TW200707094A - Colored photosensitive resin composition - Google Patents

Colored photosensitive resin composition

Info

Publication number
TW200707094A
TW200707094A TW095124270A TW95124270A TW200707094A TW 200707094 A TW200707094 A TW 200707094A TW 095124270 A TW095124270 A TW 095124270A TW 95124270 A TW95124270 A TW 95124270A TW 200707094 A TW200707094 A TW 200707094A
Authority
TW
Taiwan
Prior art keywords
resin composition
formula
photosensitive resin
colored photosensitive
photo
Prior art date
Application number
TW095124270A
Other languages
Chinese (zh)
Inventor
Koji Ichikawa
Yuji Akiyama
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of TW200707094A publication Critical patent/TW200707094A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Abstract

To provided is a colored photosensitive resin composition comprising (A) color agent, (B) binder resin, (C) photo-polymerization compound, (D) photo-polymerization initiator, (E) solvent, and (F) at least one compound selected from the group consisting of the compound represented by formula (I-1) or the compound represented by formula (I-2), [in formula (I-1) and formula (I-2), R1 and R2 each independently represent a hydrogen atom or a C1-C4 alkyl, p represents an integer above 4 and below 90, q, r, and s each independently represent an integer above 1 and below 4.]
TW095124270A 2005-07-29 2006-07-04 Colored photosensitive resin composition TW200707094A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005220345 2005-07-29

Publications (1)

Publication Number Publication Date
TW200707094A true TW200707094A (en) 2007-02-16

Family

ID=37674026

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095124270A TW200707094A (en) 2005-07-29 2006-07-04 Colored photosensitive resin composition

Country Status (3)

Country Link
KR (1) KR20070014999A (en)
CN (1) CN1904735A (en)
TW (1) TW200707094A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI459049B (en) * 2008-06-06 2014-11-01 Jsr Corp Coloring composition for forming red pixel, color filter and color liquid crystal display element

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100803899B1 (en) * 2007-02-13 2008-02-15 동우 화인켐 주식회사 A colored photosensitive resin composition, patterning method thereof, color filter, liquid crystal display device and imaging device having the same
KR101373895B1 (en) * 2007-04-13 2014-03-12 동우 화인켐 주식회사 A colored photosensitive resin composition, color filter, liquid display device and imaging device having the same
KR100904068B1 (en) * 2007-09-04 2009-06-23 제일모직주식회사 Photosensitive resin composition for color filter and color filter using same
KR101401487B1 (en) * 2008-02-05 2014-06-03 동우 화인켐 주식회사 Colored photosensitive resin composition, and color filter and liquid crystal display device prepared by using the same
JP5439860B2 (en) * 2008-03-06 2014-03-12 住友化学株式会社 Colored photosensitive resin composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI459049B (en) * 2008-06-06 2014-11-01 Jsr Corp Coloring composition for forming red pixel, color filter and color liquid crystal display element

Also Published As

Publication number Publication date
CN1904735A (en) 2007-01-31
KR20070014999A (en) 2007-02-01

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