TW200627650A - Storage capacitor and method of manufacturing a storage capacitor - Google Patents

Storage capacitor and method of manufacturing a storage capacitor

Info

Publication number
TW200627650A
TW200627650A TW094141582A TW94141582A TW200627650A TW 200627650 A TW200627650 A TW 200627650A TW 094141582 A TW094141582 A TW 094141582A TW 94141582 A TW94141582 A TW 94141582A TW 200627650 A TW200627650 A TW 200627650A
Authority
TW
Taiwan
Prior art keywords
storage capacitor
manufacturing
semiconductor substrate
disclosed
substrate surface
Prior art date
Application number
TW094141582A
Other languages
English (en)
Other versions
TWI276229B (en
Inventor
Rolf Weis
Original Assignee
Infineon Technologies Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies Ag filed Critical Infineon Technologies Ag
Publication of TW200627650A publication Critical patent/TW200627650A/zh
Application granted granted Critical
Publication of TWI276229B publication Critical patent/TWI276229B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • H10B12/01—Manufacture or treatment
    • H10B12/09—Manufacture or treatment with simultaneous manufacture of the peripheral circuit region and memory cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
    • H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/76885—By forming conductive members before deposition of protective insulating material, e.g. pillars, studs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/76895—Local interconnects; Local pads, as exemplified by patent document EP0896365
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
    • H01L28/40—Capacitors
    • H01L28/60—Electrodes
    • H01L28/82—Electrodes with an enlarged surface, e.g. formed by texturisation
    • H01L28/90—Electrodes with an enlarged surface, e.g. formed by texturisation having vertical extensions
    • H01L28/91—Electrodes with an enlarged surface, e.g. formed by texturisation having vertical extensions made by depositing layers, e.g. by depositing alternating conductive and insulating layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • H10B12/01—Manufacture or treatment
    • H10B12/02—Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
    • H10B12/03—Making the capacitor or connections thereto
    • H10B12/033—Making the capacitor or connections thereto the capacitor extending over the transistor
TW094141582A 2005-01-20 2005-11-25 Storage capacitor and method of manufacturing a storage capacitor TWI276229B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/039,740 US7271058B2 (en) 2005-01-20 2005-01-20 Storage capacitor and method of manufacturing a storage capacitor

Publications (2)

Publication Number Publication Date
TW200627650A true TW200627650A (en) 2006-08-01
TWI276229B TWI276229B (en) 2007-03-11

Family

ID=36684461

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094141582A TWI276229B (en) 2005-01-20 2005-11-25 Storage capacitor and method of manufacturing a storage capacitor

Country Status (3)

Country Link
US (2) US7271058B2 (zh)
KR (1) KR100756290B1 (zh)
TW (1) TWI276229B (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7271058B2 (en) * 2005-01-20 2007-09-18 Infineon Technologies Ag Storage capacitor and method of manufacturing a storage capacitor
US7468306B2 (en) * 2005-05-31 2008-12-23 Qimonds Ag Method of manufacturing a semiconductor device
US7829410B2 (en) * 2007-11-26 2010-11-09 Micron Technology, Inc. Methods of forming capacitors, and methods of forming DRAM arrays
US8492818B2 (en) 2010-09-14 2013-07-23 International Business Machines Corporation High capacitance trench capacitor
US8946045B2 (en) 2012-04-27 2015-02-03 International Business Machines Corporation Metal-insulator-metal (MIM) capacitor with deep trench (DT) structure and method in a silicon-on-insulator (SOI)
US20150348963A1 (en) * 2014-05-30 2015-12-03 Inotera Memories, Inc. Cylinder-shaped storage node with single-layer supporting structure

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2528731B2 (ja) * 1990-01-26 1996-08-28 三菱電機株式会社 半導体記憶装置およびその製造方法
KR960005246B1 (ko) * 1992-10-21 1996-04-23 현대전자산업주식회사 캐패시터의 저장전극 제조방법
US5436186A (en) * 1994-04-22 1995-07-25 United Microelectronics Corporation Process for fabricating a stacked capacitor
US5858838A (en) * 1998-02-23 1999-01-12 Taiwan Semiconductor Manufacturing Company, Ltd. Method for increasing DRAM capacitance via use of a roughened surface bottom capacitor plate
JP2820065B2 (ja) * 1995-04-27 1998-11-05 日本電気株式会社 半導体装置の製造方法
DE19546999C1 (de) * 1995-12-15 1997-04-30 Siemens Ag Verfahren zur Herstellung von Kondensatoren in einer Halbleiteranordnung
JP2809185B2 (ja) * 1996-03-29 1998-10-08 日本電気株式会社 半導体装置およびその製造方法
JP3466851B2 (ja) * 1997-01-20 2003-11-17 株式会社東芝 半導体装置及びその製造方法
US5917213A (en) * 1997-08-21 1999-06-29 Micron Technology, Inc. Depletion compensated polysilicon electrodes
DE19821776C1 (de) * 1998-05-14 1999-09-30 Siemens Ag Herstellverfahren für einen Kondensator in einer integrierten Halbleiterschaltung
DE19821777C1 (de) * 1998-05-14 1999-06-17 Siemens Ag Herstellverfahren für einen Kondensator in einer integrierten Speicherschaltung
US5956594A (en) * 1998-11-02 1999-09-21 Vanguard International Semiconductor Corporation Method for simultaneously forming capacitor plate and metal contact structures for a high density DRAM device
JP3408450B2 (ja) * 1999-04-20 2003-05-19 日本電気株式会社 半導体装置およびその製造方法
DE19926106C1 (de) * 1999-06-08 2001-02-01 Siemens Ag Halbleiterspeicherbauelement mit Speicherzellen, Logikbereichen und Füllstrukturen
JP3374831B2 (ja) * 2000-03-10 2003-02-10 日本電気株式会社 半導体装置及びその製造方法
DE10053170C2 (de) * 2000-10-26 2002-09-26 Infineon Technologies Ag Speicherkondensator und zugehörige Kontaktierungsstruktur sowie Verfahren zu deren Herstellung
DE10055711B4 (de) * 2000-11-10 2008-04-30 Qimonda Ag Verfahren zur Herstellung von Grabenkondensatoren
KR100418581B1 (ko) * 2001-06-12 2004-02-11 주식회사 하이닉스반도체 메모리 소자의 제조방법
KR20030003303A (ko) * 2001-06-30 2003-01-10 주식회사 하이닉스반도체 저장 캐패시터 및 반도체 메모리 소자
US7239013B2 (en) * 2002-07-18 2007-07-03 Hitachi Chemical Co., Ltd. Multilayer wiring board, method for producing the same, semiconductor device and radio electronic device
DE10324081B4 (de) * 2003-05-27 2005-11-17 Infineon Technologies Ag Speichervorrichtung zur Speicherung elektrischer Ladung und Verfahren zur Herstellung derselben
EP1628327A2 (en) * 2004-08-20 2006-02-22 Matsushita Electric Industrial Co., Ltd. Dielectric memory device and method for fabricating the same
US7271058B2 (en) * 2005-01-20 2007-09-18 Infineon Technologies Ag Storage capacitor and method of manufacturing a storage capacitor
US7829410B2 (en) * 2007-11-26 2010-11-09 Micron Technology, Inc. Methods of forming capacitors, and methods of forming DRAM arrays

Also Published As

Publication number Publication date
KR100756290B1 (ko) 2007-09-06
TWI276229B (en) 2007-03-11
US7271058B2 (en) 2007-09-18
US8093641B2 (en) 2012-01-10
KR20060084819A (ko) 2006-07-25
US20080001201A1 (en) 2008-01-03
US20060160300A1 (en) 2006-07-20

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees