JPS56142533A - Automatic photographic mask testing device - Google Patents

Automatic photographic mask testing device

Info

Publication number
JPS56142533A
JPS56142533A JP14373880A JP14373880A JPS56142533A JP S56142533 A JPS56142533 A JP S56142533A JP 14373880 A JP14373880 A JP 14373880A JP 14373880 A JP14373880 A JP 14373880A JP S56142533 A JPS56142533 A JP S56142533A
Authority
JP
Japan
Prior art keywords
testing device
automatic photographic
photographic mask
mask testing
automatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14373880A
Other languages
Japanese (ja)
Inventor
Degenkorube Eeberuharuto
Haintsue Manfureeto
Ramuroo Kaaru
Shiyumitsuto Ieruku
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jenoptik AG
Original Assignee
Carl Zeiss Jena GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Jena GmbH filed Critical Carl Zeiss Jena GmbH
Publication of JPS56142533A publication Critical patent/JPS56142533A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
JP14373880A 1979-10-16 1980-10-16 Automatic photographic mask testing device Pending JPS56142533A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD21623879A DD146500A1 (en) 1979-10-16 1979-10-16 ARRANGEMENT FOR AUTOMATIC TESTING OF PHOTOMASKS

Publications (1)

Publication Number Publication Date
JPS56142533A true JPS56142533A (en) 1981-11-06

Family

ID=5520612

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14373880A Pending JPS56142533A (en) 1979-10-16 1980-10-16 Automatic photographic mask testing device

Country Status (6)

Country Link
JP (1) JPS56142533A (en)
DD (1) DD146500A1 (en)
DE (1) DE3037467A1 (en)
FR (1) FR2468100A1 (en)
GB (1) GB2060876B (en)
SU (1) SU1142733A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58204346A (en) * 1982-05-24 1983-11-29 Nippon Jido Seigyo Kk Defect inspection device for pattern
JPH05142754A (en) * 1991-11-21 1993-06-11 Sharp Corp Inspecting method for phase shift mask

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3274015D1 (en) * 1981-07-14 1986-12-04 Hitachi Ltd Pattern detection system
WO2005026706A1 (en) * 2003-09-04 2005-03-24 Applied Materials Israel, Ltd. Method for high efficiency multipass article inspection

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5265671A (en) * 1975-11-26 1977-05-31 Nippon Jidoseigyo Ltd Apparatus for testing defects in pattern

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5419664A (en) * 1977-07-15 1979-02-14 Nippon Jidoseigyo Ltd Device for inspecting fault of pattern

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5265671A (en) * 1975-11-26 1977-05-31 Nippon Jidoseigyo Ltd Apparatus for testing defects in pattern

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58204346A (en) * 1982-05-24 1983-11-29 Nippon Jido Seigyo Kk Defect inspection device for pattern
JPH05142754A (en) * 1991-11-21 1993-06-11 Sharp Corp Inspecting method for phase shift mask

Also Published As

Publication number Publication date
GB2060876A (en) 1981-05-07
FR2468100B1 (en) 1984-02-24
SU1142733A1 (en) 1985-02-28
DD146500A1 (en) 1981-02-11
DE3037467A1 (en) 1981-04-30
GB2060876B (en) 1983-12-21
FR2468100A1 (en) 1981-04-30

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