TW200527163A - Exposure apparatus - Google Patents

Exposure apparatus Download PDF

Info

Publication number
TW200527163A
TW200527163A TW094102191A TW94102191A TW200527163A TW 200527163 A TW200527163 A TW 200527163A TW 094102191 A TW094102191 A TW 094102191A TW 94102191 A TW94102191 A TW 94102191A TW 200527163 A TW200527163 A TW 200527163A
Authority
TW
Taiwan
Prior art keywords
roller
film mask
exposure device
item
scope
Prior art date
Application number
TW094102191A
Other languages
English (en)
Chinese (zh)
Inventor
Sang-Jin Kim
Original Assignee
Lg Electronics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lg Electronics Inc filed Critical Lg Electronics Inc
Publication of TW200527163A publication Critical patent/TW200527163A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2035—Exposure; Apparatus therefor simultaneous coating and exposure; using a belt mask, e.g. endless

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW094102191A 2004-02-02 2005-01-25 Exposure apparatus TW200527163A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020040006705A KR100548937B1 (ko) 2004-02-02 2004-02-02 필름 마스크를 이용한 스캔 타입 노광장치

Publications (1)

Publication Number Publication Date
TW200527163A true TW200527163A (en) 2005-08-16

Family

ID=36093337

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094102191A TW200527163A (en) 2004-02-02 2005-01-25 Exposure apparatus

Country Status (5)

Country Link
US (1) US20050170293A1 (https=)
JP (1) JP2005215686A (https=)
KR (1) KR100548937B1 (https=)
CN (1) CN1740914A (https=)
TW (1) TW200527163A (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4984631B2 (ja) * 2006-04-28 2012-07-25 株式会社ニコン 露光装置及び方法、露光用マスク、並びにデバイス製造方法
TWI428686B (zh) * 2006-12-05 2014-03-01 Hoya Corp 光罩之檢查裝置、光罩之檢查方法、液晶裝置製造用光罩之製造方法以及圖案轉印方法
JP5064116B2 (ja) * 2007-05-30 2012-10-31 Ｈｏｙａ株式会社 フォトマスクの検査方法、フォトマスクの製造方法及び電子部品の製造方法
CN102323719B (zh) * 2011-06-30 2014-09-03 丹阳博昱科技有限公司 一种连续曝光方法和装置
CN104076613B (zh) * 2013-03-27 2016-12-28 上海微电子装备有限公司 基于圆形掩模的步进扫描光刻机及其曝光方法
CN106061123A (zh) * 2016-06-27 2016-10-26 太仓博轩信息科技有限公司 一种键盘薄膜制造工艺
CN106313878A (zh) * 2016-08-08 2017-01-11 深圳市聚龙高科电子技术有限公司 一种玻璃装饰纹路转印设备
CN110632831A (zh) * 2019-11-14 2019-12-31 江苏上达电子有限公司 一种cof基板的新冲孔式样和曝光对位mark设计方法
CN110794654A (zh) * 2019-11-19 2020-02-14 江苏上达电子有限公司 可生产超长尺寸产品的新型曝光机结构曝光方法
KR102827466B1 (ko) * 2020-03-06 2025-07-02 삼성디스플레이 주식회사 마스크 및 이의 제조 방법
KR102683631B1 (ko) 2021-10-07 2024-07-10 (주) 고송이엔지 노광용 필름 마스크 얼라인 장치

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53111803A (en) * 1977-03-11 1978-09-29 Toppan Printing Co Ltd Engraving method
JPS54128733A (en) * 1978-03-29 1979-10-05 Toppan Printing Co Ltd Method of reproducing upon projection
JPS59165062A (ja) * 1983-03-10 1984-09-18 Fuji Xerox Co Ltd ホトエツチング露光装置
JPS60205452A (ja) * 1984-03-30 1985-10-17 Canon Inc 露光方法
JPS636538A (ja) * 1986-06-27 1988-01-12 Seiko Instr & Electronics Ltd 画像記録装置
JPH0442159A (ja) * 1990-06-08 1992-02-12 Kato Hatsujo Kaisha Ltd フォトレジストにおける露光方法および装置
JPH0467654U (https=) * 1990-10-24 1992-06-16
JPH0581840U (ja) * 1992-04-03 1993-11-05 旭光学工業株式会社 走査型投影露光装置
JP2000035677A (ja) * 1998-07-17 2000-02-02 Adtec Engineeng:Kk 露光装置
JP2000241648A (ja) * 1999-02-17 2000-09-08 Sony Corp 光学部品の製造装置およびその製造方法ならびに光学部品
JP2001042118A (ja) * 1999-08-02 2001-02-16 Canon Inc カラーフィルタとその連続製造方法、該カラーフィルタを用いた液晶素子
TW556044B (en) * 2001-02-15 2003-10-01 Sipix Imaging Inc Process for roll-to-roll manufacture of a display by synchronized photolithographic exposure on a substrate web
DE10330421A1 (de) * 2003-07-04 2005-02-03 Leonhard Kurz Gmbh & Co. Kg Belichtungsstation für Folienbahnen
JP2005148531A (ja) * 2003-11-18 2005-06-09 Adtec Engineeng Co Ltd 基板伸縮に対応したプリント配線基板用露光装置

Also Published As

Publication number Publication date
CN1740914A (zh) 2006-03-01
KR20050078538A (ko) 2005-08-05
US20050170293A1 (en) 2005-08-04
JP2005215686A (ja) 2005-08-11
KR100548937B1 (ko) 2006-02-02

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