TW200714870A - Apparatus and method for measurement and compensation of atmospheric turbulence effects in wavefront interferometry - Google Patents

Apparatus and method for measurement and compensation of atmospheric turbulence effects in wavefront interferometry

Info

Publication number
TW200714870A
TW200714870A TW095131312A TW95131312A TW200714870A TW 200714870 A TW200714870 A TW 200714870A TW 095131312 A TW095131312 A TW 095131312A TW 95131312 A TW95131312 A TW 95131312A TW 200714870 A TW200714870 A TW 200714870A
Authority
TW
Taiwan
Prior art keywords
array
atmospheric turbulence
measurement
compensation
computing
Prior art date
Application number
TW095131312A
Other languages
English (en)
Inventor
Henry A Hill
Original Assignee
Zetetic Inst
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zetetic Inst filed Critical Zetetic Inst
Publication of TW200714870A publication Critical patent/TW200714870A/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
    • G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
    • G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
    • G01B9/02005—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using discrete frequency stepping or switching
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/06—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
TW095131312A 2005-08-26 2006-08-25 Apparatus and method for measurement and compensation of atmospheric turbulence effects in wavefront interferometry TW200714870A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US71195205P 2005-08-26 2005-08-26

Publications (1)

Publication Number Publication Date
TW200714870A true TW200714870A (en) 2007-04-16

Family

ID=37772440

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095131312A TW200714870A (en) 2005-08-26 2006-08-25 Apparatus and method for measurement and compensation of atmospheric turbulence effects in wavefront interferometry

Country Status (5)

Country Link
US (1) US7460245B2 (zh)
EP (1) EP1917496A4 (zh)
JP (1) JP2009506330A (zh)
TW (1) TW200714870A (zh)
WO (1) WO2007025147A2 (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5523664B2 (ja) * 2007-11-06 2014-06-18 株式会社ミツトヨ 干渉計
CN114563030A (zh) 2009-05-27 2022-05-31 希里克萨有限公司 光学感测的方法及装置
GB201006593D0 (en) * 2010-04-20 2010-06-02 Phase Focus Ltd Characteristic determination
US8558890B2 (en) 2010-08-12 2013-10-15 Goodrich Corporation Aerial reconnaissance camera system with atmospheric dispersion correction
AT520258B1 (de) * 2017-07-26 2022-02-15 Univ Wien Tech Verfahren zur spektroskopischen bzw. spektrometrischen Untersuchung einer Probe
KR102150110B1 (ko) * 2018-12-12 2020-08-31 주식회사 내일해 측정 대상 물체의 3차원 형상 정보 생성 방법
WO2021054097A1 (ja) * 2019-09-18 2021-03-25 株式会社フジキン 濃度測定装置
US11237059B1 (en) * 2020-12-14 2022-02-01 Gerchberg Ophthalmic Dispensing, PLLC Totagraphy: Coherent diffractive/digital information reconstruction by iterative phase recovery using special masks
CA3232526A1 (en) * 2021-09-21 2023-03-30 National Research Council Of Canada Optical beamforming and interferometry using digital source modulation

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU528882B2 (en) 1978-09-26 1983-05-19 Commonwealth Scientific And Industrial Research Organisation Producing anhydrous aluminium chloride
US4575248A (en) 1984-06-18 1986-03-11 Itek Corporation Wavefront sensor employing novel D.C. shearing interferometer
US4733967A (en) 1987-03-19 1988-03-29 Zygo Corporation Apparatus for the measurement of the refractive index of a gas
JPH0198902A (ja) 1987-10-12 1989-04-17 Res Dev Corp Of Japan 光波干渉測長装置
DE3930632A1 (de) 1989-09-13 1991-03-14 Steinbichler Hans Verfahren zur direkten phasenmessung von strahlung, insbesondere lichtstrahlung, und vorrichtung zur durchfuehrung dieses verfahrens
EP0561015A1 (de) 1992-03-17 1993-09-22 International Business Machines Corporation Interferometrische Phasenmessung
US5412474A (en) 1992-05-08 1995-05-02 Smithsonian Institution System for measuring distance between two points using a variable frequency coherent source
US5404222A (en) 1994-01-14 1995-04-04 Sparta, Inc. Interferametric measuring system with air turbulence compensation
JP3295583B2 (ja) 1994-12-19 2002-06-24 シャープ株式会社 光学装置および該光学装置を用いた頭部搭載型ディスプレイ
US5589938A (en) 1995-07-10 1996-12-31 Zygo Corporation Method and apparatus for optical interferometric measurements with reduced sensitivity to vibration
US5663793A (en) 1995-09-05 1997-09-02 Zygo Corporation Homodyne interferometric receiver and calibration method having improved accuracy and functionality
US5883717A (en) 1996-06-04 1999-03-16 Northeastern University Optical quadrature interferometry utilizing polarization to obtain in-phase and quadrature information
US5915048A (en) 1996-06-05 1999-06-22 Zetetic Institute Method and apparatus for discriminating in-focus images from out-of-focus light signals from background and foreground light sources
US5838485A (en) 1996-08-20 1998-11-17 Zygo Corporation Superheterodyne interferometer and method for compensating the refractive index of air using electronic frequency multiplication
US5764362A (en) 1996-08-20 1998-06-09 Zygo Corporation Superheterodyne method and apparatus for measuring the refractive index of air using multiple-pass interferometry
US6480285B1 (en) 1997-01-28 2002-11-12 Zetetic Institute Multiple layer confocal interference microscopy using wavenumber domain reflectometry and background amplitude reduction and compensation
US5760901A (en) 1997-01-28 1998-06-02 Zetetic Institute Method and apparatus for confocal interference microscopy with background amplitude reduction and compensation
GB9802688D0 (en) * 1998-02-06 1998-07-29 Marconi Gec Ltd Improvements in or relating to sound detection
US6271923B1 (en) 1999-05-05 2001-08-07 Zygo Corporation Interferometry system having a dynamic beam steering assembly for measuring angle and distance
ATE285081T1 (de) 1999-08-02 2005-01-15 Zetetic Inst Interferometrische konfokale nahfeld- abtastmikroskopie
US6304330B1 (en) 1999-10-06 2001-10-16 Metrolaser, Inc. Methods and apparatus for splitting, imaging, and measuring wavefronts in interferometry
US7043082B2 (en) * 2000-01-06 2006-05-09 Canon Kabushiki Kaisha Demodulation and phase estimation of two-dimensional patterns
WO2001088468A1 (en) 2000-05-17 2001-11-22 Zygo Corporation Interferometric apparatus and method
FR2817030B1 (fr) 2000-11-17 2003-03-28 Centre Nat Rech Scient Procede et dispositif d'imagerie microscopique interferentielle d'un objet a haute cadence
US6847452B2 (en) 2001-08-02 2005-01-25 Zygo Corporation Passive zero shear interferometers
TWI259898B (en) * 2002-01-24 2006-08-11 Zygo Corp Method and apparatus for compensation of time-varying optical properties of gas in interferometry
JP2006505778A (ja) 2002-11-04 2006-02-16 ザイゴ　コーポレーション 干渉計経路内の屈折度の摂動の補正
US7084983B2 (en) 2003-01-27 2006-08-01 Zetetic Institute Interferometric confocal microscopy incorporating a pinhole array beam-splitter
KR20060011938A (ko) 2003-01-27 2006-02-06 제테틱 인스티튜트 핀홀 어레이 빔-스플리터가 삽입된 간섭계 공초점 현미경
WO2004090465A2 (en) 2003-04-01 2004-10-21 Zetetic Institute Apparatus and method for joint measurement of fields of scattered/reflected or transmitted orthogonally polarized beams by an object in interferometry
US7057738B2 (en) 2003-08-28 2006-06-06 A D Technology Corporation Simultaneous phase-shifting Fizeau interferometer
US7355722B2 (en) 2003-09-10 2008-04-08 Zetetic Institute Catoptric and catadioptric imaging systems with adaptive catoptric surfaces
US7221461B2 (en) * 2004-08-13 2007-05-22 Zygo Corporation Method and apparatus for interferometric measurement of components with large aspect ratios
US7161680B2 (en) 2004-08-16 2007-01-09 Zetetic Institute Apparatus and method for joint and time delayed measurements of components of conjugated quadratures of fields of reflected/scattered and transmitted/scattered beams by an object in interferometry
US20070014319A1 (en) 2005-07-15 2007-01-18 Zetetic Institute Continuously Tunable External Cavity Diode Laser Sources With High Tuning And Switching Rates And Extended Tuning Ranges
US7405832B2 (en) 2005-08-08 2008-07-29 Zetetic Institute Apparatus and methods for reduction and compensation of effects of vibrations and of environmental effects in wavefront interferometry

Also Published As

Publication number Publication date
WO2007025147A2 (en) 2007-03-01
EP1917496A2 (en) 2008-05-07
US20070046951A1 (en) 2007-03-01
WO2007025147A3 (en) 2009-05-07
EP1917496A4 (en) 2010-07-28
US7460245B2 (en) 2008-12-02
JP2009506330A (ja) 2009-02-12

Similar Documents

Publication Publication Date Title
TW200714870A (en) Apparatus and method for measurement and compensation of atmospheric turbulence effects in wavefront interferometry
WO2005029193A3 (en) Interferometric analysis of surfaces.
Novák et al. Multi-step phase-shifting algorithms insensitive to linear phase shift errors
TW200604695A (en) Methods and systems for determining optical properties using low-coherence interference signals
NO20080968L (no) Fremgangsmate og apparat for direkte deteksjon av signaler fra et differensialforsinket heterodynt interferometrisk system
CA2873477C (en) Systems and methods for detecting transient acoustic signals
TW200604494A (en) Small displacement measuring method and instrument
WO2006107928A3 (en) Multiple channel interferometric surface contour measurement system
TW200632306A (en) Interferometer for determining characteristics of an object surface
WO2010062853A3 (en) Scan error correction in low coherence scanning interferometry
WO2010070113A3 (en) A position resolved measurement apparatus and a method for acquiring space coordinates of a quantum beam incident thereon
WO2008108374A1 (ja) 信号測定装置および試験装置
AU2001250613A1 (en) Spatial and spectral wavefront analysis and measurement
WO2008154349A3 (en) Method and apparatus for localized polarization sensitive imaging
IN2014DN05651A (zh)
WO2007019548A3 (en) Apparatus and methods for reduction and compensation of effects of vibrations and of environmental effects in wavefront interferometry
JP6796043B2 (ja) 光反射測定装置及びその方法
CN115566522B (zh) 激光相干合成相位误差补偿装置及方法
TWM476258U (en) Multi-beam interferometric displacement measurement system utilized in the large measuring range
Sai et al. Multi-source acoustic emission localization technology research based on FBG sensing network and time reversal focusing imaging
Roozen et al. Measurement-based determination of the irrotational part of the structural intensity by means of test functional series expansion
Sun et al. Array geometry calibration for underwater compact arrays
WO2005008214A3 (en) Apparatus and method for ellipsometric measurements with high spatial resolution
TW200728685A (en) Apparatus and method for reducing effects of coherent artifacts and compensation of effects of vibrations and environmental changes in interferometry
TW200700940A (en) Apparatus and method for in situ and ex situ measurements of optical system flare