TW200632575A - Stage device and exposure apparatus - Google Patents

Stage device and exposure apparatus

Info

Publication number
TW200632575A
TW200632575A TW094142000A TW94142000A TW200632575A TW 200632575 A TW200632575 A TW 200632575A TW 094142000 A TW094142000 A TW 094142000A TW 94142000 A TW94142000 A TW 94142000A TW 200632575 A TW200632575 A TW 200632575A
Authority
TW
Taiwan
Prior art keywords
exposure apparatus
stage device
wst
stage
moving
Prior art date
Application number
TW094142000A
Other languages
English (en)
Other versions
TWI405041B (zh
Inventor
Yuichi Shibazaki
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200632575A publication Critical patent/TW200632575A/zh
Application granted granted Critical
Publication of TWI405041B publication Critical patent/TWI405041B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

Landscapes

  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electron Beam Exposure (AREA)
TW094142000A 2004-12-01 2005-11-30 Stage device and exposure device TWI405041B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004348682 2004-12-01

Publications (2)

Publication Number Publication Date
TW200632575A true TW200632575A (en) 2006-09-16
TWI405041B TWI405041B (zh) 2013-08-11

Family

ID=36565068

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094142000A TWI405041B (zh) 2004-12-01 2005-11-30 Stage device and exposure device

Country Status (6)

Country Link
US (1) US9557656B2 (zh)
EP (1) EP1826813A4 (zh)
JP (1) JP4905135B2 (zh)
KR (1) KR101220613B1 (zh)
TW (1) TWI405041B (zh)
WO (1) WO2006059634A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI459503B (zh) * 2010-05-26 2014-11-01 Applied Materials Inc 降低靜電放電之設備及方法

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7420188B2 (en) * 2005-10-14 2008-09-02 Taiwan Semiconductor Manufacturing Company, Ltd. Exposure method and apparatus for immersion lithography
US8084896B2 (en) * 2008-12-31 2011-12-27 Electro Scientific Industries, Inc. Monolithic stage positioning system and method
US8947638B2 (en) 2010-12-03 2015-02-03 Asml Netherlands B.V. Actuation system and lithographic apparatus
US20120325027A1 (en) * 2011-06-21 2012-12-27 Nikon Corporation Measurement stage with tube carrier
JP5957540B2 (ja) * 2012-02-03 2016-07-27 エーエスエムエル ネザーランズ ビー．ブイ． 基板ホルダ製造方法
NL2010628A (en) * 2012-04-27 2013-10-29 Asml Netherlands Bv Lithographic apparatus comprising an actuator, and method for protecting such actuator.
US9904178B2 (en) * 2015-04-09 2018-02-27 Nikon Corporation On-board supply system for a stage assembly
JP6655925B2 (ja) * 2015-09-24 2020-03-04 東京エレクトロン株式会社 ステージ装置及びプローブ装置

Family Cites Families (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4999507A (en) * 1990-05-10 1991-03-12 At&T Bell Laboratories Apparatus comprising an electrostatic wafer cassette
JPH05315429A (ja) * 1992-05-07 1993-11-26 Hitachi Ltd 半導体製造装置の搬送装置
JP3097319B2 (ja) * 1992-06-18 2000-10-10 株式会社安川電機 電動機の無接触給電制御方法、該方法による分離型制御電動機、及び該分離型制御電動機を用いた機械装置
JP3412704B2 (ja) 1993-02-26 2003-06-03 株式会社ニコン 投影露光方法及び装置、並びに露光装置
US5874820A (en) 1995-04-04 1999-02-23 Nikon Corporation Window frame-guided stage mechanism
US5528118A (en) 1994-04-01 1996-06-18 Nikon Precision, Inc. Guideless stage with isolated reaction stage
JPH0883832A (ja) 1994-07-13 1996-03-26 Shinko Electric Co Ltd 電力供給装置
JPH0851137A (ja) * 1994-08-08 1996-02-20 Shinko Electric Co Ltd 半導体製造装置における搬送装置
US5623853A (en) 1994-10-19 1997-04-29 Nikon Precision Inc. Precision motion stage with single guide beam and follower stage
JP4029182B2 (ja) 1996-11-28 2008-01-09 株式会社ニコン 露光方法
JP4029183B2 (ja) 1996-11-28 2008-01-09 株式会社ニコン 投影露光装置及び投影露光方法
SG88824A1 (en) 1996-11-28 2002-05-21 Nikon Corp Projection exposure method
EP0890136B9 (en) 1996-12-24 2003-12-10 ASML Netherlands B.V. Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
JPH10270535A (ja) * 1997-03-25 1998-10-09 Nikon Corp 移動ステージ装置、及び該ステージ装置を用いた回路デバイス製造方法
JP3814384B2 (ja) * 1997-10-09 2006-08-30 キヤノン株式会社 面位置検出方法及び面位置検出装置
JP4210871B2 (ja) * 1997-10-31 2009-01-21 株式会社ニコン 露光装置
US6208407B1 (en) 1997-12-22 2001-03-27 Asm Lithography B.V. Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
JPH11214482A (ja) * 1998-01-28 1999-08-06 Canon Inc ステージ装置および露光装置ならびにディバイス製造方法
JPH11219882A (ja) 1998-02-02 1999-08-10 Nikon Corp ステージ及び露光装置
JP2000100918A (ja) * 1998-09-24 2000-04-07 Ulvac Japan Ltd 静電チャックプレート用電源装置
DE19853093B4 (de) * 1998-11-18 2004-11-04 Leica Microsystems Lithography Gmbh Verfahren und Anordnung zur Belichtung eines Substrates
JP4378822B2 (ja) * 1999-07-09 2009-12-09 Ｔｏｔｏ株式会社 静電チャックおよびユニット
JP2001133959A (ja) * 1999-11-08 2001-05-18 Nikon Corp マスク基板、パターン保護材、マスク保護装置及びマスク、並びに露光装置及びデバイス製造方法
JP2002043213A (ja) 2000-07-25 2002-02-08 Nikon Corp ステージ装置および露光装置
JP2003037157A (ja) * 2001-07-26 2003-02-07 Canon Inc 基板保持装置、露光装置、デバイス製造方法、半導体製造工場および半導体製造装置の保守方法
US6815699B2 (en) * 2001-12-11 2004-11-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1319986B1 (en) 2001-12-11 2008-02-27 ASML Netherlands B.V. A litographic apparatus and a device manufacturing method
JP4099028B2 (ja) * 2002-10-03 2008-06-11 株式会社日立ハイテクノロジーズ 静電吸着装置及びそれを用いた半導体製造装置
JP2005172503A (ja) * 2003-12-09 2005-06-30 Canon Inc 静電容量センサを用いた計測装置およびそれを用いた製造装置
JP3748559B2 (ja) * 2003-06-30 2006-02-22 キヤノン株式会社 ステージ装置、露光装置、荷電ビーム描画装置、デバイス製造方法、基板電位測定方法及び静電チャック
JP2005175173A (ja) * 2003-12-10 2005-06-30 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
US20050128449A1 (en) 2003-12-12 2005-06-16 Nikon Corporation, A Japanese Corporation Utilities transfer system in a lithography system
JP4478470B2 (ja) * 2004-01-26 2010-06-09 キヤノン株式会社 位置決めステージ装置
KR101119814B1 (ko) 2004-06-07 2012-03-06 가부시키가이샤 니콘 스테이지 장치, 노광 장치 및 노광 방법
EP1811526A4 (en) 2004-07-23 2008-04-16 Nikon Corp HOLDING DEVICE, STAGE DEVICE, EXPOSURE DEVICE AND COMPONENT MANUFACTURING METHOD

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI459503B (zh) * 2010-05-26 2014-11-01 Applied Materials Inc 降低靜電放電之設備及方法

Also Published As

Publication number Publication date
US20080060828A1 (en) 2008-03-13
TWI405041B (zh) 2013-08-11
EP1826813A1 (en) 2007-08-29
WO2006059634A1 (ja) 2006-06-08
JPWO2006059634A1 (ja) 2008-06-05
KR20070083498A (ko) 2007-08-24
US9557656B2 (en) 2017-01-31
JP4905135B2 (ja) 2012-03-28
EP1826813A4 (en) 2009-05-13
KR101220613B1 (ko) 2013-01-18

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees