TW200720842A - A squarilium compound and the short-wave length source photo polymerization composition using thereof - Google Patents

A squarilium compound and the short-wave length source photo polymerization composition using thereof

Info

Publication number
TW200720842A
TW200720842A TW095138663A TW95138663A TW200720842A TW 200720842 A TW200720842 A TW 200720842A TW 095138663 A TW095138663 A TW 095138663A TW 95138663 A TW95138663 A TW 95138663A TW 200720842 A TW200720842 A TW 200720842A
Authority
TW
Taiwan
Prior art keywords
short
wave length
polymerization composition
photo polymerization
length source
Prior art date
Application number
TW095138663A
Other languages
Chinese (zh)
Inventor
Yutaka Osedo
Junzo Yamano
Original Assignee
Kyowa Hakko Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyowa Hakko Chemical Co Ltd filed Critical Kyowa Hakko Chemical Co Ltd
Publication of TW200720842A publication Critical patent/TW200720842A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C225/00—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones
    • C07C225/20—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to carbon atoms of rings other than six-membered aromatic rings of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C225/00—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones
    • C07C225/22—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/08—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms
    • C07D295/096—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms with the ring nitrogen atoms and the oxygen or sulfur atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/12—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms
    • C07D295/135—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00—Other synthetic dyes of known constitution
    • C09B57/007—Squaraine dyes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/04—Systems containing only non-condensed rings with a four-membered ring

Abstract

[subject] The present invention provides a short-wave length source light photo polymerization composition having an excellent photosensitivity to the short-wave length source light. [solution] A photo polymerization composition, which contains a squarilium compound of the following formula (I), [wherein, R1 and R2 may be the same or different, each represents a hydrogen atom or an optionally substituted alkyl group, etc., X represents a group of the formula (A): (wherein, R3 represents a phenyl group etc., R4 represents a methyl group or an ethyl group, R5, R6 , R7, and R8 may be the same or different, each represents a hydrogen atom or an optionally substituted alkyl group, etc.) etc.], and a radical initiator and a compound having an ethylenic unsaturated double bond.
TW095138663A 2005-10-24 2006-10-20 A squarilium compound and the short-wave length source photo polymerization composition using thereof TW200720842A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005308892 2005-10-24

Publications (1)

Publication Number Publication Date
TW200720842A true TW200720842A (en) 2007-06-01

Family

ID=37967691

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095138663A TW200720842A (en) 2005-10-24 2006-10-20 A squarilium compound and the short-wave length source photo polymerization composition using thereof

Country Status (3)

Country Link
JP (1) JPWO2007049579A1 (en)
TW (1) TW200720842A (en)
WO (1) WO2007049579A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100065112A1 (en) 2008-09-15 2010-03-18 Thompson Mark E Organic Photosensitive Devices Comprising a Squaraine Containing Organoheterojunction and Methods of Making Same
JP5550136B2 (en) * 2010-03-05 2014-07-16 カーリットホールディングス株式会社 Photosensitive composition for blue-violet semiconductor laser
CA2826909A1 (en) 2011-02-09 2012-08-16 The Regents Of The University Of Michigan Organic photosensitive devices comprising aryl squaraines and methods of making the same
JP5646426B2 (en) * 2011-09-30 2014-12-24 富士フイルム株式会社 Colored photosensitive composition, color filter, method for producing the same, and liquid crystal display device
JP6126851B2 (en) * 2013-01-28 2017-05-10 カーリットホールディングス株式会社 UV curable resin composition
JP6151033B2 (en) * 2013-01-28 2017-06-21 カーリットホールディングス株式会社 UV curable resin composition
JP6509600B2 (en) * 2015-03-17 2019-05-08 株式会社日本触媒 Method for producing cured product containing oxocarbon compound

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5147758A (en) * 1991-02-19 1992-09-15 E. I. Du Pont De Nemours And Company Red sensitive photopolymerizable compositions
JP2871181B2 (en) * 1991-07-09 1999-03-17 ブラザー工業株式会社 Photocurable composition
JP3404046B2 (en) * 1994-09-21 2003-05-06 協和醗酵工業株式会社 Photopolymerizable composition containing squarylium compound
JPH09127694A (en) * 1995-10-31 1997-05-16 Mitsubishi Chem Corp Photopolymerizable composition
US6599605B2 (en) * 1999-12-16 2003-07-29 Kyowa Hakko Kogyo Co., Ltd. Squarylium compounds and optical recording media using the same
JP4183918B2 (en) * 2001-02-14 2008-11-19 株式会社リコー Optical recording medium and optical recording method using the same
JP4156215B2 (en) * 2001-06-14 2008-09-24 株式会社リコー Optical recording medium, optical recording method and optical recording apparatus using the same
WO2003085005A1 (en) * 2002-04-08 2003-10-16 Kyowa Hakko Chemical Co., Ltd. Photopolymerizable composition
JP2005319728A (en) * 2004-05-11 2005-11-17 Ricoh Co Ltd Optical recording medium, reproducing method and optical recording device employing same
JPWO2006041155A1 (en) * 2004-10-14 2008-05-22 協和発酵ケミカル株式会社 SQUARYLIUM COMPOUND AND PHOTOELECTRIC CONVERSION MATERIAL, PHOTOELECTRIC CONVERSION ELEMENT AND PHOTOELECTROCHEMICAL CELL USING THE SAME
WO2006041156A1 (en) * 2004-10-14 2006-04-20 Kyowa Hakko Chemical Co., Ltd. Squarylium compound, photo-electric converting material comprising the same, photo-electric converting element, and photoelectrochemical cell

Also Published As

Publication number Publication date
JPWO2007049579A1 (en) 2009-04-30
WO2007049579A1 (en) 2007-05-03

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