TR201820566T4 - Güçlü asitlerin veya güçlü asidik ortamların iki veya daha yüksek değerlikli metal iyonlarından arındırılmasına yönelik yöntem. - Google Patents

Güçlü asitlerin veya güçlü asidik ortamların iki veya daha yüksek değerlikli metal iyonlarından arındırılmasına yönelik yöntem. Download PDF

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Publication number
TR201820566T4
TR201820566T4 TR2018/20566T TR201820566T TR201820566T4 TR 201820566 T4 TR201820566 T4 TR 201820566T4 TR 2018/20566 T TR2018/20566 T TR 2018/20566T TR 201820566 T TR201820566 T TR 201820566T TR 201820566 T4 TR201820566 T4 TR 201820566T4
Authority
TR
Turkey
Prior art keywords
purification
metal ions
double
strong acids
strongly acidic
Prior art date
Application number
TR2018/20566T
Other languages
English (en)
Inventor
Panz Christian
Paulat Florian
Titz Guido
Muller Sven
Erlhofer Peter
Ruf Markus
Frings Bodo
Rauleder Hartwig
Barthel Thomas
Siray Mustafa
Behnisch Jurgen
Original Assignee
Evonik Degussa Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Evonik Degussa Gmbh filed Critical Evonik Degussa Gmbh
Publication of TR201820566T4 publication Critical patent/TR201820566T4/tr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/126—Preparation of silica of undetermined type
    • C01B33/128—Preparation of silica of undetermined type by acidic treatment of aqueous silicate solutions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J39/00—Cation exchange; Use of material as cation exchangers; Treatment of material for improving the cation exchange properties
    • B01J39/04—Processes using organic exchangers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J39/00—Cation exchange; Use of material as cation exchangers; Treatment of material for improving the cation exchange properties
    • B01J39/08—Use of material as cation exchangers; Treatment of material for improving the cation exchange properties
    • B01J39/16—Organic material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J39/00—Cation exchange; Use of material as cation exchangers; Treatment of material for improving the cation exchange properties
    • B01J39/08—Use of material as cation exchangers; Treatment of material for improving the cation exchange properties
    • B01J39/16—Organic material
    • B01J39/18—Macromolecular compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J49/00—Regeneration or reactivation of ion-exchangers; Apparatus therefor
    • B01J49/50—Regeneration or reactivation of ion-exchangers; Apparatus therefor characterised by the regeneration reagents
    • B01J49/53—Regeneration or reactivation of ion-exchangers; Apparatus therefor characterised by the regeneration reagents for cationic exchangers
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/187—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
    • C01B33/193—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates of aqueous solutions of silicates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Silicates, Zeolites, And Molecular Sieves (AREA)
  • Treatment Of Water By Ion Exchange (AREA)

Abstract

Mevcut buluş, yüksek saflıkta silisyum dioksit üretimi kapsamında kullanılabilen, güçlü asitlerin veya güçlü asidik ortamların iki veya daha yüksek değerlikli metal iyonlarından arındırılmasına yönelik yöntem ile ilgilidir. Ayrıca buluş, buluşa göre yöntemin gerçekleştirilmesine yönelik özel iyon değiştiricilerin kullanımı ve bu şekilde elde edilen yüksek saflıkta silisyum dioksitler ile ilgilidir.
TR2018/20566T 2011-02-22 2012-02-10 Güçlü asitlerin veya güçlü asidik ortamların iki veya daha yüksek değerlikli metal iyonlarından arındırılmasına yönelik yöntem. TR201820566T4 (tr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102011004533A DE102011004533A1 (de) 2011-02-22 2011-02-22 Verfahren zur Reinigung starker Säuren bzw. stark saurer Medien von zwei- und höherwertigen Metallionen

Publications (1)

Publication Number Publication Date
TR201820566T4 true TR201820566T4 (tr) 2019-01-21

Family

ID=45722608

Family Applications (1)

Application Number Title Priority Date Filing Date
TR2018/20566T TR201820566T4 (tr) 2011-02-22 2012-02-10 Güçlü asitlerin veya güçlü asidik ortamların iki veya daha yüksek değerlikli metal iyonlarından arındırılmasına yönelik yöntem.

Country Status (11)

Country Link
US (2) US20140079620A1 (tr)
EP (1) EP2678272B1 (tr)
JP (1) JP2014515718A (tr)
KR (1) KR101933728B1 (tr)
CN (1) CN103402916B (tr)
CA (1) CA2828030C (tr)
DE (1) DE102011004533A1 (tr)
ES (1) ES2705173T3 (tr)
TR (1) TR201820566T4 (tr)
TW (1) TWI537211B (tr)
WO (1) WO2012113657A1 (tr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011004533A1 (de) 2011-02-22 2013-05-16 Evonik Degussa Gmbh Verfahren zur Reinigung starker Säuren bzw. stark saurer Medien von zwei- und höherwertigen Metallionen
KR20140010953A (ko) 2011-02-22 2014-01-27 에보니크 데구사 게엠베하 알칼리 금속 실리케이트 용액으로부터의 고순도의 수성 콜로이드 실리카졸의 제조 방법
DE102012218815A1 (de) * 2012-10-16 2014-04-17 Evonik Industries Ag Verfahren zur Reinigung von Phosphonsäure- bzw. Phosphonatgruppen enthaltenden Verbindungen
CN113370365B (zh) 2015-06-29 2022-07-12 康宁股份有限公司 生产线、方法、以及烧结制品
US10766165B2 (en) * 2015-06-29 2020-09-08 Corning Incorporated Manufacturing line, process, and sintered article
US10486332B2 (en) 2015-06-29 2019-11-26 Corning Incorporated Manufacturing system, process, article, and furnace
US10690858B2 (en) 2018-02-28 2020-06-23 Corning Incorporated Evanescent optical couplers employing polymer-clad fibers and tapered ion-exchanged optical waveguides
CN108975556B (zh) * 2018-08-08 2021-07-30 昆山尚道源环境技术有限公司 净化回收老化磷酸抛光液的方法
US10585242B1 (en) 2018-09-28 2020-03-10 Corning Research & Development Corporation Channel waveguides with bend compensation for low-loss optical transmission
US11342649B2 (en) 2019-09-03 2022-05-24 Corning Incorporated Flexible waveguides having a ceramic core surrounded by a lower dielectric constant cladding for terahertz applications
CN114455596B (zh) * 2022-01-22 2024-02-20 江西双龙硅材料科技有限公司 一种硅橡胶领域用白炭黑及其生产工艺
WO2023180174A1 (de) 2022-03-22 2023-09-28 Lanxess Deutschland Gmbh Verfahren zur elution von aluminium- und/oder zinkionen
CN116002691A (zh) * 2022-12-01 2023-04-25 航天特种材料及工艺技术研究所 一种去除硅酸中高价金属离子杂质的方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2934863A1 (de) * 1979-08-29 1981-04-09 Tetra Werke Dr.Rer.Nat. Ulrich Baensch Gmbh, 4520 Melle Verfahren zur regenerierung von ionenaustauschern
JPH0796447B2 (ja) * 1986-06-13 1995-10-18 モ−ゼス レイク インダストリ−ズ インコ−ポレイテツド 高純度シリカの製造方法
TW593674B (en) * 1999-09-14 2004-06-21 Jsr Corp Cleaning agent for semiconductor parts and method for cleaning semiconductor parts
KR100477676B1 (ko) 1999-11-17 2005-03-18 악조 노벨 엔.브이. 실리카졸 제조방법
CA2646180A1 (en) 2006-03-15 2007-09-20 Reaction Sciences, Inc. Method for making silicon for solar cells and other applications
US20110236288A1 (en) 2008-09-30 2011-09-29 Christian Panz Method for producing high-purity sio2 from silicate solutions
DE102011004533A1 (de) 2011-02-22 2013-05-16 Evonik Degussa Gmbh Verfahren zur Reinigung starker Säuren bzw. stark saurer Medien von zwei- und höherwertigen Metallionen

Also Published As

Publication number Publication date
WO2012113657A1 (de) 2012-08-30
CA2828030A1 (en) 2012-08-30
EP2678272B1 (de) 2018-10-17
US10106426B2 (en) 2018-10-23
JP2014515718A (ja) 2014-07-03
KR20140006951A (ko) 2014-01-16
CA2828030C (en) 2020-03-24
CN103402916A (zh) 2013-11-20
CN103402916B (zh) 2015-05-13
DE102011004533A1 (de) 2013-05-16
TWI537211B (zh) 2016-06-11
TW201247539A (en) 2012-12-01
ES2705173T3 (es) 2019-03-22
US20160207785A1 (en) 2016-07-21
US20140079620A1 (en) 2014-03-20
KR101933728B1 (ko) 2018-12-28
EP2678272A1 (de) 2014-01-01

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