TWI365117B - - Google Patents
Info
- Publication number
- TWI365117B TWI365117B TW095135225A TW95135225A TWI365117B TW I365117 B TWI365117 B TW I365117B TW 095135225 A TW095135225 A TW 095135225A TW 95135225 A TW95135225 A TW 95135225A TW I365117 B TWI365117 B TW I365117B
- Authority
- TW
- Taiwan
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
- B23Q1/25—Movable or adjustable work or tool supports
- B23Q1/26—Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members
- B23Q1/38—Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members using fluid bearings or fluid cushion supports
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q5/00—Driving or feeding mechanisms; Control arrangements therefor
- B23Q5/22—Feeding members carrying tools or work
- B23Q5/26—Fluid-pressure drives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q5/00—Driving or feeding mechanisms; Control arrangements therefor
- B23Q5/22—Feeding members carrying tools or work
- B23Q5/28—Electric drives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7007—Alignment other than original with workpiece
- G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
Landscapes
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Details Of Measuring And Other Instruments (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Magnetic Bearings And Hydrostatic Bearings (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Machine Tool Units (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005369959A JP4899469B2 (ja) | 2005-12-22 | 2005-12-22 | 平面ステージ装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200724294A TW200724294A (en) | 2007-07-01 |
TWI365117B true TWI365117B (zh) | 2012-06-01 |
Family
ID=38184503
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095135225A TW200724294A (en) | 2005-12-22 | 2006-09-22 | Planar carrying stage device |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4899469B2 (zh) |
KR (1) | KR101076950B1 (zh) |
CN (1) | CN1987661B (zh) |
TW (1) | TW200724294A (zh) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4702083B2 (ja) * | 2006-02-10 | 2011-06-15 | ウシオ電機株式会社 | XYθ移動ステージ |
TWI409499B (zh) * | 2007-10-19 | 2013-09-21 | Hon Hai Prec Ind Co Ltd | 顯微鏡用載物台 |
US8988881B2 (en) | 2007-12-18 | 2015-03-24 | Sandia Corporation | Heat exchanger device and method for heat removal or transfer |
US9207023B2 (en) | 2007-12-18 | 2015-12-08 | Sandia Corporation | Heat exchanger device and method for heat removal or transfer |
WO2010016963A1 (en) * | 2008-08-04 | 2010-02-11 | Sandia National Laboratories | Heat exchanger device and method for heat removal or transfer |
KR20120036954A (ko) * | 2009-07-17 | 2012-04-18 | 로버트 에이. 사막 | 자동화되고 조절가능한, 공작기계 가공물 장착 장치 |
US9261100B2 (en) | 2010-08-13 | 2016-02-16 | Sandia Corporation | Axial flow heat exchanger devices and methods for heat transfer using axial flow devices |
JP2012151418A (ja) * | 2011-01-21 | 2012-08-09 | Topcon Corp | 吸着ステージ |
DE102011005157A1 (de) * | 2011-03-04 | 2012-09-27 | JRT Photovoltaics GmbH & Co. KG | Bearbeitungsstation für flächige Substrate, insbesondere Solarzellen |
TWI463125B (zh) * | 2011-12-23 | 2014-12-01 | Stone & Resource Ind R & D Ct | Membrane Rigidity Testing Platform for Air Floating Plane Bearing and Its Application |
CN106575086B (zh) * | 2014-08-01 | 2018-05-18 | 株式会社村田制作所 | 直写型曝光装置 |
KR20170008127A (ko) | 2015-07-13 | 2017-01-23 | 박용문 | 한지 섬유를 이용한 방탄 제품 |
CN207424530U (zh) * | 2017-07-31 | 2018-05-29 | 东莞科视自动化科技有限公司 | 全自动曝光机取料装置 |
WO2020044685A1 (ja) * | 2018-08-30 | 2020-03-05 | 住友重機械工業株式会社 | ステージ装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6561870B2 (en) * | 2001-03-30 | 2003-05-13 | Lam Research Corporation | Adjustable force applying air platen and spindle system, and methods for using the same |
JP4122922B2 (ja) * | 2002-10-18 | 2008-07-23 | ウシオ電機株式会社 | 平面ステージ装置 |
CN2608939Y (zh) * | 2003-02-26 | 2004-03-31 | 台智精密科技股份有限公司 | 三维测量仪 |
JP2005083789A (ja) | 2003-09-05 | 2005-03-31 | Sumitomo Heavy Ind Ltd | ステージ装置 |
JP2005268608A (ja) | 2004-03-19 | 2005-09-29 | Sumitomo Heavy Ind Ltd | ステージ装置 |
-
2005
- 2005-12-22 JP JP2005369959A patent/JP4899469B2/ja not_active Expired - Fee Related
-
2006
- 2006-09-22 TW TW095135225A patent/TW200724294A/zh not_active IP Right Cessation
- 2006-10-23 KR KR1020060102740A patent/KR101076950B1/ko active IP Right Grant
- 2006-12-22 CN CN2006101701466A patent/CN1987661B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
TW200724294A (en) | 2007-07-01 |
CN1987661A (zh) | 2007-06-27 |
JP2007171015A (ja) | 2007-07-05 |
KR101076950B1 (ko) | 2011-10-26 |
KR20070066850A (ko) | 2007-06-27 |
CN1987661B (zh) | 2011-06-08 |
JP4899469B2 (ja) | 2012-03-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |