TW200724294A - Planar carrying stage device - Google Patents

Planar carrying stage device

Info

Publication number
TW200724294A
TW200724294A TW095135225A TW95135225A TW200724294A TW 200724294 A TW200724294 A TW 200724294A TW 095135225 A TW095135225 A TW 095135225A TW 95135225 A TW95135225 A TW 95135225A TW 200724294 A TW200724294 A TW 200724294A
Authority
TW
Taiwan
Prior art keywords
planar plate
planar
supporting member
carrying stage
stage device
Prior art date
Application number
TW095135225A
Other languages
English (en)
Other versions
TWI365117B (zh
Inventor
Yoneta Tanaka
Original Assignee
Ushio Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Electric Inc filed Critical Ushio Electric Inc
Publication of TW200724294A publication Critical patent/TW200724294A/zh
Application granted granted Critical
Publication of TWI365117B publication Critical patent/TWI365117B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/25—Movable or adjustable work or tool supports
    • B23Q1/26—Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members
    • B23Q1/38—Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members using fluid bearings or fluid cushion supports
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q5/00—Driving or feeding mechanisms; Control arrangements therefor
    • B23Q5/22—Feeding members carrying tools or work
    • B23Q5/26—Fluid-pressure drives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q5/00—Driving or feeding mechanisms; Control arrangements therefor
    • B23Q5/22—Feeding members carrying tools or work
    • B23Q5/28—Electric drives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Magnetic Bearings And Hydrostatic Bearings (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Machine Tool Units (AREA)
TW095135225A 2005-12-22 2006-09-22 Planar carrying stage device TW200724294A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005369959A JP4899469B2 (ja) 2005-12-22 2005-12-22 平面ステージ装置

Publications (2)

Publication Number Publication Date
TW200724294A true TW200724294A (en) 2007-07-01
TWI365117B TWI365117B (zh) 2012-06-01

Family

ID=38184503

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095135225A TW200724294A (en) 2005-12-22 2006-09-22 Planar carrying stage device

Country Status (4)

Country Link
JP (1) JP4899469B2 (zh)
KR (1) KR101076950B1 (zh)
CN (1) CN1987661B (zh)
TW (1) TW200724294A (zh)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI409499B (zh) * 2007-10-19 2013-09-21 Hon Hai Prec Ind Co Ltd 顯微鏡用載物台
TWI463125B (zh) * 2011-12-23 2014-12-01 Stone & Resource Ind R & D Ct Membrane Rigidity Testing Platform for Air Floating Plane Bearing and Its Application
TWI821323B (zh) * 2018-08-30 2023-11-11 日商住友重機械工業股份有限公司 載台裝置

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4702083B2 (ja) * 2006-02-10 2011-06-15 ウシオ電機株式会社 ＸＹθ移動ステージ
US8988881B2 (en) 2007-12-18 2015-03-24 Sandia Corporation Heat exchanger device and method for heat removal or transfer
WO2010016963A1 (en) * 2008-08-04 2010-02-11 Sandia National Laboratories Heat exchanger device and method for heat removal or transfer
US9207023B2 (en) 2007-12-18 2015-12-08 Sandia Corporation Heat exchanger device and method for heat removal or transfer
JP2012533439A (ja) * 2009-07-17 2012-12-27 サマック，ロバート，エー 自動調整可能な工作機械加工物搭載装置
US9261100B2 (en) 2010-08-13 2016-02-16 Sandia Corporation Axial flow heat exchanger devices and methods for heat transfer using axial flow devices
JP2012151418A (ja) * 2011-01-21 2012-08-09 Topcon Corp 吸着ステージ
DE102011005157A1 (de) * 2011-03-04 2012-09-27 JRT Photovoltaics GmbH & Co. KG Bearbeitungsstation für flächige Substrate, insbesondere Solarzellen
CN106575086B (zh) * 2014-08-01 2018-05-18 株式会社村田制作所 直写型曝光装置
KR20170008127A (ko) 2015-07-13 2017-01-23 박용문 한지 섬유를 이용한 방탄 제품
CN207424529U (zh) * 2017-07-31 2018-05-29 东莞科视自动化科技有限公司 全自动曝光机接料装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6561870B2 (en) * 2001-03-30 2003-05-13 Lam Research Corporation Adjustable force applying air platen and spindle system, and methods for using the same
JP4122922B2 (ja) * 2002-10-18 2008-07-23 ウシオ電機株式会社 平面ステージ装置
CN2608939Y (zh) * 2003-02-26 2004-03-31 台智精密科技股份有限公司 三维测量仪
JP2005083789A (ja) 2003-09-05 2005-03-31 Sumitomo Heavy Ind Ltd ステージ装置
JP2005268608A (ja) 2004-03-19 2005-09-29 Sumitomo Heavy Ind Ltd ステージ装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI409499B (zh) * 2007-10-19 2013-09-21 Hon Hai Prec Ind Co Ltd 顯微鏡用載物台
TWI463125B (zh) * 2011-12-23 2014-12-01 Stone & Resource Ind R & D Ct Membrane Rigidity Testing Platform for Air Floating Plane Bearing and Its Application
TWI821323B (zh) * 2018-08-30 2023-11-11 日商住友重機械工業股份有限公司 載台裝置

Also Published As

Publication number Publication date
KR20070066850A (ko) 2007-06-27
CN1987661A (zh) 2007-06-27
JP2007171015A (ja) 2007-07-05
TWI365117B (zh) 2012-06-01
JP4899469B2 (ja) 2012-03-21
CN1987661B (zh) 2011-06-08
KR101076950B1 (ko) 2011-10-26

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees