TW200806467A - Flexible laminate having thermoplastic polyimide layer and method for manufacturing the same - Google Patents

Flexible laminate having thermoplastic polyimide layer and method for manufacturing the same Download PDF

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Publication number
TW200806467A
TW200806467A TW96111090A TW96111090A TW200806467A TW 200806467 A TW200806467 A TW 200806467A TW 96111090 A TW96111090 A TW 96111090A TW 96111090 A TW96111090 A TW 96111090A TW 200806467 A TW200806467 A TW 200806467A
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TW
Taiwan
Prior art keywords
thermoplastic polyimide
film
polyimide film
layer
thermoplastic
Prior art date
Application number
TW96111090A
Other languages
Chinese (zh)
Inventor
Takahiro Nishikawa
Masashi Nakano
Noriyuki Akane
Nobuhito Itoh
Masaki Sasaki
Masao Arima
Original Assignee
Kurashiki Boseki Kk
Taiyo Ink Mfg Co Ltd
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Priority claimed from JP2006099282A external-priority patent/JP2007268917A/en
Priority claimed from JP2007022776A external-priority patent/JP5119401B2/en
Application filed by Kurashiki Boseki Kk, Taiyo Ink Mfg Co Ltd filed Critical Kurashiki Boseki Kk
Publication of TW200806467A publication Critical patent/TW200806467A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • B32B15/088Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising polyamides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C65/00Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor
    • B29C65/02Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor by heating, with or without pressure
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/28Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
    • B32B27/281Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polyimides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1039Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors comprising halogen-containing substituents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1042Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1046Polyimides containing oxygen in the form of ether bonds in the main chain
    • C08G73/105Polyimides containing oxygen in the form of ether bonds in the main chain with oxygen only in the diamino moiety
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1057Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
    • C08G73/1064Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing sulfur
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1067Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
    • C08G73/1071Wholly aromatic polyimides containing oxygen in the form of ether bonds in the main chain
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0346Organic insulating material consisting of one material containing N
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4611Manufacturing multilayer circuits by laminating two or more circuit boards
    • H05K3/4626Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials
    • H05K3/4635Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials laminating flexible circuit boards using additional insulating adhesive materials between the boards
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4652Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
    • H05K3/4655Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern by using a laminate characterized by the insulating layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00Ancillary operations in connection with laminating processes
    • B32B38/0012Mechanical treatment, e.g. roughening, deforming, stretching
    • B32B2038/0028Stretching, elongating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/20Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/202Conductive
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/50Properties of the layers or laminate having particular mechanical properties
    • B32B2307/514Oriented
    • B32B2307/518Oriented bi-axially
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2311/00Metals, their alloys or their compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2379/00Other polymers having nitrogen, with or without oxygen or carbon only, in the main chain
    • B32B2379/08Polyimides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/04Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the partial melting of at least one layer
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/0353Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
    • H05K1/036Multilayers with layers of different types
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0104Properties and characteristics in general
    • H05K2201/0129Thermoplastic polymer, e.g. auto-adhesive layer; Shaping of thermoplastic polymer
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0137Materials
    • H05K2201/0154Polyimide
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/06Thermal details
    • H05K2201/068Thermal details wherein the coefficient of thermal expansion is important
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/06Lamination
    • H05K2203/065Binding insulating layers without adhesive, e.g. by local heating or welding, before lamination of the whole PCB
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31678Of metal
    • Y10T428/31681Next to polyester, polyamide or polyimide [e.g., alkyd, glue, or nylon, etc.]

Abstract

Disclosed is a flexible laminate comprising a metal foil layer/a thermoplastic layer or/and a conductive circuit layer/a thermoplastic polyimide layer, which is obtained by bonding a metal foil layer or a conductive circuit layer to at least one side of a thermoplastic polyimide layer. In this flexible laminate, the thermoplastic polyimide layer is made of a thermoplastic polyimide resin film or sheet which is obtained by melt-extruding a thermoplastic polyimide resin. Alternatively, the thermoplastic polyimide layer is made of a biaxially stretched thermoplastic polyimide resin film or sheet. Such a flexible laminate can be easily produced by a lamination method wherein a thermoplastic polyimide resin film (1) and a metal foil (2) or a conductive circuit layer (4) are bonded by heat and pressure, and has excellent heat resistance, electrical characteristics and mechanical strength inherent in polyimides. When a biaxially stretched thermoplastic polyimide resin film or sheet is used, the flexible laminate can be improved in dimensional stability and solder heat resistance.

Description

200806467 (1) 九、發明說明 【發明所屬之技術領域】 本發明係關於具有作爲黏著層的熱塑性聚醯亞胺層之 撓性層合板及其製造方法。 、 【先前技術】 隨著近年的電子機器的高密度化,其所使用的印刷回 Φ 路板朝向多層化發展,撓性電路板亦多半使用多層構造 者。 聚醯亞胺樹脂薄膜,因爲富有撓性而柔軟,同時機械 的強度、耐熱性、電的特性等之諸特性亦優異,故從先前 技術以來以使用環氧樹脂等的黏著劑與銅箔貼合的3層基 板,廣泛地被使用於可謂爲撓性電路板、撓性印刷電路板 的一種之錄音自動化接合(TAB )製品的製造,惟,因爲 使用黏著劑,故會有介電率變高,又耐熱性降低之問題。 Φ 此外,因爲近年對電氣•電子製品小型化的要求變 « 高,故使用於裝置在窄小化的空間之撓性印刷電路板被要 _ 求更進一步的薄層化及小型化,而且,由電路密度的提 高、耐折強度的提高之觀點而言,一直以來供給省略黏著 劑層,於聚醯亞胺樹脂薄膜的表面上直接設置銅層之2層 基板。 惟,熱硬化性聚醯亞胺樹脂薄膜因爲不加熱熔融,故 無法直接貼合於銅層,因此,先前技術於聚醯亞胺樹脂薄 膜的表面上在不使用黏著劑下形成銅層而使其成爲2層基 -5- 200806467 (2) 板之方法,一直以來廣泛使用蒸鍍法、流延法、鍍敷法。 但任何一種方法皆有缺點,亦即,使用蒸鍍法,於聚醯亞 胺樹脂薄膜的表面上藉由蒸鍍形成銅層之2層基板,銅層 與聚醯亞胺樹脂薄膜欠缺密著力,此外亦有耐移動性降低 - 之問題。另一方面,流延法,因爲必須於銅箱上塗佈聚醯 _ 亞胺先驅物之聚醯胺酸,以高溫進行醯亞胺化,故製造步 驟複雜且生產性差,再加上因爲易混入雜質,又易發生空 φ 隙、或所製造的基板易發生翹曲之卷縮不良,故此方法亦 很難實用化。 故,一般最常被使用之方法爲鍍敷法,無電解鍍敷法 或組合無電解鍍敷法與電鍍法後使用的方法爲一般作法, 但以無電解銅鍍敷所形成的銅層,亦會有與聚醯亞胺樹脂 薄膜欠缺密著力,銅層的剝離強度(peel strength)低, 欠缺作爲基板的信賴性之問題。 而且,上述各方法共通的缺點,可列舉與導體層的層 Φ 合時每次只能進行單面之缺點,進行雙面的層合則需要複 . 數的步驟作業。 ^ 此外,使用熱塑性聚醯亞胺這件事亦於許多的專利文 獻中被提案(參考專利文獻1〜8 ),惟,先前技術的聚醯 亞胺即使爲熱塑性,因爲不適合熔融成形加工,故上述專 利文獻中被提案之方法,係將先驅物的聚醯胺酸流延、塗 佈於基底薄膜上後,加熱後經由醯亞胺化反應(脫水縮合 反應)而得到薄膜,使用環氧樹脂等之黏著劑將其層壓於 金屬箔之層合方法等,故此方法亦與上述同樣會有因爲使 -6 - 200806467 (3)200806467 (1) Description of the Invention [Technical Field] The present invention relates to a flexible laminate having a thermoplastic polyimide layer as an adhesive layer and a method for producing the same. [Prior Art] With the increase in the density of electronic devices in recent years, the printing back Φ boards used in the development of multilayers have been multi-layered, and flexible circuit boards have mostly used multilayer structures. The polyimine resin film is excellent in flexibility and flexibility, and has excellent properties such as mechanical strength, heat resistance, and electrical properties. Therefore, an adhesive such as an epoxy resin and a copper foil have been used since the prior art. The three-layer substrate is widely used in the manufacture of recording automatic bonding (TAB) products which can be described as flexible circuit boards and flexible printed circuit boards. However, since the adhesive is used, the dielectric constant is changed. High and low heat resistance. Φ In addition, since the demand for miniaturization of electrical and electronic products has become high in recent years, flexible printed circuit boards used in devices with a narrow space have been required to be further thinned and miniaturized. From the viewpoint of improvement in circuit density and improvement in folding endurance, a two-layer substrate in which a copper layer is directly provided on the surface of a polyimide film is omitted. However, since the thermosetting polyimide film is not heated and melted, it cannot be directly bonded to the copper layer. Therefore, the prior art forms a copper layer on the surface of the polyimide film without using an adhesive. The method of forming a 2-layer base-5-200806467 (2) plate has been widely used for vapor deposition, casting, and plating. However, any of the methods has disadvantages in that a two-layer substrate of a copper layer is formed on the surface of the polyimide film by vapor deposition using a vapor deposition method, and the copper layer and the polyimide film are insufficient in adhesion. In addition, there is also the problem of reduced mobility resistance. On the other hand, the casting method, because it is necessary to coat the polyfluorene acid of the polyfluorene-imine precursor on the copper box, and to carry out the hydrazine imidization at a high temperature, the manufacturing steps are complicated and the productivity is poor, and When the impurities are mixed, the voids are liable to occur, or the substrate to be manufactured is liable to warp, which is difficult to be practical. Therefore, the most commonly used method is the plating method, the electroless plating method or the combination of the electroless plating method and the electroplating method is a general method, but the copper layer formed by electroless copper plating, There is also a lack of adhesion to the polyimide film, and the peel strength of the copper layer is low, which is a problem of reliability as a substrate. Further, the disadvantages common to the above respective methods include the disadvantage that only one side can be performed each time when the layer of the conductor layer is combined, and the step of performing double-sided lamination requires a complicated number of steps. In addition, the use of thermoplastic polyimides has also been proposed in many patent documents (refer to Patent Documents 1 to 8), but the prior art polyimine is thermoplastic, because it is not suitable for melt forming, In the method proposed in the above patent document, a polyglycine of a precursor is cast and applied onto a base film, and after heating, a film is obtained by a hydrazine imidization reaction (dehydration condensation reaction), and an epoxy resin is used. Such as the laminating method of laminating the metal foil, etc., so the method is also the same as above because of the -6 - 200806467 (3)

用黏著劑而使介電率變高,又耐熱性降低之問題 〔專利文獻1〕特開平8-244168號公報 〔專利文獻2〕特開2 〇 0 1 - 3 4 2 2 7 0號公報 〔專利文獻3〕特開2 0 0 2 - 3 6 3 2 8 4號公報 〔專利文獻4〕特開2003-192 7 89號公報 〔專利文獻5〕特開2 0 0 3 - 2 5 1 7 7 3號公報 〔專利文獻6〕特開2005-96265號公報 〔專利文獻7〕特開2 0 0 5 - 1 44 9 0 8號公報 〔專利文獻8〕特開2005-193541號公報 【發明內容】 〔發明所欲解決之課題〕 本發明係爲了解決上述的先前技術的課題所完成的發 明,其主要目的在於提供含有可藉由層壓法簡單地製造, 具有聚醯亞胺原本優異的耐熱性、電特性、機械的強度之 金屬箔層/熱塑性聚醯亞胺層或/及導體回路層/熱塑性聚醯 亞胺層之撓性層合板。 而且本發明的目的在於提供含有可藉由層壓法簡單地 製造,除了具有聚醯亞胺原本優異的耐熱性、電特性、機 械的強度之外,更具有優異的尺寸安定性、耐焊熱性等諸 特性之金屬箔層/熱塑性聚醯亞胺層或/及導體回路層/熱塑 性聚醯亞胺層之撓性層合板。 本發明之目的在於提供藉由加熱加壓熱塑聚醯亞胺樹 脂薄膜可層合聚醯胺層與導體層(金屬箔)’在不使用黏 200806467 (4) 著劑下’可藉由層壓法以生產性優良、低成本製造上述的 撓性層合板之方法。 而且本發明的目的在於提供在不使用黏著劑下,可藉 由層壓法以生產性優良、低成本製造尺寸安定性、耐焊熱 ^ 性等之諸特性優異之撓性層合板之方法。 〔用以解決課題之手段〕 φ 爲了達成上述目的,依據本發明,提供一種含有於熱 塑性聚醯亞胺層的至少單面上黏著金屬箔層或導體回路層 所成的金屬箔層/熱塑性聚醯亞胺層或/及導體回路層/熱塑 性聚醯亞胺層之撓性層合板;其特徵係上述熱塑性聚醯亞 胺層,係由將熱塑性聚醯亞胺樹脂熔融擠壓成形後所得到 的熱塑性聚醯亞胺樹脂薄膜或薄片(以下總稱爲「熱塑性 聚醯亞胺樹脂薄膜」),或者由二軸延伸熱塑性聚醯亞胺 樹脂薄膜或薄片(以下總稱爲「二軸延伸熱塑性聚醯亞胺 Φ 樹脂薄膜」)所成之撓性層合板。 . 於較佳形態,上述熱塑性聚醯亞胺樹脂,較佳係玻璃 轉移溫度(Tg )爲180〜2 80 °c,或在比該樹脂的熔點高30 °C的擠壓溫度,用50〜SOOtsecT1]的範圍的剪切速度所測量 的熔融黏度爲5X101〜lxl04[Pa· S]較佳。此處,熱塑性聚 醯亞胺樹脂的熔融黏度[Pa · S],依據JIS K-7199,使用島 津製作所FLO W TESTER CFT-5 00所測量之値’但並不限 定於此値,亦可爲在同樣條件下所測量的値。 上述二軸延伸熱塑性聚醯亞胺樹脂薄膜’係可爲將如 -8- 200806467 (5) 先前技術的作法藉由流延法所得到的熱塑性聚醯亞胺樹脂 薄膜,藉由二軸延伸所得到者,於更佳形態,如上述將熱 塑性聚醯亞胺熔融擠壓成形後所得到的熱塑性聚醯亞胺樹 脂薄膜,再藉由二軸延伸所得到的二軸延伸熱塑性聚醯亞 - 胺樹脂薄膜,較佳係上述二軸延伸熱塑性聚醯亞胺樹脂薄 v 膜,MD方向(薄膜長邊方向)及TD方向(薄膜寬度方 向)的任一者的熱膨脹α 2〇-2〇〇亦在5父10_6〜30父1〇-6/:^的 φ 範圍內,此外,MD方向(薄膜長邊方向)及TD方向 (薄膜寬度方向)之熱膨脹率α2〇-2()()的差爲2〇χ1(Γ6/Κ以 內更佳;而且更佳係上述二軸延伸熱塑性聚醯亞胺樹脂薄 膜,希望其玻璃轉移溫度Tg比延伸前的熱塑性聚醯亞胺 樹脂薄膜的玻璃轉移溫度Tg高10〜80°C。再者,本說明 書中所謂的玻璃轉移溫度Tg,係指藉由熱機械分析 (TMA)依據 JIS C 6481: 1996 的「5.17.1TMA 法」所記 載方法所測量的玻璃轉移溫度。 • 於其他的較佳形態,上述熱塑性聚醯亞胺樹脂,爲結 - 晶性熱塑性聚醯亞胺樹脂,或由結晶性熱塑性聚醯亞胺樹 , 脂、與熔點爲280〜3 5 0°C的其他的熱塑性樹脂的混合物。 於更具體的較佳形態,上述熱塑性聚醯亞胺樹脂爲具 有後述的一般式(1)的重複結構單元、較佳爲具有後述 的式(5 )的重複結構單元之熱塑性聚醯亞胺樹脂。更佳 係上述熱塑性聚醯亞胺樹脂,以式(6 )的結構單元的莫 耳數m與式(7 )的結構單元的莫耳數^之比m/n爲4〜9 的比例’ s有後述式(6 )及式(7 )的重複結構單元之熱 -9- 200806467 (6) 塑性聚醯亞胺樹脂。此外,於其他的較佳形態,爲具有後 述式(6 )及式(8 )的重複結構單元之熱塑性聚醯亞胺樹 月旨,而且後述式(6)所表示的重複結構單元與式(8)所 表示的重複結構單元的莫耳比爲1: 0〜0.75 : 0.25的範圍 • 之熱塑性聚醯亞胺樹脂。 ^ 而且依據本發明,亦提供撓性層合板的製造方法,其 基本的形態係含有於熱塑性聚醯亞胺層的至少單面上黏著 φ 金屬箔層或導體回路層所成的金屬箔層/熱塑性聚醯亞胺 層或/及導體回路層/熱塑性聚醯亞胺層之撓性層合板的製 造方法;其特徵係將熱塑性聚醯亞胺樹脂熔融擠壓成形後 所得到的熱塑性聚醯亞胺樹脂薄膜,或者由二軸延伸熱塑 性聚醯亞胺樹脂薄膜,與金屬箔或導電回路層加熱加壓後 黏著。 本發明的撓性層合板的製造方法的較佳之一的形態, 其特徵係在至少一面經粗面處理或密著性處理的銅箔的處 理側上’重疊熱塑性聚醯亞胺樹脂熔融擠壓成形後所得到 • 的熱塑性聚醯亞胺樹脂薄膜,或二軸延伸熱塑性聚醯亞胺 • 樹脂薄膜,再於上述薄膜的相反面上,重疊至少其中一面 經粗面處理或密著性處理的銅箔的處理側,然後加熱加 壓。 此外,本發明的撓性層合板的製造方法的較佳的其他 形態’其特徵係在無處理或雙面施以密著性處理的聚醯亞 胺樹脂薄膜的雙面上,重疊將熱塑性聚醯亞胺樹脂熔融擠 壓成形後所得到的熱塑性聚醯亞胺樹脂薄膜,或二軸延伸 10- 200806467 (7) 熱塑性聚醯亞胺樹脂薄膜,而且於其外側上使至少單面經 粗面處理或密著性處理的銅箔的處理側朝內重疊,然後加 熱加壓。 此外,本發明的撓性層合板的製造方法較佳的其他形 - 態,其特徵係在被形成回路、無處理或雙面施以密著性處 v 理的雙面撓性基板彼此之間,挾入將熱塑性聚醯亞胺樹脂 熔融擠壓成形後所得到的熱塑性聚醯亞胺樹脂薄膜,或二 φ 軸延伸熱塑性聚醯亞胺樹脂薄膜,然後加熱加壓。 而且,本發明的撓性層合板的製造方法更佳的其他形 態,其特徵係在被形成回路、無處理或雙面施以密著性處 理的雙面撓性基板的外側上,各自重疊將熱塑性聚醯亞胺 樹脂熔融擠壓成形後所得到的熱塑性聚醯亞胺樹脂薄膜, 或二軸延伸熱塑性聚醯亞胺樹脂薄膜,再將至少單面經粗 面處理或密著性處理的銅箔的處理側成內側之方式重疊, 然後加熱加壓。 • 於上述任一形態的撓性層合板的製造方法中,較佳係 . 使用單面或雙面施以表面改質處理所成者,作爲該熱塑性 聚醯亞胺樹脂薄膜或二軸延伸熱塑性聚醯亞胺樹脂薄膜。 备 而且較佳的形態中,加熱加壓,係以所使用的熱塑性聚醯 亞胺樹脂的玻璃轉移溫度Tg以上,較佳爲熱塑性聚醯亞 胺樹脂薄膜或二軸延伸熱塑性聚醯亞胺樹脂薄膜的玻璃轉 移溫度Tg以上、熔點以下的溫度進行,更佳係以300 〜3 8 0 °C的溫度進行,再更佳係於上述加熱加壓時,在被配 置於與被加熱加壓材連接之加壓板、與加壓機的加壓盤之 -11 - 200806467 (8) 間,介入氈狀的緩衝材,較佳爲芳香族聚醯胺或聚苯並噁 唑的氈狀緩衝材。 〔發明的效果〕 * 本發明的撓性層合板,含有於熱塑性聚醯亞胺層的至 ^ 少單面上黏著金屬箔層或導體回路層所成的金屬箔層/熱 塑性聚醯亞胺層或/及導體回路層/熱塑性聚醯亞胺層之撓 φ 性層合板;其之形態中,因爲上述熱塑性聚醯亞胺層,係 由將熱塑性聚醯亞胺樹脂熔融擠壓成形後所得到的熱塑性 聚醯亞胺樹脂薄膜或薄片所形成者,故可使用無單體殘 渣•殘留溶劑等雜質之純度高的熱塑性聚醯亞胺樹脂薄 膜,可提供含有熱塑性聚醯亞胺層與金屬箔層或/及導電 回路之間的黏著強度,或者耐移動性優異,而且,具有聚 醯亞胺原本優異的耐熱性、電特性、機械的強度之金屬箔 /熱塑性聚醯亞胺層或/及導電回路層/熱塑性聚醯亞胺層之 @ 撓性層合板。 . 此外,於其他形態,因爲上述的熱塑性聚醯亞胺層, 係由二軸延伸熱塑性聚醯亞胺樹脂薄膜或薄片所成者,故 * 可提供含有與所層合的金屬箔之熱膨脹率幾乎無差異或差 異極小,熱塑性聚醯亞胺層與金屬箔層或/及導電回路層 之間的黏著強度,或者耐移動性優異,而且,除了聚醯亞 胺原本優異的耐熱性、電特性、機械的強度以外,再加上 尺寸安定性、耐焊熱性等諸特性優異的金屬箔/熱塑性聚 醯亞胺層或/及導電回路層/熱塑性聚醯亞胺層之撓性層合 -12- 200806467 (9) 板。特別是上述熱塑性聚醯亞胺層,係由將使結晶性 性聚醯亞胺樹脂熔融擠壓成形後所得到的熱塑性聚醯 樹脂薄膜,再藉由二軸延伸所得到的二軸延伸熱塑性 亞胺樹脂薄膜所成時,可更容易製作如上述的無單 - 渣•殘留溶劑等雜質之純度高的熱塑性聚醯亞胺樹 i 膜。此外,MD方向及TD方向的任一者的熱膨脹α : (以下簡單稱爲熱膨脹率)亦在5xl(T6〜30χ10_6/Κ( 鲁 簡寫爲ppm/K )的範圍內,此外,MD方向及TD方 熱膨脹率的差爲20ppm/K以內之二軸延伸熱塑性聚醯 樹脂薄膜,可有效果的防止與金屬箔層壓時所發生 縮。而且,熱塑性聚醯亞胺樹脂薄膜藉由二軸延伸, 璃轉移溫度Tg可比未延伸的熱塑性聚醯亞胺樹脂薄 玻璃轉移溫度Tg高10〜8 (TC,提高了耐焊熱性。 此外,本發明的撓性層合板的製造方法,係藉由 塑性聚醯亞胺樹脂熔融擠壓成形後所得到的熱塑性聚 • 胺樹脂薄膜或二軸延伸熱塑性聚醯亞胺樹脂薄膜,與 • 箔或導體回路層加熱加壓後黏著之方法,所謂的層壓 * 行如上述的撓性層合板的製造,故可在不會發生空隙 合體的鍾曲下’以1步驟進彳了多層的層合,能夠以生 佳且低成本製造具有聚醯亞胺原本優異的耐熱性、 性、機械的強度之撓性層合板,或者更具有優異的尺 定性、耐焊熱性等諸特性之撓性層合板。所以,能夠 單的步驟而生產性佳地進行撓性雙面貼銅層合板的製 或熱塑性聚醯亞胺樹脂薄膜作爲回路埋入的黏著 熱塑 亞胺 聚醯 體殘 脂薄 20-200 以下 向之 亞胺 的卷 其玻 膜的 使熱 醯亞 金屬 法進 、層 產性 電特 寸安 以簡 造、 膠層 -13- 200806467 (10) (bonding sheet )或層間絕緣材利用的各種多層結構的撓 性層合基板的製造。 而且,依據本發明的較佳形態,上述熱塑性聚醯亞胺 層,係玻璃轉移溫度(Tg)爲180〜2 8 0 °C,或在比該樹脂 - 的熔點高30°C的擠壓溫度,用50〜SOOhecT1]的範圍的剪 v 切速度所測量的熔融黏度爲5x1ο1〜lxl〇4[Pa · S]。因爲較 佳爲具有後述的一般式(1)的重複結構單元之熱塑性聚 φ 醯亞胺樹脂、較佳爲具有後述的式(5)的重複結構單元 之熱塑性聚醯亞胺樹脂,更佳係含有後述式(6 )及式 (7 )的重複結構單元之熱塑性聚醯亞胺樹脂、或具有後 述式(6)及式(8)的重複結構單元之熱塑性聚醯亞胺樹 脂,故可利用此等的聚醯亞胺樹脂的熱塑性,應用以其玻 璃轉移溫度Tg以上、熔點以下的溫度,較佳爲300〜380 °C的溫度,藉由加熱加壓之熔融•硬化的物理的狀態變化 而簡單地層合。特別是由結晶性熱塑性聚醯亞胺樹脂、與 II 以層合加工溫度而成熔融狀態的熱塑性樹脂,較佳係熔點 ▲ 爲280〜3 50°C的其他的熱塑性樹脂的混合物所形成時,可 # 更提高層合時的黏著強度。而且更佳係在上述加熱加壓 時,被配置與被加熱加壓材連接之加壓板與加壓機的加壓 盤之間,藉由介入氈狀的緩衝材,較佳爲芳香族聚醯胺或 聚苯並噁唑的氈狀緩衝材,可得到即使面積廣亦平滑且均 勻肉厚的撓性層合基板。 〔實施發明之最佳形態〕 -14- 200806467 (11) 如上述,本發明的撓性層合板及其製造方法,係使用 將熱塑性聚醯亞胺樹脂熔融擠壓成形後所得到的熱塑性聚 醯亞胺樹脂薄膜,或二軸延伸熱塑性聚醯亞胺樹脂薄膜, 使其與金屬箔或導體回路層加熱加壓後黏著之方法,藉由 I 所謂的層壓法所進行者。 v 先前技術爲了形成膜狀的聚醯亞胺層,因爲如上述在 銅箔或聚醯亞胺樹脂薄膜上塗佈熱塑性聚醯亞胺的先驅物 Φ 聚醯胺酸後醯亞胺化,故存在單體殘渣或殘留溶劑,而成 爲電特性降低的主要原因。此外,加熱壓黏時因爲雜質產 生氣體而在層間易發生間隙,而且會有層合時塗佈、加熱 步驟變煩雜之問題。惟,經由開發如後述的可熔融成形成 加工的熱塑性聚醯亞胺樹脂的薄膜,可如本發明之藉由層 壓法製造各種結構的撓性層合板。 藉由如此層壓法之撓性層合板的製造的特徵,可列舉 如以述幾點。 # ( 1 )所使用的熱塑性聚醯亞胺,與一般的塑膠材料 . 同樣可熔融成形加工,藉由量產性優異的T模頭擠壓方法 成形聚醯亞胺樹脂薄膜。 雇 (2 )因爲醯亞胺化反應皆已在樹脂顆粒的製造階段 結束,故薄膜成膜時不需要進行醯亞胺化反應,可使用無 單體殘渣或殘留溶劑等的雜質之純度高的熱塑性聚醯亞胺 樹脂薄膜。 (3 )並非藉由聚醯胺酸的醯亞胺化反應或樹脂硬化 反應而層合,利用聚醯亞胺樹脂的熱塑性,利用藉由加熱 -15 - 200806467 (12) 加壓之熔融•硬化的物理的狀態變化而層合。 (4 )熱塑性聚醯亞胺樹脂薄膜的加熱加懕’係在並 非完全被熔融的狀態下,以Tg以上、熔點以下的溫度條 件進行。 ^ ( 5 )加熱加壓時,被配置於與被加熱加壓材連接之 、 加壓板及加壓機的加壓盤之間,藉由使用具有耐熱性之氈 狀的緩衝材,可得到即使面積廣但平滑且均勻的肉厚的層 φ 合板。 (6)可使形成回路的基板再層合化。 此外,本發明之藉由層壓法之撓性層合板的製造方 法,相對於先前技術工法的優點,可列舉如下述幾點。 (1 )不使用耐熱性差的黏著劑等,可得到具有聚醯 亞胺原本優異的耐熱性、電特性、機械的強度之回路基 板,所以,可製造全聚醯亞胺基板。 (2 )因爲熱塑性聚醯亞胺樹脂薄膜的純度高,故耐 β 移動性優異。 • ( 3 )於金屬箔或導體層與熱塑性聚醯亞胺樹脂薄膜 . 之層合,可得到具有高的黏著強度的回路基板。 (4)雖然藉由醯亞胺化反應之層合,會發生因爲氣 體的發生所造成空隙、層合體的翹曲,但因爲利用熱塑性 聚醯亞胺樹脂薄膜的熱塑性而未發生此等問題。 (5 )因爲僅加熱黏著己被成形的熱塑性聚醯亞胺樹 脂薄膜,故步驟單純,而且藉由堆疊複數的層,可用1步 驟進行多層的層合。 -16- 200806467 (13) 此外,本發明的較佳形態,係使二軸延伸熱塑性聚醯 亞胺樹脂薄膜、與金屬箔或導體回路層加熱加壓後黏著。 使用熱塑性聚醯亞胺樹脂薄膜層壓於金屬箔時,因爲 是熱塑性,故熱膨脹率大於先前技術的熱硬化性聚醯亞胺 • 樹脂(熱塑性聚醯亞胺樹脂的熱膨脹率爲40xl(T6〜60xl(T6 ^ /Κ ),層合熱膨脹率小的金屬箔(熱膨脹率約20x1 (Γ6 /Κ ),則因爲冷卻至室溫時產生尺寸差異而易產生翹曲, Φ 故會有用於製造尺寸安定性等優異的撓性層合板之層壓條 件的控制變難之問題。 如上述在撓性層合板的技術領域中,高密度實裝的要 求水準變嚴格,製造精密度高的配線板時,要求尺寸安定 性、熱膨脹率、拉伸彈性率等的機械的特性優異的材料。 此外,一般而言熱塑性的塑膠薄膜使用於撓性電路板時, 爲了實裝零件而進行回流焊接時,超過其玻璃轉移溫度 Tg之溫度則薄膜軟化,在撓性電路板上產生翹曲或扭曲 ® 等的變曲而成爲問題。在於熱塑性聚醯亞胺樹脂薄膜,因 • 爲其玻璃轉移溫度Tg與無鉛焊接的加工溫度相同或更低 . 的溫度,故更要求耐熱性的提昇。 本發明者等,對於如此的現象更進一步硏究的結果, 發現結晶性的熱塑性聚醯亞胺樹脂薄膜藉由二軸延伸,可 使其熱膨脹率降低至銅箔或與熱硬化性的聚醯亞胺樹脂薄 膜相同的20ppm/K左右或附近,而且,藉由二軸延伸可提 高玻璃轉移溫度Tg,即使3 00 °C以上的溫度亦保持剛性。 亦即,熱塑性聚醯亞胺樹脂藉由二軸延伸,將熱塑性 -17- 200806467 (14) 聚醯亞胺樹脂在薄膜的面方向上等向性的分子配向,降低 熱膨脹率。而且,藉由調整延伸溫度或延伸速度,可調整 至使其降低至與銅箔或熱硬化性聚醯亞胺樹脂薄膜同等的 熱膨脹率。 . 此外,二軸延伸後藉由一邊限制收縮一邊加熱後固定 (熱固定)分子配向,即使超過所使用的延伸前的熱塑性 聚醯亞胺樹脂的玻璃轉移溫度Tg之溫度區域,亦無法回 φ 復到原來的熱膨脹率,在玻璃轉移溫度Tg以上、熔點以 下的溫度範圍,可在維持經降低的熱膨脹率的狀態下加熱 黏著。而且,成爲擠壓成形時所產生的薄膜的殘留應力亦 被去除,加熱•冷卻至可黏著的溫度後亦無產生尺寸變化 之尺寸安定性優異的薄膜。因此,在層壓於金屬箔或導體 回路時,可製造未產生翹曲、尺寸精密度及尺寸安定性優 異的層合板。 而且可藉由使熱塑性聚醯亞胺樹脂薄膜進行二軸延 # 伸,提高玻璃轉移溫度,例如玻璃轉移溫度Tg爲258 °c . 之熱塑性聚醯亞胺樹脂,藉由二軸延伸而上昇至305 °C。 藉由使熱塑性聚醯亞胺樹脂薄膜進行二軸延伸,玻璃轉移 溫度可能上昇1〇〜80°c,即使300°c以上的溫度亦保持剛 性。這樣的結果,即使超過延伸前的玻璃轉移溫度Tg, 薄膜亦未開始軟化,作爲印刷電路板使用時,回流焊接時 的耐焊熱性亦提高。 測量玻璃轉移溫度,可用測量熱膨脹率之ΤΜΑ試驗 進行分析,以下,一邊參照圖面一邊說明。 -18- 200806467 (15) 圖1係表示熱塑性聚醯亞胺樹脂未延伸薄膜及熱塑性 聚醯亞胺樹脂延伸薄膜的TMA曲線之模式圖,由圖1可 清楚知道,藉由使熱塑性聚醯亞胺樹脂進行二軸延伸,提 高玻璃轉移溫度Tg,再者,玻璃轉移溫度Tg係熱膨脹率 - 平緩上昇的線段、與陡峭地上昇的線段之交接點。 . 接著,說明關於熱塑性聚醯亞胺樹脂薄膜的二軸延 伸。 φ 延伸步驟係同時二軸延伸及逐次二軸延伸皆可,延伸 溫度爲250〜275 t的範圍較佳;延伸溫度太低,則延伸所 需的應力強而無法延伸,或者,延伸步驟時薄膜破裂或不 均勻的延伸;另一方面,延伸溫度太高,則分子配向小, 未表現出因爲延伸所產生的熱膨脹降低效果。 此外,延伸倍率較佳爲2.5〜5倍的範圍,延伸倍率太 低,則分子配向不足且熱膨脹率不降低,或者於熱固定中 薄膜產生皺褶,另一方面,延伸倍率太高,則會引起延伸 # 時薄膜破裂等問題。 • 此外,延伸速度較佳爲100〜1000%/min的範圍,延伸 速度低,則分子配向小,熱膨脹率不降低,另一方面,藉 鏟 由延伸設備的能力的限制而使延伸速度有上限。 接著,熱固定的條件可在加熱溫度爲280〜3 80 °C、較 佳爲290〜3 3 0 °C,限制收縮爲2〜20%,較佳爲4〜10%,時 間爲1〜5 000分鐘的範圍內任意設定。熱固定溫度太低則 再加熱延伸薄膜時發生大的尺寸變化,另一方向熱固定溫 度高至熔點以上,則藉由延伸所完成的分子配向會消除。 -19- (16) 200806467 二軸延伸的方法係可使用利用複數的滾輪進行延伸之 方法、使用拉幅機進行延伸之方法、藉由用滾輪壓延進行 延伸之方法、管型延伸方法等先前技術習知的方法。產業 上經常被使用之使用拉幅機的延伸法,以不同步驟的2階 〃 段各自延伸縱方向與垂直方向之逐次延伸,與同時延伸緃 ^ 方向與垂直方向之同時延伸,用任何一種方法進行二軸延 伸皆可。 φ 逐次二軸延伸時,首先以250〜3 00°C預熱欲延伸的熱 塑性聚醯亞胺樹脂薄膜,在被均勻地加熱至所定的溫度的 狀態下,往一方向延伸2〜5倍;接著,於250〜300°C的溫 度範圍在與該延伸方向的垂直方向上往一方向延伸2〜5 倍。接著,於280〜3 80 °C的溫度範圍在伸展下熱固定薄 膜,於熱固定,雖然伴有延伸後薄膜的收縮,但一邊維持 在限制收縮的伸展狀態一邊慢慢的在限制收縮至2〜2 0 %的 狀態下冷卻。 Φ 同時二軸延伸時,以250〜300°C預熱欲延伸的熱塑性 . 聚醯亞胺樹脂薄膜,在被均勻地加熱至所定的溫度的狀態 λ 下,往互相成垂直的二方向同時延伸2〜5倍;接著,於 2 8 0〜3 8 0 °C的溫度範圍在伸展下熱固定薄膜,於熱固定, 雖然伴有延伸後薄膜的收縮,但一邊維持在限制收縮的伸 展狀態一邊慢慢的在限制收縮至2〜20%的狀態下冷卻。 如上述藉由使熱塑性聚醯亞胺樹脂薄膜藉進行二軸延 伸,可製作MD方向及TD方向的任一者的熱膨脹皆爲5〜 3 0 ppm/K,較佳爲10〜25 ppm/K的範圍內,此外,MD方 -20- 200806467 (17) 向及TD方向之熱膨脹率的差爲20ppm/K以內之二軸延伸 熱塑性聚醯亞胺樹脂薄膜,可有效果的防止與金屬箔層壓 時所發生的翹曲。而且,藉由使熱塑性聚醯亞胺樹脂薄膜 進行二軸延伸,其玻璃轉移溫度T g可比未延伸的熱塑性 - 聚醯亞胺樹脂薄膜的玻璃轉移溫度Tg高10〜80 °c,提高 . 了耐焊熱性。此外,即使接受了熔點以下的熱履歷亦可維 持低的低膨脹率,持續保持優良的尺寸安定性及必要的黏 φ 著強度,藉由選擇適當的層壓條件就不會在層壓於銅箔時 發生流出樹脂。 如上述作法所得到二軸延伸熱塑性聚醯亞胺樹脂薄 膜,在非完全被熔融的狀態,用延伸前的熱塑性聚醯亞胺 樹脂的玻璃轉移溫度Tg以上,較佳爲二軸延伸熱塑性聚 醯亞胺樹脂薄膜的玻璃轉移溫度Tg以上,熔點以下的溫 度,較佳爲300〜3 80 °c進行加熱加壓,可輕易的層壓於銅 箔、導體回路層、聚醯亞胺薄膜等之被加熱加壓材上。層 # 壓壓力具有愈高則層壓溫度可愈低之優點,但一般因爲層 - 壓壓力太高則所得到的層合板會有尺寸容易變化的傾向, , 故5〜50kgf/cm2的範圍較適當。 上述二軸延伸前的熱塑性聚醯亞胺樹脂薄膜,可使用 將熱塑性聚醯亞胺薄膜熔融擠壓成形後所得到的熱塑性聚 醯亞胺樹脂薄膜,或藉由如先前技術的流延法所得到的熱 塑性聚醯亞胺樹脂薄膜之任一種,特別是爲將熱塑性聚醯 亞胺樹脂熔融擠壓成形後所得到的熱塑性聚醯亞胺樹脂薄 膜時,可得到如下述的優點。 -21 - (18) (18)200806467 (1)可藉由量產性優異的T模頭擠壓方法成形聚醯 亞胺樹脂薄膜。 (2 )因爲醯亞胺化反應皆己在樹脂顆粒的製造階段 結束,故薄膜成膜時不需要進行醯亞胺化反應,可使用無 單體殘渣或殘留溶劑等的雜質之純度高的熱塑性聚醯亞胺 樹脂薄膜。 (3 )因爲熱塑性聚醯亞胺樹脂薄膜的純度高,故耐 移動性優。 本發明所使用的熱塑性聚醯亞胺樹脂薄膜的材料,可 使用如後述的熱塑性聚醯亞胺樹脂或被稱爲聚醚醯亞胺樹 脂者,此等可單獨使用或混合2種以上使用。再者,本說 明書中,「熱塑性聚醯亞胺樹脂」用語,可理解爲包含熱 塑性聚醯亞胺樹脂及聚醚醯亞胺樹脂者,「熱塑性聚醯亞 胺樹脂薄膜」用語之意,係指具有熱塑性(硬化與軟化的 熱可逆性)之聚醯亞胺樹脂薄膜。再者,本發明所使用的 熱塑性聚醯亞胺樹脂的對數黏度並沒有特別的限制,但一 般希望爲約 0.35〜1.30dl/g,較佳爲 0.40〜1.00dl/g的範 圍,對數黏度低於上述範圍則樹脂的分子量小,變成特性 上劣化者,另一方面,高過上述範圍,則樹脂的分子量太 大,擠壓成形時的流動性產生困難而較不佳。熱塑性聚醯 亞胺樹脂的對數黏度,係將試料溶解於苯酚9容量份與p-氯苯酚1容量份之混合溶劑之溶液(濃度0.5g/dl),及, 該混合溶劑的黏度各自用ubbelohde式黏度計於30°C測 量,藉由下述數式(1)算出之値。 -22- (19) (19)200806467 [數1] 對數黏度=......數式(1) [式中,t爲溶液的落下時間(sec ),to爲混合溶劑的落下 時間(sec ) ,C爲溶液濃度(g/dl )。] 上述熱塑性聚醯亞胺樹脂,可列舉具有下述一般式 (1 )所表示的重複結構單元者。In the case of the use of the adhesive, the dielectric constant is increased, and the heat resistance is lowered. [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei 8-244168 (Patent Document 2) JP-A-2002- 1 0 2 2 2 7 [Patent Document 3] JP-A-2002-192 7-89 (PATENT DOCUMENT 5) OPERATION 2 0 0 3 - 2 5 1 7 7 Japanese Laid-Open Patent Publication No. 2005-19265 (Patent Document No. JP-A-2005-193541) [Problems to be Solved by the Invention] The present invention has been made to solve the above-described problems of the prior art, and its main object is to provide a heat-resistant property which is excellent in polyetherimide by simply being produced by a lamination method. Flexible laminate of metal foil layer/thermoplastic polyimide layer or/and conductor loop layer/thermoplastic polyimide layer of electrical properties, mechanical strength. Further, an object of the present invention is to provide a film which can be easily produced by a lamination method, and which has excellent heat resistance, electrical properties, mechanical strength, and excellent dimensional stability and solder heat resistance. A flexible laminate of a metal foil layer/thermoplastic polyimide layer or/and a conductor loop layer/thermoplastic polyimide layer of such characteristics. The object of the present invention is to provide a layer of a polyimide layer and a conductor layer (metal foil) by heat-pressurizing a thermoplastic polyimide film without using a layer of viscous 200806467 (4) The method of producing the above flexible laminate by the press method with excellent productivity and low cost. Further, an object of the present invention is to provide a flexible laminate which is excellent in productivity, low-cost, and excellent in properties such as dimensional stability and solder heat resistance by a lamination method without using an adhesive. [Means for Solving the Problem] φ In order to achieve the above object, according to the present invention, there is provided a metal foil layer/thermoplastic polymer formed by adhering a metal foil layer or a conductor loop layer on at least one side of a thermoplastic polyimide layer. a flexible laminate of a quinone imine layer or/and a conductor loop layer/thermoplastic polyimide layer; characterized by the above thermoplastic polyimide layer being obtained by melt-extruding a thermoplastic polyimide film resin a thermoplastic polyimide film or sheet (hereinafter collectively referred to as "thermoplastic polyimide film"), or a biaxially stretched thermoplastic polyimide film or sheet (hereinafter collectively referred to as "biaxially stretched thermoplastic polymer" Flexible laminate made of imine Φ resin film"). In a preferred embodiment, the thermoplastic polyimide resin preferably has a glass transition temperature (Tg) of 180 to 2 80 ° C or a extrusion temperature of 30 ° C higher than the melting point of the resin. The shear viscosity measured in the range of SOOtsecT1] is preferably 5X101~lx104 [Pa·S]. Here, the melt viscosity [Pa · S] of the thermoplastic polyimide resin is measured by the Shimadzu FLO W TESTER CFT-5 00 according to JIS K-7199, but is not limited thereto, and may be The enthalpy measured under the same conditions. The above-mentioned biaxially stretched thermoplastic polyimide film can be a thermoplastic polyimide film obtained by a casting method as in the prior art of -8-200806467 (5), by means of a biaxial stretching In a preferred embodiment, the thermoplastic polyimide film obtained by melt-extruding the thermoplastic polyimide, as described above, and the biaxially stretched thermoplastic poly-imide obtained by biaxial stretching The resin film is preferably a thin v film of the above biaxially stretched thermoplastic polyimide film, and the thermal expansion α 2〇-2〇〇 of either the MD direction (longitudinal direction of the film) and the TD direction (film width direction) In the range of φ of 5 parent 10_6 to 30 parent 1〇-6/:^, the difference between the thermal expansion ratio α2〇-2()() in the MD direction (longitudinal direction of the film) and the TD direction (film width direction) It is preferably 2〇χ1 ((6/Κ6 or less); and more preferably, the above-mentioned biaxially stretched thermoplastic polyimide film is desired to have a glass transition temperature Tg of glass transition temperature Tg of the thermoplastic polyimide film before stretching. 10~80°C higher. Again, the so-called in this manual The glass transition temperature Tg is the glass transition temperature measured by thermomechanical analysis (TMA) according to the method described in "5.17.1 TMA method" of JIS C 6481: 1996. • In other preferred embodiments, the above thermoplastic polyfluorene The imine resin is a knot-crystalline thermoplastic polyimide resin or a mixture of a crystalline thermoplastic polyimide, a resin, and another thermoplastic resin having a melting point of 280 to 350 ° C. In a preferred embodiment, the thermoplastic polyimide resin is a thermoplastic polyimine resin having a repeating structural unit of the general formula (1) to be described later, preferably a repeating structural unit having the formula (5) described later. The thermoplastic polyimine resin is a ratio of the molar number m of the structural unit of the formula (6) to the molar number of the structural unit of the formula (7), m/n is 4 to 9 s, which will be described later. Heat of the repeating structural unit of the formula (6) and the formula (7) - 200806467 (6) Plastic polyimine resin. Further, in other preferred embodiments, the formula (6) and the formula (8) are described later. The repeating structural unit of the thermoplastic polyimine tree, and the following formula (6) The thermoplastic structure of the repeating structural unit represented by the formula (8) and the repeating structural unit represented by the formula (8) is 1:0 to 0.75: 0.25. A method for producing a laminate, the basic form of which comprises a metal foil layer/thermoplastic polyimide layer formed by adhering a φ metal foil layer or a conductor loop layer on at least one surface of a thermoplastic polyimide layer. A method for producing a flexible laminate of a conductor loop layer/thermoplastic polyimide layer; characterized by a thermoplastic polyimide film obtained by melt-extruding a thermoplastic polyimide film, or by biaxial stretching The thermoplastic polyimide film is adhered to the metal foil or the conductive loop layer after being heated and pressurized. A preferred embodiment of the method for producing a flexible laminate of the present invention is characterized in that the superposed thermoplastic polyimide film is melt-extruded on the treated side of the roughened or adhesively treated copper foil. a thermoplastic polyimide film prepared after molding, or a biaxially stretched thermoplastic polyimide/resin film, on the opposite side of the film, overlapping at least one of which is roughened or adhesively treated The treated side of the copper foil is then heated and pressurized. Further, a preferred other aspect of the method for producing a flexible laminate of the present invention is characterized in that the thermoplastic polymer is superposed on both sides of the polyimide film which is treated without treatment or double-sided with adhesion treatment. a thermoplastic polyimide film obtained by melt extrusion molding of a quinone imine resin, or a biaxially stretched 10-200806467 (7) thermoplastic polyimide film, and at least one side of the outer surface thereof is roughened The treated side of the treated or adhesively treated copper foil is overlapped inwardly and then heated and pressurized. Further, other preferred embodiments of the method for producing a flexible laminate of the present invention are characterized in that the double-sided flexible substrates which are formed into a loop, have no treatment, or have a double-sided adhesiveness therebetween A film of a thermoplastic polyimide film obtained by melt-extruding a thermoplastic polyimide film or a film of a two-axis-extending thermoplastic polyimide film is then introduced and then heated and pressurized. Further, in another aspect of the method for producing a flexible laminate according to the present invention, it is characterized in that the outer layer of the double-sided flexible substrate which is formed into a circuit, has no treatment, or has a double-sided adhesive treatment is overlapped. a thermoplastic polyimide film obtained by melt-extruding a thermoplastic polyimide film, or a biaxially stretched thermoplastic polyimide film, and then at least one side roughened or densely treated copper The treated side of the foil is overlapped inwardly and then heated and pressurized. In the method for producing a flexible laminate according to any of the above aspects, it is preferred to use a one-side or two-side surface modification treatment as the thermoplastic polyimide film or biaxially stretched thermoplastic. Polyimine resin film. In a preferred and preferred embodiment, the heat and pressure are based on the glass transition temperature Tg of the thermoplastic polyimide resin used, preferably a thermoplastic polyimide film or a biaxially stretched thermoplastic polyimide resin. The film has a glass transition temperature Tg or higher and a temperature equal to or lower than the melting point, more preferably at a temperature of 300 to 380 ° C, and more preferably at the time of the above-described heating and pressing, and is disposed on the heated and pressed material. Between the connected pressure plate and the pressure plate of the press machine -11 - 200806467 (8), the felt-like cushioning material is interposed, preferably a felt buffer material of aromatic polyamine or polybenzoxazole. . [Effect of the Invention] * The flexible laminate of the present invention comprises a metal foil layer/thermoplastic polyimide layer formed by adhering a metal foil layer or a conductor loop layer to at least one surface of the thermoplastic polyimide layer. Or/and a flexible circuit layer of a conductive circuit layer/thermoplastic polyimide layer; in the form of the above thermoplastic polyimine layer, obtained by melt-extruding a thermoplastic polyimide film Since the thermoplastic polyimide film or sheet is formed, a thermoplastic polyimide film having a high purity such as a monomer-free residue or a residual solvent can be used, and a thermoplastic polyimide layer and a metal foil can be provided. The adhesive strength between the layers or/and the conductive loops, or the excellent mobility resistance, and the metal foil/thermoplastic polyimide layer having the excellent heat resistance, electrical properties, and mechanical strength of the polyimide. @Flexible laminate of conductive loop layer / thermoplastic polyimide layer. Further, in other forms, since the above-mentioned thermoplastic polyimide layer is formed of a biaxially stretched thermoplastic polyimide film or sheet, the thermal expansion ratio of the metal foil to be laminated can be provided. There is almost no difference or very small difference, and the adhesion strength or the mobility resistance between the thermoplastic polyimide layer and the metal foil layer or/and the conductive circuit layer is excellent, and in addition to the excellent heat resistance and electrical properties of the polyimide. In addition to the strength of the machine, a metal foil/thermoplastic polyimide layer or/and a conductive loop layer/thermoplastic polyimide layer flexible laminate -12 excellent in dimensional stability and solder heat resistance - 200806467 (9) Board. In particular, the thermoplastic polyimide layer is a biaxially stretched thermoplastic sub-paste obtained by melt-extruding a crystalline polyimine resin obtained by biaxial stretching. When the amine resin film is formed, it is easier to produce a thermoplastic polyimide film i film having high purity such as the above-mentioned impurities such as a single residue or a residual solvent. In addition, the thermal expansion α of any of the MD direction and the TD direction (hereinafter simply referred to as the thermal expansion coefficient) is also in the range of 5xl (T6 to 30 χ 10_6 / Κ (Lu abbreviated as ppm / K), in addition, the MD direction and TD A biaxially stretched thermoplastic polyanthraquinone film having a difference in thermal expansion coefficient of 20 ppm/K can be effectively prevented from shrinking when laminated with a metal foil. Further, the thermoplastic polyimide film is extended by two axes. The glass transition temperature Tg can be higher than the unstretched thermoplastic polyimide resin thin glass transfer temperature Tg by 10 to 8 (TC, which improves solder heat resistance. Further, the flexible laminate of the present invention is produced by plastic polymerization. A thermoplastic polyamine resin film or a biaxially stretched thermoplastic polyimide film obtained by melt-extruding a bismuth imine resin, and a method of heating and pressing a foil or a conductor loop layer, so-called lamination* Since the flexible laminate is manufactured as described above, it is possible to carry out the lamination of a plurality of layers in one step without the occurrence of voids, and it is possible to produce the polyimide having excellent properties at a low cost and at a low cost. Heat resistance, Flexible laminates with strong mechanical strength, or flexible laminates with excellent properties such as excellent sizing, solder heat resistance, etc. Therefore, the flexible double-sided copper layer can be produced with good productivity in a single step. A plywood or thermoplastic polyimide film is embedded as a loop of adhesive thermoplastic imine polythene remnant fat thinner than 20-200 to the imine roll of the glass film to make the thermal sub-metallurgical process Manufacture of a flexible laminated substrate of various multilayer structures utilized in a simple, adhesive layer-13-200806467 (10) (bonding sheet) or interlayer insulating material. Further, in accordance with a preferred embodiment of the present invention The above thermoplastic polyimide layer has a glass transition temperature (Tg) of 180 to 280 ° C, or a extrusion temperature of 30 ° C higher than the melting point of the resin - with a range of 50 to SOOhecT1] The melt viscosity measured by the shear v-cutting speed is 5x1 ο1 to lxl 〇 4 [Pa · S]. Since it is preferably a thermoplastic poly φ imimine resin having a repeating structural unit of the general formula (1) described later, it is preferred to have The thermoplasticity of the repeating structural unit of the formula (5) described later The polyimine resin is more preferably a thermoplastic polyimide resin containing a repeating structural unit of the following formulas (6) and (7), or a thermoplastic having a repeating structural unit of the following formulas (6) and (8); Since the polyimine resin is used, the thermoplasticity of the polyimide resin can be used at a temperature equal to or higher than the glass transition temperature Tg and at a temperature equal to or lower than the melting point, preferably at a temperature of 300 to 380 ° C. The physical state of the melting and hardening is simply laminated, and in particular, the crystalline thermoplastic polyimide resin and the thermoplastic resin which is melted in a lamination processing temperature with II are preferably 280 to 3 in melting point ▲ When a mixture of other thermoplastic resins at 50 ° C is formed, the adhesion strength at the time of lamination can be further improved. Further preferably, during the heating and pressurization, it is preferably disposed between the pressure plate connected to the heated and pressed material and the pressure plate of the press machine, and is preferably an aromatic polymer by interposing a felt-like cushioning material. A felt-like cushioning material of guanamine or polybenzoxazole can obtain a flexible laminated substrate which is smooth and uniform in thickness even in a wide area. [Best Mode for Carrying Out the Invention] -14-200806467 (11) As described above, the flexible laminate of the present invention and the method for producing the same are those obtained by melt-molding a thermoplastic polyimide resin. A method in which a film of an imide resin or a film of a biaxially stretched thermoplastic polyimide film is adhered to a metal foil or a conductor circuit layer by heating and pressurization is carried out by a so-called lamination method. v Prior art In order to form a film-like polyimide layer, since the precursor of the thermoplastic polyimide, Φ polyamine, is imidized on the copper foil or polyimide film by the above, There is a monomer residue or a residual solvent, which is a major cause of a decrease in electrical characteristics. Further, when the pressure is applied by heating, a gap is likely to occur between the layers due to the generation of gas by the impurities, and there is a problem that the coating and heating steps become complicated when laminating. However, a flexible laminate of various structures can be produced by a lamination method according to the present invention by developing a film of a thermoplastic polyimide film which can be melt-formed as described later. The characteristics of the manufacture of the flexible laminate by such a lamination method are as follows. # (1) The thermoplastic polyimide used is a melt-molding process similar to a general plastic material, and the polyimide film is formed by a T-die extrusion method excellent in mass productivity. Employed (2) Since the ruthenium imidization reaction has been completed at the production stage of the resin pellets, it is not necessary to carry out the oxime imidization reaction when the film is formed, and the purity of impurities such as a monomer-free residue or a residual solvent can be used. Thermoplastic polyimide film. (3) It is not laminated by a hydrazine imidization reaction of a polyaminic acid or a resin hardening reaction, and the thermoplasticity of the polyimide resin is utilized, and melting and hardening by pressurization by heating -15 - 200806467 (12) The physical state changes and is laminated. (4) The heating and twisting of the thermoplastic polyimide film is carried out at a temperature of not more than Tg and not more than the melting point in a state where it is not completely melted. (5) When heated and pressurized, it is disposed between the pressure plate and the pressure plate of the press machine connected to the heated and pressed material, and is obtained by using a felt-like cushioning material having heat resistance. Even a wide, smooth and uniform layer of fleshy φ plywood. (6) The substrate forming the loop can be laminated. Further, the method for producing a flexible laminate by the lamination method of the present invention has the following points as compared with the advantages of the prior art method. (1) A circuit board having excellent heat resistance, electrical properties, and mechanical strength which is excellent in polyamidimide can be obtained without using an adhesive having poor heat resistance, etc., so that a wholly polyimine substrate can be produced. (2) Since the thermoplastic polyimide film has high purity, it is excellent in resistance to β mobility. • (3) Lamination of a metal foil or a conductor layer and a thermoplastic polyimide film to obtain a circuit substrate having high adhesion strength. (4) Although the voids of the laminate and the warp caused by the generation of the gas are caused by the lamination of the hydrazine imidation reaction, such a problem does not occur because of the thermoplasticity of the thermoplastic polyimide film. (5) Since only the thermoplastic polyimide film formed by the adhesion is heated, the steps are simple, and by stacking a plurality of layers, lamination of a plurality of layers can be carried out in one step. Further, in a preferred embodiment of the present invention, the biaxially stretched thermoplastic polyimide film is adhered to the metal foil or the conductor circuit layer by heating and pressurization. When a thermoplastic polyimide film is laminated on a metal foil, since it is thermoplastic, the coefficient of thermal expansion is higher than that of the prior art thermosetting polyimide/resin (the thermal expansion ratio of the thermoplastic polyimide resin is 40xl (T6~) 60xl (T6 ^ /Κ ), laminated metal foil with low thermal expansion rate (thermal expansion rate of about 20x1 (Γ6 /Κ), it is easy to produce warpage due to dimensional difference when cooling to room temperature, Φ will be used for manufacturing size The control of lamination conditions of flexible laminates excellent in stability, etc. becomes difficult. As described above, in the technical field of flexible laminates, the requirements for high-density mounting are strict, and when manufacturing precision wiring boards are high, A material excellent in mechanical properties such as dimensional stability, thermal expansion coefficient, and tensile modulus. It is generally used when a thermoplastic plastic film is used for a flexible circuit board, and reflow soldering is performed for mounting a part. The temperature at the glass transition temperature Tg is softened by the film, and warpage or distortion of the warpage or the like is caused on the flexible circuit board. This is a problem in the thermoplastic polyimide film. • For the temperature at which the glass transition temperature Tg is the same as or lower than the processing temperature of the lead-free soldering, heat resistance is required to be improved. The inventors of the present invention have found that crystalline thermoplastics are obtained as a result of further investigation of such phenomena. The polyimide film can be reduced in thermal expansion rate to the copper foil or the same 20ppm/K or near the thermosetting polyimide film by biaxial stretching, and can be extended by two axes. Increasing the glass transition temperature Tg, even if the temperature above 300 ° C remains rigid. That is, the thermoplastic polyimide resin is biaxially stretched, and the thermoplastic -17-200806467 (14) polyimine resin is in the film. The isotropic molecular alignment in the plane direction reduces the coefficient of thermal expansion, and by adjusting the stretching temperature or the stretching speed, it can be adjusted to be reduced to the same thermal expansion ratio as that of the copper foil or the thermosetting polyimide film. In addition, the biaxial extension is followed by heating and fixing (heat-fixing) the molecular alignment while restraining the shrinkage, even if the glass of the thermoplastic polyimide resin before stretching is used. In the temperature region where the temperature Tg is moved, it is not possible to return to the original thermal expansion coefficient, and the temperature can be heated and maintained while maintaining the reduced thermal expansion rate in the temperature range of the glass transition temperature Tg or more and the melting point or lower. The residual stress of the film generated during molding is also removed, and there is no film having excellent dimensional stability after heating/cooling to an adhesive temperature. Therefore, it can be manufactured when laminated on a metal foil or a conductor loop. A laminate having excellent warpage, dimensional precision, and dimensional stability is not produced. Moreover, the glass transition temperature can be increased by subjecting the thermoplastic polyimide film to biaxial stretching, for example, the glass transition temperature Tg is 258 °c. The thermoplastic polyimide resin is raised to 305 ° C by biaxial stretching. By biaxially stretching the thermoplastic polyimide film, the glass transition temperature may rise by 1 〇 to 80 ° C, and the temperature is maintained at a temperature of 300 ° C or more. As a result, even if it exceeds the glass transition temperature Tg before stretching, the film does not start to soften, and when used as a printed circuit board, the solder heat resistance at the time of reflow soldering is also improved. The glass transition temperature is measured and analyzed by the enthalpy test for measuring the coefficient of thermal expansion. Hereinafter, the description will be made with reference to the drawings. -18- 200806467 (15) Figure 1 is a schematic view showing the TMA curve of a thermoplastic polyimide film unstretched film and a thermoplastic polyimide film extended film, as is clear from Fig. 1, by making a thermoplastic poly The amine resin is biaxially stretched to increase the glass transition temperature Tg. Further, the glass transition temperature Tg is a thermal expansion coefficient - a point where the line segment rises gently and the point where the line rises steeply. Next, the biaxial stretching of the thermoplastic polyimide film will be described. The φ extension step is simultaneous with both the biaxial extension and the successive biaxial extension, and the extension temperature is preferably in the range of 250 to 275 t; if the extension temperature is too low, the stress required for the extension is strong and cannot be extended, or the film is extended. Rupture or uneven extension; on the other hand, if the extension temperature is too high, the molecular alignment is small, and the thermal expansion reduction effect due to the extension is not exhibited. Further, the stretching ratio is preferably in the range of 2.5 to 5 times, and the stretching ratio is too low, the molecular alignment is insufficient and the coefficient of thermal expansion is not lowered, or the film is wrinkled during heat setting, and on the other hand, the stretching ratio is too high. Causes problems such as film breakage when stretching #. • In addition, the extension speed is preferably in the range of 100 to 1000%/min, and the extension speed is low, the molecular alignment is small, and the thermal expansion rate is not lowered. On the other hand, the extension speed is limited by the ability of the shovel to extend the device. . Next, the heat setting condition may be at a heating temperature of 280 to 3 80 ° C, preferably 290 to 3 30 ° C, and the shrinkage is limited to 2 to 20%, preferably 4 to 10%, and the time is 1 to 5 Any setting within the range of 000 minutes. If the heat setting temperature is too low, a large dimensional change occurs when the stretched film is heated again, and when the heat setting temperature is higher than the melting point in the other direction, the molecular alignment by extension is eliminated. -19- (16) 200806467 The method of biaxial stretching can use a method of extending with a plurality of rollers, a method of stretching using a tenter, a method of stretching by rolling with a roller, a method of extending a tube type, and the like. A conventional method. In the industry, the stretching method using a tenter is often used, and the second-order segments of different steps are respectively extended in the longitudinal direction and the vertical direction, and simultaneously extended in the direction of the 緃^ direction and the vertical direction, by any method. It is possible to carry out two-axis extension. When φ is successively extended by two axes, the thermoplastic polyimide film to be stretched is first preheated at 250 to 300 ° C, and is uniformly extended to a predetermined temperature in a state of 2 to 5 times; Next, the temperature range of 250 to 300 ° C is extended by 2 to 5 times in one direction in the direction perpendicular to the extending direction. Next, the film is thermally fixed under the temperature range of 280 to 3 80 ° C, and is heat-fixed, and although it is accompanied by the shrinkage of the film after stretching, while maintaining the stretched state of the contraction, the shrinkage is gradually restricted to 2 Cool down to ~20% of the state. Φ At the same time of biaxial stretching, preheating the thermoplastic to be stretched at 250 to 300 ° C. The polyimide film of the polyimide film is simultaneously extended in two directions perpendicular to each other in a state of being uniformly heated to a predetermined temperature λ. 2 to 5 times; then, the film is thermally fixed under extension in a temperature range of 280 to 380 ° C, and is heat-fixed, although accompanied by the shrinkage of the film after stretching, while maintaining the stretched state of the contraction Slowly cool down while limiting the shrinkage to 2 to 20%. By subjecting the thermoplastic polyimide film to biaxial stretching as described above, the thermal expansion of either the MD direction and the TD direction can be made 5 to 30 ppm/K, preferably 10 to 25 ppm/K. In addition, MD Fang-20-200806467 (17) The biaxially stretched thermoplastic polyimide film with a difference in thermal expansion ratio to the TD direction of 20 ppm/K can effectively prevent the metal foil layer Warpage that occurs when pressed. Moreover, by subjecting the thermoplastic polyimide film to biaxially stretching, the glass transition temperature T g can be increased by 10 to 80 ° C higher than the glass transition temperature Tg of the unstretched thermoplastic-polyimine resin film. Solder heat resistance. In addition, even if the thermal history below the melting point is accepted, a low low expansion ratio can be maintained, and excellent dimensional stability and necessary adhesive strength can be maintained, and the laminate is not laminated to copper by selecting appropriate lamination conditions. The resin flows out when the foil is used. The biaxially stretched thermoplastic polyimide film obtained by the above method is in a state of not being completely melted, and the glass transition temperature Tg of the thermoplastic polyimide resin before stretching is preferably Tg or more, preferably a biaxially stretched thermoplastic polymer. The imide resin film has a glass transition temperature Tg or more, a temperature lower than the melting point, preferably 300 to 3 80 °c, and can be easily laminated on a copper foil, a conductor loop layer, a polyimide film, or the like. It is heated on the pressurizing material. The higher the pressure of the layer #, the lower the lamination temperature can be, but generally because the layer-pressure pressure is too high, the resulting laminate will tend to change in size, so the range of 5 to 50 kgf/cm2 is relatively appropriate. The thermoplastic polyimide film before the biaxial stretching may be a thermoplastic polyimide film obtained by melt-molding a thermoplastic polyimide film, or by a casting method as in the prior art. Any of the obtained thermoplastic polyimide film films, in particular, a thermoplastic polyimide film obtained by melt-molding a thermoplastic polyimide resin, can have the following advantages. -21 - (18) (18)200806467 (1) A polyimide film can be formed by a T-die extrusion method excellent in mass productivity. (2) Since the ruthenium imidization reaction has been completed at the production stage of the resin granules, it is not necessary to carry out the oxime imidization reaction when the film is formed, and it is possible to use a thermoplastic having high purity without impurities such as a monomer residue or a residual solvent. Polyimine resin film. (3) Since the thermoplastic polyimide film has a high purity, it is excellent in migration resistance. The material of the thermoplastic polyimide film of the present invention can be used, for example, a thermoplastic polyimide resin or a polyether phthalimide resin, which will be described later, and these may be used alone or in combination of two or more. In addition, in this specification, the term "thermoplastic polyimide resin" is understood to mean a thermoplastic polyimide resin and a polyether phthalimide resin, and the term "thermoplastic polyimide film" means Refers to a polyimide film having a thermoplastic (heat reversibility of hardening and softening). Further, the logarithmic viscosity of the thermoplastic polyimide resin used in the present invention is not particularly limited, but it is generally desirably in the range of about 0.35 to 1.30 dl/g, preferably 0.40 to 1.00 dl/g, and the logarithmic viscosity is low. In the above range, the molecular weight of the resin is small and deteriorates in characteristics. On the other hand, when the content is higher than the above range, the molecular weight of the resin is too large, and the fluidity at the time of extrusion molding is difficult to be obtained, which is difficult. The logarithmic viscosity of the thermoplastic polyimide resin is obtained by dissolving a sample in a mixed solvent of 9 parts by volume of phenol and 1 part by volume of p-chlorophenol (concentration: 0.5 g/dl), and the viscosity of the mixed solvent is ubbelohde The viscometer was measured at 30 ° C and was calculated by the following formula (1). -22- (19) (19)200806467 [Number 1] Logarithmic viscosity = ... Formula (1) [where t is the falling time of the solution (sec), and to is the falling time of the mixed solvent ( Sec ) , C is the solution concentration (g/dl). The thermoplastic polyimine resin may be a repeating structural unit represented by the following general formula (1).

上述一般式(1 )中,X爲直接鍵結、-S02_、-CO_、-C ( CH3 ) 2-、-C(CF3) 2-或- S-,R1、R2、R3、R4 各自獨 立地爲氫原子、碳數1〜6的烷基、烷氧基、鹵化烷基、鹵 化烷氧基、或鹵原子,Y爲選自下述式(2)所成群之 基。In the above general formula (1), X is a direct bond, -S02_, -CO_, -C(CH3)2-, -C(CF3)2- or -S-, and R1, R2, R3, and R4 are each independently It is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group, a halogenated alkyl group, a halogenated alkoxy group or a halogen atom, and Y is a group selected from the group consisting of the following formula (2).

具有上述一般式(1 )所表示的重複結構單元之熱塑 性聚醯亞胺樹脂,係可將以下述一般式(3 )的醚二胺與 -23- 200806467 (20) 下述一般式(4)的四羧酸二酐作爲原料,在有機溶劑的 存在下或非存在下使其反應而所得到的聚醯胺酸,以化學 的或熱的方式進行醯亞胺化後製造。The thermoplastic polyimine resin having the repeating structural unit represented by the above general formula (1) may be an ether diamine of the following general formula (3) and -23-200806467 (20) the following general formula (4) The polycarboxylic acid obtained by reacting the tetracarboxylic dianhydride as a raw material in the presence or absence of an organic solvent is produced by chemically or thermally hydrazide.

上述一般式(3)中,R1、R2、R3、R4各自表示與上 述式(1)中之記號相同意義。In the above general formula (3), R1, R2, R3 and R4 each have the same meaning as the symbol in the above formula (1).

(4) 上述一般式(4)中,Y表示與上述式(1)中之記號 相同意義。 上述一般式(1)及一般式(3)中,R1、R2、R3、R4 的具體例子,可列舉氫原子、甲基、乙基等之烷基、甲氧 基、乙氧基等之院氧基、氟甲基、三氟甲基等之鹵化院 基、氟甲氧基等之鹵化烷氧基、氯原子、氟原子等之鹵原 子,較佳爲氫原子。此外,式中的X爲直接鍵結、4〇2-、-CO-、-C(CH3)2-、-C(CF3)2-或-S-,較佳爲直接鍵結、 -S〇2-、-CO-、-C(CH3)2_ 〇 -24- (21) (21)200806467 此外,在上述一般式(1)及一般式(4)中,Y爲上 述式(2)表示者,較佳係使用均苯四甲酸二酐作爲酸二 酐者。 更佳的熱塑性聚醯亞胺樹脂,係具有下述式(5 )所 表示的重複結構單元之熱塑性聚醯亞胺樹脂。(4) In the above general formula (4), Y represents the same meaning as the symbol in the above formula (1). In the above general formula (1) and general formula (3), specific examples of R1, R2, R3 and R4 include a hydrogen atom, an alkyl group such as a methyl group or an ethyl group, a methoxy group or an ethoxy group. A halogen atom such as a halogenated alkoxy group such as an oxy group, a fluoromethyl group or a trifluoromethyl group, or a halogenated alkoxy group such as a fluoromethoxy group, a chlorine atom or a fluorine atom is preferably a hydrogen atom. Further, X in the formula is a direct bond, 4〇2-, -CO-, -C(CH3)2-, -C(CF3)2- or -S-, preferably a direct bond, -S〇 2-, -CO-, -C(CH3)2_ 〇-24- (21) (21)200806467 Further, in the above general formula (1) and general formula (4), Y is represented by the above formula (2) Preferably, pyromellitic dianhydride is used as the acid dianhydride. More preferably, the thermoplastic polyimide resin is a thermoplastic polyimide resin having a repeating structural unit represented by the following formula (5).

再者’具有上述式(5)所表示的重複結構單元之熱 塑性聚醯亞胺樹脂,可購自三井化學股份有限公司製的 「AURUM」(註冊商標)。 此外,具有下述式(6)及式(7)的重複結構單元之 熱塑性聚醯亞胺樹脂,亦列舉較佳的具體例子。Further, the thermoplastic polyimine resin having the repeating structural unit represented by the above formula (5) can be purchased from "AURUM" (registered trademark) manufactured by Mitsui Chemicals, Inc. Further, preferred examples of the thermoplastic polyimide resin having the repeating structural unit of the following formulas (6) and (7) are also exemplified.

-25- (7) (22) (7) (22)200806467-25- (7) (22) (7) (22)200806467

上述式(6)及式(7)中,m及n表示各結構單元的 莫耳比(並非一定表示嵌段聚合物),m/n爲4〜9,更佳 爲5〜9,再更佳爲6〜9的範圍的數字。 具有上述式(6 )及(7 )的重複的結構單元之熱塑性 聚醯亞胺樹脂,可將以各自對應的醚二胺與四羧酸二酐作 爲原料,在有機溶劑的、存在下或非存在下使其反應而所得 到的聚醯胺酸,以化學的或熱的方式進行醯亞胺化後製 造。此等的具體的製造方法,可利用習知的聚醯亞胺的製 造方法的條件。 本發明中’較佳爲可使用具有下述式(8 )所表示的 重複結構單元之熱塑性聚醯亞胺樹脂,取代具有> ± __般 式(1)所表示的重複的結構單元之熟塑性聚醯亞胺^ 脂,或與該樹脂組合。此外,使用具有上、1f _ 工逦式(6 )所表 示的結構單元之單體與具有下述式(8) + ^ 尸/T表不的結構單 元之單體的共聚物亦佳,此時,上述式(61 、Ό ) m表7κ的重 複結構單元與下述式(8)所表示的重複結構單胃 比,以1 : 0〜0.75 : 0.25的比例較適當。 -26- 200806467In the above formulae (6) and (7), m and n represent the molar ratio of each structural unit (not necessarily a block polymer), and m/n is 4 to 9, more preferably 5 to 9, more Good for numbers ranging from 6 to 9. The thermoplastic polyimine resin having the repeating structural unit of the above formulas (6) and (7) may be prepared by using the corresponding ether diamine and tetracarboxylic dianhydride as raw materials in the presence or absence of an organic solvent. The polylysine obtained by reacting it in the presence of ruthenium is chemically or thermally produced. The specific manufacturing method of these can utilize the conditions of the manufacturing method of the conventional polyimine. In the present invention, it is preferred to use a thermoplastic polyimide resin having a repeating structural unit represented by the following formula (8) instead of the repeating structural unit represented by the formula (1) of > ± _ A mature plastic polyimine resin, or combined with the resin. Further, it is also preferable to use a copolymer having a monomer having a structural unit represented by the above formula (1) and a monomer having a structural unit of the following formula (8) + ^ cadmium/T. In the above formula (61, Ό) m, the repeating structural unit of 7κ and the repeating structure represented by the following formula (8) have a ratio of 1:0 to 0.75: 0.25. -26- 200806467

οο

具有下述式(8 )所表示的重複結構單元之熱塑性聚 醯亞胺樹脂,可將以各自對應的醚二胺與四羧酸二酐作爲 原料,在有機溶劑的存在下或非存在下使其反應而所得到 的聚醯胺酸’以化學的或熱的方式進行醯亞胺化後製造。 此等的具體的製造方法,可利用習知的聚醯亞胺的製造方 法的條件。 聚醚醯亞胺樹脂,可列舉具有上述一般式(9 )所表 示的重複結構單元者。 Ο II /°\ / •M D-0 - Z-O - D: XC II 0 i? Ν—Ε— (9) 上述一般式(9)中,D爲3價的芳香族基,Ε與 皆爲2價的殘基。 具有上述一般式(9)的重複結構單元之聚醚醯亞 樹脂,可使以各自對應的醚二胺與四羧酸二酐作爲原料 在有機溶劑的存在下或非存在下使其反應而所得到的聚 -27- 200806467 (24) 胺酸’以化學的或熱的方式進行醯亞胺化後製造 具體的製造方法,可利用習知的聚醯亞胺的製造 件。 聚醚醯亞胺樹脂的具體例子,例如可列舉具 . 一般式(1〇)〜(12)所表示的重複結構單元所 . 少1種的重複結構單元之聚醚醯亞胺樹脂。 。此等的 方法的條 有由下述 選出的至The thermoplastic polyimine resin having a repeating structural unit represented by the following formula (8) can be obtained by using the corresponding ether diamine and tetracarboxylic dianhydride as raw materials in the presence or absence of an organic solvent. The polylysine obtained in the reaction is produced by chemically or thermally hydrazide. The specific manufacturing method of these can utilize the conditions of the manufacturing method of the conventional polyimine. The polyether quinone imine resin may, for example, be a repeating structural unit represented by the above general formula (9). Ο II /°\ / •M D-0 - ZO - D: XC II 0 i? Ν—Ε— (9) In the above general formula (9), D is a trivalent aromatic group, and both are 2 The residue of the price. The polyether fluorene resin having the repeating structural unit of the above general formula (9) can be reacted by using the corresponding ether diamine and tetracarboxylic dianhydride as raw materials in the presence or absence of an organic solvent. The obtained poly-27-200806467 (24) Amine acid' is chemically or thermally subjected to hydrazine imidization to produce a specific production method, and a known polyimine product can be used. Specific examples of the polyether quinone imide resin include, for example, a polyether quinone imine resin having one or more repeating structural units represented by the repeating structural unit represented by the general formula (1〇) to (12). . The strips of these methods are selected from the following

(10) (11) (12) 述式所表 上述一般式(10)〜(12)中,記號E爲 示之基等的2價的芳香族殘基。 -28- (25) 200806467 普-令,普,(10) (11) (12) In the above general formulas (10) to (12), the symbol E is a divalent aromatic residue such as a group. -28- (25) 200806467 Pu-Ling, Pu,

特別佳的被使用的聚醚醯亞胺樹脂,係具有下述式 (1 3 )所表示的重複結構單元之聚醚醯亞胺樹脂。A particularly preferred polyether oximine resin to be used is a polyether fluorene imine resin having a repeating structural unit represented by the following formula (13).

具有下述式(13)所表示的重複結構單元之聚醚醯亞 胺樹脂,可購自GE公司製的ULTEM (註冊商標)。 成爲如上述的熱塑性聚醯亞胺樹脂的原料之二胺或四 羧酸二酐,可使用1種或組合複數種使用,在不阻礙本發 明的目的的範圍,可含有其他的共聚成份,此外,由不同 的單體所得到的複數的聚醯亞胺樹脂,在不阻礙本發明的 目的的範圍內,可任意摻合聚合物後使用。 本發明所使用的熱塑性聚醯亞胺樹脂,可添加其他的 樹脂,例如在不阻礙本發明的目的的範圍內,可含有聚醯 胺樹脂,較佳爲全芳香族聚醯胺樹脂、聚醯胺醯亞胺樹 脂、聚芳酯樹脂、聚醚腈樹脂、聚苯硫醚樹脂、聚醚颯樹 -29 - 200806467 (26) 脂、聚醚醚酮樹脂、液晶聚合物等。特別是由結晶性熱塑 性聚醯亞胺樹脂,與以層合加工溫度成熔融狀態之其他的 熱塑性樹脂,較佳爲熔點爲2 8 0〜3 5 0 °C的其他的熱塑性樹 脂之混合物而成時,可更提高層合時的黏著強度。 • 本發明的熱塑性聚醯亞胺樹脂薄膜中,在可達成本發 明的目的之範圍內,可使其再含有著色劑、離型劑、各種 安定劑、可塑劑、滑劑、各種無機塡充劑、油類等之添加 • 劑。 可藉由擠壓成形而薄膜化之熔融黏度,爲5X101至1χ 104[Pa · S],較佳爲 4xl02至 3xl03[Pa · S],熔融黏度低 於5 X 1 01時,從模頭吐出後的壓降(draw do wn )顯著而 無法生產薄膜,另一方面,熔融黏度超過1x1 〇4 [Pa· S] 時,熔融時施加於擠壓螺旋的負荷大,或從模頭吐出變困 難,製造薄膜變不可能。 接著,說明關於熱塑性聚醯亞胺樹脂薄膜的製造步 _ 驟。 w 本發明的聚醯亞胺樹脂薄膜,可藉由以熔融擠壓成形 法進行成形而製造’例如聚醯亞胺樹脂的顆粒或粉末 '及The polyether oxime resin having a repeating structural unit represented by the following formula (13) is commercially available from ULTEM (registered trademark) manufactured by GE. The diamine or the tetracarboxylic dianhydride which is a raw material of the thermoplastic polyimine resin as described above may be used singly or in combination of plural kinds, and other copolymerizable components may be contained in a range not inhibiting the object of the present invention. The plural polyimine resin obtained from different monomers can be used by blending the polymer arbitrarily within the range not inhibiting the object of the present invention. The thermoplastic polyimide resin used in the present invention may be added with other resins, and may contain a polyamidamide resin, preferably a wholly aromatic polyamide resin, or a polyfluorene, for example, within a range not inhibiting the object of the present invention. Amine amide resin, polyarylate resin, polyether nitrile resin, polyphenylene sulfide resin, polyether eucalyptus -29 - 200806467 (26) Lipid, polyether ether ketone resin, liquid crystal polymer, and the like. In particular, the crystalline thermoplastic polyimide resin is preferably a mixture of another thermoplastic resin having a melting point of 280 to 350 ° C, and another thermoplastic resin which is molten at a lamination processing temperature. In time, the adhesion strength at the time of lamination can be further improved. • The thermoplastic polyimide film of the present invention can further contain a coloring agent, a releasing agent, various stabilizers, a plasticizer, a lubricant, and various inorganic fillers within the scope of the object of the invention. Additives such as agents and oils. The melt viscosity which can be thinned by extrusion molding is 5×101 to 1χ104 [Pa · S], preferably 4×10 2 to 3×10 3 [Pa · S], and when the melt viscosity is lower than 5×1 01, it is spouted from the die. The subsequent draw do wn is remarkable and the film cannot be produced. On the other hand, when the melt viscosity exceeds 1x1 〇 4 [Pa· S], the load applied to the extrusion screw during melting is large, or it is difficult to spit out from the die. It is impossible to manufacture a film. Next, the manufacturing steps of the thermoplastic polyimide film will be described. w The polyimide film of the present invention can be produced by a melt extrusion molding method to produce, for example, particles or powder of a polyimide resin.

A 依所希望的其他的樹脂及添加劑’經由亨雪莉 '混合機或螺 帶式摻混機等乾式混合後’用二軸混煉擠壓機進行熔融* 混煉及擠壓’將被濟壓出來的股線於水中冷卻,切斷^ g 到混合物的穎粒,接著,將所得到的顆粒加熱乾燥後去除 吸附水分後’用單軸或二軸螺旋擠壓機使其加熱熔融’從 設置在擠壓機前端的T模頭以平膜狀的吐出’連接或壓著 -30- 200806467 (27) 於滾輪而冷卻•硬化後得到聚醯亞胺樹脂薄膜,此外,不 混煉下,直接擠壓顆粒或粉末之方法亦可。 熱塑性聚醯亞胺樹脂薄膜的厚度並沒有特別的限制, 一般爲l〇"m〜1 mm,較佳爲20// m〜400// m。 . 一般所使用的聚醯亞胺樹脂薄膜,係將含聚醯胺酸之 ^ 溶液,流延於滾輪或底膜上後藉由進行脫水縮合反應所得 到,故,聚合反應時的單體或溶劑殘留,伴隨著電特性或 φ 透明性的降低。 另一方面,關於熱塑性聚醯亞胺樹脂薄膜,在進行T 模頭擠壓成形前,需要進行一次藉由混煉擠壓之顆粒製造 步驟。聚合反應與脫水縮合反應的步驟後殘留於聚醯亞胺 樹脂之單體殘渣及溶劑,爲了在顆粒製造步驟時的熔融混 煉時去除,聚醯亞胺樹脂的材料本身可充分發揮原本具有 的電特性或機械的強度,同時可得到透明度高的熱塑性聚 醯亞胺樹脂薄膜。 # 將如上述所製作的熱塑性聚醯亞胺樹脂薄膜,如上述 - 再藉由二軸延伸,得到本發明的二軸延伸熱塑性聚醯亞胺 樹脂薄膜。 將如上述之用T模頭擠壓成形法所製作的熱塑性聚醯 亞胺樹脂薄膜,或二軸延伸熱塑性聚醯亞胺樹脂薄膜,與 銅箔或導體層、或通常的聚醯亞胺樹脂薄膜進行加壓黏著 時,藉由在薄膜表面進行改質處理而可更提高黏著強度。 表面改質的方法,可爲電暈放電處理、或電漿處理、臭氧 處理、準分子雷射處理、鹼處理等之一般的表面處理,從 -31 - 200806467 (28) 成本或處理效果面而言,以電暈放電處理、電漿處理爲 佳。 接著,參考圖面說明關於經由本發明的方法所得到的 撓性層合基板的幾個形態,但本發明並非限定於下述形 . 態,各種形態皆可能。 ^ 首先,圖2及圖3係表示撓性雙面貼銅層合板的2個 結構。 φ 圖2所表示的撓性雙面貼銅層合板,係至少單面經粗 面處理或密著性處理的銅箔2的處理側上,重疊上述熱塑 性聚醯亞胺樹脂薄膜(或二軸延伸熱塑性聚醯亞胺樹脂薄 膜)1,再於該熱塑性聚醯亞胺樹脂薄膜(或二軸延伸熱 塑性聚醯亞胺樹脂薄膜)1的相反面上,重疊至少單面經 粗面處理或密著性處理的銅箔2的處理側,藉由加熱加壓 而得到。或者,至少單面經粗面處理或密著性處理的銅箔 2的處理側上,重疊上述熱塑性聚醯亞胺樹脂薄膜(或二 • 軸延伸熱塑性聚醯亞胺樹脂薄膜)1,經加熱加壓的二層 ^ 構成亦可。 另一方面,圖3所表示的撓性雙面貼銅層合板,係在 無處理或雙面施以密著性處理的聚醯亞胺樹脂薄膜3的面 面上,重疊上述熱塑性聚醯亞胺樹脂薄膜(或二軸延伸熱 塑性聚醯亞胺樹脂薄膜)1,再於外側上使至少單面經粗 面處理或密著性處理的銅箔2的處理側朝內重疊,藉由加 熱加壓而得到。 接著,圖4係表示將熱塑性聚醯亞胺樹脂薄膜(或二 -32- 200806467 (29) 軸延伸熱塑性聚醯亞胺樹脂薄膜)作爲回路埋入的的黏著 膠層利用的形態。此多層撓性層合板,係在聚醯亞胺薄膜 3的雙面上形成導電回路層4,無處理或雙面施以密著性 處理的雙面撓性層合板彼此之間,挾入上述熱塑性聚醯亞 ^ 胺樹脂薄膜(或二軸延伸熱塑性聚醯亞胺樹脂薄膜)1, ^ 經加熱加壓而得到。 最後,圖5係表示將熱塑性聚醯亞胺樹脂薄膜(或二 φ 軸延伸熱塑性聚醯亞胺樹脂薄膜)作爲回路埋入的的層間 絕緣層利用的形態。此多層撓性層合板,係在聚醯亞胺薄 膜3的雙面上形成導電回路層4,無處理或雙面施以密著 性處理的雙面撓性層合板的外側上,各自重疊上述熱塑性 聚醯亞胺樹脂薄膜(或二軸延伸熱塑性聚醯亞胺樹脂薄 膜)1,再將至少單面經粗面處理或密著性處理的銅箔2 的處理側朝內重疊上去,經加熱加壓而得到。 此外,本發明的熱塑性聚醯亞胺樹脂薄膜或二軸延伸 # 熱塑性聚醯亞胺樹脂薄膜,亦可爲如以下的應用例。 . (1)作爲各種撓性基板或面狀發熱體的覆蓋膜 (coverlay film)利用。 (2) 可爲與銅、不鏽鋼、鋁、鎳等之金屬箔之層 合,較佳係可作爲與銅箔之層合材利用,此外,金屬箔的 表面上,藉由使用金屬膏或金屬凸塊而使絶緣層(熱塑性 聚醯亞胺樹脂薄膜或二軸延伸熱塑性聚醯亞胺樹脂薄)貫 通,層間連接亦可同時進行。 (3) 可一倂進行多層層合,可使用1步驟層合。 -33- (30) 200806467 (4)可逐次層合,例如藉由依序使用Tg不同的熱塑 性聚醯亞胺樹脂薄膜或二軸延伸熱塑性聚醯亞胺樹脂薄, 逐次的層合亦可。此外,藉由先使Tg高的熱塑性聚醯亞 胺樹脂薄膜或二軸延伸熱塑性聚醯亞胺樹脂薄進行層合 、 後,順序層合Tg低的熱塑性聚醯亞胺樹脂薄膜或二軸延 * 伸熱塑性聚醯亞胺樹脂薄,雖然有層合次數的限制,但可 逐次層合。 ’ 【實施方式】 以下列示實施例具體的說明關於本發明,但本發明並 非限定於此等的實施例,此外,本發明在不脫離其主旨的 範圍內,可基於熟悉該項技術者的知識,以各種加入改 良、變更、修正的形態實施。 熱塑性聚醯亞胺樹脂薄膜的製造例1 ® 使用以90 : 1 0的比例含有化學結構式爲上述(6 )與A Other resins and additives as desired 'drying and mixing with a two-axis mixing extruder after a dry mixing such as a Henry's mixer or a ribbon blender' will be used The pressed strands are cooled in water, and the grit of the mixture is cut off, and then the obtained pellets are dried by heating to remove the adsorbed moisture, and then heated and melted by a uniaxial or biaxial screw extruder. The T-die provided at the front end of the extruder is sputtered in a flat film shape. 'Connected or pressed -30- 200806467 (27) Cooled on the roller and hardened to obtain a polyimide film. In addition, without mixing, A method of directly extruding particles or powder is also possible. The thickness of the thermoplastic polyimide film is not particularly limited and is generally from 1 m to 1 mm, preferably from 20/m to 400 m/m. The polyimine resin film generally used is obtained by performing a dehydration condensation reaction on a roller or a base film after casting a solution containing poly-proline, so that the monomer during polymerization or The solvent remains, accompanied by a decrease in electrical properties or φ transparency. On the other hand, regarding the thermoplastic polyimide film, it is necessary to carry out a particle production step by kneading extrusion before performing the T die extrusion molding. After the step of the polymerization reaction and the dehydration condensation reaction, the monomer residue and the solvent remaining in the polyimide resin are removed, and the material of the polyimide resin can be sufficiently utilized in order to be removed during the melt-kneading at the particle production step. Electrical properties or mechanical strength, as well as a highly transparent thermoplastic polyimide film. # The thermoplastic polyimide film prepared as described above, as described above, was further biaxially stretched to obtain a biaxially stretched thermoplastic polyimide film of the present invention. A thermoplastic polyimide film prepared by a T-die extrusion method as described above, or a biaxially stretched thermoplastic polyimide film, and a copper foil or conductor layer, or a usual polyimide resin When the film is pressure-bonded, the adhesion strength can be further improved by modifying the surface of the film. The surface modification method may be a general surface treatment such as corona discharge treatment, or plasma treatment, ozone treatment, excimer laser treatment, alkali treatment, etc., from -31 to 200806467 (28) cost or treatment effect It is better to use corona discharge treatment and plasma treatment. Next, several aspects of the flexible laminated substrate obtained by the method of the present invention will be described with reference to the drawings, but the present invention is not limited to the following forms, and various forms are possible. ^ First, Fig. 2 and Fig. 3 show two structures of a flexible double-sided copper-clad laminate. φ The flexible double-sided copper-clad laminate shown in Fig. 2 is laminated on the treated side of the copper foil 2 which has been subjected to rough surface treatment or adhesion treatment on at least one side, and overlaps the above thermoplastic polyimide film (or two axes) Extending the thermoplastic polyimide film) 1, on the opposite side of the thermoplastic polyimide film (or biaxially stretched thermoplastic polyimide film) 1, overlapping at least one side of the rough surface or dense The treated side of the inventive copper foil 2 is obtained by heating and pressurizing. Alternatively, the thermoplastic polyimide film (or the biaxially stretched thermoplastic polyimide film) 1 is superposed on the treated side of the copper foil 2 which has been subjected to the rough surface treatment or the adhesion treatment at least one side, and is heated. The pressurized two layer ^ can also be constructed. On the other hand, the flexible double-sided copper-clad laminate shown in Fig. 3 is formed by laminating the above-mentioned thermoplastic polyimide film on the surface of the polyimide film 3 which has no treatment or double-sided adhesion treatment. An amine resin film (or a biaxially stretched thermoplastic polyimide film) 1 is further coated on the outer side with at least one side of the treated side of the roughened or adhesively treated copper foil 2, by heating Get it by pressure. Next, Fig. 4 shows a form in which a thermoplastic polyimide film (or a bis-32-200806467 (29) axially stretched thermoplastic polyimide film) is used as an adhesive layer embedded in a circuit. The multilayer flexible laminate is formed with a conductive circuit layer 4 on both sides of the polyimide film 3, and the double-sided flexible laminates which are treated without treatment or double-sided adhesive treatment are interposed therebetween. A thermoplastic polyimide film (or a biaxially stretched thermoplastic polyimide film) 1, ^ is obtained by heating and pressurizing. Finally, Fig. 5 shows a form in which a thermoplastic polyimide film (or a two-φ-axis extended thermoplastic polyimide film) is used as an interlayer insulating layer in which a circuit is buried. The multilayer flexible laminate is formed by forming a conductive circuit layer 4 on both sides of the polyimide film 3, and the outer sides of the double-sided flexible laminates which are not treated or double-coated with adhesion treatment are overlapped a thermoplastic polyimide film (or a biaxially stretched thermoplastic polyimide film) 1, and at least the treated side of the roughened or adhesively treated copper foil 2 is superposed on the inside, heated Obtained by pressurization. Further, the thermoplastic polyimide film of the present invention or the biaxially stretched # thermoplastic polyimide film may also be used as the following application examples. (1) It is used as a coverlay film of various flexible substrates or planar heat generating bodies. (2) It may be laminated with a metal foil of copper, stainless steel, aluminum, nickel, etc., preferably as a laminate with copper foil, and further, by using a metal paste or metal on the surface of the metal foil The bumps are used to penetrate the insulating layer (the thermoplastic polyimide film or the biaxially stretched thermoplastic polyimide resin), and the interlayer connection can be simultaneously performed. (3) Multi-layer lamination can be performed at one time, and lamination can be performed in one step. -33- (30) 200806467 (4) The layers may be laminated one by one, for example, by sequentially using Tg different thermoplastic polyimide film or biaxially stretched thermoplastic polyimide resin, and successive lamination may be employed. Further, by laminating a thin Tg-high thermoplastic polyimide film or a biaxially stretched thermoplastic polyimide resin, a TG low thermoplastic polyimide film or a biaxial extension is sequentially laminated. * The stretched thermoplastic polyimide resin is thin, although it has the limitation of the number of laminations, it can be laminated one by one. [Embodiment] The present invention is specifically described by the following examples, but the present invention is not limited to the embodiments, and the present invention can be based on those skilled in the art without departing from the scope of the invention. Knowledge is implemented in various forms of improvement, change, and revision. Production Example 1 of a Thermoplastic Polyimine Resin Film Using a Chemical Structural Formula at a Ratio of 90:10 to the above (6)

* ( 7 )之熱塑性聚醯亞胺(三井化學(股)製的 AURUM ‘ (註冊商標)PD500A ; Tg25 8 [t:]、熔點 3 80[它]、以 500 secT1的剪切速度所測量的熔融黏度700[Pa · S])、與化 學結構式爲上述式(6 )之熱塑性聚醯亞胺(三井化學 (股)製的 AURUM (註冊商標)PD450C ; Tg250[t:]、熔 點3 80 [t:]、以 SOOsecT1的剪切速度所測量的熔融黏度 5 〇〇 [Pa · S])之樹脂顆粒,再者,擠壓成形所使用的熱塑 性聚醯亞胺樹脂的熔融黏度[pa · S],依據JIS K-7199,用 -34- 200806467 (31) 島津製作所FLOW TESTER CFT-500所測量° 熱風式高溫槽內將上述樹脂顆粒以180°C乾燥10小時 後,使用螺旋徑50mm的單軸擠壓機與被設置在其前端的 T模頭進行薄膜的擠壓,薄膜擠壓溫度爲42 0 °C,將樹脂 . 材料從T模頭吐出後,用溫度調至220T:的冷卻滾輪進行 冷卻硬化,雙面進行電暈放電處理,得到厚度50 // m的熱 塑性聚醯亞胺樹脂薄膜(以下稱爲熱塑性PI薄膜a )。再 φ 者,對薄膜表面的電暈放電處理,使用巴工業(股)製電 暈處理裝置,以瓦密度120W/m2/min的條件進行。 熱塑性聚醯亞胺樹脂薄膜的製造例2 使用以9〇 : 1 0的比例含有化學結構式爲上述(6 )與 (7 )之熱塑性聚醯亞胺(三井化學(股)製的 AURUM (註冊商標)PD500A ; Tg25 8 [°C ]、熔點 380[°C ]、以 500 secT1的剪切速度所測量的熔融黏度700[Pa · S])、與化 φ 學結構式爲上述式(13)之熱塑性聚醚醯亞胺(General , Electric Company 製的 ULTEM1 000P )之樹脂顆粒,藉由 與上述熱塑性聚醯亞胺樹脂薄膜的製造例1相同的方法及 電暈放電處理,得到厚度50 // m的熱塑性聚醯亞胺樹脂薄 膜(以下稱爲熱塑性PI薄膜b )。 聚醯亞胺樹脂薄膜: 化學結構爲上述式(7)之聚醯亞胺,因爲以聚醯亞 胺樹脂的薄膜被一般販售(東麗杜邦(股)製 -35- (32) (32)200806467* (7) Thermoplastic polyimine (AURUM' (registered trademark) PD500A by Mitsui Chemicals Co., Ltd.; Tg25 8 [t:], melting point 3 80 [it], measured at a shear rate of 500 secT1 Melt viscosity 700 [Pa · S]), and thermoplastic polyimine of the above formula (6) (Aurum (registered trademark) PD450C manufactured by Mitsui Chemicals Co., Ltd.; Tg250 [t:], melting point 3 80 [t:], the resin particle of the melt viscosity of 5 〇〇 [Pa · S] measured by the shear rate of SOOsecT1, and the melt viscosity of the thermoplastic polyimide resin used for extrusion molding [pa · S], measured according to JIS K-7199, using -34- 200806467 (31) Shimadzu FLOW TESTER CFT-500. After drying the above resin pellets at 180 ° C for 10 hours in a hot air type high temperature bath, a spiral diameter of 50 mm is used. The uniaxial extruder is pressed against the T die provided at the front end thereof, and the film extrusion temperature is 42 0 ° C. After the resin material is discharged from the T die, the temperature is adjusted to 220 T: cooling. The roller is cooled and hardened, and the corona discharge treatment is performed on both sides to obtain a thermoplastic polythene having a thickness of 50 // m. A resin film (hereinafter, referred to as a thermoplastic film PI a). Further, in the case of φ, the corona discharge treatment on the surface of the film was carried out under the conditions of a tile density of 120 W/m 2 /min using a corona treatment apparatus manufactured by Ba Industrial Co., Ltd. Production Example 2 of a thermoplastic polyimide film: Aurethane (Mitsubishi Chemical Co., Ltd.) having a chemical structure of the above formula (6) and (7) was used in a ratio of 9 〇:10 (registered) Trademark) PD500A; Tg25 8 [°C], melting point 380 [°C], melt viscosity measured at a shear rate of 500 secT1 ([Pa · S]), and chemical formula (13) The resin pellet of the thermoplastic polyether phthalimide (ULTEM 1 000P, manufactured by General Electric Company) was obtained by the same method and corona discharge treatment as in the above-mentioned thermoplastic polyimide film of the thermoplastic polyimide film to obtain a thickness of 50 // A thermoplastic polyimide film of m (hereinafter referred to as thermoplastic PI film b). Polyimine resin film: The chemical structure is the polyimine of the above formula (7) because a film of a polyimide resin is generally sold (Tongli Dubang Co., Ltd. -35- (32) (32) )200806467

Kapton200H ),故使用此市售的聚醯亞胺樹脂薄膜。再 者,此聚醯亞胺樹脂爲不具有熱塑性(硬化與軟化間的熱 可逆性)之直鏈狀聚合物,不可能單獨擠壓成形。所以’ 此市售的聚醯亞胺樹脂薄膜(以下亦稱爲PI薄膜)’係 藉由將含有先驅物的聚醯胺酸之溶液,流延於滾輪上或平 面上後進行脫水縮合反應而得到者。 實施例1 50/zm的熱塑性PI薄膜a的雙面上重疊厚度18//m 的銅箔,從其雙面用不鏽鋼板(以稱爲SUS )挾住’而 且,SUS板的雙面上,重疊聚苯並噁唑製的作爲氈狀緩衝 材之(股)FUJICO製的FUJIRON STM,裝置於北川精機 (股)製的真空高溫加壓機,然後,進行減壓至l.OkPa, 以初期壓力l〇kgf/cm2的壓力以昇溫5°C/min.昇溫至300 °C後,提高壓力至二次成形壓25kgf/cm2,在此狀態下保 持1〇分鐘,然後,慢慢的進行冷卻至室溫,得到圖2所 示的撓性雙面貼銅層合基板。使用所得到的貼銅層合板, 評估如表1所示的諸特性,結果一倂列示於表1。 實施例2 除了將實施例1中的加壓溫度變更爲3 3 0°C以外,其 餘與實施例1同樣的進行’得到目的之撓性雙面貼銅層合 板,關於使用所得到的貼銅層合板所評估的諸特性的結果 列示於表1。 -36- (33) (33)200806467 實施例3 除了將實施例1中的加壓溫度變更爲3 60 °C以外,其 餘與實施例1同樣的進行,得到目的之撓性雙面貼銅層合 板,關於使用所得到的貼銅層合板所評估的諸特性的結果 列示於表1。 實施例4 除了將實施例1中的加壓溫度變更爲3 80°C以外,其 餘與實施例1同樣的進行,得到目的之撓性雙面貼銅層合 板,關於使用所得到的貼銅層合板所評估的諸特性的結果 列示於表1。 實施例5 除了將實施例1中的加壓溫度變更爲3 3 0 t與3 8 0 °C,將緩衝材變更爲P-ARAMID (芳香族聚醯胺、(股) FU1ICO製、商品名「FUJIRON 9000」)以外,其餘與實 施例1同樣的進行,得到目的之撓性雙面貼銅層合板,關 於使用所得到的貼銅層合板所評估的諸特性的結果列示於 表1 〇 -37- (34) 200806467 [表l] 加壓條件及特性 實施例 1 2 3 4 5 加壓溫度(。〇 300 330 360 380 330 380 緩衝材 PBO PBO PBO PBO P-ARAMID 緩衝材的沾黏 〇 〇 〇 〇 Δ 剝離強度 (N/cm) 熱塑性PI薄 膜a-銅箔 14 13 14 14 13 14 耐焊熱性 良 良 良 良 良 良 樹脂滲出 ◎ 〇 〇 〇 〇 〇 PBO :聚苯並噁唑(商品名「FUJIRONSTM」、(股)FUJICO製) P-ARAMID :芳香族聚醯胺(商品名「FUJIRON 9000」、(股)FUJICO製) 由上述表1所示的結果可清楚知道,使用本發明的熱 塑性PI薄膜時,即使在加壓溫度3 3 0〜3 8 0°c的任何溫度, 皆無緩衝材的沾黏或樹脂滲出,在高的剝離強度下與銅箔 的黏著性亦優異,耐焊熱性亦優良。再者,因爲使用芳香 族聚醯胺製緩衝材時,僅少數有沾黏的狀況,使用聚苯並 噁唑製的氈狀緩衝材作爲緩衝材較佳。Kapton 200H), so the commercially available polyimide film was used. Further, the polyimide resin is a linear polymer which does not have thermoplasticity (thermal reversibility between hardening and softening) and cannot be separately extruded. Therefore, the commercially available polyimide film (hereinafter also referred to as PI film) is subjected to a dehydration condensation reaction by casting a solution of a precursor containing polylysine onto a roller or a flat surface. Get the winner. Example 1 A copper foil having a thickness of 18/m was superposed on both sides of a 50/zm thermoplastic PI film a, and was sandwiched from a stainless steel plate (referred to as SUS) on both sides thereof, and on both sides of the SUS plate, FUJIRON STM, manufactured by FUJICO, which is a felt-like cushioning material made of polybenzoxazole, was placed in a vacuum high-temperature press machine manufactured by Kitagawa Seiki Co., Ltd., and then depressurized to 1.0 kPa. The pressure of the pressure l〇kgf/cm2 is raised by 5 ° C / min. After the temperature is raised to 300 ° C, the pressure is increased to 25 kgf / cm 2 of the secondary forming pressure, and maintained for 1 minute in this state, and then slowly cooled. At room temperature, the flexible double-sided copper-clad laminate substrate shown in Fig. 2 was obtained. Using the obtained copper-clad laminate, the characteristics shown in Table 1 were evaluated, and the results are shown in Table 1. Example 2 A flexible double-sided copper-clad laminate which was obtained in the same manner as in Example 1 except that the pressurization temperature in Example 1 was changed to 340 ° C, and the obtained copper paste was used. The results of the properties evaluated by the laminates are listed in Table 1. -36- (33) (33)200806467 Example 3 The same procedure as in Example 1 was carried out except that the pressurization temperature in Example 1 was changed to 3 60 ° C to obtain a desired flexible double-sided copper layer. The results of the plywood and the properties evaluated using the obtained copper clad laminate are shown in Table 1. Example 4 The same procedure as in Example 1 was carried out except that the pressurization temperature in Example 1 was changed to 380 ° C, and a desired flexible double-sided copper-clad laminate was obtained, and the obtained copper-clad layer was used. The results of the properties evaluated by the plywood are shown in Table 1. Example 5 The buffer material was changed to P-ARAMID (aromatic polyamide, (manufactured by FU1ICO, trade name), except that the pressurization temperature in Example 1 was changed to 3 3 0 t and 380 °C. The same results as in Example 1 were carried out except for FUJIRON 9000"), and the desired flexible double-sided copper-clad laminates were obtained. The results of evaluation of the properties evaluated using the obtained copper-clad laminates are shown in Table 1 - 37- (34) 200806467 [Table l] Pressurization conditions and characteristics Example 1 2 3 4 5 Pressurization temperature (.〇300 330 360 380 330 380 Buffer material PBO PBO PBO PBO P-ARAMID Buffer material 沾〇〇Δ Peel strength (N/cm) Thermoplastic PI film a-copper foil 14 13 14 14 13 14 Solder heat resistance good and good good resin oozing ◎ BOPBO: polybenzoxazole (trade name) "FUJIRONSTM", manufactured by FUJICO) P-ARAMID: Aromatic polyamide (trade name "FUJIRON 9000", manufactured by FUJICO) It is clear from the results shown in Table 1 that the thermoplastic of the present invention is used. In the PI film, even at any temperature of the pressurization temperature of 3 3 0 to 3 0 0 °c, there is no Adhesive or resin bleed out of the punched material, excellent adhesion to copper foil at high peel strength, and excellent soldering heat resistance. Moreover, only a few sticks are used because of the use of a buffer material made of aromatic polyamide. In the case of using a felt-like cushioning material made of polybenzoxazole as a cushioning material, it is preferred.

此外,除了將實施例1中加壓溫度變更爲250°C以 外,其餘與實施例1同樣的進行的結果,關於緩衝材的沾 黏或樹脂滲出皆毫無問題,但剝離強度相當低,又耐焊熱 性亦不佳,故希望加壓溫度3 00°C以上。另一方面,將加 壓溫度變更爲400°C的結果,關於其他諸特性皆與實施例 1相同毫無問題,但可觀察到樹脂的滲出,所以,使用熱 塑性PI薄膜時,希望加壓溫度低於400 °C。而且,上述實 施例 3中,除了將作爲緩衝材的 SUS板的雙面的 FUJIRON STM,變更爲 m-ARAMID 公司製的 FUJIR0N -38- (35) 200806467 6 000緩衝材以外,其餘與實施例3同樣進行的結果,關於 其他諸特性皆與實施例3相同毫無問題,但可觀察到緩衝 材的沾黏。 關於上述表1所表示的諸特性,如下述進行評估(後 • 述表2〜表5亦相同)。 (1 )緩衝材的沾黏 • 加熱加壓時所使用的緩衝材,是否沾黏於SUS板或加 壓機本體,在加壓結束後,以目視判斷。 〇:無沾黏 △:僅少數沾黏 X :沾黏 (2 )剝離強度 將所得到的撓性雙面貼銅層合板的剝離強度 _ ( N / c m ),依據 JIS C 6 8 4 1 測量。 (3 )耐焊熱性 將所得到的撓性雙面貼銅層合板,浮於260°C的焊浴 中1 〇秒使銅箔側與焊浴接觸,冷卻至室溫後,目視觀察 是否有膨潤或剝離,判斷優劣。 (4 )樹脂滲出 加壓所定的尺寸的撓性雙面貼銅層合板後,用目視判 -39- (36) 200806467 斷從端部的聚醯亞胺樹脂的滲出量。 ◎:無滲出 〇:僅少數滲出 x :大量的滲出 比較例1 非以擠壓成形而是流延方式所製作的市售 樹脂(東麗杜邦(股)製kapton Η ),熱塑性 實施例1的撓性電路板製作(加壓)條件則未 性,無法進行與銅箔的黏著。 此外,在4 0 0 °C以上的溫度中亦同樣無法擊 比較例2 以擠壓成形所製作的聚萘二甲酸乙二醇酯 施例1的撓性電路板製作(加壓)條件,雖有 性,但無法進行與銅箔的黏著。 實施例6 5 0 /X m的熱塑性PI薄膜(東麗杜邦(股 20 0H)的雙面上各自重疊厚度15/zm的熱塑 a、厚度18/zm的銅箔,從其雙面用SUS板 SUS板的雙面上重疊作爲緩衝材之FUJIRON 於北川精機(股)製的真空高溫加壓機,然後 至l.OkPa,以初期壓力i〇kgf/cm2的壓力以昇 的聚醯亞胺 不存在,以 表現出流動 Ϊ著。 薄膜,以實 少許的流動 )製 kapton 性PI薄膜 挾住,而且 STM,裝置 ,進行減壓 溫 5 〇C / m i η · -40- 200806467 (37) 昇溫至300°C後,提高壓力至二次成 狀態下保持10分鐘,然後,慢慢的 到圖3所示的撓性雙面貼銅層合板。 合板,評估如表2所示的諸特性,結 實施例7 除了將實施例6中的加壓溫度 餘與實施例6同樣的進行,得到目 板,關於使用所得到的貼銅層合板 列示於表2。 實施例8 除了將實施例6中的加壓溫度 餘與實施例6同樣的進行,得到目 板,關於使用所得到的貼銅層合板 列示於表2。 形壓25kgf/cm2,在此 丨進行冷卻至室溫,得 使用所得到的貼銅層 果一倂列示於表2。 更爲3 3 0 °C以外,其 之撓性雙面貼銅層合 評估的諸特性的結果 更爲3 60°C以外,其 之撓性雙面貼銅層合 評估的諸特性的結果 -41 - (38) 200806467 [表2] 加壓條件及特性 實施例 6 7 8 加壓溫度(。〇 300 330 360 緩衝材 PBO PBO PBO 緩衝材的相 5黏 〇 〇 〇 剝離強度 (N/cm) PI薄膜-熱塑 性PI薄膜a 無法測量* (材料破壞) 無法測量* (材料破壞) 無法測量* (材料破壞) 13 熱塑性Π薄 膜a-銅箔 14 14 耐焊熱性 良 良 良 樹脂滲出 ◎ 〇 〇 備考 PBO:聚苯並噁唑(商品名「FUJIRONSTM」、(股)FUJICO製) *材料破壞:因爲黏著強度太強,於剝離試驗中無法剝離界面而浩成破M 〇 由上述表2所示的結果可清楚知道,使用本發明的熱 塑性PI薄膜時,即使在加壓溫度330〜3 60°C的任何溫度, 皆無緩衝材的沾黏或樹脂滲出,在高的剝離強度下與銅I fg 的黏著性亦優異,耐焊熱性亦優良。 馨此外,除了將實施例6中加壓溫度變更爲25 〇t:以 - 外,其餘與實施例6同樣的進行的結果,關於緩衝材的沾 , 黏或樹脂的滲出皆毫無問題,但剝離強度相當低,又耐焊 熱性亦不佳,故希望加壓溫度3 00 °C以上。另一方面,將 加壓溫度變更爲400°C的結果,關於其他諸特性皆與實施 例6相同毫無問題,但可觀察到樹脂的滲出,所以,使用 熱塑性PI薄膜時,希望加壓溫度低於400°C。 實施例9 -42 - (39) (39)200806467 50//m的熱塑性pi薄膜a的雙面上各自重疊具有導 體回路之2層撓性聚醯亞胺雙面板,從其雙面用SUS板挾 住’而且SUS板的雙面上重疊作爲緩衝材之FUJIRON STM ’裝置於北川精機(股)製的真空高溫加壓機,然 後’進行減壓至l.OkPa,以初期壓力10kgf/cm2的壓力以 昇溫5°C/min·昇溫至3 60°C後,提高壓力至二次成形壓25 kgf/cm2,在此狀態下保持1 0分鐘,然後,慢慢的進行冷 卻至室溫,得到圖4所示的導體回路層以熱塑性PI薄膜 埋入的多層撓性雙面貼銅層合板。使用所得到的貼銅層合 板,評估如表3所示的諸特性,結果一倂列示於表3。 實施例1 〇 除了將實施例9中的加壓溫度變更爲3 3 0 °C以外,其 餘與實施例9同樣的進行,得到目的之多層撓性雙面貼銅 層合板,關於使用所得到的貼銅層合板所評估的諸特性的 結果列示於表3。 實施例η 除了將實施例9中的加壓溫度變更爲360 °C以外,其 餘與實施例9同樣的進行’得到目的之多層撓性雙面貼銅 層合板,關於使用所得到的貼銅層合板所評估的諸特性的 結果列示於表3。 -43- (40) 200806467 [表3] 力[]壓條件及特性 實施例 9 10 11 加壓溫度(。〇 300 330 360 緩衝材 PBO PBO PBO 緩衝材的沾黏 〇 〇 〇 剝離強度 (N/cm) PI薄膜熱塑 性PI薄膜a 無法測量* (材料破壞) 無法測量* (材料破壞) 無法測量* (材料破壞) 熱塑性PI薄 膜a-導體回路層 14 14 13 回路埋入性 良 良 良 耐焊熱性 良 良 良 樹脂滲出 ◎ 〇 〇 備考 PBO:聚苯並噁唑(商品名「FUJIRONSTM」、(股)FUJICO製) *材料破壞:因爲黏著強度太強,於剝離試驗中無法剝離界面而造成破壞。 由上述表3所示的結果可清楚知道,使用本發明的熱 塑性PI薄膜時,即使在加壓溫度3 3 0〜360°C的任何溫度, 皆無緩衝材的沾黏或樹脂滲出,此外回路埋入性、耐焊熱 性皆優良,在高的剝離強度下與導體回路層的黏著性亦優 異。 此外,除了將實施例9中加壓溫度變更爲250 °C以 外,其餘與實施例9同樣的進行的結果,關於緩衝材的沾 黏或樹脂的滲出皆毫無問題,但剝離強度相當低,又回路 埋入性、耐焊熱性亦不佳,故希望加壓溫度3 00 °C以上。 另一方面,將加壓溫度變更爲400°C的結果,關於其他諸 特性皆與實施例9相同毫無問題,但可觀察到樹脂的滲 出,所以,使用熱塑性PI薄膜時,希望加壓溫度低於400 -44 - (41) 200806467 〇C。 關於上述表3所表示的回路埋入性’如下述進行評估 (關於後述的表4亦相同)。 ★ ( 5 )回路埋入性 、 所製作的多層撓性雙面貼銅層合板進行截面,用光學 顯微鏡確認回路間的樹脂埋入性,判斷其優劣。 實施例1 2 雙面上形成導體回路的2層撓性聚醯亞胺雙面板的雙 面上,各自重疊50/zm的熱塑性PI薄膜a、18/zm的銅 箔,從其雙面用SUS板挾住,而且SUS板的雙面上重疊 作爲緩衝材之FUJIRON STM,裝置於北川精機(股)製 的真空高溫加壓機,然後,進行減壓至10 kgf/cm2,以初 期壓力1·〇 MPa的壓力以昇溫5°C /min·昇溫至360°C後, # 提高壓力至二次成形壓25kgf/cm2,在此狀態下保持1〇分 、 鐘,然後,慢慢的進行冷卻至室溫,得到圖5所示的導體 • 回路層以熱塑性PI薄膜a埋入的多層撓性雙面貼銅層合 板。使用所得到的貼銅層合板,評估如表4所示的諸特 性,結果一倂列示於表4。 實施例1 3 除了將實施例12中的加壓溫度變更爲33(rc以外,其 餘與實施例12同樣的進行,得到目的之多層撓性雙面貼 -45- (42) 200806467 銅層合板,關於使用所得到的貼銅層合板所評估的諸特性 的結果列示於表4。 實施例1 4 除了將實施例1 2中的加壓溫度變更爲3 60 °C以外,其 餘與實施例12同樣的進行,得到目的之撓性雙面貼銅層 合板,關於使用所得到的貼銅層合板所評估的諸特性的結 果列示於表4。 [表4] 加壓條件及特性 實施例 12 13 14 加壓溫度(。〇 300 330 360 緩衝材 PBO PBO PBO 緩衝材的沾黏 〇 〇 〇 剝離強度 (N/cm) PI薄膜-熱塑 性PI薄膜a 無法測量* (材料破壞) 無法測量* (材料破壞) 無法測量* (材料破壞) 熱塑性PI薄 膜a-導體回路層 14 13 13 回路埋入性 良 良 良 耐焊熱性 良 良 良 樹脂滲出 ◎ 〇 〇 備考 PBO :聚苯並噁唑(商品名「FUJIRONSTM」、(股)FUJICO製) *材料破壞:因爲黏著強度太強,於剝離試驗中無法剝離界面而造成破壞。 由上述表4所示的結果可清楚知道,使用本發明的熱 塑性PI薄膜時,即使在加壓溫度3 3 0〜3 60°C的任何溫度, 皆無緩衝材的沾黏或樹脂滲出,此外回路埋入性、耐焊熱 -46 - 200806467 (43) 性皆優良,在高的剝離強度下與導體回路層的黏著性亦優 異。 此外,除了將實施例12中加壓溫度變更爲250 °C以 外,其餘與實施例1 2同樣的進行的結果,關於緩衝材的 . 沾黏或樹脂的滲出皆毫無問題,但剝離強度相當低,又回 I 路埋入性、耐焊熱性亦不佳,故希望加壓溫度3 00 °C以 上。另一方面,將加壓溫度變更爲400 °C的結果,關於其 φ 他諸特性皆與實施例1 2相同毫無問題,但可觀察到樹脂 的滲出,所以,使用熱塑性PI薄膜時,希望加壓溫度低 於 40 0〇c 。 實施例15 除了將實施例1中的熱塑性聚醯亞胺樹脂薄膜a變更 爲熱塑性PI薄膜b以外,其餘與實施例1同樣的進行, 得到目的之撓性雙面貼銅層合板,使用所得到的貼銅層合 板,評估關於表5所示的諸特性,其結果列示於表5。 實施例16 除了將實施例1 5中的加壓溫度變更爲3 3 0 °C以外,其 餘與實施例1 5同樣的進行,得到目的之撓性雙面貼銅層 合板,關於使用所得到的貼銅層合板所評估的諸特性的結 果列示於表5。 實施例17 47- 200806467 (44) 除了將實施例15中的加壓溫度變更爲360 °C以外’其 餘與實施例1 5同樣的進行,得到目的之撓性雙面貼銅層 合板,關於使用所得到的貼銅層合板所評估的諸特性的結 果列示於表5。 實施例1 8 除了將實施例1 5中的加壓溫度變更爲3 8 0 °C以外,其 餘與實施例1 5同樣的進行’得到目的之撓性雙面貼銅層 合板,關於使用所得到的貼銅層合板所評估的諸特性的結 果列示於表5。 實施例1 9 除了將實施例15中的加壓溫度變更爲330 °C與380 °C,將緩衝材變更爲P-ARAMID (芳香族聚醯胺、(股) FUJICO製、商品名「FUJIR0N 9000」)以外,其餘與實 施例1 5同樣的進行’得到目的之撓性雙面貼銅層合板, 關於使用所得到的貼銅層合板所評估的諸特性的結果列示 於表5 〇 -48- (45) 200806467 [表5] 加壓條件及特性 實施例 15 16 17 18 19 加壓溫度(。〇 300 330 360 380 330 380 緩衝材 PBO PBO PBO PBO P-ARAMID 緩衝材的沾黏 〇 〇 〇 〇 〇 Δ 剝離強度 (N/cm) 熱塑性PI 薄膜b-銅箔 13 13 14 14 13 14 耐焊熱性 良 良 良 良 良 良 樹脂滲出 ◎ 〇 〇 〇 〇 〇 PBO:聚苯並噁唑(商品名「FUJIRONSTM」、(股)FUJICO製) P-ARAMID :芳香族聚醯胺(商品名「FUJIRON9000」、(股)FUJICO製) 由上述表5所示的結果可清楚知道,使用本發明的熱 塑性PI薄膜b時,即使在加壓溫度3 3 0〜3 80°C的任何溫 度,皆無緩衝材的沾黏或樹脂滲出,在高的剝離強度下與 銅箔的黏著性亦優異,耐焊熱性亦優良。 延伸薄膜製作例1 將化學結構式爲上述(6 )之熱塑性聚醯亞胺(三井 化學(股)製的 AURUM (註冊商標)PD450C ; Tg25 0[°C ]、熔點3 8 8 [t ]、以SOOsecT1的剪切速度所測量 的熔融黏度500[Pa · S])之經顆粒化的樹脂材料乾燥後去 除水份後,用單軸螺旋擠壓機使其加熱熔融,從設置在擠 壓機前端的T模頭以平膜狀的吐出,與冷卻滾輪接觸而使 其冷卻硬化,得到熱塑性聚醯亞胺樹脂(以下簡稱爲 TPI)薄膜(A)。Further, in the same manner as in Example 1, except that the pressurization temperature in Example 1 was changed to 250 ° C, there was no problem with the adhesion of the cushioning material or the resin bleeding, but the peeling strength was rather low, and The soldering heat resistance is also not good, so it is desirable to pressurize the temperature above 300 °C. On the other hand, as a result of changing the pressurization temperature to 400 ° C, the other characteristics were the same as those of Example 1, but the bleeding of the resin was observed. Therefore, when a thermoplastic PI film was used, the pressurization temperature was desired. Below 400 °C. In addition, in the third embodiment, the FUJIRON STM on both sides of the SUS plate as the cushioning material is changed to the FUJIR0N-38-(35) 200806467 6 000 cushioning material manufactured by m-ARAMID Co., Ltd., and the third embodiment is the same as the third embodiment. As a result of the same, the other characteristics were the same as those of Example 3, but the adhesion of the cushioning material was observed. Regarding the characteristics shown in the above Table 1, the evaluation was performed as follows (the latter is also the same as Table 2 to Table 5). (1) Adhesion of cushioning material • Whether or not the cushioning material used for heating and pressurizing is adhered to the SUS plate or the body of the presser, and after visual inspection, it is visually judged. 〇: no stickiness △: only a small amount of sticking X: sticking (2) peeling strength The peeling strength of the obtained flexible double-sided copper clad laminate _ (N / cm), measured according to JIS C 6 8 4 1 . (3) Soldering heat resistance The obtained flexible double-sided copper-clad laminate was floated in a solder bath at 260 ° C for 1 〇 second to bring the copper foil side into contact with the solder bath. After cooling to room temperature, visually observe whether there is any Swelling or peeling, judging the pros and cons. (4) Resin exudation After the flexible double-sided copper-clad laminate having a predetermined size was pressed, the amount of exudation of the polyimine resin from the end portion was visually judged to be -39-(36) 200806467. ◎: no bleed out: only a small amount of bleed x: a large amount of bleed out Comparative Example 1 A commercially available resin (kapton 制 manufactured by Toray Dupont Co., Ltd.) which was produced by extrusion molding but not by the extrusion method, and thermoplastic example 1 The flexible circuit board production (pressurization) condition is not normal, and adhesion to the copper foil cannot be performed. Further, in the temperature of 400 ° C or higher, the flexible circuit board production (pressurization) condition of Comparative Example 2, polyethylene naphthalate produced in the extrusion molding example 1 was also impossible. Sexual, but unable to adhere to the copper foil. Example 6 A thermoplastic film of 5 0 /X m (a thermoplastic foil of a thickness of 15/zm and a copper foil having a thickness of 18/zm on both sides of Toray DuPont (20H), SUS from both sides thereof On the both sides of the SUS plate, FUJIRON is used as a cushioning material in a vacuum high-temperature press machine manufactured by Kitagawa Seiki Co., Ltd., and then at a pressure of 1.0 kPa, at a pressure of 初期kgf/cm2 at an initial pressure of yttrium. Does not exist to show the flow of squatting. The film, with a little flow) made of kapton PI film, and STM, device, decompression temperature 5 〇C / mi η · -40- 200806467 (37) After the temperature reached 300 ° C, the pressure was raised to the secondary state for 10 minutes, and then slowly extended to the flexible double-sided copper-clad laminate shown in FIG. The slabs were evaluated for the characteristics shown in Table 2. In the same manner as in Example 6, except that the pressurization temperature in Example 6 was carried out in the same manner as in Example 6, the results were obtained, and the obtained copper clad laminates were used for listing. In Table 2. (Example 8) The same conditions as in Example 6 were carried out except that the pressurization temperature in Example 6 was carried out, and a target was obtained, and the obtained copper-clad laminate was shown in Table 2. The pressure was 25 kgf/cm2, and after cooling to room temperature, the obtained copper layer was used as shown in Table 2. More than 3 3 ° C, the results of the evaluation of the flexible double-sided copper lamination evaluation are more than 3 60 ° C, the results of the characteristics of the flexible double-sided copper lamination evaluation - 41 - (38) 200806467 [Table 2] Pressurization conditions and characteristics Example 6 7 8 Pressurization temperature (.〇300 330 360 Buffer material PBO PBO PBO Buffer material phase 5 peel strength (N/cm) PI film-thermoplastic PI film a cannot be measured* (material damage) Unmeasured* (material damage) Unmeasured* (material damage) 13 Thermoplastic enamel film a-copper foil 14 14 Solder heat resistance good resin oozing ◎ 〇〇 PBO: Polybenzoxazole (trade name "FUJIRONSTM", (stock) FUJICO) * Material damage: Because the adhesion strength is too strong, the interface cannot be peeled off during the peeling test and the result is shown in Table 2 above. It is clear that when the thermoplastic PI film of the present invention is used, even at any temperature of the pressurizing temperature of 330 to 3 60 ° C, there is no sticking of the cushioning material or resin bleeding, and adhesion to the copper I fg at a high peeling strength. Excellent in properties and excellent in soldering resistance. In the same manner as in Example 6, except that the pressurization temperature in Example 6 was changed to 25 〇t: -, the viscous of the cushioning material, the stickiness of the adhesive or the resin, and the peeling of the resin were not problematic, but peeling off. The strength is relatively low, and the solder heat resistance is also poor, so it is desirable to pressurize the temperature above 300 ° C. On the other hand, the result of changing the pressurization temperature to 400 ° C is the same as the other examples. No problem, but bleed out of the resin was observed, so when using a thermoplastic PI film, it is desirable to pressurize the temperature below 400 ° C. Example 9 - 42 - (39) (39) 200806467 50 / / m thermoplastic pi film A two-layer flexible polyimine double-panel having a conductor loop is overlapped on both sides of a, and the FUJIRON STM device is used as a cushioning material on both sides of the SUS plate. The vacuum high-temperature press machine made by the fine machine (stock) is then subjected to a pressure reduction to 1.0 kPa, and the temperature is raised to 5 ° C/min at an initial pressure of 10 kgf/cm 2 · the temperature is raised to 3 60 ° C, and the pressure is increased to two. The secondary forming pressure is 25 kgf/cm2, and it is kept for 10 minutes in this state, then slowly enters After cooling to room temperature, a multilayer flexible double-sided copper-clad laminate in which the conductor loop layer shown in Fig. 4 was embedded in a thermoplastic PI film was obtained. Using the obtained copper-clad laminate, the characteristics as shown in Table 3 were evaluated. The results are shown in Table 3. Example 1 The same procedure as in Example 9 was carried out except that the pressurization temperature in Example 9 was changed to 3 30 ° C, and the desired multilayer flexible double-sided sticker was obtained. The results of the copper laminates regarding the properties evaluated using the obtained copper-clad laminates are shown in Table 3. Example η In the same manner as in Example 9, except that the pressurization temperature in Example 9 was changed to 360 ° C, the obtained multilayer flexible double-sided copper-clad laminate was used, and the obtained copper-clad layer was used. The results of the properties evaluated by the plywood are shown in Table 3. -43- (40) 200806467 [Table 3] Force [] Pressure Conditions and Characteristics Example 9 10 11 Pressurization Temperature (.〇300 330 360 Buffer Material PBO PBO PBO Buffer Material Peel Peel Strength (N/ Cm) PI film thermoplastic PI film a cannot be measured* (material damage) cannot be measured* (material damage) cannot be measured* (material damage) thermoplastic PI film a-conductor loop layer 14 14 13 circuit buried good good solder heat Good good resin oozing ◎ 〇〇 Preparation PBO: Polybenzoxazole (trade name "FUJIRONSTM", (stock) FUJICO) * Material damage: Because the adhesion strength is too strong, the interface cannot be peeled off during the peel test and cause damage. From the results shown in the above Table 3, it is clear that when the thermoplastic PI film of the present invention is used, even at any temperature of the pressurization temperature of 3 3 0 to 360 ° C, there is no sticking of the cushioning material or resin bleed out, and the circuit is buried. It is excellent in both solderability and solder heat resistance, and is excellent in adhesion to a conductor circuit layer at a high peeling strength. The same as Example 9 except that the pressurization temperature in Example 9 was changed to 250 °C. As a result, there is no problem with the sticking of the cushioning material or the exudation of the resin, but the peeling strength is relatively low, and the circuit embedding property and the soldering heat resistance are also poor, so it is desirable to pressurize the temperature above 300 °C. On the other hand, as a result of changing the pressurization temperature to 400 ° C, the other characteristics were the same as those of Example 9, but the bleeding of the resin was observed, so when the thermoplastic PI film was used, it was desirable to have a low pressurization temperature. 400-44 - (41) 200806467 〇C. The circuit embedding property shown in Table 3 above is evaluated as follows (the same applies to Table 4 to be described later). ★ (5) Circuit embedding property, produced The multilayer flexible double-sided copper-clad laminate was subjected to cross section, and the resin embedding property between the circuits was confirmed by an optical microscope to judge its advantages and disadvantages. Example 1 2 Two-layer flexible polyimine double-panel forming a conductor loop on both sides On both sides, a thermoplastic PI film a and 18/zm copper foils each having a thickness of 50/zm are stacked on the double-sided SUS plate, and the FUJIRON STM is used as a cushioning material on both sides of the SUS plate. Vacuum high temperature pressurization made of fine machine Then, the pressure is reduced to 10 kgf/cm2, and the temperature is raised to 5 ° C /min at an initial pressure of 1 〇 MPa. After the temperature is raised to 360 ° C, the pressure is increased to 25 kgf/cm 2 of the secondary forming pressure. The state was maintained for 1 minute, and then slowly cooled to room temperature to obtain a multilayer flexible double-sided copper-clad laminate in which the conductor/circuit layer shown in Fig. 5 was embedded in a thermoplastic PI film a. Using the obtained copper-clad laminate, the characteristics as shown in Table 4 were evaluated, and the results are shown in Table 4. Example 1 3 The same procedure as in Example 12 was carried out except that the pressurization temperature in Example 12 was changed to 33 (rc), and the desired multilayer flexible double-sided adhesive-45-(42) 200806467 copper laminate was obtained. The results of the properties evaluated using the obtained copper-clad laminates are shown in Table 4. Example 1 4 Except that the pressurization temperature in Example 12 was changed to 3 60 ° C, the same as in Example 12 The same procedure was carried out to obtain a flexible double-sided copper-clad laminate, and the results of evaluation of the properties evaluated using the obtained copper-clad laminate were shown in Table 4. [Table 4] Pressurization conditions and characteristics Example 12 13 14 Pressurization temperature (.〇300 330 360 cushioning material PBO PBO PBO cushioning material peeling strength (N/cm) PI film-thermoplastic PI film a cannot be measured* (material damage) cannot be measured* (material Destruction) Unable to measure* (Material damage) Thermoplastic PI film a-conductor circuit layer 14 13 13 Good embedding of good resistance to soldering heat Good resin exudation ◎ Preparation for test PBO: Polybenzoxazole (trade name " FUJIRONSTM", (share) FUJIC O system) * Material damage: Since the adhesion strength is too strong, the interface cannot be peeled off in the peeling test to cause damage. From the results shown in Table 4 above, it is clear that the thermoplastic PI film of the present invention is used even at the pressurization temperature. 3 3 0~3 Any temperature at 60 °C, no sticking of the buffer material or resin bleed, in addition, the circuit embedding, solder heat resistance -46 - 200806467 (43) are excellent, at high peel strength and conductor The adhesion of the circuit layer was also excellent. The results of the same procedure as in Example 12 except that the pressurization temperature in Example 12 was changed to 250 ° C, the adhesion of the cushioning material or the bleeding of the resin were all There is no problem, but the peeling strength is quite low, and the I-buried property and the soldering heat resistance are not good. Therefore, it is desirable to pressurize the temperature above 300 ° C. On the other hand, the pressurization temperature is changed to 400 ° C. As a result, the properties of φ were the same as those of Example 12, but the bleeding of the resin was observed, so when a thermoplastic PI film was used, it was desirable that the pressurization temperature was lower than 40 ° C. Example 15 The thermoplastic in Example 1 The flexible polyimide film b was changed to the thermoplastic PI film b, and the same procedure as in Example 1 was carried out to obtain a desired flexible double-sided copper-clad laminate, and the obtained copper-clad laminate was used for evaluation. The results are shown in Table 5. Example 16 The same procedure as in Example 15 was carried out except that the pressurization temperature in Example 15 was changed to 3 30 ° C, and the intended purpose was obtained. The results of the properties of the flexible double-sided copper-clad laminates evaluated using the obtained copper-clad laminates are shown in Table 5. Example 17 47-200806467 (44) The same procedure as in Example 15 was carried out except that the pressurization temperature in Example 15 was changed to 360 ° C, and the desired flexible double-sided copper-clad laminate was obtained. The results of the properties evaluated by the obtained copper-clad laminates are shown in Table 5. Example 1 8 A flexible double-sided copper-clad laminate which was obtained in the same manner as in Example 15 except that the pressurization temperature in Example 15 was changed to 380 ° C, was obtained by using The results of the properties evaluated for the copper-clad laminates are shown in Table 5. Example 1 9 In addition to changing the pressurization temperature in Example 15 to 330 ° C and 380 ° C, the buffer material was changed to P-ARAMID (Aromatic Polyamide, manufactured by FUJICO, trade name "FUJIR0N 9000". The results of the characteristics of the flexible double-sided copper-clad laminates obtained in the same manner as in Example 15 except for the evaluation of the obtained copper-clad laminates are shown in Table 5 〇-48. - (45) 200806467 [Table 5] Pressurization conditions and characteristics Example 15 16 17 18 19 Pressurization temperature (.〇300 330 360 380 330 380 Buffer material PBO PBO PBO PBO P-ARAMID Buffer material 沾〇〇Δ Peel strength (N/cm) Thermoplastic PI film b-copper foil 13 13 14 14 13 14 Solder heat resistance good and good good resin oozing ◎ BOPBO: polybenzoxazole (trade name) "FUJIRONSTM", manufactured by FUJICO) P-ARAMID: Aromatic polyamide (trade name "FUJIRON 9000", manufactured by FUJICO) It is clear from the results shown in Table 5 that the thermoplastic PI of the present invention is used. When film b is used, even at any temperature of the pressurization temperature of 3 3 0 to 3 80 ° C, Adhesion without buffer material or resin bleed, excellent adhesion to copper foil at high peel strength, and excellent solder heat resistance. Example 1 of extended film production The thermoplastic structure of the above (6) Amine (registered trademark) PD450C manufactured by Mitsui Chemicals Co., Ltd.; Tg25 0 [°C ], melting point 3 8 8 [t ], melt viscosity measured at a shear rate of SOOsecT1 500 [Pa · S]) After the granulated resin material is dried, the water is removed, and then heated and melted by a uniaxial screw extruder, and discharged from a T-die provided at the front end of the extruder in a flat film form to be in contact with the cooling roller. The film was cooled and hardened to obtain a film (A) of a thermoplastic polyimide film (hereinafter abbreviated as TPI).

將所得到的熱塑性聚醯亞胺樹脂薄膜(A )以260 °C -49- (46) (46)200806467 加熱,在互相成垂直的2方向上進行3倍延伸操作,將所 得到的延伸薄膜以3 00 °C在伸展狀態下進行熱固定操作, 得到目的之二軸延伸熱塑性聚醯亞胺樹脂薄膜(A-3 ), 此外,除了 2倍延伸以外進行同樣的操作而製作二軸延伸 熱塑性聚醯亞胺樹脂薄膜(A-2 )。再者,(A-3 )的「-3」是爲了容易判斷其爲3倍延伸所加入的標記,而(A-2 )的「-2」爲容易判斷其爲2倍延伸所加入的標記(以 下亦相同)。 延伸薄膜製作例2 除了使用以9 : 1的比例含有化學結構式爲上述(6 ) 與(7 )之熱塑性聚醯亞胺(三井化學(股)製的AURUM (註冊商標)PD500A ; Tg25 8 [°C ]、熔點 3 8 0 [ °C ]、以 SOOsecT1的剪切速度所測量的熔融黏度700[Pa· S])之經 顆粒化的樹脂材料以外,其餘與薄膜製作例1所示的薄膜 製造步驟相同的操作,得到熱塑性聚醯亞胺樹脂薄膜 (B) 〇 將所得到的熱塑性聚醯亞胺樹脂薄膜(B )以260 1 加熱,在互相成垂直的2方向上進行3倍延伸操作,將所 得到的延伸薄膜以300°C在伸展狀態下進行熱固定操作, 得到目的之二軸延伸熱塑性聚醯亞胺樹脂薄膜(B-3 )。 延伸薄膜製作例3 除了使化學結構式爲上述式(6 )之熱塑性聚醯亞胺 (三井化學(股)製的AURUM (註冊商標)PD450C)與 -50- 200806467 (47) 化學結構式爲上述式(9)之聚醚醚酮樹脂(Victrex-MC 公司製、商品名「45 0P」)之80 : 20的比例的摻合物所 成之經顆粒化的樹脂材料以外’其餘與薄膜製作例1所示 的薄膜製造步驟相同的操作’得到熱塑性聚醯亞胺樹脂薄 , 膜(C)。 將所得到的熱塑性聚醯亞胺樹脂薄膜(C )以260 °C 加熱,在互相成垂直的2方向上進行3倍延伸操作,將所 φ 得到的延伸薄膜以300°C在伸展狀態下進行熱固定操作, 得到目的之二軸延伸熱塑性聚醯亞胺樹脂薄膜(C-3 )。 延伸薄膜製作例4 對依照上述薄膜製作例1所製作的二軸延伸熱塑性聚 醯亞胺樹脂薄膜(A-3 )的雙面進行電暈放電處理,得到 目的之二軸延伸熱塑性聚醯亞胺樹脂薄膜(D-3 ),再 者,對薄膜表面之電暈放電處理,使用巴工業(股)製電 # 暈處理裝置,以每1分鐘的瓦密度120W/m2的條件進行。 延伸薄膜製作例5 身 使用化學結構式爲上述(6 )之熱塑性聚醯亞胺(三 井化學(股)製的AURUM (註冊商標)PD450C)之經顆 粒化的樹脂材料,進行與薄膜製作例1所示的薄膜製造步 驟相同的操作,得到聚醯亞胺樹脂薄膜(A )。 將所得到的熱塑性聚醯亞胺樹脂薄膜(A)以280°C 加熱’在互相成垂直的2方向上進行3倍延伸操作,將所 -51 - 200806467 (48) 得到的延伸薄膜以3 1 0 °C在伸展狀態下進行熱固定操作, 得到目的之二軸延伸熱塑性聚醯亞胺樹脂薄膜(E-3 )。 延伸薄膜製作例6 ^ 使用化學結構式爲上述(6)之熱塑性聚醯亞胺(三 w 井化學(股)製的AURUM (註冊商標)PD450C )之經顆 粒化的樹脂材料,進行與薄膜製作例1所示的薄膜製造步 φ 驟相同的操作,得到熱塑性聚醯亞胺樹脂薄膜(A )。 將所得到的熱塑性聚醯亞胺樹脂薄膜(A )以26〇 t 加熱,僅在1方向上進行3倍延伸操作,將所得到的延伸 薄膜以3 00 °C在伸展狀態下進行熱固定操作,得到目的之 一軸延伸熱塑性聚醯亞胺樹脂薄膜(F-3 )。 將上述延伸薄膜製作例1〜6所得到的熱塑性聚醯亞胺 樹脂延伸薄膜的熱膨膜率(2 2〇-2〇〇及延伸前後的玻璃轉移 溫度(Tg )歸納於表6。此外,爲了參考用,亦一倂列示 φ 未延伸的熱塑性聚醯亞胺樹脂薄膜(A )的數據,再者, , 關於熱膨脹率’使用由薄膜的二次元的形狀的點所成的線 . 膨脹率(CTE ),用以下方法測量,此外,玻璃轉移溫度 (Tg ),藉由熱機械分析(TMA )用以下測量法決定。 <線膨脹率(CTE)〉 使用島津製作所(股)的熱機械測量裝置TMA-60, 將試驗片2x23mm’在5gf的拉伸荷重下,以昇溫速度5°c /min,測量20〜200°C爲止的熱膨脹率。 -52- 200806467 (49) <藉由TMA測量法之Tg> 使用島津製作所(股)的熱機械測量裝置TMA-60, 依據JIS C 6481: 1996的「5·17·1 TMA法」所記載的方 法,將試驗片2x23mm,在5gf的拉伸荷重下,以昇溫速 度5 °C /min的條件,測量玻璃轉移溫度Tg的測量。The obtained thermoplastic polyimide film (A) is heated at 260 ° C -49-(46) (46)200806467, and the stretching film is obtained by performing a 3-fold stretching operation in two directions perpendicular to each other. The heat-fixing operation was carried out at 300 ° C in an extended state to obtain a biaxially stretched thermoplastic polyimide film (A-3 ) for the purpose, and the same operation was carried out except for stretching twice to prepare a biaxially stretched thermoplastic. Polyimine resin film (A-2). Further, "-3" of (A-3) is a mark added for easy determination of the 3-fold extension, and "-2" of (A-2) is a mark added for easy judgment of a 2-fold extension. (The same is true below). Stretch Film Production Example 2 AURUM (registered trademark) PD500A manufactured by Mitsui Chemicals Co., Ltd.; Tg25 8 [Tylon Chemicals Co., Ltd.] was used in a ratio of 1:1 in a chemical composition of the above formula (6) and (7). °C], a melting point of 38 ° [ ° C ], a granulated resin material having a melt viscosity of 700 [Pa·S] measured at a shear rate of SOOsec T1, and the film shown in Film Production Example 1. The same operation is carried out to obtain a thermoplastic polyimide film (B), and the obtained thermoplastic polyimide film (B) is heated at 260 1 to perform a 3-fold stretching operation in two directions perpendicular to each other. The obtained stretched film was heat-fixed at 300 ° C in an expanded state to obtain a desired biaxially stretched thermoplastic polyimide film (B-3 ). Extension film production example 3 except that the thermoplastic polyimine of the above formula (6) (Aurum (registered trademark) PD450C manufactured by Mitsui Chemicals Co., Ltd.) and -50-200806467 (47) have the chemical structural formula described above. The polyether ether ketone resin of the formula (9) (manufactured by Victrex-MC Co., Ltd., trade name "45 0P") has a ratio of 80:20 to a granulated resin material. The same operation as the film production step shown in Fig. ' yields a thin thermoplastic polyimide film, film (C). The obtained thermoplastic polyimide film (C) was heated at 260 ° C, and stretched three times in two directions perpendicular to each other, and the stretched film obtained by φ was stretched at 300 ° C. The heat-fixing operation gives the intended biaxially stretched thermoplastic polyimide film (C-3). Extended Film Production Example 4 Corona discharge treatment was performed on both sides of a biaxially stretched thermoplastic polyimide film (A-3) prepared in accordance with the above Film Production Example 1, to obtain a biaxially stretched thermoplastic polyimide. Further, the resin film (D-3) was subjected to a corona discharge treatment on the surface of the film, and was carried out under the conditions of a tile density of 120 W/m2 per minute using a battery manufacturing apparatus. In the case of the film production example 5, a granulated resin material having a chemical structure of the above-mentioned (6) thermoplastic polyimine (AURUM (registered trademark) PD450C manufactured by Mitsui Chemicals Co., Ltd.) was used. The film forming step shown is the same operation to obtain a polyimide film (A). The obtained thermoplastic polyimide film (A) was heated at 280 ° C to perform a 3-fold stretching operation in two directions perpendicular to each other, and the stretched film obtained in -51 - 200806467 (48) was 3 1 The heat-fixing operation was carried out at 0 ° C in an extended state to obtain a biaxially stretched thermoplastic polyimide film (E-3 ) for the purpose. Extended Film Production Example 6 ^ Using a granulated resin material having a chemical structure of the above-mentioned (6) thermoplastic polyimine (AURUM (registered trademark) PD450C manufactured by Sanwa Chemical Co., Ltd.), and film production The film production step of the film shown in Example 1 was carried out in the same manner to obtain a thermoplastic polyimide film (A). The obtained thermoplastic polyimide film (A) was heated at 26 Torr, and the stretching film was subjected to a heat stretching operation at 300 ° C in an extended state by performing a 3-fold stretching operation in only one direction. A shaft-extending thermoplastic polyimide film (F-3) is obtained for one of the purposes. The thermal expansion ratio (2 2 〇 -2 〇〇 and the glass transition temperature (Tg) before and after the stretching of the thermoplastic polyimide film extending film obtained in the above-mentioned stretched film production examples 1 to 6 are summarized in Table 6. Further, For reference, the data of the Φ unstretched thermoplastic polyimide film (A) is also listed, and the coefficient of thermal expansion 'uses the line formed by the point of the shape of the secondary element of the film. The rate (CTE) was measured by the following method. In addition, the glass transition temperature (Tg) was determined by the following measurement method by thermomechanical analysis (TMA). <Linear expansion ratio (CTE)> Using the heat of Shimadzu Corporation The mechanical measuring device TMA-60 measures the thermal expansion rate of 20 to 200 ° C at a heating rate of 5 ° C / min under a tensile load of 5 gf. -52- 200806467 (49) Tg of TMA measurement method Using the thermomechanical measuring device TMA-60 of Shimadzu Corporation, the test piece 2x23mm, at 5gf, according to the method described in "5·17·1 TMA method" of JIS C 6481: 1996 Under the tensile load, the temperature is measured at a temperature of 5 ° C / min. Glass transition temperature Tg measured.

[表6] 特性 熱塑侣 三聚醯亞胺樹脂延1 _膜 A-3*1 A-2*1 B-3*1 C-3*1 D-3*1 E-3*1 F-3*2 A*3 CTE (ppm) MD方向 15 40 21 29 15 45 28 55 TD方向 18 40 23 29 18 45 60 55 依延伸前的 TMA 之 Tg(〇C) 250 250 258 250 250 250 250 250 依延伸後的 TMA 之 Tg(°C) 320 320 305 320 320 320 305 — 依延伸後的 TMA之Tg上昇 (°C) 70 70 47 70 70 70 55 — 備考 *1 :二軸延伸*2 ·•—軸延伸*3 :未延伸 實施例20 將延伸薄膜製作例1所得到的1 2.5 // m的二軸熱塑性 聚醯亞胺樹脂薄膜(A-3)的單面上重疊厚度18/zm的銅 (以下亦簡稱爲Cu )箔,從其雙面隔著作爲離型用薄膜 之厚度100// m的聚四氟乙烯樹脂(以下稱爲PTFE )薄膜 用SUS板挾住,而且SUS板的雙面上重疊聚苯並噁唑製 之作爲氈狀緩衝材之(股)FUJICO製的FUJIRON STM, -53 - 200806467 (50) 裝置於北川精機(股)製的真空高溫加壓機,然後,進行 減壓至l.OkPa,以初期壓力lOkgf/cm2的壓力以昇溫5 °C /min.昇溫至 3 60 °C後,提高壓力至二次成形壓 25kgf /cm2,在此狀態下保持1 0分鐘,然後,慢慢的進行冷卻 至室溫,得到TPI/Cu的層構成的撓性單面貼銅層合板。 實施例21 除了將實施例20的二軸延伸熱塑性聚醯亞胺樹脂薄 膜(A-3)變更延伸薄膜製作例2所得到的二軸延伸熱塑 性聚醯亞胺樹脂薄膜(B-3 )以外,其餘與實施例20同樣 的進行,得到目的之TPI/Cu的層構成的撓性單面貼銅層 合板。 實施例22 除了將實施例20的二軸延伸熱塑性聚醯亞胺樹脂薄 膜(A-3 )變更爲延伸薄膜製作例3所得到的二軸延伸熱 塑性聚醯亞胺樹脂薄膜(C-3 )以外,其餘與實施例20同 樣的進行,得到目的之TPI/Cu的層構成的撓性單面貼銅 層合板。 將使用上述實施例20〜22所得到的撓性單面貼銅層合 板所評估的諸特性,歸納整理於表7 ° -54- (51) 200806467 [表7] 特性 「實施例 20 21 22 熱塑性聚醯亞胺樹脂延伸薄膜 A-3 B-3 C-3 加壓溫度(。〇 360 360 360 緩衝材 PBO PBO PBO 黏著強度 (N/mm) TPI薄膜-銅箔 〇 〇 〇 黏著後的翹曲 〇 〇 〇 耐回流焊接性 〇 〇 〇 備考 PBO··聚苯並噁唑(商品名「FUJIRONSTM」、(股)FUJICO製)[Table 6] Characteristic Thermoplastic Tripolyimine Resin Extension 1 _ Membrane A-3*1 A-2*1 B-3*1 C-3*1 D-3*1 E-3*1 F- 3*2 A*3 CTE (ppm) MD direction 15 40 21 29 15 45 28 55 TD direction 18 40 23 29 18 45 60 55 Tg (〇C) according to the TMA before extension 250 250 258 250 250 250 250 250 Tg of the extended TMA (°C) 320 320 305 320 320 320 305 — Tg rise according to the extended TMA (°C) 70 70 47 70 70 70 55 — Remarks *1 : Two-axis extension *2 ·•— Axis extension *3 : Unextended embodiment 20 The copper film of the thickness of 18/zm was superposed on one surface of the 1 2.5 // m biaxial thermoplastic polyimide film (A-3) obtained in the stretched film production example 1. (hereinafter also referred to as Cu) foil, a polytetrafluoroethylene resin (hereinafter referred to as PTFE) film having a thickness of 100//m from the double-sided film is sandwiched by a SUS plate, and the SUS plate is doubled. FUJIRON STM, manufactured by FUJICO, which is made of polybenzoxazole as a felt-like cushioning material, -53 - 200806467 (50) is installed in a vacuum high-temperature press machine manufactured by Kitagawa Seiki Co., Ltd., and then Depressurize to 1.0 kPa, with an initial pressure of 10 kgf / cm 2 of pressure After heating to 3 60 °C at a temperature of 5 °C /min, increase the pressure to a secondary forming pressure of 25 kgf / cm2, and keep it for 10 minutes in this state, then slowly cool to room temperature to obtain TPI/Cu. The layer consists of a flexible single-sided copper clad laminate. Example 21 except that the biaxially stretched thermoplastic polyimide film (A-3) of Example 20 was changed to the biaxially stretched thermoplastic polyimide film (B-3) obtained in the film production example 2, The same procedure as in Example 20 was carried out to obtain a flexible single-sided copper-clad laminate having a layer of the desired TPI/Cu layer. Example 22 except that the biaxially stretched thermoplastic polyimide film (A-3) of Example 20 was changed to the biaxially stretched thermoplastic polyimide film (C-3) obtained in Example 3 of the stretched film. The same procedure as in Example 20 was carried out to obtain a flexible single-sided copper-clad laminate having a layer of the desired TPI/Cu layer. The properties evaluated using the flexible single-sided copper-clad laminates obtained in the above Examples 20 to 22 are summarized in Table 7 ° -54- (51) 200806467 [Table 7] Characteristics "Example 20 21 22 Thermoplastic Polyimine resin stretch film A-3 B-3 C-3 Pressurization temperature (.〇360 360 360 cushioning material PBO PBO PBO Adhesive strength (N/mm) TPI film-copper foil warp after warping 〇〇〇Reflow-resistant soldering preparation PPBO··Polybenzoxazole (trade name “FUJIRONSTM”, (share) FUJICO)

上述表7所示的黏著強度、黏著後的翹曲及耐回流焊 接性的評估方法如下,關於後述的實施例亦相同。 (η黏著強度 所得到的撓性貼銅層合板的黏著強度,依據 JIS C 648 1測量剝離強度(N/min),用以下的判斷基準 評估。 〇·· >0.8N>mm △ : 0.4 〜0.8 N / m m x : < 0.4 N/mm (2)黏著後的翹曲 加壓結束後,以目視判斷所得到的撓性貼銅層合板是 否有翹曲,判斷基準如下。 〇:無曲 -55- 200806467 (52) △:有少許翹曲 X :有卷縮 (3 )耐回流焊接性 ^ 將所得到的撓性貼銅層合板,通過最高達到 °C的回流焊接爐後,藉由目視判斷是否有膨潤、 斷基準如下。 _ 〇:無膨潤、翹曲 △:有少許膨潤、翹曲 X :有膨潤、卷縮 實施例23 除了將實施例20的二軸延伸熱塑性聚醯亞 膜(A-3 )變更爲二軸延伸熱塑性聚醯亞胺樹脂 2 )以外,其餘與實施例20同樣的進行,得到目 Cu的層構成的撓性單面貼銅層合板。因爲樹脂 膨脹係數大,而與銅箔黏著後發生翹曲。 實施例24 除了將實施例20的加壓溫度變更爲28〇°C以夕 與實施例20同樣的進行,得到目的之TPI/Cu的Λ 撓性單面貼銅層合板。結果,因爲加壓溫度低於/ 的軟化開始溫度,故黏著強度低於其他的實施例的 度260 曲,判 樹脂薄 膜(Α-之 ΤΡΙ/ 膜的線 、,其餘 〖構成的 -3薄膜 情況。 -56- 200806467 (53) 實施例2 5 除了將實施例20的加壓溫度變更爲3 90°c以外,其餘 與實施例20同樣的進行’得到目的之TPI/Cu的層構成的 撓性單面貼銅層合板。結果,因爲以超過熔點的溫度進行 . 加壓,故有樹脂流出,此外線膨脹係數上昇。 實施例26 除了未使用實施例20的緩衝材以外,其餘與實施例 20同樣的進行,得到目的之TPI/Cu的層構成的撓性單面 貼銅層合板。結果,因爲未使用緩衝材,故無法得到高的 表面平滑性。 實施例27 除了將實施例20的二軸延伸熱塑性聚醯亞胺樹脂薄 膜(A-3 )變更爲二軸延伸熱塑性聚醯亞胺樹脂薄膜(D-3 )以外,其餘與實施例20同樣的進行,得到目的之TPI/ Cu的層構成的撓性單面貼銅層合板。 實施例2 8 除了將實施例20的二軸延伸熱塑性聚醯亞胺樹脂薄 膜(A-3 )變更爲二軸延伸熱塑性聚醯亞胺樹脂薄膜(E-3 )以外,其餘與實施例20同樣的進行,得到目的之TPI/ Cu的層構成的撓性單面貼銅層合板。因爲樹脂薄膜的線 膨脹係數大,故與銅箔的黏著後產生翹曲。 -57- 200806467 (54) 使用上述實施例23〜28所得到的撓性單面貼銅層合板 評估諸特性,歸納整理於表8。 [表8] 特性 實施例 23 24 25 26 27 28 熱塑性聚醯亞胺樹脂延伸薄膜 A-2 A-3 A-3 A-3 D-3 E-3 加壓溫度(。。) 360 280 390 360 360 360 緩衝材 PBO PBO PBO ist y\w PBO PBO 黏著強度 (N/mm) TPI薄膜-銅箔 〇 Δ 〇 〇 〇 〇 黏著後的翹曲 Δ 〇 〇 〇 〇 Δ 耐回流焊g △ 〇 〇 〇 〇 △ 備考|PBO:聚苯並噁唑(商品名「FUJIRONSTM」、(股)FUJICO製) 實施例29 將12.5 /zm的二軸熱塑性聚醯亞胺樹脂薄膜(A-3) 的雙面上重疊厚度18//m的銅箔,隔著作爲離型用薄膜之 厚度100 μ m的PTFE薄膜用SUS板挾住,而且SUS板的 雙面上重疊聚苯並噁唑製之作爲氈狀緩衝材之FUJIRON STM,裝置於北川精機(股)製的真空高溫加壓機,然 後,進行減壓至l.OkPa,以初期壓力lOkgf/cm2的壓力以 昇溫5°C/min·昇溫至36〇°C後,提高壓力至二次成形壓25 kgf/cm2,在此狀態下保持1 0分鐘,然後,慢慢的進行冷 卻至室溫,得到Cu /TPI/Cu的層構成的撓性雙面貼銅層合 基板。 -58- 200806467 (55) 實施例30 除了將實施例29的二軸延伸熱塑性聚醯亞胺樹脂薄 膜(A-3)變更爲二軸延伸熱塑性聚醯亞胺樹脂薄膜(B-3 )以外,其餘與實施例29同樣的進行,得到目的之Cu/ . TPI/Cu的層構成的撓性雙面貼銅層合板。 實施例3 1 除了將實施例29的二軸延伸熱塑性聚醯亞胺樹脂薄 膜(A-3 )變更爲二軸延伸熱塑性聚醯亞胺樹脂薄膜(C-3 )以外,其餘與實施例29同樣的進行,得到目的之 Cu/TPI/Cu的層構成的撓性雙面貼銅層合板。 使用上述實施例29〜31所得到的撓性單面貼銅層合板 評估諸特性,歸納整理於表9。 [表9] 特性 實施例 29 30 31 熱塑性聚醯亞胺樹脂延伸薄膜 A-3 B-3 C-3 加壓溫度(。〇 360 360 360 緩衝材 PBO PBO PBO 黏著強度 (N/mm) TPI薄膜-銅箔 〇 〇 〇 黏著後的翹曲 〇 〇 〇 耐回流焊g ctt 1 〇 〇 〇 備考 PBO:聚苯並噁唑(商品*「FUJIR〇nSTM」、(股)FUJI CO製) 實施例3 2 -59- 200806467 (56) 5 0 // m的kaptoη ΕΝ ( Du Pont公司製的聚醯亞胺樹脂 薄膜;此聚醯亞胺樹脂爲不具有熱塑性(硬化與軟化間的 熱可逆性)之直鏈狀聚合物,因爲不可能單獨擠壓成形, 故此市售的聚醯亞胺樹脂(以下亦稱爲PI薄膜)薄膜, 係藉由將含有先驅物的聚醯胺酸之溶液,流延於滾輪上或 平面上後進行脫水縮合反應而得到者)的雙面上,重疊厚 度12.5/zm的二軸延伸熱塑性聚醯亞胺樹脂薄膜(A-3)、厚度18/zm的銅箔,從其雙面隔著作爲離型用薄膜 之厚度100^/m的PTFE薄膜用SUS板挾住,而且SUS板 的雙面上重疊聚苯並噁唑製之作爲氈狀緩衝材之FIHIRON STM,裝置於北川精機(股)製的真空高溫加壓機,然 後,進行減壓至l.OkPa,以初期壓力lOkgf/cm2的壓力以 昇溫5°C/min.昇溫至360°C後,提高壓力至二次成形壓25 kgf/cm2,在此狀態下保持1 〇分鐘,然後,慢慢的進行冷 卻至室溫,得到Cu /TPI/PI/TPI/Cu的層構成的撓性雙面 貼銅層合基板。 實施例3 3 除了將實施例3 2的二軸延伸熱塑性聚醯亞胺樹脂薄 膜(A-3 )變更爲二軸延伸熱塑性聚醯亞胺樹脂薄膜(B-3 )以外,其餘與實施例32同樣的進行,得到目的之Cu/ TPI/PI/TPI/Cu的層構成的撓性雙面貼銅層合板。 實施例3 4 •60- 200806467 (57) 除了將實施例3 2的二軸延伸熱塑性聚醯亞胺樹脂薄 膜(A-3)變更爲二軸延伸熱塑性聚醯亞胺樹脂薄膜(C-3 )以外,其餘與實施例32同樣的進行,得到目的之 Cu/TPI/PI/TPI/Cu的層構成的撓性雙面貼銅層合板。 ^ 使用上述實施例3 2〜3 4所得到的撓性雙面貼銅層合板 評估諸特性,歸納整理於表1 〇。 [表 1〇] 特性 實施例 32 33 34 熱塑性聚醯亞胺樹脂延伸薄膜 A-3 B-3 C-3 加壓溫度ΓΟ 360 360 360 緩衝材 PBO PBO PBO 黏著強度 (N/mm) TPI薄膜-銅箔 〇 〇 〇 TPI薄膜-PI薄膜 〇 〇 〇 黏著後的翹曲 〇 〇 〇 耐回流焊接性 〇 〇 〇 備考 PBO:聚苯並噁唑(商品名「FUJIRON STM」、(股)FUJICO製) ^ 實施例35 . 將1 2 · 5 // m的二軸熱塑性聚醯亞胺樹脂薄膜(A-3 ) 的雙面上各自重疊具有導體回路之2層撓性聚醯亞胺雙面 板,從其雙面隔著作爲離型用薄膜之厚度100// m的PTFE 薄膜用SUS板挾住’而且SUS板的雙面上重疊作爲氈狀 緩衝材之 FUJIRON STM,裝置於北川精機(股)製的真 空高溫加壓機,然後,進行減壓至1 .OkPa,以初期壓力 lOkgf/cm2的壓力以昇溫5°C/min.昇溫至36(TC後,提高壓 -61 - 200806467 (58) 力至二次成形壓25kgf/cm2,在此狀態下保持1 0分鐘,然 後,慢慢的進行冷卻至室溫’得到導體回路被埋入熱塑性 聚醯亞胺樹脂薄膜之導體回路/PI/導體回路/TPI/導體回路 /PIV導體回路的層構成的多層撓性雙面貼銅層合基板。 實施例3 6 除了將實施例3 5的二軸延伸熱塑性聚醯亞胺樹脂薄 φ 膜(A-3 )變更爲二軸延伸熱塑性聚醯亞胺樹脂薄膜(B- 3 )以外,其餘與實施例3 5同樣的進行,得到目的之導體 回路/PI/導體回路/TPI/導體回路/PI/導體回路的層構成的 多層撓性雙面貼銅層合板。 實施例37 除了將實施例3 5的二軸延伸熱塑性聚醯亞胺樹脂薄 膜(A-3 )變更爲二軸延伸熱塑性聚醯亞胺樹脂薄膜(c-3 )以外,其餘與實施例3 5同樣的進行,得到目的之導體 回路/PI/導體回路/TPI/導體回路/PI/導體回路的層構成的 多層撓性雙面貼銅層合板。 使用上述實施例3 5〜3 7所得到的多層撓性雙面貼銅層 合板評估諸特性.,歸納整理於表1 1。 -62- 200806467 (59) [表 11] 特性 實施例 35 36 37 熱塑性聚醯亞胺樹脂延伸薄膜 A-3 B-3 C-3 加壓溫度(。〇 360 360 360 緩衝材 PBO PBO PBO 黏著強度 (N/mm) TPI薄膜·銅箔 〇 〇 〇 TPI薄膜-PI薄膜 〇 〇 〇 黏著後的翹曲 〇 〇 〇 耐回流焊接性 〇 〇 〇 備考 PBO:聚苯並噁唑(商品名「FUJIRONSTM」、(股)FUJICO製) 實施例3 8 在雙面上形成導體回路的2層撓性聚醯亞胺雙面板的 雙面上,各自重疊12.5 /zm的二軸熱塑性聚醯亞胺樹脂薄 膜(A-3)及18//m的銅箔,從其雙面隔著作爲離型用薄 膜之厚度l〇〇//m的PTFE薄膜用SUS板挾住,而且SUS 板的雙面上重疊作爲氈狀緩衝材之FUJIRON STM,裝置 於北川精機(股)製的真空高溫加壓機,然後,進行減壓 至10 kgf/cm2,以初期壓力1 .OMPa的壓力以昇溫5°C /min 昇溫至360°C後,提高壓力至二次成形壓25kgf/cm2,在此 狀態下保持1 〇分鐘,然後,慢慢的進行冷卻至室溫,得 到導體回路被埋入熱塑性聚醯亞胺樹脂薄膜之Cu/TPI/導 體回路/PI7導體回路/TPI/Cu的層構成的多層撓性雙面貼銅 層合板。 實施例3 9 -63- 200806467 (60) 除了將實施例3 8的二軸延伸熱塑性聚醯亞胺樹脂薄 膜(A-3 )變更爲二軸延伸熱塑性聚醯亞胺樹脂薄膜(B-3 )以外,其餘與實施例3 8同樣的進行,得到目的之Cu/ TPI/導體回路/PI/導體回路/TPI/Cu的層構成的多層撓性雙 . 面貼銅層合板。 實施例40 除了將實施例3 8的二軸延伸熱塑性聚醯亞胺樹脂薄 膜(A-3 )變更爲二軸延伸熱塑性聚醯亞胺樹脂薄膜(C-3 )以外,其餘與實施例3 8同樣的進行,得到目的之Cu/ TPI/導體回路/PI/導體回路/TPI/Cu的層構成的多層撓性雙 面貼銅層合板。 使用上述實施例3 8〜40所得到的多層撓性雙面貼銅層 合板評估諸特性,歸納整理於表1 2。The evaluation methods of the adhesive strength, the warpage after the adhesion, and the reflow solderability shown in the above Table 7 are as follows, and the same applies to the examples described later. (The adhesion strength of the flexible copper-clad laminate obtained by the η adhesion strength was measured according to JIS C 648 1 and measured by the following criteria. 〇·· > 0.8 N > mm △ : 0.4 ~0.8 N / mmx : < 0.4 N/mm (2) After the warpage after the adhesion was completed, it was visually judged whether or not the obtained flexible copper-clad laminate was warped, and the judgment criteria were as follows. -55- 200806467 (52) △: There is a little warpage X: There is curling (3) Reflow-resistant solderability ^ The obtained flexible copper-clad laminate is passed through a reflow soldering furnace up to °C, by The swelling was judged visually as follows. _ 〇: no swelling, warping △: slight swelling, warping X: swelling, crimping Example 23 except that the biaxially stretched thermoplastic polythene film of Example 20 was used. In the same manner as in Example 20 except that the (A-3) was changed to the biaxially stretched thermoplastic polyimide resin 2), a flexible single-sided copper-clad laminate having a layer of a target Cu was obtained. Because the coefficient of expansion of the resin is large, warpage occurs after adhesion to the copper foil. (Example 24) A target TPI/Cu flexible single-sided copper-clad laminate was obtained in the same manner as in Example 20 except that the pressurization temperature of Example 20 was changed to 28 °C. As a result, since the pressurization temperature is lower than the softening start temperature of /, the adhesive strength is lower than the degree 260 of the other examples, and the resin film (the line of Α-ΤΡΙ/membrane, and the remaining -3 film form) is judged. -56-200806467 (53) Example 2 5 The flexibility of the layer structure of the desired TPI/Cu was carried out in the same manner as in Example 20 except that the pressurization temperature of Example 20 was changed to 3 90 ° C. The copper laminate was laminated on one side. As a result, the pressure was increased at a temperature exceeding the melting point, so that the resin flowed out and the coefficient of linear expansion increased. Example 26 Except that the cushioning material of Example 20 was not used, Example 20 was used. In the same manner, a flexible single-sided copper-clad laminate having a desired layer of TPI/Cu was obtained. As a result, since no buffer material was used, high surface smoothness could not be obtained. Example 27 In addition to Example 20 The desired stretching layer of TPI/Cu was obtained in the same manner as in Example 20 except that the axially stretched thermoplastic polyimide film (A-3) was changed to the biaxially stretched thermoplastic polyimide film (D-3). Flexible list Copper-clad laminate. Example 2 8 except that the biaxially stretched thermoplastic polyimide film (A-3) of Example 20 was changed to a biaxially stretched thermoplastic polyimide film (E-3), In the same manner as in Example 20, a flexible single-sided copper-clad laminate having a layer of the desired TPI/Cu layer was obtained. Since the linear expansion coefficient of the resin film was large, warpage occurred after adhesion to the copper foil. 200806467 (54) The properties of the flexible single-sided copper-clad laminates obtained in the above Examples 23 to 28 were evaluated and summarized in Table 8. [Table 8] Characteristic Example 23 24 25 26 27 28 Thermoplastic Polyimine Resin stretch film A-2 A-3 A-3 A-3 D-3 E-3 Pressurization temperature (..) 360 280 390 360 360 360 Buffer material PBO PBO PBO ist y\w PBO PBO Adhesion strength (N/ Mm) TPI film-copper foil 〇Δ 翘 warpage after adhesion Δ 〇〇〇〇 Δ reflow resistant g △ 〇〇〇〇 △ remarks | PBO: polybenzoxazole (trade name "FUJIRONSTM", (manufactured by FUJICO) Example 29 A double-sided weight of a 12.5 /zm biaxial thermoplastic polyimide film (A-3) A copper foil having a thickness of 18/m is sandwiched between SUS sheets having a thickness of 100 μm, which is a release film, and a polystyrene oxazole is laminated on both sides of the SUS plate as a felt-like cushioning material. The FUJIRON STM is installed in a vacuum high-temperature press machine manufactured by Kitagawa Seiki Co., Ltd., and then decompressed to 1.0 kPa, and the temperature is raised to 5 ° C / min at a pressure of 10 kg / min at the initial pressure of 10 ° C / min. After C, the pressure was increased to 25 kgf/cm2 of the secondary forming pressure, and kept for 10 minutes in this state, and then slowly cooled to room temperature to obtain a flexible double-sided paste composed of a layer of Cu /TPI/Cu. Copper laminated substrate. -58-200806467 (55) Example 30 except that the biaxially stretched thermoplastic polyimide film (A-3) of Example 29 was changed to a biaxially stretched thermoplastic polyimide film (B-3), The same procedure as in Example 29 was carried out to obtain a flexible double-sided copper-clad laminate having a layer of Cu/.TPI/Cu. Example 3 1 The same procedure as in Example 29 except that the biaxially stretched thermoplastic polyimide film (A-3) of Example 29 was changed to the biaxially stretched thermoplastic polyimide film (C-3). The process proceeds to obtain a flexible double-sided copper-clad laminate composed of a layer of Cu/TPI/Cu. The properties of the flexible single-sided copper-clad laminates obtained in the above Examples 29 to 31 were evaluated and summarized in Table 9. [Table 9] Characteristic Example 29 30 31 Thermoplastic Polyimine Resin Stretch Film A-3 B-3 C-3 Pressurization Temperature (.〇360 360 360 Buffer Material PBO PBO PBO Adhesion Strength (N/mm) TPI Film - warpage of copper foil 〇〇〇 after adhesion, reflow soldering g ctt 1 〇〇〇 Preparation PBO: polybenzoxazole (product * "FUJIR 〇 nSTM", (stock) FUJI CO) Example 3 2 -59- 200806467 (56) 5 0 // m kaptoη ΕΝ (a polyimide film made of Du Pont); this polyimide resin does not have thermoplasticity (thermal reversibility between hardening and softening) Since the linear polymer is not separately extrudable, a commercially available polyimide film (hereinafter also referred to as PI film) is cast by a solution containing a precursor polyamine. a biaxially stretched thermoplastic polyimide film (A-3) having a thickness of 12.5/zm and a copper foil having a thickness of 18/zm on both sides of the roll or on the flat surface after dehydration condensation reaction. The PTFE film having a thickness of 100 μm/m from the double-sided film is SUS plate, and the SUS plate is used. FIHIRON STM, which is a felt-like cushioning material made of polybenzoxazole on both sides, is placed in a vacuum high-temperature press machine manufactured by Beichuan Seiki Co., Ltd., and then decompressed to 1.0 kPa at an initial pressure of 10 kgf/ The pressure of cm2 is raised by 5 ° C / min. After raising the temperature to 360 ° C, the pressure is increased to 25 kgf / cm 2 of the secondary forming pressure, and maintained for 1 〇 minutes in this state, and then slowly cooled to room temperature. A flexible double-sided copper-clad laminate substrate having a layer of Cu / TPI / PI / TPI / Cu was obtained. Example 3 3 In addition to the biaxially stretched thermoplastic polyimide film (A-3) of Example 32 The flexible double-sided copper paste having the layer of Cu/TPI/PI/TPI/Cu for the purpose was obtained in the same manner as in Example 32 except that the film was changed to the biaxially stretched thermoplastic polyimide film (B-3). Laminated plate. Example 3 4 • 60-200806467 (57) In addition to changing the biaxially stretched thermoplastic polyimide film (A-3) of Example 32 to a biaxially stretched thermoplastic polyimide film (C) Except for -3), the same procedure as in Example 32 was carried out to obtain a flexible double-sided sticker of a layer of Cu/TPI/PI/TPI/Cu. Laminates. ^ The properties of the flexible double-sided copper-clad laminates obtained in the above Examples 3 2 to 3 4 were evaluated and summarized in Table 1. [Table 1〇] Characteristic Example 32 33 34 Thermoplastic Polysiloxane Amine resin stretch film A-3 B-3 C-3 Pressurization temperature ΓΟ 360 360 360 Buffer material PBO PBO PBO Adhesive strength (N/mm) TPI film-copper foil 〇〇〇TPI film-PI film 〇〇〇 adhesion翘 翘 〇〇〇 〇〇〇 回流 P P P P PBO: polybenzoxazole (trade name "FUJIRON STM", (stock) FUJICO system) ^ Example 35. Will 1 2 · 5 / m 2 The two-layer flexible polyimide polyimide double-panel having a conductor loop is superposed on both sides of the axial thermoplastic polyimide film (A-3), and the thickness of the film for release film is 100// The PTFE film of the m was smashed with a SUS plate, and the FUJIRON STM, which was a felt-like cushioning material, was placed on both sides of the SUS plate, and was placed in a vacuum high-temperature press machine manufactured by Kitagawa Seiki Co., Ltd., and then depressurized to 1. OkPa, at a pressure of 10kg/min at the initial pressure of 10kg/cm2, the temperature is raised to 36 (after TC, the pressure is increased -61 - 200806467 (58) Force to the secondary forming pressure 25kgf/cm2, hold it for 10 minutes in this state, and then slowly cool to room temperature' to obtain a conductor loop in which the conductor loop is buried in the thermoplastic polyimide film. Multilayer flexible double-sided copper-clad laminate substrate composed of layers of /PI/conductor loop/TPI/conductor loop/PIV conductor loop. Example 3 6 Except that the biaxially stretched thermoplastic polyimide film φ film (A-3) of Example 35 was changed to the biaxially stretched thermoplastic polyimide film (B-3), In the same manner as in Example 3, a multilayer flexible double-sided copper-clad laminate having a desired layer of a conductor loop/PI/conductor loop/TPI/conductor loop/PI/conductor loop was obtained. Example 37 except that the biaxially stretched thermoplastic polyimide film (A-3) of Example 35 was changed to the biaxially stretched thermoplastic polyimide film (c-3), and Example 35 In the same manner, a multilayer flexible double-sided copper-clad laminate composed of a layer of a desired conductor loop/PI/conductor loop/TPI/conductor loop/PI/conductor loop is obtained. The properties of the multilayer flexible double-sided copper-clad laminate obtained in the above Examples 35 to 37 were evaluated and summarized in Table 11. -62- 200806467 (59) [Table 11] Characteristic Example 35 36 37 Thermoplastic Polyimine Resin Stretch Film A-3 B-3 C-3 Pressurization Temperature (.〇360 360 360 Buffer Material PBO PBO PBO Adhesion Strength (N/mm) TPI film, copper foil, TPI film, PI film, warpage after adhesion, reflow solderability, preparation test PBO: polybenzoxazole (trade name "FUJIRONSTM" (manufactured by FUJICO Co., Ltd.) Example 3 8 A two-axis thermoplastic polyimide film having a thickness of 12.5 /zm was superposed on both sides of a two-layer flexible polyimide film double-sided panel in which a conductor loop was formed on both sides ( The copper foil of A-3) and 18//m is smashed with a SUS film having a thickness of 10 〇〇//m from the double-sided film, and the SUS plate is overlapped on both sides. The FUJIRON STM of the felt-like cushioning material is installed in a vacuum high-temperature press machine manufactured by Beichuan Seiki Co., Ltd., and then depressurized to 10 kgf/cm2, and is heated at a temperature of 5 ° C /min at an initial pressure of 1.0 MPa. After 360 °C, increase the pressure to 25kgf/cm2 of the secondary forming pressure, and keep it for 1 〇 minute in this state, then slowly enter After cooling to room temperature, a multilayer flexible double-sided copper-clad laminate in which a conductor loop was embedded in a Cu/TPI/conductor loop/PI7 conductor loop/TPI/Cu layer of a thermoplastic polyimide film was obtained. 9-63-200806467 (60) In addition to changing the biaxially stretched thermoplastic polyimide film (A-3) of Example 38 to the biaxially stretched thermoplastic polyimide film (B-3), In the same manner as in Example 38, a multilayer flexible double-faced copper laminate having a desired Cu/TPI/conductor loop/PI/conductor loop/TPI/Cu layer was obtained. Example 40 Except that Example 3 was The biaxially stretched thermoplastic polyimide film (A-3) of 8 was changed to the biaxially stretched thermoplastic polyimide film (C-3), and the same procedure as in Example 38 was carried out to obtain the intended Cu. Multilayer flexible double-sided copper-clad laminate composed of layers of TPI/conductor loop/PI/conductor loop/TPI/Cu. Evaluation of multilayer flexible double-sided copper-clad laminates obtained in the above Examples 38 to 40 The characteristics are summarized in Table 12.

[表 12] 特性 實施例 38 39 40 熱塑性聚醯亞胺樹脂延伸薄膜 A-3 B-3 C-3 加壓溫度fc) 360 360 360 緩衝材 PBO PBO PBO 黏著強度 TH薄膜-銅箔 〇 〇 〇 (N/mm) TPI薄膜-PI薄膜 〇 〇 〇 黏著後的翹曲 〇 〇 〇 耐回流焊接性 〇 〇 〇 備考 PBO:聚苯並噁唑(商品名「FUJIRONSTM」、(股)FUJI CO製) -64 - 200806467 (61) 比較例3 使用 25 // m的未延伸熱塑性聚醯亞胺樹脂薄膜 (A),在單面上重疊厚度18//m的銅箔,從其雙面隔著 作爲離型用薄膜之厚度l〇〇/zm的PTFE薄膜用SUS板挾 . 住,而且SUS板的雙面上重疊聚苯並噁唑製的作爲氈狀緩 衝材之FUJIRON STM,裝置於北川精機(股)製的真空 高溫加壓機,然後,進行減壓至1.0 kpa,以初期壓力10 φ kgf/cm2的壓力以昇溫5°C /min·昇溫至3 60°C後,提高壓力 至二次成形壓25kgf/cm2,在此狀態下保持10分鐘,然 後,慢慢的進行冷卻至室溫,得到未延伸TPI/Cu的層構 成的撓性單面貼銅層合基板。於所得到的撓性單面貼銅層 合基板,因爲所使用的未延伸熱塑性聚醯亞胺樹脂薄膜的 線膨脹係數大,故與,銅箔的黏著後產生顯著的翹曲(卷 縮)。 比較例4 除了將實施例20的二軸延伸熱塑性聚醯亞胺樹脂薄 膜(A-3 )變更爲一軸延伸熱塑性聚醯亞胺樹脂薄膜(F-3 )以外,其餘與實施例20同樣的進行,得到一軸延伸 TPI/Cu的層構成的撓性單面貼銅層合板。於所得到的撓性 單面貼銅層合基板,因爲所使用的熱塑性聚醯亞胺樹脂薄 膜(E-3 )的MD方向(薄膜的長邊方向)的線膨脹係數 爲接近於銅箔之値,故與銅箔的黏著後產生顯著的翹曲 (卷縮)。 -65- (62) 200806467 比較例5 除了將實施例20的加壓溫度變更爲240 °C以外,其餘 與實施例20同樣的進行,製造tpi/Cu的層構成的撓性單 面貼銅層合板。其結果,因爲以低於二軸延伸熱塑性聚醯 亞胺樹脂薄膜的T g低的溫度的加壓,故二軸延伸熱塑性 聚醯亞胺樹脂薄膜未開始軟化,故無法黏著。 使用上述比較例3〜5所得到的撓性單面貼銅層合板評 估諸特性,歸納整理於表1 3。 [表 13] 特性 比較例 3 4 5 熱塑性聚醯亞胺樹脂延伸薄膜 A F-3 A-3 _ 加壓溫度(。〇 360 360 240 一 緩衝材 PBO PBO PBO _ 黏著強度 (N/mm) TPI薄膜-銅箔 〇 〇 X 黏著後的翹曲 X X 一 耐回流焊接性 — — — 黏著後的狀態 翹曲顯著 翹曲顯著 不黏著 備考 PBO:聚苯並噁唑(商品名「FUJIRONSTM」、(股)FUJICO製) 〔產業上的可利用性〕 本發明的撓性層合板,因爲具有作爲黏著層之熱塑性 聚醯亞胺樹脂層,故可使用於各種撓性基板或面狀發熱體 的覆蓋膜、與不鏽鋼、鋁、鎳等之金屬箔的層合材等各種 技術領域,特別是可較適合使用於撓性印刷電路板的製 -66- 200806467 (63) 造、或可謂爲撓性印刷電路板的一種之錄音自動化接合 (TAB)製品的製造。 【圖式簡單說明】 〔圖1〕係表示熱塑性聚醯亞胺樹脂未延伸薄膜及二 軸延伸熱塑性聚醯亞胺樹脂薄膜的TMA曲線之模式圖。 〔圖2〕係表示本發明相關的撓性雙面貼銅層合板的 φ 結構的其中一例之槪略部份截面圖。 〔圖3〕係表示本發明相關的撓性雙面貼銅層合板的 結構的其他例子之槪略部份截面圖。 〔圖4〕係表示本發明相關的多層撓性層合板的結構 的其中一例之槪略部份截面圖。 〔圖5〕係表示本發明相關的多層撓性層合板的結構 的其他例子之槪略部份截面圖。 φ 【主要元件符號說明】 ^ 1 :熱塑性聚醯亞胺薄膜(或二軸延伸熱塑性聚醯亞 胺樹脂薄膜) 2 :銅箔 3 :聚醯亞胺樹脂薄膜 4 :導體回路層 -67、[Table 12] Characteristic Example 38 39 40 Thermoplastic Polyimine Resin Stretch Film A-3 B-3 C-3 Pressurization Temperature fc) 360 360 360 Buffer PBO PBO PBO Adhesive Strength TH Film - Copper Foil 〇〇〇 (N/mm) TPI film-PI film 翘 翘 〇〇〇 〇〇〇 〇〇〇 〇〇〇 P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P P -64 - 200806467 (61) Comparative Example 3 Using a 25 // m unstretched thermoplastic polyimide film (A), a copper foil having a thickness of 18/m was superposed on one surface, and The PTFE film of the thickness of the release film is 〇〇 z z z FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU FU a vacuum high-temperature press machine, which is then subjected to a reduced pressure to 1.0 kpa, at a pressure of 10 φ kgf/cm 2 at an initial pressure of 5 ° C /min · a temperature rise to 3 60 ° C, and then the pressure is increased to two times. The molding pressure was 25 kgf/cm2, and was kept in this state for 10 minutes, and then slowly cooled to room temperature to obtain an unstretched TPI/Cu. Layer constituting one surface of the flexible copper-clad laminated board. In the obtained flexible single-sided copper-clad laminate substrate, since the unstretched thermoplastic polyimide film used has a large coefficient of linear expansion, significant warpage (crimping) occurs after adhesion of the copper foil. . Comparative Example 4 The same procedure as in Example 20 was carried out, except that the biaxially stretched thermoplastic polyimide film (A-3) of Example 20 was changed to the one-axis stretch thermoplastic polyimide film (F-3). A flexible single-sided copper-clad laminate composed of a layer of one-axis extended TPI/Cu is obtained. In the obtained flexible single-sided copper-clad laminate substrate, the linear expansion coefficient in the MD direction (longitudinal direction of the film) of the thermoplastic polyimide film (E-3) used is close to that of the copper foil. Oh, it causes significant warpage (crimping) after adhesion to the copper foil. -65- (62) 200806467 Comparative Example 5 A flexible single-sided copper layer having a layer structure of tpi/Cu was produced in the same manner as in Example 20 except that the pressurization temperature of Example 20 was changed to 240 °C. Plywood. As a result, since the Tg of the thermoplastic polyimide film having a lower Tg is less than the Tg, the biaxially stretched thermoplastic polyimide film does not start to soften, so that it cannot adhere. The properties of the flexible single-sided copper-clad laminates obtained in the above Comparative Examples 3 to 5 were evaluated and summarized in Table 13. [Table 13] Characteristic Comparative Example 3 4 5 Thermoplastic Polyimine Resin Stretch Film A F-3 A-3 _ Pressurization Temperature (.〇360 360 240 A Buffer Material PBO PBO PBO _ Adhesive Strength (N/mm) TPI Film-copper foil 〇〇X After warping XX a reflow-resistant solderability — — After warping, the warpage is noticeably warped significantly. The test is not sticky. PBO: Polybenzoxazole (trade name “FUJIRONSTM”, [Production of FUJICO] [Industrial Applicability] Since the flexible laminate of the present invention has a thermoplastic polyimide film as an adhesive layer, it can be used for a cover film of various flexible substrates or planar heat-generating bodies. And various technical fields such as a laminate of a metal foil such as stainless steel, aluminum, or nickel, and the like, particularly suitable for use in a flexible printed circuit board - 66-200806467 (63), or a flexible printed circuit The manufacture of a recording automatic bonding (TAB) product of a board. [Simple description of the drawing] [Fig. 1] shows the TMA curve of a thermoplastic polyimide film unstretched film and a biaxially stretched thermoplastic polyimide film. Pattern diagram. 2] is a schematic partial cross-sectional view showing an example of the φ structure of the flexible double-sided copper-clad laminate according to the present invention. [Fig. 3] shows the structure of the flexible double-sided copper-clad laminate according to the present invention. BRIEF DESCRIPTION OF THE DRAWINGS [Fig. 4] is a schematic partial cross-sectional view showing an example of the structure of a multilayer flexible laminate according to the present invention. [Fig. 5] shows a multilayer in accordance with the present invention. A schematic partial cross-sectional view of another example of the structure of the flexible laminate. φ [Explanation of main component symbols] ^ 1 : Thermoplastic polyimide film (or biaxially stretched thermoplastic polyimide film) 2 : Copper foil 3: Polyimine resin film 4: conductor loop layer -67,

Claims (1)

200806467 (1) 十、申請專利範圍 1 · 一種撓性層合板,其係含有於熱塑性聚醯亞胺層的 至少單面上黏著金屬箔層或導體回路層所成的金屬箔層/ 熱塑性聚醯亞胺層或/及導體回路層/熱塑性聚醯亞胺層之 • 撓性層合板;其特徵係上述熱塑性聚醯亞胺層,係由將熱 塑性聚醯亞胺樹脂熔融擠壓成形後所得到的熱塑性聚醯亞 胺樹脂薄膜或薄片,或者由二軸延伸熱塑性聚醯亞胺樹脂 φ 薄膜或薄片所形成者。 2 ·如申請專利範圍第1項之撓性層合板,其中該熱塑 性聚醯亞胺樹脂之玻璃轉移溫度(Tg)爲180〜280°C。 3 ·如申請專利範圍第1項之撓性層合板,其中該熱塑 性聚醯亞胺樹脂,在比該樹脂的熔點高3 0 °C的擠壓溫度, 用50〜50OfsecT1]的範圍的剪切速度所測量的熔融黏度爲5 xlO1 〜lxl04[Pa · S]° 4. 如申請專利範圍第1項之撓性層合板,其中該二軸 φ 延伸熱塑性聚醯亞胺樹脂薄膜或薄片,係將熱塑性聚醯亞 胺熔融擠壓成形後所得到的熱塑性聚醯亞胺樹脂薄膜或薄 片,再藉由二軸延伸所得到的二軸延伸熱塑性聚醯亞胺樹 脂薄膜。 5. 如申請專利範圍第1項之撓性層合板,其中該二軸 延伸熱塑性聚醯亞胺樹脂薄膜或薄片,MD方向(薄膜 長邊方向)及TD方向(薄膜寬度方向)的任一者的熱膨 脹α2〇-2〇〇皆在5xl〇-6〜30χ10·6/Κ的範圍內。 6. 如申請專利範圍第1項之撓性層合板,其中該二軸 -68- (2) 200806467 延伸熱塑性聚醯亞胺樹脂薄膜或薄片,MD方向(薄膜長 邊方向)及TD方向(薄膜寬度方向)之熱膨脹率α 2Q_2〇〇 的差爲20χ1(Γ6/Κ以內。 7 ·如申請專利範圍第1項之撓性層合板,其中該二軸 延伸熱塑性聚醯亞胺樹脂薄膜或薄片,藉由熱機械分析 (ΤΜΑ)依據 JIS C 648 1 : 1 996 的「5.17.1ΤΜΑ 法」所記 載方法所測量的玻璃轉移溫度Tg,比延伸前的熱塑性聚 醯亞胺樹脂薄膜或薄片的玻璃轉移溫度Tg高10〜80 °C。 8 ·如申請專利範圍第1項之撓性層合板,其中該熱塑 性聚醯亞胺樹脂爲結晶性熱塑性聚醯亞胺樹脂。 9 ·如申請專利範圍第1項之撓性層合板,該熱塑性聚 醯亞胺樹脂,由結晶性熱塑性聚醯亞胺樹脂、與熔點爲 2 8 0〜3 5 0 °C的其他的熱塑性樹脂的混合物所成。 1 〇·如申請專利範圍第1至9項中任一項之撓性層合 板,其中該熱塑性聚醯亞胺樹脂,爲具有下述式(i )的 重複結構單元之熱塑性聚醯亞胺樹脂,200806467 (1) X. Patent Application No. 1 · A flexible laminate comprising a metal foil layer/thermoplastic polymer layer formed by adhering a metal foil layer or a conductor loop layer on at least one side of a thermoplastic polyimide layer An imide layer or/and a conductor loop layer/thermoplastic polyimide layer; a flexible laminate; characterized by the above thermoplastic polyimide layer being obtained by melt-extruding a thermoplastic polyimide film resin A thermoplastic polyimide film or sheet of thermoplastic polyimide, or a film formed from a biaxially stretched thermoplastic polyimide film φ film or sheet. 2. The flexible laminate of claim 1, wherein the thermoplastic polyimide resin has a glass transition temperature (Tg) of from 180 to 280 °C. 3. The flexible laminate according to claim 1, wherein the thermoplastic polyimide resin is cut at a temperature of 30 ° C higher than the melting point of the resin by a range of 50 to 50 ° sec T1] The melt viscosity measured by the speed is 5 x lO1 ~ lxl04 [Pa · S] ° 4. The flexible laminate according to claim 1, wherein the two-axis φ extended thermoplastic polyimide film or sheet A thermoplastic polyimide film or sheet obtained by melt-extruding a thermoplastic polyimide, and a biaxially stretched thermoplastic polyimide film obtained by biaxial stretching. 5. The flexible laminate according to claim 1, wherein the biaxially stretched thermoplastic polyimide film or sheet has any of MD direction (long film direction) and TD direction (film width direction) The thermal expansion α2〇-2〇〇 is in the range of 5xl〇-6~30χ10·6/Κ. 6. The flexible laminate according to claim 1, wherein the two-axis-68-(2) 200806467 extended thermoplastic polyimide film or sheet, MD direction (film longitudinal direction) and TD direction (film The difference in thermal expansion ratio α 2Q_2 in the width direction is 20χ1 (Γ6/Κ. 7) The flexible laminate according to claim 1, wherein the biaxially stretched thermoplastic polyimide film or sheet, The glass transition temperature Tg measured by thermomechanical analysis (ΤΜΑ) according to the method described in "5.17.1ΤΜΑ method" of JIS C 648 1 : 996, compared with the glass transition of the thermoplastic polyimide film or sheet before stretching The temperature Tg is 10 to 80 ° C. 8. The flexible laminate according to claim 1, wherein the thermoplastic polyimide resin is a crystalline thermoplastic polyimide resin. The flexible laminate of the present invention is a thermoplastic polyimide resin which is composed of a mixture of a crystalline thermoplastic polyimide resin and another thermoplastic resin having a melting point of 2800 to 350 ° C. 1 〇· For example, the scope of patent application is 1 The flexible laminate of any one of the items 9, wherein the thermoplastic polyimide resin is a thermoplastic polyimide resin having a repeating structural unit of the following formula (i), o=c\\>HO (1 ) (式中,X 爲直接鍵結、-S〇2-、-CO-、-C(CH3)2-、 -C(CF3)2-或-S-,R1、R2、R3、R4各自獨立地爲氫原子、 碳數1〜6的烷基、烷氧基、鹵化烷基、鹵化烷氧基、或鹵 -69- (2) 200806467 (3) 原子,此外,Y爲選自下述式(2 )所成群之基)o=c\\>HO (1 ) (where X is a direct bond, -S〇2-, -CO-, -C(CH3)2-, -C(CF3)2- or -S- , R1, R2, R3, and R4 are each independently a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group, a halogenated alkyl group, a halogenated alkoxy group, or a halogen-69-(2) 200806467 (3) atom Further, Y is a group selected from the group consisting of the following formula (2)) 1 1 .如申請專利範圍第1至9項中任一項之撓性層合 板,其中該熱塑性聚醯亞胺樹脂,爲具有下述式(5 )的 重複結構單元之熱塑性聚醯亞胺樹脂,The flexible laminate according to any one of claims 1 to 9, wherein the thermoplastic polyimide resin is a thermoplastic polyimide resin having a repeating structural unit of the following formula (5) , 1 2 .如申請專利範圍第1至9項中任一項之撓性層合 板,其中該熱塑性聚醯亞胺樹脂,爲具有下述式(6 )及 式(7 )的重複結構單元之熱塑性聚醯亞胺樹脂,The flexible laminate according to any one of claims 1 to 9, wherein the thermoplastic polyimide resin is a thermoplastic having a repeating structural unit of the following formula (6) and formula (7) Polyimine resin, -70- (6) (7) (4) 200806467-70- (6) (7) (4) 200806467 t (式中,m及n表示各結構單元的莫耳比,m/n = 4〜9範 圍)。 φ 1 3 .如申請專利範圍第1至9項中任一項之撓性層合 板,其中該熱塑性聚醯亞胺樹脂,爲具有下述式(6)及 式(8 )的重複結構單元之熱塑性聚醯亞胺樹脂,而且下 述式(6 )所表示的重複結構單元與下述式(8 )所表示的 重複結構單元的莫耳比爲1 : 0〜0.75 : 0.25的範圍,t (where m and n represent the molar ratio of each structural unit, m/n = 4 to 9 range). The flexible laminate according to any one of claims 1 to 9, wherein the thermoplastic polyimide resin is a repeating structural unit having the following formula (6) and formula (8); The thermoplastic polyimine resin, and the molar ratio of the repeating structural unit represented by the following formula (6) to the repeating structural unit represented by the following formula (8) is in the range of 1:0 to 0.75: 0.25. (6) i?(6) i? N (8) 1 4 . 一種撓性層合板的製造方法,其係含有於熱塑性 -71 - 200806467 (5) 聚醯亞胺層的至少單面上黏著金屬箔層或導體回路層所成 的金屬箔層/熱塑性聚醯亞胺層或/及導體回路層/熱塑性聚 醯亞胺層之撓性層合板的製造方法;其特徵係將熱塑性聚 醯亞胺樹脂熔融擠壓成形後所得到的熱塑性聚醯亞胺樹脂 , 薄膜或薄片,或者由二軸延伸熱塑性聚醯亞胺樹脂薄膜或 & 薄片,與金屬箔或導電回路層加熱加壓後黏著。 1 5 · —種撓性層合板的製造方法,其特徵係在至少一 φ 面經粗面處理或密著性處理的銅箔的處理側上,重疊將熱 塑性聚醯亞胺樹脂熔融擠壓成形後所得到的熱塑性聚醯亞 胺樹脂薄膜或薄片,或二軸延伸熱塑性聚醯亞胺樹脂薄膜 或薄片,再於上述薄膜的相反面上,重疊至少其中一面經 粗面處理或密著性處理的銅箔的處理側,然後加熱加壓。 1 6· —種撓性層合板的製造方法,其特徵係在無處理 或雙面施以密著性處理的聚醯亞胺樹脂薄膜的雙面上,重 疊將熱塑性聚醯亞胺樹脂熔融擠壓成形後所得到的熱塑性 φ 聚醯亞胺樹脂薄膜或薄片,或二軸延伸熱塑性聚醯亞胺樹 脂薄膜或薄片,而且於其外側上使至少單面經粗面處理或 X 密著性處理的銅箔的處理側朝內重疊,然後加熱加壓。 17.—種撓性層合板的製造方法,其特徵係在被形成 回路,無處理或雙面施以密著性處理的雙面撓性基板彼此 之間,挾入將熱塑性聚醯亞胺樹脂熔融擠壓成形後所得到 的熱塑性聚醯亞胺樹脂、薄膜或薄片,或二軸延伸熱塑性聚 醯亞胺樹脂薄膜或薄片,然後加熱加壓。 1 8 · —種撓性層合板的製造方法,其特徵係在被形成 -72- 200806467 (6) 回路,無處理或雙面施以密著性處理的雙面撓性基板的外 側上,各自重疊將熱塑性聚醯亞胺樹脂熔融擠壓成形後所 得到的熱塑性聚醯亞胺樹脂薄膜或薄片,或二軸延伸熱塑 性聚醯亞胺樹脂薄膜或薄片,再將至少單面經粗面處理或 . 密著性處理的銅箔的處理側成內側之方式重疊,然後加熱 加壓。 19·如申請專利範圍第14至18項中任一項之撓性層 φ 合板的製造方法,其係該熱塑性聚醯亞胺樹脂薄膜或薄片 或者二軸延伸熱塑性聚醯亞胺樹脂薄膜或薄片,爲單面或 雙面施以表面改質處理所成者。 2〇·如申請專利範圍第14至18項中任一項之撓性層 合板的製造方法,其中該加熱加壓,以所使用的熱塑性聚 醯亞胺樹脂的玻璃轉移溫度Tg以上的溫度進行。 2 1 ·如申請專利範圍第1 4至1 8項中任一項之撓性層 合板的製造方法,其中該加熱加壓,以熱塑性聚醯亞胺樹 # 脂薄膜或薄片或者二軸延伸熱塑性聚醯亞胺樹脂薄膜或薄 . 片的玻璃轉移溫度Tg以上、熔點以下的溫度進行。 I 22.如申請專利範圍第1 4至1 8項中任一項之撓性層 合板的製造方法,其係以300〜3 80 °C的溫度進行該加熱加 壓。 2 3 ·如申請專利範圍第1 4至1 8項中任一項之撓性層 合板的製造方法,其係於上述加熱加壓時,在被配置於與 被加熱加壓材連接之加壓板、與加壓機的加壓盤之間,介 入氈狀的緩衝材。 〃 -73· 200806467 (7) 24.如申請專利範圍第23項之撓性層合板的製造方 法,其中該氈狀緩衝材爲芳香族聚醯胺或聚苯並噁唑。N (8) 1 4 . A method for producing a flexible laminate comprising a metal layer or a conductor loop layer bonded to at least one side of a thermoplastic-71 - 200806467 (5) polyimide layer A method for producing a flexible laminate of a foil layer/thermoplastic polyimide layer or/and a conductor loop layer/thermoplastic polyimide layer; characterized by thermoplasticity obtained by melt-extruding a thermoplastic polyimide film Polyimide resin, film or sheet, or a film or a sheet of a biaxially stretched thermoplastic polyimide film, which is adhered to a metal foil or a conductive circuit layer by heating and pressing. 1 5 - A method for producing a flexible laminate, characterized in that a thermoplastic polyimide film is melt-extruded on a treated side of a copper foil having at least one φ surface subjected to rough surface treatment or adhesion treatment The obtained thermoplastic polyimide film or sheet, or the biaxially stretched thermoplastic polyimide film or sheet, and the opposite side of the film, overlap at least one of which is roughened or adhesively treated The treated side of the copper foil is then heated and pressurized. 1 6 — A method for producing a flexible laminate, characterized in that a thermoplastic polyimide film is melt-extruded on both sides of a polyimide film having no treatment or double-sided adhesion treatment. a thermoplastic φ polyimine resin film or sheet obtained by press forming, or a biaxially stretched thermoplastic polyimide film or sheet, and at least one side of which is subjected to rough surface treatment or X-adhesive treatment The treated side of the copper foil overlaps inwardly and then is heated and pressurized. 17. A method of producing a flexible laminate, characterized in that a double-sided flexible substrate which is formed into a circuit, which is not treated or double-sidedly adhered, is in contact with each other to form a thermoplastic polyimide resin. The thermoplastic polyimide film, film or sheet obtained after melt extrusion molding, or a film or sheet of a biaxially stretched thermoplastic polyimide film is then heated and pressurized. 1 8 - A method for producing a flexible laminate, characterized in that it is formed on the outer side of a double-sided flexible substrate which is formed into a -72-200806467 (6) circuit, without treatment or double-sided adhesion treatment Overlaying a thermoplastic polyimide film or sheet obtained by melt-extruding a thermoplastic polyimide film, or a biaxially stretched thermoplastic polyimide film or sheet, and then at least one side is roughened or The treated side of the adhesively treated copper foil is overlapped in the inner side, and then heated and pressurized. The method for producing a flexible layer φ ply according to any one of claims 14 to 18, which is a film or sheet of a thermoplastic polyimide film or a biaxially stretched thermoplastic polyimide film or sheet For those who apply surface modification treatment on one or both sides. The method for producing a flexible laminate according to any one of claims 14 to 18, wherein the heating and pressurization is carried out at a temperature higher than a glass transition temperature Tg of the thermoplastic polyimide resin to be used. . The method for producing a flexible laminate according to any one of claims 1 to 4, wherein the heating and pressurization is performed by a thermoplastic polyimide film or a sheet or a biaxially stretched thermoplastic. The polyimide film of the polyimide film or the film has a glass transition temperature Tg or higher and a temperature equal to or lower than the melting point. The method for producing a flexible laminate according to any one of claims 1 to 4, wherein the heating and pressing are carried out at a temperature of 300 to 380 °C. The method for producing a flexible laminate according to any one of the above claims, wherein the heating and pressurization is performed at a pressure connected to the heated and pressed material. A felt-like cushioning material is interposed between the plate and the pressure plate of the press machine. The method for producing a flexible laminate according to claim 23, wherein the felt cushioning material is an aromatic polyamine or a polybenzoxazole. -74--74-
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