SI20037A - Sistem za prenos digitalno postavljenih slik na občutljivo podlago in obratno - Google Patents

Sistem za prenos digitalno postavljenih slik na občutljivo podlago in obratno Download PDF

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Publication number
SI20037A
SI20037A SI9620144A SI9620144A SI20037A SI 20037 A SI20037 A SI 20037A SI 9620144 A SI9620144 A SI 9620144A SI 9620144 A SI9620144 A SI 9620144A SI 20037 A SI20037 A SI 20037A
Authority
SI
Slovenia
Prior art keywords
light
support material
image
sensitive
flat plate
Prior art date
Application number
SI9620144A
Other languages
English (en)
Slovenian (sl)
Inventor
Jozef Vodopivec
Cesare Fumo
Original Assignee
New System S.R.L.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by New System S.R.L. filed Critical New System S.R.L.
Publication of SI20037A publication Critical patent/SI20037A/sl

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/70391Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70475Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70716Stages

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
  • Cameras Adapted For Combination With Other Photographic Or Optical Apparatuses (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
  • Projection-Type Copiers In General (AREA)
  • Facsimile Scanning Arrangements (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Image Input (AREA)
  • Measuring And Recording Apparatus For Diagnosis (AREA)
  • Compounds Of Unknown Constitution (AREA)
  • Holo Graphy (AREA)
  • Preparation Of Compounds By Using Micro-Organisms (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Light Receiving Elements (AREA)
  • Developing Agents For Electrophotography (AREA)
SI9620144A 1996-12-23 1996-12-23 Sistem za prenos digitalno postavljenih slik na občutljivo podlago in obratno SI20037A (sl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/IT1996/000264 WO1998028666A1 (en) 1996-12-23 1996-12-23 System for the transfer of digitized images to an image support or vice-versa

Publications (1)

Publication Number Publication Date
SI20037A true SI20037A (sl) 2000-02-29

Family

ID=11332608

Family Applications (1)

Application Number Title Priority Date Filing Date
SI9620144A SI20037A (sl) 1996-12-23 1996-12-23 Sistem za prenos digitalno postavljenih slik na občutljivo podlago in obratno

Country Status (23)

Country Link
US (1) US6424368B1 (pt)
EP (1) EP0946899B1 (pt)
JP (1) JP3680317B2 (pt)
KR (1) KR100483596B1 (pt)
AT (1) ATE195592T1 (pt)
AU (1) AU736673B2 (pt)
BR (1) BR9612815A (pt)
CA (1) CA2275995A1 (pt)
DE (1) DE69609871T2 (pt)
DK (1) DK0946899T3 (pt)
ES (1) ES2151191T3 (pt)
GR (1) GR3034808T3 (pt)
HK (1) HK1024756A1 (pt)
HU (1) HUP9903419A3 (pt)
NO (1) NO993039L (pt)
NZ (1) NZ336851A (pt)
PL (1) PL183950B1 (pt)
PT (1) PT946899E (pt)
RO (1) RO119663B1 (pt)
SI (1) SI20037A (pt)
TR (1) TR199902336T2 (pt)
UA (1) UA66780C2 (pt)
WO (1) WO1998028666A1 (pt)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6669316B2 (en) * 2002-04-09 2003-12-30 Hewlett-Packard Development Company, L.P. Document reproduction

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1589296A (en) * 1976-10-04 1981-05-13 Spence Bate Step and repeat mechanism in a microfiche camera
US4198701A (en) * 1978-05-23 1980-04-15 Harris Corporation of Cleveland, Ohio Digital optical recorder-reproducer system
US4675702A (en) * 1986-03-14 1987-06-23 Gerber Scientific Inc. Photoplotter using a light valve device and process for exposing graphics
DK69492D0 (da) * 1992-05-26 1992-05-26 Purup Prepress As Apparat til exponering af et medie, apparat til punktexponering af et medie, samt en indretning til fastholdelse af et medie
JP3052587B2 (ja) * 1992-07-28 2000-06-12 日本電気株式会社 露光装置

Also Published As

Publication number Publication date
AU736673B2 (en) 2001-08-02
ATE195592T1 (de) 2000-09-15
NZ336851A (en) 2000-06-23
HUP9903419A3 (en) 2002-11-28
KR20000062312A (ko) 2000-10-25
PT946899E (pt) 2001-02-28
KR100483596B1 (ko) 2005-04-15
DE69609871D1 (de) 2000-09-21
PL334384A1 (en) 2000-02-28
HUP9903419A2 (hu) 2000-02-28
ES2151191T3 (es) 2000-12-16
AU1207997A (en) 1998-07-17
JP3680317B2 (ja) 2005-08-10
EP0946899B1 (en) 2000-08-16
NO993039L (no) 1999-08-17
RO119663B1 (ro) 2005-01-28
TR199902336T2 (xx) 2000-07-21
US6424368B1 (en) 2002-07-23
GR3034808T3 (en) 2001-02-28
UA66780C2 (en) 2004-06-15
EP0946899A1 (en) 1999-10-06
PL183950B1 (pl) 2002-08-30
BR9612815A (pt) 2000-05-02
JP2001507900A (ja) 2001-06-12
WO1998028666A1 (en) 1998-07-02
HK1024756A1 (en) 2000-10-20
NO993039D0 (no) 1999-06-21
DE69609871T2 (de) 2001-04-05
CA2275995A1 (en) 1998-07-02
DK0946899T3 (da) 2000-12-18

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IF Valid on the event date
KO00 Lapse of patent

Effective date: 20050830