GB2060876B - Testing photomasks - Google Patents

Testing photomasks

Info

Publication number
GB2060876B
GB2060876B GB8033396A GB8033396A GB2060876B GB 2060876 B GB2060876 B GB 2060876B GB 8033396 A GB8033396 A GB 8033396A GB 8033396 A GB8033396 A GB 8033396A GB 2060876 B GB2060876 B GB 2060876B
Authority
GB
United Kingdom
Prior art keywords
photomasks
testing
testing photomasks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8033396A
Other versions
GB2060876A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jenoptik AG
Original Assignee
Carl Zeiss Jena GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Jena GmbH filed Critical Carl Zeiss Jena GmbH
Publication of GB2060876A publication Critical patent/GB2060876A/en
Application granted granted Critical
Publication of GB2060876B publication Critical patent/GB2060876B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
GB8033396A 1979-10-16 1980-10-16 Testing photomasks Expired GB2060876B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD21623879A DD146500A1 (en) 1979-10-16 1979-10-16 ARRANGEMENT FOR AUTOMATIC TESTING OF PHOTOMASKS

Publications (2)

Publication Number Publication Date
GB2060876A GB2060876A (en) 1981-05-07
GB2060876B true GB2060876B (en) 1983-12-21

Family

ID=5520612

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8033396A Expired GB2060876B (en) 1979-10-16 1980-10-16 Testing photomasks

Country Status (6)

Country Link
JP (1) JPS56142533A (en)
DD (1) DD146500A1 (en)
DE (1) DE3037467A1 (en)
FR (1) FR2468100A1 (en)
GB (1) GB2060876B (en)
SU (1) SU1142733A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3274015D1 (en) * 1981-07-14 1986-12-04 Hitachi Ltd Pattern detection system
JPS58204346A (en) * 1982-05-24 1983-11-29 Nippon Jido Seigyo Kk Defect inspection device for pattern
JP3069417B2 (en) * 1991-11-21 2000-07-24 シャープ株式会社 Inspection method of phase shift mask
WO2005026706A1 (en) * 2003-09-04 2005-03-24 Applied Materials Israel, Ltd. Method for high efficiency multipass article inspection

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5265671A (en) * 1975-11-26 1977-05-31 Nippon Jidoseigyo Ltd Apparatus for testing defects in pattern
JPS5419664A (en) * 1977-07-15 1979-02-14 Nippon Jidoseigyo Ltd Device for inspecting fault of pattern

Also Published As

Publication number Publication date
FR2468100B1 (en) 1984-02-24
DD146500A1 (en) 1981-02-11
SU1142733A1 (en) 1985-02-28
FR2468100A1 (en) 1981-04-30
GB2060876A (en) 1981-05-07
DE3037467A1 (en) 1981-04-30
JPS56142533A (en) 1981-11-06

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee