200426854 η) 玖、發明說明 【發明所屬之技術領域】 本發明係關於載台裝置，特別係關於其可動部被構成 在石製平臺上至少可以往X軸、γ軸的其中一方的方向移 動之載台裝置。 【先前技術】 作爲此種載台裝置的一例，參照第3圖來說明被稱爲 表面型定位載台裝置之Χ-Υ載台裝置。在第3圖中，在 被固定於架台1上的石製平臺10上，2根導引構件2、3 被配置成隔開規定的間隔而相互平行地往Υ軸方向延 伸。移動體4、5分別被配置在導引構件2、3上。移動體 4 ' 5，係分別藉由線型馬達驅動方式而沿著導引構件2、 3移動。 簡單來說，分別由多數磁石所組成的磁石裝置，被組 裝在導引構件2、3中。另一方面，移動體4、5分別具有 與磁石裝置互相作用的可動線圈。藉此，移動體4、5可 以分別沿著導引構件2、3而滑動移動。再者，爲了定位 控制，移動體4、5具備後述之用來測量移動體！ 4的位置 之測量裝置，例如直尺及感測器，但是由於此種包含測量 裝置的線型馬達本身爲眾所週知，所以省略詳細說明。 在此’若著眼於導引構件2和移動體4，如第3圖（b) 所示，移動體4具有跨過導引構件2之剖面大約爲倒υ 形狀；其內面具備靜壓軸承襯墊1 2，介於導引構件2和 -4- (2) (2)200426854 移動體4之間。藉此，移動體4之沿著導引構件2的 動’平滑地被進行。又，在移動體4的底面，具備靜壓 承襯墊13’介於石製平臺10和移動體4之間。藉此， 移動體4的石製平臺丨〇上的移動，平滑地被進行。同 地’移動體5，也具有靜壓軸承襯墊12和靜壓軸承襯 13 °再者，在第3圖（a)中，係將移動體4的上部的一 分剖開來加以表示。 移動體4和移動體5之間，以樑6連結。移動體 則被配置在樑6上。移動體1 4係將樑6作爲導件，可 在第3圖（a)的X軸方向移動。在第3圖（a)中，爲了 便，以將移動體1 4的上部剖開的狀態來加以表示。移 體14也係藉由上述般的線型馬達驅動方式來進行移動 因此，磁石裝置被組裝在樑6中，而移動體14則具有 此磁石裝置互相作用的可動線圈。 移動體1 4具有跨過樑6之剖面大約爲倒U形狀； 內面具備靜壓軸承襯墊15a、15b、15c、15d，介於樑 和移動體14之間。又，靜壓軸承襯墊14a〜14c被安裝 移動體14的底面。藉此，移動體14被作成可以沿著樑 平滑地移動，並能在石製平臺10上平滑地移動。再者 在樑6的底面，也具備靜壓軸承襯墊16，介於樑6和 製平臺1 〇之間。藉此，樑6係被作成可以在石製平臺 上平滑地移動。 如此的表面型定位載台裝置，例如揭示於專利文獻 中 。 -5- (3) 200426854 此種表面型定位載台裝置，例如作成液晶曝光裝 時，移動體14係被構成用來承載被處理物體也就是 基板而使其移動的機台，特別係作成具有藉由吸著機 來保持液晶基板之功能的機台。 總之，目前爲止的表面型定位載台裝置，一體物 製平臺10係被設置在架台〗上，而在其上，設置 部、其導引部、可動部的驅動裝置、可動部的位置測 置等。又，可動部係藉由利用壓縮空氣的吹出而浮上 壓軸承襯墊而被支撐，沿著導引部在石製平臺10上 觸地移動。 然而，靜壓軸承襯墊移動之石製平臺10的表面 然其真平度爲數μπι，而被平滑地精加工，但是靜壓 襯墊移動的範圍，如第3圖（a)所示，僅被限定於石 臺10全面之中的一部分。 相對於此，當作成液晶曝光裝置用的表面型定位 裝置的情況，隨著液晶基板的大型化（第五代基板： xl 8 00mm、第7代基板：1 8 0 0 x 2 0 0 0 m m )，石製平臺 型化，一體物的石製平臺的製作變困難。也就是說， 用於液晶曝光裝置中的表面型定位載台裝置，隨著被 在機台上的吸著機構上之成爲曝光對象的液晶基板的 變新，基板尺寸也隨之大型化，習知的構成有可能超 製作的界限。 【專利文獻1】日本特開2000-356693號公報（第 置用 液晶 構等 的石 可動 量裝 的靜 非接 ，雖 軸承 製平 載台 1500 也大 被使 承載 世代 過其 1圖 (4) (4)200426854 【發明內容】 (發明所欲解決之課題） 在此’本發明的課題在於提供一種載台裝置，藉由改 良具備石製平臺之載台裝置的構成，不但滿足所要求的性 能且適合大型化的載台裝置。 (解決課題所用的手段） 若根據本發明，可以提供一種載台裝置，係針對其可 動部係被構成至少在石製平臺上可以往X軸、γ軸的至少 其中一方的方向移動之形態的載台裝置，其特徵爲： 將前述石製平臺的尺寸作成對應前述可動部的移動區 域之尺寸’並將該石製平臺固定於具有承接部之鑄鐵製的 鑄造物或是由鋼構造物所構成的底座上。 在根據本發明的第1態樣的載台裝置中，其中前述底 座’在其中央部具有前述承接部；在其兩側，則具有相互 平行地往X軸、Y軸的其中一方的方向延伸之二個導引構 件設置部；在這二個導引構件設置部，設置分別互相平行 地延伸的導引構件，且這二根導引構件，分別具備可以沿 者該導引構件移動的第1移動體，並利用往X軸、γ軸的 另一方的方向延伸的樑，連結這二個第1移動體之間；且 藉由該樑具有可以沿著該樑移動的第2移動體，該第2移 動體作爲則述可動部’係被作成可以在則述石製平臺上往 前述X軸方向和Y軸方向移動。 又，在根據本發明的第1態樣的載台裝置中，其中介 -7- (5) (5)200426854 於前述第1移動體和前述導引構件之間的至少一個的靜壓 軸承襯墊，被設置於前述第1移動體；而且，介於前述第 1移動體和前述石製平臺之間的靜壓軸承襯墊，被設置於 前述第1移動體；而介於前述第2移動體和前述樑之間的 至少一個的靜壓軸承襯墊，被設置於前述第2移動體；而 且，介於前述第2移動體和前述石製平臺之間的複數個靜 壓軸承襯墊，被設置於前述第2移動體。 在根據本發明的第2態樣的載台裝置中，其中前述底 座，在其中央部具有前述承接部；在其兩側，則具有相互 平行地往X軸、Y軸的其中一方的方向延伸之二個導引構 件設置部；在這二個導引構件設置部，設置分別互相平行 地延伸的導引構件，且具備可以沿著這二根導引構件移動 的移動體，該移動體作爲前述可動部，係被作成可以往前 述X軸、Y軸的其中一方的方向移動。 又，在根據本發明的第2態樣的載台裝置中，其中介 於前述移動體和前述導引構件之間的至少一個靜壓軸承襯 墊，被設置於前述移動體。 進而’在根據本發明的第2態樣的載台裝置中，其中 被處理基板被置於前述石製平臺上，在前述移動體，承載 用來對該被處理基板進行檢查或加工的檢查機器或加工機 器。 【實施方式】 參照第1圖來說明將本發明應用在表面型定位載台裝 -8- (6) (6)200426854 置中的第1實施形態。在第1圖中，與第3圖相同的部 分，標上相同的符號。本形態具有以下幾點的特徵。 (1) 取代在第3圖所說明的一體物之石製平臺10和架 台1，而使用底座100和石製平臺20的組合。底座100 係由鑄鐵所做成的鑄造物、或是藉由方管、型鋼等所做成 鋼構造物，將相當於移動體1 4的移動區域之區域’做成 凹口構造。 (2) 而且，底座100的凹口部分，也就是對應移動體 14的移動區域的部分，設置石製平臺20。石製平臺20的 表面係真平度爲數μπι，且平滑地被精加工。又，石製平 臺20的水平，係相對於底座1〇〇而被調整設置。 (3) 樑6的驅動裝置亦即線型馬達或導引部，被配置 在底座1 0 0側。 (4) 對於習知技術之具有一體物之石製平臺的構造而 言，是困難的；但是藉由作成如此的構造，此種載台裝置 的製作成爲可能。 以下，詳細地說明根據本形態之表面型定位載台裝 置。在第1圖中，石製平臺20被設置在：被形成在由鋼 構造物所構成的底座100中的石製平臺用的承接部100a 上，且進行水平校正後被固定。底座1〇〇，在承接部l〇〇a 的兩側，具有用來設置導引構件的設置部。在此設置部， 導引構件2、3係被配置成相互平行地往Y軸方向延伸。 移動體4、5，係分別藉由線型馬達驅動方式而移 動。也就是說，分別由多數磁石所組成的磁石裝置，被組 -9- (7) (7)200426854 裝在導引構件2、3中。移動體4、5分別具有與磁石裝置 互相作用的可動線圈。藉此，移動體4、5可以分別沿著 導引構件2、3而在Y軸方向滑動移動。又，爲了定位控 制’移動體4、5設置後述之用來測量移動體1 4的位置之 測量裝置，例如直尺及感測器，但是由於此種包含測量裝 置的線型馬達爲眾所週知，所以省略詳細說明。 若就導引構件2和移動體4而言，如第1圖（b)所 示’移動體4具有跨過導引構件2之剖面大約爲倒U形 狀。在移動體4的內面，具備1個以上的靜壓軸承襯墊 1 2 ’介於導引構件2和移動體4之間。移動體4之成爲導 引面的導引構件2的側面，當然也被施以表面精加工。藉 此，移動體4之沿著導引構件2的移動，平滑地被進行。 又，如第1圖（b)所示，在移動體4的底面，具備1個以 上的靜壓軸承襯墊13，介於石製平臺20和移動體4之 間。藉此，在石製平臺20上的移動，平滑地被進行。 以上的構成，關於導引構件3和移動體5也幾乎完全 相同。也就是說，移動體5，也具有靜壓軸承襯墊12、 1 3 〇 再者，也可以取代上述靜壓軸承襯墊，而使用所謂的 直聯導件，此取代在關於以後所述的移動體1 4中的靜廯 軸承襯墊，也是同樣的。 移動體4和移動體5之間，以樑6連結。移動體14 則被配置在樑6上。移動體14係將樑6作爲導件，可以 在第1圖（a)的X軸方向移動。在第1圖U)中，爲了方 -10- (8) (8)200426854 便’以將移動體1 4的上部剖開的狀態來加以表示。移動 體1 4也係藉由上述般的線型馬達驅動方式來進行移動。 因此’磁石裝置被組裝在樑6中，而移動體1 4則具有與 此磁石裝置互相作用的可動線圈。 移動體1 4具有跨過樑6之剖面大約爲倒U形狀；其 內面具備靜壓軸承襯墊Ba'lSb'lSc'lSd，介於樑6 和移動體14之間。在石製平臺20和移動體14之間，也 配置靜壓軸承襯墊14a、14b、14c。也就是說，靜壓軸承 襯墊14a〜14c被安裝在移動體14的底面。移動體14之 成爲導引面的樑6的側面，當然也被施以表面精加工。藉 此’移動體14被作成可以沿著樑6平滑地移動，並能在 石製平臺20上平滑地移動。 也就是說，可以在X軸方向、Y軸方向移動。 再者，在樑6的底面，也具備靜壓軸承襯墊16，介 於樑6和石製平臺20之間。藉此，樑6係被作成可以在 石製平臺20上平滑地移動。 上述表面型定位載台裝置，在移動體14，設置用來 承載被處理物的機台、或是移動體14本身作爲機台來利 用。而且，被處理物爲基板狀的物體的情況，此機台具備 藉由減壓機構所構成的吸著機構。如此的載台裝置，例如 應用於液晶曝光裝置，但是並不被限定於此，可以應用於 全部的要求大型化之載台裝置。又，上述形態，係移動體 14可以往X軸、Y軸兩方移動的載台裝置，但是也可以 應用於移動體14僅可以在X軸、Y軸之其中一方移動的 -11 - (9) (9)200426854 載台裝置。此情況’相當於移動體1 4的部分被固定於樑 6 °當然，沒有相當於移動體1 4的部分而將樑6本身作爲 移動體來利用也可以。此情況，移動體4、5和樑6所組 成的部分，也可以被稱爲移動體。 參照第2圖來說明關於本發明的第2實施形態。根據 此第2實施形態的載台裝置，利用承載著用來檢查被置於 石製平臺上的被處理基板之攝像裝置，作爲檢查用載台裝 置來使用。 在第2圖中，與第1圖相同的部分標上相同的符號。 本形態與第1實施形態相異之處在於：除了被處理基板被 置於石製平臺20上以外，加入攝像裝置30承載在樑6-1 上之點。此情況，爲了被處理基板的保持，在石製平臺 2〇中，理想爲埋入一個以上藉由減壓機構所構成的吸著 機構。又，攝像裝置3 0，係作成可以沿著樑6 · 1的側面 往圖中的X軸方向移動，且往垂直於X軸、Y軸的Z軸 方向移動。作爲將攝像裝置30作成可以在Z軸方向移動 的一個理由，例如可以將攝像範圍作成可變。導引構件2 和移動體4、導引構件3和移動體5之間的構造，與第1 實施形態完全一樣便可以。雖然在圖面中省略了關於將如 此X軸、Y軸方向的移動作成可能的驅動機構，簡單地說 明其一例。藉由在樑6-1的側面設置往X軸方向延伸的導 引構件，藉由X軸驅動源，作成使可動部可以沿著此導 引構件移動。而且，在此可動部，經由Z軸驅動源，承載 可以往Z軸方向移動的攝像裝置3 0。作爲X軸驅動源， -12 - (10) (10)200426854 例如能夠使用線型馬達；z軸驅動源，例如能夠使用音圈 馬達。由於如此的驅動源本身爲眾所週知，故省略詳細的 說明。當然，驅動源並不被限定於線型罵達、音圈馬達。 再者’在操 6 - 1的底面側，並沒有具備靜壓軸系襯 墊；被處理基板，當然係爲沒有進入移動體4、5的底面 側之靜壓軸承襯墊的移動區域的尺寸。又，移動體4、5 的Y軸方向的長度，從Y軸方向的檢查區域的擴大之觀 點，當然理想爲儘可能地短。 如此的載台裝置，應用在利用攝像裝置來將被置於石 製平臺2 0上的被處理基板的處理後的狀態攝像，然後根 據所得到的畫像，來進行被處理基板的表面狀態的檢查之 裝置中，能夠對應被置於石製平臺20上的被處理基板的 大型化。 另外，在液晶基板的製造過程中，爲了藉由特定的材 料在玻璃基板上塗佈形成薄膜，逐漸取代旋轉塗佈機而使 用被稱爲機台塗佈機的設備。本發明，也可以應用於機台 塗佈機用的載台裝置中。此情況，機台塗佈機，在第2圖 所示的載台裝置中，噴嘴部被承載在樑6_1。也就是說， 沒有具備第1圖所示的移動體14，而在石製平臺20上放 置玻璃基板。而且，爲了玻璃基板的保持，在石製平臺 20中，埋入一個以上藉由減壓機構所構成的吸著機構。 如此的機台塗佈機，也被稱爲高架型塗佈機。即使對 於如此的機台塗佈機用的載台裝置，也能夠對應被置於石 製平臺20上的如玻璃基板般的被處理基板的大型化。 •13- (11) (11)200426854 〔發明的效果〕 若根據本發明，藉由改良載台裝置中的底座和石製平 臺的構成，能夠提供一種不但滿足所要求的性能，且可以 製作出例如基板處理用之大型的載台裝置。這是由於：液 晶基板等的被處理物大型化的情況，對應該大型化，石製 平臺、底座也大型化，但是與習知的石製平臺的大型化相 比，本發明中石製平臺尺寸的增加較少便可以。 【圖式簡單說明】 第1圖係表示將本發明應用在表面型定位載台裝置中 的第1貫施形態的圖；第1圖（a)係俯視圖、第1圖（b)係 側視圖。 第2圖係表示將本發明應用在檢查用載台裝置中的第 2貫施形態的圖；第2圖（a)係俯視圖、第2圖（b)係側視 圖。 第3圖係表示習知的表面型定位載台裝置的一例之 圖；第3圖（a)係俯視圖、第3圖（b)係側視圖。 【符號說明】 1 :架台 2、3 :導引構件 4、5、14 :移動體 6 、 6·1 :樑 •14- (12) (12)200426854 20 :石製平臺 12、13、14a〜14c、15a〜15d、16:靜壓軸承襯墊 1 〇〇 :底座 1 0 0 a :承接部200426854 η) Description of the invention [Technical field to which the invention belongs] The present invention relates to a stage device, and more particularly, to a movable platform in which a movable portion is configured to move at least one of the X-axis and the γ-axis. Carrier device. [Prior Art] As an example of such a stage device, an X-Z stage device called a surface type positioning stage device will be described with reference to FIG. 3. In FIG. 3, on a stone platform 10 fixed to the stand 1, two guide members 2, 3 are arranged so as to extend parallel to each other at a predetermined interval in the Z axis direction. The moving bodies 4 and 5 are arranged on the guide members 2 and 3, respectively. The moving bodies 4 ′ 5 are moved along the guide members 2 and 3 by a linear motor driving method, respectively. In simple terms, magnet devices each composed of a plurality of magnets are incorporated in the guide members 2 and 3. On the other hand, each of the moving bodies 4 and 5 has a movable coil which interacts with the magnet device. Thereby, the movable bodies 4, 5 can be slidably moved along the guide members 2, 3, respectively. Furthermore, for positioning control, the moving bodies 4 and 5 are provided for measuring the moving body described later! 4 position measuring devices, such as rulers and sensors, but since such linear motors including measuring devices are well known, detailed descriptions are omitted. Here, if focusing on the guide member 2 and the moving body 4, as shown in FIG. 3 (b), the moving body 4 has an approximately inverted shape in cross section across the guide member 2; its inner surface is provided with a hydrostatic bearing The gasket 12 is between the guide member 2 and the -4- (2) (2) 200426854 moving body 4. Thereby, movement of the moving body 4 along the guide member 2 is smoothly performed. A static pressure bearing pad 13 'is provided on the bottom surface of the moving body 4 between the stone platform 10 and the moving body 4. Thereby, the movement on the stone platform of the mobile body 4 is smoothly performed. In the same place, the moving body 5 also has a hydrostatic bearing pad 12 and a hydrostatic bearing pad 13 °. Furthermore, in Fig. 3 (a), a part of the upper portion of the moving body 4 is shown in a cutaway manner. The mobile body 4 and the mobile body 5 are connected by a beam 6. The moving body is arranged on the beam 6. The moving body 1 and 4 use the beam 6 as a guide and can move in the X-axis direction in Fig. 3 (a). In Fig. 3 (a), the upper part of the moving body 14 is shown in a state of being cut out for convenience. The moving body 14 is also moved by the above-mentioned linear motor driving method. Therefore, a magnet device is assembled in the beam 6, and the moving body 14 has a movable coil which interacts with the magnet device. The moving body 14 has an approximately U-shaped cross section across the beam 6; the inner surface is provided with hydrostatic bearing pads 15a, 15b, 15c, 15d, which are interposed between the beam and the moving body 14. The static pressure bearing pads 14a to 14c are mounted on the bottom surface of the moving body 14. Thereby, the moving body 14 can be smoothly moved along the beam, and can be smoothly moved on the stone platform 10. Furthermore, the bottom surface of the beam 6 is also provided with a hydrostatic bearing pad 16 interposed between the beam 6 and the platform 10. As a result, the beam 6 is made to move smoothly on the stone platform. Such a surface-type positioning stage device is disclosed in, for example, Patent Literature. -5- (3) 200426854 Such a surface-type positioning stage device, for example, when a liquid crystal exposure device is made, the moving body 14 is a machine for moving the object to be processed, that is, the substrate, and is especially designed to have A machine that maintains the function of a liquid crystal substrate by a suction machine. In short, the surface-type positioning stage device so far, the integrated platform 10 is installed on the stand, and the installation part, its guide part, driving device of the movable part, and position measurement of the movable part are set thereon. Wait. The movable portion is supported by floating the pressure bearing pad by blowing out compressed air, and moves along the guide portion on the stone platform 10 while touching the ground. However, although the surface of the stone platform 10 on which the hydrostatic bearing pad moves has a true flatness of several μm, it is smoothly finished, but the range of movement of the hydrostatic pad, as shown in FIG. It is limited to a part of the entirety of the stone platform 10. On the other hand, as a surface-type positioning device for a liquid crystal exposure device, as the size of a liquid crystal substrate becomes larger (fifth-generation substrate: xl 8 00mm, seventh-generation substrate: 1 8 0 0 x 2 0 0 0 mm ), The stone platform is shaped, making the integrated stone platform becomes difficult. In other words, as the surface-type positioning stage device used in the liquid crystal exposure device, as the liquid crystal substrate to be exposed on the suction mechanism on the machine becomes newer, the substrate size also becomes larger. The known structure may exceed the limit of production. [Patent Document 1] Japanese Patent Application Laid-Open No. 2000-356693 (the first non-contact static movable device with a liquid crystal structure, etc., although the bearing-made flat stage 1500 is also largely used to carry it for 1 generation (4) (4) 200426854 [Summary of the Invention] (Problems to be Solved by the Invention) Here, the object of the present invention is to provide a stage device which improves the structure of the stage device provided with a stone platform and not only satisfies the required performance It is also suitable for a large-sized stage device. (Means for solving the problem) According to the present invention, a stage device can be provided for the movable part of the stage device, which can be constructed at least on a stone platform to the X axis and the γ axis. The stage device in the form of moving in at least one of the directions is characterized in that the size of the stone platform is made to correspond to the size of the moving area of the movable portion, and the stone platform is fixed to a cast iron with a receiving portion. The casting or the base made of a steel structure. In the stage device according to the first aspect of the present invention, the base is provided with the receiving portion at a central portion thereof; On both sides, there are two guide member installation portions extending parallel to one of the X-axis and the Y-axis; and the two guide member installation portions are provided with guides extending in parallel with each other. And the two guide members each include a first moving body capable of moving along the guide member, and the two first movements are connected by a beam extending in the other direction of the X-axis and the γ-axis. And the beam has a second moving body that can move along the beam, and the second moving body is made as a movable part of the said system so that it can be moved on the stone platform in the X-axis direction and It moves in the Y-axis direction. In the stage device according to the first aspect of the present invention, at least one of the -7- (5) (5) 200426854 is between the first moving body and the guide member. A hydrostatic bearing pad is provided on the first moving body; and a hydrostatic bearing pad between the first moving body and the stone platform is provided on the first moving body; and Hydrostatic bearing bushing between at least one of said second moving body and said beam A pad is provided on the second moving body, and a plurality of hydrostatic bearing pads between the second moving body and the stone platform are provided on the second moving body. In the second aspect of the stage device, the base includes the receiving portion at a central portion of the stage device, and two guides extending in parallel to one of the X-axis and the Y-axis on both sides of the base. A component installation section; the two guide member installation sections are provided with guide members extending in parallel with each other, and are provided with a movable body capable of moving along the two guide members, and the movable body is used as the movable section, It is made to move to one of the X-axis and Y-axis. In the stage device according to the second aspect of the present invention, at least one between the moving body and the guide member The hydrostatic bearing pad is provided on the moving body. Furthermore, in the stage device according to the second aspect of the present invention, the substrate to be processed is placed on the stone platform, and the moving body carries an inspection machine for inspecting or processing the substrate to be processed. Or processing machines. [Embodiment] A first embodiment in which the present invention is applied to a surface-type positioning stage device-(6) (6) 200426854 will be described with reference to Fig. 1. In Fig. 1, the same parts as those in Fig. 3 are marked with the same symbols. This form has the following features. (1) Instead of the one-piece stone platform 10 and the stand 1 described in FIG. 3, a combination of a base 100 and a stone platform 20 is used. The base 100 is a cast structure made of cast iron or a steel structure made of a square pipe, a profiled steel, or the like, and has a recessed structure corresponding to the area ′ of the moving area of the moving body 14. (2) Further, a stone platform 20 is provided in a recessed portion of the base 100, that is, a portion corresponding to a moving area of the moving body 14. The surface of the stone platform 20 has a true flatness of several μm and is smoothly finished. The level of the stone platform 20 is adjusted relative to the base 100. (3) The driving device of the beam 6, that is, a linear motor or a guide, is arranged on the 100 side of the base. (4) It is difficult to construct a monolithic stone platform using conventional technology; however, by making such a structure, it is possible to manufacture such a stage device. Hereinafter, the surface-type positioning stage device according to this aspect will be described in detail. In FIG. 1, the stone platform 20 is installed on a receiving portion 100 a for a stone platform formed in a base 100 made of a steel structure, and is fixed after level correction. The base 100 has setting portions for setting the guide member on both sides of the receiving portion 100a. In this installation portion, the guide members 2 and 3 are arranged so as to extend parallel to each other in the Y-axis direction. The moving bodies 4 and 5 are respectively moved by a linear motor driving method. That is, the magnet devices composed of a plurality of magnets, respectively, are installed in the guide members 2 and 3 in the group -9- (7) (7) 200426854. The moving bodies 4 and 5 each have a movable coil which interacts with the magnet device. Thereby, the moving bodies 4, 5 can slide along the guide members 2, 3 in the Y-axis direction, respectively. In addition, for positioning control, the moving bodies 4 and 5 are provided with a measuring device for measuring the position of the moving body 14 described later, such as a ruler and a sensor. However, since this type of linear motor including a measuring device is well known, it is omitted. Detailed description. As for the guide member 2 and the moving body 4, as shown in Fig. 1 (b), the 'moving body 4 has a cross-section that crosses the guide member 2 and has an approximately U-shape. On the inner surface of the moving body 4, one or more hydrostatic bearing pads 1 2 'are provided between the guide member 2 and the moving body 4. Of course, the side surface of the guide member 2 serving as the guide surface of the moving body 4 is also surface-finished. Thereby, the movement of the mobile body 4 along the guide member 2 is smoothly performed. As shown in FIG. 1 (b), the bottom surface of the moving body 4 is provided with one or more hydrostatic bearing pads 13 between the stone platform 20 and the moving body 4. Thereby, the movement on the stone platform 20 is performed smoothly. The above configuration is also almost the same with respect to the guide member 3 and the moving body 5. That is to say, the moving body 5 also includes the hydrostatic bearing pads 12 and 130. Furthermore, instead of the above-mentioned hydrostatic bearing pads, a so-called direct-coupled guide may be used. The same applies to the static bearing pads in the moving body 14. The mobile body 4 and the mobile body 5 are connected by a beam 6. The moving body 14 is arranged on the beam 6. The moving body 14 can move in the X-axis direction of Fig. 1 (a) using the beam 6 as a guide. In Fig. 1 U), for the purpose of -10- (8) (8) 200426854, it is shown in a state where the upper portion of the moving body 14 is cut away. The moving body 14 is also moved by the aforementioned linear motor driving method. Therefore, the 'magnet device' is assembled in the beam 6, and the moving body 14 has a movable coil which interacts with the magnet device. The moving body 14 has an approximately U-shaped cross-section across the beam 6; its inner surface is provided with a hydrostatic bearing pad Ba'lSb'lSc'lSd, between the beam 6 and the moving body 14. Between the stone platform 20 and the moving body 14, static pressure bearing pads 14a, 14b, and 14c are also arranged. That is, the static pressure bearing pads 14a to 14c are mounted on the bottom surface of the moving body 14. Of course, the side surface of the beam 6 serving as the guide surface of the moving body 14 is also subjected to surface finishing. With this, the 'moving body 14 is made to be able to move smoothly along the beam 6 and to move smoothly on the stone platform 20. That is, it can move in the X-axis direction and the Y-axis direction. The bottom surface of the beam 6 is also provided with a hydrostatic bearing pad 16 between the beam 6 and the stone platform 20. This allows the beam 6 to be smoothly moved on the stone platform 20. In the above-mentioned surface-type positioning stage device, the moving body 14 is provided with a machine for carrying an object to be processed, or the moving body 14 itself is used as a machine. In addition, when the object to be processed is a substrate-like object, this machine is provided with a suction mechanism constituted by a decompression mechanism. Such a stage device is applied to, for example, a liquid crystal exposure device, but it is not limited to this, and can be applied to all stage devices that require an increase in size. In the above-mentioned embodiment, the stage device is a stage device that the movable body 14 can move to both the X-axis and the Y-axis. However, it can also be applied to the -11-(9 ) (9) 200426854 Carrier device. In this case, a portion corresponding to the mobile body 14 is fixed to the beam 6 °. Of course, there is no portion corresponding to the mobile body 14 and the beam 6 itself may be used as a mobile body. In this case, a portion composed of the moving bodies 4, 5 and the beam 6 may also be referred to as a moving body. A second embodiment of the present invention will be described with reference to FIG. 2. According to the stage device of the second embodiment, an imaging device carrying an inspection substrate to be processed placed on a stone platform is used as the inspection stage device. In Fig. 2, the same parts as those in Fig. 1 are assigned the same symbols. This embodiment is different from the first embodiment in that the substrate to be processed is placed on the stone platform 20, and the point where the imaging device 30 is carried on the beam 6-1 is added. In this case, in order to hold the substrate to be processed, it is desirable to embed one or more suction mechanisms formed by a pressure reducing mechanism in the stone platform 20. The imaging device 30 is configured to move along the side of the beam 6 · 1 in the X-axis direction in the figure and in the Z-axis direction perpendicular to the X-axis and Y-axis. As one reason for making the imaging device 30 movable in the Z-axis direction, for example, the imaging range can be made variable. The structures between the guide member 2 and the mobile body 4 and between the guide member 3 and the mobile body 5 are exactly the same as those of the first embodiment. Although the drive mechanism for making the movement in the X-axis and Y-axis directions as described above is omitted in the drawing, an example is briefly described. A guide member extending in the X-axis direction is provided on the side of the beam 6-1, and an X-axis drive source is provided so that the movable portion can be moved along the guide member. In addition, the movable unit carries a camera device 30 that can move in the Z-axis direction via a Z-axis drive source. As the X-axis drive source, -12-(10) (10) 200426854 can be used, for example, a linear motor; the z-axis drive source can be used, for example, a voice coil motor. Since such a driving source itself is well known, detailed description is omitted. Of course, the drive source is not limited to linear scolding and voice coil motors. In addition, the bottom surface side of the operation 6-1 is not provided with a hydrostatic shafting pad; the substrate to be processed is, of course, a size that does not enter the moving area of the hydrostatic bearing pads on the bottom surface side of the moving bodies 4,5. The lengths of the moving bodies 4 and 5 in the Y-axis direction are preferably as short as possible from the viewpoint of expanding the inspection area in the Y-axis direction. Such a stage device is applied to use an imaging device to image a processed state of a processed substrate placed on a stone platform 20, and then to inspect the surface state of the processed substrate based on the obtained image. The apparatus can support the increase in size of a substrate to be processed placed on the stone platform 20. In addition, in the manufacturing process of liquid crystal substrates, in order to form a thin film on a glass substrate by a specific material, a device called a machine coater is gradually replaced in place of a spin coater. The present invention can also be applied to a stage device for a coater. In this case, in the stage coater, the nozzle unit is carried on the beam 6_1 in the stage apparatus shown in FIG. 2. That is, the glass substrate is placed on the stone platform 20 without the moving body 14 shown in FIG. 1. In order to hold the glass substrate, one or more suction mechanisms including a pressure reducing mechanism are embedded in the stone platform 20. Such a machine coater is also called an overhead coater. Even with such a stage device for a coater, it is possible to cope with an increase in the size of a processing substrate such as a glass substrate placed on the stone platform 20. • 13- (11) (11) 200426854 [Effects of the invention] According to the present invention, by improving the constitution of the base and the stone platform in the stage device, it is possible to provide not only the required performance, but also the production For example, a large stage device for substrate processing. This is because the size of the object to be processed such as a liquid crystal substrate is large, and the stone platform and the base are also large. However, the size of the stone platform in the present invention is larger than that of the conventional stone platform. Less increase is enough. [Brief description of the drawings] Fig. 1 is a diagram showing a first embodiment of the present invention applied to a surface-type positioning stage device; Fig. 1 (a) is a plan view, and Fig. 1 (b) is a side view. . Fig. 2 is a diagram showing a second embodiment of the application of the present invention to an inspection stage device; Fig. 2 (a) is a plan view and Fig. 2 (b) is a side view. Fig. 3 is a diagram showing an example of a conventional surface-type positioning stage device; Fig. 3 (a) is a plan view and Fig. 3 (b) is a side view. [Symbol description] 1: Stands 2, 3: Guide members 4, 5, 14: Moving bodies 6, 6 · 1: Beams · 14- (12) (12) 200426854 20: Stone platforms 12, 13, 14a ~ 14c, 15a ~ 15d, 16: Hydrostatic bearing pad 1 00: Base 1 0 0a: Receiving part
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