TW200702344A - Hologram recording material - Google Patents

Hologram recording material

Info

Publication number
TW200702344A
TW200702344A TW095112395A TW95112395A TW200702344A TW 200702344 A TW200702344 A TW 200702344A TW 095112395 A TW095112395 A TW 095112395A TW 95112395 A TW95112395 A TW 95112395A TW 200702344 A TW200702344 A TW 200702344A
Authority
TW
Taiwan
Prior art keywords
visible light
polymer
recording material
hologram recording
molecule
Prior art date
Application number
TW095112395A
Other languages
English (en)
Inventor
Yoshihide Kawaguchi
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Publication of TW200702344A publication Critical patent/TW200702344A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/40—Esters of unsaturated alcohols, e.g. allyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/04—Acids, Metal salts or ammonium salts thereof
    • C08F20/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/026—Recording materials or recording processes
    • G03H2001/0264—Organic recording material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Holo Graphy (AREA)
  • Polymerization Catalysts (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
TW095112395A 2005-04-08 2006-04-07 Hologram recording material TW200702344A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005112136A JP4248020B2 (ja) 2005-04-08 2005-04-08 ホログラム記録材料

Publications (1)

Publication Number Publication Date
TW200702344A true TW200702344A (en) 2007-01-16

Family

ID=37086941

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095112395A TW200702344A (en) 2005-04-08 2006-04-07 Hologram recording material

Country Status (7)

Country Link
US (1) US7781124B2 (zh)
EP (1) EP1873593A1 (zh)
JP (1) JP4248020B2 (zh)
KR (1) KR20070118940A (zh)
CN (1) CN101061442B (zh)
TW (1) TW200702344A (zh)
WO (1) WO2006109665A1 (zh)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
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JP4257295B2 (ja) * 2005-01-07 2009-04-22 日東電工株式会社 光屈折率変調重合体組成物、ホログラム記録材料および屈折率制御方法
WO2011054791A1 (de) * 2009-11-03 2011-05-12 Bayer Materialscience Ag Verfahren zur herstellung eines holographischen films
US9057950B2 (en) * 2010-02-02 2015-06-16 Bayer Intellectual Property Gmbh Photopolymer formulation having ester-based writing monomers
DE102010000559A1 (de) * 2010-02-25 2011-08-25 Bundesdruckerei GmbH, 10969 Verfahren zur Verifikation von Sicherheits- oder Wertdokumenten mit einem Anthrachinon-Farbstoff
US8778568B2 (en) * 2010-12-14 2014-07-15 General Electric Company Optical data storage media and methods for using the same
CN102344504B (zh) * 2011-07-29 2013-03-13 华中科技大学 一种制备高衍射效率全息光聚合物材料的可见光光引发体系
JP5998722B2 (ja) * 2011-08-03 2016-09-28 三菱化学株式会社 ホログラム記録媒体用組成物及びこれを用いたホログラム記録媒体
EP2766902A1 (de) * 2011-10-12 2014-08-20 Bayer Intellectual Property GmbH Schwefelhaltige kettenübertragungsreagenzien in polyurethan-basierten photopolymer-formulierungen
JP6048078B2 (ja) * 2011-11-08 2016-12-21 三菱化学株式会社 ホログラム記録媒体用組成物及びこれを用いたホログラム記録媒体並びにそれらの製造方法
KR102309427B1 (ko) * 2018-09-27 2021-10-05 주식회사 엘지화학 홀로그램 매체
KR102426756B1 (ko) 2019-01-25 2022-07-27 주식회사 엘지화학 포토폴리머 조성물
US11733647B2 (en) * 2019-05-08 2023-08-22 Meta Platforms Technologies, Llc Light-activated controlled radical polymerization
KR102384288B1 (ko) * 2019-07-02 2022-04-06 주식회사 엘지화학 포토폴리머 조성물
CN112759701B (zh) * 2019-10-21 2022-12-30 杭州光粒科技有限公司 光致聚合物组合物、反射式衍射光栅及其制备方法
CN112778444B (zh) * 2021-01-25 2022-11-08 南京工业大学 一种光诱导有机催化制备聚烯烃的方法

Family Cites Families (20)

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Publication number Priority date Publication date Assignee Title
BE755251A (fr) * 1969-08-25 1971-02-25 Du Pont Enregistrement holographique dans des couches photopoly- merisables
US3652275A (en) * 1970-07-09 1972-03-28 Du Pont HEXAARYLBIIMIDAZOLE BIS (p-DIALKYL-AMINOPHENYL-{60 ,{62 -UNSATURATED) KETONE COMPOSITIONS
JPS5315152A (en) * 1976-07-27 1978-02-10 Canon Inc Hologram
US4293674A (en) * 1980-06-03 1981-10-06 E. I. Du Pont De Nemours And Company Dienyl methacrylates
US4415651A (en) * 1981-03-30 1983-11-15 E. I. Du Pont De Nemours And Company Aqueous processable, positive-working photopolymer compositions
JPS6222152A (ja) 1985-07-22 1987-01-30 Toshiba Corp ハ−ドウエアシミユレ−シヨン装置
DE3719871A1 (de) * 1987-06-13 1988-12-29 Basf Ag Durch photopolymerisation vernetzbare heisspraegeplatten
US4942102A (en) * 1988-01-15 1990-07-17 E. I. Du Pont De Nemours And Company Holographic optical elements having a reflection hologram formed in a photopolymer
US5886101A (en) * 1988-03-02 1999-03-23 E. I. Du Pont De Nemours And Company Solvent dispersible interpenetrating polymer networks
EP0501433B1 (en) * 1991-02-28 1997-05-07 E.I. Du Pont De Nemours And Company Photosensitive compositions using solvent dispersible interpenetrating polymer networks
JPH0792313A (ja) 1993-09-20 1995-04-07 Toshiba Corp 光ファイバー型回折格子
JP2914486B2 (ja) 1995-12-26 1999-06-28 清藏 宮田 光ファイバ、及びその製造方法
JPH10273505A (ja) * 1997-03-27 1998-10-13 Mitsubishi Rayon Co Ltd ポリ（メタ）アクリル酸エステルの製造法
JPH11228327A (ja) * 1998-02-18 1999-08-24 Gc Corp 歯科用ペースト系グラスアイオノマーセメント組成物
JPH11249298A (ja) * 1998-03-04 1999-09-17 Mitsubishi Chemical Corp 感光性組成物及び感光性平版印刷版
GB0030675D0 (en) * 2000-12-15 2001-01-31 Rue De Int Ltd Methods of creating high efficiency diffuse back-reflectors based on embossed surface relief
US6515067B2 (en) * 2001-01-16 2003-02-04 Chevron Phillips Chemical Company Lp Oxygen scavenging polymer emulsion suitable as a coating, an adhesive, or a sealant
JP2002322207A (ja) * 2001-04-24 2002-11-08 Fuji Photo Film Co Ltd 光重合性組成物及び記録材料
JP3718518B2 (ja) * 2003-10-03 2005-11-24 日東電工株式会社 光屈折率変調重合体、光屈折率変調重合体組成物および屈折率制御方法
JP4257295B2 (ja) * 2005-01-07 2009-04-22 日東電工株式会社 光屈折率変調重合体組成物、ホログラム記録材料および屈折率制御方法

Also Published As

Publication number Publication date
US20080305404A1 (en) 2008-12-11
JP4248020B2 (ja) 2009-04-02
CN101061442A (zh) 2007-10-24
CN101061442B (zh) 2011-02-02
EP1873593A1 (en) 2008-01-02
KR20070118940A (ko) 2007-12-18
WO2006109665A1 (ja) 2006-10-19
US7781124B2 (en) 2010-08-24
JP2006292933A (ja) 2006-10-26

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