TW200600829A - Optical system, exposure device, and exposure method - Google Patents
Optical system, exposure device, and exposure methodInfo
- Publication number
- TW200600829A TW200600829A TW094116057A TW94116057A TW200600829A TW 200600829 A TW200600829 A TW 200600829A TW 094116057 A TW094116057 A TW 094116057A TW 94116057 A TW94116057 A TW 94116057A TW 200600829 A TW200600829 A TW 200600829A
- Authority
- TW
- Taiwan
- Prior art keywords
- optical system
- phase difference
- light
- polarization
- exposure
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004178777 | 2004-06-16 | ||
JP2004332531 | 2004-11-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200600829A true TW200600829A (en) | 2006-01-01 |
Family
ID=35509840
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094116057A TW200600829A (en) | 2004-06-16 | 2005-05-18 | Optical system, exposure device, and exposure method |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP1767978A4 (zh) |
JP (1) | JPWO2005124420A1 (zh) |
KR (1) | KR101244994B1 (zh) |
TW (1) | TW200600829A (zh) |
WO (1) | WO2005124420A1 (zh) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4612849B2 (ja) * | 2005-03-01 | 2011-01-12 | キヤノン株式会社 | 露光方法、露光装置及びデバイス製造方法 |
JP5588176B2 (ja) * | 2006-12-28 | 2014-09-10 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 傾斜偏向ミラーを有する反射屈折投影対物器械、投影露光装置、投影露光方法、及びミラー |
US7872731B2 (en) * | 2007-04-20 | 2011-01-18 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
DE102007043958B4 (de) | 2007-09-14 | 2011-08-25 | Carl Zeiss SMT GmbH, 73447 | Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage |
DE102007054731A1 (de) | 2007-11-14 | 2009-05-20 | Carl Zeiss Smt Ag | Optisches Element zur Reflexion von UV-Strahlung, Herstellungsverfahren dafür und Projektionsbelichtungsanlage damit |
DE102009022034A1 (de) * | 2009-05-20 | 2010-12-02 | Layertec Gmbh | Optisches Bauelement mit hoher Formstabilität, seine Herstellung und Verwendung |
JP2012004465A (ja) | 2010-06-19 | 2012-01-05 | Nikon Corp | 照明光学系、露光装置、およびデバイス製造方法 |
KR101146619B1 (ko) * | 2010-11-22 | 2012-05-14 | 한국전광(주) | 가시광선과 적외선 영역을 동시에 충족하는 고반사율 거울 |
JP5534276B2 (ja) * | 2013-08-23 | 2014-06-25 | 株式会社ニコン | 照明光学系、露光装置、およびデバイス製造方法 |
WO2023186325A1 (en) * | 2022-04-01 | 2023-10-05 | SLM Solutions Group AG | Method of operating an irradiation system, irradiation system and apparatus for producing a three-dimensional work piece |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3340424A1 (de) * | 1983-11-09 | 1985-05-15 | Brown, Boveri & Cie Ag, 6800 Mannheim | Elektrochemische speicherzelle |
JPS60181704A (ja) * | 1984-02-29 | 1985-09-17 | Canon Inc | 真空紫外用反射ミラー |
JPH0590128A (ja) * | 1991-06-13 | 1993-04-09 | Nikon Corp | 露光装置 |
JPH06124873A (ja) * | 1992-10-09 | 1994-05-06 | Canon Inc | 液浸式投影露光装置 |
JP3747566B2 (ja) * | 1997-04-23 | 2006-02-22 | 株式会社ニコン | 液浸型露光装置 |
JPH11311704A (ja) * | 1998-02-26 | 1999-11-09 | Nikon Corp | 紫外光用ミラー |
WO1999049504A1 (fr) * | 1998-03-26 | 1999-09-30 | Nikon Corporation | Procede et systeme d'exposition par projection |
US7301605B2 (en) * | 2000-03-03 | 2007-11-27 | Nikon Corporation | Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices |
JP3678120B2 (ja) | 2000-06-06 | 2005-08-03 | ウシオ電機株式会社 | 偏光光照射装置 |
DE10124474A1 (de) * | 2001-05-19 | 2002-11-21 | Zeiss Carl | Mikrolithographisches Belichtungsverfahren sowie Projektionsobjektiv zur Durchführung des Verfahrens |
US6831731B2 (en) * | 2001-06-28 | 2004-12-14 | Nikon Corporation | Projection optical system and an exposure apparatus with the projection optical system |
-
2005
- 2005-05-18 TW TW094116057A patent/TW200600829A/zh unknown
- 2005-06-09 WO PCT/JP2005/010589 patent/WO2005124420A1/ja active Application Filing
- 2005-06-09 EP EP05748799A patent/EP1767978A4/en not_active Withdrawn
- 2005-06-09 KR KR1020077000303A patent/KR101244994B1/ko active IP Right Grant
- 2005-06-09 JP JP2006514714A patent/JPWO2005124420A1/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JPWO2005124420A1 (ja) | 2008-04-17 |
EP1767978A1 (en) | 2007-03-28 |
KR101244994B1 (ko) | 2013-03-18 |
EP1767978A4 (en) | 2010-07-07 |
KR20070026784A (ko) | 2007-03-08 |
WO2005124420A1 (ja) | 2005-12-29 |
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