SG65778A1 - Wafer polishing apparatus - Google Patents

Wafer polishing apparatus

Info

Publication number
SG65778A1
SG65778A1 SG1998002930A SG1998002930A SG65778A1 SG 65778 A1 SG65778 A1 SG 65778A1 SG 1998002930 A SG1998002930 A SG 1998002930A SG 1998002930 A SG1998002930 A SG 1998002930A SG 65778 A1 SG65778 A1 SG 65778A1
Authority
SG
Singapore
Prior art keywords
wafer
air
guide groove
uniform
air guide
Prior art date
Application number
SG1998002930A
Other languages
English (en)
Inventor
Nimoru Numoto
Takao Inaba
Hisashi Terashita
Original Assignee
Tokyo Seimitsu Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Seimitsu Co Ltd filed Critical Tokyo Seimitsu Co Ltd
Publication of SG65778A1 publication Critical patent/SG65778A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/30—Work carriers for single side lapping of plane surfaces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/16—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the load
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
SG1998002930A 1997-08-11 1998-08-08 Wafer polishing apparatus SG65778A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21669997 1997-08-11

Publications (1)

Publication Number Publication Date
SG65778A1 true SG65778A1 (en) 1999-06-22

Family

ID=16692544

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1998002930A SG65778A1 (en) 1997-08-11 1998-08-08 Wafer polishing apparatus

Country Status (7)

Country Link
US (1) US6080049A (fr)
EP (1) EP0896859B1 (fr)
KR (1) KR100306717B1 (fr)
DE (1) DE69823113T2 (fr)
MY (1) MY120754A (fr)
SG (1) SG65778A1 (fr)
TW (1) TW434096B (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW434095B (en) * 1997-08-11 2001-05-16 Tokyo Seimitsu Co Ltd Wafer polishing apparatus
US6425809B1 (en) * 1999-02-15 2002-07-30 Ebara Corporation Polishing apparatus
US6281128B1 (en) * 1999-06-14 2001-08-28 Agere Systems Guardian Corp. Wafer carrier modification for reduced extraction force
US6910949B1 (en) * 2001-04-25 2005-06-28 Lam Research Corporation Spherical cap-shaped polishing head in a chemical mechanical polishing apparatus for semiconductor wafers
US6776693B2 (en) * 2001-12-19 2004-08-17 Applied Materials Inc. Method and apparatus for face-up substrate polishing
TWI492818B (zh) * 2011-07-12 2015-07-21 Iv Technologies Co Ltd 研磨墊、研磨方法以及研磨系統
KR102191916B1 (ko) * 2013-06-26 2020-12-16 주식회사 케이씨텍 화학 기계적 연마 장치의 캐리어 헤드
KR101480168B1 (ko) * 2014-01-29 2015-01-08 제타텍 주식회사 리테이너링을 갖는 화학기계적 연마장치
KR102050975B1 (ko) * 2017-12-27 2020-01-08 주식회사 케이씨텍 기판 지지 유닛 및 이를 포함하는 기판 연마 장치
US12017322B2 (en) * 2018-08-14 2024-06-25 Taiwan Semiconductor Manufacturing Co., Ltd. Chemical mechanical polishing method

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6022500B2 (ja) * 1980-05-23 1985-06-03 株式会社デイスコ 位置合せ載置方法
JPH0691058B2 (ja) * 1988-10-06 1994-11-14 信越半導体株式会社 半導体ウエーハ研磨方法
JPH0582631A (ja) * 1991-09-20 1993-04-02 Toshiba Ceramics Co Ltd 半導体ウエーハ用真空チヤツク
JPH07290355A (ja) * 1994-04-25 1995-11-07 Nippon Steel Corp 研磨装置
JP3257304B2 (ja) * 1994-11-24 2002-02-18 三菱マテリアル株式会社 研磨装置
TW348279B (en) * 1995-04-10 1998-12-21 Matsushita Electric Ind Co Ltd Substrate grinding method
JP2758152B2 (ja) * 1995-04-10 1998-05-28 松下電器産業株式会社 被研磨基板の保持装置及び基板の研磨方法
JP3287761B2 (ja) * 1995-06-19 2002-06-04 日本電信電話株式会社 真空吸着装置および加工装置
DE69717510T2 (de) * 1996-01-24 2003-10-02 Lam Research Corp., Fremont Halbleiterscheiben-Polierkopf
JP3663728B2 (ja) * 1996-03-28 2005-06-22 信越半導体株式会社 薄板の研磨機
KR100475845B1 (ko) * 1997-04-04 2005-06-17 도쿄 세이미츄 코퍼레이션 리미티드 연마장치
TW436369B (en) * 1997-07-11 2001-05-28 Tokyo Seimitsu Co Ltd Wafer polishing device

Also Published As

Publication number Publication date
EP0896859A2 (fr) 1999-02-17
KR100306717B1 (ko) 2001-11-30
EP0896859A3 (fr) 2002-08-28
MY120754A (en) 2005-11-30
DE69823113T2 (de) 2004-08-26
DE69823113D1 (de) 2004-05-19
EP0896859B1 (fr) 2004-04-14
US6080049A (en) 2000-06-27
KR19990023511A (ko) 1999-03-25
TW434096B (en) 2001-05-16

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