TW200416824A - Exposure device and exposure method - Google Patents

Exposure device and exposure method Download PDF

Info

Publication number
TW200416824A
TW200416824A TW092132868A TW92132868A TW200416824A TW 200416824 A TW200416824 A TW 200416824A TW 092132868 A TW092132868 A TW 092132868A TW 92132868 A TW92132868 A TW 92132868A TW 200416824 A TW200416824 A TW 200416824A
Authority
TW
Taiwan
Prior art keywords
light
light source
solid
exposure device
scope
Prior art date
Application number
TW092132868A
Other languages
English (en)
Chinese (zh)
Inventor
Motoo Koyama
Masashi Tanaka
Kazuyuki Kato
Michio Noboru
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200416824A publication Critical patent/TW200416824A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0009—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
    • G02B19/0014—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only at least one surface having optical power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G02B19/0061—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a LED
    • G02B19/0066—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a LED in the form of an LED array
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW092132868A 2002-11-25 2003-11-24 Exposure device and exposure method TW200416824A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002341545 2002-11-25
JP2003065646 2003-03-11
JP2003133190A JP2004335953A (ja) 2002-11-25 2003-05-12 露光装置及び露光方法

Publications (1)

Publication Number Publication Date
TW200416824A true TW200416824A (en) 2004-09-01

Family

ID=32397747

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092132868A TW200416824A (en) 2002-11-25 2003-11-24 Exposure device and exposure method

Country Status (5)

Country Link
JP (1) JP2004335953A (ja)
KR (1) KR20050086755A (ja)
AU (1) AU2003284659A1 (ja)
TW (1) TW200416824A (ja)
WO (1) WO2004049410A1 (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4938069B2 (ja) * 2004-03-31 2012-05-23 日立ビアメカニクス株式会社 パターン露光方法およびパターン露光装置
JP2006019412A (ja) * 2004-06-30 2006-01-19 Canon Inc 露光装置及びデバイスの製造方法
JP4771753B2 (ja) * 2005-06-08 2011-09-14 新光電気工業株式会社 面光源制御装置および面光源制御方法
JP2009302225A (ja) * 2008-06-12 2009-12-24 Nikon Corp ライトガイド、照明装置、露光装置及びデバイス製造方法
JP5245775B2 (ja) * 2008-12-04 2013-07-24 株式会社ニコン 照明装置、露光装置、及びデバイス製造方法
KR101322737B1 (ko) 2011-12-21 2013-10-29 마이다스시스템주식회사 자외선 엘이디 모듈 탑재 마스크 얼라이너
JP6866565B2 (ja) 2016-01-20 2021-04-28 ウシオ電機株式会社 光源装置
JP6746934B2 (ja) * 2016-02-08 2020-08-26 ウシオ電機株式会社 光源装置
KR102139719B1 (ko) * 2019-09-09 2020-08-12 주식회사 투에이치앤엠 디스플레이 패널의 uv 노광에 대한 영향 평가장치
JP2024048111A (ja) 2022-09-27 2024-04-08 ウシオ電機株式会社 光源装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08334803A (ja) * 1995-06-07 1996-12-17 Nikon Corp 紫外レーザー光源
JPH09179309A (ja) * 1995-12-26 1997-07-11 Sony Corp 露光照明装置
JP4649717B2 (ja) * 1999-10-01 2011-03-16 株式会社ニコン 露光方法及び露光装置、デバイス製造方法
JP2002303988A (ja) * 2001-04-03 2002-10-18 Nippon Telegr & Teleph Corp <Ntt> 露光装置
JP2002318364A (ja) * 2001-04-20 2002-10-31 Ricoh Co Ltd 照明装置
JP4546019B2 (ja) * 2002-07-03 2010-09-15 株式会社日立製作所 露光装置

Also Published As

Publication number Publication date
JP2004335953A (ja) 2004-11-25
KR20050086755A (ko) 2005-08-30
AU2003284659A1 (en) 2004-06-18
WO2004049410A1 (ja) 2004-06-10

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