TW200727077A - Photoresist composition - Google Patents

Photoresist composition

Info

Publication number
TW200727077A
TW200727077A TW095144080A TW95144080A TW200727077A TW 200727077 A TW200727077 A TW 200727077A TW 095144080 A TW095144080 A TW 095144080A TW 95144080 A TW95144080 A TW 95144080A TW 200727077 A TW200727077 A TW 200727077A
Authority
TW
Taiwan
Prior art keywords
resist
groups
organic solvent
cyclohexanol
acetate
Prior art date
Application number
TW095144080A
Other languages
English (en)
Chinese (zh)
Inventor
Tetsunori Tanaka
Katsunori Makizawa
Original Assignee
Daicel Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Chem filed Critical Daicel Chem
Publication of TW200727077A publication Critical patent/TW200727077A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Optical Filters (AREA)
TW095144080A 2005-11-30 2006-11-29 Photoresist composition TW200727077A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005345760A JP2007148258A (ja) 2005-11-30 2005-11-30 レジスト組成物

Publications (1)

Publication Number Publication Date
TW200727077A true TW200727077A (en) 2007-07-16

Family

ID=38125719

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095144080A TW200727077A (en) 2005-11-30 2006-11-29 Photoresist composition

Country Status (4)

Country Link
JP (1) JP2007148258A (ja)
KR (1) KR101405696B1 (ja)
CN (1) CN1975572B (ja)
TW (1) TW200727077A (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4835210B2 (ja) * 2006-03-10 2011-12-14 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物、カラーフィルタおよびカラーフィルタの製造方法
JP4904869B2 (ja) * 2006-03-22 2012-03-28 Ｊｓｒ株式会社 着色層形成用感放射線性組成物およびカラーフィルタ
CN101501570B (zh) * 2006-08-04 2012-07-25 东友精化股份有限公司 光刻胶组成物及其图案化方法
JP5224030B2 (ja) * 2007-03-22 2013-07-03 Ｊｓｒ株式会社 熱硬化性樹脂組成物、保護膜および保護膜の形成方法
JP5083520B2 (ja) * 2007-07-17 2012-11-28 Ｊｓｒ株式会社 感放射線性樹脂組成物、液晶表示用スペーサーおよび液晶表示素子
JP5061792B2 (ja) * 2007-08-21 2012-10-31 住友ベークライト株式会社 ポジ型感光性樹脂組成物、硬化膜、保護膜、絶縁膜およびそれを用いた半導体装置、表示体装置。
KR101113019B1 (ko) * 2008-01-24 2012-02-13 주식회사 엘지화학 포지티브형 블랙 포토레지스트 조성물
JP4593638B2 (ja) * 2008-02-18 2010-12-08 ダイセル化学工業株式会社 エステル系溶剤の製造方法
JP5422198B2 (ja) * 2008-12-25 2014-02-19 東京応化工業株式会社 レジスト組成物、およびレジストパターン形成方法
JP2010275327A (ja) * 2010-09-15 2010-12-09 Daicel Chem Ind Ltd エステル系溶剤

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0667420A (ja) * 1992-08-19 1994-03-11 Nippon Zeon Co Ltd ポジ型レジスト組成物
JPH086244A (ja) * 1994-06-17 1996-01-12 Shin Etsu Chem Co Ltd 感放射線性レジスト組成物
JPH0992594A (ja) * 1995-09-25 1997-04-04 Sony Corp 塗布膜の形成方法
JP2000181069A (ja) * 1998-10-05 2000-06-30 Tonen Corp 感光性ポリシラザン組成物及びパタ―ン化されたポリシラザン膜の形成方法
JP4623452B2 (ja) * 2000-02-09 2011-02-02 旭化成イーマテリアルズ株式会社 赤外線感受性層を形成する為の塗工液
JP2004191404A (ja) * 2002-12-06 2004-07-08 Hitachi Chemical Dupont Microsystems Ltd 超厚膜用感光性ポリイミド前駆体組成物
JP4317772B2 (ja) * 2004-02-20 2009-08-19 富士フイルム株式会社 液浸露光用レジスト組成物及びそれを用いたパターン形成方法
JP4365235B2 (ja) * 2004-02-20 2009-11-18 富士フイルム株式会社 液浸露光用レジスト組成物及びそれを用いたパターン形成方法

Also Published As

Publication number Publication date
CN1975572B (zh) 2011-07-20
CN1975572A (zh) 2007-06-06
JP2007148258A (ja) 2007-06-14
KR20070057004A (ko) 2007-06-04
KR101405696B1 (ko) 2014-06-10

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