JPH03221336A - Movable stage device - Google Patents
Movable stage deviceInfo
- Publication number
- JPH03221336A JPH03221336A JP2014279A JP1427990A JPH03221336A JP H03221336 A JPH03221336 A JP H03221336A JP 2014279 A JP2014279 A JP 2014279A JP 1427990 A JP1427990 A JP 1427990A JP H03221336 A JPH03221336 A JP H03221336A
- Authority
- JP
- Japan
- Prior art keywords
- base
- stage
- movable
- movable part
- movable stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005484 gravity Effects 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 241000257465 Echinoidea Species 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Machine Tool Units (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Magnetic Bearings And Hydrostatic Bearings (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【発明の詳細な説明】
Ｅ産業上の利用分野］
本発明は、可動ステージ装置に関し、特に１次元方向あ
るいは、２次元平面内で対象物を高精度に移動させるこ
とのできるステージ装置の構造に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a movable stage device, and particularly to the structure of a stage device that can move an object with high precision in a one-dimensional direction or within a two-dimensional plane. .
［従来の技術］
半導体露光装置や超精密加工装置等において利用される
可動ステージ装置は、ステージの移動ガイド部の精度か
、ステージの運動精度、位置決め精度に大きく影響を与
える。したかって、ガイド装置としては非接触形のベア
リング装置と剛性の高いガイド構造体の組み合わせが多
く採用されている。[Prior Art] A movable stage device used in semiconductor exposure equipment, ultra-precision processing equipment, etc. has a large effect on the accuracy of the movement guide portion of the stage, the motion accuracy, and positioning accuracy of the stage. Therefore, a combination of a non-contact bearing device and a highly rigid guide structure is often used as a guide device.
第３図に、従来の１軸可動ステージ装置の例の外観を示
す。これは、剛性の高いカイトレール３■の周囲を囲む
ようにして担持された可動ステージ３２かガイドレール
３１上をＸ方向に移動するものである。可動ステージ３
２とカイトレール３１との間には図示しないエアベアリ
ング装置からの空気が吹き出されて可動ステージ３２に
浮上刃を与えて、摩擦のきわめて少ない滑り軸受けを構
成している。ステージ３２の移動は電磁気的駆動装置に
よるのか一般的である０通常このようなカイトレール３
１とステージ３２のとの組み合わせを２組並列に配置し
、両ステージ間を接続してＸ方向の可動ステージとする
。さらに、同じものをＸ方向可動ステージ上に、Ｘ方向
と直交するＹ方向に案内補遺体を向けて担持するとＸ−
Ｙ２次元平面可動ステージ装置となる。FIG. 3 shows the appearance of an example of a conventional uniaxial movable stage device. In this case, a movable stage 32 supported so as to surround a highly rigid kite rail 32 moves in the X direction on a guide rail 31. Movable stage 3
Air from an air bearing device (not shown) is blown between the movable stage 2 and the kite rail 31 to provide a floating blade to the movable stage 32, thereby forming a sliding bearing with extremely low friction. The movement of the stage 32 is generally performed by an electromagnetic drive device.
Two combinations of stage 1 and stage 32 are arranged in parallel, and both stages are connected to form a movable stage in the X direction. Furthermore, if the same thing is carried on an X-direction movable stage with the guide support body facing in the Y-direction perpendicular to the X-direction,
It becomes a Y2-dimensional plane movable stage device.
こ発明か解決しようとする課題］
第３図に示すような可動ステージ装置の構造では、可動
ステージ３２の重量により、カイトレール３１か歪む、
また、可動ステージ装置３１の位置によってカイトレー
ル３１の歪み量も変わる。Problems to be Solved by the Invention] In the structure of the movable stage device as shown in FIG. 3, the weight of the movable stage 32 causes the kite rail 31 to become distorted.
Further, the amount of distortion of the kite rail 31 also changes depending on the position of the movable stage device 31.
この歪みを少なくするためには、カイトレール３１の剛
性を高める必要かあるか、そうするとガイドレールか大
型化、し、それにつれて可動ステージまでも大型化せざ
るをえなくなる。これは可動ステージの運動性を低下さ
せるので、高速で高精度なステージ装置か得られなくな
る。In order to reduce this distortion, is it necessary to increase the rigidity of the kite rail 31? If so, the guide rail will have to be enlarged, and the movable stage will also have to be enlarged accordingly. This reduces the mobility of the movable stage, making it impossible to obtain a high-speed and highly accurate stage device.
さらに、可動ステージ３２を垂直（重力）方向移動に使
用する場合には、ガイドレール３１も垂直に立てられる
。この場合、ステージ３２の重心と支持点とがずれるの
で、重量によりステージ３２か傾きカイトレール３１が
変形する。この傾きと変形は、ステージ３１に対してＹ
ｌｌｌｌまわりのローリングとＸ軸まわりのピッチング
等の運動誤差を生じせしめ、これが位置決め精度を劣化
させる原因となる。Furthermore, when the movable stage 32 is used for vertical (gravity) direction movement, the guide rail 31 is also erected vertically. In this case, since the center of gravity of the stage 32 and the support point are shifted, the stage 32 or the tilted kite rail 31 is deformed due to the weight. This tilt and deformation is caused by Y
This causes motion errors such as rolling around lllll and pitching around the X axis, which causes deterioration in positioning accuracy.
本発明の目的は装置を大型化することなく、可動ステー
ジの運動性を向上させ、垂直移動ステージ装置の場合で
も位置決め精度の高い可動ステージ装置を提供すること
である。An object of the present invention is to provide a movable stage device that improves the mobility of the movable stage without increasing the size of the device and has high positioning accuracy even in the case of a vertically movable stage device.
′Ｌ課題を解決するための手段］
本発明の垂直可動ステージ装置においては、カイトレー
ルを構成する一対のベースが可動ステージを挟み込む構
造を有する。Means for Solving Problem 'L] The vertical movable stage device of the present invention has a structure in which a pair of bases forming a kite rail sandwich the movable stage.
本発明の可動ステージ装置の構成は、表面を有する第１
のベース部材と、第１のベース部材の表面と所定間隙を
置いて平行に対向する表面を有する第２のベース部材と
、第１と第２のベース部材の間隙で挟持され、第１と第
２のベース部材に対し非接触で相対移動か可能な可動部
とを含む。The configuration of the movable stage device of the present invention includes a first stage device having a surface.
a second base member having a surface facing parallel to the surface of the first base member with a predetermined gap therebetween; and a movable part that can move relative to the base member of No. 2 without contacting it.
「作用」
第１と第２のベース部材の間隙中で非接触で支持され、
可動部は間隙中を移動する。ベースは支柱状のカイトレ
ールとは異なり平面体であるため容易に剛性か高くでき
、可動部の重量が与えられても実質的に変形は起こらな
い、さらに二つのベースか可動部を挟み込む構成である
ので、垂直可動ステージの場合でも、可動部の重量によ
るモーメントの発生か起こりに＜＜、あっても可動部重
量増化を引きおこすことなく、ベースに十分な強度を与
えることかできるので、ベースの変形か起きない。"Function" Supported without contact in the gap between the first and second base members,
The movable part moves through the gap. Since the base is a flat body unlike the pillar-shaped kite rail, it can easily be made to have high rigidity, and virtually no deformation occurs even when the weight of the moving part is applied.Furthermore, it can be constructed by sandwiching the moving part between two bases. Therefore, even in the case of a vertically movable stage, even if a moment is generated due to the weight of the movable part, it is possible to provide sufficient strength to the base without causing an increase in the weight of the movable part. Deformation does not occur.
Ｅ実施例］
第１図は、本発明における可動ステージ装置の断面図で
ある。第１のベース１１はその表面１２か精密加工仕上
げされ、高い平面度を有する剛性の高い定盤である。第
２のベース１３はその表面１４が精密加工仕上げされ、
高い平面度を有する剛性の高い定盤である０表面１２と
１４とは平行に所定間隙を保って対向するように、支持
体１５で結合されている。ベース１１．１３の材料は剛
性の高いものが選ばれるが、鉄のような磁性体にかぎら
ない、セラミックスも比剛性が高く、しかも加工精度が
高いので好ましル）材料である。E Example] FIG. 1 is a sectional view of a movable stage device in the present invention. The first base 11 is a highly rigid surface plate whose surface 12 is precision-machined and has a high degree of flatness. The surface 14 of the second base 13 is finished with precision processing,
Surfaces 12 and 14, which are highly rigid surface plates with high flatness, are connected by a support 15 so as to face each other in parallel with a predetermined gap. The material for the bases 11 and 13 is selected to have high rigidity, but is not limited to magnetic materials such as iron; ceramics are also preferred materials because they have high specific rigidity and high processing accuracy.
第１と第２のベース１１．１３の平面１２．１４に挟ま
れるように可動ステージ部材１６が配置される。平面１
２．１４と対向するステージ部材１６の両面は精密加工
仕上げされ、高い平面度と平行度を有する。ステージ部
材１６の各面とベース１１．１３の平面１２．１４との
間には間隙１７か設けられる０間隙１７には図示しない
空気供給装置よりベース１１．１３に設けた空気孔（図
示せす）を介して空気が吹き付けられ空気膜か構成され
る４間隙１７の空気膜は、ステージ１６の滑り軸受け、
すなわちエアーベアリングとして機能する。したかって
、ステージ部材１６は第１と第２のベース１１．１３と
空気膜１７とによって非接触で案内支持されて平面１２
．１４間を移動できる。移動装置としてはりニアモータ
のように電磁駆動手段を用いるとよい、空気膜１７の間
隔は、ステージ負荷の大きさや、空気膜１７に要求され
る剛性等を考慮して決定される。A movable stage member 16 is arranged between the planes 12.14 of the first and second bases 11.13. Plane 1
Both surfaces of the stage member 16 facing 2.14 are precision machined and finished, and have high flatness and parallelism. A gap 17 is provided between each surface of the stage member 16 and a flat surface 12.14 of the base 11.13.In the gap 17, an air hole (not shown) provided in the base 11.13 is provided by an air supply device (not shown). ) The air film of the four gaps 17 formed by air being blown through the slide bearing of the stage 16,
In other words, it functions as an air bearing. Therefore, the stage member 16 is guided and supported by the first and second bases 11.13 and the air film 17 in a non-contact manner, and is positioned on the plane 12.
．． You can move between 14 spaces. It is preferable to use an electromagnetic drive means such as a linear motor as the moving device.The interval between the air films 17 is determined by taking into consideration the magnitude of the stage load, the rigidity required of the air film 17, and the like.
ステージ部材１６の運動精度は、ベース１１１３の表面
加工精度及び剛性に依存する。空気膜１７による非接触
支持案内の場合、ベース１１゜１３に表面荒さかあって
も、空気膜は自由に外形を変形できるので、微少な変形
は空気膜１７が吸収し、はぼその荒さの平均値によって
運動が支配される。セラミックスのベースと空気膜によ
る軸受けの組み合わせによって、例として０．０５μｍ
／１００ｍｍの真直精度が得られる。The motion accuracy of the stage member 16 depends on the surface processing accuracy and rigidity of the base 1113. In the case of non-contact support and guidance using the air film 17, even if the bases 11 and 13 have surface roughness, the air film can freely deform its outer shape, so the air film 17 absorbs the minute deformation and reduces the roughness of the surface. Movement is governed by the average value. For example, 0.05μm due to the combination of ceramic base and air film bearing.
A straightness accuracy of /100 mm can be obtained.
さらに、ベース１．１．１３の剛性を高めるためにベー
ス１１．１３を大きくすることは平面構造であるので非
常に容易であり、しかも、それによって、ステージ部材
１６の大きさを変える必要はなく、可動ステージ部材１
６の運動性は損なわれることはない。Furthermore, it is very easy to increase the size of the base 11.13 in order to increase the rigidity of the base 1.1.13 since it has a planar structure, and there is no need to change the size of the stage member 16. , movable stage member 1
6's mobility is not impaired.
非接触案内支持の方法として、空気膜によるエアーベア
リング手段の他に、磁石の反発力を利用するものが使用
できる。この場合には、ベース１１．１３の平面１２．
１４とステージ部材１６の表面とは磁性体で作られる。As a non-contact guiding support method, in addition to air bearing means using an air film, methods that utilize the repulsive force of magnets can be used. In this case, the plane 12. of the base 11.13.
14 and the surfaces of the stage member 16 are made of magnetic material.
そして、各平面１２゜１４とステージ部材１６の表面で
は同極性の磁極か対向するように磁石が取り付けられる
。この磁石は永久磁石でも電磁石でもよい。Magnets are attached to each plane 12° 14 and the surface of the stage member 16 so that magnetic poles of the same polarity face each other. This magnet may be a permanent magnet or an electromagnet.
次に、第１図の可動ステージ装置を半導体露光装置のア
ライナ−用ステージ装置に適用した例を第２図を参照し
て説明する。第１のベース２１はその表１ｆｉ２２か精
密加工仕上げされ、高い平面度を有する剛性の高いセラ
ミックス定盤である。第２のベース２３はその表面２４
か精密加工仕上げされ−高い平面度を有するセラミック
ス定盤である。平面２２と２４とは平行に所定間隔を保
って対向するように、支持体２５で結合される。Next, an example in which the movable stage apparatus of FIG. 1 is applied to an aligner stage apparatus of a semiconductor exposure apparatus will be described with reference to FIG. 2. The first base 21 is a highly rigid ceramic surface plate that has been precisely machined and finished with high flatness. The second base 23 has its surface 24
It is a precision-machined ceramic surface plate with high flatness. The planes 22 and 24 are connected by a support 25 so as to be parallel to each other and face each other at a predetermined distance.
第１と第２のベース２１．２３の平面２２．２４に挟ま
れるように可動ステージ部材２６が配置される。平面２
２．２４と対向するステージ部材２６の両面は精密加工
仕上げされ、高い平面度と平行度を有する。ステージ部
材２６の各面とベース２１．２３の平面２２．２４との
間には図示しない空気供給装置により空気膜２７が形成
される。The movable stage member 26 is arranged so as to be sandwiched between the planes 22.24 of the first and second bases 21.23. Plane 2
Both surfaces of the stage member 26 facing 2.24 are precision machined and finished, and have high flatness and parallelism. An air film 27 is formed between each surface of the stage member 26 and the flat surface 22.24 of the base 21.23 by an air supply device (not shown).
空気膜２７は、ステージ部材２６のエアーベアリングと
して機能する。したがって、ステージ部材２６は第１と
第２のベース２１．２３と空気膜２７とによって非接触
で案内支持されて平面２２゜２４間を移動できる。移動
装置としてはりニアモータのような電磁駆動手段を用い
るとよい。The air film 27 functions as an air bearing for the stage member 26. Therefore, the stage member 26 is guided and supported by the first and second bases 21.23 and the air film 27 in a non-contact manner and can move between the planes 22.degree. 24. It is preferable to use an electromagnetic drive means such as a beam near motor as the moving device.
第２のベース２３の中央部には露光用の光を通過させる
ための開孔部２８か設けられる。開孔部２８にはマスク
ステージ２つか配設される。マスクステージ２９にはパ
ターンか描かれたマスク４０が置かれる。An opening 28 is provided in the center of the second base 23 to allow exposure light to pass therethrough. Two mask stages are arranged in the opening 28. A mask 40 with a pattern drawn thereon is placed on the mask stage 29.
ステージ部材２６には四部４１が設けられる。The stage member 26 is provided with four parts 41.
凹部４１のほぼ中央部にはウニハラチャフ４２が配置さ
れ、その上にウェハ４３が固定される０図示しない移動
装置によりステージ部材２６か移動せしめられマスク４
０とのアライメントがなされる９図では水平方向の移動
で示されているが、もちろん、垂直方向の移動でも使用
できる。ＳＯＲ光を利用したＸ線露光装置のステージの
場合は、垂直型ステージとなろう、移動精度を上げるた
めに可動部を大型化する必要はなく、一対のガイド部材
の剛性等を向上すればよい。A sea urchin chaff 42 is arranged approximately in the center of the recess 41, and a wafer 43 is fixed thereon.The stage member 26 is moved by a moving device (not shown) and the mask 4 is moved.
In FIG. 9, where alignment with 0 is performed, horizontal movement is shown, but of course vertical movement can also be used. In the case of a stage for an X-ray exposure device that uses SOR light, it will be a vertical stage, and there is no need to increase the size of the movable part in order to improve movement accuracy; it is only necessary to improve the rigidity of the pair of guide members. .
以上を実施例に沿って、本発明を説明したが、本発明は
これらに制限されるものではない６また、以上に説明し
た実施例に基づいて、種々の変更、改良、組み合わせ等
が可能なことは当業者に自明であろう。Although the present invention has been described above in accordance with the examples, the present invention is not limited to these.6 Furthermore, various changes, improvements, combinations, etc. can be made based on the examples described above. This will be obvious to those skilled in the art.
′Ｌ発明の効果１
つの平面ベースによりステージか挟まれ、ベース平面と
ステージ間は非接触支持されてステージか案内されるた
め、ベースの剛性を高くするためにステージを大型にす
る必要はない、特に、垂直可動ステージの場合に、ステ
ージの重量によるモーメントの発生かあっても充分ベー
スに強度を与えることかでき、ベースの変形を防止でき
る。Effects of the Invention 1 The stage is sandwiched between the flat bases, and the stage is guided with non-contact support between the base plane and the stage, so there is no need to make the stage large in order to increase the rigidity of the base. Particularly in the case of a vertically movable stage, sufficient strength can be given to the base even if a moment is generated due to the weight of the stage, and deformation of the base can be prevented.
第１図は本発明の実線例による可動ステージ装置の断面
図、
第２図は本発明の可動ステージ装置を半導体Ｘ線露光装
置に適用した場合の断面図、
第３図は従来の可動ステージ装置の外観図である。
図において、
１１ １３ ２１ ２３ ベース
１２、 １４
２
４
ベース表面
１５ 。
１６゜
７
８
９
０
１
２
３
６
７
２
支持体
ステージ部材
空気膜
開孔部
マスクステージ
マスク
凹部
ウェハチャック
ウェハFIG. 1 is a sectional view of a movable stage device according to a solid line example of the present invention, FIG. 2 is a sectional view of a movable stage device of the present invention applied to a semiconductor X-ray exposure device, and FIG. 3 is a conventional movable stage device. FIG. In the figure: 11 13 21 23 base 12, 14 24 base surface 15. 16゜7 8 9 0 1 2 3 6 7 2 Support Stage member Air membrane Opening portion Mask Stage Mask Recess Wafer Chuck Wafer
Claims (4)
行に対向する表面を有する第２のベース部材と、 前記第１と第２のベース部材の前記間隙で挟持され、前
記第１と第２のベース部材に対し非接触で相対移動が可
能な可動部と を有する可動ステージ装置。(1) a first base member having a surface; a second base member having a surface facing parallel to the surface of the first base member with a predetermined gap therebetween; and the first and second bases. A movable stage device having a movable part that is held between the members and is movable relative to the first and second base members in a non-contact manner.
表面との間に空気膜を形成するエアーベアリング手段を
有する請求項１記載の可動ステージ装置。(2) The movable stage device according to claim 1, wherein the movable portion includes air bearing means for forming an air film between the surfaces of the first and second base members.
表面との間で磁気的反発力を発生する磁石手段を有する
請求項１記載の可動ステージ装置。(3) The movable stage device according to claim 1, wherein the movable portion includes magnet means for generating magnetic repulsion between the surfaces of the first and second base members.
平行になるように配設される請求項１から３のいずれか
記載の可動ステージ。(4) The movable stage according to any one of claims 1 to 3, wherein the stage device is arranged so that the base surface is parallel to the direction of gravity.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014279A JP2780837B2 (en) | 1990-01-24 | 1990-01-24 | Movable stage device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014279A JP2780837B2 (en) | 1990-01-24 | 1990-01-24 | Movable stage device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03221336A true JPH03221336A (en) | 1991-09-30 |
| JP2780837B2 JP2780837B2 (en) | 1998-07-30 |
Family
ID=11856654
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014279A Expired - Fee Related JP2780837B2 (en) | 1990-01-24 | 1990-01-24 | Movable stage device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2780837B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001045145A1 (en) * | 1999-12-16 | 2001-06-21 | Nikon Corporation | Exposure method and exposure apparatus |
| JP2002361852A (en) * | 2001-06-07 | 2002-12-18 | Dainippon Printing Co Ltd | Pattern forming apparatus |
| JP2003133254A (en) * | 2001-08-10 | 2003-05-09 | Semiconductor Energy Lab Co Ltd | Laser annealing device and manufacturing method of thin film transistor using the same |
| KR100428003B1 (en) * | 2000-06-23 | 2004-05-04 | 캐논 가부시끼가이샤 | Moving mechanism in exposure apparatus, and exposure apparatus having the same |
| JP2009164637A (en) * | 2001-08-10 | 2009-07-23 | Semiconductor Energy Lab Co Ltd | Semiconductor device manufacturing method and laser irradiation device |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100346924C (en) * | 2005-10-19 | 2007-11-07 | 潘旭华 | Assemblied guide rail and its manufacturing method |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60207165A (en) * | 1984-03-31 | 1985-10-18 | Toshiba Electric Equip Corp | Power unit for copying machine bias |
| JPS6237514A (en) * | 1985-08-10 | 1987-02-18 | Omron Tateisi Electronics Co | Static pressure bearing device |
| JPS62207165A (en) * | 1986-03-06 | 1987-09-11 | Omron Tateisi Electronics Co | Two-dimensional actuator |
-
1990
- 1990-01-24 JP JP2014279A patent/JP2780837B2/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60207165A (en) * | 1984-03-31 | 1985-10-18 | Toshiba Electric Equip Corp | Power unit for copying machine bias |
| JPS6237514A (en) * | 1985-08-10 | 1987-02-18 | Omron Tateisi Electronics Co | Static pressure bearing device |
| JPS62207165A (en) * | 1986-03-06 | 1987-09-11 | Omron Tateisi Electronics Co | Two-dimensional actuator |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001045145A1 (en) * | 1999-12-16 | 2001-06-21 | Nikon Corporation | Exposure method and exposure apparatus |
| US6937319B2 (en) | 1999-12-16 | 2005-08-30 | Nikon Corporation | Exposure method and apparatus with vibration-preventative control |
| KR100428003B1 (en) * | 2000-06-23 | 2004-05-04 | 캐논 가부시끼가이샤 | Moving mechanism in exposure apparatus, and exposure apparatus having the same |
| JP2002361852A (en) * | 2001-06-07 | 2002-12-18 | Dainippon Printing Co Ltd | Pattern forming apparatus |
| JP2003133254A (en) * | 2001-08-10 | 2003-05-09 | Semiconductor Energy Lab Co Ltd | Laser annealing device and manufacturing method of thin film transistor using the same |
| JP2009164637A (en) * | 2001-08-10 | 2009-07-23 | Semiconductor Energy Lab Co Ltd | Semiconductor device manufacturing method and laser irradiation device |
| US7863541B2 (en) | 2001-08-10 | 2011-01-04 | Semiconductor Energy Laboratory Co., Ltd. | Laser annealing apparatus and semiconductor device manufacturing method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2780837B2 (en) | 1998-07-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| USRE41232E1 (en) | Wafer positioner with planar motor and mag-lev fine stage | |
| US6353271B1 (en) | Extreme-UV scanning wafer and reticle stages | |
| US6989889B2 (en) | Method, system, and apparatus for management of reaction loads in a lithography system | |
| JP3325077B2 (en) | Electromagnetic alignment device | |
| WO2005090902A1 (en) | Stage device | |
| US6724466B2 (en) | Stage assembly including a damping assembly | |
| JPS607726A (en) | Electromagnetic aligning device | |
| TW201126641A (en) | Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method | |
| US20170090303A1 (en) | Methods and apparatus for vibration damping stage | |
| US9823587B2 (en) | Lithography apparatus, stage apparatus, and method of manufacturing articles | |
| US20030173833A1 (en) | Wafer stage with magnetic bearings | |
| JPS6320014B2 (en) | ||
| JP2005079368A (en) | Magnetic levitating stage system and exposure device | |
| JPH03221336A (en) | Movable stage device | |
| KR102151930B1 (en) | Exposure device, method for manufacturing flat panel display, and method for manufacturing device | |
| JP4962779B2 (en) | STAGE DEVICE, FLOAT CONTROL METHOD, AND EXPOSURE DEVICE USING STAGE DEVICE | |
| JPH03135360A (en) | Linear motor | |
| TW200425164A (en) | X-Y axis stage device | |
| JP4407774B2 (en) | MOTOR DEVICE, MOTOR DEVICE ASSEMBLY METHOD, AND EXPOSURE DEVICE | |
| JP2706184B2 (en) | Movable stage device | |
| JP2837716B2 (en) | Vertical movable bearing device and vertical movable stage device using the same | |
| JPH09320955A (en) | Drive unit and stage device | |
| CN107664920B (en) | Electromagnetism track-type facilities | |
| TW200426854A (en) | Stage device | |
| JP2002057206A (en) | Stage apparatus and aligner system |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |