TW200610963A - Surface inspection apparatus, polarization illuminating device and light-receiving device - Google Patents

Surface inspection apparatus, polarization illuminating device and light-receiving device

Info

Publication number
TW200610963A
TW200610963A TW094120000A TW94120000A TW200610963A TW 200610963 A TW200610963 A TW 200610963A TW 094120000 A TW094120000 A TW 094120000A TW 94120000 A TW94120000 A TW 94120000A TW 200610963 A TW200610963 A TW 200610963A
Authority
TW
Taiwan
Prior art keywords
light
luminous flux
inspected
substrate
inspection apparatus
Prior art date
Application number
TW094120000A
Other languages
English (en)
Other versions
TWI445947B (zh
Inventor
Takeo Oomori
Hideo Hirose
Yasuharu Nakajima
Kenzo Chiaki
Tatsumi Satou
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2005084290A external-priority patent/JP2006266817A/ja
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200610963A publication Critical patent/TW200610963A/zh
Application granted granted Critical
Publication of TWI445947B publication Critical patent/TWI445947B/zh

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956Inspecting patterns on the surface of objects
    • G01N21/95607Inspecting patterns on the surface of objects using a comparative method
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21Polarisation-affecting properties
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501Semiconductor wafers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00Features of devices classified in G01N21/00
    • G01N2201/06Illumination; Optics
    • G01N2201/063Illuminating optical parts
    • G01N2201/0636Reflectors

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
TW094120000A 2004-06-16 2005-06-16 A surface inspection apparatus, a polarizing illumination apparatus, and a light receiving apparatus TWI445947B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2004178880 2004-06-16
JP2004324688 2004-11-09
JP2005084290A JP2006266817A (ja) 2005-03-23 2005-03-23 表面検査装置
JP2005139068 2005-05-11

Publications (2)

Publication Number Publication Date
TW200610963A true TW200610963A (en) 2006-04-01
TWI445947B TWI445947B (zh) 2014-07-21

Family

ID=35480203

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094120000A TWI445947B (zh) 2004-06-16 2005-06-16 A surface inspection apparatus, a polarizing illumination apparatus, and a light receiving apparatus

Country Status (3)

Country Link
US (1) US7307725B2 (zh)
KR (1) KR101248674B1 (zh)
TW (1) TWI445947B (zh)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4722564B2 (ja) * 2005-05-30 2011-07-13 京セラ株式会社 無線通信システム、無線発信装置、および無線受信装置
KR101447407B1 (ko) * 2005-07-08 2014-10-06 가부시키가이샤 니콘 면 위치 검출 장치, 노광 장치 및 노광 방법
CN101473219B (zh) * 2006-07-14 2012-02-29 株式会社尼康 表面检查设备
CN101451963B (zh) 2006-08-01 2013-02-20 以色列商·应用材料以色列公司 用于缺陷检测的方法和系统
US8213024B2 (en) * 2006-08-01 2012-07-03 Applied Materials Israel, Ltd. Method and system for aerial imaging of a reticle
KR101427433B1 (ko) * 2006-08-02 2014-08-08 가부시키가이샤 니콘 결함 검출 장치 및 결함 검출 방법
US20100189880A1 (en) * 2007-04-10 2010-07-29 Fas Holdings Group, Llc Method and Apparatus for Extruding a Liquid Onto a Substrate and Inspecting the Same
WO2009041295A1 (ja) * 2007-09-26 2009-04-02 Nikon Corporation 表面検査方法および表面検査装置
WO2011001678A1 (ja) * 2009-07-01 2011-01-06 株式会社ニコン 露光条件設定方法および表面検査装置
KR20140104468A (ko) * 2011-11-29 2014-08-28 가부시키가이샤 니콘 측정 장치, 측정 방법 및 반도체 디바이스 제조 방법
KR102086362B1 (ko) * 2013-03-08 2020-03-09 삼성전자주식회사 편광화된 빛을 이용하여 공정을 모니터링하는 반도체 제조 설비 및 모니터링 방법
KR102161160B1 (ko) 2013-10-31 2020-09-29 삼성전자주식회사 기판의 표면 검사 방법 및 이를 수행하기 위한 장치
EP3076160A1 (en) * 2015-03-31 2016-10-05 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Spatially resolved aerosol detection
CN112630879B (zh) * 2020-12-25 2022-09-30 中国工程物理研究院激光聚变研究中心 一种相位延迟元件及相位延迟装置
CN113008796A (zh) * 2021-03-03 2021-06-22 赤壁精迈光电科技有限公司 亚表面缺陷的检测装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4864123A (en) * 1987-05-08 1989-09-05 Nikon Corporation Apparatus for detecting the level of an object surface
JPH0530761U (ja) * 1991-09-30 1993-04-23 京セラ株式会社 欠陥観察装置
JPH07294837A (ja) * 1994-04-26 1995-11-10 Hitachi Ltd 光走査装置
US5877859A (en) * 1996-07-24 1999-03-02 Therma-Wave, Inc. Broadband spectroscopic rotating compensator ellipsometer
JP3692685B2 (ja) 1997-02-19 2005-09-07 株式会社ニコン 欠陥検査装置
JP4419250B2 (ja) * 2000-02-15 2010-02-24 株式会社ニコン 欠陥検査装置
JP2001356276A (ja) * 2000-06-13 2001-12-26 Nikon Corp 偏光顕微鏡
US6646735B2 (en) * 2000-09-13 2003-11-11 Nikon Corporation Surface inspection apparatus and surface inspection method
US6784991B2 (en) * 2001-06-18 2004-08-31 Therma-Wave, Inc. Diffractive optical elements and grid polarizers in focusing spectroscopic ellipsometers
US7206277B2 (en) * 2001-07-27 2007-04-17 Pioneer Corporation Optical pickup device and focal error detecting device therefor and wave aberration and focal error detecting device therefor
JP2003121380A (ja) * 2001-10-11 2003-04-23 Nikon Corp 表面検査装置および表面検査方法

Also Published As

Publication number Publication date
KR20060046192A (ko) 2006-05-17
US20050280806A1 (en) 2005-12-22
KR101248674B1 (ko) 2013-03-28
TWI445947B (zh) 2014-07-21
US7307725B2 (en) 2007-12-11

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