TW200604095A - Hydrogen-containing carbon film - Google Patents

Hydrogen-containing carbon film

Info

Publication number
TW200604095A
TW200604095A TW094116906A TW94116906A TW200604095A TW 200604095 A TW200604095 A TW 200604095A TW 094116906 A TW094116906 A TW 094116906A TW 94116906 A TW94116906 A TW 94116906A TW 200604095 A TW200604095 A TW 200604095A
Authority
TW
Taiwan
Prior art keywords
hydrogen
carbon film
containing carbon
less
atomic
Prior art date
Application number
TW094116906A
Other languages
English (en)
Inventor
Kazuhiko Oda
Takashi Matsuura
Toshihiko Ushiro
Original Assignee
Sumitomo Electric Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries filed Critical Sumitomo Electric Industries
Publication of TW200604095A publication Critical patent/TW200604095A/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/22—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
    • B01D53/228—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion characterised by specific membranes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0002—Organic membrane manufacture
    • B01D67/002—Organic membrane manufacture from melts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0039—Inorganic membrane manufacture
    • B01D67/0072—Inorganic membrane manufacture by deposition from the gaseous phase, e.g. sputtering, CVD, PVD
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
    • B01D69/14—Dynamic membranes
    • B01D69/141—Heterogeneous membranes, e.g. containing dispersed material; Mixed matrix membranes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02—Inorganic material
    • B01D71/021—Carbon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/05—Preparation or purification of carbon not covered by groups C01B32/15, C01B32/20, C01B32/25, C01B32/30
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2323/00—Details relating to membrane preparation
    • B01D2323/34—Use of radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Dispersion Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Analytical Chemistry (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Physical Vapour Deposition (AREA)
TW094116906A 2004-07-29 2005-05-24 Hydrogen-containing carbon film TW200604095A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004221946A JP2006036611A (ja) 2004-07-29 2004-07-29 水素含有炭素膜

Publications (1)

Publication Number Publication Date
TW200604095A true TW200604095A (en) 2006-02-01

Family

ID=35786034

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094116906A TW200604095A (en) 2004-07-29 2005-05-24 Hydrogen-containing carbon film

Country Status (7)

Country Link
US (1) US20090159840A1 (zh)
EP (1) EP1775262A1 (zh)
JP (1) JP2006036611A (zh)
KR (1) KR20070039568A (zh)
CN (1) CN1989069A (zh)
TW (1) TW200604095A (zh)
WO (1) WO2006011279A1 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9721853B2 (en) * 2013-03-13 2017-08-01 Taiwan Semiconductor Manufacturing Company, Ltd. System and method for forming a semiconductor device
KR101707763B1 (ko) * 2013-05-24 2017-02-16 미쯔이가가꾸가부시끼가이샤 펠리클 및 이것을 포함하는 ｅｕｖ 노광 장치
JP5730960B2 (ja) * 2013-07-26 2015-06-10 トヨタ自動車株式会社 摺動部材
DE112015004470B4 (de) * 2014-09-30 2018-08-23 Fujifilm Corporation Antireflexfilm, Linse und Abbildungsvorrichtung
JP6155399B2 (ja) * 2014-09-30 2017-06-28 富士フイルム株式会社 反射防止膜及びカルコゲナイドガラスレンズ並びに撮像装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07121938A (ja) * 1993-10-28 1995-05-12 Matsushita Electric Ind Co Ltd テープ駆動装置
JPH09128708A (ja) * 1995-10-27 1997-05-16 Hitachi Ltd 薄膜磁気ヘッド及び磁気ディスク記録再生装置
WO1997045855A1 (en) * 1996-05-31 1997-12-04 Akashic Memories Corporation Highly tetrahedral amorphous carbon films and methods for their production
JP2001240034A (ja) * 2000-02-24 2001-09-04 Mitsubishi Shoji Plast Kk 揮発性有機物を含有する液体用のプラスチック容器
JP3995900B2 (ja) * 2001-04-25 2007-10-24 株式会社神戸製鋼所 ダイヤモンドライクカーボン多層膜
JP2003147508A (ja) * 2001-11-07 2003-05-21 Sumitomo Electric Ind Ltd 炭素膜、炭素膜の成膜方法、および炭素膜被覆部材
JP4002164B2 (ja) * 2002-10-30 2007-10-31 三菱商事プラスチック株式会社 Ｄｌｃ膜コーティングプラスチック容器及びその製造方法

Also Published As

Publication number Publication date
CN1989069A (zh) 2007-06-27
WO2006011279A1 (ja) 2006-02-02
JP2006036611A (ja) 2006-02-09
EP1775262A1 (en) 2007-04-18
US20090159840A1 (en) 2009-06-25
KR20070039568A (ko) 2007-04-12

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