TW200817176A - Display device - Google Patents

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TW200817176A
TW200817176A TW096137962A TW96137962A TW200817176A TW 200817176 A TW200817176 A TW 200817176A TW 096137962 A TW096137962 A TW 096137962A TW 96137962 A TW96137962 A TW 96137962A TW 200817176 A TW200817176 A TW 200817176A
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Taiwan
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display device
group
general formula
transparent substrate
liquid crystal
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TW096137962A
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Chinese (zh)
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TWI426021B (en
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Takashi Saito
Hideki Andoh
Kenichi Kitamura
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Nippon Steel Chemical Co
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133305Flexible substrates, e.g. plastics, organic film
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133302Rigid substrates, e.g. inorganic substrates

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Liquid Crystal (AREA)
  • Silicon Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Electroluminescent Light Sources (AREA)
  • Laminated Bodies (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

Provided is a display device formed by using a hard transparent substrate having properties like inorganic glass and properties like plastic and having an excellent bending-resistance. The hard transparent substrate is obtained by hardening a hardening resin represented by formula (1), said hardening resin having a tight structure portion (A) having a Kp of 0.68 to 0.8 calculated from formula (2) and a loose structure portion (B) having a Kp less than 0.68, weight ration of structure portion (A)/(B) being in a range of 0.01 to 5.00, said hardening resin having at least one unsaturated coupling and having an average molecular weight of 800 to 60000. -((A)-(B)m)n- (1)(m and n are integrals equal to or more than 1) Kp=An*Vw*p/Mw(2)(An = Avogardro constant, Vw = Van der Waals volume, p = density, Mw = molecular weight, Vw = ΣVa, Va = 4π/R3 - Σ1/3πhi2(3Ra-hi), hi = Ra-(Ra2+di2-Ri2)/2di, Ra = radius of atom, Ri = radius of coupled atom, and di = distance between atoms)

Description

200817176 一 九、發明說明: 【發明所屬之技術領域】 本發明係有關使用新穎之硬質透明基板取代以往之玻 璃基板而積層顯示裝置用電子材料而成之顯示裝置,且有 關在例如電腦、視聽設備、行動電話、資訊和通訊機器、 遊戲或模擬機器、車上裝載之導航系統等各種領域所使用 之顯示裝置。 【先前技術】 : 隨著電子技術急遽進步,特別是液晶顯示裝置、觸控 式面板、光電領域正擴大中。一般而言,光電元件係經由 將元件形成在具有透明導電層之玻璃基板上而提供至各種 用返。然而,玻璃基板係重量大,且當組合於行動型裝置 時,由於玻璃基板之比重大故有機器重量變大之問題。因 此,輕量化備受期待,而就取代玻璃基板之硬質基板而言, 係逐漸採用由強度、透明性、耐熱性等較優良之聚丙烯酸 〔酯、聚醚砜(polyethersulfone)、聚碳酸酯等塑膠薄片組成 之薄片基板。 然而,現狀之此專薄片基板由於厚度為〇 · 1 左右, 故比起以往之玻璃基板較欠缺剛性。雖然為了賦予剛性可 考慮將溥無加尽’但在一般得到薄片基板之際所採用之溶 劑堯每(casting)法中’由於發泡、平面性降低、殘留溶劑 之問題故實際上製造厚度〇.2mm左右者為極限。此外,為 了應用於液晶元件,薄片基板之雙折射率通常須在2〇nm 以下、較理想係1 〇nm以下,但塑膠成形之際,容易受到 319624 5 200817176 -分子定向而難以製造低雙折射之成形體。於是 例如積層2層雙折射率小之薄片之光學(來^ 利文獻υ,但在此種薄片中由於為難塑性樹脂,故有剛性 小且對对藥性極差之缺點。此外,對光學用薄片雖提幸有 在基材w之表面層塗布有硬化性樹脂者(參照專利文獻 2)’但此種薄片在基板清洗時,由於依溶劑不同而薄片側 面之硬化性樹脂有膨潤或溶解之虞,故耐藥性差,同 基板之剛性也不足之問題。 =別是,由於在光電元件領域中,更加要求高度之光 予守性、阻虱(gasbarrier)性、導電性、機械強度等。故實 =上係使用由具有各機能之多層或者膜所組成積層構造之 土板。已提案有例如,於塑膠成形體上之雙面設置硬化覆 =之:::面設置導電膜,且於另一面設置金屬氧化物覆 -著在此積層體中,因各層之性質不同和 : ° 4專’因此在加熱時,在塑膠成形體上容易產 生龜裂等之問題。 / 另=方面,有用之塑膠薄片基板雖做為玻璃替代基 <為了提同利用價值,故不只須為輕量,且也須兼具 儿性換。之,即在以某個曲率使基板彎曲(使彎曲際, 必财導電膜上不帶有裂痕而確保導電性。然而,在以不往 之塑膠薄片基板上,有其耐彎曲性不足之問題。 [專利文獻1]日本特開平7_ 36〇23號公報 [專利文獻2]日本特開平6 — 116406號公報 [專利文獻3]日本特開平2 — 53〇8號公報 319624 6 200817176 - 【發明内容】 (發明所欲解決的課題) 本發明t目的係在於提供—種顯示裝i,其係利用具 備如無機玻璃之強度、透明性、耐熱性及尺寸安定性,同 時也具備如塑膠之高動性及可加工性,且财彎曲性也優良 之硬貝透明基板,而積層各種顯示装置用電子材料而成者。 (解決課題的手段) 本發明人等為了得到取代以往之玻璃基板之新穎之基 "板而專心致力研究後結果發現,使在分子構造中具有自由 =積刀卞不同之緊密構造部位與疏鬆構造部位之硬化性樹 月曰硬化,而兼具玻璃基板與塑膠薄片基板所具有之優良性 能,且能得到耐彎曲性也<憂良之硬質透明基板,而此硬質 透月基板較適合代替i今在各種顯示裝置中所使用之玻璃 基板,才完成本發明。 換σ之,本發明係將顯示裝置用電子材料積層於硬質 ◦=明基板而形成之顯示裝置;硬質透明基板為可使下述一 ,式(1)所示之硬化性樹脂硬化而得到者,而上述硬化性樹 脂為具有由下述計算式⑺所計算之堆砌係數(packing c〇eff1Cient)KP在〇·68至〇·8之金屬氧化物 料位㈧、與由上述Κρ未達〇.68之有機物或有機 機金屬氧化物所構成之疏鬆構造部位(Β),同時構造部位(Α) /(B)之重量比為〇 〇1至5 〇〇,且具有至少—個不飽和鍵 而平均分子量在800至60000。 -ί (A)-(B)m} n- (l) 319624 200817176 -(惟,m及η係表示1以上之整數) Κρ=Αη · Vw · p/Mw ⑺ (惟,An=亞佛加厥數(Avogadro constant)、vw=凡得瓦體積 (Van der Waals volume)、密度、Mw=分子量、Vw==SVa、[Technical Field] The present invention relates to a display device in which a novel hard transparent substrate is used in place of a conventional glass substrate to laminate an electronic material for a display device, and is related to, for example, a computer or an audiovisual device. Display devices used in various fields such as mobile phones, information and communication machines, game or simulation machines, and navigation systems mounted on vehicles. [Prior Art]: With the rapid advancement of electronic technology, especially the liquid crystal display device, touch panel, and photovoltaic field are expanding. In general, photovoltaic elements are provided to various applications by forming the elements on a glass substrate having a transparent conductive layer. However, the glass substrate is heavy in weight, and when combined with a mobile device, the weight of the organic device becomes large due to the large ratio of the glass substrate. Therefore, light weight is expected, and in the case of a hard substrate which replaces a glass substrate, polyacrylic acid (ester, polyethersulfone, polycarbonate, etc.) which are excellent in strength, transparency, heat resistance, etc. are gradually used. A sheet substrate composed of plastic sheets. However, since the thickness of the wafer substrate is about 〇·1, the rigidity of the wafer substrate is less than that of the conventional glass substrate. In order to impart rigidity, it is considered that the crucible is not exhausted. However, in the case of a solvent which is generally used for obtaining a sheet substrate, in the casting method, the thickness is actually produced due to problems of foaming, planarity reduction, and residual solvent. The limit of .2mm is the limit. In addition, in order to be applied to a liquid crystal element, the birefringence of the sheet substrate usually needs to be 2 〇 nm or less, preferably less than 1 〇 nm, but when the plastic is formed, it is easy to be subjected to molecular orientation and it is difficult to manufacture low birefringence by 319624 5 200817176 - molecular orientation. The formed body. Then, for example, the optical layer of a sheet having a small birefringence layer is laminated (in the case of such a sheet, since it is a difficult plastic resin, it has a small rigidity and is extremely inferior to the drug property. Further, the optical sheet is used. In the case where the surface layer of the substrate w is coated with a curable resin (see Patent Document 2), when the sheet is cleaned on the substrate, the curable resin on the side of the sheet is swollen or dissolved depending on the solvent. Therefore, the resistance is poor, and the rigidity of the same substrate is insufficient. = In other words, in the field of photovoltaic elements, a high degree of light-preserving, gas barrier, conductivity, mechanical strength, etc. are required. = Upper layer uses an earth plate composed of a multilayer structure or a film having various functions. It has been proposed, for example, to provide a hardened coating on both sides of a plastic molded body::: a conductive film is provided on the surface, and the other surface is provided on the other side The metal oxide coating is provided in this laminate, and the properties of the layers are different from each other: ° 4 is special. Therefore, when heating, cracks and the like are likely to occur on the plastic molded body. Although the rubber sheet substrate is used as a glass substitute base, it is not only required to be lightweight, but also has to be changed in a child's manner. That is, the substrate is bent at a certain curvature (to make the bending, it is necessary There is no crack on the conductive film to ensure conductivity. However, there is a problem that the bending resistance is insufficient on the plastic substrate which is not in use. [Patent Document 1] Japanese Patent Laid-Open Publication No. 7_36〇23 [Patent [Patent Document 2] Japanese Patent Laid-Open No. Hei 6-116406 [Patent Document 3] Japanese Laid-Open Patent Publication No. Hei No. Hei. No. Hei. No. Hei. The display device i is a hard shell transparent substrate which has strength, transparency, heat resistance and dimensional stability such as inorganic glass, and also has high mobility and workability such as plastic, and excellent in flexibility. In addition, the inventors of the present invention have been working hard to obtain a new type of substrate for replacing the conventional glass substrate. In the substructure, the hardened tree is hardened by the compact structure and the loose structure, and the glass substrate and the plastic sheet substrate have excellent performance, and the bending resistance is also obtained. A hard transparent substrate, which is suitable for replacing the glass substrate used in various display devices, is completed. In the sigma, the present invention laminates the display device with electronic materials on the hard raft. a display device formed by a bright substrate; the hard transparent substrate is obtained by curing a curable resin represented by the following formula (1), and the curable resin is calculated by the following calculation formula (7) Packing c〇eff1Cient KP in the metal oxide level of 〇·68 to 〇·8 (8), and the loose structure part (Β) composed of the organic matter or organic metal oxide of the above Κρ未达〇68 At the same time, the weight ratio of the structural part (Α) / (B) is 〇〇1 to 5 〇〇, and has at least one unsaturated bond and an average molecular weight of 800 to 60,000. -ί (A)-(B)m} n- (l) 319624 200817176 - (except that m and η represent integers above 1) Κρ=Αη · Vw · p/Mw (7) (only, An = Yafoga Avogadro constant, vw=Van der Waals volume, density, Mw=molecular weight, Vw==SVa,

Va=47i/R3- El/37i:hi2(3Ra-hi)、hi=Ra- (Ra2+ di2-Ri2) /2di、Ra=原子半徑、Ri=鍵結原子半徑、及di=原子間距 離) 此外,本發明之上述顯示裝置中,緊密構造部位(A) (為具有去除下述一般式(I)之有機物部位之三維多面體構 造之金屬氧化物部位,疏鬆構造部位(B)為由一般式(〗)之 有機物部位與下述一般式(U )所構成。 (RSi03/2)w(M02)x(RXSiO)y(XM〇3/2)z ⑴ (R3R4R5Si01/2)j(R6R7SiO)k{R6R7XSi〇1/2}l ( jj ) 或者(c)—CH=CH2表示之不飽和基、烷基、環烷基、環烯 (,基、苯基、氳原子、烷氧基、或烷基矽氧基,而式(1)中之 多個R可為互相不同者,但至少i個係包含(&)、(b)、(c) 之任一者。此外,R1表示伸烷基、伸烯基或伸苯基,r2 表示氫原子或烷基,R3至R7為以— 、 (b) — R1 — CR2=CH2或者(c) — CH=CH2表示之不飽和基、烷 基、環烷基、環烯基、苯基、氫原子、烷氧基、或烷基矽 氧基’ Μ為矽、鍺、鈦、或锆之金屬原子,χ為鹵素原子、 或烷氧基,W為4以上之整數,X、y及ζ為滿足w+x+y + z = 8之整數;此外,j、k、及1分別表示〇以上之整數) 319624 8 200817176 在匕-k 般式(工)所示之構造單位中之三維多面體 構造骨架之金屬氧化物部位為產生自RSiX3、MX4或此等 此口 = (!隹R、]y [及X與一般式⑴相同)之水解縮合物 之構以單位中之二維多面體構造骨架之金屬氧化物部位、 或一般式(π)所示之構造單位為由R3R4R5six、R6R7si& 或此等之混合物(惟,…至r7^x與一般式⑻相同)之水 解縮合物所製造之金屬氧化物之鏈狀單位、及與金屬原子 鍵結之有機基,係本發明之較理想之樣態。 '^此外.,在本發明中,可依在上述硬化性樹脂中調配矽 氳(hydrosilyl)化觸媒或自由基起始劑,或者調配梦氫化觸 媒與自由基起始劑兩者而形成硬化性樹脂組成物之後,使 ^匕硬化性樹脂組成物硬化而得到硬質透明基板。具體而 3,可將如上述進行而調配出之硬化性樹脂組成物,在成 形成預定形狀後使之熱硬化或光硬化而得到成形體(硬質 透明基板)。此外,在此硬化性樹脂組成物中,調配分子中 ;具有至少1個矽氫基之可矽氫化之化合物、或調配分子中 具有不飽和基之化合物,或者也可調配此等兩者。 (發明的效果) 由本冬明所仔到之硬質透明基板因具備如無機玻璃之 強度、透明性、耐熱性及尺寸安定性,同時也具備如塑膠 之高韌性及可加工性,且因耐彎曲性也優良,所以可取代 在以液晶顯示裝置、觸控式面板顯示裝置、有機EL顯示 裝置為首之各種領域之顯示裝置中所使用之玻璃基板而使 用,一面發揮以往之玻璃基板和塑膠薄片基板所具備之性 319624 9 200817176 -能,同時可提供輕量性、及耐衝撞性更加優良之顯示裝置。 【實施方式】 ~ & 以下,進一步具體說明本發明。 本發明之硬化性樹脂係如上述一般式(1)所示,具有由 緊密構造部位(A)與疏鬆構造部位(B)組成之分子構造,且 具有至少1個不飽和鍵。在此,緊密構造部位⑷係由堆砌 係數Kp在0.68至〇·8之金屬氧化物部位所構成之構造部 位,而疏鬆構造部位(Β)係由堆砌係數Κρ未達〇·68之有機 Γ部位或有機部位與有機金屬氧化物部位所構成之構造 位。 口口 緊密構造部位(A)較理想係上述一般式(所示之構 造單位中三維多面體構造骨架之金屬氧化物部位。在一般 式(I)中,R之至少1個宜為具有以上述(a)至(c)表示之= 飽合基之有機基。再者,一般式⑴之多個R係無須皆相 同。 、 I > —般式⑴所示之構造單位係由三維多面體構造與 R所構成,其一例係將—般式(1)中之评為8且X、丫及z 為0時、w為10且X、y及z為〇時、及w為12且X、j 及Z為0之構造之具體例表示於下述構造式(3)、(句及(5)。 准,一般式(I )所示之構造單位並不限定於如此構造式 =)、(4)及(5)所示者。再者,此等構造係對於周知之特定 官能基者由X射線結晶構造解析所顯示。 319624 10 200817176Va=47i/R3-El/37i:hi2(3Ra-hi),hi=Ra-(Ra2+ di2-Ri2) /2di, Ra=atomic radius, Ri=bonded atomic radius, and di=interatomic distance) In the above display device of the present invention, the compact structure portion (A) is a metal oxide portion having a three-dimensional polyhedral structure in which the organic substance portion of the following general formula (I) is removed, and the loose structure portion (B) is a general formula ( The organic matter part of the formula is composed of the following general formula (U): (RSi03/2) w(M02)x(RXSiO)y(XM〇3/2)z (1) (R3R4R5Si01/2)j(R6R7SiO)k{ R6R7XSi〇1/2}l (jj) or (c)-CH=CH2 represents an unsaturated group, an alkyl group, a cycloalkyl group, a cycloalkene group, a phenyl group, a fluorene atom, an alkoxy group, or an alkyl group. a decyloxy group, and a plurality of R in the formula (1) may be different from each other, but at least i of the groups include any one of (&), (b), and (c). Further, R1 represents an alkylene group. , an alkenyl group or a phenyl group, r 2 represents a hydrogen atom or an alkyl group, and R 3 to R 7 are an unsaturated group represented by — — (b) — R 1 — CR 2 —CH 2 or (c) — CH=CH 2 , an alkyl group, Cycloalkyl, cycloalkenyl, phenyl, hydrogen, alkoxy, or alkyl oxime 'Μ is a metal atom of ruthenium, osmium, titanium, or zirconium, χ is a halogen atom, or alkoxy group, W is an integer of 4 or more, and X, y, and ζ are integers satisfying w+x+y + z = 8. In addition, j, k, and 1 respectively represent integers above )) 319624 8 200817176 The metal oxide portion of the three-dimensional polyhedral structure skeleton in the structural unit shown by 匕-k general (work) is generated from RSiX3, MX4 Or such a mouth = (! 隹 R, ] y [and X is the same as the general formula (1)) of the hydrolysis condensate is constructed in a unit of a two-dimensional polyhedron structure of the metal oxide portion of the skeleton, or the general formula (π) The structural unit is a chain unit of a metal oxide produced by a hydrolysis condensate of R3R4R5six, R6R7si& or a mixture thereof (only, ... to r7^x is the same as general formula (8)), and bonded to a metal atom. The organic group is a preferred aspect of the present invention. In addition, in the present invention, a hydrosilyl catalyst or a radical initiator may be formulated according to the above curable resin, or may be formulated. Dream hydrogenation catalyst and free radical initiator to form a curable resin composition The hardenable resin composition is cured to obtain a hard transparent substrate. Specifically, the curable resin composition prepared as described above can be thermally cured or photohardened after being formed into a predetermined shape. a molded body (hard transparent substrate). Further, in the curable resin composition, a compound capable of hydrogenating at least one anthracene hydrogen group or a compound having an unsaturated group in a compound, or These two can be adjusted. (Effects of the Invention) The hard transparent substrate which is described by the present invention has strength, transparency, heat resistance and dimensional stability such as inorganic glass, and also has high toughness and workability such as plastic, and is resistant to bending. Since it is excellent in the properties, it can be used as a glass substrate used in a display device of various fields including a liquid crystal display device, a touch panel display device, and an organic EL display device, and the conventional glass substrate and plastic film substrate can be used. The 319624 9 200817176 - can provide the display device with better lightweight and collision resistance. [Embodiment] ~ & The present invention will be further described in detail below. The curable resin of the present invention has a molecular structure composed of a compact structure portion (A) and a loose structure portion (B) as shown in the above general formula (1), and has at least one unsaturated bond. Here, the compact structure portion (4) is a structural portion composed of a metal oxide portion having a stacking coefficient Kp of 0.68 to 〇8, and the loose structure portion (Β) is an organic tantalum portion having a stacking coefficient Κρ未达·68. Or the structural position of the organic part and the organometallic oxide site. The mouth tight structure portion (A) is preferably a metal oxide portion of the above-described general formula (the three-dimensional polyhedral structure skeleton in the structural unit shown. In the general formula (I), at least one of R should preferably have the above ( a) to (c) = the organic group of the saturated group. Further, the plurality of R systems of the general formula (1) need not be the same. The structural unit represented by the general formula (1) is composed of a three-dimensional polyhedron and R is composed of an example in which the general formula (1) is rated as 8 and X, 丫 and z are 0, w is 10, and X, y, and z are 〇, and w is 12 and X, j. Specific examples of the structure in which Z is 0 are shown in the following structural formulas (3) and (sentences and (5). The structural unit represented by the general formula (I) is not limited to such a structural formula =), (4) And (5). These structures are shown by the X-ray crystal structure analysis for a well-known specific functional group. 319624 10 200817176

上述一般式(I )所示之構造早位中之金屬氧化物部位 係能藉由將以RSiX3或MX4表示之化合物之1種以上在酸 或驗觸媒存在下進行水解與縮合反應而得到。在此,r、X 及Μ係具有與一般式(j )之r、X及μ相同意義。 R之一部分係以上述(a)、(b)或(c)表示之不飽合基較理 想,但若以具體例表示較理想之不飽合基,則可舉例如, 3-甲基丙烯醯氧丙基、3_丙烯醯氧丙基、芳基、二烯美: 319624 11 200817176 及苯乙烯基。 X係鹵素原子、烷氧基之水解性基,若以具體例表示, 則可例示如氯、溴、甲氧基、乙氧基、正丙氧基、及異丙 氧基。 若呈示以RSiX3所示之化合物的較佳例,則可舉封 如,三氯矽烷、曱基三氯矽烷、乙基三氯矽烷、異丙基三 氯石夕纟兀、丁基二氯石夕烧、三級丁基三氯石夕烧、環己基三氯 矽烷、苯基三氯矽烷、乙烯基三氯矽烷、烯丙基三氯矽烷、 苯乙烯基三氯矽烷、環己烯基三氯矽烷、三曱氧基矽烷、 甲基二甲氧基矽烷、乙基三甲氧基矽烷、異丙基三〒氧基 矽烷、丁基三曱氧基矽烷、三級丁基三甲氧基矽烷、環己 基二甲氧基矽烷、苯基三甲氧基矽烷、乙烯基三曱氧基矽 烷、浠丙基三甲氧基石夕烧、苯乙烯基三甲氧基石夕燒、環己 稀基,甲氧基㈣、三乙氧基㈣、甲基三乙氧基石夕烧、 乙基一乙氧基石夕烧、異丙基三乙氧基石夕燒、丁基三乙氧其The metal oxide site in the structure of the structure represented by the above formula (I) can be obtained by subjecting one or more compounds represented by RSiX3 or MX4 to hydrolysis and condensation reaction in the presence of an acid or a test medium. Here, r, X and lanthanide have the same meanings as r, X and μ of the general formula (j). It is preferable that one part of R is an unsaturated group represented by the above (a), (b) or (c), but if a preferred unsaturated group is represented by a specific example, for example, 3-methylpropene醯 丙基 propyl, 3 propylene oxypropyl, aryl, diene: 319624 11 200817176 and styryl. The hydrolyzable group of the X-based halogen atom or the alkoxy group may, for example, be a chlorine, a bromine, a methoxy group, an ethoxy group, a n-propoxy group or an isopropoxy group. Preferred examples of the compound represented by RSiX3 include, for example, trichlorodecane, decyltrichlorodecane, ethyltrichloromethane, isopropyltrichloromethane, butyl dichloride. Xishou, tertiary butyl triclosan, cyclohexyl trichlorodecane, phenyl trichlorodecane, vinyl trichlorodecane, allyl trichlorodecane, styryltrichlorodecane, cyclohexenyl Chlorodecane, trimethoxy decane, methyl dimethoxy decane, ethyl trimethoxy decane, isopropyl tridecyl decane, butyl tridecyl decane, tert-butyl butyl trimethoxy decane, Cyclohexyl dimethoxy decane, phenyl trimethoxy decane, vinyl trimethoxy decane, propyl propyl trimethoxy sulphur, styryl trimethoxy sulphur, cyclohexyl, methoxy (tetra) , triethoxy (tetra), methyl triethoxy zebra, ethyl monoethoxy zebra, isopropyl triethoxy zebra, butyl triethoxy

:烧、三級丁基三乙氧基石夕院、環己基三乙氧基石夕院、J 基二乙乳基料、乙稀基三乙氧基㈣、烯丙基三乙氧笑 乙烯基三乙氧基石夕烧、環己烯基三乙氧基石夕燒: 院、甲基三丙氧基錢、乙基三丙氧基石夕燒、 異丙基二丙氧基石夕烧、其- 童美放p . 丁基二丙氧基矽烷、三級丁基三丙 烯基三丙氧基石夕烧、埽丙基:二:公丙减石夕烧、乙 氧基矽烷、環己烯基三丙氧美二二:本乙烯基三丙 乙氧基錢、甲基丙烯酸氧;:燒甲:=㈣甲基- 虱T基二甲虱基矽烷、3_甲基丙 319624 12 200817176 ,稀醯氧丙基三氯矽烷、3_甲基丙烯醯氧丙基三甲氧基矽 ??甲基丙稀醯氧丙基三乙氧基矽烷、3_丙稀醯氧丙基 三甲氧基矽烷、3-丙烯醯氧丙基三氯矽烷等。 」此外,Μ係矽、鍺、鈦或鍅。在此,若表示以μα 所示之化合物之較理想之例,則可舉例如,四氯錢、四 甲氧基料、四乙氧基料、四氯鍺烧(germane)、四甲氧 基錯烧、四乙氧基錯烧、6氧化鈦(titaniumeth〇xide)、丙 氧域、異丙氧化鈦、丁氧化鈦、異丁氧化鈦、乙氧化鍅、 丙氧化鍅、異丙氧化錯、丁氧化鍅、異丁氧化錯等。 另一方面,疏鬆構造部位(B)係由去除上述一般式(1 ) 所示之構造單位中之三維多面體構造骨架之殘基(或取代 基)’與上述-般式⑷所示之構造單位組成。換言之,係 由上述-般式⑴所示之構造單位去除緊密構造部位⑷ 之邛位舁上述一般式(π)所示之構造單位所組成。更具體 而言’依照下述說明,以可得自R3R4R5six、R6R7six:或 二匕:之混合物(惟,以至尺7及χ係與一般式⑷相同)之水 解縮口物之|又式(Π)所不之金屬氧化物之鍵狀構造物、 及與-般式⑴中之金屬原子鍵結之有機基[換言之,即去 除-般式(I )所示之構造單位中之三維多面體構造骨架之 殘基(或取代基)]組成為佳。 上述一般式(]];)所元接 ,,, ν ;所不之構造早位係,可由將以 R R R SiX或R6R7SiX2表矛夕/卜人从 2衣不之化合物之1種以上,在酸或 鹼觸媒存在下進行轉與縮合反應:Sinter, tert-butyl butyl triethoxy shixiyuan, cyclohexyl triethoxy zexiyuan, J-based di-ethyl milk base, ethylene triethoxy (tetra), allyl triethoxy methoxy vinyl Ethoxylated sulphur, cyclohexenyl triethoxy sulphur: 院, methyl tripropoxy hydroxy, ethyl tripropoxy sulphur, isopropyl dipropoxy sulphur, its - Tongmei P. butyl dipropoxy decane, tert-butyl butyl propylene tripropoxy sulphur, fluorenyl propyl: two: propylene reduction, ethoxy decane, cyclohexenyl tripropoxy US 22: the present vinyl tripropylene ethoxy money, methacrylic acid;: burnt: = (tetra) methyl - 虱 T-dimethyl dimethyl decane, 3 - methyl propyl 319624 12 200817176, dilute oxypropylene Trichlorodecane, 3-methylpropenyloxypropyltrimethoxyhydrazine, methylpropenyloxypropyltriethoxydecane, 3-propyleneoxypropyltrimethoxydecane, 3-propene醯 丙基 propyl trichloro decane and the like. In addition, the system is 矽, 锗, titanium or 鍅. Here, as a preferable example of the compound represented by μα, for example, tetrachloromethane, tetramethoxy hydride, tetraethoxy hydride, tetrahydrofuran (germane), and tetramethoxy group are mentioned. Misfired, tetraethoxy misfired, 6 titanium oxide (titaniumeth〇xide), propoxy field, titanium isopropoxide, titanium butoxide, titanium isobutoxide, cerium oxide, cerium oxide, isopropoxide Butadiene oxide, isobutyl oxidation, and the like. On the other hand, the loose structure portion (B) is a structural unit represented by the above-described general formula (4) by removing the residue (or substituent) of the three-dimensional polyhedral structural skeleton in the structural unit represented by the above general formula (1). composition. In other words, the structural unit shown by the above general formula (1) removes the structure of the compact structure portion (4) and the structural unit shown by the above general formula (π). More specifically, 'according to the following description, a mixture of R3R4R5six, R6R7six: or diterpene: (but, as long as the ruler 7 and the oxime is the same as the general formula (4)) a bond structure of a metal oxide and an organic group bonded to a metal atom in the general formula (1). In other words, a three-dimensional polyhedral structure skeleton in a structural unit represented by the general formula (I) is removed. The residue (or substituent)] composition is preferred. The above general formula (]];) is not connected to the structure of the early system, and may be one or more compounds of the compound of the genus of the genus or the genus of the genus Or a condensation reaction in the presence of a base catalyst

R7係具有與一般式(”之…至尺7相门^ IThe R7 series has the same principle as the general formula ("...to 7"

;K至R相同意義。當R3至R 319624 13 200817176 '之一部分為不飽合基時,若以較理想之具體例表示,則可 舉例如’ 3 -甲基丙烯醯氧丙基、3 -丙烯驢氧丙基、芳基、 乙烯基、及苯乙烯基。X係鹵素原子或烷氧基,若以^體 例表示,則可例示如氯、溴、甲氧基、乙氧基、正丙氧基、 及異丙氧基。 以R3R4R5SiX表示之化合物之較佳例,可舉例如,三 甲基氯矽烷、乙烯基二甲基氯矽烷、二甲基氯矽烷、苯基 二甲基氯矽烷、苯基氯矽烷、三乙基氯矽烷、三乙烯基氯 矽烷、甲基二乙烯基氯矽烷、烯丙基二甲基氯矽烷、3_甲 基丙卸ik氧丙基一甲基氣砍烧、3 -丙烯酿氧丙基二甲基氯 矽烷、苯乙烯基二甲基氯矽烷、三甲基甲氧基矽烷、乙烯 基二甲基乙氧基矽烷、二甲基曱氧基矽烷、苯基二甲基甲 氧基矽烷、苯基甲氧基矽烷、三乙基曱氧基矽烷、三乙烯 基甲氧基矽烷、甲基二乙烯基甲氧基矽烷、烯丙基二甲基 甲氧基矽烷、3_甲基丙烯醯氧丙基二曱基甲氧基矽烷、3_ )丙烯醯氧丙基二甲基甲氧基矽烷、苯乙烯基二甲基甲氧基 矽烷、三甲基乙氧基矽烷、乙烯基二曱基乙氧基矽烷、二 甲基乙氧基矽烷、苯基二甲基乙氧基矽烷、苯基乙氧基矽 烷、三乙基乙氧基矽烷、三乙烯基乙氧基矽烷、甲基二乙 烯基乙氧基矽烷、浠丙基二甲基乙氡基矽烷、3_甲基丙烯 醯氧丙基二甲基乙氧基矽烷、3-丙烯醯氧丙基二甲基乙氧 基矽烷、苯乙烯基二甲基乙氧基矽烧、三曱基丙氧基矽烷、 乙烯基二甲基丙氧基矽烷、二甲基丙氧基矽烷、苯基二甲 基丙氧基矽烷、苯基丙氧基矽烷、三乙基丙氧基矽烷、三 319624 14 200817176 •乙烯基丙氧基矽烷、甲基二乙烯基丙氧基矽烷、烯丙基二 甲基丙氧基矽烷、3-甲基丙烯醯氧丙基二甲基丙氧基石夕 烷、3_丙烯醯氧丙基二甲基丙氧基矽烷、苯乙烯基二甲基 丙氧基矽烷、三甲基異丙氧基矽烷、乙烯基二曱基異丙氧 基矽烷、二甲基異丙氧基矽烷、苯基二甲基異丙氧基矽烷、 苯基異丙氧基矽烷、三乙基異丙氧基矽烷、三乙烯基異丙 氧基矽烷、甲基二乙烯基異丙氧基矽烷、烯丙基二甲基異 丙氧基矽烷、3-甲基丙烯醯氧丙基二甲基異丙氧基矽烷、 Γ 3-丙烯醯氧丙基二甲基異丙氧基矽烷、苯乙烯基二甲基異 丙氧基矽烷等。 以R6R7SiX2表示之化合物之較佳例,可舉例如,二曱 基二氯石夕燒、乙烯基甲基二氯石夕烧、二乙稀基二氯石夕烧、 烯丙基甲基二氯我、甲基二氯傾、甲基苯基二氯石夕烧、 甲基乙基二氯石夕烧、乙基乙烯基二氯石夕炫、乙基婦丙基二 氯石夕燒、苯乙烯基甲基二氯我、苯乙烯基乙基二氯石夕院、 3_甲基丙烯醯氧丙基甲基二氯矽烷、二甲基二甲氧基矽 烷、乙烯基甲基二甲氧基石夕烧、二乙稀基二甲氧基石夕烧、 烯丙基甲基二甲氧基石夕院、甲基二甲氧基石夕烧、甲基苯基 =乳基料、甲基乙基二甲氧基錢、乙基乙烯基二甲 夕烧乙基烯丙基二甲氧基♦烷、苯乙烯基甲基二甲 兩:夕烧-苯乙婦基乙基二T氧基石夕烧、甲基丙烯醯氧 其Γ甲^二?氧基錢、二甲基二乙氧基㈣、乙婦基甲 厂二氧基石夕燒、二乙婦基二乙氧基石夕烧、稀丙基甲基二 乙氣基錢、甲基二乙氧基㈣1基苯基二乙氧基石夕炫、 319624 15 200817176 •’基乙基二乙氧基矽烷、 烯丙基二乙氧基石夕燒、苯 乙氧基石夕炫、乙基 稀基乙基二乙氧其抑、Q 土甲基—乙乳基錢、苯乙 基石夕貌、二甲A:丙气1 _甲基丙稀釀氧丙基甲基二乙氧 基㈣,基=-:二= 二丙氧基料1基苯基二^基料 二^基 基石夕垸、乙其7哈甘- 土乙基一丙氧 石夕垸、苯乙料^二丙氧基石夕烧、乙基稀丙基二丙氧基 基石夕垸、3甲^ Γ'苯乙婦基乙基二丙氧 ▲丙烯&乳丙基甲基二丙氧基矽烷、二Μ 统、乙婦基甲基二異丙氧基錢、 基錢、料基甲基二異丙氧基錢、甲基二里 氧1石=坑、f基苯基二異丙氧基石夕统、甲基乙基二異丙 =凡、乙基乙烯基二異丙氧基石夕燒、乙基稀丙基二里 基:苯乙烯基甲基二異丙氧基石夕燒、苯乙稀基2 石夕炫等丙乳基石夕院、3_甲基丙婦酿氧丙基甲基二異丙氧基 2明之硬化性樹脂係能使上述—般式⑴所示之籠 减樹脂、與上述一般式⑻所示之石夕氧化合物反應 :到’而所得到之硬化性樹腊係具有藉由將上述一般式 脾十及上述一般式(ιι)所示之構造單位之不飽和鍵予以交 ^水解縮合而縮合之分子構造。而且,此硬化性樹脂係 ^虿处自由體積分率所計算之堆砌係數在0.68至〇8之緊 =冓造部位⑷、與堆石切係數未達0.68之疏鬆構造部位 且具有至少一個不飽和鍵。 319624 16 200817176; K to R have the same meaning. When one of R3 to R 319624 13 200817176 'is an unsaturated group, if it is represented by a preferable specific example, for example, '3-methylpropenyloxypropyl, 3-propenyloxypropyl, aryl Base, vinyl, and styryl. The X-based halogen atom or the alkoxy group may, for example, be a chlorine, a bromine, a methoxy group, an ethoxy group, a n-propoxy group or an isopropoxy group. Preferred examples of the compound represented by R3R4R5SiX include, for example, trimethylchlorodecane, vinyldimethylchlorodecane, dimethylchlorodecane, phenyldimethylchlorodecane, phenylchlorodecane, and triethyl. Chlorodecane, trivinyl chlorodecane, methyl divinyl chlorodecane, allyl dimethyl chloro decane, 3-methyl propyl propyloxypropyl monomethyl chopping, 3- propylene oxypropyl Dimethylchlorodecane, styryldimethylchlorodecane, trimethylmethoxydecane, vinyl dimethyl ethoxy decane, dimethyl decyl decane, phenyl dimethyl methoxy decane , phenyl methoxy decane, triethyl decyl decane, trivinyl methoxy decane, methyl divinyl methoxy decane, allyl dimethyl methoxy decane, 3- methacryl醯 丙基 曱 曱 甲 methoxy decane, 3 _ propylene methoxy propyl dimethyl methoxy decane, styryl dimethyl methoxy decane, trimethyl ethoxy decane, vinyl dioxime Ethoxy decane, dimethyl ethoxy decane, phenyl dimethyl ethoxy decane, phenyl ethoxy decane, triethyl ethoxy ruthenium Alkane, trivinyl ethoxy decane, methyl divinyl ethoxy decane, propyl propyl dimethyl ethane decane, 3- methacryl methoxy dimethyl methoxy decane, 3- Propylene methoxypropyl dimethyl ethoxy decane, styryl dimethyl ethoxy oxime, tridecyl propoxy decane, vinyl dimethyl propoxy decane, dimethyl propoxy decane , phenyl dimethyl propoxy decane, phenyl propoxy decane, triethyl propoxy decane, tri 319624 14 200817176 • vinyl propoxy decane, methyl divinyl propoxy decane, allylic Dimethylpropoxydecane, 3-methylpropenyloxypropyldimethylpropoxy aspartate, 3-propylenesulfonyloxypropyldimethylpropoxydecane, styryldimethylpropane Base decane, trimethyl isopropoxy decane, vinyl dinonyl isopropoxy decane, dimethyl isopropoxy decane, phenyl dimethyl isopropoxy decane, phenyl isopropoxy decane , triethylisopropoxydecane, trivinylisopropoxydecane, methyldivinylisopropoxydecane, allyldimethylisopropoxyfluorene , 3-dimethyl-oxopropyl Bing Xixi isopropoxy Silane, Bing Xixi Gamma] 3- oxopropyl dimethyl isopropoxy Silane, dimethyl styrene Silane isopropoxy and the like. Preferred examples of the compound represented by R6R7SiX2 include, for example, dimercapto chlorite, vinylmethyl chlorite, dichlorocarbazone, allyl methyl dichloride. I, methyl dichloride, methyl phenyl dichlorite, methyl ethyl dichlorite, ethyl vinyl dichlorite, ethyl propyl dichlorite, benzene Vinylmethyldichloro-I, Styryl Ethyl Chloride, 3-Methylpropenyloxypropylmethyldichlorodecane, Dimethyldimethoxydecane, Vinylmethyldimethoxy Base stone kiln, dimethoxy dimethoxy zebao, allyl methyl dimethoxy shixi, methyl dimethoxy zebao, methyl phenyl = milk base, methyl ethyl Methoxy money, ethyl vinyl dimethoate ethylallyl dimethoxy methoxy, styryl methyl dimethyl two: Xizhuo - phenylethyl ethyl dioxylate Methyl propylene oxime Γ Γ ^ ^ ^? Oxygen, dimethyldiethoxy (tetra), ethoxylate, dioxycarbazide, diethyl diethoxy sulphur, dipropylmethyldiethylene, methylene Oxy (tetra) 1 -phenylphenyldiethoxy Shi Xi Xuan, 319624 15 200817176 • 'Alkyl diethyl ethoxy decane, allyl diethoxy sulphur, phenethyl oxalate, ethyl isopropyl ethyl Diethoxylated, Q-methyl-ethyl-etheric acid, phenethyl sulphate, dimethyl A: propane 1 _methyl propylene oxypropylmethyldiethoxy (tetra), base =-: Bis = dipropoxyl material 1 phenyl phenyl 2 base 2 基 base Shi Xi 垸, B 7 7 Hagan - soil ethyl propylene oxide 垸 垸, benzene benzene ^ dipropoxy zexi, B Base propyl dipropoxy group 垸 垸 3, 3 甲 Γ 苯 苯 妇 乙基 二 ▲ & & 乳 乳 乳 乳 甲基 甲基 甲基 甲基 乳 乳 乳 乳 乳 乳 乳 乳 乳 乳 乳 乳 乳Diisopropoxyl money, base money, methylene diisopropoxy alcohol, methyl dihydroxan 1 stone = pit, f-phenyl phenylisopropoxy oxalate, methyl ethyl diisopropyl = 凡, ethyl vinyl diisopropoxy zebra, ethyl propyl propyl : Styryl methyl diisopropoxy zebra, styrene 2 Shi Xixuan and other propyl milk base stone court, 3_ methyl propyl oxypropyl methyl diisopropoxy 2 sclerosing The resin is capable of reacting the cage-reduced resin represented by the above formula (1) with the cerium oxide compound represented by the above general formula (8): the hardened bollard obtained by the above-mentioned formula has the spleen ten by the above-mentioned general formula And the molecular structure of the unsaturated bond of the structural unit represented by the above general formula (ιι) is hydrolyzed and condensed. Moreover, the stacking coefficient calculated by the free volume fraction of the curable resin is between 0.68 and 〇8 = the molded portion (4), the loose structure portion with the rock cutting coefficient of less than 0.68, and has at least one unsaturated bond. . 319624 16 200817176

Kp係從以下之計 (2) 密度、Mw=分 計算在本發明中所使用之堆砌係數 算式(2)所計算。 Κρ=Αη · Vw · p/Mw (惟’ An=亞佛加厥數、vw==凡得瓦體積 子量)在此之中, 'The Kp system is calculated from the following formula (2) Density, Mw = min. Calculated by the stacking factor formula (2) used in the present invention. Κρ=Αη · Vw · p/Mw (only 'An=Afoga number, vw==Wandeva volume), among them, '

Vw=EVaVw=EVa

Va=47c/R3-El/37ihi2(3R-hi) hi=R — (R2+ di2 — Ri2)/2di (惟,R=好半彳f、Ri,結原子半徑、及 在計算上述堆石切係數時,原子半徑 原子間距離) 載於曰本化學學會著化學便覽基礎編修訂 值。換言之,即原子半徑則使用H=12 a、〇==152 A、e=h7 A、Si=2.14人,原子間距離係使用H — ㈡別 A、Si-〇u63A、Si—〇=1_^^、卜 A。例如,以 一般^ (1)之M=石夕原子、㈣、w=2、y=〇、及z=〇表示之 玻璃密度係2.23g/cm3而其堆⑽數係成為Q 747。取一 般式(1)之R為甲基且v=8、w=〇、y=〇、及z=〇之立方體構 k之八甲基倍半石夕氧烧(sllsesqui〇xane)之密度係1 4%/ cm3而堆砌係數係成為〇 697。此外取一般式(2)之尺6及r7 士甲基且j=〇、k=4、及卜〇之環狀構造之八甲基環四石夕氧 烷之密度係0.956g/cm3,而其堆石切係數係成為〇·576。同 樣地取及3及R4、R5、R6及R7為甲基且j=2、k=l、及1=0 之鏈狀構造之八甲基三矽氧烷之密度係〇 82〇g/cm3,而 其堆砌係數係成為0.521。換言之’具有矽原子與3個以 319624 17 200817176 上氧原子鍵結之三維多面體構造之金屬氧化物之堆彻 為0.69以上,而成為本發明之緊密構造部位。此外 及鏈狀構造之化合物之堆彻係數係〇 576及Q 52成 本發明之疏鬆部位。 X兩 本發明之硬化性樹脂係,緊密構造部位(A)與疏鬆構造 部位⑻之構成重量比㈧/⑻為〇〇1至5〇〇、較理 U至3·0。當⑷/(B)小於〇·〇10寺,緊密構造過少,= 硬化性樹脂成形且使樹脂硬化而得到之成形體之機械物性 及耐熱性顯者地惡化。此外,當重量比在請以上時 予成形體柔軟性之疏鬆構造部位過少,而㈣顯著地惡化 且成為脆弱之成形體。 此外,本發明之硬化性樹脂係平均分子量在8㈧至 6_〇。若平均分子量未達_則在成形後容易變得脆弱, 相反地若朗6_〇則硬化成型加工變得困難且在使用上 有時會造成不自由。再者,平均分子量可經由周知之咖 測定裝置進行測定。 6 7以RSiX3或ΜΧ4表示之化合物、及以R3ws汉或 ^R7SiX2表示之化合物之水解及縮合所使用之酸觸媒而 5 ’可舉例如鹽酸及硫酸。此外,亦能將此等混合使用, 且當水解基為鹵素原子時也可利用在水解時所生成之鹵化 氫。 ^以使用於水解及縮合之鹼性觸媒而言,可例示如,氫 氧化钟、氫氧化鈉、氫氧化铯等驗金屬氫氧化物、或者^ 氧化四甲在安、氫氧化四乙銨、氫氧化四丁録、氯氧化苯; 319624 18 200817176 基二甲基銨、氫氧化苯曱基三乙基銨 之中,從觸媒活性高之點來看尤以使用::銨鹽:此等 想。驗性觸媒通常係使用水溶液。目甲銨較理 水解反應係必須有水的存在,但此 液供认,&gt; 丌s4 λ u ? 寺了由觸媒之水溶 旦:^ 水量係以將水解性基水解之 置以上,較理想係理論量之1〇至15倍量。 之 在將硬化性樹脂做為硬化性樹脂組:里物之情开V,在 2性樹脂所調配成之分子中具有至少氫基之化合 物係,:子甲至少“固以上之可矽氫化之矽原子上 原子之寡聚物及單體。以石夕原子上 ^ 一 _ ^ r卞上具有虱原子之寡聚物而 吕’可舉例如,$氫石夕A^(polyhydrogensiloxane)類、聚 二:基氫⑦氧基發氧烧類及其共聚物、末端為由二甲基氯 石夕氧基所修飾之石夕氧烧。此外,以在石夕原子上具有氫原子 之單體而言,可例示如,四甲基環四矽氧烷、五甲基環五 石夕氧烧等環狀㊉氧絲,H氧絲、三氫單我類、 二氫單矽烷類、單氫單矽烷類、二甲矽氧基矽氧烷類等, 也可混合此等2種以上。 此外,具有硬化性樹脂所調配成之不飽合基之化合物 係大致區分成,構造單位之重複數2至2〇左右之聚合物之 反應性單體、與低分子量之低黏度之反應性單體。此外, 大致區分成,具有1個不飽和基之單官能不飽和化合物與 具有2個以上不飽和基之多官能不飽和化合物。 以反應性寡聚物而言,可例示如,聚乙烯矽氧烷類、 聚二甲基乙烯基矽氧基矽氧烷類及其共聚物、末端為由二 19 319624 200817176 , 甲基乙烯基矽氧基所修飾之矽氧烷類、環氧丙烯酸酯、環 氧化油丙烯酸g旨、胺基甲酸酯丙稀酸酯、不餘和聚酯、聚 酯丙烯酸i旨、聚醚丙烯酸酯、丙稀酸乙浠酯、多稀/硫醇、 矽氧丙烯酸酯、聚丁二烯、聚曱基丙烯酸苯乙烯基乙酯等。 在此等中係有單官能不飽和化合物與多官能不飽和化合 物。 以反應性單官能單體而言,可例示如,三乙基乙稀基 石夕烧、二本基乙烯基梦烧等乙稀取代碎化合物類、環己稀 ( 等環狀烯烴類、苯乙烯、醋酸乙烯酯、N-乙烯基吡咯酮、 丙烯酸丁酯、丙烯酸2-乙基己酯、丙烯酸正己酯、丙烯酸 環己酯、丙烯酸正癸酯、丙烯酸異冰片酯(isoborny 1)、丙 烯酸二環戊烯氧基乙酯、丙烯酸苯氧乙酯、甲基丙烯酸三 氟乙酯等。 以反應性多官能單體而言,可例示如,四乙烯基矽烧、 二乙烯基四曱基二矽氧烷等乙烯取代矽化合物,四甲基四 &amp;乙烯基環四矽氧烷、五曱基五乙烯基環五矽氧烷等乙烯取 代環狀矽化合物,雙(三甲矽烷基)乙炔、二苯基乙炔等乙 炔竹生物’降冰片二稀(n〇rb〇rnadiene)、二環戊二烯、環 辛二烯等環狀多烯類,乙烯基環己烯等乙烯基取代環狀烯 烴’二乙烯基苯類、二乙炔基苯類、三羥甲丙烷二烯丙基 醚、季戊四醇(pentaerythritol)三烯丙基醚、三丙二醇二丙 浠酸酯、1,6-己二醇二丙烯酸酯、雙酚a二環氧丙基 (glycidyl)醚二丙烯酸酯、四乙二醇二丙稀酸酯、羥基特戊 酸(pivalic acid)新戊二醇二丙烯酸酯、三羥曱丙烷三丙烯 20 319624 200817176 酸酉旨:季戊四醇三丙稀酸醋、季戊四醇四㈣㈣、 戍四醇六丙稀酸酯等。 以为子中具有不飽和基之化合物而言,除以上所例示 者以外’能制各種反應性寡聚物、單體。此外,此 應性寡聚物和單體可分別單獨使用、或混合2種 用 本發明所使用之分子中具有至少氫基之化合 物、及分子中具有不飽和基之化合物可分別單獨使用 混合使用2種以上皆可。 (本發明中,可在硬化性樹脂中調时氫化觸媒或自由 基起始劑,或者調配兩者而得到硬化性樹月旨組絲。缺後, 能使此硬化性樹脂組成物熱硬化或光魏,以石夕氯化和自 由基聚合,而得到硬質透明基板。此外,可加入石夕氫化觸 媒和自由基起始劑,將分子中具有至少j個石夕氯基之化合 物和具有不飽和基之化合物進一步調配而得到硬化性樹脂 組成物。換言之,即從使硬化性樹脂硬化而得到硬質透明 (基板之目的、和改良所得到之硬化透明基板之物性之目 的’促進反應之添加劑係調配石夕氫化觸媒、絲合起始劑、 光聚合起始劑、光起始助劑、增敏劑等而得到硬化 組成物。 旦當調配石夕氫化觸媒日夺’其添加量相對於硬化性樹脂之 重量以金屬原子添加在}至1〇〇〇ppm、較理想係在2〇至 5〇二ppm之|&amp;圍内較理想。當調配光聚合起始劑或熱聚合起 =J做為自由基起始劑時,其添加量在相對於硬化性樹 月曰,以使其在0.1至5重量份之範圍為佳,且以使其在〇」 319624 21 200817176 至3重量份之範圍更加理相。 〜 右此添加夏不滿0· 1重署佟 則硬化不足,而所得到之忐擗駚 1 刀 Μ亍判之成形體之強度和剛性降低。 ^面右超過5重量份則有產生成形體之著色等問題之 虞。此外可單較_氫化觸㈣自由㈣ 用2種以上使用。 併 以了氯化觸媒而言,可舉例如,氯化翻、氣 (CM〇r_t麵acid)、氯翻酸與醇、盤、§同之錯合物 ㈣與敎類之錯合物、_乙烯切氧燒之錯合物、二 碳基,氯化缺㈣、㈣觸料聽金屬系觸媒。 在此权中,從觸媒活性之點來看,以氯⑽、氯麵酸盘 細經類=錯合物、銘與乙烯基石夕氧院之錯合物較理想。此 外,可單獨使用此等,也可併用2種以上。 乂更化ί±樹Ha成物做為光硬化性組成物之情形中所 使用之光聚合起始劑而言,能較適合使用乙醯苯系、安自 香(b_in)系、二苯基酮系、嗟_⑽。讓th_)系、酿 基膦氧化物系等化合物。具體而言可例示如,三氯乙醯苯、 二乙氧基乙酸苯、經基_2•甲基丙小酮、卜經基環 己基苯基酮、2_甲基_H4_甲基。塞吩基⑽。phenyi))_2_嗎淋 基丙-1-酉同、安息香甲基鱗、苯甲基二甲基縮嗣(ketai)、二 苯基酮、嗟軸、氧化2,4,6•三甲基苯甲酸基二苯膦、乙 搭酸(gly〇xy㈣甲基苯醋、樟腦醌(camph〇rquin〇ne)、苯 偶醯、蒽醌、米其勒酮(Michier,s ket〇ne)等。此外,也能 併用與光聚合起始劑組合而發揮效果之絲始助劑和增敏 劑0 319624 22 200817176 其奉t 過氧化氫系、過氧化一严 基系、過氧化二醯基系、過氧二 -烷 各種有機過氧化物。具心言可㈣如等 限制。:外己:;1:,2-乙㈣,但並非被此等所 上混合使用。(、、、w起始劑可單獨使用、或將2種以 明之更化性樹脂組成物中,係能在不棒離本發 如有J:r加各種添加劑。各種添加劑係可例示 劑、發泡劑:晶 成分等。 U者色劑、交聯劑、分散助劑、樹脂 如上述’本發明之硬質透明基板係,能將含 由基聚合起始劑之任一種、或者包含兩者之: 碌Γ曰ί成物成形為預定形狀,再經由加熱或光照射使並 1、、二:ί、:::,製造共聚物(硬質透明基板)時, 2二二1 j合起始劑與促進劑,而能選自室溫至 之見廣la圍。此情形,在模具内和鋼帶上 合,化而能得到所需形狀之硬質透明基板。更具體而= 射出成形、擠壓成形、Μ卜丄、, I鈿成形、轉移成形、壓延成形 (ca—g molding)、堯鑄(注模)成形之一般成形加工方 319624 23 200817176 - 法皆可應用。 士此外,當經由光照射產生之光聚合製造硬質透明基板 打,恥射波長1.0至400nm之紫外線和波長4〇〇至 之可見光,而能得到硬質透明基板。所使用之光之波長並 不特別限制,但較適合使用波長200 i 4〇〇nm之近料 線。以使用做為紫外線產生源之燈而言,可例示如,低壓 水銀燈(輸出:0.4至樣/cm)、高塵水銀燈(4〇至l6〇w; _、超高壓水銀燈⑽i 435w/cm)、金屬自素燈⑽ 至160W/cm)、脈衝氤燈(8〇至12〇w/cm)、無電極放電 /燈(80至l2〇W/cm)f。此等之紫外線燈係由於在其分光 布有各自之知'被,故依所使用之光起始劑之種類而選 定。 •以經由光照射得到硬質透明基板之方法而言,可例示 如·在^具有任何穴(Cavity)形且由石英玻璃等透明材料所構 成^模具内注入硬化性樹脂組成物,再以上述紫外線燈照 ^射I外線進行聚合硬化後,使其從模具脫模而製造所需形 狀之硬質透明基板之方法;和在不使用模具之情形中,例 ^在私動之鋼V上使用刮刀片或輥狀之塗布 =k布本發明之硬化性樹脂組成物,使其以上述紫外線燈 聚口硬化,而製造薄片狀之硬質透明基板之方法等。並且 在本毛明中也可組合使用經由加熱與光照射得到硬質透明 基板之方法。 、 少使本务明中之硬化性樹脂硬化而得到之硬質透明基板 二I月f生優良,具體而言波長在55〇nm之光之光線穿透率 319624 24 200817176 •在80%以上,此外,因雙折射率在2〇随以下,所以可夢 由^各種顯示裝置用電子材料積層而得到各種顯示裝置。曰 換言之’若光線穿透率未達8〇%,則當顯示彩色等時,由 於晝面變暗而難以使用,故有只能使用於單色顯示元件等 用途之傾向,若雙折射率大於施m,則做為顯示面板時, 有顯不晝面產生色斑之傾向,但本發明之硬質透明基板係 由於具備如上述之特性,故在得到各種顯示裝置之上 合。 、《硬質透明基板之厚度係因顯示裝置之種類而異, 例如液晶顯示裝置之情形係以〇1〇至2 〇〇麵較理相。若 未達O.Hhnm則因基板本身之重量而容易彎曲,且线用 以往之玻璃製基板之液晶顯示裝置之製造過程無法使用之 虞。另一方面,若超過2.〇〇mm則重量變成與以往之15 至0.7mm之玻璃基板相同,而悖離輕量化之目的。 以下’使用所附圖式說明本發明之較理想之實施樣態。 '第1圖係使用各種顯示裝置用電子材料與本發明之硬 質透明基板形成之液晶顯示裝置之剖面解說圖,且為使用 本!X明之硬貝透明基板之較適合之例。此情形,顯示裝置 用電子材料係例如,透明電極、定向膜、液晶層、濾色器、 溥膜電晶體、偏光板、及背光源,而在硬質透明基板上積 層有滤色器、透明電極、及定向膜之液晶第i構件、與在 硬質透明基板上積層有薄膜電晶體及定向膜之第2構件係 以使定向膜彼此面對面之方式夾住液晶層,且在液晶第1 構件之硬質透明基板外側配置偏光板,同時在液晶第2構 319624 25 200817176 件之硬質透明基板外側配置偏光板及背光源。在此,可在 上述硬質透明基板之雙面設置阻氣膜。 液晶顯示裝置之情形,以透明電極而言,可舉例如, 氧化銦、氧化錫、金、銀、銅、鎳等導電物質。此等可單 獨或2種以上混合使用,從透明性與導電性之平衡面來 看,通常以由氧化銦99至90%與氧化錫2至1〇%之混合 物組成之氧化銦錫(以下稱為「IT〇」)特別理想。形成透明 電極之方法係,能使用以往習知之真空蒸鍍法·、喷鍍 jsputtenng)法、離子電鍍(i〇n piating)法、化學蒸鍍法進 仃。在此之中,從黏著性之點來看以濺鍍法較理想。以上 之透明電極之厚度從透明性及導電性之平衡面來看,通常 以在500至2000 A之範圍較理想。 第2圖係使用各種顯示裝置用電子材料與本發明之硬 質透明基板形成之觸控式面板顯示裝置之剖面解說圖。換 吕之’顯不裝置用電子材料至少包括透明電極、點隔件(dot spacer)、偏光板、及液晶顯梦 疮占、#日日币“ 曰』丁衣置’而在硬質透明基板上 /成透明%極之一對觸控式面板構件係以使透明電極彼此 ㈣面之方式夹住點隔件1後,在各觸控式面板構= 外側配置偏光板,同時在任―側之觸控式面板構件 除偏光板以外配置以液晶顯示裝置為首之顯以置在 此,j可在上述硬質透明基板之雙面上設置阻氣膜。 所=®係❹各義置用電子材㈣本 :透:基板形成之有機EL顯示裝置之剖面 更 之’心i置用電子材料至少包括透明電極、 319624 26 200817176 -電洞輸送層、發光層、電子輸送層、金屬電極、及阻氣膜, 而在硬質透明基板上積層透明電極、電洞注入層、電 达層、發光層、電子輸送層、及金屬電極而成。在此,J 可經由圖式外之阻氣膜將整體密封。此外,也可 貝透明基板之雙面設置阻氣膜。此有機EL顯示装置 形,例如,發光體層則使用硫化鋅、硫化録、碼^ 金屬電極則使用紹等。 ^ f 在硬質透明基板上積層顯示裝置用電子材料之際 於依需要而設置於硬質透明基板與顯 射j 間之阻氣膜’可舉例如,無機氧化物膜、或者 =共聚物(㈣’EVAL商。飢、s。二乙 =且氣性樹㈣’但較理想係無機氧化物膜。所; 二勿,:指金屬、非金屬、亞金屬之 : 化約、氧化鑛、氧化::鋅:氧化錄、氧化銦、氧 、化翻、氧化免二 乳化鐵、氧化銅、氧化鎳、 化叙、氧化鋇等,:氧:二化鎮、氧化链、氧化銷、氧 物中可含有微量金屬:非1寸別理想。再者’在無機氧化 化物,此外,為了金屬單體或此等之氯氧 成阻氣膜之方法而言「可==可適當含有碳或氟。以形 =由無機氧化物⑻;:膜之=樹:等::法、* 方法而言,能使用真空基铲形成裔鍍膜之 CVD法等以往周知之方法γ、—濺鑛法、離子電錢法、 319624 27 200817176 關於此阻氣膜之厚度並無特別限制,雖因構成阻氣膜 之成分之種類而異’但除氧氣阻氣性和阻水蒸氣性以外,、 若考慮經濟性,則膜厚係以5至5Qnm較理想。若膜厚未 達5疆則由於可能有膜呈島狀而產生不形成膜之處而有益 :得到均勻膜之傾向故不甚理想。為了進一步得到高度氧 氣阻氣性和阻水蒸氣性只要使膜厚變厚即可,但若超過 5 Onm則由於生產性差且成本增加,且透明性也連帶惡^故 較不理想。 ^ 以下,表示本發明之實施例。再者,在下述實施例中 使用之硬化性樹脂係’以如下述合成例所示之方法得到者。 (合成例) 在備有攪拌機、滴液漏斗之2L之4 口燒瓶中裝入異 丙醇300mL、曱苯600mL及2〇w%氫氧化四甲銨水溶液 22.37g(氫氧化四甲銨 4 55g/ 〇 〇5m〇i、水 0.99mol)。在滴液漏斗中裝入乙烯基三曱氧基矽烷 0·3^η〇1與異丙醇5〇mL之混合溶液,一面攪拌反應容器, 同時在室溫下費時3小時滴人。滴人結束後不加熱即擾掉 3小吟。攪拌3小時後,停止攪拌且使反應溶液在室溫下 18小牯热成。將該反應溶液加入至〇· 1M檸檬酸水溶液π 中且進行中和,並且以水進行水洗至中性後,加入無水硫 酸鎂進行脫水。濾除無水硫酸鎂後,在減壓下進行濃縮。 將濃縮物以經脫水之四氫呋喃2〇〇mL溶解後,裝入至備有 攪拌機、滴液漏斗之1L之4 口燒瓶中。在反應容器中加 入經脫水之吡啶h00mL及在滴液漏斗中加入二曱基二氯 319624 28 200817176 ,矽烷3.2g/〇.〇25m〇:I、三甲基氯矽烷2 7g/〇 〇25m〇;[與四 氫呋喃30mL,在氮氣流下一面攪拌反應容器,同時在室 溫下費時3小時滴入。滴入結束後不加熱即攪拌3小時。 擾摔3小時後’加入甲苯3〇〇mL後,將反應溶液以水進行 水洗至中性,再加入無水硫酸鎂進行脫水。濾除無水硫酸 鎂後,在減壓下進行濃縮而得到無色透明液體之硬化性樹 脂[一般式(l)]27.1g。 在此硬化性樹脂之1H—NMR中,因觀測到乙烯基之 尖銳信號所以確認出水解自乙烯基三曱氧基矽烷之水解縮 合物為籠型構造。因此關於由金屬氧化物,即矽氧化物所 構成之三維多面體構造之緊密構造部位(A ),係能假設成由 8個石夕原子與12個氧原子所構成之(Si〇3/2)8表示之立方體 構造,而所導出之Kp# G.73。此外,上述硬化性樹脂之 (A)以外之部位係,(H2C=CH—Si〇3/2)8之殘基之乙烯基與 (MhSiO〗/2)與(MejiO)之疏鬆構造部位(B),從此等所求之 /重里比[(A)/(B)]係1.3〇2。此外,來自Gpc之數平均分子 罝Μη係5200。再者,計算緊密構造部位(A)之Κρ之際, (SA/2)8由於為⑷之一部分且作為存在於一般式⑴樹脂 中之-部分故不可能取“無法直接求得Kp *。因此使 用(HSiC^2)8做為對Kp之影響最少且能最近似之化合物 計算。 (實施例1) 將在合成例中所得到之硬化性樹脂100重量份與過氧 化一異丙苯(日本油脂股份有限公司percumyl 重量 319624 29 200817176 •份混合至均勻而得到硬化性樹脂組成物。將此流入至以玻 璃板組合成之模使厚度成為〇.2mm,在lOOt:中加熱】小 時、在120°C中!小時、在14〇t中1小時、在16代中! 小枯、及在18〇t:中2小時而得到成形體(硬質透明基板)。 (實施例2) 將在合成例中所得到之硬化性樹脂58重量份、末端三 甲矽烷基修飾聚甲基氫矽氧烧(Azmax股份有限公司製 HMS— 992)42重量份、及翻_乙烯基石夕氧烷錯合物…麵 、股份有限公司製8ΙΡ6830·3)〇·5重量份混合至均勻而得到 硬化性樹脂組成物。將此流入至以玻璃板組合成之模使厚 度成為0.2mm,在10(rc中加熱1小時、在12〇。〇中ι小 時、在14〇°C中1小時、在中1小時、及在18〇。〇中 2小時而得到成形體(硬質透明基板)。 (實施例3) 將在合成例中所得到之硬化性樹脂58重量份、末端三 )甲矽烧基修飾聚甲基氫發氧炫(Azmax股份有限公司製 'HMS-992)2!重量份、過氧化二異丙苯(日本油脂股份有' 限公司PERCUMYL D)2重量份、及翻_乙烯基石夕氧烧錯合 物(Azmax股份有限公司製SIp683〇.3)〇 5重量份混合至均 勻而得到硬化性樹脂組成物。將此流入至以玻璃板:合成 之模使厚度成為0.2mm ’在10(rc中加熱i小時、在12〇 °C中1小時、在14〇°C中1小時、在16(TC中1小時、及在 180t中2小時而得到成形體(硬質透明基板)。 在實施例1至3中所得到之硬質透明基板上,分別預 319624 30 200817176 . 先依濺鍍法設置由厚度1 〇nm之矽氧化物組成之阻氣膜, 接著依濺鍍法在阻氣膜上形成厚度150nm之ITO膜(透明 電極),而得到在硬質透明基板上備有透明電極之測試用積 層體。將所得到之測試用積層體以以下方法進行評估。 &lt;耐熱性&gt; 在維卡軟化(Vicat Softening)測試中,在壓頭(indenter) 剖面積1.0mm、負重5Kg、升溫速度50°C/hr之測定條件 下,在120°C以下壓頭進入〇.4mm以上者標示為X、進入 /、0.2至0.4mm者標示為△、在0· 1mm以下幾乎未進入者標 不為Ο。 〈雙折射率〉 使用相位差測定裝置(Nikon製,NPDM— 1000),以波 長400至80Onm測定面内之雙折射率。 &lt;光線穿透率&gt; 使用(股)日立製作所之分光光度計,測定波長550nm 之穿透率。 v &lt; ITO膜表面之粗糙度(Ra) &gt; 依AFM進行表面粗糙度測定。測定範圍為10 // m, 在輕敲模式(tapping mode)之條件下進行測定。 &lt;彎曲性&gt; 以直徑25mm之芯棒纏繞測試用積層體,在彎折90 度時,不產生龜裂者標示為〇、產生龜裂者標示為X。 在實施例1至3所得到之測試用積層體之耐熱性、雙 折射率、光線穿透率、ITO膜表面粗糙度、及彎曲性之評 31 319624 200817176 • 估結果如表1所示。 [表1]Va=47c/R3-El/37ihi2(3R-hi) hi=R — (R2+ di2 — Ri2)/2di (only, R=good half 彳f, Ri, junction atom radius, and when calculating the above-mentioned rockfill coefficient , the atomic radius of the atomic distance) is contained in the basics of the chemical nature of the Sakamoto Chemical Society. In other words, the atomic radius is H = 12 a, 〇 == 152 A, e = h7 A, Si = 2.14, and the distance between atoms is H - (2) A, Si-〇u63A, Si - 〇 = 1_^ ^, Bu A. For example, the glass density is 2.23 g/cm3 in terms of M = Shi Xi atom, (4), w = 2, y = 〇, and z = 一般, and the number of piles (10) is Q 747. Taking the density of octamethyl octoxide (sllsesqui〇xane) of the general formula (1) wherein R is methyl and v=8, w=〇, y=〇, and z=〇 cube structure k 1 4% / cm3 and the stacking factor is 〇697. Further, the density of the octamethylcyclotetracycline having a ring structure of the general formula (2) and the r7 smethyl group and j=〇, k=4, and dike is 0.956 g/cm 3 , and Its pile cutting coefficient is 〇·576. Similarly, the density system of octamethyltrioxane having a chain structure of 3 and R4, R5, R6 and R7 as a methyl group and j=2, k=l, and 1=0 is 〇82〇g/cm3. And its stacking coefficient is 0.521. In other words, the metal oxide having a three-dimensional polyhedral structure in which a ruthenium atom is bonded to an oxygen atom on 319624 17 200817176 is 0.69 or more, and is a compact structure portion of the present invention. Further, the packing coefficient of the compound of the chain structure is 〇 576 and Q 52 to form a loose portion of the present invention. X 2 In the curable resin of the present invention, the weight ratio (8)/(8) of the compact structure portion (A) to the loose structure portion (8) is 〇〇1 to 5〇〇, and more preferably U to 3.0. When (4)/(B) is less than 〇·〇10, the compact structure is too small, and the mechanical properties and heat resistance of the molded body obtained by molding the curable resin and curing the resin are remarkably deteriorated. Further, when the weight ratio is more than or equal to the above, the loose structural portion of the molded body is too small, and (4) is remarkably deteriorated and becomes a weak molded body. Further, the curable resin of the present invention has an average molecular weight of from 8 (8) to 6 Å. If the average molecular weight is less than _, it tends to become brittle after molding. On the contrary, if it is 6_〇, the hardening molding process becomes difficult and it may cause non-freeness in use. Further, the average molecular weight can be measured by a well-known coffee measuring device. 6 7 is an acid catalyst used for the hydrolysis and condensation of a compound represented by RSiX3 or ΜΧ4, and a compound represented by R3ws or R7SiX2, and 5', for example, hydrochloric acid and sulfuric acid. Further, these may be used in combination, and the hydrogen halide formed at the time of hydrolysis may also be used when the hydrolyzable group is a halogen atom. In the case of an alkaline catalyst used for hydrolysis and condensation, for example, a metal hydroxide such as a hydroxide clock, sodium hydroxide or barium hydroxide, or tetramethylammonium hydroxide or tetraethylammonium hydroxide can be exemplified. , tetrabutyl hydride, chlorobenzene; 319624 18 200817176 dimethylammonium hydride, phenyl hydrazinium triethylammonium hydride, especially from the point of high catalyst activity:: ammonium salt: this Wait for it. An organic solvent is usually used as an inert catalyst. Methylammonium is required to have water in the hydrolysis reaction system, but this liquid is confessed, &gt; 丌s4 λ u ? Temple has been dissolved by the water of the catalyst: ^ The amount of water is more than the hydrolysis of the hydrolyzable group. It is 1 to 15 times the theoretical amount. In the case where the curable resin is used as a curable resin group: a compound having at least a hydrogen group in a molecule prepared by a bi-type resin, the sub-form is at least "solid" An oligomer and a monomer of an atom on a ruthenium atom. An oligomer having a ruthenium atom on a shi 原子 atom 而 ^ 卞 可 可 可 可 可 可 可 可 可 可 可 可 可 可 可 可 可 可 可 可 可 可 可 可 可 可 可 可Two: a hydrogen oxy-oxygen group and a copolymer thereof, and a terminal end is a sulphur-oxygenated gas modified by dimethyl chlorite, and further, a monomer having a hydrogen atom on the lithium atom. In other words, for example, a cyclic ten-oxygen wire such as tetramethylcyclotetraoxane or pentamethylcyclopentazepine, H-oxide, trihydrogen, dihydromonodecane, or monohydrogen can be exemplified. Two or more types of decanes, dimethyl methoxy oxanes, and the like may be mixed. Further, the compound having an unsaturated group prepared by a curable resin is roughly classified into a repeating number of structural units. Reactive monomer to polymer of about 2 、, reactive monomer with low molecular weight and low viscosity. a monofunctional unsaturated compound having one unsaturated group and a polyfunctional unsaturated compound having two or more unsaturated groups. In the case of a reactive oligomer, for example, a polyvinyl siloxane, a poly Dimethylvinyl methoxy methoxy oxanes and copolymers thereof, the ends are oxiranes, epoxy acrylates, epoxidized oleic acid acrylates modified by two 19 319 624 200817176 , methyl vinyl fluorenyloxy groups , urethane acrylate, polyester and polyester, polyester acrylate, polyether acrylate, acetoacetate, polyester/thiol, oxime acrylate, polybutylene a olefin, a polystyryl styrene ethyl acrylate, etc. Among these, a monofunctional unsaturated compound and a polyfunctional unsaturated compound are contained. In the case of a reactive monofunctional monomer, for example, triethylethylene is exemplified. Ethyl-substituted sulphate, cyclohexene (such as cyclic olefins, styrene, vinyl acetate, N-vinylpyrrolidone, butyl acrylate, acrylic acid 2-) Ethylhexyl ester, n-hexyl acrylate, cyclohexyl acrylate, N-decyl enoate, isobornyl acrylate (isoborny 1), dicyclopentenyloxyethyl acrylate, phenoxyethyl acrylate, trifluoroethyl methacrylate, etc. In the case of reactive polyfunctional monomers, For example, an ethylene-substituted fluorene compound such as tetravinylsulfonium or divinyltetradecyldioxane, tetramethyltetramine/vinylcyclotetraoxane or pentadecylpentavinylcyclopentanyloxy Ethylene and other ethylene-substituted cyclic hydrazine compounds, bis(trimethyl decyl) acetylene, diphenyl acetylene and other acetylene bamboo organisms 'n〇rb〇rnadiene, dicyclopentadiene, cyclooctadiene, etc. Vinyl-substituted cyclic olefins such as polyenes, vinylcyclohexene, divinylbenzenes, diacetylenylbenzenes, trimethylolpropane diallyl ether, pentaerythritol triallyl ether, Tripropylene glycol dipropionate, 1,6-hexanediol diacrylate, bisphenol aglycidyl ether diacrylate, tetraethylene glycol diacrylate, hydroxypivalic acid ( Pivalic acid) neopentyl glycol diacrylate, trioxane propane tripropylene 20 319624 200817176 The purpose of the acid is: pentaerythritol triacetic acid vinegar, pentaerythritol tetra (tetra) (tetra), perylenetetraol hexaacrylate, and the like. In the case of a compound having an unsaturated group in the substituent, various reactive oligomers and monomers can be produced other than those exemplified above. Further, the oligomer and the monomer may be used alone or in combination of two compounds having at least a hydrogen group in the molecule used in the present invention, and a compound having an unsaturated group in the molecule may be used alone or in combination. More than 2 types are available. (In the present invention, the curable resin or the radical initiator may be adjusted in a curable resin, or both may be blended to obtain a curable resin. After the absence, the curable resin composition may be thermally hardened. Or Guangwei, to obtain a hard transparent substrate by chlorination and free radical polymerization. In addition, a compound of at least j chlorinated groups in the molecule may be added by adding a catalyst and a radical initiator. Further, the compound having an unsaturated group is further blended to obtain a curable resin composition. In other words, the cured resin is cured to obtain a hard transparent (the purpose of the substrate and the purpose of improving the physical properties of the obtained cured transparent substrate) to promote the reaction. The additive is formulated with a Lixi hydrogenation catalyst, a silking starter, a photopolymerization initiator, a photoinitiator, a sensitizer, etc. to obtain a hardened composition. Once the compound is added, the Shixi hydrogenation catalyst is taken The amount is preferably in the range of from 1 to 1 ppm, more preferably from 2 to 5 ppm, relative to the weight of the curable resin. When blending with a photopolymerization initiator or heat Aggregation = J When it is a radical initiator, it is added in an amount relative to the hardenability tree, so that it is in the range of 0.1 to 5 parts by weight, and is in the range of 319 319 624 21 2008 17176 to 3 parts by weight. More on the right. ~ Add this summer dissatisfaction 0. 1 Re-deployment, the hardening is insufficient, and the strength and rigidity of the formed body obtained by the knives are reduced. ^More than 5 parts by weight on the right side In addition, it is possible to use two or more types of the coloring of the molded body. The chlorinated catalyst may be, for example, chlorinated or gas (CM〇r_t surface). Acid), chloropropanoic acid and alcohol, disk, § the same complex (4) and hydrazine complex, _ ethylene oxy-combustion complex, two carbon base, chlorinated deficiency (four), (four) touch metal In this right, from the point of view of the activity of the catalyst, it is preferable to use a chlorine (10), a chloroauric acid plate, a fine compound, a complex compound, and a vinyl compound. These may be used alone or in combination of two or more. Photopolymerization used in the case of a photocurable composition As the starting agent, a compound such as acetaminophen, azulene (b_in), diphenylketone or 嗟_(10) can be suitably used, and a compound such as th_) or a phosphinyl oxide can be used. For example, trichloroacetamidine, diethoxyacetic acid benzene, benzyl-2-methyl propyl ketone, p-cyclohexyl phenyl ketone, 2-methyl-H4_methyl. thiophene (10). ))_2_吗淋基丙-1-酉, benzoin methyl scale, benzyl ketal (ketai), diphenyl ketone, oxime, oxidized 2,4,6•trimethylbenzene Formic acid diphenylphosphine, acetonic acid (gly〇xy (tetra)methyl benzene vinegar, camphor sputum (camph〇rquin〇ne), benzoin, oxime, ketone (Michier, sketne) and the like. In addition, it is also possible to use a combination of a photopolymerization initiator and a priming agent and a sensitizer. 0 319624 22 200817176 It is a hydrogen peroxide system, a peroxidation-based system, a bismuth peroxide system, Peroxydi-alkane various organic peroxides. With a heartfelt (4), such as restrictions. : Foreign: 1:, 2-B (four), but not used in combination. (,, w initiator can be used alone or in two kinds of modified resin compositions, can be used in various applications such as J: r plus various additives. Various additives are examples, A foaming agent: a crystal component, etc. U colorant, a crosslinking agent, a dispersing aid, a resin, such as the above-mentioned hard transparent substrate of the present invention, which can contain any one of the radical polymerization initiators, or both It is formed into a predetermined shape, and then, by heating or light irradiation, 1, 2, ί, :::, when manufacturing a copolymer (hard transparent substrate), 2 2 The agent and the accelerator can be selected from room temperature to the wide range. In this case, the hard transparent substrate of the desired shape can be obtained by combining the inside of the mold and the steel strip. More specifically, the injection molding and extrusion General forming processing for press forming, boring, I 钿 forming, transfer forming, cal-forming, casting (injection molding) 319624 23 200817176 - The method can be applied. Photopolymerization by light irradiation to produce a hard transparent substrate, with a purple wavelength of 1.0 to 400 nm The line and the visible light of 4 〇〇 to the hard transparent substrate can be obtained. The wavelength of the light used is not particularly limited, but it is more suitable to use the near-line of the wavelength 200 i 4 〇〇 nm. For the source lamp, for example, a low-pressure mercury lamp (output: 0.4 to sample/cm), a high-dust mercury lamp (4〇 to l6〇w; _, an ultra-high pressure mercury lamp (10) i 435w/cm), a metal-based lamp (10) to 160 W/cm), pulsed xenon lamp (8 〇 to 12 〇 w/cm), electrodeless discharge/lamp (80 to l2 〇 W/cm) f. These ultraviolet lamps are selected according to the type of photoinitiator used, since they have their own knowledge of the spectroscopic cloth. In the method of obtaining a hard transparent substrate by light irradiation, it is exemplified that a curable resin composition is formed in a mold having a Cavity shape and is made of a transparent material such as quartz glass, and the ultraviolet ray is further formed. a method of producing a hard transparent substrate of a desired shape by demolding the lamp from the outer line of the lamp, and using a doctor blade on the private steel V in the case where the mold is not used. Or a roll-form coating = a method of forming a hard transparent resin composition of the present invention, which is formed by hardening the above-mentioned ultraviolet lamp to produce a sheet-like rigid transparent substrate. Further, in the present invention, a method of obtaining a hard transparent substrate by heating and light irradiation may be used in combination. The hard transparent substrate obtained by hardening the hardening resin in the present invention is excellent, especially the light transmittance of light having a wavelength of 55 〇 nm is 319624 24 200817176 • at 80% or more, Since the birefringence is 2 Å or less, it is possible to obtain various display devices by laminating electronic materials for various display devices. In other words, if the light transmittance is less than 8〇%, when color or the like is displayed, it is difficult to use because the surface is darkened, so there is a tendency to use it only for applications such as a monochrome display element, and if the birefringence is larger than When m is used as a display panel, there is a tendency for color unevenness to occur on the surface. However, since the hard transparent substrate of the present invention has the above-described characteristics, it is obtained by various display devices. The thickness of the hard transparent substrate varies depending on the type of display device. For example, the liquid crystal display device is in a phase of 〇1〇 to 2〇〇. If it is less than O.Hhnm, it is easy to bend due to the weight of the substrate itself, and the manufacturing process of the liquid crystal display device using the conventional glass substrate cannot be used. On the other hand, if it exceeds 2. 〇〇mm, the weight becomes the same as that of the conventional glass substrate of 15 to 0.7 mm, and the weight is reduced. The preferred embodiment of the present invention will be described below using the drawings. The first drawing is a cross-sectional view of a liquid crystal display device using an electronic material for various display devices and a hard transparent substrate of the present invention, and is a more suitable example of a hard-shell transparent substrate using the present invention. In this case, the display device uses an electronic material such as a transparent electrode, an alignment film, a liquid crystal layer, a color filter, a ruthenium film transistor, a polarizing plate, and a backlight, and a color filter and a transparent electrode are laminated on the hard transparent substrate. And the liquid crystal i-th member of the alignment film and the second member in which the thin film transistor and the alignment film are laminated on the hard transparent substrate sandwich the liquid crystal layer so that the alignment films face each other, and are hard in the liquid crystal first member A polarizing plate is disposed outside the transparent substrate, and a polarizing plate and a backlight are disposed outside the hard transparent substrate of the liquid crystal second structure 319624 25 200817176. Here, a gas barrier film may be provided on both surfaces of the above-mentioned hard transparent substrate. In the case of a liquid crystal display device, the transparent electrode may, for example, be a conductive material such as indium oxide, tin oxide, gold, silver, copper or nickel. These may be used alone or in combination of two or more. In view of the balance between transparency and conductivity, indium tin oxide usually consisting of a mixture of 99 to 90% of indium oxide and 2 to 1% by weight of tin oxide (hereinafter referred to as It is especially ideal for "IT〇". The method of forming the transparent electrode can be carried out by a conventional vacuum vapor deposition method, a sputtering method, an ion plating method, or a chemical vapor deposition method. Among them, the sputtering method is preferable from the viewpoint of adhesion. The thickness of the above transparent electrode is usually in the range of 500 to 2000 A from the viewpoint of the balance of transparency and conductivity. Fig. 2 is a cross-sectional view showing a touch panel display device formed using an electronic material of various display devices and a hard transparent substrate of the present invention. For the Lu's 'display device', the electronic materials include at least a transparent electrode, a dot spacer, a polarizing plate, and a liquid crystal display, and a Japanese yen coin. One of the transparent % poles is such that the touch panel member sandwiches the dot spacers 1 so that the transparent electrodes are placed on each other (four faces), and the polarizing plate is disposed on each of the touch panel structures = at the same time The control panel member is disposed in addition to the polarizing plate, and is mainly provided with a liquid crystal display device. Here, a gas barrier film can be disposed on both sides of the hard transparent substrate. : Transparency: The cross section of the organic EL display device formed by the substrate is more than a transparent electrode, 319624 26 200817176 - a hole transport layer, a light emitting layer, an electron transport layer, a metal electrode, and a gas barrier film, On the hard transparent substrate, a transparent electrode, a hole injection layer, an electric layer, a light-emitting layer, an electron transport layer, and a metal electrode are laminated. Here, J can be integrally sealed by a gas barrier film outside the drawing. , can also be transparent substrate The gas barrier film is provided on both sides of the organic EL display device. For example, the illuminant layer is made of zinc sulfide, sulphide, or metal electrode. ^ f The electronic material for the display device is laminated on the hard transparent substrate. The gas barrier film which is disposed between the hard transparent substrate and the display j as needed may be, for example, an inorganic oxide film or a = copolymer ((4) 'EVAL quotient. Hunger, s. Diethyl = and gas tree (4) 'But the ideal inorganic oxide film. The second, refers to the metal, non-metal, sub-metal: chemical, oxidized ore, oxidation: zinc: oxidation record, indium oxide, oxygen, turn, oxidation Free of two emulsified iron, copper oxide, nickel oxide, chemical, antimony oxide, etc.: oxygen: Dihua town, oxidation chain, oxidation pin, oxygen can contain trace metals: not 1 inch is not ideal. Oxide, in addition, for the method of metal monomer or chlorine oxide to form a gas barrier film, "may == may suitably contain carbon or fluorine. Form = inorganic oxide (8);: film = tree: etc. ::Method, * method, CVD method using a vacuum base shovel to form a coating Conventionally known methods γ, - splashing method, ion battery method, 319624 27 200817176 There is no particular limitation on the thickness of the gas barrier film, although it varies depending on the type of the gas barrier film, but the oxygen gas barrier property is removed. In addition to the water vapor barrier property, if the economy is considered, the film thickness is preferably 5 to 5 Qnm. If the film thickness is less than 5, the film may be island-shaped and the film may not be formed. The tendency of the uniform film is not so good. In order to further obtain high oxygen gas barrier properties and water vapor barrier properties, the film thickness may be increased, but if it exceeds 5 Onm, productivity is poor and the cost is increased, and transparency is also associated with evil. Therefore, it is not preferable. The following shows an example of the present invention. Further, the curable resin used in the following examples is obtained by the method shown in the following synthesis example. (Synthesis Example) A 4-liter 4-liter flask equipped with a stirrer and a dropping funnel was charged with 300 mL of isopropyl alcohol, 600 mL of toluene, and 22.37 g of a 2% w% aqueous solution of tetramethylammonium hydroxide (tetramethylammonium hydroxide 4 55 g). / 〇〇5m〇i, water 0.99mol). A mixed solution of vinyltrimethoxyoxane 0·3^η〇1 and isopropyl alcohol 5〇mL was placed in a dropping funnel, and the reaction vessel was stirred while dropping at room temperature for 3 hours. After the end of the drip, it will disturb 3 hours without heating. After stirring for 3 hours, the stirring was stopped and the reaction solution was allowed to heat at room temperature for 18 hours. The reaction solution was added to 〇·1M aqueous citric acid solution π and neutralized, and washed with water to neutrality, and then anhydrous magnesium sulfate was added for dehydration. After removing anhydrous magnesium sulfate, it was concentrated under reduced pressure. The concentrate was dissolved in 2 mL of dehydrated tetrahydrofuran, and placed in a 4-liter flask equipped with a stirrer and a dropping funnel. Add dehydrated pyridine h00mL to the reaction vessel and add dimercapto dichloride 319624 28 200817176 to the dropping funnel, decane 3.2g / 〇. 〇 25m 〇: I, trimethylchloro decane 2 7g / 〇〇 25m 〇 [With 30 mL of tetrahydrofuran, the reaction vessel was stirred while flowing under a nitrogen stream while dropping at room temperature for 3 hours. After the completion of the dropwise addition, the mixture was stirred for 3 hours without heating. After 3 hours of disruption, after adding 3 〇〇 mL of toluene, the reaction solution was washed with water to neutrality, and then anhydrous magnesium sulfate was added for dehydration. After removing anhydrous magnesium sulfate, it was concentrated under reduced pressure to give 27.1 g of a sclerosing resin (general formula (1)) as a colorless transparent liquid. In the 1H-NMR of the curable resin, a sharp signal of a vinyl group was observed, and it was confirmed that the hydrolyzed condensate hydrolyzed from vinyltrimethoxy decane was a cage structure. Therefore, the compact structure portion (A) of the three-dimensional polyhedral structure composed of a metal oxide, that is, cerium oxide, can be assumed to be composed of eight austenite atoms and twelve oxygen atoms (Si〇3/2). 8 represents the cube structure, and the derived Kp# G.73. Further, the portion other than the (A) of the curable resin is a vinyl group of (H2C=CH-Si〇3/2)8 and a loose structure portion of (MhSiO/2) and (MejiO). ), from this, the ratio/weight ratio [(A)/(B)] is 1.3〇2. In addition, the average molecular 罝Μη from Gpc is 5200. Further, when Κρ of the compact structure portion (A) is calculated, (SA/2)8 is a part of (4) and it is impossible to obtain Kp* directly as a part existing in the resin of the general formula (1). Therefore, (HSiC^2)8 was used as the compound having the least influence on Kp and the closest approximation. (Example 1) 100 parts by weight of the curable resin obtained in the synthesis example and monocumyl peroxide ( Japan Oil & Fat Co., Ltd. percumyl weight 319624 29 200817176 • The parts are mixed until uniform to obtain a hardenable resin composition. This is poured into a mold which is combined into a glass plate to have a thickness of 〇.2 mm, heated in lOOt: hour, at In 120 ° C, hour, 14 〇t, 1 hour, 16 generations; small dry, and 18 〇t: 2 hours to obtain a molded body (hard transparent substrate). (Example 2) will be synthesized 58 parts by weight of the curable resin obtained in the example, 42 parts by weight of a terminal trimethyl decyl group-modified polymethylhydroquinone oxy-fired (HMS-992 manufactured by Azmax Co., Ltd.), and a trans-vinyl oxalate complex. No., Co., Ltd. 8ΙΡ6830·3)〇·5 weight The mixture was mixed until uniform to obtain a curable resin composition, and this was poured into a mold which was combined with a glass plate to have a thickness of 0.2 mm, and was heated at 10 (rc for 1 hour, at 12 Torr. 〇 hour, at 14 〇) A molded body (hard transparent substrate) was obtained in 1 hour, 1 hour in the middle, and 18 hours in a crucible. (Example 3) 58 parts by weight of the curable resin obtained in the synthesis example, and the end 3) formazan-based modified polymethylhydrogen oxide (HMS-992, manufactured by Azmax Co., Ltd.) 2 parts by weight, dicumyl peroxide (Japanese oil company has limited company PERCUMYL D) 2 parts by weight And a mixture of 5 parts by weight of fluorene-vinyl oxo-oxygenate (SIp683 〇.3, manufactured by Azmax Co., Ltd.) was uniformly mixed to obtain a curable resin composition. This was poured into a glass plate: a synthetic mold. The thickness was 0.2 mm. The molded body was obtained by heating at 10 (rc for 1 hour, at 12 °C for 1 hour, at 14 °C for 1 hour, at 16 (TC for 1 hour, and at 180t for 2 hours). (Hard transparent substrate). On the hard transparent substrate obtained in Examples 1 to 3, respectively, 319624 30 200817 176. First, a gas barrier film composed of tantalum oxide having a thickness of 1 〇nm is formed by sputtering, and then an ITO film (transparent electrode) having a thickness of 150 nm is formed on the gas barrier film by a sputtering method to obtain a hard transparent substrate. The test laminate was provided with a transparent electrode, and the obtained test laminate was evaluated by the following method: &lt;Heat resistance&gt; In the Vicat Softening test, the indenter sectional area 1.0mm, load 5Kg, temperature rise rate 50 °C / hr under the measurement conditions, below 120 ° C, the indenter enters 〇. 4mm or more, marked as X, enter /, 0.2 to 0.4mm, marked as △, at 0· Substantially less than 1mm is not marked as Ο. <Birefringence> The birefringence in the plane was measured at a wavelength of 400 to 80 nm using a phase difference measuring device (manufactured by Nikon, NPDM-1000). &lt;Light Transmittance&gt; The transmittance at a wavelength of 550 nm was measured using a spectrophotometer of Hitachi, Ltd. v &lt; Roughness (Ra) of surface of ITO film &gt; Surface roughness measurement by AFM. The measurement range was 10 // m, and the measurement was performed under tapping mode. &lt;Flexibility&gt; The test laminate was wound with a mandrel having a diameter of 25 mm, and when it was bent at 90 degrees, the crack was marked as 〇 and the crack was marked as X. Evaluation of heat resistance, birefringence, light transmittance, surface roughness of ITO film, and bendability of the laminated body for testing obtained in Examples 1 to 3 31 319624 200817176 • The evaluation results are shown in Table 1. [Table 1]

此外,將在實施例1至3所得到之測試用積層體使用 於觸匕式©板構件之—側,另—侧之觸控式面板構件係使 用在,璃基板上以與前述同樣之方法形成^ 之透明導 電,溥膜者。以使透明導電薄膜互相面對面之方式,隔著 直徑3 0 # m之環氧樹脂珠而配置此2片觸控式面板構件從 ,衣作觸控式面板測試體。關於此所得到之觸控式面板測 試體以以下方法進行評估。 (比較例1) 矛、使用;度0· 1 之聚對g太酸乙二酯代替硬質透 明丨2板以外係與實施例1至3同樣進行而製作觸控式面板 测式體。 1)耐熱變色: 12〇°C之熱風循環烘 若無變化則標示為 ^將組合好之觸控式面板測試體以 相處理120小時後確認基板之變色 〇、有變黃等著色情形係標示為X。 2)筆滑動測試: 在聚縮醛製筆(尖端形狀: 0.8mmR)上掛250g之碎石馬 319624 32 200817176 進行20萬次之滑動測試。在滑動部分未觀察到白化而在導 通電阻(ON resistance)無異常則標示為〇、有白化及 通電阻觀察到異常則標示為x。 導 3)按鍵測試: 在聚縮醛製筆(尖端形狀:0.8mmR)上掛25〇g之 進行100萬次之按鍵測試。在0N抵抗無異常則標示’、、' 觀察到異常則標示為X。 .....Further, the test laminated body obtained in the first to third embodiments is used on the side of the touch-sensitive type panel member, and the other side touch panel member is used on the glass substrate in the same manner as described above. Forming transparent conductive, 溥 film. The two touch panel members are disposed as a touch panel test body via the epoxy beads having a diameter of 30 #m so that the transparent conductive films face each other. The touch panel test body obtained in this way was evaluated in the following manner. (Comparative Example 1) A spear-type measuring body was produced in the same manner as in Examples 1 to 3 except that the poly-glycolic acid ethylene diester was used in the same manner as in the first to third embodiments. 1) Heat-resistant discoloration: If there is no change in the hot air circulation of 12〇°C, it will be marked as ^When the combined touch panel test body is treated for 120 hours, the color change of the substrate and the coloration of yellowing are confirmed. For X. 2) Pen slip test: 250 g of crushed stone horse was hung on a polyacetal pen (tip shape: 0.8 mmR) 319624 32 200817176 A sliding test of 200,000 times was performed. No whitening was observed in the sliding portion, and no abnormality was observed in the ON resistance, and 标示, whitening, and on-resistance were observed as abnormalities. Guide 3) Button test: hang 25 〇g on the polyacetal pen (tip shape: 0.8mmR) and perform 1 million key test. If there is no abnormality at 0N resistance, the indication ', ' is observed as X. .....

使用在上述實施例i至3及比較例J中所得到之 用積層體製作出之觸控式面板測試體之薄膜成形性、耐二 變色、筆滑動測試、及按鍵測試之評估結果如表厂…、 [表2] 不。The results of the film formability, the two-color discoloration, the pen slip test, and the button test of the touch panel test body obtained by using the laminated system obtained in the above Examples i to 3 and Comparative Example J are as shown in the watch factory. ..., [Table 2] No.

(:【圖式簡單說明】 第1圖係使用顯示裝置用電子材料與本發明之硬 明基板形成之液晶顯示裝置之剖面解說圖。 第2圖係使用顯示裝置用電子材料與本發明之硬 明基,形成之觸控式面板顯示裝置之剖面解說圖。、 第3圖係使用顯示裝置用電子材料與本發明之硬曾、# 明基板形成之有機EL海m立⑴ 硬貝透 匁饨頭不裝置之剖面解說圖。 319624 33BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view showing a liquid crystal display device formed using an electronic material for a display device and a hard substrate of the present invention. Fig. 2 is a view showing an electronic material for a display device and a hard surface of the present invention. BenQ, a cross-sectional view of the formed touch panel display device. Fig. 3 is an organic EL sea (1) hard shell through the electronic material of the display device and the hard substrate of the present invention. Sectional diagram of the device is not installed. 319624 33

Claims (1)

200817176 、申清專利範圍·· ,一種顯示裝置,发筏 一 透明基板❹/ 裝置用電子材料積層於硬質 之硬二性樹脂;^硬質透明基板為使下述—般式⑴所示 由以下料算日式二得到者’而上述硬化性樹脂為具有 之金屬氧化物:异一了系數KP在。⑽至。.8 成之緊孩、構造部位(A)、與由上述Kp * ·之有機物或有機物與有機金屬氧化物所構成 之疏鬆構造部位(Β),π Rtfc &amp; )冋日守,構造部位(A)/(B)之重量比 、· 5·0〇,且具有至少一個不飽和鍵而平均分子 量在800至60000, —{(A)〜 (B)m} η- (1) (惟,m及η係1以上之整數) Kp=An - yw . p/Mw ⑺ 分子量、Vw=SVa、Va=47c/R3 —sl/3;ihi2(3Ra—μ)、 hi=Ra—(Ra2+di2~ Ri2)/2di、Ra=原子半徑、Ri=鍵結 原子半徑、及di =原子間距離)。 (惟’ An=亞佛加厥數、Vw=凡得瓦體積、p=密度、Mw= / 如申明專利|&amp;圍第1項之顯示裝置,其中,緊密構造部 位(A)係具有去除下述一般式(I )之有機物部位之三維 多面體構造之金屬氧化物部位,疏鬆構造部位(B)係由 一般式(I)之有機物部位與下述一般式(]1)構成, (RSi03/2)w(M02)x(RXSi〇)y(XM〇3/2)z (1) (R3R4R5Si01/2)j(R6R7si〇)k { R6R7xsi〇1/2} j (Π) (惟,R 為以(a) — R1 — 〇c〇 ~ CR2=CH2、(b) — R1 — 319624 34 .200817176 .CR2=CH2或者⑷— CH=CH2表示之不飽和基、焼基、環 烷基、環烯基、苯基、氫原子、烷氧基、或烷基矽氧基; 而式(1)中之多個R可為互相不同者,但至少〗個係包 含(a)、(b)、⑷之任一者;此外,R1表示伸烷基、伸埽 基或伸苯基’ R2表示氫或炫基,R3至r7為以⑷—rI _ 0C0 — CR2=CH2、⑻ _ Rl — cr2=cH2 或者⑷— CH=CH2表示之不飽和基、烷基、環烷基、環烯基、苯 基、氫原子、烷氧基、或烷基矽氧基,M為矽、鍺、鈦、 •或锆之金屬原子,X為i素原子、或烷氧基,…為4以 上之整數,X、y及z為滿足w+x+y+zg8之整數; 此外,j、k、及1分別表示〇以上之整數)。 3.如申請專利範圍第2項之顯示裝置,其中,一般式(1) 中之(A)所不之構造單位係由得自RSiX3、MX4或此算 混合物(惟,R、M及X與一般式(1)相同)之水解縮合 物之一般式(I )所示之構造單位中之三維多面體構造骨 架之金屬氧化物部位所構成。 4·如申請專利範圍第2項之顯示裝置,其中,一般式〇) 中之(的所不之構造單位係由R3R4R5SiX、R6R7SiX2或此 等之混合物(惟,R7&amp;x與一般式⑻相同)之水解 縮合物所製造之一般式(π )所示之金屬氧化物之鏈狀單 位、及與一般式(1)所示之構造中所含有之金屬原子鍵結 之有機基所構成。 5.如申請專利範圍第i項至第4項中任一項之顯示裝置, 其中,在硬化性樹脂中調配矽氳化觸媒及/或自由基起 319624 35 200817176 ^始劑而得到硬化性樹脂组成物後,使此硬化性樹脂組成 物成形’且使其熱硬化或光硬化㈣到硬質透明基板。 6.如申請專利範圍第5項之顯示裝置,其中,進一步調配 分子’具有至少!個矽氫基之化合物及,或具有不飽和 基之化合物而得到硬化性樹脂組成物。 7.如申請專利範園第】項至第6射任一項之顯示裝置, 该顯不裝置係為液晶顯示裝置,其中,顯示裝置用電子 =料至少有透明電極、定向膜、液晶層、遽色器、薄膜 $晶體、偏光板、及背光源,該液晶顯示裝置係令在硬 貝透明基板上積層有濾色器、透明電極、及定向膜之液 ^ M 籌件、與在硬質透明基板上積層有薄膜電晶體及 疋向腰之液晶第2構件以使定向膜彼此面對面之方 ^::曰曰層’且在液晶第1構件之硬質透明基板外側配置 2反’㈣在液晶第2構件之硬f透明基板外侧 偏光板及背光源而成者。 1 8.=請專利範圍第1項至第6項中任一項之顯示H 置係為有機虹顯示農置,其中,顯示 電子材料至少有透明電極、電洞 用 發光層、電子輸送層、金屬電才θ A /同輸运層、 EL顯示裝置係在硬質透韻板;氣膜,而有機 :: 主入層、電洞輸送層、發光層、電子輸送層 : 電極,並經阻氣膜而密封而成者。 主屬 9.二申請專利範圍第!項至第6項中任一項之顯示事置 广頒不裝置係為觸控式面板顯示農置,其中,顯示裝置 319624 36 200817176 ‘ 用電子材料至少有透明電極、赴b 顯示裝置,而觸控式面板顯示二:偏光板、及液晶 上形成有透明電極之-對觸控;=^硬質透明基板 工式面板構件,以使透明電 和彼此面對面之方式夾住點隔件,且在各觸控式面板構 件之外側配置偏光板,同時在任—侧之觸控式面板構件 之外側進一步配置液晶顯示裝置而成者。 1〇·如申請專利範圍第7項至第9項中任一項之顯示裝置, 其中’在硬質透明基板與透明電極之間進一步配置阻氣 Ί 膜。 i 37 319624200817176, Shen Qing patent range ·············································································· The Japanese type 2 is obtained by the 'the above-mentioned curable resin is a metal oxide having a different coefficient KP. (10) to. .8 into a tight child, a structural part (A), and a loose structural part (Β) composed of the above-mentioned Kp* · organic matter or organic matter and an organometallic oxide, π Rtfc &amp; A) / (B) weight ratio, · 5.0 〇, and has at least one unsaturated bond and an average molecular weight of 800 to 60,000, -{(A) ~ (B)m} η- (1) (only, m and η are integers above 1) Kp=An - yw . p/Mw (7) Molecular weight, Vw=SVa, Va=47c/R3 —sl/3; ihi2(3Ra—μ), hi=Ra—(Ra2+di2 ~ Ri2)/2di, Ra = atomic radius, Ri = bonding atom radius, and di = atomic distance). (Only 'An = Yafo's number of turns, Vw = Van der Waals volume, p = density, Mw = / such as the patent | &amp; surrounding the first item of the display device, wherein the tight structure part (A) has removed The metal oxide portion of the three-dimensional polyhedral structure of the organic substance portion of the following general formula (I), the loose structure portion (B) is composed of the organic substance portion of the general formula (I) and the following general formula (1): (RSi03/ 2) w(M02)x(RXSi〇)y(XM〇3/2)z (1) (R3R4R5Si01/2)j(R6R7si〇)k { R6R7xsi〇1/2} j (Π) (only, R is (a) — R1 — 〇c〇~ CR2=CH2, (b) — R1 — 319624 34 .200817176 .CR2=CH2 or (4)—CH=CH2 represents an unsaturated group, a fluorenyl group, a cycloalkyl group, a cycloalkene a group, a phenyl group, a hydrogen atom, an alkoxy group, or an alkyloxy group; and a plurality of R in the formula (1) may be different from each other, but at least one of the groups includes (a), (b), (4) In addition, R1 represents an alkyl group, a decyl group or a phenyl group, and R2 represents hydrogen or a thio group, and R3 to r7 are as (4)-rI _ 0C0 — CR2=CH2, (8) _ Rl — cr2=cH2 Or (4) - CH=CH2 represents an unsaturated group, an alkyl group, a cycloalkyl group, a ring a group, a phenyl group, a hydrogen atom, an alkoxy group, or an alkyloxy group, M is a metal atom of ruthenium, osmium, titanium, or zirconium, X is an atom of an atom, or an alkoxy group, ... is 4 or more The integers, X, y, and z are integers satisfying w+x+y+zg8; and j, k, and 1 respectively represent integers above )). 3. The display device of claim 2, wherein The structural unit of (A) in the general formula (1) is a general formula of a hydrolysis condensate obtained from RSiX3, MX4 or this mixture (except that R, M and X are the same as in the general formula (1)) The metal oxide portion of the three-dimensional polyhedral structure skeleton in the structural unit shown in I). 4. The display device according to the second aspect of the patent application, wherein the general structural unit is a chain unit of a metal oxide represented by the general formula (π) produced by a hydrolysis condensate of R3R4R5SiX, R6R7SiX2 or a mixture thereof (except for R7&amp;x and the general formula (8)), and a general formula (1) The organic base of the metal atom bond contained in the structure shown. 5. The display device according to any one of the items of the present invention, wherein the curable resin composition is obtained by formulating a catalyzed catalyst and/or a radical from the curable resin to obtain a curable resin composition. The curable resin composition is shaped 'and thermally cured or photohardened (four) to a rigid transparent substrate. 6. The display device of claim 5, wherein the further compounding 'has at least! A compound of a hydrogen group and a compound having an unsaturated group are used to obtain a curable resin composition. 7. The display device of any one of the patents to the sixth to the sixth, wherein the display device is a liquid crystal display device, wherein the display device uses at least a transparent electrode, an alignment film, a liquid crystal layer, a color filter, a film, a crystal, a polarizing plate, and a backlight. The liquid crystal display device is provided with a color filter, a transparent electrode, and an alignment film on a hard shell transparent substrate, and is transparent and transparent. A thin film transistor and a liquid crystal second member are laminated on the substrate such that the alignment film faces each other with the surface layer and the outer surface of the hard transparent substrate of the liquid crystal first member is disposed opposite to the second liquid crystal. 2 members of the hard f transparent substrate outside the polarizer and backlight. 1 8.=Please display the display H of any one of items 1 to 6 of the patent range as an organic rainbow display, wherein the display electronic material has at least a transparent electrode, a light-emitting layer for a hole, an electron transport layer, The metal electric θ A / the same transport layer, the EL display device is in the hard transparent plate; the gas film, and the organic:: the main entry layer, the hole transport layer, the luminescent layer, the electron transport layer: the electrode, and the gas barrier The film is sealed and sealed. The main genus 9. The second patent application scope! The display device of any one of the items to the sixth item is a touch panel display, wherein the display device 319624 36 200817176 'the electronic material has at least a transparent electrode, and the display device is touched. The control panel display 2: a polarizing plate, and a transparent electrode formed on the liquid crystal-to-touch; =^ hard transparent substrate working panel member, so that the transparent electric and the face-to-face manner sandwich the point spacer, and A polarizing plate is disposed on the outer side of the touch panel member, and a liquid crystal display device is further disposed on the outer side of the touch panel member. The display device according to any one of the items 7 to 9, wherein a gas barrier film is further disposed between the hard transparent substrate and the transparent electrode. i 37 319624
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