1261007 (1) 玖、發明說明 【發明所屬之技術領域】 本發明係關於載台裝置，特別係關於其可動部被構成 在石製平臺上至少可以往X軸、Y軸的其中一方的方向移 動之載台裝置。 【先前技術】 作爲此種載台裝置的一例，參照第3圖來說明被稱爲 表面型定位載台裝置之X-Y載台裝置。在第3圖中，在 被固定於架台1上的石製平臺1 0上，2根導引構件2、3 被配置成隔開規定的間隔而相互平行地往 Y軸方向延 伸。移動體4、5分別被配置在導引構件2、3上。移動體 4 ' 5 ’係分別藉由線型馬達驅動方式而沿著導引構件2、 3移動。 簡單來說，分別由多數磁石所組成的磁石裝置，被組 - ..… — · … 裝在導引構件2、3中。另一方面，移動體4、5分別具有 與磁石裝置互相作用的可動線圈。藉此，移動體4、5可 以分別沿著導引構件2、3而滑動移動。再者，爲了定位 控制’移動體4、5具備後述之用來測量移動體I 4的位置 之測量裝置，例如直尺及感測器，但是由於此種包含測量 裝置的線型馬達本身爲眾所週知，所以省略詳細說明。 在此，若著眼於導引構件2和移動體4，如第3圖（b) 所示，移動體4具有跨過導引構件2之剖面大約爲倒U 形狀；其內面具備靜壓軸承襯墊1 2，介於導引構件2和 -4- 1261007 (2) 移動體4之間。藉此，移動體4之沿著導引構件2的移 動’平滑地被進行。又，在移動體4的底面，具備靜壓軸 承襯墊13’介於石製平臺和移動體4之間。藉此，在 移動體4的石製平臺1 〇上的移動，平滑地被進行。同樣 地’移動體5’也具有靜壓軸承襯墊12和靜壓軸承襯墊 1 3。再者’在第3圖（a)中，係將移動體4的上部的一部 分剖開來加以表示。 移動體4和移動體5之間，以樑6連結。移動體1 4 則被配置在樑6上。移動體14係將樑6作爲導件，可以 在第3圖（a)的X軸方向移動。在第3圖（a)中，爲了方 便’以將移動體1 4的上部剖開的狀態來加以表示。移動 體14也係藉由上述般的線型馬達驅動方式來進行移動。 因此，磁石裝置被組裝在樑6中，而移動體14則具有與 此磁石裝置互相作用的可動線圈。 移動體1 4具有跨過樑6之剖面大約爲倒U形狀；其 內面具備靜壓軸承襯墊15a、15b、15 c.、15d，介於樑 6 和移動體14之間。又，靜壓軸承襯墊14a〜14c被安裝在 移動體14的底面。藉此，移動體14被作成可以沿著樑6 平滑地移動，並能在石製平臺1〇上平滑地移動。再者， 在樑6的底面，也具備靜壓軸承襯墊16，介於樑6和石 製平臺10之間。藉此，樑6係被作成可以在石製平臺1〇 上平滑地移動。 如此的表面型定位載台裝置，例如揭示於專利文獻1 1261007 (3) 此種表面型定位載台裝置，例如作成液晶曝光裝 時’移動體1 4係被構成用來承載被處理物體也就是 基板而使其移動的機台，特別係作成具有藉由吸著機 來保持液晶基板之功能的機台。 總之’目前爲止的表面型定位載台裝置，一體物 製平臺10係被設置在架台1上，而在其上，設置 部、其導引部、可動部的驅動裝置、可動部的位置測 置等。又’可動部係藉由利用壓縮空氣的吹出而浮上 壓軸承襯墊而被支撐，沿著導引部在石製平臺10上 觸地移動。 然而，靜壓軸承襯墊移動之石製平臺10的表面 然其真平度爲數μιη，而被平滑地精加工，但是靜壓 襯墊移動的範圍，如第3圖（a)所示，僅被限定於石 臺10全面之中的一部分。 相對於此，當作成液晶曝光裝置用的表面型定位 裝置的情況，隨著液晶基板的大型化（第五代基板： xl 8 0 0mm、第 7代基板：1 8 0 0x 2 0 00mm)，石製平臺 型化，一體物的石製平臺的製作變困難。也就是說， 用於液晶曝光裝置中的表面型定位載台裝置，隨著被 在機台上的吸著機構上之成爲曝光對象的液晶基板的 變新，基板尺寸也隨之大型化，習知的構成有可能超 製作的界限。 【專利文獻1】日本特開2000-3 5 6693號公報（第 置用 液晶 構等 的石 可動 量裝 的靜 非接 ，雖 軸承 製平 載台 1500 也大 被使 承載 世代 過其 1圖 1261007 (4) 【發明內容】 (發明所欲解決之課題） 在此，本發明的課題在於提供一種載台裝置，藉由改 良具備石製平臺之載台裝置的構成，不但滿足所要求的性 能且適合大型化的載台裝置。 (解決課題所用的手段） 若根據本發明，可以提供一種載台裝置，係針對其可 動部係被構成至少在石製平臺上可以往X軸、Y軸的至少 其中一方的方向移動之形態的載台裝置，其特徵爲： 將前述石製平臺的尺寸作成對應前述可動部的移動區 域之尺寸，並將該石製平臺固定於具有承接部之鑄鐵製的 鑄造物或是由鋼構造物所構成的底座上。 在根據本發明的第1態樣的載台裝置中，其中前述底 座’在其中央部具有前述承接部；在其兩側，則具有相互 平行地往X軸、Y軸的其中一方的方向延伸之二個導引構 件設置部；在這二個導引構件設置部，設置分別互相平行 地延伸的導引構件，且這二根導引構件，分別具備可以沿 著該導引構件移動的第1移動體，並利用往X軸、Y軸的 另一方的方向延伸的樑，連結這二個第1移動體之間；且 藉由該樑具有可以沿著該樑移動的第2移動體，該第2移 動體作爲前述可動部，係被作成可以在前述石製平臺上往 前述X軸方向和Y軸方向移動。 又，在根據本發明的第1態樣的載台裝置中，其中介 1261007 (5) 於前述第1移動體和前述導引構件之間的至少一個的靜壓 軸承襯墊，被設置於前述第1移動體；而且，介於前述第 1移動體和前述石製平臺之間的靜壓軸承襯墊，被設置於 前述第1移動體；而介於前述第2移動體和前述樑之間的 至少一個的靜壓軸承襯墊，被設置於前述第2移動體；而 且’介於前述第2移動體和前述石製平臺之間的複數個靜 壓軸承襯墊，被設置於前述第2移動體。 在根據本發明的第2態樣的載台裝置中，其中前述底 座’在其中央部具有前述承接部；在其兩側，則具有相互 平行地往X軸、Y軸的其中一方的方向延伸之二個導引構 件設置部；在這二個導引構件設置部，設置分別互相平行 地延伸的導引構件，且具備可以沿著這二根導引構件移動 的移動體，該移動體作爲前述可動部，係被作成可以往前 述X軸、Y軸的其中一方的方向移動。 又’在根據本發明的第2態樣的載台裝置中，其中介 於前述移動體和前述導引構件之間的至少一個靜壓軸承襯 墊，被設置於前述移動體。 進而，在根據本發明的第2態樣的載台裝置中，其中 被處理基板被置於前述石製平臺上，在前述移動體，承載 用來對該被處理基板進行檢查或加工的檢查機器或加工機 器。 【實施方式】 參照第1圖來說明將本發明應用在表面型定位載台裝 •8- 1261007 (6) 置中的第1實施形態。在第1圖中，與第3圖相同的部 分，標上相同的符號。本形態具有以下幾點的特徵。 (1 )取代在第3圖所說明的一體物之石製平臺]〇和架 台1，而使用底座1 〇 〇和石製平臺2 〇的組合。底座1 〇 〇 係由鑄鐵所做成的鑄造物、或是藉由方管、型鋼等所做成 鋼構造物，將相當於移動體14的移動區域之區域，做成 凹口構造。 (2) 而且，底座100的凹口部分，也就是對應移動體 14的移動區域的部分’設置石製平臺20。石製平臺20的 表面係真平度爲數μιη，且平滑地被精加工。又，石製平 臺2 0的水平，係相對於底座1〇〇而被調整設置。 (3) 樑6的驅動裝置亦即線型馬達或導引部，被配置 在底座1 0 0側。 (4) 對於習知技術之具有一體物之石製平臺的構造而 言，是困難的；但是藉由作成如此的構造，此種載台裝置 的製作成爲可能。 以下，詳細地說明根據本形態之表面型定位載台裝 置。在第1圖中，石製平臺20被設置在：被形成在由鋼 構造物所構成的底座100中的石製平臺用的承接部l〇〇a 上，且進行水平校正後被固定。底座1〇〇，在承接部100a 的兩側，具有用來設置導引構件的設置部。在此設置部， 導引構件2、3係被配置成相互平行地往Y軸方向延伸。 移動體4、5，係分別藉由線型馬達驅動方式而移 動。也就是說，分別由多數磁石所組成的磁石裝置’被組 -9 - (7) 1261007 裝在導引構件2、3中。移動體4、5分別具有與磁石裝置 互相作用的可動線圈。藉此，移動體4、5可以分別沿著 導引構件2、3而在Y軸方向滑動移動。又，爲了定位控 制’移動體4、5設置後述之用來測量移動體14的位置之 測量裝置’例如直尺及感測器，但是由於此種包含測量裝 置的線型馬達爲眾所週知，所以省略詳細說明。 若就導引構件2和移動體4而言，如第1圖（b)所 示’移動體4具有跨過導引構件2之剖面大約爲倒u形 狀。在移動體4的內面，具備1個以上的靜壓軸承襯墊 12 ’介於導引構件2和移動體4之間。移動體4之成爲導 引面的導引構件2的側面，當然也被施以表面精加工。藉 此’移動體4之沿著導引構件2的移動，平滑地被進行。 又’如第1圖（b)所示，在移動體4的底面，具備1個以 上的靜壓軸承襯墊13，介於石製平臺20和移動體4之 間。藉此，在石製平臺20上的移動，平滑地被進行。 以上的構成，關於導引構件3和移動體5也幾乎完全 相同。也就是說，移動體5，也具有靜壓軸承襯墊12、 13° 再者，也可以取代上述靜壓軸承襯墊，而使用所謂的 直聯導件，此取代在關於以後所述的移動體14中的靜靡 軸承襯墊，也是同樣的。 移動體4和移動體5之間，以樑6連結。移動體14 則被配置在樑6上。移動體14係將樑6作爲導件，可以 在第1圖（a)的X軸方向移動。在第1圖（a)中，爲了方 (8) 1261007 便，以將移動體1 4的上部剖開的狀態來加以表示。移動 體1 4也係藉由上述般的線型馬達驅動方式來進行移動。 因此，磁石裝置被組裝在樑6中，而移動體14則具有與 此磁石裝置互相作用的可動線圈。 移動體1 4具有跨過樑6之剖面大約爲倒U形狀；其 內面具備靜壓軸承襯墊15a、15b、15c、15d，介於樑6 和移動體1 4之間。在石製平臺2 0和移動體1 4之間，也 配置靜壓軸承襯墊14a、14b、14c。也就是說，靜壓軸承 襯墊14a〜14c被安裝在移動體14的底面。移動體14之 成爲導引面的樑6的側面，當然也被施以表面精加工。藉 此，移動體14被作成可以沿著樑6平滑地移動，並能在 石製平臺20上平滑地移動。 也就是說，可以在X軸方向、Y軸方向移動。 再者，在樑6的底面，也具備靜壓軸承襯墊16，介 於樑6和石製平臺20之間。藉此，樑6係被作成可以在 石製平臺20上平滑地移動。 上述表面型定位載台裝置，在移動體14，設置用來 承載被處理物的機台、或是移動體14本身作爲機台來利 用。而且，被處理物爲基板狀的物體的情況，此機台具備 藉由減壓機構所構成的吸著機構。如此的載台裝置，例如 應用於液晶曝光裝置，但是並不被限定於此，可以應用於 全部的要求大型化之載台裝置。又，上述形態，係移動體 14可以往X軸、Y軸兩方移動的載台裝置，但是也可以 應用於移動體14僅可以在X軸、Y軸之其中一方移動的 -11 - 1261007 Ο) 載台裝置。此情況，相當於移動體1 4的部分被固定於樑 6。當然，沒有相當於移動體1 4的部分而將樑6本身作爲 移動體來利用也可以。此情況，移動體4、5和樑6所組 成的部分’也可以被稱爲移動體° 參照第2圖來說明關於本發明的第2實施形態。根據 此第2實施形態的載台裝置，利用承載著用來檢查被置於 石製平臺上的被處理基板之攝像裝置，作爲檢查用載台裝 置來使用。 在第2圖中，與第1圖相同的部分標上相同的符號。 本形態與第1實施形態相異之處在於：除了被處理基板被 置於石製平臺20上以外，加入攝像裝置30承載在樑6-1 上之點。此情況，爲了被處理基板的保持，在石製平臺 2 0中，理想爲埋入一個以上藉由減壓機構所構成的吸著 機構。又，攝像裝置30，係作成可以沿著樑1的側面 往圖中的X軸方向移動，且往垂直於X軸、Y軸的Z軸 方向移動。作爲將攝像裝置30作成可以在Z軸方向移動 的一個理由，例如可以將攝像範圍作成可變。導引構件2 和移動體4、導引構件3和移動體5之間的構造，與第1 實施形態完全一樣便可以。雖然在圖面中省略了關於將如 此X軸、Y軸方向的移動作成可能的驅動機構，簡單地說 明其一例。藉由在樑6-1的側面設置往X軸方向延伸的導 引構件，藉由X軸驅動源，作成使可動部可以沿著此導 引構件移動。而且，在此可動部，經由Z軸驅動源，承載 可以往Z軸方向移動的攝像裝置3 0。作爲X軸驅動源， -12· 1261007 (11) 〔發明的效果〕 若根據本發明，藉由改良載台裝置中的底座和石製平 臺的構成，能夠提供一種不但滿足所要求的性能，且可以 製作出例如基板處理用之大型的載台裝置。這是由於：液 晶基板等的被處理物大型化的情況，對應該大型化，石製 平臺、底座也大型化，但是與習知的石製平臺的大型化相 比，本發明中石製平臺尺寸的增加較少便可以。 【圖式簡單說明】 第1圖係表示將本發明應用在表面型定位載台裝置中 的第1實施形態的圖；第1圖（a)係俯視圖、第1圖（b)係 側視圖。 第2圖係表示將本發明應用在檢查用載台裝置中的第 2實施形態的圖；第2圖（a)係俯視圖 '第2圖（b)係側視 圖。 第3圖係表示習知的表面型定位載台裝置的一例之 圖；第3圖（a)係俯視圖、第3圖（b)係側視圖。 【符號說明】 1 :架台 2、3 :導引構件 4、5、1 4 :移動體 6 、 6-1 :樑 -14- 1261007 (12) 2 0 :石製平臺 12、13、14a〜14c、15a〜15d、16:靜壓軸承襯墊 1 0 0 :底座 1 0 0 a :承接部1261007 (1) Technical Field of the Invention The present invention relates to a stage device, and particularly relates to a movable portion that is configured to move on at least one of an X-axis and a Y-axis on a stone platform. The stage device. [Prior Art] As an example of such a stage device, an X-Y stage device called a surface type positioning stage device will be described with reference to Fig. 3 . In Fig. 3, on the stone platform 10 fixed to the gantry 1, the two guide members 2, 3 are arranged to extend in the Y-axis direction in parallel with each other at a predetermined interval. The moving bodies 4, 5 are disposed on the guiding members 2, 3, respectively. The moving bodies 4'5' are moved along the guiding members 2, 3 by a linear motor driving method, respectively. Briefly, a magnet device consisting of a plurality of magnets, respectively, is mounted in the guiding members 2, 3 by a group ..... On the other hand, the moving bodies 4, 5 each have a movable coil that interacts with the magnet device. Thereby, the moving bodies 4, 5 can be slidably moved along the guiding members 2, 3, respectively. Further, in order to perform the positioning control, the moving bodies 4 and 5 are provided with measuring devices for measuring the position of the moving body I 4, which are described later, such as a ruler and a sensor, but since such a line motor including the measuring device itself is well known, Therefore, the detailed description is omitted. Here, focusing on the guiding member 2 and the moving body 4, as shown in Fig. 3(b), the moving body 4 has a cross-sectional U-shaped cross section across the guiding member 2; the inner surface thereof is provided with a hydrostatic bearing The pad 1 2 is interposed between the guiding member 2 and the -4- 1261007 (2) moving body 4. Thereby, the movement 'movement' of the moving body 4 along the guiding member 2 is smoothly performed. Further, on the bottom surface of the movable body 4, a static pressure bearing pad 13' is provided between the stone platform and the movable body 4. Thereby, the movement on the stone platform 1 移动 of the moving body 4 is smoothly performed. Similarly, the 'moving body 5' also has a hydrostatic bearing pad 12 and a hydrostatic bearing pad 13 . Further, in Fig. 3(a), a part of the upper portion of the moving body 4 is shown as being cut away. The moving body 4 and the moving body 5 are connected by a beam 6. The moving body 14 is disposed on the beam 6. The moving body 14 has the beam 6 as a guide and can be moved in the X-axis direction of Fig. 3(a). In Fig. 3(a), in order to facilitate 'the state in which the upper portion of the movable body 14 is cut away is shown. The moving body 14 is also moved by the above-described linear motor driving method. Therefore, the magnet device is assembled in the beam 6, and the moving body 14 has a movable coil that interacts with the magnet device. The moving body 14 has a cross-shaped U-shaped cross section across the beam 6; the inner surface thereof is provided with hydrostatic bearing pads 15a, 15b, 15 c., 15d between the beam 6 and the moving body 14. Further, the hydrostatic bearing pads 14a to 14c are attached to the bottom surface of the movable body 14. Thereby, the moving body 14 is made to be smoothly movable along the beam 6, and can be smoothly moved on the stone platform 1〇. Further, a hydrostatic bearing pad 16 is provided on the bottom surface of the beam 6, interposed between the beam 6 and the stone platform 10. Thereby, the beam 6 is made to smoothly move on the stone platform 1〇. Such a surface type positioning stage device is disclosed, for example, in the surface type positioning stage device of the patent document 1 261 007 (3), for example, when the liquid crystal exposure is mounted, the moving body 14 is configured to carry the object to be processed, that is, The machine that moves the substrate is particularly configured to have a function of holding the liquid crystal substrate by the absorbing machine. In short, the surface-type positioning stage device of the present invention is provided on the gantry 1 on which the mounting portion, the guiding portion, the driving portion of the movable portion, and the position of the movable portion are placed. Wait. Further, the movable portion is supported by floating the pressure bearing pad by the blowing of the compressed air, and moves on the stone platform 10 along the guiding portion. However, the surface of the stone platform 10 on which the hydrostatic bearing pad moves has a true flatness of several μm and is smoothly finished, but the range in which the static pressure pad moves, as shown in Fig. 3(a), is only Limited to a part of Shitai 10 comprehensive. On the other hand, in the case of a surface type positioning device for a liquid crystal exposure device, as the liquid crystal substrate is enlarged (the fifth generation substrate: xl 80 mm, the seventh generation substrate: 1 800 0 2 200 mm), The stone platform is shaped, and the fabrication of the stone platform of the integrated object becomes difficult. In other words, in the surface type positioning stage device used in the liquid crystal exposure apparatus, as the liquid crystal substrate to be exposed on the suction mechanism on the machine table is new, the substrate size is also increased. The composition of knowledge is likely to exceed the boundaries of production. [Patent Document 1] Japanese Laid-Open Patent Publication No. 2000-3 5 6693 (The static non-contact of the rock movable amount of the liquid crystal structure, etc., although the bearing flat stage 1500 is also greatly loaded by the generation. (4) SUMMARY OF THE INVENTION (Problems to be Solved by the Invention) An object of the present invention is to provide a stage device that improves the configuration of a stage device having a stone platform and satisfies not only the required performance but also A stage device suitable for increasing the size. (Means for Solving the Problem) According to the present invention, a stage device can be provided, wherein the movable portion is configured to be at least on the stone platform to at least the X-axis and the Y-axis. A stage device in which one of the directions moves is characterized in that the size of the stone platform is set to correspond to the size of the moving region of the movable portion, and the stone platform is fixed to a cast iron casting having a receiving portion. In the stage device according to the first aspect of the present invention, the base portion has the aforementioned receiving portion at a central portion thereof; On both sides, there are two guiding member installation portions extending in parallel to one of the X-axis and the Y-axis, and guiding members respectively extending in parallel with each other are provided in the two guiding member installation portions. Each of the two guiding members includes a first moving body that is movable along the guiding member, and connects the two first moving bodies by a beam extending in the other direction of the X-axis and the Y-axis. And the second movable body that is movable along the beam, the second movable body being configured as the movable portion, and movable on the stone platform in the X-axis direction and the Y-axis direction Further, in the stage device according to the first aspect of the present invention, the hydrostatic bearing pad of at least one of the first movable body and the guiding member is disposed in the second layer 1061. a first movable body; and a static bearing pad interposed between the first movable body and the stone platform, provided in the first movable body; and interposed between the second movable body and the beam At least one hydrostatic bearing pad between The second movable body; and a plurality of hydrostatic bearing pads interposed between the second movable body and the stone platform are provided in the second movable body. According to the second aspect of the present invention In the stage device, the base portion has the receiving portion at a central portion thereof, and two guiding member mounting portions extending in parallel with one of the X-axis and the Y-axis in parallel with each other; The two guide member installation portions are provided with guide members that extend in parallel with each other, and are provided with a movable body that is movable along the two guide members, and the movable body is formed as the movable portion. Further, in the direction of one of the X-axis and the Y-axis, in the stage device according to the second aspect of the present invention, at least one hydrostatic bearing lining interposed between the moving body and the guiding member The pad is provided on the aforementioned moving body. Further, in the stage device according to the second aspect of the present invention, the substrate to be processed is placed on the stone platform, and the moving body carries an inspection machine for inspecting or processing the substrate to be processed. Or processing machine. [Embodiment] A first embodiment in which the present invention is applied to a surface type positioning stage mount 8-2162007 (6) will be described with reference to Fig. 1. In Fig. 1, the same portions as those in Fig. 3 are denoted by the same reference numerals. This aspect has the following features. (1) Instead of the stone platform of the unitary body illustrated in Fig. 3, the frame 1 and the frame 1 are used, and a combination of the base 1 〇 〇 and the stone platform 2 。 is used. Base 1 〇 铸造 A cast product made of cast iron or a steel structure made of a square tube or a section steel, and a region corresponding to the moving region of the moving body 14 is formed into a notch structure. (2) Further, the notch portion of the base 100, that is, the portion corresponding to the moving area of the moving body 14 is provided with the stone platform 20. The surface of the stone platform 20 has a true flatness of several μm and is smoothly finished. Further, the level of the stone platform 20 is adjusted relative to the base 1〇〇. (3) The drive unit of the beam 6, that is, the linear motor or the guide, is disposed on the side of the base 100. (4) It is difficult to construct a stone platform having a unitary structure of the prior art; however, by such a configuration, the manufacture of such a stage device becomes possible. Hereinafter, the surface type positioning stage device according to the present embodiment will be described in detail. In Fig. 1, the stone platform 20 is placed on a receiving portion 10a for a stone platform formed in a base 100 made of a steel structure, and is horizontally corrected and fixed. The base 1 has an installation portion for providing a guide member on both sides of the receiving portion 100a. In this installation portion, the guide members 2, 3 are arranged to extend in parallel with each other in the Y-axis direction. The moving bodies 4, 5 are respectively moved by the linear motor driving method. That is, the magnet devices ', respectively composed of a plurality of magnets, are mounted in the guiding members 2, 3 by the group -9 - (7) 1261007. The moving bodies 4, 5 respectively have movable coils that interact with the magnet means. Thereby, the moving bodies 4, 5 can be slidably moved in the Y-axis direction along the guiding members 2, 3, respectively. Further, in order to position and control the "moving bodies 4, 5, a measuring device for measuring the position of the moving body 14, which will be described later, such as a ruler and a sensor", but since such a linear motor including the measuring device is well known, detailed description is omitted. Description. In the case of the guide member 2 and the moving body 4, as shown in Fig. 1(b), the moving body 4 has a cross-sectional shape which is approximately inverted u-shaped across the guiding member 2. On the inner surface of the movable body 4, one or more hydrostatic bearing pads 12' are provided between the guide member 2 and the movable body 4. The side surface of the guiding member 2 which becomes the guiding surface of the moving body 4 is of course also subjected to surface finishing. By this, the movement of the moving body 4 along the guiding member 2 is smoothly performed. Further, as shown in Fig. 1(b), one or more hydrostatic bearing pads 13 are provided on the bottom surface of the movable body 4 between the stone platform 20 and the movable body 4. Thereby, the movement on the stone platform 20 is smoothly performed. The above configuration is almost identical to the guide member 3 and the moving body 5. That is to say, the moving body 5 also has a hydrostatic bearing pad 12, 13°. Further, instead of the above-mentioned hydrostatic bearing pad, a so-called direct-coupling guide may be used instead of the movement described later. The same is true for the static bearing pads in the body 14. The moving body 4 and the moving body 5 are connected by a beam 6. The moving body 14 is disposed on the beam 6. The moving body 14 has the beam 6 as a guide and can be moved in the X-axis direction of Fig. 1(a). In Fig. 1(a), the square (8) 1261007 is shown in a state in which the upper portion of the movable body 14 is cut away. The moving body 14 is also moved by the above-described linear motor driving method. Therefore, the magnet device is assembled in the beam 6, and the moving body 14 has a movable coil that interacts with the magnet device. The moving body 14 has a cross-shaped U-shaped cross section across the beam 6; the inner surface thereof is provided with hydrostatic bearing pads 15a, 15b, 15c, 15d interposed between the beam 6 and the moving body 14. The hydrostatic bearing pads 14a, 14b, 14c are also disposed between the stone platform 20 and the moving body 14. That is, the hydrostatic bearing pads 14a to 14c are attached to the bottom surface of the moving body 14. The side surface of the beam 6 which becomes the guide surface of the moving body 14 is of course also subjected to surface finishing. Thereby, the moving body 14 is made to be smoothly movable along the beam 6 and can be smoothly moved on the stone platform 20. In other words, it is possible to move in the X-axis direction and the Y-axis direction. Further, a hydrostatic bearing pad 16 is provided on the bottom surface of the beam 6, between the beam 6 and the stone platform 20. Thereby, the beam 6 is made to be smoothly movable on the stone platform 20. In the above-described surface type positioning stage device, the moving body 14 is provided with a machine for carrying the object to be processed, or the moving body 14 itself is used as a machine. Further, when the object to be processed is a substrate-like object, the machine includes a suction mechanism constituted by a pressure reducing mechanism. Such a stage device is applied to, for example, a liquid crystal exposure device, but is not limited thereto, and can be applied to all stage devices that require an increase in size. Further, the above-described embodiment is a stage device in which the movable body 14 can move to both the X-axis and the Y-axis. However, the movable body 14 can be applied to only the X-axis and the Y-axis, which can be moved by one of the X-axis and the Y-axis. ) Stage device. In this case, a portion corresponding to the moving body 14 is fixed to the beam 6. Of course, there is no equivalent to the portion of the moving body 14 and the beam 6 itself may be used as a moving body. In this case, the portion 'composed of the moving bodies 4, 5 and the beam 6' may also be referred to as a moving body. The second embodiment of the present invention will be described with reference to Fig. 2 . According to the stage device of the second embodiment, an image pickup device for inspecting a substrate to be processed placed on a stone platform is used as an inspection stage device. In the second drawing, the same portions as those in Fig. 1 are denoted by the same reference numerals. This embodiment differs from the first embodiment in that a point at which the image pickup device 30 is carried on the beam 6-1 is added except that the substrate to be processed is placed on the stone platform 20. In this case, in order to hold the substrate to be processed, it is preferable to embed one or more absorbing mechanisms constituted by the pressure reducing mechanism in the stone platform 20. Further, the imaging device 30 is configured to be movable along the side surface of the beam 1 in the X-axis direction in the drawing and to move in the Z-axis direction perpendicular to the X-axis and the Y-axis. As a reason why the imaging device 30 can be moved in the Z-axis direction, for example, the imaging range can be made variable. The structure between the guiding member 2 and the moving body 4, the guiding member 3, and the moving body 5 may be exactly the same as in the first embodiment. Although a drive mechanism for making the movement in the X-axis and Y-axis directions is omitted in the drawing, an example thereof will be briefly described. By providing a guide member extending in the X-axis direction on the side surface of the beam 6-1, the X-axis drive source is used to move the movable portion along the guide member. Further, the movable portion carries the image pickup device 30 movable in the Z-axis direction via the Z-axis drive source. As an X-axis driving source, -12·1261007 (11) [Effects of the Invention] According to the present invention, by improving the configuration of the base and the stone platform in the stage device, it is possible to provide a performance that not only satisfies the required performance, but also For example, a large stage device for substrate processing can be produced. This is because the size of the object to be processed such as the liquid crystal substrate is increased, and the size of the stone platform and the base is also increased. However, the size of the stone platform in the present invention is larger than that of the conventional stone platform. The increase is less. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing a first embodiment in which the present invention is applied to a surface type positioning stage device; Fig. 1(a) is a plan view and Fig. 1(b) is a side view. Fig. 2 is a view showing a second embodiment in which the present invention is applied to an inspection stage device; and Fig. 2(a) is a plan view "second drawing (b) is a side view. Fig. 3 is a view showing an example of a conventional surface type positioning stage device; Fig. 3(a) is a plan view and Fig. 3(b) is a side view. [Description of Symbols] 1 : Stand 2, 3: Guide members 4, 5, 1 4: Moving body 6, 6-1: Beam-14-1261007 (12) 2 0: Stone platform 12, 13, 14a to 14c , 15a~15d, 16: Static pressure bearing pad 1 0 0 : Base 1 0 0 a : Receiving part
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