TWI328699B - Method for manufacturing flat panel display and external mechanical polishing apparatus of glass substrate for flat panel display - Google Patents

Description

1328699 VI. Description of the Invention: [Technical Field] The present invention relates to the manufacture of a liquid crystal display or a plasma display, a flat panel display having an electromechanical excitation light display (hereinafter referred to as FPD) r. [Prior Art] A flat panel display (FPD) such as a liquid crystal display or a plasma display is widely used in various electronic devices such as a computer display device, a TV receiver, and a mobile phone display unit. Recently, an organic EL display having excellent high-speed reactivity for self-luminescence without backlighting has been developed, and is expected in the future. One of the problems required for such FPDs is thinning. % Thinning is required for thinning, miniaturization, and weight reduction of the electronic equipment to be mounted. For example, in a notebook computer or in a mobile phone, it is required to be thinner or lighter, and the FPD is also required to be thinner and lighter. An important element of thinning or lightening of FPD is a glass substrate. Regardless of the liquid crystal display, the electro-polymer display, or the organic EL display, a pair of substrates are bonded to each other, and the structure of the element electrodes is disposed inside. The glass has a heavier specific gravity and it is necessary to ensure the mechanical strength of the glass. Therefore, it must have a certain degree of thickness. Therefore, the presence of the glass substrate may hinder the thinning or fortunate quantification of the FPD. In many FPD manufacturing projects, the method of producing most FPDs from a larger pair of glass substrates is used. A pair of glass substrates 'are differentiated into the respective FPD uses produced' to form element electrodes in each region. After the end of the bonding process, a pair of glass substrates are cut into various areas and enter the finishing process. Such a method of generating a large number of FPDs from a pair of glass substrates has an advantage of being extremely simplified in engineering and having a reduced manufacturing cost, but the glass substrate tends to be large. For example, in the manufacturing process of a liquid crystal display, a glass substrate having a size of about 2000 mm x 800 mm is used. When such a large glass substrate is handled, if the glass substrate is too thin, it is easily broken or bent due to its own weight. Therefore, there must be a certain degree of thickness. On the other hand, if the glass substrate is thinned to the extent that the glass substrate is thinned to the extent that it is after each region (the semi-finished product), there is no problem because the size is small. From this point of view, in the invention of Japanese Laid-Open Patent Publication No. Hei No. 5 - 2 4 9 4 2 2, after the bonding of a pair of glass substrates is performed, the outer surface of the glass substrate is etched and thinned, and then cut into Construction methods in various regions. 4 1328699 [Summary of the Invention] Problem to be Solved by the Invention In the above-mentioned report, the name of the person who was thinning the outside was hardly revealed. That is, although the etching is described as being performed by the immersion method, the etching solution used and the immersion time are not specifically described. Therefore, in the disclosure of the above-mentioned publication, even if the manufacturer has the ability to implement, it is difficult to implement the month and even if it can be implemented, it is judged that it is difficult to ensure sufficient quality from the viewpoint of flatness, which is a very important factor of FPD. In order to solve this problem, the inventor of the present application, which is a practical technique for reducing the thickness of the FPD, has an operational significance. The invention described in the first aspect of the application of the present application is a method for fabricating a flat panel display, comprising: • one or both of the glass substrates are at least one of the substrates ; + α The formation of the electrode forming electrode, in the electrode formation engineering De Meiman, the second seal, the sealing material adhered to the inside of a pair of substrate seals.. _ ^ ^ ^ private, and after the seal project The glass substrate is also a mechanical polishing process in which the outer surface of the substrate is mechanically ground to be thinned on one side or the other side; wherein the outer surface 5 1328699 has the dissolution liquid, and the acceleration caused by the outer surface is further described outside. In order to solve the above-described invention, the fifth embodiment is directed to the above-described invention, in which the above-described substrate is ejected and the outer surface of the substrate is formed, and the nozzle of the eluate is dissolved in the outer surface. Method having the above dissolution In addition, in order to solve the invention described in the above-mentioned section, the method 9 has the pressure of the above-mentioned elution 9 system 0. 5kg/cm2~ In order to solve the invention described in the above section, the method has the above-mentioned sticking outer surface &gt At the same time, in order to solve the above-mentioned lessons, the nozzles on the outside of the glass substrate are dissolved, and the acceleration of the weight is added to make the eluate go up to the outside, and the eluate is sprayed in a vertical posture to maintain the upper side or The substrate of both the sides is mechanically moved, and the impact caused by the discharge of the eluate is the same as the problem of the application of the second paragraph of the above-mentioned patent application. Problem 'Applicable Patent Scope Item 3 of the above-mentioned patent application scope item 1 The range of 3·5kg/cm2 when the above-mentioned external impact is caused by the liquid. Title 'Applicable Patent Scope Item 4 The double-grinding of the glass substrate in one of the above-mentioned patent application scopes, the thickness of the whole is thinned. The invention of claim 5, wherein the distance from the injection hole of the nozzle to the outer surface of the substrate at the start of polishing is 5 mm or more. 〇〇_ below. In order to solve the above problems, the invention of claim 6 is directed to the method of item i of the above-mentioned patent application, wherein each of the injection holes is provided at equal intervals, and from each of the injection holes to the outer surface. The distance is a certain structure. "In order to solve the above problem, the invention of the invention of claim 7 is an external mechanical polishing device which is mechanically grounded outside the glass substrate for the I-side display; it has a structure: a processing chamber for performing external mechanical polishing treatment inside, and a substrate holder for holding the glass substrate at a specific position in the processing chamber and an eluate having a material for eluting the outer surface, and the holder is held by the substrate holder The upper surface of the blasting hole of the glass substrate is immersed on the ::: '...plate holder, which is in the eluent nozzle: 2, the vertical posture is 'to hold the above-mentioned substrate section' and to supply and exchange the nozzle. . The eluate supply system of the liquid mixture. The eluate supply wire, 仫> '·' is added to the eluate with an acceleration greater than the acceleration of its own weight. 7 U28699 The surface is ejected and impacted on the outside, and the pressure of the grinding is applied to the nozzle by the pressure of the physical action of the impact, and the eluate is supplied to the nozzle; The above-mentioned two-cold or both of the substrates of the eluate are mechanically moved to the injection holes of the nozzles. In order to solve the above problems, the invention described in the patent application is directed to the above-mentioned patent application. Structure: The structure having the above-mentioned eluent-based hydrofluoric acid. In order to solve the above-mentioned problems, the invention contained in the ninth article of the patent application of the syllabus is applied to the needle _i, and is ancient. 7 items "- The solution supply system is such that the above-mentioned eluate is ejected from the above nozzle, and the injection hole is sprayed to a pressure of 0.5 kg/cm, 3.5 kg/cm, t^chu The force impinges on the outside of the glass substrate to provide a structure in which the nozzles are supplied with + and σ. Further, in order to solve the invention described in the above item, the structure of the needle application patent item No. 1 has the outer surface of the seventh glass substrate of the above-mentioned application patent range, and one of the bonded substrates can be bonded to the substrate holder. Bao Yi ^ structure. In order to solve the invention described in the above paragraphs on the both sides of the glass substrate, the invention is in the form of the above-mentioned patent application No. 7 8 1328699 - the structure of the above-mentioned application, at the beginning of the grinding, from the above The distance from the perforation to the outside of the glass substrate is not more than 100 mm. In order to solve the above problems, the invention described in the patent application is directed to the structure of the above-mentioned patent application, wherein each of the injection holes is disposed at equal intervals and the distance from each of the injection holes to the outer surface is structure. Advantageous Effects of Invention As described below, according to the invention described in the first or seventh aspect of the present application, in addition to the new (material not dissolved in the outside material), the eluate is ejected in the eluate ejection. The outside is a vertical posture holding substrate, and the eluted solution in which the outer material is dissolved continuously flows out, so that the efficiency and the average grinding can be performed. Even if the outer glass component or the crystal state is used, it is sufficient because it has a physical effect. Row grinding. Therefore, the flatness of the outer surface after grinding can also improve the display performance of the produced FPD. In addition, according to the invention described in the ninth application of the present application, the nozzle of the nozzle of the above-mentioned effect is 5 mm, and the range of the 11th range is the seventh. In addition, it is the third or the first, because the pressure of the outer surface of the above-mentioned outer surface is 〇^kg/cm2~3.5kg. Since the range of /cm2 is sufficient, the new eluate can be sufficiently supplied for polishing, and the physical action can be fully utilized. Even if the outer t-glass component or the crystallized state is not evenly distributed, it can be sufficiently polished to ensure higher Flatness. In addition to the above effects, in addition to the above effects, one of the two sides of the glass substrate is mechanically ground at the same time, and the overall thickness is thinned. Therefore, in addition to contributing to the thinning of the point-and-stick panel, the process productivity is also high. In addition to the above-described effects, the distance from the injection hole of the nozzle to the outer surface of the substrate is 5ππη or more and 丨00 mm or less, in addition to the above effects, in the invention according to the fifth aspect of the invention. Therefore, the average impact (ie, the flatness of the polishing) can be ensured, and it can be a practical process. Further, according to the invention described in the sixth or the twelfth aspect of the patent application, in addition to the above effects, the respective injection holes are provided in plural at equal intervals and the distance from each of the injection holes to the outside is constant. Therefore, it is easy to average the impact pressure caused by the ejected eluate, which contributes to the polishing treatment with high flatness. 1328699 [Embodiment] Hereinafter, a preferred mode (hereinafter referred to as an embodiment) of the invention of the present application, which is large in size ▲ too π %, will be described. In the following description, as an example of FpD, a liquid crystal display (hereinafter referred to as L c D ) is used. Fig. 1 is a view showing an outline of a method of manufacturing an FPD in the embodiment. The method of Fig. 1 is, for example, a CD for a mobile phone. The method shown in FIG. 1 includes an electrode forming process in which one of the glass substrates is one of the substrate substrates and an electrode n is formed; and after the electrode forming process, the pair of substrates 1 are adhered via the sealing material 12, After the liquid crystal crucible 3 was internally injected, the sealing process was completed, and after the sealing process, the outer surfaces of the glass substrates 1 were mechanically ground to thin the outer machine. In the manufacturing method shown in Fig. 1, a majority of LCDs are produced from the glass substrate 1 from almost one of the same shape sizes. First, the sloping substrate 1 is divided into the φ where each LCD is produced, and the electrode formation is performed on individual regions. The electrode forming process is a transparent electrode forming process including a transparent conductive crucible such as germanium, and a driving electrode or a common electrode forming process by a low temperature polycrystalline germanium film produced by a plasma CVD method. In each project, it includes a light lithography method consisting of exposure, development, and [remaining time]. On the other side of the glass substrate 丨 light sheet forming project. The color grading sheet c has a colored soil. A color layer or a black layer is formed on the substrate 1, and is broken. The colored layer is a project in which a color, a transparent electrode, or the like is formed; the pigment in the photolithography method is carried out in a specific pattern. The black matrix is transmitted by A-printing or electroplating to form a pattern along the pixel boundary or to prevent color mixing. Transparent electrodes are formed by splashing money in most cases. Month; the brother is the I T 0 film and in the sealing project, the sealing material 12 is attached to one side. Sealing material 12, surface coating of t glass substrate 1

The contour is coated with A^ and /σ around the shape of each LCD jade. The inner side is a cloth spacer surrounded by the specific amount of the sealing material 12, and the day and day are 13. Then use the necessary spacers to disperse the spacers, and align them with the other ones. ▲Plate 1 ′ - Covered by the side and then 'External mechanical polishing project that is characterized by being too loud and also a big feature. In this embodiment, the mechanical grinding machine outside the 攸 転 転 転 転 洛 洛 洛 洛 洛 洛 洛 洛 洛 洛 洛 洛 洛 洛 洛 机械 机械 机械 机械 机械 机械 机械 机械 机械 机械 机械 机械 机械 机械 机械 机械 机械 机械 机械 机械 机械 机械 机械 机械 机械 机械The eluate L is sprayed out to the outside αο and the surface. In addition, if the L is dissolved in the early pure, the liquid L is only added to the acceleration caused by the weight of the body 12 1328699, and is different. In the present specification, a surface on which a pair of substrates face each other is referred to as an "inner surface", and a surface on the opposite side is referred to as an "outer surface". In the outer surface mechanical polishing process of the present embodiment, the outer surface of one of the glass substrates (hereinafter referred to as the pasting panel 1) is mechanically polished. The "mechanical polishing" of the stomach is based on the polishing of the physical action of the eluate of the so-called discharge pressure, and the mechanical movement of the glass substrate 1 during polishing. The term "mechanical movement" means "moving by machine". In addition, if it is compared with the term "cutting", that is, "cutting and reducing the thickness", it is necessary to cut the surface and reduce the thickness as long as the polishing is performed. Therefore, "polishing" is the concept of "cutting". It is natural and clear. As shown in Fig. 1, the tones a 1 Λ in the yoke mode hold the adhesive surface in a vertical position, and the eluent L is ejected from the nozzles 4 disposed on both sides thereof. As the eluent l, ##用# / , ^ . A strong acid such as murine acid is used. In the case of citric acid, for example, it is used by diluting 7 to 1 uu to about 10 to 50% (volume percentage). The impact pressure is 0.5 kg/cm 2 to 3 5 kg/cm 2 on the outer surface of the adhesive sheet 10 . The outer surface that is ejected from the eluent L sprayed from the nozzle 4 is rolled by the eluent L: 醢, B1 ☆ solution 'and the bad flow is caused by the impact of the eluent L to mechanically grind outside, and the thin glass substrate factory 13 The thickness (also mixed eh ι '疋 pasted panel 1 overall in mechanical grinding H degree). At the location, mhL touches the cover tape, and when the dissolution is the cover tape, it is pre-protected. As a cover or iron gas dragon ",: strong: when 'can use polypropylene bake (10)) acid resistance (four), coated with grease on the back. For example, Japan Japan φ + tens of tens of degrees of adhesive SPV-362M and so on. After I cleaned the outside of the machine after the above-mentioned external mechanical grinding project, I also worked along the production process to cut the workmanship. (4) to cut the adhesive surface to the right according to the above-mentioned embodiment of the manufacturing method 1 dissolution of the outside of the glass substrate ... outside the cut will be: by itself re-emergence; it 4, shot, thereby k Acceleration to add a larger plus

L Eluent L is sprayed outside and hits the outside: Again,

The physical effect of the impact is to supply the liquid I to the new eluate. As a result, in addition to the continuous liquid L, 'the outside of the dissolved L will continue to flow out due to the impact, the purpose: the average of the liquid Excellent grinding. Even if it is a place where the rate is good and the situation is not uniform, the place can be polished on average evenly because of the physical effect. Therefore, the outer surface is flat after polishing, and S can be produced. Next, the description is applicable to the polishing apparatus. The following describes the description of the mechanical grinding device. The display performance is also high. The outer surface of the above manufacturing method is also an embodiment other than the mechanical machine

"Besides the mechanical polishing device outside the Besch method. The front schematic view, Fig. 3 is the side of the device shown in Fig. 2: a schematic cross-sectional view. The outer surface grinding device shown in FIG. 2 and FIG. 3 is provided with an outer mechanical grinding process inside: the processing chamber 2, and the substrate holder 3 at a specific position in the processing chamber 2: the substrate holder 3 of the plate 1 The discharge enthalpy supply system 5 for supplying the eluted liquid L to the nozzle 4 is provided on the outer surface of the glass substrate 1 held by the substrate and the nozzle 4' which is provided to eject the eluate. In this embodiment, because after sticking

Outside #刻, the substrate holder 3 will become a member that maintains the adhesive surface: 10 . In the processing chamber 2, there is provided an inlet 21 for carrying in the adhesive panel 1 and a panel 22 which is mechanically polished and adhered to the panel 22, and is carried out by the paper opening of the blocking gate 2 3 . Move the inlet 21 and move out the σ blocking gate 2 to switch. Further, the 'opening relationship' is performed by moving in the horizontal direction (the straight direction of the second drawing) perpendicular to the conveyance direction. This device is provided with a moving mechanism that moves the injection hole of the nozzle 4 to the injection hole of the nozzle 4 and also moves relative to the injection hole as a moving mechanism. # & « μ 叹 搬运 搬运 搬运 搬运 搬运 〇 〇 〇 〇 〇 〇 〇 〇 〇 n n n n n n n n n n n n n n n n The substrate holder 3 is provided as a member, and the wall member constitutes a member of the transport mechanism 30.苐4图' is a three-dimensional schematic diagram of the violent plate holder 3 in the second ku 罘d diagram. As shown in Fig. 4, the base plate 31 holding the substrate and the support member 32' which is standing on the base plate 3i and the cushioning member attached to the support 32 are formed. The struts 32' are respectively provided at the corner portions of the elongated rectangular base plate 31, and a total of four are provided. Further, the yoke is further provided with a beam member 34 extending along the longitudinal direction of the base plate 31, and the upper ends of the respective posts 32 are connected to reinforce the substrate supporting member 3. Each of the struts 32 has a higher height than the standing adhesive panel 10. Base plate = the spacing of the two legs 32 of the short side is a little larger than the thickness of the adhesive substrate ι. The interval between the two legs 32 of the long side of the base plate 31 is a little longer than the length of the pasting substrate 10. The adhesive substrate is inserted into the space formed by the pillars 32 and held. The cushioning device 3 3 is in direct contact with the adhesive panel 1 〇 4 shots, and is not close to the adhesive substrate 1 . The cushioning device 33 is formed of a material that does not corrode (the chemical resistance) of the eluent L, for example, Teflon (registered trademark of Dupon Co., Ltd.), etc.

16 CD 丄jzooyy I 糸 resin to form. As shown in Fig. 4, the cushioning member 33 is formed by two creeping connections 32 in the longitudinal direction of the base plate, and is connected to the upper end in the longitudinal direction. And the installer like this... The substrate is attached to the corners of the 4 cushioning device 33. The pick-up machine μ# μ contacts the underside of the lower corner of the Weijiao substrate 10 and is 3 3 concave, County The cross-sectional shape of the side of the side is concave. The cross-sectional shape of the side is the upper end of the substrate 10. The contact paste is ^ιΙ ^ 欸 33, which is a short side and has a lateral concave shape. In the figure, in 1 Λ brother 4, when the adhesive panel 10 is assembled, it is from the upper recess. Lo is formed in each cushion 33: the transport mechanism 3〇 is for example, a latch and a pinion The transport mechanism 3 is configured as a flash lock base plate 31, and the pinion gear is 3 〇1 person-specific. The pinion gear is disposed along the transport line by a large number. The small tooth chamber 2 is equipped with a wheel 301. In addition, a guide member having a holder hh "the substrate for moving the guide bow" is appropriately provided. As shown in Figure 3, the mouthpiece 4 is 3 inches, and the renting system is placed on the substrate holding panel; the side of the panel is attached to the side of the panel, and the eluate can be ejected toward the adhesive system to indicate the second outer crucible. . Fig. 5 is a perspective view showing the shape of the nozzle 4 shown in Fig. 1 . As shown in Fig. 5, the nozzle 4 is a tubular member having a spray hole 41. As shown in Fig. 5, the nozzles 4 are arranged to extend in the vertical direction, and are arranged side by side at equal intervals in the longitudinal direction (transport direction) of the pasting panel 10. The injection holes 41 are provided in the nozzles 4 facing the portions to which the panel 10 is pasted, and are disposed at equal intervals in the extending direction (vertical direction) of the tubes. Further, as the configuration of the nozzle 4, there are cases where more (or less) are arranged side by side than in Fig. 5, and there are cases where a plurality of nozzles are arranged in parallel in the horizontal direction or the inclined direction. Further, the nozzle 4 does not need to be tubular, and may have a plate shape or other shape. The eluent supply system 5 is composed of a reservoir portion 51 for storing the eluate L, a pipe 52 connecting the reservoir portion 51 and each nozzle 4, a valve 53 or a liquid supply pump 54 provided on the pipe 52, and the like. A filter or a pressure-regulating pump for removing impurities, garbage, or the like from the supplied eluted liquid L is provided as necessary. The eluate L is ejected to the respective nozzles 4 by the eluent supply system 5 from the respective ejection holes 41 to the outside of the adhesive panel 10 held by the substrate holder 3. The ejected liquid L which is sprayed will be sprayed to dissolve the outside and be ground outside. Further, as shown in Fig. 2, the bottom of the processing chamber 2 has a funnel shape, and the lowermost portion is provided with a discharge hole 24. The discharge port 24 is connected to a discharge pipe 25 for discharging the used eluted liquid L. As described above, the eluted liquid L in which the material of the adhesive panel 1 is dissolved is dropped to the bottom of the process 2 and is discharged through the discharge hole 24 and the discharge pipe 25. Further, the inner wall surface of the processing chamber 2 or the surface of each member in the processing chamber 2 has a structure which is resistant to the eluted liquid L. For example, when the effluent L is fluoric acid, the inner wall surface or the surface of each member is a structure coated with a chaotic resin such as Teflon (registered trademark of Dupon Co., Ltd.). Further, the lock gate 23 of the switch inlet 2 or the outlet 22 is blocked without causing the eluted liquid 1 to flow out. ♦ The beta-type device is specially designed for the construction of the nozzle 4 because the flatness of the outer surface after mechanical grinding is further improved. The following is for this point. Figure 6 is a sound picture of the point of the mountain shape L. As shown in Fig. 5, each of the 喰 y ^ ^ injection holes 41 is a direction in which the e-direction of the nozzle 4 (vertical square life, σ) is inclined at a 45-degree angle.攸 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , The right side of Fig. 6 shows the injection amount distribution of the eluted liquid L from each of the injection holes 41 as seen from the height direction of the adhesive sheet 10. At this time, the outer upper point P facing the middle of the two injection holes 41 which are adjacent to each other is received, and the supply of the eluent L is received from the adjacent two injection holes 41. At this time, since the point P is located at the diffusion end of the push-out type L, the amount of the eluted liquid L received from one injection hole 41 is about 1/2 of the other points as shown on the right side of Fig. 6, On the other hand, the two injection holes 41 adjacent to each other are used to receive the supply of the eluate L of one injection hole. Therefore, in the height direction of the pasting panel 10, the supply amount of the eluent L at each outer point is average. Further, the case where the eluted liquid L is diffused not only in the cross-sectional shape shown in Fig. 5 but also in the cross-sectional shape such as an elliptical shape, a circular shape, a square shape (square shape, a rectangular shape), a rhombic shape, or a parallelogram shape is used to diffuse the eluted liquid L. Happening. Next, the operation of the above device will be described. The pasted substrate 10 which has been completed by the above sealing process is placed on the substrate holder 3 outside the processing chamber 2. The loading operation is performed by a robot, and it is also carried out by the operator. Before the substrate holder 3 is loaded, the covering by the covering tape may be sometimes performed. The transport mechanism 30 operates to open the lock gate 20 23 ' of the carry-in port 2 1 through the carry-in port 21 to move the substrate holder 3 into the processing chamber: The substrate holder 3, which is the last name between the nozzles on the side of the adhesive panel ι〇-a, is worn from the 'two and then moved...' time point, and stops. However, the blocking gate 23 of ^ will be closed. In this state, the eluent supply system R is opened, and the liquid supply pump 54 sends the dissolution to the nozzles 4 by the special pressure to eject the injection holes 41 of the nozzles 4, and/or曰攸 喷 喷 ; ; ; ; ; ; 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射 喷射The eluent L of the material of the surface is discharged from the discharge hole 24 in the lower part. θ The pump 54 is operated for a certain period of time, and after the injection of the liquid u is closed, the liquid supply A ^ is stopped, and then the transport mechanism 30 is operated. Make the I pull holder 3 transfer + 1 text will be attached to the panel i〇C port 22 block free 23 panel. It is pure water to 2, etc. It is removed by the removal of the paste. Clean the liquid or cover the tape to the next dividing machine. The action of the device will also be applied to the outer surface of the spray wave L in the 10 points of the spray wave. 41 is the point of the shortest distance|When the injection hole L of the injection holes of each nozzle 4 is estimated to be /, the pressure is too high, then by 0i 7T_t After the time is averaged, the panel 1 〇 moves back and forth, and the impact pressure can be averaged. Thus, 1328699 can improve the flatness of the outer surface after mechanical polishing. The movement of the adhesive panel 10 is also performed in the up and down direction. In the structure of the apparatus, the liquid supply pressure caused by the liquid supply pump 54 is set to a range of 0.5 kg/cm 2 to 3.5 kg/cm 2 by the outer solution L. At this time, the respective injection holes 41 of the respective nozzles 4 The distance to the outside (indicated by d in Fig. 3) is an important factor. If the distance d is too large, if the liquid supply pressure of the liquid supply pump 54 is not increased, the pressure inside the above range cannot be used to impact the outside, which is difficult to be practical. When the distance d is small, although it is easy to maintain the optimum value of the impact pressure, the impact pressure to the shortest point of the injection hole 4 1 is too high, which causes a problem in terms of averaging. In order to ensure the average of the impact ( In the practical structure of the polishing flatness, the distance d is preferably 5 mm or more and 100 mm or less. Further, the polishing of the eluent L is in progress, although the distance from the injection hole 41 to the outside is small. It is slightly longer, but the distance from 5 mm to 100 mm is actually the distance at which the polishing starts. When the impact pressure is less than 0.5 kg/cm2, the supply of the new eluent L is small, and sufficient polishing cannot be performed, and the physical effect is also If it is not sufficient, the glass component or the crystallized state is not uniformly ground, and the flatness is lowered. If the impact pressure is larger than 3.5 kg/cm2, only the injection hole 41 from the nozzle 4 is sprayed. The short point of the 1st will be more polished, which makes the flatness sub-centered. Therefore, the impact pressure is ideal as the range of 55kg/cm2~3.5k£r/r>2々々# m . If you follow the above, κκ.. '" set 'in addition to the chemical action of the L solution', it also uses the physical action of the so-called rushing and smashing to perform external grinding, so it can enter the rod Guya t, ^ 1 仃Since the glass substrate 1 is handled and the mechanical lt π tape is automated, the productivity is also high. The nozzles 4 of the nozzles 4 are arranged at equal intervals. Since the distance from the hole 41 to the outside is constant, it is easy to average the impact pressure of the eluted ejection, which contributes to the polishing process having high flatness. Keeping the adhesive surface extension 1Λ -ir micro 1 〇 is a vertical state to dissolve this point 'has the effect of promoting the replacement of the outer liquid mixture L, and has sufficient efficiency to enter the dry; _ U. The technical significance of grinding. Further, the nozzles 4 are disposed on both sides of the pasting panel 10, and the outer surfaces can be mechanically ground at the same time. Therefore, in addition to contributing to the thinning of the adhesive panel 10, the productivity is also high. In the structure of each of the above embodiments, the physical action by the elution liquid L by the external solution is substantially different from the etching by the etching liquid or only the etching liquid. [23. In the above embodiment, the outer surface mechanical polishing treatment is performed after a pair of glass substrates are adhered, but the outer surface may be subjected to mechanical polishing. At this time, external mechanical polishing is performed before the electrode % engineering or the like is performed, or external mechanical polishing is performed before the % color filter is formed. At this time, the substrate holder 3 is also configured to hold only one glass substrate 1. When the surface of the sloping substrate 1 is thinned, there is a problem of strength. However, if it is mechanically polished with a strong acid such as fluorinated ruthenium, the strong acid action will have an effect of strengthening 1. Even if it is thinned, there is no problem. Moreover, there are also those who perform mechanical grinding outside after the =J work. Further, the plurality of pasting panels 10 may be held at the same time to perform the outer mechanical polishing process at the same time. Further, in the apparatus of the above embodiment, the transport mechanism 30 is also used as the moving mechanism, but the moving mechanism may be provided separately from the transport mechanism 30. For example, the substrate holder 3 may be provided as a part of the movement mechanism, and the adhesive panel 10 transported by the transport mechanism 30 may be moved to the substrate holder to be moved. In addition, the "relative movement" is intended to change the positional relationship between the glass substrate 1 and the injection hole 41 of the nozzle 4 -. The injection hole 41 of the stationary nozzle 4 can be moved as shown in the above embodiment. It is also possible to move both of the stationary glass substrate ejection holes 41'. 24 ^^28699 Although the LCD is used in the description of the above embodiment, the same applies to the plasma display or the organic EL display. Since these FPDs do not require a backlight, the substrate on the side opposite to the exit side may not be a glass substrate. That is, sometimes only one side is a glass substrate. In the invention of the present invention, the outer side of the pair of glass substrates can be mechanically polished externally, and the case can be obtained at this time.

The effect of the invention. Next, an embodiment of the invention of the FPD will be described. Fig. 7 is a schematic cross-sectional view showing the FpD in the embodiment. The FPD shown in Fig. 7 is attached to the glass substrate j. The figure shown in Fig. 7 is the same as the above embodiment, and is a liquid crystal display of the FPD type. The inner portion of the pair of glass substrates is formed as an electrode (the element electrode, the common electrode, etc.) U which is formed on the inner surface of the substrate 1 and the sealed liquid crystal 13 as a light transmission control unit. On the other side of the glass substrate, a shirt color filter 14 is formed. The structure of the light transmission control unit itself is the same as that of a general liquid crystal display. The outer faces 100 of both sides of the panel 1 of the FPD shown in Fig. 7 are the polishers. Since the outer mechanical polishing is the same, the description of the large feature points is omitted, and by performing the upper feature points, a pair of glass substrates are treated by the outer mechanical polishing treatment and the above embodiments. The external mechanical grinding treatment of the FPD of this embodiment, 25 1328699, makes the outer surface as a T5T extraction company suitable for providing FPD according to the local grinding station. With its value. The flat surface of the line has a flatness of 0.1 μm or less. If the flatness is described, as shown in the enlarged view of Fig. 7, the distance between the topmost 1 0 1 and the lowest portion 1 0 2 is flat in 1 0 0. This value corresponds to the case where the surface roughness is measured in the maximum roughness (Rmax). A surface roughness meter from a plurality of companies which can measure the maximum degree of roughness is commercially available, and the flatness of the outer surface can be measured from the selection. In the study of the inventor of the present invention, by performing the above-described external mechanical research, the thickness t of one glass substrate 1 can be made 〇5 off and the flatness (Rmax) can be made less than 0·1 μηη, thereby achieving thinning and lightness. The high performance of the high-performance and non-display unevenness is the same as the flatness of the outer surface of the moon-J glass substrate 1 at the outer mechanical polishing. This results in no damage to the flat surface due to the external mechanical polishing treatment. . In the above example, although the maximum roughness is used as the flatness, the center line average roughness (Ra) may be used as the flatness. In this case, the average height of the unevenness of the outer surface i 00 is obtained, and the height is used as a reference. Absolute temples also have a measurable centerline average roughness (ra) surface roughness meter, so use this one. Incidentally, in the case of the center roughness, if it is less than 3 mm, 1328699 F P D without display unevenness can be provided, and such flatness can also be achieved by the above external mechanical polishing treatment. In addition to the above configuration, even an FPD other than a liquid crystal display is equally applicable. In the case of an FPD that emits light like an organic EL display, a light-emitting portion is provided instead of the light transmission control portion. BRIEF DESCRIPTION OF THE DRAWINGS [Fig. 1] is a schematic view showing a method of manufacturing an FPD in an embodiment. [Fig. 2] A front schematic view of an external mechanical polishing apparatus according to an embodiment [Fig. 3] A schematic cross-sectional view of the side of the apparatus. [Fig. 4] A perspective view of the substrate holder 3 in the apparatus shown in Figs. 2 and 3 [Fig. 5] shows the shape of the nozzle 4 shown in Fig. 3. 'Three-dimensional schematic view [Fig. 6] is a schematic view showing a point at which the eluent L is ejected on the outer surface of the pasting panel 10 from each of the ejecting holes 4 1 [Fig. 7] FIG. 7 is a schematic view of the FPD in the embodiment. DESCRIPTION OF SYMBOLS 1 '. Glass substrate 1 0 : Adhesive panel 1 1 . Electrode 1 2 : Sealing part 1 3 . Liquid crystal 1 4 : Color filter 2 : Processing chamber 21 · · Carrying in port 22 : Carrying out port 2 3 : Blocking Brake 24: discharge hole 3: substrate holder 30: transport mechanism 31: base plate 32: strut 3 3: cushion 3 0 1 : pinion 1328699 52 : 53 : 54 : pipe valve feed pump eluent

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Claims (1)

1328699 VII. Patent application scope: 1. A method for manufacturing a flat panel display, comprising: forming an electrode on one or both of the glass substrates on at least one of the substrates, and forming an electrode after the electrode formation process; a pair of substrates adhered to seal the internal sealing process, and an outer mechanical polishing process in which the glass substrate, that is, one or both of the substrates, is mechanically ground to be thinned after the sealing process; In the process, the eluate on the outside of the glass substrate is eluted and ejected toward the outside surface to add an acceleration greater than the acceleration caused by its own weight, so that the eluate is ejected to the outside and impacts the outside, wherein, in the dissolution In the liquid jet, the substrate is held in a vertical posture, and the substrate is held, and the one or both of the substrates are relatively mechanically moved to the nozzle for ejecting the eluate, and the outer surface is eluted with the elution solution, and the eluate is eluted. The physical effect of the impact, the worker who grinds . 2. The method of producing a flat panel according to the first aspect of the invention, wherein the eluate is a hydrofluoric acid. 3. The method of manufacturing a flat panel according to the first aspect of the invention, wherein the pressure at which the eluate causes the impact of the outer surface 30 is in the range of 5 kg/cm 2 to 3 5 kg/cm 2 . 4. The method of manufacturing a flat display according to the first aspect of the invention, wherein the one of the bonded surfaces is mechanically polished to the outer surface of both of the glass substrates, and the overall thickness is reduced. 5. The method of manufacturing a flat display according to claim 1, wherein at the start of the polishing, a distance from the nozzle of the nozzle to a distance of ± from the outside of the substrate is 5 匪 or more and 100 mm or less. /, as shown in the first paragraph of the patent scope, the method shown in the first paragraph is a method in which the "I" injection holes are plurally arranged at equal intervals, and the distance from each of the injection holes to the outside is constant. 7. An external mechanical polishing device for mechanically polishing a glass substrate for a flat display to be thinned; the features are: comprising: a processing chamber for performing external mechanical polishing treatment inside, and holding the glass substrate in the processing a substrate holder at a specific position in the chamber, and a nozzle having a discharge hole for ejecting the material of the outer surface and a nozzle for ejecting the outer surface of the glass substrate held by the substrate holder U2S699 2, in the basin In the above-mentioned substrate, the above-mentioned outer surface is made to be a ground, and the substrate of the JL is held, and the electrolyte supply system for supplying the eluate to the nozzle is provided; and the eluent supply system and the system are It is added with a larger weight than the acceleration caused by Cao Li. The above-mentioned outside is ejected and impacted, and the liquid is formed. The impact can be used to supply the eluate. The above-mentioned substrate of the eluate is sprayed, and the injection hole of the nozzle is made into a double-moving mechanism. Τ 移动 · · 如 如 如 如 研磨 研磨 研磨 ’ ’ ’ ’ ’ ’ ’ ’ ’ ’ ’ ’ ’ ’ ’ ’ ’ ’ ’ ’ ’ No. 9: In the apparatus according to the seventh aspect of the invention, the eluate supply system is configured to eject the eluate from the ejection orifice of the nozzle, and 〇: 1:1/cm2 to 3.5 kg/ The pressure in the range of cm2 impacts the above-mentioned slope: the outside of the substrate... also supplies the above-mentioned eluate to the above-mentioned nozzle. The grinding device, the re-machine, and the above-mentioned nozzle system can be bonded as described in the seventh aspect of the patent application. The latter one pulls 1 ^ Μ X ^ ^ ^ ^ σ between the outer sides of the 32 1 glass substrate to be mechanically ground, and is placed in the substrate holder to maintain the __ Π 知 知 - - - - - - - - - The sides of the soil substrate. 11. As stated in the seventh paragraph of the patent scope "grinding device", the machine is sprayed outside the glass substrate to the outside of the glass substrate at the beginning of the grinding: 攸 攸 攸 攸 攸 。 ' ' ' ' '. As in the patent application section 7, the grinding device is configured such that each of the injection holes # is mechanically placed outside, and "two at equal intervals" and each of the injection holes is further to the outside. 1 back to the horse is a certain distance 33