TW200700573A - Sputtering target and manufacturing method thereof - Google Patents

Sputtering target and manufacturing method thereof

Info

Publication number
TW200700573A
TW200700573A TW095103875A TW95103875A TW200700573A TW 200700573 A TW200700573 A TW 200700573A TW 095103875 A TW095103875 A TW 095103875A TW 95103875 A TW95103875 A TW 95103875A TW 200700573 A TW200700573 A TW 200700573A
Authority
TW
Taiwan
Prior art keywords
sputtering target
less
weight
particles
manufacturing
Prior art date
Application number
TW095103875A
Other languages
English (en)
Inventor
Toshio Morimoto
Masakazu Achikita
Hiroyuki Watanabe
Original Assignee
Sumitomo Metal Mining Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co filed Critical Sumitomo Metal Mining Co
Publication of TW200700573A publication Critical patent/TW200700573A/zh

Links

Classifications

    • E—FIXED CONSTRUCTIONS
    • E01—CONSTRUCTION OF ROADS, RAILWAYS, OR BRIDGES
    • E01C—CONSTRUCTION OF, OR SURFACES FOR, ROADS, SPORTS GROUNDS, OR THE LIKE; MACHINES OR AUXILIARY TOOLS FOR CONSTRUCTION OR REPAIR
    • E01C5/00—Pavings made of prefabricated single units
    • E01C5/18—Pavings made of prefabricated single units made of rubber units
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61H—PHYSICAL THERAPY APPARATUS, e.g. DEVICES FOR LOCATING OR STIMULATING REFLEX POINTS IN THE BODY; ARTIFICIAL RESPIRATION; MASSAGE; BATHING DEVICES FOR SPECIAL THERAPEUTIC OR HYGIENIC PURPOSES OR SPECIFIC PARTS OF THE BODY
    • A61H3/00—Appliances for aiding patients or disabled persons to walk about
    • A61H3/06—Walking aids for blind persons
    • A61H3/066—Installations on the floor, e.g. special surfaces, to guide blind persons
    • E—FIXED CONSTRUCTIONS
    • E01—CONSTRUCTION OF ROADS, RAILWAYS, OR BRIDGES
    • E01C—CONSTRUCTION OF, OR SURFACES FOR, ROADS, SPORTS GROUNDS, OR THE LIKE; MACHINES OR AUXILIARY TOOLS FOR CONSTRUCTION OR REPAIR
    • E01C11/00—Details of pavings
    • E01C11/22—Gutters; Kerbs ; Surface drainage of streets, roads or like traffic areas
    • E01C11/224—Surface drainage of streets
    • E—FIXED CONSTRUCTIONS
    • E01—CONSTRUCTION OF ROADS, RAILWAYS, OR BRIDGES
    • E01C—CONSTRUCTION OF, OR SURFACES FOR, ROADS, SPORTS GROUNDS, OR THE LIKE; MACHINES OR AUXILIARY TOOLS FOR CONSTRUCTION OR REPAIR
    • E01C11/00—Details of pavings
    • E01C11/24—Methods or arrangements for preventing slipperiness or protecting against influences of the weather
    • E—FIXED CONSTRUCTIONS
    • E01—CONSTRUCTION OF ROADS, RAILWAYS, OR BRIDGES
    • E01C—CONSTRUCTION OF, OR SURFACES FOR, ROADS, SPORTS GROUNDS, OR THE LIKE; MACHINES OR AUXILIARY TOOLS FOR CONSTRUCTION OR REPAIR
    • E01C2201/00—Paving elements
    • E01C2201/10—Paving elements having build-in shock absorbing devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Structural Engineering (AREA)
  • Civil Engineering (AREA)
  • Architecture (AREA)
  • Health & Medical Sciences (AREA)
  • Rehabilitation Therapy (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physical Education & Sports Medicine (AREA)
  • Pain & Pain Management (AREA)
  • Epidemiology (AREA)
  • Physical Vapour Deposition (AREA)
  • Liquid Crystal (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
  • Gas-Filled Discharge Tubes (AREA)
TW095103875A 2005-05-18 2006-02-06 Sputtering target and manufacturing method thereof TW200700573A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005145789A JP2006322039A (ja) 2005-05-18 2005-05-18 スパッタリングターゲット

Publications (1)

Publication Number Publication Date
TW200700573A true TW200700573A (en) 2007-01-01

Family

ID=37424634

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095103875A TW200700573A (en) 2005-05-18 2006-02-06 Sputtering target and manufacturing method thereof

Country Status (4)

Country Link
JP (1) JP2006322039A (zh)
KR (1) KR20060119735A (zh)
CN (1) CN1865490A (zh)
TW (1) TW200700573A (zh)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4954816B2 (ja) * 2007-07-18 2012-06-20 山陽特殊製鋼株式会社 Ｎｉ−Ｗ系中間層用スパッタリングターゲット材の製造方法
JP2010133001A (ja) * 2008-12-08 2010-06-17 Hitachi Metals Ltd Ｎｉ合金ターゲット材の製造方法
JP4948634B2 (ja) 2010-09-01 2012-06-06 Ｊｘ日鉱日石金属株式会社 インジウムターゲット及びその製造方法
JP5140169B2 (ja) 2011-03-01 2013-02-06 Ｊｘ日鉱日石金属株式会社 インジウムターゲット及びその製造方法
KR101323151B1 (ko) * 2011-09-09 2013-10-30 가부시키가이샤 에스에이치 카퍼프로덕츠 구리-망간합금 스퍼터링 타겟재, 그것을 사용한 박막 트랜지스터 배선 및 박막 트랜지스터
JP5026611B1 (ja) 2011-09-21 2012-09-12 Ｊｘ日鉱日石金属株式会社 積層構造体及びその製造方法
JP5074628B1 (ja) * 2012-01-05 2012-11-14 Ｊｘ日鉱日石金属株式会社 インジウム製スパッタリングターゲット及びその製造方法
KR20140054169A (ko) 2012-08-22 2014-05-08 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 인듐제 원통형 스퍼터링 타깃 및 그 제조 방법
WO2015004958A1 (ja) 2013-07-08 2015-01-15 Jx日鉱日石金属株式会社 スパッタリングターゲット及び、それの製造方法
CN104745880B (zh) * 2015-04-14 2017-08-25 钢铁研究总院 一种高密度动能超高强度钨镍耐热合金及制备方法
CN105506551B (zh) * 2015-11-26 2017-09-19 厦门虹鹭钨钼工业有限公司 一种用于电致变色玻璃镀膜的钨镍合金靶材的制备方法
TWI807114B (zh) * 2018-10-10 2023-07-01 日商Ｊｘ金屬股份有限公司 氧化鎂濺鍍靶
JP6791313B1 (ja) * 2019-07-12 2020-11-25 三菱マテリアル株式会社 ニッケル合金スパッタリングターゲット

Also Published As

Publication number Publication date
CN1865490A (zh) 2006-11-22
KR20060119735A (ko) 2006-11-24
JP2006322039A (ja) 2006-11-30

Similar Documents

Publication Publication Date Title
TW200700573A (en) Sputtering target and manufacturing method thereof
EP2368857A8 (en) Heat ray-shielding material
TW200643199A (en) Al-Ni-rare earth element alloy sputtering target
MX2016012380A (es) Miembro de lamina de acero formada en caliente de alta resistencia.
TW200637924A (en) Novel ruthenium-based materials and ruthenium alloys, their use in vapor deposition or atomic layer deposition and films produced therefrom
EP2620523A3 (en) Method of forming a microstructure
WO2008079088A3 (en) Multilayered coated cutting tool
TW200644309A (en) Reduced reflectance display devices containing a thin-layer metal-organic mixed layer(MOML)
NO20064799L (no) Slitesterkt hardt belegg inneholdende silikonnitrid
EP1717347A3 (en) Coated insert
EP1990855A4 (en) SEPARATOR FOR FESTPOLYMER FUEL CELL AND METHOD FOR THE PRODUCTION THEREOF
TWI263684B (en) Ag based sputtering target and method for manufacturing thereof
NO20073889L (no) Fast farmasoytisk sammensetning omfattende Valsartan
MX2019007991A (es) Lamina de acero y metodo para producir la misma.
TW200940742A (en) Solution for processing of metal replacement with metal aluminum or aluminum alloy and method for surface processing using such solution
TW200801236A (en) Coated steel sheet
EP2256228A3 (en) Layered coating for erosion protection
Wang et al. Antibacterial nanostructured copper coatings deposited on tantalum by magnetron sputtering
WO2008117475A1 (ja) コート剤及び反射防止フィルム
EP2104169A4 (en) ALLOY COATING FILM FOR FUEL CELL METAL SEPARATOR, PROCESS FOR PRODUCING THE SAME, SPUTTERING TARGET MATERIAL, METAL SEPARATOR, AND FUEL CELL
WO2007021741A3 (en) Methods of using a nanotransfer printing stamp having conductively coated sidewalls
Ren et al. Effect of sputtering parameters on (AlCrMnMoNiZr) N films
DE602006021012D1 (en) Staublose pulverstoffe
WO2008084839A1 (ja) アルミニウム電解コンデンサケース用樹脂被覆アルミニウム合金板材、アルミニウム電解コンデンサケース、及びアルミニウム電解コンデンサ
ATE438686T1 (de) Abriebfeste fluorpolymerzusammensetzungen mit mikrofaserstoff