TW200739267A - Photosensitive transfer material, bulkhead and production method thereof, optical element and production method thereof, and display device - Google Patents

Photosensitive transfer material, bulkhead and production method thereof, optical element and production method thereof, and display device

Info

Publication number
TW200739267A
TW200739267A TW095142914A TW95142914A TW200739267A TW 200739267 A TW200739267 A TW 200739267A TW 095142914 A TW095142914 A TW 095142914A TW 95142914 A TW95142914 A TW 95142914A TW 200739267 A TW200739267 A TW 200739267A
Authority
TW
Taiwan
Prior art keywords
production method
transfer material
bulkhead
display device
optical element
Prior art date
Application number
TW095142914A
Other languages
English (en)
Chinese (zh)
Inventor
Takeshi Ando
Naotaka Wachi
Koichi Kawamura
Yuichi Wakata
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW200739267A publication Critical patent/TW200739267A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Laminated Bodies (AREA)
  • Materials For Photolithography (AREA)
TW095142914A 2005-11-21 2006-11-21 Photosensitive transfer material, bulkhead and production method thereof, optical element and production method thereof, and display device TW200739267A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005336349 2005-11-21
JP2006162702 2006-06-12

Publications (1)

Publication Number Publication Date
TW200739267A true TW200739267A (en) 2007-10-16

Family

ID=38048734

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095142914A TW200739267A (en) 2005-11-21 2006-11-21 Photosensitive transfer material, bulkhead and production method thereof, optical element and production method thereof, and display device

Country Status (5)

Country Link
JP (1) JP4913750B2 (ko)
KR (1) KR20080070809A (ko)
CN (1) CN101313249B (ko)
TW (1) TW200739267A (ko)
WO (1) WO2007058355A1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9122090B2 (en) 2013-10-24 2015-09-01 Chunghwa Picture Tubes, Ltd. Transparent display device

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1961775A4 (en) 2005-12-15 2010-09-01 Asahi Glass Co Ltd FLUORINATED POLYMER, NEGATIVE PHOTOSENSITIVE COMPOSITION AND SEPARATION PARTITION
EP2149803A1 (en) * 2007-05-30 2010-02-03 Asahi Glass Company, Limited Method for producing substrate with partition wall and pixel formed thereon
JP5068603B2 (ja) * 2007-08-22 2012-11-07 富士フイルム株式会社 感光性転写材料、隔壁及びその形成方法、カラーフィルタ及びその製造方法、並びに表示装置
JP5523677B2 (ja) * 2007-09-26 2014-06-18 富士フイルム株式会社 顔料分散組成物、光硬化性組成物、およびカラーフィルタ
US8192802B2 (en) 2007-09-26 2012-06-05 Fujifilm Corporation Photocurable coating composition, and overprint and process for producing same
JP5249588B2 (ja) 2008-01-11 2013-07-31 東京応化工業株式会社 着色感光性樹脂組成物
JP5720395B2 (ja) * 2011-04-20 2015-05-20 大日本印刷株式会社 タッチパネル付カラーフィルタ用保護層形成用組成物
KR102047231B1 (ko) * 2012-12-10 2019-11-21 엘지디스플레이 주식회사 전기영동 표시소자 및 그 제조방법
JP2017167171A (ja) * 2014-08-05 2017-09-21 旭硝子株式会社 感光性樹脂溶液、パターニング膜の形成方法および含フッ素樹脂膜の微細加工方法
KR102071376B1 (ko) 2015-08-31 2020-01-30 후지필름 가부시키가이샤 경화성 조성물, 경화막의 제조 방법, 컬러 필터, 차광막, 고체 촬상 소자 및 화상 표시 장치
KR102567855B1 (ko) * 2017-05-31 2023-08-16 니폰 제온 가부시키가이샤 터치 센서 기재 및 그 제조 방법, 터치 센서 부재 및 그 제조 방법, 그리고, 표시 장치
JP6885518B1 (ja) * 2019-07-22 2021-06-16 三菱ケミカル株式会社 感光性着色樹脂組成物、硬化物、隔壁及び画像表示装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0762761B2 (ja) * 1986-03-28 1995-07-05 富士写真フイルム株式会社 画像形成材料
JP2847720B2 (ja) * 1988-09-20 1999-01-20 東レ株式会社 フォトレジストフィルム
US4963471A (en) * 1989-07-14 1990-10-16 E. I. Du Pont De Nemours And Company Holographic photopolymer compositions and elements for refractive index imaging
JP2001013682A (ja) * 1999-06-30 2001-01-19 Hitachi Chem Co Ltd 感光性エレメント及びこれを用いたカラーフィルタの製造法
JP2002025432A (ja) * 2000-07-04 2002-01-25 Hitachi Chem Co Ltd 誘電体層及び障壁形成用樹脂組成物エレメント及びこれを用いたプラズマディスプレイパネル用基板の製造法
EP1235106B1 (en) * 2001-02-08 2011-12-07 FUJIFILM Corporation Lithographic printing plate precursor
KR20040073286A (ko) * 2001-12-13 2004-08-19 후지 샤신 필름 가부시기가이샤 화상형성재료
JP2003345026A (ja) * 2002-05-24 2003-12-03 Tokyo Ohka Kogyo Co Ltd 反射防止膜形成用塗布液組成物およびこれを用いたホトレジスト積層体、並びにホトレジストパターンの形成方法
JP4310970B2 (ja) * 2002-06-17 2009-08-12 凸版印刷株式会社 カラーフィルターの製造方法
JP3851594B2 (ja) * 2002-07-04 2006-11-29 Ａｚエレクトロニックマテリアルズ株式会社 反射防止コーティング用組成物およびパターン形成方法
JP4129543B2 (ja) * 2002-08-08 2008-08-06 三菱樹脂株式会社 ドライフィルムレジスト用保護フィルム
JP2005064143A (ja) * 2003-08-08 2005-03-10 Seiko Epson Corp レジストパターンの形成方法、配線パターンの形成方法、半導体装置の製造方法、電気光学装置及び電子機器

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9122090B2 (en) 2013-10-24 2015-09-01 Chunghwa Picture Tubes, Ltd. Transparent display device
TWI507775B (zh) * 2013-10-24 2015-11-11 Chunghwa Picture Tubes Ltd 透明顯示裝置

Also Published As

Publication number Publication date
JP4913750B2 (ja) 2012-04-11
JPWO2007058355A1 (ja) 2009-05-07
WO2007058355A1 (ja) 2007-05-24
CN101313249B (zh) 2012-07-11
CN101313249A (zh) 2008-11-26
KR20080070809A (ko) 2008-07-31

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