SG54612A1 - In-situ capped aluminium plug (cap) process using selective cvd al for integrated plug/interconnect metallization - Google Patents
In-situ capped aluminium plug (cap) process using selective cvd al for integrated plug/interconnect metallizationInfo
- Publication number
- SG54612A1 SG54612A1 SG1997004694A SG1997004694A SG54612A1 SG 54612 A1 SG54612 A1 SG 54612A1 SG 1997004694 A SG1997004694 A SG 1997004694A SG 1997004694 A SG1997004694 A SG 1997004694A SG 54612 A1 SG54612 A1 SG 54612A1
- Authority
- SG
- Singapore
- Prior art keywords
- plug
- capped
- situ
- cap
- interconnect metallization
- Prior art date
Links
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title 1
- 229910052782 aluminium Inorganic materials 0.000 title 1
- 239000004411 aluminium Substances 0.000 title 1
- 238000011065 in-situ storage Methods 0.000 title 1
- 238000001465 metallisation Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76877—Filling of holes, grooves or trenches, e.g. vias, with conductive material
- H01L21/76879—Filling of holes, grooves or trenches, e.g. vias, with conductive material by selective deposition of conductive material in the vias, e.g. selective C.V.D. on semiconductor material, plating
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/791,653 US6110828A (en) | 1996-12-30 | 1996-12-30 | In-situ capped aluminum plug (CAP) process using selective CVD AL for integrated plug/interconnect metallization |
Publications (1)
Publication Number | Publication Date |
---|---|
SG54612A1 true SG54612A1 (en) | 1998-11-16 |
Family
ID=25154367
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG1997004694A SG54612A1 (en) | 1996-12-30 | 1997-12-26 | In-situ capped aluminium plug (cap) process using selective cvd al for integrated plug/interconnect metallization |
Country Status (6)
Country | Link |
---|---|
US (1) | US6110828A (zh) |
EP (1) | EP0851482A3 (zh) |
JP (1) | JPH10233396A (zh) |
KR (1) | KR100489920B1 (zh) |
SG (1) | SG54612A1 (zh) |
TW (1) | TW385533B (zh) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040222525A1 (en) * | 1997-03-14 | 2004-11-11 | Rhodes Howard E. | Advanced VLSI metallization |
US6660650B1 (en) * | 1998-12-18 | 2003-12-09 | Texas Instruments Incorporated | Selective aluminum plug formation and etchback process |
US6245655B1 (en) | 1999-04-01 | 2001-06-12 | Cvc Products, Inc. | Method for planarized deposition of a material |
US6211086B1 (en) * | 1999-06-08 | 2001-04-03 | United Microelectronics Corp. | Method of avoiding CMP caused residue on wafer edge uncompleted field |
US7105434B2 (en) * | 1999-10-02 | 2006-09-12 | Uri Cohen | Advanced seed layery for metallic interconnects |
US6610151B1 (en) | 1999-10-02 | 2003-08-26 | Uri Cohen | Seed layers for interconnects and methods and apparatus for their fabrication |
US6924226B2 (en) | 1999-10-02 | 2005-08-02 | Uri Cohen | Methods for making multiple seed layers for metallic interconnects |
US6207558B1 (en) | 1999-10-21 | 2001-03-27 | Applied Materials, Inc. | Barrier applications for aluminum planarization |
US6509274B1 (en) * | 2000-08-04 | 2003-01-21 | Applied Materials, Inc. | Method for forming aluminum lines over aluminum-filled vias in a semiconductor substrate |
US20020192948A1 (en) * | 2001-06-15 | 2002-12-19 | Applied Materials, Inc. | Integrated barrier layer structure for copper contact level metallization |
KR100576363B1 (ko) * | 2003-05-30 | 2006-05-03 | 삼성전자주식회사 | 인시투 화학기상증착 금속 공정 및 그에 사용되는화학기상증착 장비 |
KR100561523B1 (ko) * | 2003-12-31 | 2006-03-16 | 동부아남반도체 주식회사 | 알루미늄 배선 형성 방법 |
DE102004015865B4 (de) * | 2004-03-31 | 2006-05-04 | Advanced Micro Devices, Inc., Sunnyvale | Verfahren zum Reinigen der Oberfläche eines Substrats |
US20070184656A1 (en) * | 2004-11-08 | 2007-08-09 | Tel Epion Inc. | GCIB Cluster Tool Apparatus and Method of Operation |
US7799683B2 (en) | 2004-11-08 | 2010-09-21 | Tel Epion, Inc. | Copper interconnect wiring and method and apparatus for forming thereof |
US7550055B2 (en) * | 2005-05-31 | 2009-06-23 | Applied Materials, Inc. | Elastomer bonding of large area sputtering target |
KR20080098514A (ko) * | 2006-02-06 | 2008-11-10 | 텔 에피온 인크 | 구리 인터커넥트 배선 및 이를 형성하기 위한 방법 및 장치 |
US7901869B2 (en) * | 2007-06-01 | 2011-03-08 | Applied Materials, Inc. | Double patterning with a double layer cap on carbonaceous hardmask |
US8183145B2 (en) * | 2007-10-11 | 2012-05-22 | International Business Machines Corporation | Structure and methods of forming contact structures |
US9293557B2 (en) | 2014-02-20 | 2016-03-22 | International Business Machines Corporation | Low temperature spacer for advanced semiconductor devices |
CN112379245B (zh) * | 2020-11-11 | 2023-08-11 | 上海华力集成电路制造有限公司 | 金属电迁移测试结构及其测试方法 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2559030B2 (ja) * | 1986-07-25 | 1996-11-27 | 日本電信電話株式会社 | 金属薄膜の製造方法 |
JPS6373660A (ja) * | 1986-09-17 | 1988-04-04 | Fujitsu Ltd | 半導体装置 |
JPS63160328A (ja) * | 1986-12-24 | 1988-07-04 | Mitsubishi Electric Corp | 半導体装置の製造方法 |
US4960732A (en) * | 1987-02-19 | 1990-10-02 | Advanced Micro Devices, Inc. | Contact plug and interconnect employing a barrier lining and a backfilled conductor material |
US4994410A (en) * | 1988-04-04 | 1991-02-19 | Motorola, Inc. | Method for device metallization by forming a contact plug and interconnect using a silicide/nitride process |
US4920072A (en) * | 1988-10-31 | 1990-04-24 | Texas Instruments Incorporated | Method of forming metal interconnects |
JPH038359A (ja) * | 1989-06-06 | 1991-01-16 | Fujitsu Ltd | 半導体装置の製造方法 |
ATE139866T1 (de) * | 1990-02-19 | 1996-07-15 | Canon Kk | Verfahren zum herstellen von abgeschiedener metallschicht, die aluminium als hauptkomponente enthält, mit anwendung von alkylaluminiumhydrid |
US5032233A (en) * | 1990-09-05 | 1991-07-16 | Micron Technology, Inc. | Method for improving step coverage of a metallization layer on an integrated circuit by use of a high melting point metal as an anti-reflective coating during laser planarization |
US5147819A (en) * | 1991-02-21 | 1992-09-15 | Micron Technology, Inc. | Semiconductor metallization method |
JPH04368125A (ja) * | 1991-06-14 | 1992-12-21 | Canon Inc | 半導体装置及びその製造方法 |
US5300813A (en) * | 1992-02-26 | 1994-04-05 | International Business Machines Corporation | Refractory metal capped low resistivity metal conductor lines and vias |
US5371042A (en) * | 1992-06-16 | 1994-12-06 | Applied Materials, Inc. | Method of filling contacts in semiconductor devices |
EP0608628A3 (en) * | 1992-12-25 | 1995-01-18 | Kawasaki Steel Co | Method for manufacturing a semiconductor device having a multi-layer interconnection structure. |
JPH0722339A (ja) * | 1993-07-05 | 1995-01-24 | Toshiba Corp | 薄膜形成方法 |
US5393703A (en) * | 1993-11-12 | 1995-02-28 | Motorola, Inc. | Process for forming a conductive layer for semiconductor devices |
US5585308A (en) * | 1993-12-23 | 1996-12-17 | Sgs-Thomson Microelectronics, Inc. | Method for improved pre-metal planarization |
JPH0897287A (ja) * | 1994-09-29 | 1996-04-12 | Kawasaki Steel Corp | ヴィア孔の埋め込み方法 |
US5523259A (en) * | 1994-12-05 | 1996-06-04 | At&T Corp. | Method of forming metal layers formed as a composite of sub-layers using Ti texture control layer |
DE69625265T2 (de) * | 1995-03-28 | 2003-09-04 | Texas Instruments Inc., Dallas | Halbleiterstrukturen |
US5989633A (en) * | 1996-04-29 | 1999-11-23 | Applied Materials, Inc. | Process for overcoming CVD aluminum selectivity loss with warm PVD aluminum |
-
1996
- 1996-12-30 US US08/791,653 patent/US6110828A/en not_active Expired - Fee Related
-
1997
- 1997-12-26 JP JP9370396A patent/JPH10233396A/ja not_active Withdrawn
- 1997-12-26 SG SG1997004694A patent/SG54612A1/en unknown
- 1997-12-29 TW TW086119920A patent/TW385533B/zh not_active IP Right Cessation
- 1997-12-30 EP EP97310667A patent/EP0851482A3/en not_active Withdrawn
- 1997-12-30 KR KR1019970077842A patent/KR100489920B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR100489920B1 (ko) | 2005-09-16 |
KR19980064796A (ko) | 1998-10-07 |
US6110828A (en) | 2000-08-29 |
EP0851482A3 (en) | 1999-09-22 |
JPH10233396A (ja) | 1998-09-02 |
EP0851482A2 (en) | 1998-07-01 |
TW385533B (en) | 2000-03-21 |
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