SG177625A1 - Grooved cmp polishing pad - Google Patents

Grooved cmp polishing pad Download PDF

Info

Publication number
SG177625A1
SG177625A1 SG2012002234A SG2012002234A SG177625A1 SG 177625 A1 SG177625 A1 SG 177625A1 SG 2012002234 A SG2012002234 A SG 2012002234A SG 2012002234 A SG2012002234 A SG 2012002234A SG 177625 A1 SG177625 A1 SG 177625A1
Authority
SG
Singapore
Prior art keywords
mil
polishing
polishing pad
pad
groove
Prior art date
Application number
SG2012002234A
Other languages
English (en)
Inventor
Ching-Ming Tsai
Fred Sun
Sheng-Huan Liu
Jia-Cheng Hsu
Ananth Naman
Hao-Kuang Chiu
Dinesh Khanna
Original Assignee
Cabot Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Microelectronics Corp filed Critical Cabot Microelectronics Corp
Publication of SG177625A1 publication Critical patent/SG177625A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
SG2012002234A 2009-07-16 2010-07-15 Grooved cmp polishing pad SG177625A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US27106809P 2009-07-16 2009-07-16
PCT/US2010/042073 WO2011008918A2 (en) 2009-07-16 2010-07-15 Grooved cmp polishing pad

Publications (1)

Publication Number Publication Date
SG177625A1 true SG177625A1 (en) 2012-02-28

Family

ID=43450188

Family Applications (2)

Application Number Title Priority Date Filing Date
SG10201404152UA SG10201404152UA (en) 2009-07-16 2010-07-15 Grooved cmp polishing pad
SG2012002234A SG177625A1 (en) 2009-07-16 2010-07-15 Grooved cmp polishing pad

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG10201404152UA SG10201404152UA (en) 2009-07-16 2010-07-15 Grooved cmp polishing pad

Country Status (7)

Country Link
US (1) US20110014858A1 (zh)
JP (1) JP2012533888A (zh)
KR (1) KR101478414B1 (zh)
CN (1) CN102498549A (zh)
SG (2) SG10201404152UA (zh)
TW (1) TWI519384B (zh)
WO (1) WO2011008918A2 (zh)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009018434B4 (de) * 2009-04-22 2023-11-30 Ev Group Gmbh Aufnahmeeinrichtung zur Aufnahme von Halbleitersubstraten
DE102011082777A1 (de) * 2011-09-15 2012-02-09 Siltronic Ag Verfahren zum beidseitigen Polieren einer Halbleiterscheibe
JP2014124718A (ja) * 2012-12-26 2014-07-07 Toyo Tire & Rubber Co Ltd 積層研磨パッドの製造方法
TWI599447B (zh) * 2013-10-18 2017-09-21 卡博特微電子公司 具有偏移同心溝槽圖樣之邊緣排除區的ｃｍｐ拋光墊
US9873180B2 (en) 2014-10-17 2018-01-23 Applied Materials, Inc. CMP pad construction with composite material properties using additive manufacturing processes
US10875153B2 (en) 2014-10-17 2020-12-29 Applied Materials, Inc. Advanced polishing pad materials and formulations
US11745302B2 (en) 2014-10-17 2023-09-05 Applied Materials, Inc. Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process
SG11201703114QA (en) 2014-10-17 2017-06-29 Applied Materials Inc Cmp pad construction with composite material properties using additive manufacturing processes
KR102609439B1 (ko) 2015-10-30 2023-12-05 어플라이드 머티어리얼스, 인코포레이티드 원하는 제타 전위를 가진 연마 제품을 형성하는 장치 및 방법
US10593574B2 (en) 2015-11-06 2020-03-17 Applied Materials, Inc. Techniques for combining CMP process tracking data with 3D printed CMP consumables
US10391605B2 (en) 2016-01-19 2019-08-27 Applied Materials, Inc. Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process
US10875146B2 (en) * 2016-03-24 2020-12-29 Rohm And Haas Electronic Materials Cmp Holdings Debris-removal groove for CMP polishing pad
USD816774S1 (en) * 2016-03-25 2018-05-01 Craig Franklin Edevold Spiral pattern for cribbage board
EP3571009A4 (en) * 2017-01-20 2021-01-20 Applied Materials, Inc. THIN PLASTIC POLISHING ARTICLE FOR CMP APPLICATIONS
USD855110S1 (en) * 2017-01-31 2019-07-30 Gary Peterson Game board
US11471999B2 (en) 2017-07-26 2022-10-18 Applied Materials, Inc. Integrated abrasive polishing pads and manufacturing methods
WO2019032286A1 (en) 2017-08-07 2019-02-14 Applied Materials, Inc. ABRASIVE DISTRIBUTION POLISHING PADS AND METHODS OF MAKING SAME
JP7299970B2 (ja) 2018-09-04 2023-06-28 アプライド マテリアルズ インコーポレイテッド 改良型研磨パッドのための配合物
CN112720282B (zh) * 2020-12-31 2022-04-08 湖北鼎汇微电子材料有限公司 一种抛光垫
US11878389B2 (en) 2021-02-10 2024-01-23 Applied Materials, Inc. Structures formed using an additive manufacturing process for regenerating surface texture in situ
CN113829176B (zh) * 2021-08-31 2023-04-14 北京航天控制仪器研究所 一种用于铍材镜体研磨抛光的研磨平板及研磨抛光方法
CN114274043B (zh) * 2021-12-29 2023-02-24 湖北鼎汇微电子材料有限公司 一种抛光垫

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5921855A (en) * 1997-05-15 1999-07-13 Applied Materials, Inc. Polishing pad having a grooved pattern for use in a chemical mechanical polishing system
US6736709B1 (en) * 2000-05-27 2004-05-18 Rodel Holdings, Inc. Grooved polishing pads for chemical mechanical planarization
JP4615813B2 (ja) * 2000-05-27 2011-01-19 ローム アンド ハース エレクトロニック マテリアルズ シーエムピー ホウルディングス インコーポレイテッド 化学機械平坦化用の研磨パッド
CN100356515C (zh) * 2002-04-03 2007-12-19 东邦工程株式会社 抛光垫及使用该垫制造半导体衬底的方法
JP3849582B2 (ja) * 2002-06-03 2006-11-22 Ｊｓｒ株式会社 研磨パッド及び複層型研磨パッド
JP3849594B2 (ja) * 2002-06-28 2006-11-22 Ｊｓｒ株式会社 研磨パッド
EP1369204B1 (en) * 2002-06-03 2006-10-11 JSR Corporation Polishing pad and process for manufacturing a polishing pad
JP2004071985A (ja) * 2002-08-08 2004-03-04 Jsr Corp 半導体ウェハ用研磨パッドの加工方法及び半導体ウェハ用研磨パッド
JP2004167605A (ja) * 2002-11-15 2004-06-17 Rodel Nitta Co 研磨パッドおよび研磨装置
JP3872081B2 (ja) * 2004-12-29 2007-01-24 東邦エンジニアリング株式会社 研磨用パッド
CN101024260A (zh) * 2006-02-24 2007-08-29 三芳化学工业股份有限公司 具有表面纹路的抛光垫和其制造方法与制造装置
US8192257B2 (en) * 2006-04-06 2012-06-05 Micron Technology, Inc. Method of manufacture of constant groove depth pads

Also Published As

Publication number Publication date
KR20120042985A (ko) 2012-05-03
JP2012533888A (ja) 2012-12-27
TWI519384B (zh) 2016-02-01
TW201121711A (en) 2011-07-01
CN102498549A (zh) 2012-06-13
WO2011008918A3 (en) 2011-04-28
US20110014858A1 (en) 2011-01-20
KR101478414B1 (ko) 2014-12-31
WO2011008918A2 (en) 2011-01-20
SG10201404152UA (en) 2014-09-26

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