SU1142733A1 - Устройство дл автоматического контрол фотошаблонов - Google Patents
Устройство дл автоматического контрол фотошаблонов Download PDFInfo
- Publication number
- SU1142733A1 SU1142733A1 SU807771388A SU7771388A SU1142733A1 SU 1142733 A1 SU1142733 A1 SU 1142733A1 SU 807771388 A SU807771388 A SU 807771388A SU 7771388 A SU7771388 A SU 7771388A SU 1142733 A1 SU1142733 A1 SU 1142733A1
- Authority
- SU
- USSR - Soviet Union
- Prior art keywords
- photomask
- photosensors
- photo
- lines
- image
- Prior art date
Links
- 230000007547 defect Effects 0.000 claims abstract description 8
- 230000003287 optical effect Effects 0.000 claims description 9
- 239000011521 glass Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 description 2
- 238000003491 array Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001093 holography Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DD21623879A DD146500A1 (de) | 1979-10-16 | 1979-10-16 | Anordnung zur automatischen pruefung von photomasken |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SU1142733A1 true SU1142733A1 (ru) | 1985-02-28 |
Family
ID=5520612
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SU807771388A SU1142733A1 (ru) | 1979-10-16 | 1980-09-22 | Устройство дл автоматического контрол фотошаблонов |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS56142533A (enExample) |
| DD (1) | DD146500A1 (enExample) |
| DE (1) | DE3037467A1 (enExample) |
| FR (1) | FR2468100A1 (enExample) |
| GB (1) | GB2060876B (enExample) |
| SU (1) | SU1142733A1 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3274015D1 (en) * | 1981-07-14 | 1986-12-04 | Hitachi Ltd | Pattern detection system |
| JPS58204346A (ja) * | 1982-05-24 | 1983-11-29 | Nippon Jido Seigyo Kk | パタ−ンの欠陥検査装置 |
| JP3069417B2 (ja) * | 1991-11-21 | 2000-07-24 | シャープ株式会社 | 位相シフトマスクの検査方法 |
| WO2005026706A1 (en) * | 2003-09-04 | 2005-03-24 | Applied Materials Israel, Ltd. | Method for high efficiency multipass article inspection |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5265671A (en) * | 1975-11-26 | 1977-05-31 | Nippon Jidoseigyo Ltd | Apparatus for testing defects in pattern |
| JPS5419664A (en) * | 1977-07-15 | 1979-02-14 | Nippon Jidoseigyo Ltd | Device for inspecting fault of pattern |
-
1979
- 1979-10-16 DD DD21623879A patent/DD146500A1/de not_active IP Right Cessation
-
1980
- 1980-09-22 SU SU807771388A patent/SU1142733A1/ru active
- 1980-10-03 DE DE19803037467 patent/DE3037467A1/de not_active Withdrawn
- 1980-10-10 FR FR8021700A patent/FR2468100A1/fr active Granted
- 1980-10-16 JP JP14373880A patent/JPS56142533A/ja active Pending
- 1980-10-16 GB GB8033396A patent/GB2060876B/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| GB2060876A (en) | 1981-05-07 |
| FR2468100A1 (fr) | 1981-04-30 |
| DE3037467A1 (de) | 1981-04-30 |
| FR2468100B1 (enExample) | 1984-02-24 |
| DD146500A1 (de) | 1981-02-11 |
| JPS56142533A (en) | 1981-11-06 |
| GB2060876B (en) | 1983-12-21 |
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