TW200610963A - Surface inspection apparatus, polarization illuminating device and light-receiving device - Google Patents
Surface inspection apparatus, polarization illuminating device and light-receiving deviceInfo
- Publication number
- TW200610963A TW200610963A TW094120000A TW94120000A TW200610963A TW 200610963 A TW200610963 A TW 200610963A TW 094120000 A TW094120000 A TW 094120000A TW 94120000 A TW94120000 A TW 94120000A TW 200610963 A TW200610963 A TW 200610963A
- Authority
- TW
- Taiwan
- Prior art keywords
- light
- luminous flux
- inspected
- substrate
- inspection apparatus
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/06—Illumination; Optics
- G01N2201/063—Illuminating optical parts
- G01N2201/0636—Reflectors
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004178880 | 2004-06-16 | ||
JP2004324688 | 2004-11-09 | ||
JP2005084290A JP2006266817A (ja) | 2005-03-23 | 2005-03-23 | 表面検査装置 |
JP2005139068 | 2005-05-11 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200610963A true TW200610963A (en) | 2006-04-01 |
TWI445947B TWI445947B (zh) | 2014-07-21 |
Family
ID=35480203
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094120000A TWI445947B (zh) | 2004-06-16 | 2005-06-16 | A surface inspection apparatus, a polarizing illumination apparatus, and a light receiving apparatus |
Country Status (3)
Country | Link |
---|---|
US (1) | US7307725B2 (zh) |
KR (1) | KR101248674B1 (zh) |
TW (1) | TWI445947B (zh) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4722564B2 (ja) * | 2005-05-30 | 2011-07-13 | 京セラ株式会社 | 無線通信システム、無線発信装置、および無線受信装置 |
KR101447407B1 (ko) * | 2005-07-08 | 2014-10-06 | 가부시키가이샤 니콘 | 면 위치 검출 장치, 노광 장치 및 노광 방법 |
CN101473219B (zh) * | 2006-07-14 | 2012-02-29 | 株式会社尼康 | 表面检查设备 |
CN101451963B (zh) | 2006-08-01 | 2013-02-20 | 以色列商·应用材料以色列公司 | 用于缺陷检测的方法和系统 |
US8213024B2 (en) * | 2006-08-01 | 2012-07-03 | Applied Materials Israel, Ltd. | Method and system for aerial imaging of a reticle |
KR101427433B1 (ko) * | 2006-08-02 | 2014-08-08 | 가부시키가이샤 니콘 | 결함 검출 장치 및 결함 검출 방법 |
US20100189880A1 (en) * | 2007-04-10 | 2010-07-29 | Fas Holdings Group, Llc | Method and Apparatus for Extruding a Liquid Onto a Substrate and Inspecting the Same |
WO2009041295A1 (ja) * | 2007-09-26 | 2009-04-02 | Nikon Corporation | 表面検査方法および表面検査装置 |
WO2011001678A1 (ja) * | 2009-07-01 | 2011-01-06 | 株式会社ニコン | 露光条件設定方法および表面検査装置 |
KR20140104468A (ko) * | 2011-11-29 | 2014-08-28 | 가부시키가이샤 니콘 | 측정 장치, 측정 방법 및 반도체 디바이스 제조 방법 |
KR102086362B1 (ko) * | 2013-03-08 | 2020-03-09 | 삼성전자주식회사 | 편광화된 빛을 이용하여 공정을 모니터링하는 반도체 제조 설비 및 모니터링 방법 |
KR102161160B1 (ko) | 2013-10-31 | 2020-09-29 | 삼성전자주식회사 | 기판의 표면 검사 방법 및 이를 수행하기 위한 장치 |
EP3076160A1 (en) * | 2015-03-31 | 2016-10-05 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO | Spatially resolved aerosol detection |
CN112630879B (zh) * | 2020-12-25 | 2022-09-30 | 中国工程物理研究院激光聚变研究中心 | 一种相位延迟元件及相位延迟装置 |
CN113008796A (zh) * | 2021-03-03 | 2021-06-22 | 赤壁精迈光电科技有限公司 | 亚表面缺陷的检测装置 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4864123A (en) * | 1987-05-08 | 1989-09-05 | Nikon Corporation | Apparatus for detecting the level of an object surface |
JPH0530761U (ja) * | 1991-09-30 | 1993-04-23 | 京セラ株式会社 | 欠陥観察装置 |
JPH07294837A (ja) * | 1994-04-26 | 1995-11-10 | Hitachi Ltd | 光走査装置 |
US5877859A (en) * | 1996-07-24 | 1999-03-02 | Therma-Wave, Inc. | Broadband spectroscopic rotating compensator ellipsometer |
JP3692685B2 (ja) | 1997-02-19 | 2005-09-07 | 株式会社ニコン | 欠陥検査装置 |
JP4419250B2 (ja) * | 2000-02-15 | 2010-02-24 | 株式会社ニコン | 欠陥検査装置 |
JP2001356276A (ja) * | 2000-06-13 | 2001-12-26 | Nikon Corp | 偏光顕微鏡 |
US6646735B2 (en) * | 2000-09-13 | 2003-11-11 | Nikon Corporation | Surface inspection apparatus and surface inspection method |
US6784991B2 (en) * | 2001-06-18 | 2004-08-31 | Therma-Wave, Inc. | Diffractive optical elements and grid polarizers in focusing spectroscopic ellipsometers |
US7206277B2 (en) * | 2001-07-27 | 2007-04-17 | Pioneer Corporation | Optical pickup device and focal error detecting device therefor and wave aberration and focal error detecting device therefor |
JP2003121380A (ja) * | 2001-10-11 | 2003-04-23 | Nikon Corp | 表面検査装置および表面検査方法 |
-
2005
- 2005-05-26 KR KR1020050044555A patent/KR101248674B1/ko active IP Right Grant
- 2005-06-13 US US11/150,385 patent/US7307725B2/en active Active
- 2005-06-16 TW TW094120000A patent/TWI445947B/zh active
Also Published As
Publication number | Publication date |
---|---|
KR20060046192A (ko) | 2006-05-17 |
US20050280806A1 (en) | 2005-12-22 |
KR101248674B1 (ko) | 2013-03-28 |
TWI445947B (zh) | 2014-07-21 |
US7307725B2 (en) | 2007-12-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW200610963A (en) | Surface inspection apparatus, polarization illuminating device and light-receiving device | |
TW200834061A (en) | Defect detection device for plate glass, production method for plate glass, plate glass article, quality judging device for plate glass, and inspection method for plate glass | |
TW200734630A (en) | Defect inspection apparatus and defect inspection method | |
MY149740A (en) | Optical detection device and method for detecting surface of components | |
WO2008139735A1 (ja) | 表面検査装置および表面検査方法 | |
EP2241940A3 (en) | Illuminating device and image reading apparatus | |
SG169987A1 (en) | Plane position detecting apparatus, exposure apparatus and device manufacturing method | |
TW200741818A (en) | Exposure apparatus and device manufacturing method | |
TW200734800A (en) | Lithographic apparatus and device manufacturing method | |
TW200721797A (en) | Method for aligning light-receiving element array substrate provided in contact image sensor, manufacturing process of contact image sensor, contact image sensor, and image reading apparatus and image writing apparatus using the same | |
WO2008061681A3 (de) | Beleuchtungsoptik für die projektions-mikrolithografie sowie mess- und überwachungsverfahren für eine derartige beleuchtungsoptik | |
TW200951646A (en) | Surface position detection device, exposure device, surface position detection method and device production method | |
US20120044346A1 (en) | Apparatus and method for inspecting internal defect of substrate | |
MX2021015750A (es) | Aparato y metodos de seguimiento ocular a partir de la obtencion de imagenes oculares mediante un elemento optico de guia de luz. | |
TW200717039A (en) | Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method | |
TW201716768A (zh) | 濃度測定裝置 | |
EP1903314A3 (en) | Origin detection method for optical encoder | |
US7894053B2 (en) | Inspection apparatus | |
TW201640203A (zh) | 光配向裝置 | |
WO2009048051A1 (ja) | 照明光学装置、並びに露光方法及び装置 | |
ATE338962T1 (de) | Verfahren und vorrichtung für einen polarisierenden strahlkombinierer mit integriertem optischen isolator | |
HK1099606A1 (en) | Exposure apparatus and exposure method | |
TW200951629A (en) | Illumination optical system, exposure apparatus using the same and device manufacturing method | |
TW200519473A (en) | Inspection device and method of polarizer | |
EP2264441A3 (en) | Circuit pattern defect detection apparatus, circuit pattern defect detection method, and program therefor |