CN1904735A - Painted photosensitive resin composition - Google Patents

Painted photosensitive resin composition Download PDF

Info

Publication number
CN1904735A
CN1904735A CNA200610107559XA CN200610107559A CN1904735A CN 1904735 A CN1904735 A CN 1904735A CN A200610107559X A CNA200610107559X A CN A200610107559XA CN 200610107559 A CN200610107559 A CN 200610107559A CN 1904735 A CN1904735 A CN 1904735A
Authority
CN
China
Prior art keywords
compound
acid
photosensitive composition
mass parts
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA200610107559XA
Other languages
Chinese (zh)
Inventor
市川幸司
秋山裕次
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Publication of CN1904735A publication Critical patent/CN1904735A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

Provided is a colored photosensitive resin composition comprising (A) a colorant, (B) a binder resin, (C) a photopolymerizable compound, (D) a photopolymerization initiator, (E) a solvent and (F) at least one compound selected from the compounds represented by the formula (I-1) and (I-2), wherein R1 and R2 are separately represent H or alkyls with 1-4 carbon atoms; p represents a integer >=4 and <=90; q, r and s are separately represent integers >=1 and <=40.

Description

Photosensitive composition
Technical field
The present invention relates to photosensitive composition.
Background technology
In recent years, the color filter that uses in the imaging sensors such as CCD, CMOS develops to high pixelation, requires to improve resolution, and reduces thickness.But, contain the photosensitive composition formation color filter of pigment if use as colorant, reduce the thickness of color filter, and obtain identical colour saturation, the essential pigment concentration that improves in the photosensitive composition, when using said composition to form pattern, there is the problem (opening flat 8-271723 communique with reference to the spy, 2 pages of right hurdles of the 2nd page of right hurdle the 4th row-Di the 10th row) of development residue in non-pixel portion.
In order to find the photosensitive composition few as above-mentioned problem, the inventor studies, found that the photosensitive composition that contains certain compound, when using said composition to form pattern, because the development residue of non-pixel portion is few, so can obtain transmissivity height and the good color filter of pattern tack.
Summary of the invention
The object of the present invention is to provide the photosensitive composition that can be formed on the color filter that residue is few, the pattern tack is good of non-pixel portions when forming pattern.
Just the invention provides the content of following [1]～[7].
[1]. a kind of photosensitive composition, its contain (A) colorant, (B) adhesive resin, (C) optical polymerism compound, (D) Photoepolymerizationinitiater initiater, (E) solvent and (F) be selected from the compound of formula (I-1) expression and the compound of formula (I-2) expression at least a compound.
Figure A20061010755900051
[in formula (I-1) and the formula (I-2), R 1And R 2Independent separately, represent that respectively hydrogen atom or carbon number are 1～4 alkyl; P represents more than 4 or 4～integer below 90 or 90; Q, r and s are independent separately, represent respectively more than 1 or 1～integer below 40 or 40.]
[2] .[1] described composition, wherein, with respect to the photosensitive composition solid constituent, (F) content that is selected from least a compound in the compound of the compound of formula (I-1) expression and formula (I-2) expression is 5.0 quality % or below the 5.0 quality % by quality ratio.
[3] .[1] or [2] described composition, wherein, with respect to the photosensitive composition solid constituent, (F) content that is selected from least a compound in the compound of the compound of formula (I-1) expression and formula (I-2) expression is 0.0010 quality % or 0.0010 quality % by quality ratio above～4.8 quality % or below the 4.8 quality %.
[4] .[1]～[3] in any described composition, wherein, (F) the polystyrene conversion weight-average molecular weight that is selected from least a compound in the compound of the compound of formula (I-1) expression and formula (I-2) expression be more than 300 or 300～below 5,000 or 5,000.
[5]. use any pattern that described composition forms in [1]～[4].
[6]. contain the color filter of [5] described pattern.
[7]. possess the imaging sensor of [6] described color filter.
Embodiment
As employed among the present invention (A) colorant, can enumerate being selected from least a in pigment and the dyestuff.
As pigment, specifically can be set forth in the compound that is categorized as pigment among the カ ラ one イ Application デ Star Network ス (Colour Index) (TheSociety of Dyers and Colourists publication).
Specifically can enumerate yellow uitramarines such as C.I. pigment yellow 1,3,12,13,14,15,16,17,20,24,31,53,83,86,93,94,109,110,117,125,128,137,138,139,147,148,150,153,154,166,173,194,214; C.I. pigment orange 13,31,36,38,40,42,43,51,55,59,61,64,65,71, orange pigments such as 73;
C.I. Pigment Red 9,97,105,122,123,144,149,166,168,176,177,180,192,209,215,216,224,242,254,255,264, red pigments such as 265;
C.I. pigment blue 15,15:3,15:4,15:6, blue pigments such as 60;
C.I. pigment violet 1,19,23,29,32,36, violet pigments such as 38;
C.I. pigment Green 7, viridine greens such as 36;
C.I. brown such as pigment brown 23,25;
C.I. black pigment such as pigment black 1,7 etc.
Wherein preferably contain and be selected from C.I. pigment yellow 13 8,139,150; C.I. paratonere 177,209,254; C.I. pigment Violet 23; C.I. pigment blue 15: 3, the pigment of at least a pigment in 15:6 and the C.I. pigment Green 7,36.
Can enumerate as acid dyes and sulfamide derivative and oil-soluble dyes as dyestuff.As preferred dyestuff, can enumerate C.I. acid blue 83, C.I. acid blue 90, C.I. acid green 9, C.I. acid green 16, C.I solvent yellow 82, C.I. solvent yellow 16 2, C.I solvent orange 56, C.I solvent blue 67.
Can also use the compound of general formula (IV) expression.
D[(-SO 2N(R 8)R 9) n] (IV)
In the formula (IV), D is dye matrix such as pyridone, xanthene, triphenyl methane, azo, anthraquinone, pyrazolone and phthalocyanine.
N represents 1～4 integer.
R 8And R 9Independent separately, represent respectively hydrogen atom, the carbon number that can be replaced by oxygen atom be 1～20 aliphatic alkyl, carbon number be the carbon number of 3～10 alicyclic alkyl, moieties be 1～4 alkyl-cyclohexyl, carbon number be 3～15 aliphatics alkoxyalkyl, carbon number be the carbon number of 4～10 aliphatics oxygen carbonyl and aryl moiety be 6～10 and the carbon number of moieties be 1～5 aralkyl.In the formula, R 8And R 9Be not hydrogen atom simultaneously.In addition when n is 2～4, a plurality of R 8And R 9Respectively can be identical, also can be different.
It as the aforementioned carbon number that can be replaced 1～20 aliphatic alkyl by oxygen atom, can enumerate as methyl, ethyl, n-pro-pyl, isopropyl, normal-butyl, sec-butyl, the tert-butyl group, n-pentyl, n-hexyl, octyl group, decyl, the 1-methyl butyl, 1,1,3, the 3-tetramethyl butyl, 1,5-dimethyl hexyl, 1,6-dimethyl heptyl, 2-ethylhexyl and 1,1,5,5-tetramethyl hexyl, the optional position of aforementioned each aliphatic alkyl is by the group of 1 oxygen atom or 2 or 2 above oxygen atom replacements (wherein, when oxygen atom is 2 or 2 when above, this oxygen atom can not in abutting connection with) etc.
As aforementioned carbon number is 3～10 alicyclic alkyl, can enumerate as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, suberyl, ring octyl group, ring nonyl, ring decyl, isobornyl, cyclopentadienyl group etc.
As the carbon number of aforesaid alkyl part is 1～4 alkyl-cyclohexyl, can enumerate as 2-methylcyclohexyl, 2-ethyl cyclohexyl etc.
As aforementioned carbon number is 3～15 aliphatics alkoxyalkyl, can enumerate as ethoxycarbonyl propyl, isopropoxide propyl, octyloxy propyl group, 3-ethoxy n-pro-pyl, 3-(2-ethyl hexyl oxy) propyl group etc.
As aforementioned carbon number is 4～10 aliphatics oxygen carbonyl, can enumerate as propoxycarbonyl propyl group, ethoxy carbonyl butyl, propionyloxy ethyl, butyryl acyloxy butyl etc.
As the carbon number of aforementioned aryl moiety be 6～10, the carbon number of moieties is 1～5 aralkyl, can enumerate as benzyl, phenethyl, 1-methyl-3-phenyl propyl etc.
In the pigment of formula (IV) expression,, can be listed below as preferred pigment:
Figure A20061010755900081
These dyestuffs both can use separately, also can mix more than 2 kinds or 2 kinds and use.
As required, the micronize that aforementioned pigment, dyestuff can also be implemented surface treatment that rosin handles, uses the derivant that imported acidic-group or basic group etc. to carry out, sulfuric acid micronize method is handled, utilized in the grafting that utilizes macromolecular compound etc. that the dyestuff surface is carried out etc. carries out handles, be used to remove the removal processing etc. of the removal ionic impurity that utilizes carrying out washing treatment that organic solvent, water etc. carry out, undertaken by ion exchange process of impurity.
As required, can also make (A) colorant contain part or all of spreading agent, (B) adhesive resin and carry out dispersion treatment, as the dispersion liquid of pigment, dyestuff homogeneously dispersed state in solution and obtain.
As aforementioned spreading agent, for example can enumerate surfactants such as kation system, negative ion system, nonionic system, both sexes, polyester system, polyamines system etc., these spreading agents both can use separately, also can make up more than 2 kinds or 2 kinds and use.
As the example of this surfactant, can enumerate as polyoxyethylene alkyl ether class, polyoxyethylene alkyl phenyl ether class, polyethylene glycol di class, sorbitan fatty acid esters class, fatty acid modified polyesters, tertiary amine modified polyurethane, polyethyleneimine: amine etc.Specifically can enumerate commodity KP (SHIN-ETSU HANTOTAI's chemical industry (strain) system) by name, Port リ Off ロ one (common prosperity chemistry (strain) system), エ Off ト Star プ (ト one ケ system プ ロ ダ Network Star corporate system), メ ガ Off ア Star Network ス (big Japanese イ Application キ chemical industry (strain) system), Off ロ ラ one De (Sumitomo ス リ one エ system (strain) system), ア サ ヒ ガ one De, サ one Off ロ Application (above is Asahi Glass (strain) system), ソ Le ス パ one ス (ゼ ネ カ (strain) system), EFKA (EFKA CHEMICALS corporate system), PB821 (monosodium glutamate (strain) system) etc.
When using spreading agent, it is preferably 0.1～100 quality %, more preferably 5～50 quality % with respect to the consumption of colorant by quality ratio.If the consumption of spreading agent in aforementioned range, then has the tendency that can obtain even dispersion liquid, so preferred.
Employed among the present invention (A) colorant is with respect to the content of the solid constituent in the photosensitive composition, be preferably 20～65 quality % by quality ratio, more preferably 25～60 quality % are preferably 27～55 quality % again, more preferably 30～50 quality %.Here so-called solid constituent is meant in photosensitive composition contained solvent composition and is arbitrarily total amount the composition of liquid state at normal temperatures in the adding ingredient.
If (A) content of colorant is in aforementioned range, colour saturation during then as color filter is abundant, and it is contain necessary amount or the adhesive resin angle more than the necessary amount the composition from making, can form pattern, so preferred with sufficient mechanical strength.
Employed among the present invention (B) adhesive resin preferably contains the structural unit of being derived by (methyl) acrylic acid.Here (methyl) acrylic acid is represented acrylic acid and/or methacrylic acid.Aforementioned structural unit of deriving by (methyl) acrylic acid with respect to the content of all structural unit total amounts that constitute (B) adhesive resin with molar ratio computing, be preferably 16 moles of % or 16 moles of % above～40 moles of % or 40 moles are below the %; More preferably 18 moles of % or 18 moles of % above～38 moles of % or 38 moles are below the %.If the content of the structural unit of being derived by (methyl) acrylic acid is in aforementioned range, the favorable solubility of non-pixel portion when then developing, and have the tendency that after development residue is not easy to remain in non-pixel portion, so preferred.
As other monomers of the adhesive resin structural unit except that the structural unit of deriving of can deriving, can enumerate macromonomer class that has single acryloyl group or monomethyl acryloyl group as aromatic ethenyl compound, unsaturated carboxylate type, unsaturated carboxylic acid aminoalkyl ester class, unsaturated carboxylic acid ethylene oxidic ester class, vinyl esters of carboxylic acids class, unsaturated ether, acrylonitrile compound, unsaturated acyl amine, unsaturated acid imide, aliphatics conjugated diene, polymer molecule chain end etc. by (methyl) acrylic acid.As the aforementioned structure unit, can enumerate suc as formula the unit of (II) expression and the unit of formula (III) expression etc.
Figure A20061010755900101
[in formula (II) and the formula (III), R 3And R 4Independent separately, represent that respectively hydrogen atom or carbon number are 1～6 alkyl].
R 3And R 4Expression hydrogen atom, methyl, ethyl, n-pro-pyl, isopropyl, normal-butyl, sec-butyl, the tert-butyl group, n-pentyl, 1-methyl butyl, 2-methyl butyl, 3-methyl butyl, 1-ethyl propyl, 2-ethyl propyl, n-hexyl, 1-methyl amyl, 2-methyl amyl, 3-methyl amyl, 4-methyl amyl, 1-ethyl-butyl, 2-ethyl-butyl, 3-ethyl-butyl, preferred expression hydrogen atom, methyl, ethyl, n-pro-pyl, isopropyl, normal-butyl, sec-butyl, the tert-butyl group are more preferably represented hydrogen atom, methyl, ethyl.
As aforementioned adhesion agent resin, the monomer of the structural unit of concrete preferable methyl acrylic acid/benzyl methacrylate multipolymer, methacrylic acid/benzyl methacrylate/styrol copolymer, methacrylic acid/benzyl methacrylate/isobornyl methacrylate multipolymer, methacrylic acid/styrene/methacrylic acid benzyl ester/N-phenylmaleimide multipolymer, the methacrylic acid/formula of deriving (II) expression (at this moment in formula (II), R 3The expression methyl, R 4The expression hydrogen atom)/and the monomer of the structural unit of benzyl methacrylate multipolymer, the methacrylic acid/formula of deriving (III) expression (at this moment in formula (III), R 3The expression methyl, R 4The expression hydrogen atom)/and the monomer of the structural unit of benzyl methacrylate multipolymer, the methacrylic acid/formula of deriving (III) expression (at this moment in formula (III), R 3The expression methyl, R 4The expression hydrogen atom)/and the monomer of the structural unit of methacrylic acid two cyclopentyl esters/benzyl methacrylate multipolymer, the methacrylic acid/formula of deriving (III) expression (at this moment in formula (III), R 3The expression methyl, R 4The expression hydrogen atom)/styrol copolymer/methacrylic acid three ring ester copolymers in the last of the ten Heavenly stems etc.
The acid number of employed among the present invention (B) adhesive resin is preferably 50～150, and more preferably 55～135, more preferably 60～135.If acid number in aforementioned range, then can improve the dissolubility for developer solution, unexposed portion is dissolved easily, can realize high sensitivity in addition, the exposed portion pattern is residual during development, has the tendency that improves residual film ratio, so preferred.Here acid number is in measuring and the value of the needed potassium hydroxide amount of acrylic acid series polymeric compounds 1g (mg), can obtain by using the potassium hydroxide aqueous solution titration usually.
(B) adhesive resin is preferably 15～35 quality % by quality ratio with respect to the content of photosensitive composition solid constituent, more preferably 18～33 quality %, more preferably 21～31 quality %.If (B) content of adhesive resin is in aforementioned range, then can forms pattern, and have the tendency that can improve resolution and residual film ratio, so preferred.
Adhesive resin with constituent of formula (II) expression, for example constituent (R in this up-to-date style (II) of methacrylic acid/formula (II) expression 3, R 4The expression methyl)/the benzyl methacrylate multipolymer, can obtain 2 component polymer by making methacrylic acid and benzyl methacrylate carry out polymerization, make again the compound that gained 2 component polymer and formula (V) represent (in this up-to-date style (V), R 5The expression methyl) reaction obtains.
The constituent of methacrylic acid/formula (III) expression (in this up-to-date style (III), R 3, R 4The expression methyl)/and styrol copolymer/methacrylic acid three ring ester copolymers in the last of the ten Heavenly stems, the copolymer reaction of monomethacrylates that can be by making glycidyl methacrylate and benzyl methacrylate, methacrylic acid, tricyclodecane skeleton obtains.
The polystyrene conversion weight-average molecular weight of adhesive resin (B) is preferably 5,000～35, and 000, more preferably 6,000～30,000, more preferably 7,000～28,000.If molecular weight in aforementioned range, then can improve hardness of film, residual film ratio is also high, and unexposed portion is good to the dissolubility of developer solution, has the tendency that can improve resolution, so preferred.
Employed among the present invention (C) optical polymerism compound be can be by generating by (D) Photoepolymerizationinitiater initiater through rayed living radical, acid etc. carry out polymeric compounds, for example can enumerate compound with polymerism carbon-to-carbon unsaturated bond etc.
As aforementioned (C) optical polymerism compound, preferably 3 officials can or 3 officials can be above multifunctional optical polymerism compound.
As 3 officials can or 3 officials can be above multifunctional optical polymerism compound, can enumerate as tetramethylol methane tetraacrylate, pentaerythrite tetramethyl acrylate, dipentaerythritol five acrylate, dipentaerythritol pentamethyl acrylate, dipentaerythritol acrylate, dipentaerythritol hexamethyl acrylate etc.Aforementioned (C) optical polymerism compound both can use separately, also can make up more than 2 kinds or 2 kinds and use.
(C) the optical polymerism compound is preferably 5～90 quality % by quality ratio with respect to the content of photosensitive composition solid constituent, more preferably 10～80 quality %, more preferably 20～70 quality %.If (C) content of optical polymerism compound is in aforementioned range, then have to solidify and carry out fully, the Film Thickness Ratio before and after developing improves, and pattern is not easy to produce the sidewall corrosion, and so the tendency that tack is good is preferred.
As employed among the present invention (D) Photoepolymerizationinitiater initiater, can enumerate as triaizine compounds, acetophenone compound and di-imidazolium compounds, living radical propellant, acid-producing agent etc.
As aforementioned triazine based compound, can enumerate as 2 two (the trichloromethyl)-6-(4-methoxyphenyl)-1,3 of 4-, the 5-triazine, 2, two (the trichloromethyl)-6-(4-methoxyl naphthyl) of 4--1,3,5-triazines, 2, two (the trichloromethyl)-6-(4-methoxyl-styrene)-1 of 4-, 3, the 5-triazine, 2, two (trichloromethyl)-6-[2-(5-methylfuran-2-yl) vinyl of 4-]-1,3, the 5-triazine, 2, two (trichloromethyl)-6-[2-(furans-2-yl) vinyl of 4-]-1,3, the 5-triazine, 2, two (trichloromethyl)-6-[2-(4-diethylamino-2-aminomethyl phenyl) vinyl of 4-]-1,3,5-triazines, 2, two (the trichloromethyl)-6-[2-(3 of 4-, the 4-Dimethoxyphenyl) vinyl]-1,3,5-triazines etc.
As aforementioned acetophenone based compound, can enumerate as diethoxy acetophenone, 2-methyl-2-morpholino-1-(4-methyl mercapto phenyl) propane-1-ketone, 2-hydroxy-2-methyl-1-phenyl-propane-1-ketone, benzyldimethylketal, 2-hydroxy-2-methyl-1-[4-(2-hydroxyl-oxethyl) phenyl] propane-1-ketone, 1-hydroxycyclohexylphenylketone, 2-hydroxy-2-methyl-1-[4-(1-methyl ethylene) phenyl] oligomer etc. of propane-1-ketone, preferably use 2-methyl-2-morpholino-1-(methyl mercapto phenyl) propane-1-ketone.
As aforementioned di-imidazole compound, can enumerate as 22 '-two (2-chlorphenyl)-4,4 ', 5,5 '-tetraphenyl di-imidazoles, 2,2 '-two (2-chlorphenyl)-4,4 ', 5,5 '-four (4-carbethoxy phenyl) di-imidazoles, 2,2 '-two (2-chlorphenyl)-4,4 ', 5,5 '-four (4-bromophenyl) di-imidazoles, 2,2 '-two (2-chlorphenyls)-4,4 ', 5,5 '-four (2, the 4-dichlorophenyl) di-imidazoles, 2,2 '-two (2-bromophenyl)-4,4 ', 5,5 '-tetraphenyl di-imidazoles, 2,2 '-two (2, the 4-dichlorophenyl)-4,4 ', 5,5 '-tetraphenyl di-imidazoles, 2,2 '-two (2-chlorphenyl)-4,4 ', 5,5 '-four (m-methoxyphenyl) di-imidazoles, 2,2 '-two (2, the 6-dichlorophenyl)-4,4 ', 5,5 '-tetraphenyl di-imidazoles, 2,2 '-two (2-nitrobenzophenone)-4,4 ', 5,5 '-tetraphenyl di-imidazoles, 2,2 '-two (2-aminomethyl phenyls)-4,4 ', 5,5 '-tetraphenyl di-imidazoles etc.
The living radical propellant can produce living radical by rayed.As aforementioned living radical propellant, can enumerate as benzoin based compound, benzophenone based compound, thioxanthones based compound, triazine based compound, oxime compound etc.
As aforementioned benzoin based compound, can enumerate as benzoin, benzoin methylether, benzoin ethyl ether, benzoin iso-propylether, benzoin isobutyl ether etc.
As aforementioned benzophenone based compound; can enumerate as benzophenone, o-benzoyl yl benzoic acid methyl esters, 4-phenyl benzophenone, 4-benzoyl-4 '-dimethyl diphenyl sulfide, 3; 3 '; 4; 4 '-four (tert-butyl hydroperoxide carbonyl) benzophenone, 2; 4,6-tri-methyl benzophenone etc.
As aforementioned thioxanthones based compound, can enumerate as 2-isopropyl thioxanthone, 4-isopropyl thioxanthone, 2 4-diethyl thioxanthone, 2,4-two clopenthixal ketones, 1-chloro-4-propoxyl group thioxanthones etc.
As aforementioned triazine based compound, can enumerate compound as hereinbefore.
As aforementioned oxime compound; can enumerate as O-acyl group oxime compound; its concrete example can be enumerated 1-(4-phenyl sulphur alkyl-phenyl)-butane-1; 2-diketone 2-oxime-O-benzoic ether, 1-(4-phenyl sulphur alkyl-phenyl)-octane-1,2-diketone 2-oxime-O-benzoic ether, 1-(4-phenyl sulphur alkyl-phenyl)-octane-1-ketoxime-O-acetic acid esters, 1-(4-phenyl sulphur alkyl-phenyl)-butane-1-ketoxime-O-acetic acid esters etc.
As the living radical propellant beyond the foregoing example, for example can also use 2,4,6-trimethylbenzene formyl diphenyl phosphine oxide, 2,2 '-two (Chloro-O-Phenyl)-4,4 ', 5,5 '-tetraphenyl-1,2 '-di-imidazoles, 10-butyl-2-chloro-acridine ketone, 2-EAQ, benzil, 9,10-phenanthrenequione, camphorquinone, phenyl glyoxalic acid methylester, two luxuriant titaniums (チ ノ セ Application) compound etc.
As aforementioned acid-producing agent, can enumerate as  salts such as 4-hydroxy phenyl dimethyl sulfonium tosilate, 4-hydroxy phenyl dimethyl sulfonium hexafluoro antimonate, 4-acetoxyl group phenyl dimethyl sulfonium tosilate, 4-acetoxyl group phenyl methyl benzyl sulfonium hexafluoro antimonate, triphenylsulfonium tosilate, triphenylsulfonium hexafluoro antimonate, diphenyl iodine  tosilate, diphenyl iodine  hexafluoro antimonate, nitrobenzyl tosylate class, benzoin tosylate class etc.
Acidic compound when producing living radical in addition in the above-claimed cpd of aforementioned living radical propellant in addition, for example triazine is that Photoepolymerizationinitiater initiater also can be used as acid-producing agent and uses.
With respect to (B) adhesive resin and (C) optical polymerism total amount of compound, (D) content of Photoepolymerizationinitiater initiater is preferably 0.1～20 quality % by quality ratio, more preferably 1～15 quality %.If the content of Photoepolymerizationinitiater initiater is in aforementioned range, then the sensitivity of coloring phototonus resin improves, and can shorten the time shutter, so can improve the productive rate of color filter; When using the mask of striped setting to expose on the other hand,, in the striped setting, be the minimum feature place of lines and gap pattern, has the tendency that live width is not easy to become too thick, so preferred because the sensitivity of coloring phototonus resin is too high.
Can also contain (G) photopolymerization in the photosensitive composition of the present invention and cause auxiliary agent.(G) photopolymerization causes auxiliary agent and is used in combination with (D) Photoepolymerizationinitiater initiater usually, is to begin the compound that the optical polymerism compound polymerization of polymerization uses in order to promote by light trigger.
Cause auxiliary agent as (G) photopolymerization, can enumerate as amine compound, alkoxy anthracene based compound, thioxanthones based compound etc.
As aforementioned amine compound, can enumerate as triethanolamine, methyldiethanolamine, triisopropanolamine, 4-dimethylaminobenzoic acid methyl esters, 4-dimethylaminobenzoic acid ethyl ester, 4-dimethylaminobenzoic acid isopentyl ester, benzoic acid 2-dimethylamino ethyl ester, 4-dimethylaminobenzoic acid 2-Octyl Nitrite, N, the N-dimethyl-p-toluidine, 4,4 '-two (dimethylamino) benzophenone (common name Michler's keton, ミ ヒ ラ one ズ ケ ト Application), 4,4 '-two (diethylamino) benzophenone, 4,4 '-two (ethylmethylamino) benzophenone etc., wherein preferably use 4,4 '-two (diethylamino) benzophenone.
As aforementioned alkoxy anthracene based compound, can enumerate as 9 10-dimethoxy anthracene, 2-ethyl-9,10-dimethoxy anthracene, 9,10-diethoxy anthracene, 2-ethyl-9,10-diethoxy anthracene etc.
As aforementioned thioxanthones based compound, can enumerate as 2-isopropyl thioxanthone, 4-isopropyl thioxanthone, 2 4-diethyl thioxanthone, 2,4-two clopenthixal ketones, 1-chloro-4-propoxyl group thioxanthones etc.
(G) photopolymerization initiation auxiliary agent both can use separately, also can make up more than 2 kinds or 2 kinds and use.Cause auxiliary agent as (G) photopolymerization in addition, also can use the commercially available prod, cause auxiliary agent, can enumerate as EAB-F (hodogaya chemical industry (strain) system) etc. as commercially available (G) photopolymerization.
As employed among the present invention (D) Photoepolymerizationinitiater initiater and (G) combination of photopolymerization initiation auxiliary agent, can enumerate as diethoxy acetophenone/4,4 '-two (diethylamino) benzophenone, 2-methyl-2-morpholino-1-(4-methyl mercapto phenyl) propane-1-ketone/4,4 '-two (diethylamino) benzophenone, 2-hydroxy-2-methyl-1-phenyl-propane-1-ketone/4,4 '-two (diethylamino) benzophenone, benzyldimethylketal/4,4 '-two (diethylamino) benzophenone, 2-hydroxy-2-methyl-1-[4-(2-hydroxyl-oxethyl) phenyl] propane-1-ketone/4,4 '-two (diethylamino) benzophenone, 1-hydroxycyclohexylphenylketone/4,4 '-two (diethylamino) benzophenone, 2-hydroxy-2-methyl-1-[4-(1-methyl ethylene) phenyl] oligomer/4 of propane-1-ketone, 4 '-two (diethylamino) benzophenone, 2-benzyl-2-dimethylamino-1-(4-morpholino phenyl) butane-1-ketone/4,4 '-two (diethylamino) benzophenone etc.Wherein preferably use 2-methyl-2-morpholino-1-(4-methyl mercapto phenyl) propane-1-ketone/4,4 '-two (diethylamino) benzophenone.
When using these (G) photopolymerization to cause auxiliary agent, its consumption with respect to 1 mole of (D) Photoepolymerizationinitiater initiater is preferably 0.01～10 mole, more preferably 0.01～5 mole.
Employed among the present invention (E) solvent can be enumerated as ethers, arene, ketone, alcohols, ester class, amide-type etc.
As aforementioned ethers, can enumerate as tetrahydrofuran, oxinane, 1,4-two  alkane, glycol monomethyl ether, ethylene glycol monoethyl ether, propyl cellosolve, ethylene glycol monobutyl ether (EGMBE), diethylene glycol monomethyl ether, carbitol, butylcarbitol, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, the diglycol dipropyl ether, the diglycol dibutyl ethers, propylene glycol monomethyl ether acetic acid esters, ethoxy propyl acetate, propylene glycol one propyl ether acetic acid esters, methylcellosolve acetate, ethyl cellosolve acetate, the ethyl carbitol acetic acid esters, acetate of butyl carbitol, propylene glycol methyl ether acetate, methoxyl butylacetic acid ester, methoxyl amyl group acetic acid esters, methyl phenyl ethers anisole, phenetol, methylbenzene methyl ether etc.
As aforementioned arene, can enumerate as benzene,toluene,xylene, mesitylene etc.
As aforementioned ketone, can enumerate as acetone, 2-butanone, 2-heptanone, 3-heptanone, 4-heptanone, 4-methyl-2 pentanone, cyclopentanone, cyclohexanone etc.
As aforementioned alcohols, can enumerate as methyl alcohol, ethanol, propyl alcohol, butanols, hexanol, cyclohexanol, ethylene glycol, glycerine etc.
As aforementioned ester class, can enumerate as ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, isobutyl acetate, butyl propionate, isopropyl isobutyrate, ethyl butyrate, butyl butyrate, alkyl esters, methyl lactate, ethyl lactate, hydroxy methyl acetate, hydroxyl ethyl acetate, the glycolic acid butyl ester, methoxy menthyl acetate, the methoxyacetic acid ethyl ester, the methoxyacetic acid butyl ester, ethoxy acetate, ethoxy ethyl acetate, the 3-hydroxy methyl propionate, 3-hydracrylic acid ethyl ester, 3-methoxypropionic acid methyl esters, 3-methoxy propyl acetoacetic ester, 3-ethoxy-propionic acid methyl esters, the 3-ethoxyl ethyl propionate, the 2 hydroxy propanoic acid methyl esters, the 2 hydroxy propanoic acid ethyl ester, the 2 hydroxy propanoic acid propyl ester, 2-methoxypropionic acid methyl esters, 2-methoxy propyl acetoacetic ester, 2-methoxy propyl propyl propionate, 2-ethoxy-propionic acid methyl esters, the 2-ethoxyl ethyl propionate, 2-hydroxy-2-methyl methyl propionate, 2-hydroxy-2-methyl ethyl propionate, 2-methoxyl-2 Methylpropionic acid methyl esters, 2-ethoxy-2 Methylpropionic acid ethyl ester, methyl pyruvate, ethyl pyruvate, Propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, 2-ketobutyric acid methyl esters, 2-ketobutyric acid ethyl ester, 3-methoxyl butylacetic acid ester, 3-methyl-3-methoxyl butylacetic acid ester, gamma-butyrolacton etc.
As aforementioned amide-type, can enumerate as N dinethylformamide, N,N-dimethylacetamide etc.
As other solvent, can enumerate as N-Methyl pyrrolidone, dimethyl sulfoxide (DMSO) etc.
Aforementioned solvents both can have been distinguished use separately, also can make up more than 2 kinds or 2 kinds and use.
In the aforementioned solvents, the preferred solvent that contains propylene glycol monomethyl ether acetic acid esters that uses.When (E) solvent contained propylene glycol monomethyl ether acetic acid esters, by quality ratio, propylene glycol monomethyl ether acetic acid esters was preferably 50～97 quality % with respect to the content of solvent, more preferably 60～95 quality %.
With mass ratio, (E) solvent is preferably 70～90 quality % with respect to the content of photosensitive composition, more preferably 75～88 quality %.Here the content of solvent is meant the total amount of removing behind its solid constituent from photosensitive composition.If (E) content of solvent is in aforementioned range, the inner evenness when then being coated with is good, and the colour saturation when forming color filter is abundant, and display characteristic is good, so preferred.
Photosensitive composition of the present invention contains at least a compound in the compound that (F) be selected from the compound of formula (I-1) expression and formula (I-2) expression.
Figure A20061010755900171
In formula (I-1) and the formula (I-2), R 1And R 2Independent separately, represent that respectively hydrogen atom or carbon number are 1～4 alkyl.
P represents more than 4 or 4～integer below 90 or 90.
Q, r and s are independent separately, represent respectively more than 1 or 1～integer below 40 or 40.
As carbon number is 1～4 alkyl, can enumerate as methyl, ethyl, n-pro-pyl, isopropyl, normal-butyl, isobutyl, sec-butyl, the tert-butyl group etc.
R 1And R 2Expression hydrogen atom, methyl, ethyl, n-pro-pyl, isopropyl, normal-butyl, isobutyl, sec-butyl, the tert-butyl group etc., preferred hydrogen atom, methyl, ethyl, more preferably hydrogen atom, methyl.
P represents more than 4 or 4～integer below 90 or 90; More than preferred 6 or 6～integer below 80 or 80; More preferably more than 8 or 8～integer below 70 or 70.
Q, r and s are independent separately, and expression is more than 1 or 1～integer below 40 or 40; More than preferred 2 or 2～integer below 35 or 35; More preferably more than 3 or 3～integer below 30 or 30.
As the compound of formula (I-1) and formula (I-2) expression (below be sometimes referred to as polyethylene glycols), specifically can enumerate polyglycol, polypropylene glycol etc.
About the polystyrene conversion weight-average molecular weight of polyethylene glycols, can suitably select according to the composition of coloring phototonus resin combination, be preferably more than 300 or 300～below 5,000 or 5,000.
The content of this polyethylene glycols in photosensitive composition, solid constituent with respect to photosensitive composition, by quality ratio preferably at 5.0 quality % or below the 5.0 quality %, more preferably at 0.0010 quality % or more than the 0.0010 quality %～4.8 quality % or below the 4.8 quality %.
If the content of this polyethylene glycols is in aforementioned range, then non-exposed portion improves the dissolubility of developer solution, so preferred.
Can also contain surfactant in the photosensitive composition of the present invention.As surfactant, can enumerate as silicone type surface active agent, fluorine is surfactant, the silicone type surface active agent with fluorine atom.
As aforementioned silicone type surface active agent, surfactant be can enumerate, ト one レ シ リ コ one Application DC3PA, ト one レ シ リ コ one Application SH7PA, ト one レ シ リ コ one Application DC11PA, ト one レ シ リ コ one Application SH21PA, ト one レ シ リ コ one Application SH28PA, ト one レ シ リ コ one Application 29SHPA, ト one レ シ リ コ one Application SH30PA, polyether modified silicon oil SH8400 (ト one レ シ リ コ one Application (strain) system) specifically can be enumerated with siloxane bond; KP321, KP322, KP323, KP324, KP326, KP340, KP341 (the シ リ コ of SHIN-ETSU HANTOTAI one Application system); TSF400, TSF401, TSF410, TSF4300, TSF4440, TSF4445, TSF-4446, TSF4452, TSF4460 (ジ one イ Yi East sesame シ リ コ one Application (strain) system) etc.
As aforementioned fluorine is surfactant, can enumerate surfactant with carbon fluorine chain etc.Specifically can enumerate Off ロ ラ one De FC430, Off ロ ラ one De FC431 (Sumitomo ス リ one エ system (strain) system); メ ガ Off ア Star Network F142D, メ ガ Off ア Star Network F171, メ ガ Off ア Star Network F172, メ ガ Off ア Star Network F173, メ ガ Off ア Star Network F177, メ ガ Off ア Star Network F183, メ ガ Off ア Star Network R30 (big Japanese イ Application キ chemical industry (strain) system); エ Off ト Star プ EF301, エ Off ト Star プ EF303, エ Off ト Star プ EF351, エ Off ト Star プ EF352 (new autumn fields changes into (strain) system); サ one Off ロ Application S381, サ one Off ロ Application S382, サ one Off ロ Application SC101, サ one Off ロ Application SC105 (Asahi Glass (strain) system); E5844 ((strain) ダ イ キ Application Off ア イ Application ケ ミ カ Le institute system); BM-1000, BM-1100 (BM Chemie corporate system) etc.
As aforementioned silicone type surface active agent, can enumerate surfactant with siloxane bond and carbon fluorine chain etc. with fluorine atom.Specifically can enumerate メ ガ Off ア Star Network R08, メ ガ Off ア Star Network BL20, メ ガ Off ア Star Network F475, メ ガ Off ア Star Network F477, メ ガ Off ア Star Network F443 (big Japanese イ Application キ chemical industry (strain) system); サ one Off イ ノ one Le 61, オ Le Off イ Application B, オ Le Off イ Application P, サ one Off イ ノ one Le 82, サ one Off イ ノ one Le 104, オ Le Off イ Application Y, ダ イ ノ one Le 604, サ one Off イ ノ one Le 440, サ one Off イ ノ one Le 465, サ one Off イ ノ one Le 485, サ one Off イ ノ one Le 2502 (being day letter chemical industry (strain) system).
These surfactants both can use separately, also can make up more than 2 kinds or 2 kinds and use.
Can contain molecular weight in the photosensitive composition of the present invention at the organic acid below 1,000 or 1,000.As aforementioned organic acid, can enumerate Ru Te and open disclosed organic acid in flat 5-343631 number.Specifically can enumerate malonic acid, oxalic acid, succinic acid, glutaric acid, hexane diacid, benzoic acid, phthalic acid, m-phthalic acid, terephthalic acid (TPA), citraconic acid, itaconic acid, mesaconic acid, fumaric acid, phthalic acid, acrylic acid, methacrylic acid etc., preferred malonic acid, oxalic acid, fumaric acid, phthalic acid.Owing to contain molecular weight at the organic acid below 1,000 or 1,000, therefore have the tendency that residue tails off, thereby preferred.
Can also contain adjuvants such as filling agent, the macromolecular compound except that adhesive resin, adhesion promoter, antioxidant, ultraviolet light absorber, anticoalescent, organic amine compound, hardening agent in the photosensitive composition of the present invention.
As aforementioned filling agent, can enumerate particulate as glass, aluminium oxide etc.
As aforementioned macromolecular compound except that adhesive resin, can enumerate as polyvinyl alcohol (PVA), polyacrylic acid, polyglycol one alkyl ether, poly-fluoroalkyl acrylate etc.
As aforementioned adhesion promoter, can enumerate as vinyltrimethoxy silane, vinyltriethoxysilane, vinyl three (2-methoxy ethoxy) silane, N-(2-amino-ethyl)-3-aminopropyl methyl dimethoxysilane, N-(2-amino-ethyl)-3-TSL 8330, the 3-aminopropyltriethoxywerene werene, the 3-glycidoxypropyltrime,hoxysilane, 3-glycidoxy methyl dimethoxysilane, 2-(3, the 4-epoxycyclohexyl) ethyl trimethoxy silane, the 3-chloropropylmethyldimethoxysilane, the 3-r-chloropropyl trimethoxyl silane, 3-metacryloxy propyl trimethoxy silicane, 3-sulfydryl propyl trimethoxy silicane etc.
As aforementioned antioxidant, can enumerate as 44 '-thiobis (the 6-tert-butyl group-3-methylphenol), 2,6-two-tert-butyl group-4-methylphenol etc.
As aforementioned ultraviolet light absorber, can enumerate as 2-(the 2-hydroxyl-3-tert-butyl group-5-aminomethyl phenyl)-benzotriazoles such as 5-chlorobenzotriazole system;
2-hydroxyl-benzophenone series such as 4-octyloxy benzophenone;
2,4-two-tert-butyl-phenyl-3, benzoic ethers such as 5-two-tertiary butyl-4-hydroxy benzoic ether system;
2-(4,6-diphenyl-1,3,5-triazines-2-yl)-triazine systems such as the own oxygen base of 5-phenol etc.
As aforementioned anticoalescent, can enumerate as sodium polyacrylate etc.
By adding organic amine compound, on the substrate of unexposed portion, can not produce residue during development, and can obtain the pixel with substrate tack excellence.
As aforementioned organic amine compound, can enumerate as monoalkyl amines such as n-pro-pyl amine, isopropylamine, n-butylamine, isobutylamine, sec-butylamine, tert-butylamine, n-pentyl amine, n-hexyl amine, n-heptyl amine, n-octylamine, n-nonyl amine, positive decyl amine, n-undecane base amine, dodecyl amine;
Monocycle alkyl amines such as cyclohexylamine, 2-methyl cyclohexylamine, 3-methyl cyclohexylamine, 4-methyl cyclohexylamine;
Dialkyl amines such as Methylethyl amine, diethylamide, methyl n-pro-pyl amine, ethyl n-pro-pyl amine, di-n-propyl amine, diisopropylamine, di-n-butyl amine, diisobutyl amine, two sec-butylamine, di-t-butyl amine, two n-pentyl amine, di-n-hexyl amine;
Monoalkyl monocycle alkyl amines such as methylcyclohexyl amine, ethyl cyclo-hexylamine;
Bicyclic alkyl amines such as dicyclohexyl amine;
Trialkyl amines such as dimethylethyl amine, methyl diethylamide, triethylamine, dimethyl n propyl group amine, diethyl n-pro-pyl amine, methyl di-n-propyl amine, ethyl di-n-propyl amine, three n-pro-pyl amine, triisopropylamine, tri-n-butyl amine, triisobutyl amine, three sec-butylamine, tri-tert amine, three n-pentyl amine, three n-hexyl amine;
Dialkyl group monocycle alkyl amines such as dimethylcyclohexylam,ne, diethyl cyclo-hexylamine;
Monoalkyl bicyclic alkyl amines such as methyl bicyclic hexyl amine, ethyl dicyclohexyl amine, thricyclohexyl amine;
The 2-ethylaminoethanol, 3-amino-1-propyl alcohol, 1-amino-2-propyl alcohol, 4-amino-1-butanols, 5-amino-1-amylalcohol, 6-amino-monoalkanolamine classes such as 1-hexanol;
4-amino-mononaphthene alcaminess such as 1-cyclohexanol;
Dialkanol amines such as diethanolamine, two n-propanol amine, diisopropanolamine, two normal butyl alcohol amine, two isobutyl hydramine, two n-amyl alcohol amine, two n-hexyl alcohol amine; Two cyclic alkanol amines such as two (4-cyclohexanol) amine;
Three alkanol amines such as triethanolamine, three n-propanol amine, triisopropanolamine, three normal butyl alcohol amine, three isobutyl hydramine, three n-amyl alcohol amine, three n-hexyl alcohol amine;
Three cyclic alkanol amines such as three (4-cyclohexanol) amine;
3-amino-1,2-propylene glycol, 2-amino-1, ammediol, 4-amino-1,2-butylene glycol, 4-amino-1,3-butylene glycol, 3-dimethylamino-1,2-propylene glycol, 3-diethylamino-1,2-propylene glycol, 2-dimethylamino-1, ammediol, 2-diethylamino-1, amino alkane glycols such as ammediol;
4-amino-1,2-cyclohexanediol, 4-amino-1, amino cycloalkanes glycolss such as 3-cyclohexanediol; 1-amino cyclopentyl ketone methyl alcohol, 4-amino cyclopentyl ketone methyl alcohol etc. contain amino cyclanone methyl alcohol class;
1-aminocyclohexane methyl alcohol, 4-aminocyclohexane methyl alcohol, 4-dimethylamino cyclopentane methyl alcohol, 4-diethylamino cyclopentane methyl alcohol, 4-dimethylamino cyclohexane methanol, 4-diethylamino cyclohexane methanol etc. contain amino cycloalkanes methyl alcohol class;
Aminocarboxylic acids such as Beta-alanine, 2-aminobutyric acid, 3-aminobutyric acid, 4-aminobutyric acid, 2-aminoisobutyric acid, 3-aminoisobutyric acid, 2-aminovaleric acid, 5-aminovaleric acid, 6-aminocaprolc acid, 1-1-aminocyclopropane-1-carboxylic acid, 1-aminocyclohexane carboxylic acid, 4-aminocyclohexane carboxylic acid;
Aniline, o-toluidine, a methylaniline, to methylaniline, to ethylaniline, to n-propylbenzene amine, cumidine, to n-butyl aniline, p-tert-butyl-aniline, 1-naphthylamine, 2-naphthylamine, N, accelerine, N, the N-diethylaniline, to methyl-N, aromatic amines such as accelerine;
Adjacent aminobenzyl alcohol, an aminobenzyl alcohol, to aminobenzyl alcohol, to dimethylamino benzylalcohol, to aminobenzyl alcohol classes such as diethylamino benzylalcohols;
O-aminophenol, m-aminophenol, para-aminophenol, to dimethylamino phenol, to amino phenols such as diethylamino phenol;
Gavaculine, p-aminobenzoic acid, ESCAROL 507, to aminobenzoic acids such as diethyl amino yl benzoic acid etc.
As aforementioned hardening agent, for example can enumerate by heating can with the carboxyl reaction in the adhesive resin, make the crosslinked compound of adhesive resin; Polymerization makes the compound of colored pattern curing etc. separately.As aforesaid compound, can use as epoxy compound, oxetane compound etc., preferably use oxetane compound.
Here as epoxy compound, can enumerate as bisphenol-A is epoxy resin, hydrogenated bisphenol A is an epoxy resin, Bisphenol F is an epoxy resin, A Hydrogenated Bisphenol A F is an epoxy resin, phenolic resin varnish, other fragrant family epoxy resin, alicyclic ring family epoxy resin, hetero ring type epoxy resin, ethylene oxidic ester is a resin, glycidyl amine is a resin, the bromo derivative of epoxidation wet goods epoxy resin or these epoxy resin, aliphatics beyond epoxy resin and the bromo derivative thereof, alicyclic or aromatic epoxy compound, the epoxide of butadiene (being total to) polymkeric substance, the epoxide of isoprene (being total to) polymkeric substance, (being total to) polymkeric substance of (methyl) glycidyl acrylate, triglycidyl isocyanurate etc.
As aforementioned oxetane compound, can enumerate as carbonic ester dioxygen heterocycle butane, xylylene dioxygen heterocycle butane, adipate dioxygen heterocycle butane, terephthalate dioxygen heterocycle butane, cyclohexane dicarboxylic acid dioxygen heterocycle butane etc.
When photosensitive composition of the present invention contains epoxy compound, oxetane compound etc. as hardening agent, can contain the compound of the oxetanes skeleton ring-opening polymerization of the epoxy radicals that can make epoxy compound, oxetane compound.As this compound, can enumerate as polybasic carboxylic acid class, polybasic acid anhydride class, acid-producing agent etc.
As aforesaid polybasic carboxylic acid class, can enumerate as phthalic acid, 3 4-dimethyl phthalic acid, m-phthalic acid, terephthalic acid (TPA), pyromellitic acid, trimellitic acid, 1,4,5,8-naphthalene tetracarboxylic acid, 3,3 ' 4, aromatic series polybasic carboxylic acid classes such as 4 '-benzophenone tetrabasic carboxylic acid;
Succinic acid, glutaric acid, hexane diacid, 1,2,3, aliphatics polybasic carboxylic acid classes such as 4-BTCA, maleic acid, fumaric acid, itaconic acid;
Hexahydrophthalic acid, 3,4-dimethyl tetrahydro phthalic acid, six hydrogen m-phthalic acids, six hydrogen terephthalic acid (TPA)s, 1,2,4-cyclopentane tricarboxylic acids, 1,2,4-cyclohexane tricarboxylic acids, cyclopentane tetrabasic carboxylic acid, 1,2,4, alicyclic polybasic carboxylic acid classes such as 5-cyclohexane tetrabasic carboxylic acid etc.
As aforementioned polybasic acid anhydride class, can enumerate as phthalic anhydride, PMA, trimellitic anhydride, 3,3 ', 4, aromatic series polybasic acid anhydride classes such as 4 '-benzophenone tetracarboxylic dianhydride;
Itaconic anhydride, succinic anhydride, citraconic anhydride, dodecenyl succinic anhydride, tricarballylic acid acid anhydride, maleic anhydride, 1,2,3, aliphatics polybasic acid anhydride classes such as 4-butane tetracarboxylic acid dianhydride;
Hexahydrophthalic anhydride, 3,4-dimethyl tetrahydro phthalic anhydride, 1,2,4-cyclopentane tricarboxylic acid anhydride, 1,2,4-cyclohexane tricarboxylic acid anhydride, cyclopentane tetracarboxylic dianhydride, 1,2,4, alicyclic polybasic acid anhydride classes such as 5-cyclohexane tetracarboxylic dianhydride, Ha イ ミ Star Network acid anhydrides, Na ジ Application acid anhydrides;
Ethylene glycol bis trimellitate acid anhydrides, glycerine three trimellitate acid anhydrides etc. contain the carboxyanhydrides of hydroxycarbonyl group etc.
As aforementioned carboxyanhydrides, can also use the product of selling as epoxy curing agent on the market.As the aforementioned epoxy resins hardening agent, can enumerate as ア デ カ Ha one De Na one EH-700 (rising sun electrochemical industry (strain) system), リ カ シ Star De HH, MH-700 (being new Japanese physics and chemistry (strain) system) etc.
Aforementioned hardening agent both can use separately, also can make up more than 2 kinds or 2 kinds and use.
Method as modulation photosensitive composition of the present invention, can enumerate for example to make in the solvent (E) and have spreading agent simultaneously, make colorant dispersions such as pigment, the modulation colorant dispersion, make (B) adhesive resin, (C) optical polymerism compound, (D) Photoepolymerizationinitiater initiater that is dissolved in the solvent and the dissolvings of using as required such as other adjuvant again, mix with aforesaid (A) colorant dispersion, add the method for solvent etc. as required again.
Photosensitive composition of the present invention is normally enclosed in the container and is circulated, keeping.
Use the imaging sensor of photosensitive composition of the present invention as follows with the general manufacture method of color filter.
Photosensitive composition of the present invention is applied on the substrate by carrying out successively, and carries out dry operation; The gained dry coating is carried out the operation of pattern exposure by i ray stepping exposure machine (ス デ Star パ one) etc.; Carry out the operation that alkali develops after the exposure; Then carry out the operation of heat treated, form pixel by respectively shades of colour (3 looks or 4 looks) being carried out aforementioned operation repeatedly successively, thereby obtain color filter.
More specifically, by spin coater etc. the thickness that photosensitive composition of the present invention is applied to when making drying on the suitable substrate is reached 0.1～5 μ m, preferred 0.2～2 μ m placed 3 minutes in 100 ℃ baking oven usually, obtained level and smooth filming.
There is no particular limitation to substrate, can enumerate glass plate; Plastic plate; Aluminium sheet; Imaging sensor is with the substrate of electronic units such as silicon wafer; Transparent resin plate; Resin film; The display surface of kinescope; The sensitive surface of shooting sense; Form the wafer of solid-state imagers such as CCD, CMOS, BBD, CID, BASIS; Use the attached type imaging sensor of thin film semiconductor; Liquid crystal display face; The color electronography photoreceptor; Electricity causes the substrate of colour (EC) display device etc.In order to improve the cohesiveness of filming, preferably substrate is implemented height and adhere to processing in addition with photosensitive composition.Specifically be on substrate, to be coated with thinly with silane coupling agent etc. in advance, use photosensitive composition to form pattern then; Perhaps also can make in advance and contain silane coupling agent in the photosensitive composition.
On substrate, there is the difference of height different time in addition, can on substrate, be coated with to this height difference of elimination, makes the level and smooth flatted membrane of coated face, and then be coated with photosensitive composition of the present invention.For example imaging sensor such as CCD is by producing the photoelectric conversion part (photodiode) of electronics and for the grid portion that the reads formation of this generations electronics of output according to light income on the silicon substrate, if but illumination is to reading grid portion, will form noise, can not export accurate data, so to form the shading rete on the top of reading grid portion, like this and do not have between the photodiode portion of shading rete and can produce height difference.If the height difference coating photosensitive composition with so directly forms color filter, then light path is elongated, the image deepening, and while optically focused is variation also.In order to improve this point, preferably between CCD and color filter, form transparent flatted membrane and come this height difference of landfill.Make the smooth material of film as this, can enumerate thermoset resins such as the photosensitive polymer combination that can form colourless transparent film from photosensitive composition of the present invention, removing colorant and obtain, acrylic acid series, epoxy system or light-cured resin etc.
Behind the coating aforementioned lights hardening resin composition etc., obtain the photosensitive composition layer, will carry out drying under reduced pressure, prebake conditions usually in order to remove to desolvate.As the drying under reduced pressure method, for example the handlebar substrate that has been coated with photosensitive composition is placed on the method for carrying out under the pressure of 0.1～100 holder, 50～120 ℃ of temperature.Have by high temperature air etc. as the prebake conditions method and to carry out heat drying, to carry out heat drying methods such as (80～140 ℃, 50～200 seconds) by heating plate etc.
Then by being used for the mask of the pattern that transfer printing will form, the photosensitive composition layer is exposed with the light source of i ray etc.
Photosensitive composition layer after the exposure is contacted with developer solution,, obtain pattern to remove unexposed portion.
Employed developer solution can use known in the past developer solution during photosensitive composition developed, and for example can use organic bases such as tetramethyl ammonium hydroxide quaternary ammonium salts such as (TMAH), diethanolamine is aqueous solution etc.Wherein preferably using the organic base of tetramethyl ammonium hydroxide quaternary ammonium salts such as (TMAH) is aqueous solution.
Develop the back in order to make the gained pattern fully solidify, improve physical strength to obtain permanent film, carry out the back baking.For example when making 3 color look color filters, to stand to be coated with for 2 times photosensitive composition, exposure, the development of other color after the pattern of the initial color that forms.At this moment, carry out that back baking produces colour mixture with the pattern of the color avoiding forming earlier and the color that forms afterwards and by exposure, develop and cause that pattern is damaged.This back baking can be adopted the method identical with prebake conditions, but compares with the prebake conditions condition, and temperature is higher, the time is longer, under 100～250 ℃, toasts 1～60 minute usually.
As using photosensitive composition of the present invention to form pattern, the residue that then dissolves behind the photosensitive composition of unexposed portion is few, and also because the defective in the gained pattern is few, so tack is good, so be desirable.
Embodiment
Followingly illustrate in greater detail situation of the present invention according to embodiment, the present invention is not limited by these embodiment certainly.
The manufacturing of＜adhesive resin (B1) 〉
In possessing the 1L flask of stirrer, thermometer, reflux condensing tube, tap funnel and gas introduction tube, import propylene glycol monomethyl ether acetic acid esters 333g.In flask, feed nitrogen by gas introduction tube then, the atmosphere in the flask is replaced as nitrogen atmosphere.After then the solution in the flask being warming up to 100 ℃, use tap funnel, dripped in flask with 2 hours and contain two cyclopentyl-methyl acrylate (FA-513M; Hitachi changes into (strain) system) potpourri of 22.0g (0.10 mole), benzyl methacrylate 70.5g (0.40 mole), methacrylic acid 43.0g (0.5 mole), azoisobutyronitrile 3.6g and propylene glycol monomethyl ether acetic acid esters 164g, continue down to stir 5 hours in 100 ℃ after dripping off again.
After stirring end, in flask, import air by gas introduction tube, atmosphere in the flask is replaced as in flask, adds glycidyl methacrylate 35.5g[0.25 mole (is 50 moles of % with molar ratio computing with respect to methacrylic acid used in this reaction) behind the air again], three-dimethylaminomethyl phenol 0.9g and quinhydrones 0.145g, be reflected at 110 ℃ and continue 6 hours down, obtain containing the solution (solid constituent 38.5 quality %, acid number 80mgKOH/g) of resin B 1.
The acid number here be measure make in and 1g have the value that the needed potassium hydroxide amount of polymkeric substance (mg) of acidic groups such as carboxylic acid obtains, adopt the potassium hydroxide aqueous solution of concentration known to carry out titration usually and obtain.
The polystyrene conversion weight-average molecular weight of gained resin B 1 is 9,000.
About the mensuration of the polystyrene conversion weight-average molecular weight of above-mentioned adhesive resin, adopt the GPC method, measure under the following conditions.
Device: HLC-8120GPC (East ソ one (strain) system)
Post: TSK-GELG2000HXL
Column temperature: 40 ℃
Solvent: THF
Flow velocity: 1.0ml/min
The solid component concentration of tested liquid: 0.001～0.01 quality %
Sample size: 50 μ l
Detecting device: RI
Proofread and correct standard substance: TSK, STANDARD POLYSTYRENE F-40, F-4, F-1, A-2500, A-500 (East ソ one (strain) system used)
Composition used in the present embodiment is as follows, below represents with being called for short sometimes.
(A-1) colorant: C.I. paratonere 254
(A-2) colorant: C.I. pigment yellow 13 9
(A-3) colorant: C.I. pigment Green 7
(A-4) colorant: C.I. pigment green 36
(A-5) colorant: C.I. pigment blue 15: 6
(A-6) colorant: C.I. pigment Violet 23
(B-1) resin B 1
(C-1) optical polymerism compound: dipentaerythritol acrylate
(D-1) Photoepolymerizationinitiater initiater: 2-benzyl-2-dimethylamino-1-(4-morpholino phenyl) butane-1-ketone
(G-1) photopolymerization causes auxiliary agent: 4,4 '-two (diethylamino) benzophenone
(E-1) solvent: Glycol Monomethyl ether acetic acid esters
(E-2) solvent: 3-ethoxyl ethyl propionate
(F-1) polypropylene glycol diols type 2000 (with the pure pharmaceutical worker's industry of light (strain) system)
(H-1) メ ガ Off ア Star Network F475 (big Japanese イ Application キ chemical industry (strain) system)
Embodiment 1
[modulation of photosensitive composition 1]
Following substances is mixed, obtain photosensitive composition 1.
(A-1) 0.6376 mass parts
(A-2) 0.1904 mass parts
Acrylic acid series spreading agent 0.2060 mass parts
(B-1) 1.2967 mass parts
(C-1) 0.1664 mass parts
(D-1) 0.0533 mass parts
(G-1) 0.0133 mass parts
(E-1) 6.5825 mass parts
(E-2) 0.8200 mass parts
(F-1) 0.0333 mass parts
(H-1) 0.0005 mass parts
With respect to the photosensitive composition solid constituent, (F) content of composition is 1.85 quality % by quality ratio.
[the formation I of pattern]
Then at glass (#1737; コ one ニ Application グ) go up rotary coating ス ミ レ ジ ス ト PR-1300Y-PG (Sumitomo Chemical (strain) system), heat down at 100 ℃ and removed volatile ingredient in 1 minute, forming thickness is the resin bed of 0.5 μ m.Then this glass was heated 15 minutes at 230 ℃, resin bed is solidified, form support with smooth tunicle.On this support, with the method for spin coating coating above-mentioned photosensitive composition that obtains (green), under 100 ℃, make volatile ingredient volatilization 3 minutes then, form the photosensitive composition film.Expose to this photosensitive composition film irradiation i ray (wavelength 365nm) by photomask in the cooling back.I ray light source can use extra-high-pressure mercury vapour lamp, shines for after the directional light.The irradiation light quantity is 150mJ/cm 2As photomask, can use live width is the photomask that is used to form colour element of the wire of 3 μ m, 4 μ m, 5 μ m, 6 μ m, 7 μ m, 8 μ m, 9 μ m, 10 μ m, 20 μ m, 30 μ m, 40 μ m, 50 μ m and 100 μ m.Then (use the glass substrate [surface is formed with the photosensitive composition film] after the exposure pure water at 23 ℃ developer solutions with SOPD; Sumitomo Chemical (strain) system) be diluted to 0.05%TMAH concentration) in dipping develop for 80 seconds, and with the pure water washing, obtain forming the glass substrate of lines and gap pattern.
[estimating 1]
Use micro-spectral determinator (OSP-SP-200; オ リ Application パ ス system) measuring the transmissivity (400nm～780nm's is average) of dissolving after the above-mentioned substrate that obtains is coated with rete, is 99.9%.Transmissivity we can say then that more than 98% or 98% residue is few as described above.
[formation 2 of pattern]
Rotary coating ス ミ レ ジ ス ト PR-1300Y-PG (Sumitomo Chemical (strain) system) on silicon chip heats under 100 ℃ and removed volatile ingredient in 1 minute in addition, and forming thickness is the resin bed of 0.5 μ m.Then this silicon chip was heated 15 minutes at 230 ℃, resin bed is solidified, form support with smooth tunicle.On this support, with the photosensitive composition 1 that the method for spin coating coating obtains previously, drying is 1 minute under 100 ℃, removes volatile ingredient, forms the photosensitive composition layer.Then gained photosensitive composition layer is used exposure machine (Nikon NSR i9C; ニ コ Application (strain) system), carry out the i radiation exposure by mask pattern (the square pixel of 2 μ m forms two kinds of chequers that color is alternate), with 20～310msec, carry out at 30 points stage by stage at interval with 10msec, (use each exposure support pure water at developer solution then with SOPD; Sumitomo Chemical (strain) system) be diluted to 0.05%TMAH concentration) in, 23 ℃ down dipping develop for 60 seconds.Wash after the development, obtain having the color filter of pixel after the drying on support, this pixel is to be formed by live width 2.0 μ m, two kinds of alternate chequers of different colours of thickness 0.7 μ m.
[estimating 2]
With scanning electron microscope (S-4500; It is made that (strain) Hitachi changes into making) observe the pattern section, find to obtain the good pattern of tack.
In embodiment and comparative example, so-called " tack is good " is meant not perk of pattern, even or have that to come off also be degree also no problem in the practicality.Tack is bad in addition is meant the pattern perk, has coming off of problem degree arranged in practicality.
Embodiment 2
[modulation of photosensitive composition 2]
Following substances is mixed, obtain photosensitive composition 2.
(A-3) 0.4212 mass parts
(A-4) 0.1620 mass parts
(A-2) 0.2268 mass parts
Ester is spreading agent 0.1954 mass parts
(B-1) 1.3453 mass parts
(C-1) 0.1726 mass parts
(D-1) 0.0691 mass parts
(G-1) 0.0138 mass parts
(E-1) 6.5526 mass parts
(E-2) 0.8200 mass parts
(F-1) 0.0207 mass parts
(H-1) 0.0005 mass parts
With respect to the photosensitive composition solid constituent, (F) content of composition is 1.15 quality % by quality ratio.
[estimating 1]
The photosensitive composition 1 of embodiment 1 is replaced to photosensitive composition 2, in addition, carry out 1 identical operations with embodiment, measure the transmissivity (400nm～780nm's is average) after the dissolving substrate is coated with rete, the result is 99.8%.
[estimating 2]
The photosensitive composition 1 of embodiment 1 is replaced to photosensitive composition 2, in addition, carry out 1 identical operations,, find to obtain the good pattern of tack with sem observation pattern section with embodiment.
Embodiment 3
[modulation of photosensitive composition 3]
Following substances is mixed, obtain photosensitive composition 3.
(A-5) 0.4968 mass parts
(A-6) 0.1242 mass parts
Acrylic acid series spreading agent 0.2174 mass parts
(B-1) 1.3473 mass parts
(C-1) 0.2441 mass parts
(D-1) 0.1373 mass parts
(G-1) 0.0229 mass parts
(E-1) 6.5514 mass parts
(E-2) 0.8200 mass parts
(F-1) 0.0381 mass parts
(H-1) 0.0005 mass parts
With respect to the photosensitive composition solid constituent, (F) content of composition is 2.12 quality % by quality ratio.
[estimating 1]
The photosensitive composition 1 of embodiment 1 is replaced to photosensitive composition 3, in addition, carry out 1 identical operations with embodiment, measure the transmissivity (400nm～780nm's is average) after the dissolving substrate is coated with rete, the result is 99.9%.
[estimating 2]
The photosensitive composition 1 of embodiment 1 is replaced to photosensitive composition 3, in addition, carry out 1 identical operations,, find to obtain the good pattern of tack with sem observation pattern section with embodiment.
Comparative example 1
[modulation of photosensitive composition 4]
Following substances is mixed, obtain photosensitive composition 4.
(A-1) 0.6376 mass parts
(A-2) 0.1904 mass parts
Acrylic acid series spreading agent 0.2060 mass parts
(B-1) 1.3557 mass parts
(C-1) 0.1740 mass parts
(D-1) 0.0557 mass parts
(G-1) 0.0139 mass parts
(E-1) 6.5463 mass parts
(E-2) 0.8200 mass parts
(H-1) 0.0005 mass parts
[estimating 1]
The photosensitive composition 1 of embodiment 1 is replaced to photosensitive composition 4, in addition, carry out 1 identical operations with embodiment, measure the transmissivity (400nm～780nm's is average) after the dissolving substrate is coated with rete, the result is 97%.
[estimating 2]
The photosensitive composition 1 of embodiment 1 is replaced to photosensitive composition 4, in addition, carry out 1 identical operations with embodiment, with sem observation pattern section, can observe coming off of pattern, tack is bad.
Comparative example 2
[modulation of photosensitive composition 5]
Following substances is mixed, obtain photosensitive composition 5.
(A-3) 0.4212 mass parts
(A-4) 0.1620 mass parts
(A-2) 0.2268 mass parts
Ester is spreading agent 0.1954 mass parts
(B-1) 1.3814 mass parts
(C-1) 0.1773 mass parts
(D-1) 0.0709 mass parts
(G-1) 0.0142 mass parts
(E-1) 6.5305 mass parts
(E-2) 0.8200 mass parts
(H-1) 0.0005 mass parts
[estimating 1]
The photosensitive composition 1 of embodiment 1 is replaced to photosensitive composition 5, in addition, carry out 1 identical operations with embodiment, measure the transmissivity (400nm～780nm's is average) after the dissolving substrate is coated with rete, the result is 96%.
[estimating 2]
The photosensitive composition 1 of embodiment 1 is replaced to photosensitive composition 5, in addition, carry out 1 identical operations with embodiment, with sem observation pattern section, can observe coming off of pattern, tack is bad.
Comparative example 3
[modulation of photosensitive composition 6]
Following substances is mixed, obtain photosensitive composition 6.
(A-5) 0.4968 mass parts
(A-6) 0.1242 mass parts
Acrylic acid series spreading agent 0.2174 mass parts
(B-1) 1.4029 mass parts
(C-1) 0.2542 mass parts
(D-1) 0.1430 mass parts
(G-1) 0.0238 mass parts
(E-1) 6.5172 mass parts
(E-2) 0.8200 mass parts
(H-1) 0.0005 mass parts
[estimating 1]
The photosensitive composition 1 of embodiment 1 is replaced to photosensitive composition 6, in addition, carry out 1 identical operations with embodiment, measure the transmissivity (400nm～780nm's is average) after the dissolving substrate is coated with rete, the result is 97%.
[estimating 2]
The photosensitive composition 1 of embodiment 1 is replaced to photosensitive composition 6, in addition, carry out 1 identical operations with embodiment, with sem observation pattern section, can observe coming off of pattern, tack is bad.
Embodiment 4
[modulation of photosensitive composition 7]
Following substances is mixed, obtain photosensitive composition 7.
(A-3) 0.4212 mass parts
(A-4) 0.1620 mass parts
(A-2) 0.2268 mass parts
Ester is spreading agent 0.1954 mass parts
(B-1) 1.2681 mass parts
(C-1) 0.1627 mass parts
(D-1) 0.0651 mass parts
(G-1) 0.0130 mass parts
(E-1) 6.6001 mass parts
(E-2) 0.8200 mass parts
(F-1) 0.0651 mass parts
(H-1) 0.0005 mass parts
With respect to the photosensitive composition solid constituent, (F) content of composition is 3.62 quality % by quality ratio.
[estimating 1]
The photosensitive composition 1 of embodiment 1 is replaced to photosensitive composition 7, in addition, carry out 1 identical operations with embodiment, measure the transmissivity (400nm～780nm's is average) after the dissolving substrate is coated with rete, the result is 99.7%.
[estimating 2]
The photosensitive composition 1 of embodiment 1 is replaced to photosensitive composition 7, in addition, carry out 1 identical operations,, find to obtain the good pattern of tack with sem observation pattern section with embodiment.
Embodiment 5
[modulation of photosensitive composition 8]
Following substances is mixed, obtain photosensitive composition 8.
(A-3) 0.4212 mass parts
(A-4) 0.1620 mass parts
(A-2) 0.2268 mass parts
Ester is spreading agent 0.1954 mass parts
(B-1) 1.2328 mass parts
(C-1) 0.1582 mass parts
(D-1) 0.0633 mass parts
(G-1) 0.0127 mass parts
(E-1) 6.6219 mass parts
(E-2) 0.8200 mass parts
(F-1) 0.0851 mass parts
(H-1) 0.0005 mass parts
With respect to the photosensitive composition solid constituent, (F) content of composition is 4.75 quality % by quality ratio.
[estimating 1]
The photosensitive composition 1 of embodiment 1 is replaced to photosensitive composition 8, in addition, carry out 1 identical operations with embodiment, measure the transmissivity (400nm～780nm's is average) after the dissolving substrate is coated with rete, the result is 99.5%.
[estimating 2]
The photosensitive composition 1 of embodiment 1 is replaced to photosensitive composition 8, in addition, carry out 1 identical operations,, find to obtain the good pattern of tack with sem observation pattern section with embodiment.
Embodiment 6
[modulation of photosensitive composition 9]
Following substances is mixed, obtain photosensitive composition 9.
(A-3) 0.4212 mass parts
(A-4) 0.1620 mass parts
(A-2) 0.2268 mass parts
Ester is spreading agent 0.1954 mass parts
(B-1) 1.2182 mass parts
(C-1) 0.1563 mass parts
(D-1) 0.0625 mass parts
(G-1) 0.0125 mass parts
(E-1) 6.6308 mass parts
(E-2) 0.8200 mass parts
(F-1) 0.0938 mass parts
(H-1) 0.0005 mass parts
With respect to the photosensitive composition solid constituent, (F) content of composition is 5.21 quality % by quality ratio.
[estimating 1]
The photosensitive composition 1 of embodiment 1 is replaced to photosensitive composition 9, in addition, carry out 1 identical operations with embodiment, measure the transmissivity (400nm～780nm's is average) after the dissolving substrate is coated with rete, the result is 98%.
[estimating 2]
The photosensitive composition 1 of embodiment 1 is replaced to photosensitive composition 9, in addition, carry out 1 identical operations with embodiment, with sem observation pattern section, discovery obtains the good pattern of tack, also observe a part of pattern and come off, but no problem in practicality.
Embodiment 7
Use (F-1) of (F-2) polypropylene glycol trihydroxy alcohol type 2500 (with the pure pharmaceutical worker's industry of light (strain) system) (use amount is also identical) alternate embodiment 1, in addition, carry out 1 identical operations, the modulation photosensitive composition with embodiment, form pattern, and estimate.Transmissivity is 99.9% as a result, and the tack of pattern is also good.
Industrial applicability
According to the present invention, can form transmissivity height, color filter pattern that tack is good.
Photosensitive composition of the present invention can form residue, the good color filter of pattern tack, and the gained color filter can be used for imaging sensor or liquid crystal indicator.

Claims (7)

1. photosensitive composition, its contain (A) colorant, (B) adhesive resin, (C) optical polymerism compound, (D) Photoepolymerizationinitiater initiater, (E) solvent and (F) be selected from the compound of formula (I-1) expression and the compound of formula (I-2) expression at least a compound
In formula (I-1) and the formula (I-2), R 1And R 2Independent separately, represent that respectively hydrogen atom or carbon number are 1～4 alkyl; P represents more than 4 or 4～integer below 90 or 90; Q, r and s are independent separately, represent respectively more than 1 or 1～integer below 40 or 40.
2. the described composition of claim 1, wherein, with respect to the photosensitive composition solid constituent, (F) content that is selected from least a compound in the compound of the compound of formula (I-1) expression and formula (I-2) expression is 5.0 quality % or below the 5.0 quality % by quality ratio.
3. claim 1 or 2 described compositions, wherein, with respect to the photosensitive composition solid constituent, (F) content that is selected from least a compound in the compound of formula (I-1) expression compound and formula (I-2) expression is 0.0010 quality % or 0.0010 quality % by quality ratio above～4.8 quality % or below the 4.8 quality %.
4. any described composition in the claim 1～3, wherein, (F) the polystyrene conversion weight-average molecular weight that is selected from least a compound in the compound of the compound of formula (I-1) expression and formula (I-2) expression be more than 300 or 300～below 5,000 or 5,000.
5. pattern, it uses, and any described composition forms in claim 1～4.
6. color filter, it contains the described pattern of claim 5.
7. imaging sensor, it possesses the described color filter of claim 6.
CNA200610107559XA 2005-07-29 2006-07-27 Painted photosensitive resin composition Pending CN1904735A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005220345 2005-07-29
JP2005220345 2005-07-29

Publications (1)

Publication Number Publication Date
CN1904735A true CN1904735A (en) 2007-01-31

Family

ID=37674026

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA200610107559XA Pending CN1904735A (en) 2005-07-29 2006-07-27 Painted photosensitive resin composition

Country Status (3)

Country Link
KR (1) KR20070014999A (en)
CN (1) CN1904735A (en)
TW (1) TW200707094A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101689020B (en) * 2007-09-04 2014-12-03 第一毛织株式会社 Photosensitive resin composition for color filter and color filter of using same

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100803899B1 (en) * 2007-02-13 2008-02-15 동우 화인켐 주식회사 A colored photosensitive resin composition, patterning method thereof, color filter, liquid crystal display device and imaging device having the same
KR101373895B1 (en) * 2007-04-13 2014-03-12 동우 화인켐 주식회사 A colored photosensitive resin composition, color filter, liquid display device and imaging device having the same
KR101401487B1 (en) * 2008-02-05 2014-06-03 동우 화인켐 주식회사 Colored photosensitive resin composition, and color filter and liquid crystal display device prepared by using the same
JP5439860B2 (en) * 2008-03-06 2014-03-12 住友化学株式会社 Colored photosensitive resin composition
JP5402158B2 (en) * 2008-06-06 2014-01-29 Ｊｓｒ株式会社 Color composition for forming red pixel, color filter, and color liquid crystal display element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101689020B (en) * 2007-09-04 2014-12-03 第一毛织株式会社 Photosensitive resin composition for color filter and color filter of using same

Also Published As

Publication number Publication date
TW200707094A (en) 2007-02-16
KR20070014999A (en) 2007-02-01

Similar Documents

Publication Publication Date Title
CN1770012A (en) Staining light-sensitive resin composition
CN1143143C (en) Ink jet colour filter resin composition, colour filter and manufacturing method thereof
CN1079547C (en) Photosensitive resin composition
CN1301276C (en) Alkali-soluble maleimide copolymer and liquid crystal display comprising the same
CN1991584A (en) Light solidification pigmentation composition and color filter, and liquid crystal display device
CN1800885A (en) Radiation sensitive composition for forming coat of colour, color filter and chromatic liquid crystal screen
CN101046630A (en) Radiation sensibility composition for forming staining layer, color filter and color liquid crystal display element
CN1690735A (en) Dyed layer forming radiation linear combination, colour filter and liquid crystal display screen
CN1677138A (en) Radiation-ray sensitive composition for colour-filtering piece, colour filtering piece and colour liquid crystal display device
CN100350281C (en) Radioactive-ray sensitive composition for colour optical filter, colouring-layer for mation method and use
CN1683943A (en) Radioactive ray sensitive composition for forming coloring layer, color filter and color liquid crystal display plate
CN1881081A (en) Radiation sensitive composition and color filter for forming coloration layer
CN1940724A (en) Photosensitive resin composition, protective film and separator of LCD panel, forming method thereof and lcd panel
CN101067723A (en) Radiation sensitive composition for forming a colored layer, color filter and color liquid crystal display device
CN101078876A (en) Green photonasty resin composition, transfer printing material, color filter and display device
CN1758077A (en) Radiation sensitive composition and method for the preparation of the same
CN1904736A (en) Positive-type photosensitive resin composition and cured film manufactured therefrom
CN1532566A (en) Radiation sensitive composition for color filter
CN1904735A (en) Painted photosensitive resin composition
CN1673780A (en) Radiation sensitive composition for repairing a color filter defect and method of repairing a color filter defect
CN1781995A (en) Colored composition
CN101042532A (en) Radiation sensitive composition for forming a colored layer and color filter
CN1834164A (en) Pigmentation combination
CN101078878A (en) Colored photosensitive resin composition, color filter, image sensor, and camera system
CN1916762A (en) Photosensitive resin composition, cushion for display panel and display panel

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Open date: 20070131