TW200726291A - Capacitive microphone and method for making the same - Google Patents

Capacitive microphone and method for making the same

Info

Publication number
TW200726291A
TW200726291A TW094147532A TW94147532A TW200726291A TW 200726291 A TW200726291 A TW 200726291A TW 094147532 A TW094147532 A TW 094147532A TW 94147532 A TW94147532 A TW 94147532A TW 200726291 A TW200726291 A TW 200726291A
Authority
TW
Taiwan
Prior art keywords
backplate
diaphragm
making
distance
same
Prior art date
Application number
TW094147532A
Other languages
English (en)
Other versions
TWI293851B (en
Inventor
Jen-Yi Chen
Original Assignee
Ind Tech Res Inst
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ind Tech Res Inst filed Critical Ind Tech Res Inst
Priority to TW094147532A priority Critical patent/TWI293851B/zh
Priority to US11/541,632 priority patent/US7912235B2/en
Publication of TW200726291A publication Critical patent/TW200726291A/zh
Application granted granted Critical
Publication of TWI293851B publication Critical patent/TWI293851B/zh
Priority to US13/027,457 priority patent/US8468665B2/en

Links

Classifications

    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04RLOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R19/00Electrostatic transducers
    • H04R19/04Microphones
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/43Electric condenser making
    • Y10T29/435Solid dielectric type
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49005Acoustic transducer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/4902Electromagnet, transformer or inductor
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/4902Electromagnet, transformer or inductor
    • Y10T29/4908Acoustic transducer
TW094147532A 2005-12-30 2005-12-30 Capacitive microphone and method for making the same TWI293851B (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
TW094147532A TWI293851B (en) 2005-12-30 2005-12-30 Capacitive microphone and method for making the same
US11/541,632 US7912235B2 (en) 2005-12-30 2006-10-03 Capacitive microphone and method for making the same
US13/027,457 US8468665B2 (en) 2005-12-30 2011-02-15 Methods for making capacitive microphone

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW094147532A TWI293851B (en) 2005-12-30 2005-12-30 Capacitive microphone and method for making the same

Publications (2)

Publication Number Publication Date
TW200726291A true TW200726291A (en) 2007-07-01
TWI293851B TWI293851B (en) 2008-02-21

Family

ID=38289919

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094147532A TWI293851B (en) 2005-12-30 2005-12-30 Capacitive microphone and method for making the same

Country Status (2)

Country Link
US (2) US7912235B2 (zh)
TW (1) TWI293851B (zh)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI425842B (zh) * 2008-02-20 2014-02-01 無專用背板之矽麥克風
TWI575963B (zh) * 2014-02-27 2017-03-21 先技股份有限公司 微機電麥克風裝置
TWI607954B (zh) * 2013-02-05 2017-12-11 羅伯特博斯奇股份有限公司 具有膜構造的微機械構件
CN108100988A (zh) * 2017-12-19 2018-06-01 苏州工业园区纳米产业技术研究院有限公司 硅片背腔刻蚀方法及硅片器件

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DE102005004877A1 (de) * 2005-02-03 2006-08-10 Robert Bosch Gmbh Mikromechanisches Bauelement und entsprechendes Herstellungsverfahren
US8644528B2 (en) * 2007-02-20 2014-02-04 Case Western Reserve University Microfabricated microphone
US8121315B2 (en) * 2007-03-21 2012-02-21 Goer Tek Inc. Condenser microphone chip
JP5029147B2 (ja) * 2007-06-04 2012-09-19 オムロン株式会社 音響センサ
JP5034692B2 (ja) * 2007-06-04 2012-09-26 オムロン株式会社 音響センサ
TW200919593A (en) * 2007-10-18 2009-05-01 Asia Pacific Microsystems Inc Elements and modules with micro caps and wafer level packaging method thereof
US8258591B2 (en) * 2008-01-16 2012-09-04 Solid State System Co., Ltd. Micro-electro-mechanical systems (MEMS) device
WO2009101757A1 (ja) * 2008-02-14 2009-08-20 Panasonic Corporation コンデンサマイクロホン及びmemsデバイス
JP2009231951A (ja) * 2008-03-19 2009-10-08 Panasonic Corp マイクロホン装置
DE102008026886B4 (de) * 2008-06-05 2016-04-28 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Strukturierung einer Nutzschicht eines Substrats
US7951636B2 (en) * 2008-09-22 2011-05-31 Solid State System Co. Ltd. Method for fabricating micro-electro-mechanical system (MEMS) device
US8263426B2 (en) * 2008-12-03 2012-09-11 Electronics And Telecommunications Research Institute High-sensitivity z-axis vibration sensor and method of fabricating the same
CN101841756A (zh) * 2010-03-29 2010-09-22 瑞声声学科技(深圳)有限公司 振膜及应用该振膜的硅电容麦克风
US8368153B2 (en) * 2010-04-08 2013-02-05 United Microelectronics Corp. Wafer level package of MEMS microphone and manufacturing method thereof
US8625823B2 (en) * 2011-07-12 2014-01-07 Robert Bosch Gmbh MEMS microphone overtravel stop structure
US9258652B2 (en) * 2011-11-18 2016-02-09 Chuan-Wei Wang Microphone structure
US8987842B2 (en) * 2012-09-14 2015-03-24 Solid State System Co., Ltd. Microelectromechanical system (MEMS) device and fabrication method thereof
US9338559B2 (en) * 2013-04-16 2016-05-10 Invensense, Inc. Microphone system with a stop member
DE102013224718A1 (de) * 2013-12-03 2015-06-03 Robert Bosch Gmbh MEMS-Mikrofonbauelement und Vorrichtung mit einem solchen MEMS-Mikrofonbauelement
JP6252767B2 (ja) * 2014-03-14 2017-12-27 オムロン株式会社 静電容量型トランスデューサ
JP6311375B2 (ja) * 2014-03-14 2018-04-18 オムロン株式会社 静電容量型トランスデューサ
US20150296306A1 (en) * 2014-04-10 2015-10-15 Knowles Electronics, Llc. Mems motors having insulated substrates
US9369804B2 (en) 2014-07-28 2016-06-14 Robert Bosch Gmbh MEMS membrane overtravel stop
CN105621346B (zh) * 2014-11-04 2017-08-25 中芯国际集成电路制造(上海)有限公司 Mems器件及其形成方法
KR101692717B1 (ko) * 2015-12-01 2017-01-04 주식회사 비에스이센서스 정전용량형 멤스 마이크로폰 및 그 제조방법
CN106115602B (zh) * 2016-07-01 2017-10-31 杭州士兰集成电路有限公司 Mems器件及其制造方法
CN206341349U (zh) * 2016-10-25 2017-07-18 瑞声科技(新加坡)有限公司 麦克风
CN108124227B (zh) * 2016-11-29 2020-04-28 中芯国际集成电路制造(北京)有限公司 麦克风及其制造方法
CN108313975B (zh) 2017-01-16 2019-12-13 中芯国际集成电路制造(上海)有限公司 半导体装置及其制造方法
DE102017204006B3 (de) 2017-03-10 2018-08-02 Infineon Technologies Ag MEMS-Schallwandler, MEMS-Mikrophon und Verfahren zum Bereitstellen eines MEMS-Schallwandlers
DE102017209495B9 (de) 2017-06-06 2022-11-10 Infineon Technologies Ag MEMS-Schallwandler, MEMS-Mikrofon und Verfahren zum Bereitstellen eines MEMS-Schallwandlers
CN110012409A (zh) * 2018-12-31 2019-07-12 瑞声科技(新加坡)有限公司 Mems麦克风制造方法
CN111491244B (zh) * 2020-03-16 2021-11-16 歌尔微电子有限公司 一种mems麦克风的加工方法和mems麦克风
CN112408312B (zh) * 2021-01-20 2021-05-14 中芯集成电路制造(绍兴)有限公司 Mems器件的制造方法及mems器件
CN216752082U (zh) * 2021-12-20 2022-06-14 瑞声声学科技(深圳)有限公司 Mems麦克风芯片

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5146435A (en) 1989-12-04 1992-09-08 The Charles Stark Draper Laboratory, Inc. Acoustic transducer
DE4329993A1 (de) 1993-09-04 1995-03-09 Sennheiser Electronic Elektro-akustischer kapazitiver Wandler, insbesondere Elektret-Kondensator-Mikrofon
US5889872A (en) 1996-07-02 1999-03-30 Motorola, Inc. Capacitive microphone and method therefor
JPH11127498A (ja) 1997-08-13 1999-05-11 Katsuro Matsumura 静電容量型マイクロホン
US6535460B2 (en) 2000-08-11 2003-03-18 Knowles Electronics, Llc Miniature broadband acoustic transducer
US6847090B2 (en) 2001-01-24 2005-01-25 Knowles Electronics, Llc Silicon capacitive microphone
US20060008098A1 (en) * 2004-07-07 2006-01-12 Tu Xiang Z Single crystal silicon micromachined capacitive microphone
CN100379324C (zh) 2005-01-10 2008-04-02 安捷利(番禺)电子实业有限公司 挠性印制电路的湿法贴膜方法
US20060280319A1 (en) * 2005-06-08 2006-12-14 General Mems Corporation Micromachined Capacitive Microphone

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI425842B (zh) * 2008-02-20 2014-02-01 無專用背板之矽麥克風
TWI607954B (zh) * 2013-02-05 2017-12-11 羅伯特博斯奇股份有限公司 具有膜構造的微機械構件
TWI575963B (zh) * 2014-02-27 2017-03-21 先技股份有限公司 微機電麥克風裝置
CN108100988A (zh) * 2017-12-19 2018-06-01 苏州工业园区纳米产业技术研究院有限公司 硅片背腔刻蚀方法及硅片器件

Also Published As

Publication number Publication date
US20070154040A1 (en) 2007-07-05
US20110131794A1 (en) 2011-06-09
US7912235B2 (en) 2011-03-22
US8468665B2 (en) 2013-06-25
TWI293851B (en) 2008-02-21

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