TW200618872A - Inkjet alignment layer printing apparatus and printing method - Google Patents

Inkjet alignment layer printing apparatus and printing method

Info

Publication number
TW200618872A
TW200618872A TW094125264A TW94125264A TW200618872A TW 200618872 A TW200618872 A TW 200618872A TW 094125264 A TW094125264 A TW 094125264A TW 94125264 A TW94125264 A TW 94125264A TW 200618872 A TW200618872 A TW 200618872A
Authority
TW
Taiwan
Prior art keywords
alignment layer
printing
printing apparatus
inkjet
printing method
Prior art date
Application number
TW094125264A
Other languages
English (en)
Other versions
TWI418413B (zh
Inventor
Jong-Sung Bae
Jin-Soo Jung
Doo-Han Chung
Min-Young Won
Kun-Jong Lee
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of TW200618872A publication Critical patent/TW200618872A/zh
Application granted granted Critical
Publication of TWI418413B publication Critical patent/TWI418413B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J3/00—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed
    • B41J3/407—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed for marking on special material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J3/00—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed
    • B41J3/28—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed for printing downwardly on flat surfaces, e.g. of books, drawings, boxes, envelopes, e.g. flat-bed ink-jet printers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
    • B41J2202/01—Embodiments of or processes related to ink-jet heads
    • B41J2202/20—Modules
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers

Landscapes

  • Liquid Crystal (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW094125264A 2004-12-13 2005-07-26 噴墨配向膜印刷裝置及印刷方法 TWI418413B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020040104931A KR101160827B1 (ko) 2004-12-13 2004-12-13 잉크젯 배향막 인쇄 장치 및 방법

Publications (2)

Publication Number Publication Date
TW200618872A true TW200618872A (en) 2006-06-16
TWI418413B TWI418413B (zh) 2013-12-11

Family

ID=36584267

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094125264A TWI418413B (zh) 2004-12-13 2005-07-26 噴墨配向膜印刷裝置及印刷方法

Country Status (5)

Country Link
US (1) US7842345B2 (zh)
JP (1) JP4939764B2 (zh)
KR (1) KR101160827B1 (zh)
CN (1) CN100538458C (zh)
TW (1) TWI418413B (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008062568A (ja) * 2006-09-08 2008-03-21 Seiko Epson Corp 液体噴射ヘッドのアライメント治具及びアライメント装置
JP4525764B2 (ja) 2008-02-08 2010-08-18 セイコーエプソン株式会社 載置テーブルおよび液状体吐出装置
JP5374237B2 (ja) * 2009-05-28 2013-12-25 株式会社アルバック 吐出装置及び吐出装置の位置合わせ方法
JP2011031143A (ja) * 2009-07-30 2011-02-17 Ulvac Japan Ltd 回転機能付きステージ
US20130004653A1 (en) * 2011-06-30 2013-01-03 Shenzhen China Star Optoelectronics Technology Co.,Ltd. Alignment Film Coating Method and Alignment Film Coating Apparatus
US9939682B2 (en) * 2013-02-15 2018-04-10 E-Vision, Llc Liquid crystal alignment layers and method of fabrication
JP6607343B2 (ja) 2015-03-30 2019-11-20 パナソニックＩｐマネジメント株式会社 印刷装置、および薄膜印刷体の製造方法
FR3087679B1 (fr) * 2018-10-24 2020-11-13 Exel Ind Procede d'application d'un produit de revetement suivant la technologie de goutte a la demande et robot applicateur pour la mise en oeuvre du procede
KR20220005790A (ko) * 2020-07-07 2022-01-14 세메스 주식회사 약액 토출 장치

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JPS6382477A (ja) * 1986-09-26 1988-04-13 Minolta Camera Co Ltd 感光体
DE69307590T2 (de) * 1992-05-11 1997-05-15 Hewlett Packard Co Verfahren und Vorrichtung zur Druckdichtesteuerung in einem Tintenstrahldrucker
JP3757430B2 (ja) * 1994-02-22 2006-03-22 株式会社ニコン 基板の位置決め装置及び露光装置
JPH10260307A (ja) * 1997-03-17 1998-09-29 Seiko Epson Corp カラーフィルタの製造装置およびその方法
JPH11248925A (ja) * 1998-03-03 1999-09-17 Seiko Epson Corp フィルター製造装置とフィルター製造方法
NL1012812C2 (nl) * 1999-08-12 2001-02-13 Ocu Technologies B V Werkwijze voor het bedrukken van een substraat en een drukinrichting geschikt om deze werkwijze toe te passen.
US6623096B1 (en) * 2000-07-28 2003-09-23 Hewlett-Packard Company Techniques for measuring the position of marks on media and for aligning inkjet devices
JP2002090741A (ja) * 2000-09-11 2002-03-27 Seiko Epson Corp 液晶基板の製造装置、液晶基板の製造方法及び液晶装置
US20040253836A1 (en) * 2001-07-09 2004-12-16 Henning Sirringhaus Low melting point alignment
US6842217B1 (en) * 2001-08-23 2005-01-11 Cambridge Research And Instrumentation, Inc. Fabry-perot etalons and tunable filters made using liquid crystal devices as tuning material
JP3922177B2 (ja) * 2002-02-12 2007-05-30 セイコーエプソン株式会社 成膜方法、成膜装置、液滴吐出装置、カラーフィルタの製造方法、表示装置の製造方法
JP3975272B2 (ja) * 2002-02-21 2007-09-12 独立行政法人産業技術総合研究所 超微細流体ジェット装置
JP3849545B2 (ja) * 2002-02-26 2006-11-22 セイコーエプソン株式会社 薄膜形成装置と薄膜形成方法、回路パターンの製造装置と回路パターンの製造方法と電子機器、及びレジストパターンの製造装置とレジストパターンの製造方法
JP2004184977A (ja) * 2002-11-22 2004-07-02 Seiko Epson Corp カラーフィルタ及びその製造方法及び表示装置並びに電子機器
KR100928924B1 (ko) * 2003-02-27 2009-11-30 엘지디스플레이 주식회사 액정표시소자의 배향막 형성장치 및 이를 이용한 배향막형성방법
KR101060421B1 (ko) * 2003-04-03 2011-08-29 엘지디스플레이 주식회사 액정표시소자의 배향막 형성장치
CN1548294A (zh) 2003-05-22 2004-11-24 乐金电子（沈阳）有限公司 制作显示屏用喷墨头调位装置
JP2004362818A (ja) 2003-06-02 2004-12-24 Seiko Epson Corp 薄膜パターンの製造方法、有機電界発光素子の製造方法、カラーフィルタの製造方法、プラズマディスプレイパネルの製造方法、液晶表示パネルの製造方法及び電子機器
JP4785376B2 (ja) * 2003-12-12 2011-10-05 芝浦メカトロニクス株式会社 塗布装置および塗布方法
JP4419015B2 (ja) * 2004-03-04 2010-02-24 リコープリンティングシステムズ株式会社 インクジェット塗布方法及び装置

Also Published As

Publication number Publication date
KR101160827B1 (ko) 2012-06-29
TWI418413B (zh) 2013-12-11
KR20060066353A (ko) 2006-06-16
CN1790114A (zh) 2006-06-21
US20060127580A1 (en) 2006-06-15
JP2006167704A (ja) 2006-06-29
JP4939764B2 (ja) 2012-05-30
CN100538458C (zh) 2009-09-09
US7842345B2 (en) 2010-11-30

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