TW200515475A - Acoustic diffusers for acoustic field uniformity - Google Patents

Acoustic diffusers for acoustic field uniformity

Info

Publication number
TW200515475A
TW200515475A TW093127533A TW93127533A TW200515475A TW 200515475 A TW200515475 A TW 200515475A TW 093127533 A TW093127533 A TW 093127533A TW 93127533 A TW93127533 A TW 93127533A TW 200515475 A TW200515475 A TW 200515475A
Authority
TW
Taiwan
Prior art keywords
sound
processing liquid
acoustic
processing
diffusers
Prior art date
Application number
TW093127533A
Other languages
English (en)
Inventor
Kurt K Christenson
Original Assignee
Fsi Int Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fsi Int Inc filed Critical Fsi Int Inc
Publication of TW200515475A publication Critical patent/TW200515475A/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • G—PHYSICS
    • G10—MUSICAL INSTRUMENTS; ACOUSTICS
    • G10K—SOUND-PRODUCING DEVICES; METHODS OR DEVICES FOR PROTECTING AGAINST, OR FOR DAMPING, NOISE OR OTHER ACOUSTIC WAVES IN GENERAL; ACOUSTICS NOT OTHERWISE PROVIDED FOR
    • G10K11/00—Methods or devices for transmitting, conducting or directing sound in general; Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
    • G10K11/18—Methods or devices for transmitting, conducting or directing sound
    • G10K11/20—Reflecting arrangements

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Multimedia (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
TW093127533A 2003-09-11 2004-09-10 Acoustic diffusers for acoustic field uniformity TW200515475A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US50196903P 2003-09-11 2003-09-11

Publications (1)

Publication Number Publication Date
TW200515475A true TW200515475A (en) 2005-05-01

Family

ID=34312333

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093127533A TW200515475A (en) 2003-09-11 2004-09-10 Acoustic diffusers for acoustic field uniformity

Country Status (7)

Country Link
US (1) US20050072625A1 (zh)
EP (1) EP1663534A1 (zh)
JP (1) JP2007505503A (zh)
KR (1) KR20060121871A (zh)
CN (1) CN1849183A (zh)
TW (1) TW200515475A (zh)
WO (1) WO2005025767A1 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1842900A (zh) * 2003-07-31 2006-10-04 Fsi国际公司 非常均匀的氧化物层、尤其是超薄层的受控生长
US7322441B2 (en) * 2005-04-14 2008-01-29 Rpg Diffusor Systems, Inc. Extended bandwidth folded well diffusor
DE102006033372B4 (de) * 2006-02-17 2010-04-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Ultraschallaktor zur Reinigung von Objekten
US7669692B2 (en) * 2008-01-21 2010-03-02 Hawkins James W Sound diffuser
AU2010284850A1 (en) * 2009-08-19 2012-03-01 Subsea Asset Location Technologies Limited Acoustic reflector
EP2315235B1 (en) * 2009-10-21 2019-04-24 IMEC vzw Method and apparatus for cleaning a semiconductor substrate
TWI674637B (zh) * 2018-07-27 2019-10-11 台灣積體電路製造股份有限公司 製造設施及製造設施中的錯誤量測方法
JP7116694B2 (ja) * 2019-02-21 2022-08-10 キオクシア株式会社 基板処理装置

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Also Published As

Publication number Publication date
KR20060121871A (ko) 2006-11-29
JP2007505503A (ja) 2007-03-08
CN1849183A (zh) 2006-10-18
WO2005025767A1 (en) 2005-03-24
US20050072625A1 (en) 2005-04-07
EP1663534A1 (en) 2006-06-07

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