TW200815935A - Exposure device and method - Google Patents

Exposure device and method Download PDF

Info

Publication number
TW200815935A
TW200815935A TW096118779A TW96118779A TW200815935A TW 200815935 A TW200815935 A TW 200815935A TW 096118779 A TW096118779 A TW 096118779A TW 96118779 A TW96118779 A TW 96118779A TW 200815935 A TW200815935 A TW 200815935A
Authority
TW
Taiwan
Prior art keywords
substrate
base
sub
exposure
main
Prior art date
Application number
TW096118779A
Other languages
English (en)
Chinese (zh)
Other versions
TWI356284B (enExample
Inventor
Takefumi Maeda
Original Assignee
Nsk Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2006152361A external-priority patent/JP2007324347A/ja
Priority claimed from JP2006152360A external-priority patent/JP2007322706A/ja
Priority claimed from JP2006152362A external-priority patent/JP4932330B2/ja
Application filed by Nsk Ltd filed Critical Nsk Ltd
Publication of TW200815935A publication Critical patent/TW200815935A/zh
Application granted granted Critical
Publication of TWI356284B publication Critical patent/TWI356284B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW096118779A 2006-05-31 2007-05-25 Exposure device and method TW200815935A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006152361A JP2007324347A (ja) 2006-05-31 2006-05-31 露光装置
JP2006152360A JP2007322706A (ja) 2006-05-31 2006-05-31 露光装置及び露光方法
JP2006152362A JP4932330B2 (ja) 2006-05-31 2006-05-31 露光装置

Publications (2)

Publication Number Publication Date
TW200815935A true TW200815935A (en) 2008-04-01
TWI356284B TWI356284B (enExample) 2012-01-11

Family

ID=39142023

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096118779A TW200815935A (en) 2006-05-31 2007-05-25 Exposure device and method

Country Status (2)

Country Link
KR (1) KR100865051B1 (enExample)
TW (1) TW200815935A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110244396A1 (en) * 2010-04-01 2011-10-06 Nikon Corporation Exposure apparatus, exchange method of object, exposure method, and device manufacturing method
KR101700019B1 (ko) * 2012-04-06 2017-02-13 가부시키가이샤 브이 테크놀로지 노광 장치 및 노광 방법

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1260772C (zh) * 1999-10-07 2006-06-21 株式会社尼康 载物台装置、载物台驱动方法和曝光装置及曝光方法
JP2005183876A (ja) * 2003-12-24 2005-07-07 Nikon Corp ステージ装置及び露光装置

Also Published As

Publication number Publication date
KR100865051B1 (ko) 2008-10-23
TWI356284B (enExample) 2012-01-11
KR20070115640A (ko) 2007-12-06

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees