the FPD and the touch panel. Therefore, the glass panel is thinned to be effective. Therefore, as in the Japanese Patent Laid-Open No.--, the glass surface standard and the touch panel are manufactured by the manufacturing process.
顯示器（以下簡 :是電腦之顯示裝 部等中。最近進 異高速反應特性 景値得期待。 〖型化。薄型化係 型化、輕量化。 丨造成薄型化以及 :薄度與輕量的要 :上執行觸碰而可 •久性提升而繼續 f小型電子機器中 〖度者係爲玻璃面 〖製品薄型化最有 5-249422號公報 [表面予以蝕刻而 -5-Display (the following is simple: it is the display unit of the computer, etc. The recent high-speed response characteristics of the high-end response are expected. 〖Formation. Thinning system, light weight. 丨 Thinning and: thin and lightweight To: perform the touch and increase the durability and continue the f small electronic machine. The degree is the glass surface. The thinner product is the most popular. No. 5-249422 [The surface is etched and -5-
200831239 (2) 薄型化玻璃面板，藉此而薄化製品整體之, 被開發。 [曰本專利文獻1 ]日本專利公開號第 公報 【發明內容】 [發明所要解決之課題] 但是，關於使用於FPD以及觸控面板2 需要高度保持表面之平坦度。在表面平坦虔 之下，由於在凹凸部分處有光之微妙散亂之 發生顯示不規則以及視覺辨識性差的情形。 且，將玻璃面板削減而使其厚度薄化之 品之組合時將有原本不需要的步驟，但是由 完成之故，因此，以如前述公報所述之技柿 一性削減時有非常消耗時間的缺點。 本發明爲了解決上述問題，而提供一種 表面均一地以及高速地削減的實用技術，而 及觸控面板之薄型化有貢獻的技術。 [所要解決的課題的手段] 爲了解決上述課題，本發明之申請專利 爲一種玻璃面板削減方法，係爲將玻璃面 減之玻璃面板削減方法，該玻璃面板削減 嘴在平行於玻璃面板表面的轉動軸之周圍 度者之技術係 -5-249422 號 玻璃面板，係 惡劣而有凹凸 情事，因此會 步驟，對於製 於需要短時間 之下，進行均 可將玻璃面板 可對於FPD以 範圍第1項係 予以均一性削 法係爲，將噴 轉動，該噴嘴 -6· 200831239 (3) 係具有噴射孔，用以噴射出溶出液，該溶出液係用爲可將 玻璃面板表面之材料予以溶解，其中當該噴射孔對向於玻 璃面板之表面時，而進行使該被噴射出的溶出液沖擊玻璃 面板之表面，噴嘴轉動時，係使噴射孔正對向於玻璃面板 '之表面的時間點的該噴射孔之轉動方向係與玻璃面板移動 方向爲逆向而進行。 且，本發明之申請專利範圍第2項之玻璃面板削減方 A 法，係爲在該申請專利範圍第1項中，該玻璃面板之移動 係在沿著玻璃面板之表面的方向而向著對於該轉動軸爲垂 直的方向而直線移動。 且，本發明之申請專利範圍第3項之玻璃面板削減方 法，係爲在該申請專利範圍第2項中，該玻璃面板之移動 係使玻璃面板爲水平姿態，且使玻璃面板潮水平方向而直 線移動者。 且，本發明之申請專利範圍第4項之玻璃面板削減方 φ 法，係爲一種玻璃面板削減方法，係爲將玻璃面板予以均 一性削減之玻璃面板削減方法，其特徵在於：該玻璃面板 削減方法係爲，將噴嘴在平行於玻璃面板表面的轉動軸之 周圍而轉動，該噴嘴係具有噴射孔，用以噴射出溶出液， 該溶出液係用爲可將玻璃面板表面之材料予以溶解，其中 當該噴射孔對向於玻璃面板之表面時，而進行使該被噴射 出的溶出液沖撃玻璃面板之表面，噴嘴轉動時，係使噴射 孔正對向於玻璃面板之表面的時間點的該噴射孔之轉動方 向係與玻璃面板移動方向爲相同方向而進行。 200831239 (4) 且，爲解決上述課題，本發明之申請專利範圍第5項 ，係爲在該申請專利範圍第4項中，該玻璃面板之移動係 在沿著玻璃面板之表面的方向而向著對於該轉動軸爲垂直 的方向而直線移動。 * 且，爲解決上述課題，本發明之申請專利範圍第6項 _ ，係爲在該申請專利範圍第5項中，在削減時係使該玻璃 面板爲水平姿態而被支撐。 ^ 且，爲解決上述課題，本發明之申請專利範圍第7項 ，係爲在該申請專利範圍第2項中，該噴嘴轉動之轉動軸 係爲垂直方向，該玻璃面板之移動係爲使玻璃面板爲垂直 姿態而使玻璃面板朝向水平方向而直線移動。 且，爲解決上述課題，本發明之申請專利範圍第8項 ，係爲在該申請專利範圍第5項中，該噴嘴轉動之轉動軸 係爲垂直方向，且在削減時係使該玻璃面板爲垂直姿態而 被支撐。 φ 且，本發明之申請專利範圍第9項之發明，係爲一種 玻璃面板削減裝置，係爲將玻璃面板予以均一性削減之玻 璃面板削減裝置，其特徵在於：該玻璃面板削減裝置係具 有： 噴嘴，用爲向玻璃面板之表面噴射溶出液，該溶出液 係用爲可將玻璃面板表面之材料予以溶解；溶出液供給系 統，對噴嘴供給溶出液； 轉動機構，用爲使噴嘴在平行於玻璃面板方向之轉動 之周圍而轉動， -8- 200831239 (5) 該玻璃面板削減裝置係爲當藉由轉動機構而轉動噴嘴 時，用爲噴射溶出液之噴嘴的噴射孔對向於玻璃面板之表 面時，藉由使被噴射出之溶出液沖擊玻璃面板之表面而進 行削減，且， ^ 設置相對於噴嘴而移動玻璃面板之移動機構，該移動 - 機構在藉由該轉動機構而轉動噴嘴時，在噴射孔正對於玻 璃面板之表面的時間點下之轉動方向係與移動玻璃面板之 0 方向爲相反。 且，爲解決上述課題，本發明之申請專利範圍第10 項，係爲在該申請專利範圍第9項中，該移動機構係爲在 沿著玻璃面板表面的方向以相對於該轉動軸爲垂直之方向 而直線移動該玻璃面板。 且，爲解決上述課題，本發明之申請專利範圍第11 項，係爲在該申請專利範圍第1 〇項中，該移動機構係爲 使玻璃面板爲水平之姿態而使玻璃面板朝向水平方向而直 0 線移動。 且，本發明之申請專利範圍第12項之發明，係爲一 種玻璃面板削減裝置，係爲將玻璃面板予以均一性削減之 玻璃面板削減裝置，其特徵在於： 該玻璃面板削減裝置係具有： 噴嘴，用爲向玻璃面板之表面噴射溶出液，該溶出液 係用爲可將玻璃面板表面之材料予以溶解； 溶出液供給系統，對噴嘴供給溶出液； 轉動機構，用爲使噴嘴在平行於玻璃面板方向之轉動 -9 - 200831239 (6) 之周圍而轉動， 該玻璃面板削減裝置係爲當藉由轉動機構而轉動噴嘴 時，用爲噴射溶出液之噴嘴的噴射孔對向於玻璃面板之表 面時，藉由使被噴射出之溶出液沖擊玻璃面板之表面而進 行削減， 且’設置相對於噴嘴而移動玻璃面板之移動機構，該 移動機構在藉由該轉動機構而轉動噴嘴時，在噴射孔正對 p 於玻璃面板之表面的時間點下之轉動方向係與移動玻璃面 板之方向爲相反。 且，爲解決上述課題，本發明之申請專利範圍第13 項，係爲在該申請專利範圍第1 2項中，該移動機構係爲 在沿著玻璃面板表面的方向以相對於該轉動軸爲垂直之方 向而直線移動該玻璃面板。 且，爲解決上述課題，本發明之申請專利範圍第14 項，係爲在該申請專利範圍第1 3項中，係設置有一噴嘴 φ 支撐機構，用以將正被削減之該玻璃面板以水平姿態而支 撐。 且，爲解決上述課題，本發明之申請專利範圍第15 項，係爲在該申請專利範圍第1 〇項中，該噴嘴之轉動方 向係爲垂直方向，該移動機構係爲使玻璃面板爲垂直姿態 而使玻璃面板朝向水平方向而直線移動。 且，爲解決上述課題，本發明之申請專利範圍第16 項，係爲在該申請專利範圍第1 3項中，係設置有噴嘴支 撐機構，係以該噴嘴轉動之轉動軸爲垂直方向，而將正被 -10 - 200831239 (7) 削減之該玻璃面板以垂直姿態而被支撐。 且，爲解決上述課題’本發明之申請專利範圍第1 7 項，係爲在該申請專利範圍第9至1 6項中任一項，該噴 嘴係爲朝該轉動軸方向而爲長度方向，該噴射孔係沿著該 ' 噴嘴之長度方向而複數均等地設置。 ' 且，爲解決上述課題，本發明之申請專利範圍第1 8 項，係爲在該申請專利範圍第9至1 7項中任一項，該噴 φ 射孔係沿著包圍該轉動軸之周圍面而被複數均等地設置。 且，本發明之申請專利範圍第1 9項之發明，係爲一 種平板顯示器，係爲具有至少一個之透明玻璃面板的平板 顯示器，該玻璃面板係藉由使可將玻璃面板表面之材料予 以溶出之溶出液予以沖撃之硏磨處理而將厚度削減，其中 5 該硏磨處理係爲使具有噴射孔之噴嘴在平行於玻璃面 板表面之轉動軸之周圍轉動而噴射孔對向於玻璃面板表面 φ 時，使被噴射出之溶出液沖撃玻璃面板表面，且 在噴嘴轉動時，在噴射孔正對向於玻璃面板表面的時 間點時該噴射孔之轉動方向係與玻璃面板被移動之方向爲 逆向而進行處理， 藉由該硏磨處理，而使平坦度爲最大粗糙度係0.5微 米以下者。 [發明之功效] 經由以下之說明，藉由本發明之各申請專利範圍，而 11 - 200831239 (8) 可對於玻璃面板表面實施均一性以及高速地削減。 【實施方式】 [用爲實施本發明的較佳型態] 說明關於實施本發明之較佳型態（以下稱爲實施型態 )° 首先，說明第一實施型態。圖1係關於第一實施型態 0 的玻璃面板削減方法的槪略圖。此方法係爲將使溶出玻璃 面板1表面的溶出液L面向玻璃面板1之表面而噴射以沖 撃所進行之方法。此方法，係藉由溶出液而將所謂溶出之 化學作用以及所謂沖撃之物理作用予以倂用，與只浸泡於 飩刻液或是散佈於蝕刻液之鈾刻相比在本質上係爲不同。 且，溶出液L因爲係以大壓力而被噴射出，藉由自身的重 力，以隨著加速度之狀態而沖撃玻璃面板1之表面。 在本實施型態的方法中，係使用具有噴射孔20之噴 φ 嘴2，且一邊旋轉該噴嘴2，一邊進行削減。噴嘴2係爲 圓筒形之導管狀，如圖1所示，旋轉軸A係與噴嘴2之中 心軸一致。噴嘴20係沿著噴嘴2之周面（包圍中心軸之 周狀面）而被複數設置。 且，玻璃基板1，在削減時，係成爲保持水平之姿態 。且，玻璃面板1，在削減時，在水平方向而爲直線移動 。在本實施型態中，玻璃面板1係被承載於搬送滾體上， 而在保持水平姿態下而直線移動。 噴嘴之長度方向，係與玻璃面板1之寬度方向（對於 -12- 200831239 Ο) 移動方向係爲垂直之方向）相一致。噴嘴2之長度相較於 玻璃面板1之寬度係稍長。 且，噴嘴2係沿著玻璃面板2之移動方向而等間隔地 被複數設置’且該噴嘴係夾著玻璃面板1之移動線而設置 於兩側。在該實施型態中，因爲玻璃面板1係沿著保持水 平姿態之水平線而移動，因此噴嘴2係被上下設置。 如圖1所示，噴嘴2轉動的同時，而自噴射孔將溶出 φ 液射出，玻璃面板1係通過兩側噴嘴2之中間位置而直線 移動。此時，轉動方向與直線移動方向係爲相反。更正確 地說，如圖1所示，在噴射孔20正對向於玻璃面板1之 表面的時候的該噴射孔之轉動方向係與直線移動之方向， 爲相互逆向。 藉由自上下噴嘴2所射出之溶出液L而被沖擊之玻璃 面板1之表面，被溶出液所溶出，且藉由溶出液L之沖擊 而爲流出。藉此，玻璃面板1之上下兩面係同時被削減， 而使玻璃面板1之厚度變薄。 作爲溶出液L，係例如使用氫氟酸而予以適當稀釋而 使用。對於氫氟酸，係爲例如對於水以1 0至5 0 %程度（ 體積百分比）而稀釋使用。噴嘴2之噴射孔20在正對向 於玻璃基板1時之噴射孔2 0與玻璃基板1之表面之距離 爲5 mm至1 50mm，藉由在玻璃基板1表面上之溶出液L 而施以沖擊壓力〇.5kg/cm2至3.5 kg/cm2，自轉動軸起始 之噴射孔20爲止的轉動半徑爲5 0mm至100mm，噴嘴2 之轉動速度爲1至20rpm爲佳，玻璃基板1之移動速度以 -13- 200831239 (10) 100mm/分至1000mm/分程度爲佳。在此條件下而進行削減 時，係可以每秒〇.〇8至0.8微米程度之厚度而削減。因此 ，噴嘴2在以均等位置而配置，削減後之玻璃基板1之表 面的最大粗糙度可在〇·5微米以下，而進行優異平坦性的 削減。 * 且，在玻璃基板1之兩側需要進行相同速度下之削減 時，在下側之噴嘴2處的噴射壓力相較於在上側之噴嘴2 _ 之噴射壓力係爲較強，亦有在玻璃基板1之兩側處施以相 同壓力。 接著，說明關於在實施該實施型態之方法時所使用之 玻璃面板削減裝置之第一實施型態。圖2，係關於第一實 施型態之玻璃面板削減裝置之正面切面槪要圖，圖3係表 示圖2之玻璃面板削減裝置之側面切面槪要圖。 圖2以及圖3所示之玻璃面板削減裝置，係具有：噴 嘴2，用以將可溶出玻璃基板1之表面材料之溶出液L對 φ 向於玻璃基板1之表面而射出；將溶出液L供給至噴嘴2 之溶出液供給系統21 ;以及轉動機構5，用以將噴嘴2在 平行於玻璃基板1之表面的方向的轉動軸之周圍而轉動。 該玻璃面板削減裝置，爲了將像是氫氟酸之強酸作爲 溶出液L而使用，因此最好係在密閉削減處理的容器內進 行而具有處理艙室4·噴嘴2係設置在處理艙室4內。噴嘴 2中，係設置有供給溶出液L之溶出液供給系統2 1 . 處理艙室4係具有：將玻璃面板1搬入之搬入口 41; 在肖J1減後將玻璃基板1搬出之搬出口 42.搬入口 41以及搬 -14- 200831239 (11) 出口 42，係以封鎖閘門43而可開閉。且，該開閉係將封 鎖閘門43在上下方向而移動。 且，圖2與圖3所示的裝置，係具有搬送機構3〇，用 以將玻璃基板1以水平姿態以及水平方向而搬送。搬送機 ' 構3 0係由沿著水平搬送線而被配置的多數搬送滾體3所 ' 構成。搬送線係通過搬入口 4 1以及搬出口 42而被設定， 玻璃基板1係在自搬入口 4 1而被搬入而進行削減之後， φ 而可爲自搬出口 42被搬出。由此說明可清楚，搬送機構 3〇係兼用爲：在削減時將玻璃基板1保持水平姿態之機構 ;以及將玻璃基板1水平直線移動之機構。 接著，說明關於噴嘴2之構成。 如圖3所示，噴嘴2係爲在玻璃基板1之寬度方向之 長形體。因此，噴嘴2係作爲全體爲圓管狀（其切面係爲 圓形管狀）。噴嘴2係具有一在設置於噴孔20的位置處 有突起。突起之先端係作爲開口，該開口係作爲噴射孔 φ 20. 如圖2所示，噴射口 20係在中心軸之周圍之圓周方 向均等的被設置。在本實施型態中，噴射孔2 0之大小以 及形狀係皆爲相等，而在圓周方向處以90度之間隔而設 置4個噴射孔20. 且，如圖3所示，噴射孔20即使在噴嘴2之長度方 向（中心軸方向）亦複數均等地設置。在長度方向，噴射 孔20之大小以及形狀係皆相等，而均等間隔地被設置。 且，並列於周圍方向之四個噴射孔20之組成，係對 -15- 200831239 (12) 於在長度方向中相鄰合的其他噴射孔之組成以4 5度相離 的位置而設置。即，四個噴射孔20之組成，係在長度方 向以每個分離45度之位置（相互不同的位置）而被設置 的構造而成。於是，自某一噴射孔20之組成，相隔一組 而相鄰之噴射孔20 (相鄰的相鄰噴射孔20 )，在周圍方 向的位置係成爲相同。 上述構造係爲一例，其他構造亦可。例如，亦可使相 鄰合的噴射孔之組成爲個別分離3 0度的位置。此時，自 某一噴射孔20之組成係爲與相隔二組而相鄰的噴射孔20 在周圍方向爲相同的位置。且，如果在周圍方向爲有三個 噴射孔20則相隔12〇度，亦可爲相鄰合噴射孔20之組成 爲每個分離60度的位置、每個分離40度之位置、每個分 離30度之位置等亦可。 各噴射孔20，係以對於噴嘴2之長度方向爲傾斜的方 向的長形物。關於傾斜方向，可爲在噴嘴2之長度方向爲 例如4 5度。 如此之噴嘴係如圖2所示，沿著搬送方向（玻璃面板 1之長度方向）而相隔均等間隔而被複數設置。且，可同 時削減玻璃面板1之兩側之表面，噴嘴2係夾住搬送線而 上下設置。如圖2所示，各噴嘴2之配置位置係在上下方 向而爲相同位置。 溶出液供給系統2 1係包含用以供給溶出液L之配管 2 1 1，該配管2 1 1係以液體密閉的方式而貫通處理艙室4 之器壁。配管211之前端係經由圓環接合體（r〇tary j0int -16- 200831239 (13) )而連接各噴嘴2之一端。溶出液L係通過圓環接合體而 自配管而流入至噴嘴2之內部。 且’噴嘴2之另一端部係閉合，在此端部係被轉動機 構5之軸（shaft) 51而固定。雖然轉動機構5之詳細並 未圖示出’但是例如被各軸5 1所固定之齒輪以及被馬達 之出力軸所固定之齒輪所鍊結，而在驅動馬達之情形下， 而採用轉動各軸5 1之機構。 | 溶出液供給系21係由以下所構成：儲存溶出液l之 液體儲存體213;用以連接液體儲存體與各噴嘴2之該配 管2 1 1 ;設置於配管2 1 1上之閥2 1 4以及傳送液體閥。自 供給之溶出液L而除去不純物以及垃圾等之過濾器以及調 壓用閥等，是需要而可被設置。 且，如圖2所示，處理艙室4之底部係爲漏斗狀，最 下部處係設置有排出孔44.在排出孔44處，係連接有將使 用完畢之溶出液L排出之排出管45·如上述，將玻璃面板 φ 1之表面材料予以溶化之溶出液L，係落下至處理艙室4 之底部，而通過排出孔44以及排出管45而被排出。 且，處理艙室4之內壁面以及處理艙室4內之各部件 之表面，係爲由對溶出液L具有耐藥品性者而構成。例如 ’溶出液L爲氫氟酸時，內壁面以及各部件之表面係由覆 蓋（coating)如鐵氟龍（杜邦公司之商標）之氫氟酸樹脂 所構成。且，用爲開閉搬入口 41以及搬出口 42之封鎖閘 門43，係爲進行使溶出液L不會漏出之液體閉合封鎖。 接著，說明關於該裝置之動作。 -17- 200831239 (14) 玻璃面板1係藉由搬送機構30而經過搬送口 4i而搬 入至處理艙室4內。玻璃面板1係在處理艙室4內被設置 於這一邊的搬送線上的待機位置。因此，封鎖閘門4 3爲 關閉之後，溶出液供給系21開始動作，藉由送液幫浦2 1 5 • 而將溶出液L供給至各個噴嘴2，藉由送液幫浦215之送 * 液壓力而將溶出液自噴射孔2〇噴射出。因此，轉動機構5 動作而使各噴嘴2轉動。各噴嘴2之轉動方向爲相同，且 φ 轉動速度亦爲相同。 在此狀態下，搬送機構30再次動作，而開始玻璃面 板之移動，而使玻璃面板1水平地移動。在移動的過程中 ，玻璃基板1係通過轉動的上下噴嘴2之間。此時，來自 噴嘴而被射出的送液施力將沖擊玻璃基板1之上下表面， 而以前述之方式而削減表面。 玻璃基板1係通過並排於搬送方向的上下噴嘴2之間 ，在此過程中而進行削減。而在通過全部之噴嘴2之間的 φ 時候，而結束削減。之後，搬送機構3 0將玻璃基板1停 止於搬出口 42之該邊的待機位置。溶出液L之噴射爲停 止而噴嘴2之轉動爲停止之後，搬出口 42之封鎖閘門43 被打開，而搬送機構3 0再次動作而使玻璃基板1自搬出 口 42而被搬出。之後，玻璃基板1將進行用爲洗流殘留 於表面之溶出液的洗淨處理。 該實施型態之裝置，係專注於對於噴嘴2之形狀以及 配置之方式，而高速進行均一性的削減處理。關於此點， 使用圖4而說明。圖4係表示關於在噴嘴2中之噴射孔2 0 -18- 200831239 (15) 之配置以及其作用。 如前述，玻璃基板1之表面之各點，在當轉動噴嘴2 之噴射孔20對象於玻璃基板1之表面時，而接收溶出液 L之沖撃，而被削減。如圖4，而表示自一個噴嘴2而被 噴射出之溶出液L。溶出液L係自噴射孔20而以錐狀（ 或是喇叭狀）而變寬。因爲各噴射孔20係對於如前述的 噴嘴2之長度方向而朝傾斜方向而爲長，因此溶出液L亦 | 爲在該方向爲長而變廣。於是，在沖擊玻璃基板1之表面 時之溶出液L之寬度之輪廓（以下稱爲沖擊圖樣，係以圖 4之虛線L1至L3而表示）亦與噴射孔20之輪廓爲近似 形狀。且，在圖4中，爲方便說明，而說明當噴射孔20 正對象玻璃基板1之表面時之沖撃圖樣。 如前述，在本實施型態中，在噴嘴2之長度方向的相 鄰合噴嘴2之組，其周圍方向之位置係爲相差45度。爲 說明方便，而使周圍方向之位置關係相同的噴射孔20之 φ 組作爲第一噴射孔組群20a，而相對於此周圍方向之位置 關係爲45度相異的噴射孔20之組係作爲第二噴射孔組群 2 Ob.且，在各組群之噴射孔20中，將周圍方向之一個位 置的噴射孔20設定爲0度位置，接收而爲90度位置， 180度位置，270度位置。 圖4中，使第一噴射孔組群20a之0度位置噴射孔20 正對向於玻璃基板1之表面而進行溶出。此時之沖撃圖樣 係爲L1，自此狀態而使噴嘴2轉動45度時，此時，第二 噴射孔組群20b之0度位置之噴射孔20係正對向於玻璃 -19- 200831239 (16) 基板1之正面，藉此而使玻璃基板1之表面被削減。此時 之沖擊圖樣係爲L2.進一步使噴嘴2轉動45度，此時，第 一噴射孔組群20a之90度位置之噴射孔20係正對向於玻 璃基板1之表面，如此而進行溶出。此時之沖撃圖樣係爲 * L3.反覆上述動作，而使第一第二噴射孔組群20a、20b之 ' 噴射孔20交互地正對向於玻璃基板1之表面而進行溶出 〇 φ 爲了說明至玻璃基板1之表面的溶出液之總供給量之 說明，爲方便，而使玻璃基板1爲靜止。在使玻璃基板1 爲靜止時，來自各組群之噴射孔20所射出之溶出液L雖 然係沖擊至相同處，爲說明方便，以時間單位爲縱軸（橫 軸係爲玻璃面板之寬度方向位置），在圖4中而描述變換 爲平面之狀態。且，藉由沖撃圖樣之溶出液L之總供給量 之分佈La係在圖4中一倂表示。此分佈La係爲玻璃基板 1之寬度方向（噴嘴之長度方向）所見到的圖。 φ 藉由圖4所示各沖擊圖樣而瞭解，在玻璃基板1之表 面之各點中，在噴射孔20正對向時設置爲該正面（設置 爲噴射孔20之正下處）之點P 1自該噴射孔20雖然只接 受溶出液L之供給，但是在自此而稍微脫離的位置點P2 處，而接收來自鄰接二個之組群之噴射孔20之溶出液L 之供給。由上述說明可知，並非同時接收，而係在某一時 間點自第一噴射孔組群20a之噴射孔20而接收供給之後 ，而在進行4 5度轉動時接收來自第二噴射孔組群2 0b之 噴射孔20之供給。 -20- 200831239 (17) 接受來自二個組群20a、20b之噴射孔20之溶出液L 之供給之點P2係相當於溶出液L之變寬部分中之周邊部 。在該點P 2中，與位於噴射孔之正面位置處的點P 1相比 ，其自一個之噴射孔20所供給之溶出液L之量係爲少。 但是，隨著轉動，因爲接收自鄰接之噴射孔20之溶出液 之供給，因此時間累積之溶出液L之總供給量係約等於正 面位置點P 1者。此狀態係如圖4圖形所示。且，Li係表 φ 示自一個噴射孔20組所供給之溶出液L之總量分佈。 如前述，實際上玻璃基板1因爲係水平方向移動’而 如圖4所示之溶出液L之總供給量係以移動方向而分配。 於是，藉由對於噴嘴2之轉動速度之適當速度下而移動玻 璃基板1，在玻璃基板1之表面之各點將接受均等之溶出 液供給。藉此而進行均一的削減。 且，各噴射孔20對於玻璃基板1之移動方向而在傾 斜的方向處爲長的這一點，對於均一性削減係有其貢獻。 φ 以下說明該點。 本發明之各噴射孔20即使以單純的圓形或是方形亦 可實施。但是，此時，爲了使不在該玻璃基板1之表面中 噴射孔之正面位置之點亦爲均一性削減之故，在溶出液L 之變寬部位之周邊部處，溶出液L使爲重疊狀態而進行沖 撃係爲必要。且，噴嘴2之轉動結果，來自相鄰合之噴射 孔20之溶出液L使爲重複而非對於單一點供給，不經由 噴嘴之轉動，而通常係使溶出液L爲重疊者係爲必要。 但是，經由本發明之發明者之硏究，當溶出液L之變 -21 - 200831239 (18) 寬部分爲重疊時，由於重疊部分而使溶出液L 有溶出液L散亂、飛散、不規則流動之發生。 由於溶出液L而使玻璃基板1之表面狀極爲不 法均一性削減。另一方面，如本實施型態，噴t 方向處使變常時，溶出液L之變寬部分不會重 噴嘴之轉動，經轉動而可接收溶出液L之供給 間累積之溶出液L之總供給量在玻璃基板1之 φ 而爲均一。 且，噴嘴2之轉動方向以及直線移動方向 點，係用爲對高速化削減處理的貢獻。關於此 5而說明。圖5中，係爲關於達成使轉動方向 動方向爲反向之效果的表示槪要圖。 如前述，在本實施型態中，噴嘴2係轉動 對向於玻璃基板1之表面時，而使溶出液L沖 1之表面。此時，因爲噴射孔20亦轉動且成爲 % 基板1之表面的狀態，因此自噴射孔20所噴 液L之變寬部分亦轉動，而使得成爲沖擊玻璃 面的狀態。於是，理論上，沖擊玻璃基板1之 沖擊壓力係爲藉由來自噴射孔20之噴射的壓 轉動力矩之壓力之合計。 因此，在轉動與直線移動爲相同方向時， 所示，玻璃基板1係沿著溶出液L之轉動力矩 ，轉動力矩中平行於玻璃基板1之表面的部分 璃基板1之移動係成爲相同的方向）而進行， 相碰撞，而 結果，造成 均勻，而無 觜2之傾斜 疊，且藉由 ，而使經時 表面各點處 爲相反的此 點，使用圖 以及直線移 ，而在噴嘴 擊玻璃基板 對向於玻璃 射出之溶出 基板1之表 溶出液L之 力以及藉由 如圖5 ( 1 ) (嚴格來說 ，相對於玻 玻璃基板1 -22-200831239 (2) The thinned glass panel is used to thin the entire product and was developed. [Patent Document 1] Japanese Patent Laid-Open Publication No. Japanese Patent Application Publication No. JP-A No.---- Under the flat surface 虔, the occurrence of irregularities and poor visibility is caused by the occurrence of subtle scatter of light at the concavo-convex portions. In addition, when the combination of the glass panel is reduced and the thickness of the glass panel is reduced, there is a step which is not originally required, but since it is completed, it is very time consuming when the technique is reduced as described in the above publication. Shortcomings. In order to solve the above problems, the present invention provides a practical technique in which the surface is uniformly and rapidly reduced, and a technique in which the thickness of the touch panel is reduced. [Means for Solving the Problem to Be Solved] In order to solve the above problems, the patent application of the present invention is a glass panel reduction method, which is a glass panel reduction method for reducing a glass surface to be rotated parallel to a surface of a glass panel. The technical system of the shaft is the No. 5-249422 glass panel, which is bad and has irregularities. Therefore, the steps can be made for the short time, and the glass panel can be used for the FPD. The homogenous cutting method is to rotate the spray, and the nozzle -6·200831239 (3) has an injection hole for ejecting a solution for dissolving the material on the surface of the glass panel. Wherein, when the injection hole is opposed to the surface of the glass panel, the ejected liquid that is ejected is struck against the surface of the glass panel, and when the nozzle is rotated, the ejection hole is directed to face the surface of the glass panel The direction of rotation of the injection hole is reversed from the direction in which the glass panel moves. Further, in the glass panel reduction method of the second aspect of the present invention, in the first aspect of the patent application, the movement of the glass panel is directed to the direction along the surface of the glass panel. The rotating shaft moves in a straight line in a vertical direction. The method for reducing the glass panel according to the third aspect of the present invention is the second aspect of the patent application, wherein the movement of the glass panel causes the glass panel to be in a horizontal posture and the glass panel is horizontally oriented. Straight mover. Further, the glass panel reduction method of the fourth aspect of the invention is a glass panel reduction method, and is a glass panel reduction method for uniformly reducing a glass panel, characterized in that the glass panel is reduced. The method is that the nozzle is rotated around a rotation axis parallel to the surface of the glass panel, the nozzle has an injection hole for ejecting the eluent, and the eluent is used to dissolve the material of the surface of the glass panel. Wherein, when the injection hole is opposed to the surface of the glass panel, the ejected liquid is sprayed onto the surface of the glass panel, and when the nozzle is rotated, the injection hole is directed to face the surface of the glass panel. The direction of rotation of the injection hole is performed in the same direction as the direction in which the glass panel moves. 200831239 (4) In order to solve the above problem, the fifth aspect of the patent application of the present invention is that in the fourth item of the patent application, the movement of the glass panel is directed in the direction along the surface of the glass panel. The linear axis moves in a direction perpendicular to the axis of rotation. In order to solve the above problem, the sixth aspect of the present invention is in the fifth aspect of the patent application, in which the glass panel is supported in a horizontal posture during the reduction. In order to solve the above problem, the seventh aspect of the invention is in the second item of the patent application, in which the rotation axis of the nozzle is perpendicular, and the movement of the glass panel is glass. The panel is in a vertical posture and the glass panel is moved linearly in the horizontal direction. In order to solve the above problems, the eighth aspect of the invention is in the fifth aspect of the invention, in which the rotation axis of the nozzle is perpendicular, and the glass panel is Supported by a vertical posture. The invention of claim 9 is a glass panel reducing device which is a glass panel reducing device for uniformly reducing a glass panel, characterized in that the glass panel reducing device has: The nozzle is used for spraying the eluate onto the surface of the glass panel, the eluate is used to dissolve the material on the surface of the glass panel; the eluent supply system supplies the eluate to the nozzle; and the rotating mechanism is used to make the nozzle parallel to Rotating around the direction of rotation of the glass panel, -8- 200831239 (5) The glass panel reducing device is used to align the nozzle with the nozzle for ejecting the eluate when the nozzle is rotated by the rotating mechanism. At the time of the surface, the ejected liquid ejected against the surface of the glass panel is cut, and the moving mechanism that moves the glass panel with respect to the nozzle is provided, and the moving mechanism rotates the nozzle by the rotating mechanism. The direction of rotation of the injection hole at the time point of the surface of the glass panel is 0 in the direction of the moving glass panel. Anti. In order to solve the above problems, the tenth item of the present invention is in the ninth aspect of the patent application, wherein the moving mechanism is perpendicular to the rotation axis in the direction along the surface of the glass panel. Move the glass panel in a straight line in the direction. In order to solve the above problems, the eleventh aspect of the patent application of the present invention is that in the first aspect of the patent application, the moving mechanism is such that the glass panel is horizontal and the glass panel is oriented horizontally. Straight 0 line moves. Further, the invention of claim 12 is a glass panel reducing device which is a glass panel reducing device for uniformly reducing a glass panel, wherein the glass panel reducing device has: a nozzle For spraying the eluate onto the surface of the glass panel, the eluate is used to dissolve the material on the surface of the glass panel; the eluent supply system supplies the eluate to the nozzle; and the rotating mechanism is used to make the nozzle parallel to the glass Rotation of the panel direction -9 - 200831239 (6), the glass panel reducing device is used to rotate the nozzle by the rotating mechanism, and the ejection hole used as the nozzle for ejecting the eluate is opposed to the surface of the glass panel When the ejected ejected liquid hits the surface of the glass panel, the movement is reduced, and the moving mechanism for moving the glass panel with respect to the nozzle is provided. When the moving mechanism rotates the nozzle by the rotating mechanism, the jetting is performed. The direction of rotation of the hole at p at the time of the surface of the glass panel is opposite to the direction of moving the glass panelIn order to solve the above problems, the thirteenth aspect of the present invention is in the fifteenth aspect of the patent application, wherein the moving mechanism is in a direction along the surface of the glass panel with respect to the rotation axis. Move the glass panel in a straight line in the vertical direction. In order to solve the above problems, the 14th item of the present invention is in the thirteenth item of the patent application, in which a nozzle φ support mechanism is provided for leveling the glass panel being cut. Supported by posture. In order to solve the above problems, the fifteenth aspect of the patent application of the present invention is that in the first aspect of the patent application, the rotation direction of the nozzle is a vertical direction, and the moving mechanism is to make the glass panel vertical. The posture causes the glass panel to move linearly in the horizontal direction. In order to solve the above problems, the 16th aspect of the patent application of the present invention is characterized in that in the thirteenth item of the patent application, the nozzle supporting mechanism is provided, wherein the rotation axis of the nozzle rotation is a vertical direction, and The glass panel being cut by -10 - 200831239 (7) is supported in a vertical posture. Further, in order to solve the above-mentioned problem, the first aspect of the patent application scope of the present invention is any one of the ninth to sixteenth aspects of the patent application, wherein the nozzle is in the longitudinal direction toward the rotation axis direction. The injection holes are equally provided in plural along the length direction of the 'nozzle. In order to solve the above problems, the first application of the present invention is in the ninth aspect of the invention, and the φ perforating system is along the axis surrounding the rotation axis. The surrounding faces are equally set in plural. Further, the invention of claim 19 of the present invention is a flat panel display which is a flat panel display having at least one transparent glass panel which is formed by dissolving a material of a surface of the glass panel. The eluate is subjected to a honing treatment to reduce the thickness, wherein the honing treatment is such that the nozzle having the ejection hole rotates around the rotation axis parallel to the surface of the glass panel and the ejection hole faces the surface of the glass panel When φ, the ejected liquid is washed out of the surface of the glass panel, and when the nozzle is rotated, the direction of rotation of the ejecting hole and the direction in which the glass panel is moved when the ejection hole is facing the surface of the glass panel The treatment is carried out in the reverse direction, and the flatness is set to a maximum roughness of 0.5 μm or less by the honing treatment. [Effects of the Invention] By the following description, by the respective patent application scopes of the present invention, 11 - 200831239 (8), it is possible to perform uniformity and high-speed reduction on the surface of the glass panel. [Embodiment] [Best Mode for Carrying Out the Invention] A preferred embodiment for carrying out the invention (hereinafter referred to as an embodiment) is described. First, a first embodiment will be described. Fig. 1 is a schematic view showing a method of reducing a glass panel of the first embodiment. This method is a method in which the eluent L on the surface of the glass substrate 1 is sprayed toward the surface of the glass panel 1 by spraying. This method uses the so-called dissolution chemical action and the so-called physical action of the sputum by the eluent, which is essentially different from the uranium engraving which is only immersed in the engraving liquid or dispersed in the etching liquid. . Further, since the eluate L is ejected with a large pressure, the surface of the glass panel 1 is washed with the state of acceleration by its own weight. In the method of the present embodiment, the spray nozzle 2 having the injection hole 20 is used, and the nozzle 2 is rotated while being cut. The nozzle 2 is in the form of a cylindrical duct. As shown in Fig. 1, the axis of rotation A coincides with the axis of the nozzle 2. The nozzle 20 is provided in plural along the circumferential surface of the nozzle 2 (circumferential surface surrounding the central axis). Further, when the glass substrate 1 is cut, it is maintained in a horizontal posture. Further, when the glass panel 1 is cut, it moves linearly in the horizontal direction. In the present embodiment, the glass panel 1 is carried on the conveying roller and linearly moved while maintaining the horizontal posture. The length direction of the nozzle coincides with the width direction of the glass panel 1 (for the direction of the movement of the -12-200831239 Ο). The length of the nozzle 2 is slightly longer than the width of the glass panel 1. Further, the nozzles 2 are plurally arranged at equal intervals along the moving direction of the glass panel 2, and the nozzles are provided on both sides with the moving line of the glass panel 1 interposed therebetween. In this embodiment, since the glass panel 1 is moved along the horizontal line that maintains the horizontal posture, the nozzle 2 is placed up and down. As shown in Fig. 1, while the nozzle 2 is rotating, the eluted φ liquid is ejected from the ejection orifice, and the glass panel 1 is linearly moved by the intermediate position of the nozzles 2 on both sides. At this time, the direction of rotation is opposite to the direction of linear movement. More specifically, as shown in Fig. 1, when the injection hole 20 is opposed to the surface of the glass panel 1, the direction of rotation of the injection hole and the direction of linear movement are opposite to each other. The surface of the glass panel 1 which is impacted by the eluted liquid L emitted from the upper and lower nozzles 2 is eluted by the eluate and flows out by the impact of the eluent L. Thereby, the upper and lower sides of the glass panel 1 are simultaneously reduced, and the thickness of the glass panel 1 is made thin. The eluent L is appropriately diluted and used, for example, using hydrofluoric acid. For hydrofluoric acid, it is used, for example, for dilution of water in an amount of about 10 to 50% by volume. The distance between the injection hole 20 of the nozzle 2 facing the glass substrate 1 and the surface of the glass substrate 1 is 5 mm to 150 mm, and is applied by the eluent L on the surface of the glass substrate 1. The impact pressure 〇5kg/cm2 to 3.5 kg/cm2, the radius of rotation from the injection hole 20 starting from the rotating shaft is 50 mm to 100 mm, the rotation speed of the nozzle 2 is preferably 1 to 20 rpm, and the moving speed of the glass substrate 1 It is preferably -13-200831239 (10) 100mm/min to 1000mm/min. When the reduction is performed under these conditions, it can be reduced by a thickness of about 8 to 0.8 μm per second. Therefore, the nozzles 2 are disposed at equal positions, and the maximum roughness of the surface of the glass substrate 1 after the reduction is 〇·5 μm or less, and the flatness is excellent. * When the reduction of the same speed is required on both sides of the glass substrate 1, the injection pressure at the nozzle 2 on the lower side is stronger than that on the nozzle 2 _ on the upper side, and there is also a glass substrate. Apply the same pressure to both sides of the 1st. Next, a first embodiment of a glass panel reducing device used in carrying out the method of the embodiment will be described. Fig. 2 is a front cross-sectional view showing a glass panel reducing device of the first embodiment, and Fig. 3 is a side cross-sectional view showing the glass panel reducing device of Fig. 2. The glass panel reducing device shown in FIG. 2 and FIG. 3 has a nozzle 2 for ejecting the eluted liquid L of the surface material of the soluble glass substrate 1 toward the surface of the glass substrate 1; and eluating the liquid L The eluent supply system 21 supplied to the nozzle 2; and the rotating mechanism 5 for rotating the nozzle 2 around the rotation axis in a direction parallel to the surface of the glass substrate 1. In order to use a strong acid such as hydrofluoric acid as the eluent L, the glass panel reducing device is preferably provided in a container for sealing reduction treatment, and has a processing chamber 4 and a nozzle 2 installed in the processing chamber 4. The nozzle 2 is provided with an eluent supply system 2 1 for supplying the eluent L. The processing chamber 4 has a transfer inlet 41 for loading the glass panel 1 and a transfer port 42 for removing the glass substrate 1 after the Xiao J1 is removed. The entrance 41 and the transfer-14-200831239 (11) exit 42 are opened and closed by blocking the shutter 43. Further, the opening and closing system moves the lock shutter 43 in the vertical direction. Further, the apparatus shown in Fig. 2 and Fig. 3 has a transport mechanism 3A for transporting the glass substrate 1 in a horizontal posture and a horizontal direction. The conveyor mechanism 30 is constituted by a plurality of transporting rollers 3 disposed along the horizontal transport line. The transport line is set by the carry-in port 4 1 and the transfer port 42. After the glass substrate 1 is carried in and removed from the inlet 4 1 , φ can be carried out from the outlet 42 . From this, it is clear that the transport mechanism 3 is also used as a mechanism for maintaining the glass substrate 1 in a horizontal posture during the reduction, and a mechanism for horizontally moving the glass substrate 1 in a straight line. Next, the configuration of the nozzle 2 will be described. As shown in Fig. 3, the nozzle 2 is an elongated body in the width direction of the glass substrate 1. Therefore, the nozzle 2 has a circular tubular shape as a whole (the cut surface is a circular tubular shape). The nozzle 2 has a projection at a position provided at the injection hole 20. The tip end of the projection serves as an opening which serves as an injection hole φ 20. As shown in Fig. 2, the injection port 20 is equally disposed in the circumferential direction around the central axis. In the present embodiment, the size and shape of the injection holes 20 are equal, and four injection holes 20 are provided at intervals of 90 degrees in the circumferential direction. And, as shown in FIG. 3, the injection holes 20 are even The longitudinal direction of the nozzle 2 (the direction of the central axis) is also equally set. In the longitudinal direction, the size and shape of the injection holes 20 are equal, and are equally spaced. Further, the composition of the four injection holes 20 juxtaposed in the peripheral direction is set at a position where the other injection holes adjacent to each other in the longitudinal direction are separated by 45 degrees from -15 to 200831239 (12). Namely, the composition of the four injection holes 20 is configured such that the longitudinal direction is provided at positions separated by 45 degrees (different positions from each other). Then, from the composition of a certain injection hole 20, the adjacent injection holes 20 (adjacent adjacent injection holes 20) are arranged in the same direction in the circumferential direction. The above structure is an example, and other structures are also possible. For example, the composition of the adjacent injection holes may be made to separate the positions of 30 degrees. At this time, the composition of one of the injection holes 20 is the same position as the injection holes 20 adjacent to the two groups in the circumferential direction. Moreover, if there are three injection holes 20 in the surrounding direction and are separated by 12 degrees, the composition of the adjacent injection holes 20 may be a position of 60 degrees for each separation, a position of 40 degrees for each separation, and each separation 30. The location of the degree can also be. Each of the injection holes 20 is an elongated object that is inclined in the longitudinal direction of the nozzle 2. Regarding the tilt direction, it may be, for example, 45 degrees in the longitudinal direction of the nozzle 2. As shown in Fig. 2, the nozzles are plurally arranged at equal intervals in the transport direction (the longitudinal direction of the glass panel 1). Further, the surfaces of both sides of the glass panel 1 can be simultaneously cut, and the nozzle 2 is placed up and down with the conveyance line interposed therebetween. As shown in Fig. 2, the positions of the respective nozzles 2 are at the same position in the upper and lower directions. The eluent supply system 2 1 includes a pipe 2 1 1 for supplying the eluent L, and the pipe 2 1 1 penetrates the wall of the treatment chamber 4 in a liquid-tight manner. The front end of the pipe 211 is connected to one end of each nozzle 2 via a ring joint body (r〇tary j0int -16 - 200831239 (13)). The eluted liquid L flows into the inside of the nozzle 2 from the pipe through the annular joint. Further, the other end portion of the nozzle 2 is closed, and the end portion is fixed by a shaft 51 of the rotating mechanism 5. Although the details of the rotating mechanism 5 are not illustrated, 'for example, the gears fixed by the respective shafts 51 and the gears fixed by the output shaft of the motor are coupled, and in the case of driving the motor, the respective shafts are rotated. 5 1 agency. The eluent supply system 21 is composed of a liquid storage body 213 storing the eluate 1, a pipe 2 1 1 for connecting the liquid storage body and each nozzle 2, and a valve 2 1 provided on the pipe 2 1 1 4 and transfer liquid valve. It is necessary to provide a filter for removing impurities, garbage, and the like from the supply of the eluted liquid L. Further, as shown in FIG. 2, the bottom of the processing chamber 4 is funnel-shaped, and the lowermost portion is provided with a discharge hole 44. At the discharge hole 44, a discharge pipe 45 for discharging the used eluted liquid L is connected. As described above, the eluted liquid L which melts the surface material of the glass panel φ 1 is dropped to the bottom of the processing chamber 4, and is discharged through the discharge hole 44 and the discharge pipe 45. Further, the inner wall surface of the treatment chamber 4 and the surface of each member in the treatment chamber 4 are configured to have chemical resistance to the eluent L. For example, when the eluent L is hydrofluoric acid, the inner wall surface and the surface of each member are composed of a hydrofluoric acid resin such as Teflon (trademark of DuPont). Further, the blocking gates 43 for opening and closing the inlet 41 and the outlet 42 are closed to close the liquid which does not leak the eluted liquid L. Next, the operation of the device will be described. -17- 200831239 (14) The glass panel 1 is carried into the processing chamber 4 through the transfer port 4i by the transport mechanism 30. The glass panel 1 is placed in the processing chamber 4 at a standby position on the transport line on this side. Therefore, after the blocking gate 43 is closed, the eluent supply system 21 starts to operate, and the eluent L is supplied to each nozzle 2 by the liquid supply pump 2, and the liquid supply pump 215 supplies the liquid The eluate is ejected from the ejection holes 2 by pressure. Therefore, the rotation mechanism 5 operates to rotate the respective nozzles 2. The direction of rotation of each nozzle 2 is the same, and the rotational speed of φ is also the same. In this state, the conveying mechanism 30 operates again, and the movement of the glass panel is started, and the glass panel 1 is horizontally moved. During the movement, the glass substrate 1 passes between the upper and lower nozzles 2 which are rotated. At this time, the liquid feeding force from the nozzle is applied to impinge on the upper and lower surfaces of the glass substrate 1, and the surface is reduced as described above. The glass substrate 1 is placed between the upper and lower nozzles 2 in the transport direction, and is reduced in the process. When the φ between all the nozzles 2 is passed, the cut is ended. Thereafter, the transport mechanism 30 stops the glass substrate 1 at the standby position of the side of the outlet 42. After the ejection of the eluate L is stopped and the rotation of the nozzle 2 is stopped, the blocking gate 43 of the outlet 42 is opened, and the conveying mechanism 30 is operated again to move the glass substrate 1 from the outlet 42 and carry it out. Thereafter, the glass substrate 1 is subjected to a washing treatment for eluting the residue remaining on the surface. The apparatus of this embodiment focuses on the shape and arrangement of the nozzles 2, and performs uniformity reduction processing at high speed. This point will be described using FIG. 4. Fig. 4 is a view showing the arrangement of the injection holes 2 0 -18 to 200831239 (15) in the nozzle 2 and the action thereof. As described above, each point on the surface of the glass substrate 1 is cut while receiving the ejection of the eluent L when the ejection hole 20 of the rotary nozzle 2 is applied to the surface of the glass substrate 1. As shown in Fig. 4, the eluted liquid L which is ejected from one nozzle 2 is shown. The elution liquid L is widened from the injection hole 20 in a tapered shape (or a flared shape). Since each of the injection holes 20 is long in the oblique direction with respect to the longitudinal direction of the nozzle 2 as described above, the eluate L is also elongated in the direction. Then, the outline of the width of the eluted liquid L (hereinafter referred to as the impact pattern, indicated by the broken lines L1 to L3 in Fig. 4) when striking the surface of the glass substrate 1 is also approximately the same as the outline of the injection hole 20. Further, in FIG. 4, a punching pattern when the ejection hole 20 is the surface of the object glass substrate 1 will be described for convenience of explanation. As described above, in the present embodiment, the positions of the adjacent nozzles 2 in the longitudinal direction of the nozzle 2 are different from each other by 45 degrees. For convenience of explanation, the group of φ of the injection holes 20 having the same positional relationship in the peripheral direction is the first injection hole group 20a, and the group of the injection holes 20 having a positional relationship of 45 degrees with respect to the peripheral direction is used as the second. In the injection hole group 20 of each group, the injection hole 20 at one position in the peripheral direction is set to a position of 0 degree, and is received at a position of 90 degrees, a position of 180 degrees, and a position of 270 degrees. In FIG. 4, the 0-degree position injection hole 20 of the first injection hole group 20a is opposed to the surface of the glass substrate 1 to be eluted. At this time, the punching pattern is L1, and when the nozzle 2 is rotated by 45 degrees from this state, at this time, the injection hole 20 at the 0 degree position of the second injection hole group 20b is directly opposite to the glass-19-200831239 (16). The front surface of the substrate 1 is thereby made to reduce the surface of the glass substrate 1. The impact pattern at this time is L2. Further, the nozzle 2 is rotated by 45 degrees. At this time, the injection holes 20 at the 90-degree position of the first injection hole group 20a are directly opposed to the surface of the glass substrate 1, and are thus eluted. At this time, the punching pattern is * L3. In response to the above operation, the ejection holes 20 of the first and second ejection orifice groups 20a and 20b are alternately opposed to the surface of the glass substrate 1 to be eluted. The total supply amount of the eluate on the surface of the glass substrate 1 is described as being convenient, and the glass substrate 1 is made stationary. When the glass substrate 1 is stationary, the eluted liquid L emitted from the injection holes 20 of each group is impacted at the same place, and for convenience of explanation, the time unit is the vertical axis (the horizontal axis is the width direction of the glass panel). Position), the state of being transformed into a plane is described in FIG. Further, the distribution La of the total supply amount of the eluate L by the punching pattern is shown in Fig. 4 . This distribution La is a view seen in the width direction of the glass substrate 1 (the longitudinal direction of the nozzle). φ is understood by the respective impact patterns shown in FIG. 4, and at each point of the surface of the glass substrate 1, when the injection holes 20 are facing each other, the point P (which is disposed directly below the injection holes 20) is set. In the injection hole 20, only the supply of the elution liquid L is received. However, at the position P2 which is slightly separated therefrom, the supply of the eluted liquid L from the injection holes 20 of the adjacent two groups is received. As apparent from the above description, it is not received at the same time, but is received from the injection holes 20 of the first injection hole group 20a at a certain point in time, and is received from the second injection hole group 20b when the rotation is 45 degrees. 20 supply. -20- 200831239 (17) The point P2 at which the supply of the eluent L from the injection holes 20 of the two groups 20a and 20b is received corresponds to the peripheral portion in the widened portion of the eluent L. At this point P 2 , the amount of the eluted liquid L supplied from one of the injection holes 20 is smaller than the point P 1 located at the front position of the injection hole. However, with the rotation, since the supply of the eluate from the adjacent injection holes 20 is received, the total supply amount of the eluate L accumulated over time is approximately equal to the positive position point P1. This state is shown in the graph of Figure 4. Further, the Li system table φ shows the total amount distribution of the elution liquid L supplied from one group of the injection holes 20. As described above, in actuality, the glass substrate 1 is shifted in the horizontal direction, and the total supply amount of the eluent L as shown in Fig. 4 is distributed in the moving direction. Then, by moving the glass substrate 1 at an appropriate speed for the rotational speed of the nozzle 2, equal supply of the eluate is supplied at each point on the surface of the glass substrate 1. This will result in a uniform reduction. Further, each of the injection holes 20 is long in the direction in which the glass substrate 1 moves in the direction of inclination, and contributes to the uniformity reduction system. This point is explained below φ. Each of the injection holes 20 of the present invention can be implemented even in a simple circular or square shape. However, in this case, in order to reduce the uniformity of the position of the front surface of the injection hole which is not on the surface of the glass substrate 1, the elution liquid L is overlapped at the peripheral portion of the widened portion of the eluted liquid L. It is necessary to carry out the flushing system. Further, as a result of the rotation of the nozzle 2, the eluate L from the adjacent injection holes 20 is repeated rather than supplied to a single point, and does not pass through the rotation of the nozzle, and it is usually necessary to make the eluate L overlap. However, according to the study by the inventors of the present invention, when the wide portion of the eluate L--21-200831239 (18) is overlapped, the eluate L has an eluted liquid L scattered, scattered, and irregular due to the overlapping portion. The occurrence of the flow. The surface of the glass substrate 1 is extremely unevenly uniform due to the elution liquid L. On the other hand, as in the present embodiment, when the spray t direction is made constant, the widened portion of the eluate L does not rotate the nozzle, and the total amount of the eluate L accumulated between the supply of the eluent L can be received by the rotation. The supply amount is uniform in the φ of the glass substrate 1. Further, the rotation direction of the nozzle 2 and the direction of the linear movement direction are used to contribute to the speed reduction processing. Explain about this 5. Fig. 5 is a schematic view showing an effect of achieving a direction in which the direction of rotation is reversed. As described above, in the present embodiment, when the nozzle 2 is rotated against the surface of the glass substrate 1, the surface of the eluent L is flushed. At this time, since the injection hole 20 is also rotated and becomes the surface of the % substrate 1, the widened portion of the liquid L ejected from the ejection hole 20 is also rotated to be in a state of impacting the glass surface. Thus, theoretically, the impact pressure of the impingement glass substrate 1 is the sum of the pressures of the pressing rotational moments by the ejection from the injection holes 20. Therefore, when the rotation and the linear movement are in the same direction, the glass substrate 1 is shown as the rotational direction of the elution liquid L, and the movement of the partial glass substrate 1 parallel to the surface of the glass substrate 1 in the rotational moment becomes the same direction. And proceeding, colliding, and as a result, causing uniformity without the slanting stack of 觜2, and by using the point at which the points on the time-lapse surface are opposite, using the map and the straight line shift, and hitting the glass at the nozzle The force of the substrate opposite to the surface eluent L of the eluted substrate 1 ejected by the glass is as shown in Fig. 5 (1) (strictly speaking, relative to the glass substrate 1-22)
200831239 (19) 藉由轉動力矩而不對抗沖撃壓力 動係藉由轉動力矩而成爲使沖擊 體之沖撃壓力減少。另一方面， 的時候，如圖5(2)所示，玻拜 液L之轉動力矩的狀態下而進f 爲加上藉由玻璃基板1之移動白 如藉由本實施型態之構成，利用 地削減處理。 且，因爲直線移動係相對性 靜止，對此即使當噴嘴2爲直鶴 述效果。由上述說明可知，此時 之表面爲正對向之時點時的該噴 與噴嘴2之直線移動之方向爲相 進行玻璃基板1之直線移動以及 亦可。當與噴射孔正對向於玻璃 噴射孔20之轉動方向相逆向地 而使噴嘴以與該轉動方向相同的 構成，而進一步提高沖擊壓力。 如上述，如藉由本實施型態 之玻璃基板1之表面最大粗糙g 2之配置、形狀或是噴射壓力g 最大粗糙度爲〇·1微米以下。g 裝置可適當地使用在FPD或是· 實施型態之方法以及裝置，爲7 。於是，玻璃基板1之移 壓力減少的狀態，而使整 在轉動與直線移動爲反向 基板1在對抗沖撃之溶出 ，而整體之沖擊壓力變得 壓力。另一方面，因此， 噴嘴2之轉動而可以高速 者，因此使玻璃基板1爲 :移動時，可得到相同的上 ，在噴射孔與玻璃基板1 射孔2 0之轉動方向，係 I同的方向。藉由此情形， 噴嘴2之直線移動等兩者 基板1之表面時點下之該 直線移動玻璃基板1時， 方向而直線移動。藉由此 :之方法以及裝置，削減後 ί可爲0.5微米以下，噴嘴 I爲可適當選定，因此可使 3此，實施型態之方法以及 i控面板之製造上。藉此該 ‘具有高平坦性的削減後表 -23- 200831239 (20) 面，因此亦可進行硏磨。 且，上述實施型態之裝置，係以夾住搬送線而上下地 設置噴嘴2，而同時對於水平姿態的玻璃基板1之兩面（ 上下兩面）進行削減處理，亦可只在上側設置噴嘴2，只 " 在下側設置噴嘴2，只在側面進行削減處理。且，噴嘴2 * 不一定在沿著搬送方向而被複數個設置，亦可以只有一個 噴嘴2. φ 接著，說明關於第二實施型態之玻璃面板削減方法。 圖6係關於第二實施型態之玻璃面板削減方法之槪要圖。 在前述之第一實施型態中，其係使玻璃基板1爲水平 姿態而進行削減處理，但是如圖6所示，在該第二實施型 態中，係將玻璃基板1爲垂直（鉛直）姿態而進行削減處 理。玻璃基板1係以原來之垂直姿態而藉由搬送機構3 0 而爲水平方向之移動。 因此，噴嘴2亦將其長度方向以垂直方式而設置，面 φ 向水平方向而射出溶出液而構成。噴嘴2係設置於玻璃基 板1之兩側（左右）。 即使在本實施型態中，雖然各個噴嘴2係在沿著長度 方向之轉動軸之周圍而轉動，但是因爲長度方向係爲垂直 方向之故，轉動軸係爲垂直方向。因此，各噴嘴之轉動方 向係爲：噴射孔20正對向於玻璃基板1之表面的時間點 下之該噴射孔20之轉動方向與玻璃基板1之水平移動方 向爲逆向之方向。 即使藉由此構成，可得到與前述第一實施型態之方法 24- 200831239 (21) 相同之效果。該第二實施型態之情形，對向於玻璃基板1 之兩側而以相同壓力而沖擊溶出液係爲容易。因此，對於 玻璃基板1之兩側之面同時以同樣的速度而削減之情形係 爲特別好之構成。 圖7係爲關於第二實施型態之玻璃面板削減裝置之正 * 面切面槪要圖，圖8係爲圖7所示之玻璃面板削減裝置之 側面切面槪要圖，圖9係爲圖7所示之玻璃基板削減裝置 由上所示之平面槪要圖。 如圖7至圖9，即使在該實施型態，可爲在處理艙室 2內而進行削減處理。因此，玻璃基板1係在削減處理時 保持水平姿態而藉由搬送機構3 0而被搬送，而在搬送之 中被安置而設置於處理艙室內而進行削減處理。 且’在該實施型態中，玻璃基板1係已被保持於面板 支持機構6內之狀態而被搬送。圖1 〇係爲圖7所示之面 板支持機構6之斜視槪要圖。如圖10所示，面板支持機 φ 構6係與玻璃基板1大約垂直地直立之支持用構件。面板 支持構件6主要係由：水平姿態之頭部板6 1 ;站立設置於 • 頭部板61之支柱62 ;安裝於支柱之緩衝機構66所構成。 . 支柱62係個別設置於細長的長方形頭部板6 1之角端 部’共計設置4個。沿著頭部板6 1之長邊方向係設置有 延伸的樑部件64，連接各支柱62之上端而補強面板支持 機構6.各支柱62係較被直立的玻璃基板i在高度上略高 。頭部板6 1之短邊中之二個支柱62之間隔係較玻璃基板 1之厚度爲稍微大。在頭部板61之長邊方向中的二個支柱 -25- 200831239 (22) 6 2之間隔係較玻璃基板1之長度爲稍微長。玻璃基板1在 此些支柱62所產生之空間而被插入而被支撐。 緩衝機構66係爲與玻璃基板1直接接觸的部件，而 爲使玻璃基板1不會搖晃的部件。緩衝構件66係爲由對 於溶出液L爲不會腐蝕（耐藥性者）之材料所形成，例如 ^ 係由鐵氟龍（杜邦公司之商標）之氟元素樹脂所形成。 如圖10所示，緩衝機構66係爲在基板61之長邊方 φ 向之兩端處連接各支柱62之下端而被設置，在相同的長 邊方向之兩端處係連接支柱6 2之上端。被支持的玻璃基 板1係與該些緩衝機構66在角部相接觸。與玻璃基板1 之下端角部相接觸之下側緩衝機構66其短邊方向之切面 部分爲凹狀而長邊方向的切面形狀爲L字型。與玻璃基板 1之上端端部相擋接的緩衝機構66係爲短邊方向之切面形 狀爲橫的凹狀體。如圖1 〇所示，在接合玻璃基板1時， 自上而插入而使落入於各緩衝機構66之凹部。 φ 上述作爲搬送支持機構6之搬送機構，即使在本實施 型態，如圖7所示，亦採用藉由搬送滾體3者。此外，亦 可藉由齒輪及小齒條機構。即，固定於面板支持機構6之 下面部，取代各搬送滾體3而配置小齒輪亦可。 在圖7與圖9中雖然係省略噴嘴之圖式，但是如圖8 ，在處理艙室4內係配置有噴嘴2.在本實施型態中，如圖 8與圖9所示，沿著垂直於搬送方向的水平方向而設定複 數個搬送線。噴嘴2係爲了同時削減各搬送線上之玻璃基 板1之兩側而設置於各搬送線之兩側。在本實施型態中， -26- 200831239 (23) 三個搬送線係設定於處理艙室4內，而在其兩側係設置噴 嘴2.位於各搬送線之間的噴嘴2因爲係對於兩側之玻璃基 板1而倂用爲削減處理，因此在對於搬送線的垂直方向處 係如圖8所示而設置四個之噴嘴2而構成。 說明沿著各搬送線而搬送玻璃面板之構成。爲方便說 明，在圖8中左側之搬送線上而被搬送之玻璃面板係作爲 玻璃基板1 a ;在中央搬送線上而被搬送之玻璃面板係作爲 φ 玻璃基板1 b ;在右側之搬送線上而被搬送的玻璃面板係作 爲玻璃基板1 c。且，在左側之搬送線上搬送玻璃基板1 a 之搬送滾體係作爲搬送滾體3 a ;中央之搬送線上搬送玻璃 基板lb之搬送滾體係作爲中央搬送滾體3b ;右側之搬送 線上而搬送玻璃基板1 c之搬送滾體係作爲左搬送滾體3 c 如圖8所示，各搬送滾體3a、3b、3c係在上下而夾 住玻璃面板1 a、1 b、1 c而轉動，藉由向指定的方向轉動 φ 而構成。且，各搬送滾體3a、3b、3c其輪部係自軸部突 出而設置有梯度。面板支撐機構6係在該梯度上而落入， 在此狀態下而搬送玻璃基板la、lb、lc。 各噴嘴2之形狀以及構造雖與前述第一實施型態相同 者，但是各噴嘴2之轉動方向係以各噴射孔20正對玻璃 基板1之表面的時候之該噴射孔20之轉動方向爲與玻璃 基板1直線移動方向爲相反的方向。以下’說明關於該點 。爲說明方便，而以四個噴嘴自左依序，即，2a、2b、2c -27- 200831239 (24) 首先，說明藉由該搬送滾體3a、3b、3c而搬送之方 向。在三個群之搬送滾體3a、3b、3c中，左搬送滾體3a 與右搬送滾體3c係以相同之方向而搬送玻璃基板la、lc ，而中央搬送滾體3b係爲以不同之方向而搬送。例如， ' 如圖8所示，左搬送滾體3a與右搬送滾體3c係以垂直貫 ' 穿圖8之紙面而自上而下搬送玻璃基板la、lc，而中央搬 送滾體3b係爲以垂直貫穿圖8紙面而自下而上搬送玻璃 基板lb·在圖9所不平面圖中，玻璃基板la、lc係自左而 右被搬送，而玻璃基板lb係自右而左相左搬送。且，如 圖8所示在搬送滾體3a、3b、3c之各群中，在上下而視 之時，上側之搬送滾體以及下側之搬送滾體係相互逆向而 轉動。 因此，如圖8與圖9所示，在四個噴嘴2a至2d中， 噴嘴2a與噴嘴2c係爲相同之方向，噴嘴2b與噴嘴2d係 爲與該爲反向地轉動。玻璃基板1 a至1 c係爲以該方向而 φ 搬送時，如圖9所示，噴嘴2a與噴嘴2c係以順時針轉動 ，而噴嘴2b、2d係以逆時針而轉動。 藉此，各玻璃基板la至lc藉由搬送滾體3a至3c而 被搬送時，在噴射孔正對於玻璃基板1 a至1 c之表面 的時間點時的該噴嘴20之轉動方向係爲與玻璃基板la至 1 c之直線移動方向爲逆向。 溶出液供給系統2 1以及處理艙室4之構成以及其他 部分之構成係與第一實施型態爲同樣。在該第二實施型態 中，與第一實施型態相同，削減後之玻璃基板1之表面的 -28- 200831239 (25) 最大粗糙度可爲〇. 5微米以下，噴嘴2之設置以 適當地選擇噴射壓力其最大粗糙度可爲0.1微米 ，實施型態之方法以及裝置，在FPD以及觸控面 中可被適當地使用。 在該實施型態中，係以與搬送方向相垂直之 而設定三個搬送線，四個或是四個以上亦可。設 方向相互不同，且與此相配合，噴嘴1之轉動係 0 相互逆向的話，可增設無論多少之搬送線。且， 2被兼用於兩側搬送線之玻璃基板1之削減處理 因爲構造簡化以及零件數量減少之下而使裝置成 優點。但是，對於兩側之搬送線上之玻璃基板1 理不要兼用單個噴嘴而設置個別專用之噴嘴亦可 且，在第二實施型態中，在三個搬送線中， 室4設置方向轉換機構而作爲連續搬送亦可。此 玻璃基板1在處理艙室4內被三次削減處理。亦 φ 轉換機構設置於處理艙室4之外部而在處理艙室 使搬送線被連結。 各實施型態之削減處理並非只適用於作爲組 是觸控面板之前述構件之玻璃基板1(即，玻璃 組裝過程中亦可適用。 即，在FPD以及觸控面板中，使用大玻璃板 作複數個製品可被較佳地進行。例如，在液晶顯 造中，使用一對大的玻璃基板，而可爲製作作爲 之製品的液晶顯示器之構造（ITO電極、濾色器 及形狀在 以下。即 板之製造 水平方向 定爲搬送 爲設定爲 一個噴嘴 ，係可有 本降低之 之削減處 〇 在處理艙 時，一個 可將方向 4之外而 合FPD或 板），在 :而同時製 示器之製 各個領域 等）。因 •29- 200831239 (26) 此，在貼合玻璃基板之後，針對各領域予以切割而得到個 別之製品。 此時，本實施型態之削減處理，適合以切割前之大的 玻璃基板之狀態而進行。在對於大的玻璃基板而進行之下 * ，因爲係爲了個別製品之製作而總括地進行削減處理，因 ' 此可提高生產性。此時，爲了進行一對玻璃基板爲貼合後 之削減處理，被溶出液噴射的標的係在被貼合之玻璃基板 φ 之外側面。 對於不是作爲材料之玻璃板，在製造步驟之過程以及 製造之最終步驟下而進行削減處理時，而因爲溶出液L觸 碰的問題發生之處可使用遮罩貼帶予以覆蓋。 且，在該實施型態中，噴嘴2之噴射孔20雖係等間 隔而被設置，此處，係複數均等地設置之一例。在噴射孔 之大小設爲不同的時候，因應於此亦可適當變更間隔。所 謂「複數均等」只是由被射出之溶出液L之玻璃基板1之 φ 表面的沖撃壓力爲均等而複數設置之意思。 且，在上述實施型態中，雖然玻璃面板或是噴嘴之移 動係爲直線移動，但是亦有不直線移動之情形。例如，亦 可以對於靜止噴嘴而使玻璃面板爲水平姿態而在水平面內 於垂直的轉動軸之周圍轉動以進行削減。 且，在如第二實施型態而使玻璃基板1爲垂直姿態而 進行削減處理時，在玻璃基板1爲大型化時，用爲支撐玻 璃基板1之構成以及移動機構之構成亦爲大，技術性困難 將增加，而如第一實施型態而將玻璃基板1爲水平姿態而 -30- 200831239 (27) 進行削減處理時，用爲支持以及移動之機構將爲容易。 接著，說明FPD之發明的實施型態。 圖1 1係爲關於實施型態FPD之切面槪要圖。圖1 1所 示者，係爲作爲FPD之一例的液晶顯示器。圖11所示之 FPD係爲將一對玻璃基板1以封止部1 2而貼合。在一對 ' 玻璃基板1之內部中，作爲構成光透過控制部者，係爲形 成於其中之一個的玻璃基板1之內部的電極（像素電極、 Φ 共同電極等）11、被封入之液晶13。在另一個的玻璃基板 1之內面處係形成有濾色器14.光透過控制部之構成本身 係與習知之液晶顯示器者相同。 圖1 1所示之FPD之特徵點，係在於一對玻璃基板1 之各個的外側面100係爲藉由硏磨處理而硏磨者。硏磨處 理因爲係使用前述各實施型態之削減裝置而進行，因此省 略其說明。該實施型態之FPD之較大特徵點在於，藉由進 行如前述之硏磨處理，而得到外面部100具有0.5微米以 φ 下之平坦性。 在說明關於平坦性時，係將圖1 1予以擴大表示，在 外面部100之中，最頂部101以及最低部102之間的距離 係爲平坦性。此値係在表面粗糙度之測定中係相當於最大 粗糙度（Rm ax )之測定。係由來自若干個公司之可測定最 大粗糙度之表面粗糙計被販賣，其中適當地選擇以測定該 外面部1 〇〇之平坦性。經由本發明者之硏究，藉由進行上 述硏磨處理，因爲在一個之玻璃基板1之厚度爲在〇.5mm 以下之故，因此可得到〇 · 5微米以下之平坦性（Rmax )， -31- 200831239 (28) 而達成薄形化、輕量化且提供無顯示斑點之高性能 在使用上述削減裝置時，在使用將噴嘴2之形狀等 一步最佳化之下亦可實現0.1微米以下之平坦性， 步爲佳。 且，如此之平坦性，亦有與進行硏磨處理前之 板1之外面部之平坦性爲相同程度之情形，此時， 減厚度係亦不會損害其平坦性。 在該例中，最大粗糙度雖作爲平坦性，亦可將 平均粗糙度（Ra )作爲平坦性。此時，係尋求關於 100之凹凸之平均高度，以該高度爲基準而求得各 高度差之決定値平均。此時，因爲亦有可測定中心 粗糙度（Ra )之表面粗糙量測器在販賣，因此可予 。而且，在中心線平均粗糙度之情形中，可提供〇. 以下的無顯示斑點之FPD，而可藉由該外部機械硏 而達成如前述之平坦性。 且，在該說明中，雖採用液晶顯示器，即使在 示器以外之FPD，例如，電漿顯示器或是有機EL ，表面電場顯示器等亦可同樣的實施。本發明可適 部具備有具有相當於顯示部之大小之至少一個之玻 之 FPD 〇 且，在習知之技術說明中，係將FPD以及觸控 以分開說明，但是觸控面板亦有進行資訊顯示，而 一種FPD。於是，在本發明之申請專利範圍中，平 器係包含有觸控面板。 FPD。 予以進 而進一 玻璃基 即使削 中心線 外面部 凹凸之 線平均 以使用 3微米 磨處理 液晶顯 顯示器 用於全 璃面板 面板予 可掌握 板顯示 -32- 200831239 (29) 【圖式簡單說明】 圖1係爲關於第一實施型態之玻璃面板之削減方法之 槪要圖。 圖2係關於第一實施型態之面板削減裝置之正面切面 槪要圖。 圖3係圖2所示之玻璃面板削減裝置之側面切面槪要 圖。 圖4係關於圖2之噴射孔20之配置之作用所示之平 面槪要圖。 圖5係關於轉動方向與直線移動方向爲相反者在效果 上所示之槪要圖。 圖6係關於第二實施型態之玻璃面板削減方法之槪要 圖。 圖7係關於第二實施型態之玻璃面板削減裝置之正面 切面槪要圖。 圖8係圖7所示之玻璃面板削減裝置之側面切面槪要 圖。 圖9係圖7所示玻璃面板削減裝置由上視之之平面槪 要圖。 圖1 〇係圖7所示之面板支持機構6之斜視槪要圖。 圖1 1係關於實施型態之FPD之切面槪要圖。 【主要元件符號說明】 1 :玻璃面板 -33- 200831239 (30) 2 :噴嘴 2 0 :噴射孔 2 1 :溶出液供給系統 3 :搬送滾體 30 :搬送機構 4 :處理艙室 5 :轉動機構 A A :轉動軸 L :溶出液200831239 (19) By rotating the torque without against the punching pressure The moving system reduces the punching pressure of the impact body by the turning moment. On the other hand, as shown in Fig. 5 (2), in the state of the rotational moment of the glass liquid L, f is added by the movement of the glass substrate 1, as in the configuration of the present embodiment, and is utilized. Ground reduction processing. Moreover, since the linear movement is relatively stationary, even when the nozzle 2 is in a straightforward manner. As is apparent from the above description, the direction in which the surface of the jet and the nozzle 2 moves linearly when the surface is at the time of the opposite direction is a linear movement of the glass substrate 1. The impact pressure is further increased by making the nozzle reverse in the direction in which the injection hole is opposed to the glass injection hole 20 in the same direction as the rotation direction. As described above, the arrangement, shape, or ejection pressure g maximum roughness of the surface maximum roughness g 2 of the glass substrate 1 of the present embodiment is 〇·1 μm or less. g The device can be suitably used in the FPD or the implementation method and device, 7 . Then, the shifting pressure of the glass substrate 1 is reduced, and the entire rotation and the straight line are moved in the opposite direction. The substrate 1 is eluted against the punching, and the overall impact pressure becomes a pressure. On the other hand, since the rotation of the nozzle 2 can be performed at a high speed, the glass substrate 1 can be obtained in the same manner, and the same direction can be obtained in the rotation direction of the injection hole and the perforation 20 of the glass substrate 1. direction. In this case, when the glass substrate 1 is moved by the straight line at the time of the surface of the substrate 1 by the linear movement of the nozzle 2, the direction moves linearly. According to the method and the apparatus, the reduction can be 0.5 μm or less, and the nozzle I can be appropriately selected, so that the method of the embodiment and the manufacture of the i-control panel can be performed. Therefore, the ‘reduced flatness -23- 200831239 (20) with high flatness can be used for honing. Further, in the above-described embodiment, the nozzle 2 is placed up and down by sandwiching the transport line, and both surfaces (upper and lower surfaces) of the glass substrate 1 in the horizontal posture are cut, and the nozzle 2 may be provided only on the upper side. Only " is provided on the lower side of the nozzle 2, and only the side is cut. Further, the nozzles 2* are not necessarily provided in plurality along the transport direction, and only one nozzle may be provided. φ Next, a method of reducing the glass panel according to the second embodiment will be described. Fig. 6 is a schematic view showing a method of reducing a glass panel of the second embodiment. In the first embodiment described above, the glass substrate 1 is subjected to a reduction process in a horizontal posture. However, as shown in FIG. 6, in the second embodiment, the glass substrate 1 is vertical (vertical). The posture is reduced and processed. The glass substrate 1 is moved in the horizontal direction by the transport mechanism 30 in the original vertical posture. Therefore, the nozzle 2 is also formed such that its longitudinal direction is perpendicular, and the surface φ is ejected in a horizontal direction. The nozzles 2 are disposed on both sides (left and right) of the glass substrate 1. Even in the present embodiment, each of the nozzles 2 rotates around the rotation axis in the longitudinal direction, but since the longitudinal direction is the vertical direction, the rotation axis is the vertical direction. Therefore, the rotation direction of each nozzle is such that the direction of rotation of the injection hole 20 at a time point when the injection hole 20 is opposed to the surface of the glass substrate 1 is opposite to the horizontal movement direction of the glass substrate 1. Even with this configuration, the same effects as the method of the first embodiment described above 24-200831239 (21) can be obtained. In the case of the second embodiment, it is easy to impinge on the elution liquid at the same pressure against both sides of the glass substrate 1. Therefore, the case where the both sides of the glass substrate 1 are simultaneously reduced at the same speed is particularly preferable. 7 is a front view of a glass panel reducing device of the second embodiment, and FIG. 8 is a side sectional view of the glass panel reducing device shown in FIG. 7, and FIG. 9 is FIG. The illustrated glass substrate reduction device is illustrated by the plane shown above. As shown in Figs. 7 to 9, even in this embodiment, the reduction process can be performed in the process chamber 2. Therefore, the glass substrate 1 is conveyed by the transport mechanism 30 while maintaining the horizontal posture during the reduction process, and is placed in the process chamber during the transfer and is subjected to the reduction process. Further, in this embodiment, the glass substrate 1 is conveyed while being held in the panel supporting mechanism 6. Fig. 1 is a perspective view of the swash plate support mechanism 6 shown in Fig. 7. As shown in Fig. 10, the panel supporting mechanism 6 is a supporting member that is vertically erected approximately perpendicularly to the glass substrate 1. The panel supporting member 6 is mainly composed of a head plate 6 1 having a horizontal posture, a pillar 62 standing on the head plate 61, and a buffer mechanism 66 attached to the pillar. The pillars 62 are provided in total at four corners of the elongated rectangular head plate 61. An extended beam member 64 is provided along the longitudinal direction of the head plate 61, and the upper end of each of the pillars 62 is connected to reinforce the panel supporting mechanism 6. Each of the pillars 62 is slightly higher in height than the upright glass substrate i. The interval between the two pillars 62 of the short sides of the head plate 61 is slightly larger than the thickness of the glass substrate 1. The interval between the two pillars - 25 - 200831239 (22) 6 2 in the longitudinal direction of the head plate 61 is slightly longer than the length of the glass substrate 1. The glass substrate 1 is inserted and supported by the space generated by the pillars 62. The buffer mechanism 66 is a member that is in direct contact with the glass substrate 1, and is a member that does not shake the glass substrate 1. The cushioning member 66 is formed of a material which does not corrode (resistance to the solvent L), and is formed, for example, of a fluorine element resin of Teflon (trademark of DuPont). As shown in FIG. 10, the buffer mechanism 66 is provided to connect the lower ends of the respective pillars 62 at both ends of the long side φ of the substrate 61, and connects the pillars 6 2 at both ends of the same longitudinal direction. Upper end. The supported glass substrate 1 is in contact with the buffer mechanisms 66 at the corners. The side buffer mechanism 66 is in contact with the lower end corner portion of the glass substrate 1 in a concave portion in the short-side direction, and has a L-shaped cross-sectional shape in the longitudinal direction. The buffer mechanism 66 that is in contact with the upper end portion of the glass substrate 1 is a horizontal concave shape in the shape of a slit in the short side direction. As shown in FIG. 1A, when the glass substrate 1 is joined, it is inserted from the top and falls into the concave portion of each of the buffer mechanisms 66. φ The above-described transport mechanism as the transport support mechanism 6 is also used to transport the roller body 3 as shown in Fig. 7 even in the present embodiment. In addition, gears and small rack mechanisms are also available. That is, it is fixed to the lower portion of the panel supporting mechanism 6, and a pinion may be disposed instead of each of the conveying rollers 3. Although the drawings of the nozzles are omitted in FIGS. 7 and 9, as shown in FIG. 8, the nozzles 2 are disposed in the processing chamber 4. In the present embodiment, as shown in FIGS. 8 and 9, along the vertical direction A plurality of transport lines are set in the horizontal direction of the transport direction. The nozzles 2 are provided on both sides of the respective conveying lines in order to simultaneously cut both sides of the glass substrate 1 on each of the conveying lines. In the present embodiment, -26-200831239 (23) three conveying lines are set in the processing chamber 4, and nozzles are provided on both sides thereof. The nozzles 2 located between the respective conveying lines are tied to both sides. Since the glass substrate 1 is used for the reduction process, four nozzles 2 are provided as shown in FIG. 8 in the vertical direction of the conveyance line. The configuration in which the glass panel is conveyed along each conveyance line will be described. For convenience of explanation, the glass panel that is transported on the transport line on the left side in FIG. 8 is used as the glass substrate 1 a , and the glass panel that is transported on the center transport line is used as the φ glass substrate 1 b , and on the transport line on the right side. The glass panel to be conveyed is used as the glass substrate 1 c. Further, the transfer roller system that transports the glass substrate 1a on the transport line on the left side serves as the transfer roller 3a; the transfer roller system that transports the glass substrate lb on the center transfer line serves as the center transfer roller 3b; and the glass substrate is conveyed on the transfer line on the right side. As the left conveying roller 3 c as shown in Fig. 8, each of the conveying rollers 3a, 3b, and 3c is rotated up and down to sandwich the glass panels 1a, 1b, and 1c, and The specified direction is rotated by φ. Further, each of the conveying rollers 3a, 3b, and 3c has a wheel portion protruding from the shaft portion and provided with a gradient. The panel supporting mechanism 6 falls on the gradient, and in this state, the glass substrates la, lb, and lc are conveyed. The shape and structure of each nozzle 2 are the same as those of the first embodiment described above, but the rotation direction of each nozzle 2 is such that the direction of rotation of the injection hole 20 when the respective injection holes 20 face the surface of the glass substrate 1 is The direction in which the glass substrate 1 moves linearly is opposite. The following 'description' about this point. For convenience of explanation, the four nozzles are sequentially arranged from the left, that is, 2a, 2b, 2c -27 - 200831239 (24) First, the direction of conveyance by the transporting rolls 3a, 3b, 3c will be described. Among the three groups of transporting rollers 3a, 3b, and 3c, the left transporting roller 3a and the right transporting roller 3c transport the glass substrates 1a and 1c in the same direction, and the central transporting roller 3b is different. Move in the direction. For example, as shown in Fig. 8, the left conveying roller 3a and the right conveying roller 3c convey the glass substrates la and lc from top to bottom in a vertical direction through the paper surface of Fig. 8, and the central conveying roller 3b is The glass substrate 1b is conveyed from bottom to top in a vertical direction through the paper surface of Fig. 8. In the plan view of Fig. 9, the glass substrates 1a and 1b are transported from the left to the right, and the glass substrate 1b is transported from the right to the left. Further, as shown in Fig. 8, in the respective groups of the transporting rolls 3a, 3b, and 3c, when the upper and lower sides are viewed from each other, the upper conveying roller and the lower conveying roller system are rotated in opposite directions. Therefore, as shown in Figs. 8 and 9, in the four nozzles 2a to 2d, the nozzle 2a and the nozzle 2c are in the same direction, and the nozzle 2b and the nozzle 2d are rotated in the opposite direction. When the glass substrates 1a to 1c are conveyed in this direction and φ, as shown in Fig. 9, the nozzles 2a and 2c are rotated clockwise, and the nozzles 2b and 2d are rotated counterclockwise. Thereby, when the glass substrates 1a to 1c are transported by the transporting rolls 3a to 3c, the direction of rotation of the nozzle 20 at the time when the injection holes are facing the surfaces of the glass substrates 1a to 1c is The linear movement directions of the glass substrates 1a to 1c are reversed. The configuration of the eluent supply system 2 1 and the processing chamber 4 and the configuration of the other portions are the same as those of the first embodiment. In the second embodiment, as in the first embodiment, the maximum roughness of the surface of the glass substrate 1 after the reduction is -28-200831239 (25), which may be 〇. 5 μm or less, and the nozzle 2 is set appropriately. The spray pressure can be selected to have a maximum roughness of 0.1 micrometer, and the method and apparatus for implementing the type can be suitably used in the FPD and the touch surface. In this embodiment, three transport lines are set to be perpendicular to the transport direction, and four or four or more may be used. If the directions are different from each other and cooperate with this, if the rotation system 0 of the nozzle 1 is reversed, it is possible to add a conveyor line no matter how many. Further, the reduction processing of the glass substrate 1 which is used for both side conveyance lines is advantageous because the structure is simplified and the number of parts is reduced. However, in the second embodiment, the glass substrate 1 on the transfer lines on both sides may not be provided with a single nozzle, and a separate nozzle may be provided. In the second embodiment, the chamber 4 is provided with a direction changing mechanism as the three transfer lines. Continuous transfer is also possible. This glass substrate 1 is treated three times in the processing chamber 4. Further, the φ conversion mechanism is disposed outside the processing chamber 4, and the transport line is connected in the processing chamber. The reduction processing of each embodiment is not only applicable to the glass substrate 1 which is the aforementioned member of the touch panel (that is, the glass assembly process is also applicable. That is, in the FPD and the touch panel, a large glass plate is used. A plurality of products can be preferably carried out. For example, in the liquid crystal display, a pair of large glass substrates are used, and the structure of the liquid crystal display (the ITO electrode, the color filter, and the shape) can be used. That is, the manufacturing direction of the board is set to be set to one nozzle, and the reduction can be reduced. When the processing chamber is in the processing chamber, one can be combined with the FPD or the board in the direction of the direction. The various fields of the system, etc.). Because 29-200831239 (26) After the glass substrate is bonded, each product is cut for each field to obtain a separate product. In this case, the reduction treatment of the present embodiment is suitably carried out in a state of a large glass substrate before cutting. In the case of a large glass substrate, the reduction process is generally performed for the production of individual products, which improves productivity. At this time, in order to perform the reduction treatment after the bonding of the pair of glass substrates, the target to be ejected by the eluate is on the outer side surface of the bonded glass substrate φ. For a glass plate that is not a material, the reduction process is performed during the manufacturing process and the final step of the manufacturing process, and the problem of the contact of the eluent L may be covered with a mask tape. Further, in this embodiment, the injection holes 20 of the nozzles 2 are provided at equal intervals, and here, an example is provided in plural. When the size of the injection holes is different, the interval can be appropriately changed accordingly. The term "equal equalization" means that the punching pressure on the surface of the φ of the glass substrate 1 on which the eluent L is ejected is equal and plural. Further, in the above embodiment, although the movement of the glass panel or the nozzle is linear, there is a case where the movement is not linear. For example, it is also possible to rotate the glass panel in a horizontal posture with respect to the stationary nozzle and to rotate around the vertical rotation axis in the horizontal plane. In the case where the glass substrate 1 is reduced in size as in the second embodiment, when the glass substrate 1 is increased in size, the configuration for supporting the glass substrate 1 and the configuration of the moving mechanism are also large. Sexual difficulty will increase, and when the glass substrate 1 is in a horizontal posture and the -30-200831239 (27) is subjected to a reduction process as in the first embodiment, it is easy to use a mechanism for supporting and moving. Next, an embodiment of the invention of the FPD will be described. Figure 11 is a schematic view of a cross-section of an implementation type FPD. The one shown in Fig. 11 is a liquid crystal display as an example of an FPD. In the FPD shown in Fig. 11, a pair of glass substrates 1 are bonded together by a sealing portion 12. In the inside of the pair of glass substrates 1, as the light transmission control unit, electrodes (pixel electrodes, Φ common electrodes, etc.) 11 and liquid crystals 13 sealed therein are formed inside one of the glass substrates 1. . A color filter 14 is formed on the inner surface of the other glass substrate 1. The configuration of the light transmission control portion is the same as that of the conventional liquid crystal display. The feature point of the FPD shown in Fig. 11 is that the outer side surface 100 of each of the pair of glass substrates 1 is honed by a honing process. The honing process is performed by using the above-described reduction device of each embodiment, and therefore the description thereof will be omitted. A larger feature of the FPD of this embodiment is that the outer portion 100 has a flatness of 0.5 μm and φ by performing the honing treatment as described above. In the description of the flatness, Fig. 11 is enlarged, and among the outer face portions 100, the distance between the topmost portion 101 and the lowest portion 102 is flat. This lanthanum is a measurement corresponding to the maximum roughness (Rm ax ) in the measurement of the surface roughness. It is sold by a surface roughness meter from a number of companies which can measure the maximum roughness, and is appropriately selected to determine the flatness of the outer face. According to the inventors of the present invention, since the thickness of the glass substrate 1 is less than 5 mm, the flatness (Rmax) of 〇·5 μm or less can be obtained by performing the above-described honing treatment. 31-200831239 (28) In order to achieve thinning, light weight, and high performance without display spots, when the above-described reduction device is used, it is possible to achieve 0.1 micron or less under the step of optimizing the shape of the nozzle 2 and the like. Flatness, step is better. Further, such flatness is also the same as the flatness of the face other than the panel 1 before the honing treatment, and in this case, the thickness reduction system does not impair the flatness. In this example, although the maximum roughness is flat, the average roughness (Ra) may be used as the flatness. At this time, the average height of the unevenness of 100 is sought, and the determination of each height difference is obtained based on the height. At this time, since there is also a surface roughness measuring instrument capable of measuring the center roughness (Ra), it is possible to sell it. Further, in the case of the center line average roughness, the following FPD having no display spots can be provided, and the flatness as described above can be achieved by the external mechanical boring. Further, in the description, although a liquid crystal display is used, even an FPD other than the display, for example, a plasma display or an organic EL, a surface electric field display or the like can be similarly implemented. The compliant portion of the present invention is provided with an FPD having at least one glass corresponding to the size of the display portion. In the prior art description, the FPD and the touch are separately described, but the touch panel also displays information. And an FPD. Thus, in the scope of the patent application of the present invention, the flat panel comprises a touch panel. FPD. Further, the glass base is further cut evenly by the line of the outer surface of the center line. The liquid crystal display is used for the full-glazed panel to be displayed on the panel. -32-200831239 (29) [Simplified illustration] Figure 1 It is a schematic diagram of a method of reducing the glass panel of the first embodiment. Fig. 2 is a front cross-sectional view of the panel reducing device of the first embodiment. Fig. 3 is a side elevational view of the glass panel reducing device shown in Fig. 2. Fig. 4 is a plan view showing the action of the arrangement of the injection holes 20 of Fig. 2. Fig. 5 is a schematic view showing the effect in the direction in which the direction of rotation and the direction of linear movement are opposite. Fig. 6 is a schematic view showing a method of reducing the glass panel of the second embodiment. Fig. 7 is a front cross-sectional view showing the glass panel reducing device of the second embodiment. Fig. 8 is a side elevational view of the glass panel reducing device shown in Fig. 7. Fig. 9 is a plan view showing the glass panel reducing device shown in Fig. 7 from the top view. Figure 1 is a perspective view of the panel support mechanism 6 shown in Figure 7. Figure 11 is a schematic view of a section of an FPD of an implementation type. [Description of main component symbols] 1 : Glass panel -33- 200831239 (30) 2 : Nozzle 2 0 : Injection hole 2 1 : Dissolution supply system 3 : Transfer roller 30 : Transfer mechanism 4 : Process chamber 5 : Rotation mechanism AA : rotation axis L: eluate