SG47666A1 - A method of manufacturing thin film magnetic heads - Google Patents

A method of manufacturing thin film magnetic heads

Info

Publication number
SG47666A1
SG47666A1 SG1996003620A SG1996003620A SG47666A1 SG 47666 A1 SG47666 A1 SG 47666A1 SG 1996003620 A SG1996003620 A SG 1996003620A SG 1996003620 A SG1996003620 A SG 1996003620A SG 47666 A1 SG47666 A1 SG 47666A1
Authority
SG
Singapore
Prior art keywords
thin film
film magnetic
magnetic heads
manufacturing thin
manufacturing
Prior art date
Application number
SG1996003620A
Other languages
English (en)
Inventor
Nurul Amin
Uri Cohen
Original Assignee
Seagate Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seagate Technology filed Critical Seagate Technology
Publication of SG47666A1 publication Critical patent/SG47666A1/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • G11B5/3166—Testing or indicating in relation thereto, e.g. before the fabrication is completed
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032—Fabricating head structure or component thereof
    • Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
    • Y10T29/49043—Depositing magnetic layer or coating
    • Y10T29/49044—Plural magnetic deposition layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032—Fabricating head structure or component thereof
    • Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
    • Y10T29/49043—Depositing magnetic layer or coating
    • Y10T29/49046—Depositing magnetic layer or coating with etching or machining of magnetic material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032—Fabricating head structure or component thereof
    • Y10T29/49048—Machining magnetic material [e.g., grinding, etching, polishing]
    • Y10T29/49052—Machining magnetic material [e.g., grinding, etching, polishing] by etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)
SG1996003620A 1990-02-15 1990-12-14 A method of manufacturing thin film magnetic heads SG47666A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/480,558 US5141623A (en) 1990-02-15 1990-02-15 Method for aligning pole tips in a thin film head

Publications (1)

Publication Number Publication Date
SG47666A1 true SG47666A1 (en) 1998-04-17

Family

ID=23908427

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1996003620A SG47666A1 (en) 1990-02-15 1990-12-14 A method of manufacturing thin film magnetic heads

Country Status (7)

Country Link
US (1) US5141623A (ko)
EP (1) EP0442214B1 (ko)
JP (1) JPH07105004B2 (ko)
KR (1) KR100212386B1 (ko)
DE (1) DE69032936T2 (ko)
HK (1) HK1012463A1 (ko)
SG (1) SG47666A1 (ko)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5306525A (en) * 1990-04-25 1994-04-26 Kabushiki Kaisha Komatsu Seisakusho Method of processing rod
JP2901749B2 (ja) * 1990-11-19 1999-06-07 株式会社日立製作所 磁気抵抗効果型ヘッド
JPH05159221A (ja) * 1991-12-02 1993-06-25 Fujitsu Ltd 薄膜ヘッドおよびその製造方法
US5820770A (en) * 1992-07-21 1998-10-13 Seagate Technology, Inc. Thin film magnetic head including vias formed in alumina layer and process for making the same
US5945007A (en) * 1992-10-20 1999-08-31 Cohen; Uri Method for etching gap-vias in a magnetic thin film head and product
US5621595A (en) * 1992-10-20 1997-04-15 Cohen; Uri Pinched-gap magnetic recording thin film head
DE69418551T2 (de) * 1993-08-27 1999-09-16 Read-Rite Corp., Milpitas Magnetkopfzusammenbau mit Schreibpol-/Abschirmstruktur
US5666250A (en) * 1993-11-23 1997-09-09 Seagate Technology, Inc. Thin film magnetic heads with thin nickel underlayers
US5452164A (en) * 1994-02-08 1995-09-19 International Business Machines Corporation Thin film magnetic write head
US5640753A (en) * 1994-03-03 1997-06-24 Seagate Technology, Inc. Method of fabricating an inverted magnetoresistive head
US5815909A (en) * 1994-08-26 1998-10-06 Aiwa Research And Development, Inc. Method of making a thin film magnetic head including protected via connections through an electrically insulative substrate
US5665251A (en) * 1994-11-23 1997-09-09 International Business Machines Corporation RIE image transfer process for plating
US5703740A (en) * 1995-08-24 1997-12-30 Velocidata, Inc. Toroidal thin film head
US6195232B1 (en) 1995-08-24 2001-02-27 Torohead, Inc. Low-noise toroidal thin film head with solenoidal coil
JPH09153204A (ja) * 1995-11-29 1997-06-10 Read Rite S M I Kk 薄膜磁気ヘッドの製造方法
US5784772A (en) * 1995-12-21 1998-07-28 Storage Technology Corporation Method of simultaneously forming MR sensors in a dual element MR head
US5811018A (en) * 1996-01-31 1998-09-22 Storage Technology Corporation Magnetic barrier for gap control in interleaved tape head design
US5752309A (en) * 1996-06-14 1998-05-19 Quantum Corporation Method and apparatus for precisely dimensioning pole tips of a magnetic transducing head structure
US5804085A (en) * 1997-01-30 1998-09-08 Quantum Corporation Process for producing a pole-trimmed writer in a magnetoresistive read/write head and a data transducer made thereby
US5916423A (en) * 1997-05-06 1999-06-29 International Business Machines Corporation P1 notched write head with minimum overmilled p1 and p2
US5966800A (en) * 1997-07-28 1999-10-19 Read-Rite Corporation Method of making a magnetic head with aligned pole tips and pole layers formed of high magnetic moment material
US6586049B2 (en) * 1997-08-28 2003-07-01 Tdk Corporation Patterning method using mask and manufacturing method for composite type thin film magnetic head using the patterning method
JP3421259B2 (ja) 1997-12-25 2003-06-30 ティーディーケイ株式会社 エッチングマスク、その作製方法およびエッチング方法、並びに磁気ヘッドおよびその製造方法
US6137660A (en) * 1997-12-29 2000-10-24 Matsushita-Kotobuki Electronics Method for reducing ESD and imaging damage during focused ion beam definition of magnetoresistive head write track width
US6024884A (en) * 1998-03-12 2000-02-15 Storage Technology Corporation Method for creating microstructures
US6158107A (en) 1998-04-02 2000-12-12 International Business Machines Corporation Inverted merged MR head with plated notched first pole tip and self-aligned second pole tip
US6172848B1 (en) 1998-04-10 2001-01-09 International Business Machines Corporation Write head with self aligned pedestal shaped pole tips that are separated by a zero throat height defining layer
US6445536B1 (en) * 1998-08-27 2002-09-03 Read-Rite Corporation Dielectric stencil-defined write head for MR, GMR, and spin valve high density recording heads
US6826011B1 (en) 1998-11-18 2004-11-30 Seagate Technology Llc Writer design eliminating transition curvature for very narrow writer widths
US6228276B1 (en) * 1999-02-05 2001-05-08 Headway Technologies, Inc. Method of manufacturing magnetoresistive (MR) sensor element with sunken lead structure
US6362934B1 (en) * 1999-03-24 2002-03-26 Storage Technology Corporation Highly aligned thin film tape head and method of making same
US6291138B1 (en) * 1999-07-23 2001-09-18 Headway Technologies, Inc. Masking frame plating method for forming masking frame plated layer
US6477765B1 (en) * 1999-11-04 2002-11-12 Storage Technology Corporation Method of fabricating a magnetic write transducer
JP4006164B2 (ja) * 2000-04-13 2007-11-14 株式会社日立グローバルストレージテクノロジーズ 録再分離型薄膜ヘッド及び該ヘッドの製造方法
JP2002208115A (ja) * 2000-11-10 2002-07-26 Tdk Corp 薄膜磁気ヘッドの製造方法
US6798622B2 (en) * 2000-12-11 2004-09-28 Headway Technologies, Inc. Magnetoresistive (MR) sensor element with sunken lead structure
US6958885B1 (en) 2000-12-21 2005-10-25 Western Digital (Fremont), Inc. Insulation layer structure for inductive write heads and method of fabrication
US6785953B2 (en) * 2001-06-18 2004-09-07 International Business Machines Corporation Process of fabricating a write head with protection of a second pole tip thickness
US7569131B2 (en) 2002-08-12 2009-08-04 International Business Machines Corporation Method for producing multiple magnetic layers of materials with known thickness and composition using a one-step electrodeposition process
US6906893B2 (en) * 2002-10-08 2005-06-14 Hitachi Global Storage Technologies Magnetic head coil and structure for protecting same during pole notch processing
US7506428B2 (en) * 2003-09-30 2009-03-24 Hitachi Global Storage Technologies Netherlands B.V. Ion mill process with sacrificial mask layer to fabricate pole tip for perpendicular recording
US7449348B1 (en) * 2004-06-02 2008-11-11 Advanced Micro Devices, Inc. Feedback control of imprint mask feature profile using scatterometry and spacer etchback
US7818875B2 (en) * 2005-12-07 2010-10-26 Hitachi Global Storage Technologies Netherlands B.V. Method of manufacturing a magnetic head with integration of a small flash field, zero bias, and non-reactive ion milling for pole tip uniformity
US8108985B2 (en) * 2007-11-02 2012-02-07 Hitachi Global Storage Technologies Netherlands B.V. Method for manufacturing a perpendicular magnetic write head
KR102537526B1 (ko) * 2016-05-31 2023-05-26 삼성전자 주식회사 반도체 장치

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4399479A (en) * 1981-02-04 1983-08-16 Eastman Kodak Company Thin film magnetic head having good low frequency response
US4436593A (en) * 1981-07-13 1984-03-13 Memorex Corporation Self-aligned pole tips
JPS60133516A (ja) * 1983-12-22 1985-07-16 Hitachi Ltd 薄膜磁気ヘツドの製造方法
US4481071A (en) * 1983-12-29 1984-11-06 International Business Machines Corporation Process of lift off of material
JPH01128212A (ja) * 1987-11-12 1989-05-19 Sumitomo Metal Ind Ltd 薄膜磁気ヘッド用磁極の製造方法
JPH01173308A (ja) * 1987-12-28 1989-07-10 Hitachi Ltd 薄膜磁気ヘッドの製造方法
US5116719A (en) * 1990-02-15 1992-05-26 Seagate Technology, Inc. Top pole profile for pole tip trimming
US4992901A (en) * 1990-02-15 1991-02-12 Seagate Technology, Inc. Self aligned magnetic poles using sacrificial mask

Also Published As

Publication number Publication date
EP0442214A2 (en) 1991-08-21
US5141623A (en) 1992-08-25
EP0442214A3 (en) 1993-06-30
KR100212386B1 (ko) 1999-08-02
JPH03252907A (ja) 1991-11-12
KR910015969A (ko) 1991-09-30
DE69032936T2 (de) 1999-06-10
HK1012463A1 (en) 1999-07-30
JPH07105004B2 (ja) 1995-11-13
DE69032936D1 (de) 1999-03-18
EP0442214B1 (en) 1999-02-03

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