TW200643157A - Abrasive for semiconductor integrated circuit device, method for polishing semiconductor integrated circuit device and semiconductor integrated circuit device manufacturing method - Google Patents
Abrasive for semiconductor integrated circuit device, method for polishing semiconductor integrated circuit device and semiconductor integrated circuit device manufacturing methodInfo
- Publication number
- TW200643157A TW200643157A TW095108282A TW95108282A TW200643157A TW 200643157 A TW200643157 A TW 200643157A TW 095108282 A TW095108282 A TW 095108282A TW 95108282 A TW95108282 A TW 95108282A TW 200643157 A TW200643157 A TW 200643157A
- Authority
- TW
- Taiwan
- Prior art keywords
- integrated circuit
- semiconductor integrated
- circuit device
- polishing
- abrasive
- Prior art date
Links
- 238000005498 polishing Methods 0.000 title abstract 5
- 239000004065 semiconductor Substances 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 2
- 229920005591 polysilicon Polymers 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
- 229910000420 cerium oxide Inorganic materials 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 abstract 1
- 239000002245 particle Substances 0.000 abstract 1
- 229920000768 polyamine Polymers 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/0056—Control means for lapping machines or devices taking regard of the pH-value of lapping agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
- B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/32115—Planarisation
- H01L21/3212—Planarisation by chemical mechanical polishing [CMP]
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005074373 | 2005-03-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200643157A true TW200643157A (en) | 2006-12-16 |
Family
ID=36991494
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095108282A TW200643157A (en) | 2005-03-16 | 2006-03-10 | Abrasive for semiconductor integrated circuit device, method for polishing semiconductor integrated circuit device and semiconductor integrated circuit device manufacturing method |
Country Status (7)
Country | Link |
---|---|
US (1) | US8030213B2 (zh) |
EP (1) | EP1860688A4 (zh) |
JP (1) | JPWO2006098141A1 (zh) |
KR (1) | KR20070112453A (zh) |
CN (1) | CN100578740C (zh) |
TW (1) | TW200643157A (zh) |
WO (1) | WO2006098141A1 (zh) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4554363B2 (ja) * | 2002-07-22 | 2010-09-29 | Agcセイミケミカル株式会社 | 半導体用研磨剤、その製造方法及び研磨方法 |
JP2006278522A (ja) * | 2005-03-28 | 2006-10-12 | Seimi Chem Co Ltd | 半導体集積回路装置用研磨剤、研磨方法および半導体集積回路装置の製造方法 |
US7585340B2 (en) | 2006-04-27 | 2009-09-08 | Cabot Microelectronics Corporation | Polishing composition containing polyether amine |
JP4957284B2 (ja) * | 2006-04-28 | 2012-06-20 | 旭硝子株式会社 | 磁気ディスク用ガラス基板の製造方法および磁気ディスク |
CN101512733A (zh) * | 2006-09-11 | 2009-08-19 | 旭硝子株式会社 | 用于半导体集成电路装置的抛光剂、抛光方法以及半导体集成电路装置的制造方法 |
KR101349983B1 (ko) * | 2006-09-13 | 2014-01-13 | 아사히 가라스 가부시키가이샤 | 반도체 집적 회로 장치용 연마제, 연마 방법 및 반도체 집적 회로 장치의 제조 방법 |
CN101656209B (zh) * | 2008-08-18 | 2012-03-07 | 中芯国际集成电路制造(上海)有限公司 | 化学机械研磨的方法 |
KR20110090918A (ko) * | 2008-11-07 | 2011-08-10 | 아사히 가라스 가부시키가이샤 | 연마제, 연마 방법 및 반도체 집적 회로 장치의 제조 방법 |
WO2012098933A1 (ja) * | 2011-01-20 | 2012-07-26 | 旭硝子株式会社 | 研磨剤、研磨方法および半導体集積回路装置の製造方法 |
US20140054266A1 (en) * | 2012-08-24 | 2014-02-27 | Wiechang Jin | Compositions and methods for selective polishing of platinum and ruthenium materials |
US9281210B2 (en) * | 2013-10-10 | 2016-03-08 | Cabot Microelectronics Corporation | Wet-process ceria compositions for polishing substrates, and methods related thereto |
JP6423279B2 (ja) * | 2015-02-10 | 2018-11-14 | 株式会社フジミインコーポレーテッド | 研磨用組成物 |
US9803107B2 (en) * | 2015-02-12 | 2017-10-31 | Asahi Glass Company, Limited | Polishing agent, polishing method and method for manufacturing semiconductor integrated circuit device |
JP2016154208A (ja) * | 2015-02-12 | 2016-08-25 | 旭硝子株式会社 | 研磨剤、研磨方法および半導体集積回路装置の製造方法 |
WO2019030865A1 (ja) * | 2017-08-09 | 2019-02-14 | 日立化成株式会社 | 研磨液及び研磨方法 |
CN113004799A (zh) * | 2019-12-19 | 2021-06-22 | 安集微电子科技(上海)股份有限公司 | 一种化学机械抛光液 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1112561A (ja) | 1997-04-28 | 1999-01-19 | Seimi Chem Co Ltd | 半導体用研磨剤および半導体用研磨剤の製造方法 |
US6099604A (en) * | 1997-08-21 | 2000-08-08 | Micron Technology, Inc. | Slurry with chelating agent for chemical-mechanical polishing of a semiconductor wafer and methods related thereto |
KR100851451B1 (ko) * | 1998-12-25 | 2008-08-08 | 히다치 가세고교 가부시끼가이샤 | Cmp 연마제, cmp 연마제용 첨가액 및 기판의 연마방법 |
JP2001035818A (ja) | 1999-07-16 | 2001-02-09 | Seimi Chem Co Ltd | 半導体用研磨剤 |
JP2001185514A (ja) * | 1999-12-27 | 2001-07-06 | Hitachi Chem Co Ltd | Cmp研磨剤及び基板の研磨方法 |
JP4195212B2 (ja) * | 2000-10-23 | 2008-12-10 | 花王株式会社 | 研磨液組成物 |
KR100416587B1 (ko) * | 2000-12-22 | 2004-02-05 | 삼성전자주식회사 | 씨엠피 연마액 |
JP2003347247A (ja) * | 2002-05-28 | 2003-12-05 | Hitachi Chem Co Ltd | 半導体絶縁膜用cmp研磨剤及び基板の研磨方法 |
JP2004022804A (ja) * | 2002-06-17 | 2004-01-22 | Disco Abrasive Syst Ltd | 研磨装置 |
TWI256971B (en) * | 2002-08-09 | 2006-06-21 | Hitachi Chemical Co Ltd | CMP abrasive and method for polishing substrate |
JP2004266155A (ja) * | 2003-03-03 | 2004-09-24 | Jsr Corp | 化学機械研磨用水系分散体およびこれを用いた化学機械研磨方法ならびに半導体装置の製造方法 |
US7005382B2 (en) * | 2002-10-31 | 2006-02-28 | Jsr Corporation | Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing process, production process of semiconductor device and material for preparing an aqueous dispersion for chemical mechanical polishing |
JP4267348B2 (ja) * | 2003-03-05 | 2009-05-27 | 花王株式会社 | 研磨基板の製造方法 |
JP2007535118A (ja) * | 2003-07-09 | 2007-11-29 | ダイネア ケミカルズ オイ | 化学的機械的な平坦化に用いるための非高分子有機粒子 |
JP2005038924A (ja) * | 2003-07-16 | 2005-02-10 | Sanyo Chem Ind Ltd | Cmpプロセス用研磨液 |
JP2005048125A (ja) * | 2003-07-31 | 2005-02-24 | Hitachi Chem Co Ltd | Cmp研磨剤、研磨方法及び半導体装置の製造方法 |
US20050159085A1 (en) * | 2003-10-30 | 2005-07-21 | Scott Brandon S. | Method of chemically mechanically polishing substrates |
JP2006278522A (ja) * | 2005-03-28 | 2006-10-12 | Seimi Chem Co Ltd | 半導体集積回路装置用研磨剤、研磨方法および半導体集積回路装置の製造方法 |
-
2006
- 2006-02-27 JP JP2007508054A patent/JPWO2006098141A1/ja active Pending
- 2006-02-27 WO PCT/JP2006/303647 patent/WO2006098141A1/ja active Application Filing
- 2006-02-27 KR KR1020077018570A patent/KR20070112453A/ko not_active Application Discontinuation
- 2006-02-27 EP EP06714784A patent/EP1860688A4/en not_active Withdrawn
- 2006-02-27 CN CN200680008440A patent/CN100578740C/zh active Active
- 2006-03-10 TW TW095108282A patent/TW200643157A/zh unknown
-
2007
- 2007-09-17 US US11/856,166 patent/US8030213B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
KR20070112453A (ko) | 2007-11-26 |
CN100578740C (zh) | 2010-01-06 |
EP1860688A4 (en) | 2010-08-18 |
US8030213B2 (en) | 2011-10-04 |
WO2006098141A1 (ja) | 2006-09-21 |
JPWO2006098141A1 (ja) | 2008-08-21 |
EP1860688A1 (en) | 2007-11-28 |
CN101142659A (zh) | 2008-03-12 |
US20080070412A1 (en) | 2008-03-20 |
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